Pub Date : 1996-04-26DOI: 10.1364/domo.1996.jtub.15
S. Dixit, M. Feit
In laser driven inertial confinement fusion systems, it is desirable to produce smooth focal plane intensity profiles [1]. Traditionally, binary random phase plates (RPPs) have been used to produce a focal plane irradiance profile which consists of a smooth Airy function shaped envelope and a superimposed fine scale speckle pattern. The speckle is smoothed by conduction smoothing in the laser produced plasma and/or by externally imposed temporal smoothing methods. Although easy to fabricate and use, the RPPs have very limited flexibility in producing arbitrary shaped irradiance profiles. In addition, the secondary maxima of the Airy profile lead to a 15% loss of the energy from the desired region in the focal plane. This loss of the laser energy requires the operation of the fusion lasers at higher energies thereby increasing their cost of operation. Additionally the scattered energy could also cause optical damage to detection equipment near the target.
{"title":"Synthesis of fully continuous phase screens for tailoring the focal plane irradiance profiles","authors":"S. Dixit, M. Feit","doi":"10.1364/domo.1996.jtub.15","DOIUrl":"https://doi.org/10.1364/domo.1996.jtub.15","url":null,"abstract":"In laser driven inertial confinement fusion systems, it is desirable to produce smooth focal plane intensity profiles [1]. Traditionally, binary random phase plates (RPPs) have been used to produce a focal plane irradiance profile which consists of a smooth Airy function shaped envelope and a superimposed fine scale speckle pattern. The speckle is smoothed by conduction smoothing in the laser produced plasma and/or by externally imposed temporal smoothing methods. Although easy to fabricate and use, the RPPs have very limited flexibility in producing arbitrary shaped irradiance profiles. In addition, the secondary maxima of the Airy profile lead to a 15% loss of the energy from the desired region in the focal plane. This loss of the laser energy requires the operation of the fusion lasers at higher energies thereby increasing their cost of operation. Additionally the scattered energy could also cause optical damage to detection equipment near the target.","PeriodicalId":301804,"journal":{"name":"Diffractive Optics and Micro-Optics","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-04-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128134580","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
H. Nguyen, J. Britten, R. Boyd, B. Shore, M. Perry
During efforts to produce multilayer high efficiency dielectric reflection gratings in oxides, 351nm high efficiency transmission gratings, and other development work, we required very high-contrast grating profiles in photoresist. High-contrast profiles are profiles with very steep sidewalls, greater than 80 degrees. It is quite difficult to achieve high-contrast profiles using interference lithography. The electric field distribution is sinusoidal. Therefore, one would conclude that the profile would resemble a sinusoid, as shown in Figure 1a. Early work with interference lithography produced grating profiles similar to the ones shown in Figure 1a.1-3 We have learned that if great care is taken in the processing steps, very different profiles can be achieved. Figure 1b shows a very high-contrast, high-aspect ratio grating profile in photoresist. The difference between Figure 1a and Figure lb is that 1) the photoresist profile in Figure lb has completely developed through to the substrate, and 2) the contrast characteristics of the photoresist used in Figure 1b are superior over the photoresist used in Figure 1a.
