Pub Date : 2004-09-29DOI: 10.1109/GROUP4.2004.1416726
T. Chu, H. Yamada, S. Ishida, Y. Arakawa
A Mach-Zehnder interferometer-type optic switch was firstly realized on Si photonic-crystal (PhC) slab structure, by using thermo-optic effect. The maximum extinction ratio was 22 dB, and the switching speed reached 200 /spl mu/s.
{"title":"Thermo-optic switch based on 2D-Si photonic crystals","authors":"T. Chu, H. Yamada, S. Ishida, Y. Arakawa","doi":"10.1109/GROUP4.2004.1416726","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416726","url":null,"abstract":"A Mach-Zehnder interferometer-type optic switch was firstly realized on Si photonic-crystal (PhC) slab structure, by using thermo-optic effect. The maximum extinction ratio was 22 dB, and the switching speed reached 200 /spl mu/s.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131451873","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2004-09-29DOI: 10.1109/GROUP4.2004.1416723
S. Matthias, F. Muller, R. Hillebrand, J. Schilling, U. Gosele
We show a general concept to structure standard silicon wafers with an almost perfect three-dimensional shape, which is versatile, accurate and fast. For characterisation we grow photonic crystals with a complete photonic bandgap.
{"title":"Three-dimensional silicon-based photonic crystals fabricated by electrochemical etching","authors":"S. Matthias, F. Muller, R. Hillebrand, J. Schilling, U. Gosele","doi":"10.1109/GROUP4.2004.1416723","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416723","url":null,"abstract":"We show a general concept to structure standard silicon wafers with an almost perfect three-dimensional shape, which is versatile, accurate and fast. For characterisation we grow photonic crystals with a complete photonic bandgap.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131378784","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2004-09-29DOI: 10.1109/GROUP4.2004.1416642
P. Dumon, W. Bogaerts, D. van Thourhout, D. Taillaert, V. Wiaux, S. Beckx, J. Wouters, R. Baets
We demonstrate both ring resonator drop filters and arrayed waveguide gratings in silicon-on-insulator photonic wires. The structures are fabricated in a CMOS line using deep UV lithography and dry etching processes. Waveguide losses are as low as 2.4 dB/cm for a 500 nm wide photonic wire, with excess bend losses of 0.03 dB/90/spl deg/ in a 3 /spl mu/m bend. Using grating fiber couplers for measurements, we show ring and racetrack resonators with a Q up to 12700 and an 8-channel arrayed waveguide grating with a footprint of about 0.1 mm/sup 2/, 3 nm channel spacing and -6 dB crosstalk between channels.
{"title":"Wavelength-selective components in SOI photonic wires fabricated with deep UV lithography","authors":"P. Dumon, W. Bogaerts, D. van Thourhout, D. Taillaert, V. Wiaux, S. Beckx, J. Wouters, R. Baets","doi":"10.1109/GROUP4.2004.1416642","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416642","url":null,"abstract":"We demonstrate both ring resonator drop filters and arrayed waveguide gratings in silicon-on-insulator photonic wires. The structures are fabricated in a CMOS line using deep UV lithography and dry etching processes. Waveguide losses are as low as 2.4 dB/cm for a 500 nm wide photonic wire, with excess bend losses of 0.03 dB/90/spl deg/ in a 3 /spl mu/m bend. Using grating fiber couplers for measurements, we show ring and racetrack resonators with a Q up to 12700 and an 8-channel arrayed waveguide grating with a footprint of about 0.1 mm/sup 2/, 3 nm channel spacing and -6 dB crosstalk between channels.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129199270","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2004-09-29DOI: 10.1109/GROUP4.2004.1416639
Chao Li, A. Poon
We propose an injection-type active silicon microring resonator using metal-oxide-semiconductor capacitors. Our simulations reveal a modulation bandwidth exceeding 2 GHz, a resonance shift of 0.5 nm, and an extinction ratio exceeding 20 dB.
{"title":"Active silicon microring resonators using metal-oxide-semiconductor capacitors","authors":"Chao Li, A. Poon","doi":"10.1109/GROUP4.2004.1416639","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416639","url":null,"abstract":"We propose an injection-type active silicon microring resonator using metal-oxide-semiconductor capacitors. Our simulations reveal a modulation bandwidth exceeding 2 GHz, a resonance shift of 0.5 nm, and an extinction ratio exceeding 20 dB.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"127 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122262560","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1900-01-01DOI: 10.1109/GROUP4.2004.1416720
G. Reed, S.P. Chan, W. Headley, V. Passaro, A. Liu, M. Paniccia
In silicon photonics, there is a trend to smaller device dimensions. This means that polarisation independent devices become more difficult to design and fabricate whilst maintaining monomode behaviour. By way of example we discuss a polarisation independent ring resonator.
{"title":"Polarisation independent devices in small SOI waveguides","authors":"G. Reed, S.P. Chan, W. Headley, V. Passaro, A. Liu, M. Paniccia","doi":"10.1109/GROUP4.2004.1416720","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416720","url":null,"abstract":"In silicon photonics, there is a trend to smaller device dimensions. This means that polarisation independent devices become more difficult to design and fabricate whilst maintaining monomode behaviour. By way of example we discuss a polarisation independent ring resonator.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130099976","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1900-01-01DOI: 10.1109/GROUP4.2004.1416684
S.P. Chan, C. Eng Png, T. Lim, G. Reed, V. Passaro
The conditions for single mode and zero birefringence for small and deeply etched SOI waveguides are presented and discussed. It is difficult to satisfy both conditions simultaneously.
提出并讨论了小型深刻蚀SOI波导单模零双折射的条件。同时满足这两个条件是很困难的。
{"title":"Single mode, polarisation independent waveguides in silicon-on-insulator","authors":"S.P. Chan, C. Eng Png, T. Lim, G. Reed, V. Passaro","doi":"10.1109/GROUP4.2004.1416684","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416684","url":null,"abstract":"The conditions for single mode and zero birefringence for small and deeply etched SOI waveguides are presented and discussed. It is difficult to satisfy both conditions simultaneously.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"144 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116419418","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1900-01-01DOI: 10.1109/GROUP4.2004.1416715
Wenhui Wang, Yanzhe Tang, Yirong Yang, Tie Li, Yaming Wu, Jianyi Yang, Yuelin Wang
In this paper, based on the inductively coupled plasma (ICP) etching and KOH wet etching techniques, the fabrication of integrated waveguide turning mirror (IWTMs) is presented.
本文介绍了基于电感耦合等离子体刻蚀和KOH湿刻蚀技术的集成波导旋转反射镜的制备方法。
{"title":"Fabrication of integrated waveguide turning mirror on silicon-on-insulator","authors":"Wenhui Wang, Yanzhe Tang, Yirong Yang, Tie Li, Yaming Wu, Jianyi Yang, Yuelin Wang","doi":"10.1109/GROUP4.2004.1416715","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416715","url":null,"abstract":"In this paper, based on the inductively coupled plasma (ICP) etching and KOH wet etching techniques, the fabrication of integrated waveguide turning mirror (IWTMs) is presented.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"151 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117203578","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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