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First IEEE International Conference on Group IV Photonics, 2004.最新文献

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Strain of the micro-sized cone-shape GeSi alloy film determined by Raman scattering 用拉曼散射测定微尺寸锥形GeSi合金薄膜的应变
Pub Date : 2004-12-01 DOI: 10.1109/GROUP4.2004.1416680
C. Chia, L.J. Chen, V. Mashanov, H. Cheng
We present the micro-Raman study of curved Ge/sub x/Si/sub 1-x//Ge/sub y/Si/sub 1-y/ heterostructure, and found the strain of the curved thin layer is proportional to the curvature, i.e. inversely proportional to the diameter.
对弯曲的Ge/sub x/Si/sub 1-x//Ge/sub y/Si/sub 1-y异质结构进行了微观拉曼研究,发现弯曲薄层的应变与曲率成正比,即与直径成反比。
{"title":"Strain of the micro-sized cone-shape GeSi alloy film determined by Raman scattering","authors":"C. Chia, L.J. Chen, V. Mashanov, H. Cheng","doi":"10.1109/GROUP4.2004.1416680","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416680","url":null,"abstract":"We present the micro-Raman study of curved Ge/sub x/Si/sub 1-x//Ge/sub y/Si/sub 1-y/ heterostructure, and found the strain of the curved thin layer is proportional to the curvature, i.e. inversely proportional to the diameter.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"36 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122927924","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
New IR semiconductors in the Si-Ge-Sn system Si-Ge-Sn体系中的新型红外半导体
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416651
J. Kouvetakis, J. Tolle, J. Menéndez
We will discuss CVD growth, characterization and properties of novel Ge/sub 1-z/Sn/sub z//Ge/sub 1-x-y/Si/sub x/Sn/sub y/ heterostructures on Si(100). The Ge/sub 1-x-y/Si/sub x/Sn/sub y/ system provides independent strain and bandgap engineering to achieve structures that may lead to novel photonic group-IV devices.
我们将讨论新型Ge/sub - 1-z/Sn/sub -z/ /Ge/sub - 1-x-y/Si/sub x/Sn/sub y异质结构在Si(100)上的CVD生长、表征和性质。Ge/sub 1-x-y/Si/sub x/Sn/sub y/系统提供了独立的应变和带隙工程,以实现可能导致新型光子群iv器件的结构。
{"title":"New IR semiconductors in the Si-Ge-Sn system","authors":"J. Kouvetakis, J. Tolle, J. Menéndez","doi":"10.1109/GROUP4.2004.1416651","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416651","url":null,"abstract":"We will discuss CVD growth, characterization and properties of novel Ge/sub 1-z/Sn/sub z//Ge/sub 1-x-y/Si/sub x/Sn/sub y/ heterostructures on Si(100). The Ge/sub 1-x-y/Si/sub x/Sn/sub y/ system provides independent strain and bandgap engineering to achieve structures that may lead to novel photonic group-IV devices.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"74 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129141218","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Terahertz emitting devices based on dopant transitions in silicon 基于硅掺杂跃迁的太赫兹发射装置
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416645
J. Kolodzey, P. Lv, R. Troeger, S. Kim
This study proposes a different approach of much simpler THz emitters based on radiative impurity transitions in doped silicon devices fabricated without Ge alloying. This work has gathered the electroluminescence at 4.2 K from a boron doped sample. The current versus voltage characteristics are measured at the same pulse conditions using an inductive probe and oscilloscope.
本研究提出了一种基于不含锗合金的掺杂硅器件的辐射杂质跃迁的更简单的太赫兹发射器的不同方法。本工作收集了掺硼样品在4.2 K时的电致发光。在相同的脉冲条件下,使用电感探头和示波器测量电流与电压的特性。
{"title":"Terahertz emitting devices based on dopant transitions in silicon","authors":"J. Kolodzey, P. Lv, R. Troeger, S. Kim","doi":"10.1109/GROUP4.2004.1416645","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416645","url":null,"abstract":"This study proposes a different approach of much simpler THz emitters based on radiative impurity transitions in doped silicon devices fabricated without Ge alloying. This work has gathered the electroluminescence at 4.2 K from a boron doped sample. The current versus voltage characteristics are measured at the same pulse conditions using an inductive probe and oscilloscope.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"87 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132755008","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Controlling light on a microelectronics' chip: solving the coupling, modulation and switching challenges 微电子芯片上的光控制:解决耦合、调制和开关挑战
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416638
M. Lipson
This paper discusses the state of the art as well as the approach for light coupling, switching and modulating on Si. These results are based on sub-micron highly confined structures. It is primarily this principle, of manipulating light by confinement, that has enabled light control and coupling on silicon using ultra-compact structures.