{"title":"Ultrahigh Spatial-Frequency, High-Contrast Periodic Structures Produced by Interference Lithography","authors":"H. Nguyen, J. Britten, R. Boyd, B. Shore, M. Perry","doi":"10.2172/489588","DOIUrl":"https://doi.org/10.2172/489588","url":null,"abstract":"During efforts to produce multilayer high efficiency dielectric reflection gratings in oxides, 351nm high efficiency transmission gratings, and other development work, we required very high-contrast grating profiles in photoresist. High-contrast profiles are profiles with very steep sidewalls, greater than 80 degrees. It is quite difficult to achieve high-contrast profiles using interference lithography. The electric field distribution is sinusoidal. Therefore, one would conclude that the profile would resemble a sinusoid, as shown in Figure 1a. Early work with interference lithography produced grating profiles similar to the ones shown in Figure 1a.1-3 We have learned that if great care is taken in the processing steps, very different profiles can be achieved. Figure 1b shows a very high-contrast, high-aspect ratio grating profile in photoresist. The difference between Figure 1a and Figure lb is that 1) the photoresist profile in Figure lb has completely developed through to the substrate, and 2) the contrast characteristics of the photoresist used in Figure 1b are superior over the photoresist used in Figure 1a.","PeriodicalId":301804,"journal":{"name":"Diffractive Optics and Micro-Optics","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131404494","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Several methods exists to analyze grating diffraction problems by solving rigorously Maxwell's In some circumstances, all these methods suffer from some numerical instabilities and difficulties. We focus on a method originally derived from the integral method, namely the coupled-wave method (RCWA) formulated by Moharam and Gaylord1. This method is known to be slowly converging especially for TM polarization of metallic lamellar gratings. The slow convergence-rate has been analyzed in detail by Li and Haggans2. In this paper, we provide numerical evidence that the coupled-wave method is slowly converging for conical mounts of one-dimensional metallic grating. By reformulating the eigenproblem of the coupled-wave method, we provide numerical evidence that highly improved convergence-rates similar to the TE polarization case can be obtained for conical mounts. Of course, this result can be applied to the case of TM polarization for non-conical mounting, which is a particular case of the general conical mounting diffraction problem. We reveal that the origin of the slow convergence in the original RCWA method is not due to the use of Fourier expansions (as was argued by Li and Haggans), but to an inadequate formulation of the eigenproblem.
{"title":"Highly improved convergence of the coupled-wave method for TM polarization and conical mountings","authors":"P. Lalanne, G. Morris","doi":"10.1364/JOSAA.13.000779","DOIUrl":"https://doi.org/10.1364/JOSAA.13.000779","url":null,"abstract":"Several methods exists to analyze grating diffraction problems by solving rigorously Maxwell's In some circumstances, all these methods suffer from some numerical instabilities and difficulties. We focus on a method originally derived from the integral method, namely the coupled-wave method (RCWA) formulated by Moharam and Gaylord1. This method is known to be slowly converging especially for TM polarization of metallic lamellar gratings. The slow convergence-rate has been analyzed in detail by Li and Haggans2. In this paper, we provide numerical evidence that the coupled-wave method is slowly converging for conical mounts of one-dimensional metallic grating. By reformulating the eigenproblem of the coupled-wave method, we provide numerical evidence that highly improved convergence-rates similar to the TE polarization case can be obtained for conical mounts. Of course, this result can be applied to the case of TM polarization for non-conical mounting, which is a particular case of the general conical mounting diffraction problem. We reveal that the origin of the slow convergence in the original RCWA method is not due to the use of Fourier expansions (as was argued by Li and Haggans), but to an inadequate formulation of the eigenproblem.","PeriodicalId":301804,"journal":{"name":"Diffractive Optics and Micro-Optics","volume":"44 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124542868","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Hoang T. Nguyen, B. Shore, J. Britten, S. Bryan, S. Falabella, R. Boyd, Perry
High power ultraviolet lasers are now widely used in the semiconductor industry and inertial confinement fusion research, and are finding increased application in medical therapy. Whether based on excimers or frequency converted solid-state, high power ultraviolet lasers continue to be plagued by issues of optical damage and a limited choice of optical components for beam manipulation. In particular, system performance is often limited by the damage threshold of cavity and transport mirrors. Beam transport and steering based on refractive optics are limited not by surface damage as is the case with reflective systems but instead by bulk damage induced by two photon absorption, color center formation and self-focusing. These limitations can, in principle, be overcome in many applications by the use of transmission gratings fabricated in high damage threshold, transparent materials.
