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First IEEE International Conference on Group IV Photonics, 2004.最新文献

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Silicon-based waveguide-coupled planar photonic-crystal-embedded microcavities 硅基波导耦合平面光子晶体嵌入微腔
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416732
K. Tsia, A. Poon
We numerically simulate silicon-based waveguide-coupled planar square microcavities with embedded square lattice of air holes. Our two-dimensional finite-difference time-domain simulations reveal quasi-periodic high-Q resonances with frequencies limited within the first band of the photonic crystal.
本文对硅基波导耦合平面方形微腔进行了数值模拟。我们的二维时域有限差分模拟揭示了频率限制在光子晶体第一带内的准周期高q共振。
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引用次数: 2
Low temperature formation of /spl beta/--FeSi/sub 2/ polycrystalline by pulsed laser deposition and thermal annealing 脉冲激光沉积和热退火制备/spl β /—FeSi/sub - 2/多晶
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416675
H. Sugawara, S. Nakamura, M. Oouchi, Y. Kumura, T. Shishido, M. Kishi, M. Tsuchiya
Polycrystalline /spl beta/-FeSi/sub 2/ droplets were successfully formed by an exceptionally low temperature process: the room temperature pulsed laser deposition and a 350 /spl deg/C post-annealing. Their evidences have been derived by microscopic Raman spectroscopy and TEM observation.
通过室温脉冲激光沉积和350 /spl℃后退火,成功地形成了多晶/spl β /-FeSi/sub 2/液滴。通过显微拉曼光谱和透射电镜观察得到了它们的证据。
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引用次数: 0
Facet preparation of SOI waveguides by etching and cleaving compared to dicing and polishing 通过蚀刻和切割制备SOI波导的小面与切割和抛光的比较
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416657
M. Schnarrenberger, L. Zimmermann, T. Mitze, J. Bruns, K. Petermann
We compared two different techniques of facet preparation of silicon-on-insulator (SOI) waveguides: The conventional by dicing and polishing and our proposed by dry etching the facets and cleaving along anisotropically etched cleaving grooves.
我们比较了两种不同的制备绝缘体上硅(SOI)波导的工艺:传统的切割和抛光工艺,以及我们提出的沿各向异性刻蚀的刻蚀槽进行干刻蚀和切割的工艺。
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引用次数: 7
Silicon-based photonic bandgap modulators 硅基光子带隙调制器
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416725
S. Weiss, M. Haurylau, P. Fauchet
Silicon-based modulators are the missing link necessary for practical optical interconnects. Electrically and thermally tunable silicon-based photonic bandgap structures are demonstrated as building blocks for compact and low power out-of-plane and in-plane optical modulation.
硅基调制器是实际光互连所必需的缺失环节。电和热可调谐的硅基光子带隙结构被证明是紧凑和低功率的面外和光面内光调制的基石。
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引用次数: 1
Technology for ring resonator switches using electro-optic materials 使用电光材料的环形谐振器开关技术
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416640
Y. Tanushi, M. Wake, K. Wakushima, K. Suzuki, S. Yokoyama
Ring resonator switches using electro-optic materials on Si LSI are proposed and the operation voltages are simulated. Fabrication technologies for the resonators are developed. Light propagation in the optical waveguide using electro-optic material is confirmed.
提出了一种基于硅基大规模集成电路的电光材料环形谐振器开关,并对其工作电压进行了仿真。研究了谐振腔的制造技术。利用电光材料证实了光在光波导中的传播。
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引用次数: 1
Doping density dependence of 4f-4f couplings between Er and Yb ions in nanocrystalline Si 纳米晶Si中Er和Yb离子之间4f-4f耦合的掺杂密度依赖性
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416664
Xinwei Zhao, K. Kohno, S. Harako, N. Takahashi, S. Komuro
This paper presents the formation and time-resolved investigation of Er and Yb co-doped nc-Si thin films. Since the energy of the only one excited state /sup 2/F/sub 5/2/ of a Yb/sup 3+/ ion is almost same to that of the second excited state /sup 4/I/sub 11/2/ of an Er/sup 3-/ ion, the optical transition between them is expected to raise the excitation rate of the Er/sup 3+/ ion.