本文讨论了硅上光耦合、开关和调制的技术现状和方法。这些结果是基于亚微米高度受限的结构。正是这种通过约束来操纵光的原理,使得超紧凑结构的硅上的光控制和耦合成为可能。
{"title":"Controlling light on a microelectronics' chip: solving the coupling, modulation and switching challenges","authors":"M. Lipson","doi":"10.1109/GROUP4.2004.1416638","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416638","url":null,"abstract":"This paper discusses the state of the art as well as the approach for light coupling, switching and modulating on Si. These results are based on sub-micron highly confined structures. It is primarily this principle, of manipulating light by confinement, that has enabled light control and coupling on silicon using ultra-compact structures.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115403543","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Growth mechanism of GeSi quantum rings on Si [001] GeSi量子环在Si上的生长机理[001]
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416655
J. Cui, F. Xue, J. Qin, Y. L. Fan, X.J. Yang, Z. Jiang
This study performs experiments on ultrathin Si capping on Ge quantum dots at varying growth temperature to clarify the growth details of GeSi quantum rings on Si [001]. Results show that at a lower temperature of 400/spl deg/C with several angstroms thick Si capping, the shape of dots remains domed, but at a higher temperature of 640/spl deg/C, the shape changes from dome to pyramid. This phenomenon shows that the shape transition is highly dependent on temperature and Ge atom diffusion and Ge atom segregation play an important role in quantum ring formation. This is confirmed by the results of grazing incidence X-ray diffraction.
本研究在不同生长温度下对Ge量子点进行超薄硅盖层实验,以阐明Ge量子环在Si上的生长细节[001]。结果表明,在较低的温度400/spl℃下,加上几埃厚的Si盖层,圆点的形状仍为圆顶状,而在较高的温度640/spl℃下,圆点的形状由圆顶变为金字塔状。这一现象表明,形状转变高度依赖于温度,Ge原子的扩散和偏析在量子环的形成中起着重要作用。掠入射x射线衍射的结果证实了这一点。
{"title":"Growth mechanism of GeSi quantum rings on Si [001]","authors":"J. Cui, F. Xue, J. Qin, Y. L. Fan, X.J. Yang, Z. Jiang","doi":"10.1109/GROUP4.2004.1416655","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416655","url":null,"abstract":"This study performs experiments on ultrathin Si capping on Ge quantum dots at varying growth temperature to clarify the growth details of GeSi quantum rings on Si [001]. Results show that at a lower temperature of 400/spl deg/C with several angstroms thick Si capping, the shape of dots remains domed, but at a higher temperature of 640/spl deg/C, the shape changes from dome to pyramid. This phenomenon shows that the shape transition is highly dependent on temperature and Ge atom diffusion and Ge atom segregation play an important role in quantum ring formation. This is confirmed by the results of grazing incidence X-ray diffraction.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"250 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114464305","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Towards CMOS-compatible, solution-processed quantum dot nanocrystal optical sources, modulators, detectors, and optical signal processing elements across the extended communications band 1200-1700 nm 面向兼容cmos、溶液处理的量子点纳米晶体光源、调制器、探测器和扩展通信波段1200-1700 nm的光信号处理元件
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416650
E. Sargent
We review devices, fabricated using room-temperature solution spin-casting compatible with silicon post-processing, which produce, detect, modulate, and process optical signals in the spectral range from 1200-1700 nm. We first summarize the synthesis of PbS (lead sulphide) quantum dot nanocrystals 2-10 nm in diameter by solution chemistry. We then discusses the realization to date of solution-processed, silicon-compatible thin-film devices fabricated using these materials.
我们回顾了使用室温溶液自旋铸造与硅后处理兼容的器件,这些器件产生、检测、调制和处理光谱范围为1200-1700 nm的光信号。本文首先综述了用溶液化学方法合成直径为2 ~ 10 nm的PbS(硫化铅)量子点纳米晶体。然后,我们讨论了迄今为止使用这些材料制造的溶液加工、硅兼容薄膜器件的实现。
{"title":"Towards CMOS-compatible, solution-processed quantum dot nanocrystal optical sources, modulators, detectors, and optical signal processing elements across the extended communications band 1200-1700 nm","authors":"E. Sargent","doi":"10.1109/GROUP4.2004.1416650","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416650","url":null,"abstract":"We review devices, fabricated using room-temperature solution spin-casting compatible with silicon post-processing, which produce, detect, modulate, and process optical signals in the spectral range from 1200-1700 nm. We first summarize the synthesis of PbS (lead sulphide) quantum dot nanocrystals 2-10 nm in diameter by solution chemistry. We then discusses the realization to date of solution-processed, silicon-compatible thin-film devices fabricated using these materials.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"78 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128597248","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Silicon-based rare earth-doped materials and devices grown by MBE MBE制备的硅基稀土掺杂材料和器件
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416734
P. Chow, Jian-Xin Dong, S. Zaytsev, A. Osinsky, B. Hertog
Fabrication of Er doped materials deposited on silicon into LED is demonstrated. A strong infrared luminescence is observed at 1540 nm wavelength region. They also have potential applications for planar optical communication.