{"title":"High-Efficiency Transmission Gratings Fabricated in Bulk Fused Silica","authors":"Hoang T. Nguyen, B. Shore, J. Britten, S. Bryan, S. Falabella, R. Boyd, Perry","doi":"10.2172/231695","DOIUrl":"https://doi.org/10.2172/231695","url":null,"abstract":"High power ultraviolet lasers are now widely used in the semiconductor industry and inertial confinement fusion research, and are finding increased application in medical therapy. Whether based on excimers or frequency converted solid-state, high power ultraviolet lasers continue to be plagued by issues of optical damage and a limited choice of optical components for beam manipulation. In particular, system performance is often limited by the damage threshold of cavity and transport mirrors. Beam transport and steering based on refractive optics are limited not by surface damage as is the case with reflective systems but instead by bulk damage induced by two photon absorption, color center formation and self-focusing. These limitations can, in principle, be overcome in many applications by the use of transmission gratings fabricated in high damage threshold, transparent materials.","PeriodicalId":301804,"journal":{"name":"Diffractive Optics and Micro-Optics","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126599413","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1996-02-01DOI: 10.1364/domo.1996.jtub.20
Y. Sohn, C. Kwak, O. S. Choe
Z-scan technique is very useful method for measuring the magnitude and the sign of the nonlinear refractive index due to its simple geometry and high sensitivity compared with nonlinear interferometry, degenerate four-wave mixing, nearly degenerate three-wave mixing, ellipse rotation, beam distortion measurement.[1, 2] With this technique the measurements and analysis for several nonlinear optical materials such as CS2, ZnSe, GaAs, CdTe had been succesfully acomplished by using high power pulse laser.[1-3] In this paper, we present a cw pump-probe z-scan method for determining the optical nonlinearity of an amorphous As2S3 thin film. In an amorphous chalcogenide As2S3, thin film the optical nonlinearity originates from the photostructural changes of the material by band gap illumination (bandgap energy of Eg ≃ 2.5eV corresponding to Ar-ion laser wavelength of 514nm), which results in photodarkening and photoanisotropy. These effects have been extensively investigated as holographic recording medium for optical information processing, polarization hologram and binary phase gratings such as Dammann grating.[4-6]
{"title":"Z-Scan Measurement in Amorphous As2S3 Thin Film","authors":"Y. Sohn, C. Kwak, O. S. Choe","doi":"10.1364/domo.1996.jtub.20","DOIUrl":"https://doi.org/10.1364/domo.1996.jtub.20","url":null,"abstract":"Z-scan technique is very useful method for measuring the magnitude and the sign of the nonlinear refractive index due to its simple geometry and high sensitivity compared with nonlinear interferometry, degenerate four-wave mixing, nearly degenerate three-wave mixing, ellipse rotation, beam distortion measurement.[1, 2] With this technique the measurements and analysis for several nonlinear optical materials such as CS2, ZnSe, GaAs, CdTe had been succesfully acomplished by using high power pulse laser.[1-3] In this paper, we present a cw pump-probe z-scan method for determining the optical nonlinearity of an amorphous As2S3 thin film. In an amorphous chalcogenide As2S3, thin film the optical nonlinearity originates from the photostructural changes of the material by band gap illumination (bandgap energy of Eg ≃ 2.5eV corresponding to Ar-ion laser wavelength of 514nm), which results in photodarkening and photoanisotropy. These effects have been extensively investigated as holographic recording medium for optical information processing, polarization hologram and binary phase gratings such as Dammann grating.[4-6]","PeriodicalId":301804,"journal":{"name":"Diffractive Optics and Micro-Optics","volume":"89 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116850044","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
R. Pierson, K. Bishop, E. Chen, D. Neal, L. McMackin
Since etched microlenses are produced by digital technology, it is inherently easy to fabricate optics customized for a particular application. However, optimization of wavefront sensors requires an ability to predict their complex behavior. In previous work,1,2 we demonstrated binary microlens arrays for wavefront sensing in a visible wavelength tomographic imaging system. An eight-view tomographic system based on microlens array sensors is now operational and is described in a separate paper at this conference.3 The current paper addresses error budgeting and optimal design for wavefront sensors; it describes modeling and test procedures and illustrates one design approach.