本文介绍了铒镱共掺杂纳米硅薄膜的形成和时间分辨研究。由于Yb/sup 3+/离子的唯一激发态/sup 2/F/sub 5/2/的能量与Er/sup 3-/离子的第二激发态/sup 4/I/sub 11/2/的能量几乎相同,因此它们之间的光跃迁有望提高Er/sup 3+/离子的激发速率。
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引用次数: 0
Advances in dispersion-based silicon photonic-crystal physics, devices and fabrication 基于色散的硅光子晶体物理、器件和制造的进展
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416728
D. Prather
In this work we present and experimentally validate self-collimation in planar photonic crystals (PhC) as a means to achieve defect-free confinement of light in PhC devices. We demonstrate the ability to arbitrarily guide and route light by exploiting the dispersive characteristics of the photonic crystal. Propagation loss as low as 2.17 dB/mm is measured, and experimental validation of routing structures is presented.
在这项工作中,我们提出并实验验证了平面光子晶体(PhC)中的自准直作为在PhC器件中实现无缺陷光约束的一种手段。我们证明了利用光子晶体的色散特性来任意引导和路由光的能力。测量到的传输损耗低至2.17 dB/mm,并对路由结构进行了实验验证。
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引用次数: 0
1.5 /spl mu/m PL fine structures and their extreme fast decay of crystalline ErSiO compounds 1.5 /spl mu/m PL精细结构及其晶体ErSiO化合物的极快衰变
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416739
H. Isshiki, K. Masaki, K. Ueda, R. Saito, T. Kimura
Er-related 1.5 /spl mu/m emissions with linewidth of less than 1 meV and 10 /spl mu/s lifetime have been observed in crystalline ErSiO superstructures.
在晶体ErSiO上层结构中观察到与er相关的1.5 /spl mu/m发射,线宽小于1 meV,寿命小于10 /spl mu/s。
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引用次数: 0
New solar cells using Ge dots embedded in Si PIN structures 在Si PIN结构中嵌入Ge点的新型太阳能电池
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416698
N. Usami, A. Arnold, K. Fujiwara, K. Nakjima, T. Yokoyama, Y. Shiraki
Stacked Ge dots are embedded in the intrinsic layer of Si-based PIN solar cells to improve the device performance. Relationship between structural parameters and photovoltaic properties is discussed through systematic variation of the repetition number of stacked Ge dots and Si spacer width to separate Ge dots.
在硅基PIN太阳能电池的本构层中嵌入堆叠的Ge点,以提高器件性能。通过系统地改变堆叠Ge点的重复次数和分离Ge点的Si间隔宽度,讨论了结构参数与光伏性能之间的关系。
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引用次数: 1
Silicon-on-insulator (SOI): a path to high-density silicon optoelectronics? 绝缘体上硅(SOI):通向高密度硅光电子的道路?
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416713
Martin A. Green
With the greatly enhanced light-emission efficiencies in bulk silicon light emitting diodes (LEDs), they have investigated prospects for applying these improvements to the co-integration of optical and electronic functions into silicon-based microelectronics. One mitigating factor is the perceived need for microelectronics to move to SOI to maintain present rates of progress, with benefits for ultra-thin Si layers. For further investigation, optical properties of ultra-thin SOI are studied.
随着体硅发光二极管(led)的发光效率大大提高,他们研究了将这些改进应用于硅基微电子光学和电子功能协整的前景。一个缓解因素是微电子技术需要转移到SOI以保持目前的进展速度,这对超薄硅层有利。为了进一步研究超薄SOI材料的光学特性。
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引用次数: 1
期刊
First IEEE International Conference on Group IV Photonics, 2004.
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