演示了在硅上沉积掺铒材料制备LED的方法。在1540nm波长区域有较强的红外发光。它们在平面光通信中也有潜在的应用。
{"title":"Silicon-based rare earth-doped materials and devices grown by MBE","authors":"P. Chow, Jian-Xin Dong, S. Zaytsev, A. Osinsky, B. Hertog","doi":"10.1109/GROUP4.2004.1416734","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416734","url":null,"abstract":"Fabrication of Er doped materials deposited on silicon into LED is demonstrated. A strong infrared luminescence is observed at 1540 nm wavelength region. They also have potential applications for planar optical communication.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"67 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123015836","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
470 nm LED-pumped optical waveguide amplifier based on nanocrystal-Si sensitized, Er-doped silica 基于纳米晶硅敏化掺铒二氧化硅的470nm led泵浦光波导放大器
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416736
Jinku Lee, J. Shin, N. Park
We demonstrate optical gain at 1.5 /spl mu/m in Si nanocrystal-sensitized, Er-doped silica waveguide using a commercial, low-cost 470 nm LED array in top-pumping configuration. Experimental evidence of full inversion with maximum possible gain of 3 dB/cm is presented.
我们展示了在1.5 /spl mu/m的硅纳米晶体敏化,掺铒硅波导中使用商业,低成本,顶部泵浦配置的470nm LED阵列的光学增益。给出了最大增益为3 dB/cm的全反转的实验证据。
{"title":"470 nm LED-pumped optical waveguide amplifier based on nanocrystal-Si sensitized, Er-doped silica","authors":"Jinku Lee, J. Shin, N. Park","doi":"10.1109/GROUP4.2004.1416736","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416736","url":null,"abstract":"We demonstrate optical gain at 1.5 /spl mu/m in Si nanocrystal-sensitized, Er-doped silica waveguide using a commercial, low-cost 470 nm LED array in top-pumping configuration. Experimental evidence of full inversion with maximum possible gain of 3 dB/cm is presented.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114188594","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
A new and simple concept for self-aligned hybrid integration in silicon on insulator (SOI) 一种新的简单的自对准绝缘体上硅(SOI)混合集成概念
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416719
T. Mitze, M. Schnarrenberger, L. Zimmermann, J. Bruns, F. Fidorra, F. Kreissl, K. Janiak, H. Heidrich, K. Petermann
A concept for a SOI motherboard is introduced. AuSn solder technology is used for hybrid integration. The device adjustment on the board is realised by passive self-alignment. First results on fabricated boards are very encouraging.
介绍了SOI主板的概念。AuSn焊料技术用于混合集成。板上的器件调整是通过无源自对准实现的。初步结果是非常令人鼓舞的。
{"title":"A new and simple concept for self-aligned hybrid integration in silicon on insulator (SOI)","authors":"T. Mitze, M. Schnarrenberger, L. Zimmermann, J. Bruns, F. Fidorra, F. Kreissl, K. Janiak, H. Heidrich, K. Petermann","doi":"10.1109/GROUP4.2004.1416719","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416719","url":null,"abstract":"A concept for a SOI motherboard is introduced. AuSn solder technology is used for hybrid integration. The device adjustment on the board is realised by passive self-alignment. First results on fabricated boards are very encouraging.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"67 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122404963","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Fabrication of low cost Si-based tunable high performance resonant cavity enhanced photodetectors 低成本硅基可调谐高性能谐振腔增强光电探测器的制备
Pub Date : 2004-09-29 DOI: 10.1109/GROUP4.2004.1416677
R. Mao, C.B. Li, Y. Zuo, B. Cheng, X. Teng, L. Luo, J.Z. Yu, Q.M. Wang
Low cost Si-based tunable InGaAs RCE photodetectors operating at 1.3/spl sim/1.6 /spl mu/m were fabricated using sol-gel bonding. A tuning range of 14.5 nm, a quantum efficiency of 44% at 1476 nm and a 3-dB bandwidth of 1.8 GHz were obtained.
采用溶胶-凝胶键合的方法制备了低成本的硅基可调谐InGaAs RCE光电探测器,工作频率为1.3/spl sim/1.6 /spl mu/m。调谐范围为14.5 nm,在1476 nm处量子效率为44%,3db带宽为1.8 GHz。
{"title":"Fabrication of low cost Si-based tunable high performance resonant cavity enhanced photodetectors","authors":"R. Mao, C.B. Li, Y. Zuo, B. Cheng, X. Teng, L. Luo, J.Z. Yu, Q.M. Wang","doi":"10.1109/GROUP4.2004.1416677","DOIUrl":"https://doi.org/10.1109/GROUP4.2004.1416677","url":null,"abstract":"Low cost Si-based tunable InGaAs RCE photodetectors operating at 1.3/spl sim/1.6 /spl mu/m were fabricated using sol-gel bonding. A tuning range of 14.5 nm, a quantum efficiency of 44% at 1476 nm and a 3-dB bandwidth of 1.8 GHz were obtained.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2004-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114100855","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
期刊
First IEEE International Conference on Group IV Photonics, 2004.
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