{"title":"Evaluation of Wavefront Sensors Based on Etched Microlenses","authors":"R. Pierson, K. Bishop, E. Chen, D. Neal, L. McMackin","doi":"10.2172/211312","DOIUrl":"https://doi.org/10.2172/211312","url":null,"abstract":"Since etched microlenses are produced by digital technology, it is inherently easy to fabricate optics customized for a particular application. However, optimization of wavefront sensors requires an ability to predict their complex behavior. In previous work,1,2 we demonstrated binary microlens arrays for wavefront sensing in a visible wavelength tomographic imaging system. An eight-view tomographic system based on microlens array sensors is now operational and is described in a separate paper at this conference.3 The current paper addresses error budgeting and optimal design for wavefront sensors; it describes modeling and test procedures and illustrates one design approach.","PeriodicalId":301804,"journal":{"name":"Diffractive Optics and Micro-Optics","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125179701","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Color discrimination by wavelength bands has a large number of military and commercial applications. In the infrared portion of the spectrum, wavelength separation allows better temperature discrimination of thermally emissive objects. [1] In the visible portion of the spectrum, a device which separates white light into red, green, and blue wavebands without loss of energy could increase the efficiency of color sensors. An echelon-like grating structure [2,3] separates electromagnetic radiation of different wavelengths according to diffraction order rather than by dispersion within one diffraction order as would be the case for a conventional prism-type grating, as shown schematically in Figure 1.
{"title":"Color Separation Echelon Gratings","authors":"M. Stern, G. Swanson","doi":"10.1364/domo.1996.dwb.2","DOIUrl":"https://doi.org/10.1364/domo.1996.dwb.2","url":null,"abstract":"Color discrimination by wavelength bands has a large number of military and commercial applications. In the infrared portion of the spectrum, wavelength separation allows better temperature discrimination of thermally emissive objects. [1] In the visible portion of the spectrum, a device which separates white light into red, green, and blue wavebands without loss of energy could increase the efficiency of color sensors. An echelon-like grating structure [2,3] separates electromagnetic radiation of different wavelengths according to diffraction order rather than by dispersion within one diffraction order as would be the case for a conventional prism-type grating, as shown schematically in Figure 1.","PeriodicalId":301804,"journal":{"name":"Diffractive Optics and Micro-Optics","volume":"13 6A 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115346049","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A holographic optical element (HOE) is a kind of diffractive optical element. An HOE can substitute an optical system with multiple optical components like lenses, mirrors, beam-splitters, prisms and so on. So it is expected to reduce the number of its optical parts, improve a performance of various optical systems, such as optical storage systems[1] like CD or DVD systems, optical instrumentations, fiber optics and etc., and make an optical system simple, small and light weighted.
{"title":"Fabrication of blazed holographic optical elements on oxygen free copper by ultrahigh precision cutting","authors":"S. Morita, Y. Yamagata, T. Higuchi","doi":"10.1364/domo.1998.dwd.4","DOIUrl":"https://doi.org/10.1364/domo.1998.dwd.4","url":null,"abstract":"A holographic optical element (HOE) is a kind of diffractive optical element. An HOE can substitute an optical system with multiple optical components like lenses, mirrors, beam-splitters, prisms and so on. So it is expected to reduce the number of its optical parts, improve a performance of various optical systems, such as optical storage systems[1] like CD or DVD systems, optical instrumentations, fiber optics and etc., and make an optical system simple, small and light weighted.","PeriodicalId":301804,"journal":{"name":"Diffractive Optics and Micro-Optics","volume":"51 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117169718","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1900-01-01DOI: 10.1364/domo.1996.jtub.27
Y. Wang, M. Fiddy, Y. Teng, D. Pommet, L. Malley
A hologram on which an interference pattern is recorded, appears transparent after exposure, developing and bleaching. However, these types of holographic transparencies are found to have both some periodic variations of optical density and surface relief when measured using microdensitometer and profilometer. We refer to this kind of holographic grating as a compound hologram, i.e. it contains variations in both amplitude and phase.
{"title":"Measurement and Analysis of Compound Amplitude and Phase Holographic Gratings","authors":"Y. Wang, M. Fiddy, Y. Teng, D. Pommet, L. Malley","doi":"10.1364/domo.1996.jtub.27","DOIUrl":"https://doi.org/10.1364/domo.1996.jtub.27","url":null,"abstract":"A hologram on which an interference pattern is recorded, appears transparent after exposure, developing and bleaching. However, these types of holographic transparencies are found to have both some periodic variations of optical density and surface relief when measured using microdensitometer and profilometer. We refer to this kind of holographic grating as a compound hologram, i.e. it contains variations in both amplitude and phase.","PeriodicalId":301804,"journal":{"name":"Diffractive Optics and Micro-Optics","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122747537","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Optical interconnections have been shown to have advantages over electrical interconnections in terms of speed, energy, and density for global links1. In addition, the flexibility of optical interconnections permits efficient electronic layouts that can improve the performance of electrical connections in an opto-electronic computing system. Optical interconnections systems are currently a very active area of research2,3,4,5. These systems typically combine electronic circuits, opto-electronic transmitters and receivers, and optical elements. Electronic circuits are usually designed, optimized, and fabricated using standard VLSI technology. Many technologies are available for opto-electronic transmitters and receivers; in our case, we will use either Si/PLZT6,7 or Si/MQW8 technologies. Similarly, there is a wide choice of technologies available for the optical elements in the system. In this paper we first present some results on diffractive elements for Free-Space Interconnection systems fabricated using e-beam direct write technology. Then we discuss the design and optimization of the diffractive elements used in a particular free-space optical interconnection scheme: the optical transpose interconnection system (OTIS); where we have used CodeV®9 optical system design software package to design and optimize several different systems based on both refractive and diffractive micro-optic technologies. In addition, we have explored the possibility of using a volume holographic element to replace the need for a polarizing beam splitter in the system.
{"title":"Diffractive Optics in Free-Space OptoElectronic Computing Systems","authors":"P. Marchand, F. Mccormick, S. Esener","doi":"10.1364/domo.1996.dmd.1","DOIUrl":"https://doi.org/10.1364/domo.1996.dmd.1","url":null,"abstract":"Optical interconnections have been shown to have advantages over electrical interconnections in terms of speed, energy, and density for global links1. In addition, the flexibility of optical interconnections permits efficient electronic layouts that can improve the performance of electrical connections in an opto-electronic computing system. Optical interconnections systems are currently a very active area of research2,3,4,5. These systems typically combine electronic circuits, opto-electronic transmitters and receivers, and optical elements. Electronic circuits are usually designed, optimized, and fabricated using standard VLSI technology. Many technologies are available for opto-electronic transmitters and receivers; in our case, we will use either Si/PLZT6,7 or Si/MQW8 technologies. Similarly, there is a wide choice of technologies available for the optical elements in the system. In this paper we first present some results on diffractive elements for Free-Space Interconnection systems fabricated using e-beam direct write technology. Then we discuss the design and optimization of the diffractive elements used in a particular free-space optical interconnection scheme: the optical transpose interconnection system (OTIS); where we have used CodeV®9 optical system design software package to design and optimize several different systems based on both refractive and diffractive micro-optic technologies. In addition, we have explored the possibility of using a volume holographic element to replace the need for a polarizing beam splitter in the system.","PeriodicalId":301804,"journal":{"name":"Diffractive Optics and Micro-Optics","volume":"103 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114519223","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
京公网安备 11010802042870号
京ICP备2023020795号-1
扫码关注我们
求助内容：
应助结果提醒方式：