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A Correct Way to Model Arbitrary Complex Distributed FeedBack (DFB) Lasers in The Above Threshold Regime 在阈值以上区域建立任意复杂分布反馈(DFB)激光器模型的正确方法
Pub Date : 1900-01-01 DOI: 10.1364/slada.1995.tue.4
W. Hsin
Most of the published papers on the above-threshold simulation for DFB lasers utilize the powerful transfer matrix method (TMM) to include the longitudinal variations of the carrier and photon profiles caused by spatial hole burning and gain saturation effects at high output power[1]-[7]. However the approaches used to calculate the above-threshold behaviors were not correct. The most general mistakes are: (i). The use of the wrong threshold condition for the lasing mode both at and above threshold[2]- [5],[7] (ii). The iteration algorithm used to solve the above-threshold behavior for higher order DFB modes did not include the influence of the lasing mode properly[1],[2],[4],[5],[7].
已发表的DFB激光器阈值以上仿真论文大多采用强大的传递矩阵法(TMM)来考虑高输出功率下空间孔燃烧和增益饱和效应引起的载流子和光子剖面的纵向变化[1]-[7]。然而,用于计算阈值以上行为的方法是不正确的。最常见的错误是:(i)在阈值处和阈值以上的激光模式使用了错误的阈值条件[2]- [5],[7];(ii)用于求解高阶DFB模式阈值以上行为的迭代算法没有适当地考虑激光模式的影响[1],[2],[4],[5],[7]。
{"title":"A Correct Way to Model Arbitrary Complex Distributed FeedBack (DFB) Lasers in The Above Threshold Regime","authors":"W. Hsin","doi":"10.1364/slada.1995.tue.4","DOIUrl":"https://doi.org/10.1364/slada.1995.tue.4","url":null,"abstract":"Most of the published papers on the above-threshold simulation for DFB lasers utilize the powerful transfer matrix method (TMM) to include the longitudinal variations of the carrier and photon profiles caused by spatial hole burning and gain saturation effects at high output power[1]-[7]. However the approaches used to calculate the above-threshold behaviors were not correct. The most general mistakes are: (i). The use of the wrong threshold condition for the lasing mode both at and above threshold[2]- [5],[7] (ii). The iteration algorithm used to solve the above-threshold behavior for higher order DFB modes did not include the influence of the lasing mode properly[1],[2],[4],[5],[7].","PeriodicalId":365685,"journal":{"name":"Semiconductor Lasers Advanced Devices and Applications","volume":"24 2","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114093198","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High-performance folded-cavity surface-emitting InGaAs/GaAs lasers fabricated by ion-beam-etching technique 采用离子束刻蚀技术制备的高性能折叠腔面发射InGaAs/GaAs激光器
Pub Date : 1900-01-01 DOI: 10.1364/slada.1995.tud.8
Yong Cheng, G. Yang, P. Dapkus
High performance folded-cavity surface emitting lasers (FCSEL's) utilizing 45° deflection mirrors to couple the light in the horizontal cavity towards the surface are attractive devices for applications to optoelectronic integrated circuits. We report here low threshold current and high efficiency InGaAs/GaAs FCSEL's that employ high quality internal 45° deflectors. A simplified process involving a stop etch to position the surface emitting output mirror close to the waveguide and ion-beam-etching (IBE) to form the 45° deflecting mirror is presented.
高性能折叠腔表面发射激光器(FCSEL)利用45°偏转反射镜将水平腔中的光耦合到表面,是光电集成电路中有吸引力的应用器件。我们在此报告低阈值电流和高效率的InGaAs/GaAs FCSEL采用高质量的内部45°偏转。提出了一种简化的工艺,包括停止蚀刻使表面发射输出镜靠近波导,离子束蚀刻(IBE)形成45°偏转反射镜。
{"title":"High-performance folded-cavity surface-emitting InGaAs/GaAs lasers fabricated by ion-beam-etching technique","authors":"Yong Cheng, G. Yang, P. Dapkus","doi":"10.1364/slada.1995.tud.8","DOIUrl":"https://doi.org/10.1364/slada.1995.tud.8","url":null,"abstract":"High performance folded-cavity surface emitting lasers (FCSEL's) utilizing 45° deflection mirrors to couple the light in the horizontal cavity towards the surface are attractive devices for applications to optoelectronic integrated circuits. We report here low threshold current and high efficiency InGaAs/GaAs FCSEL's that employ high quality internal 45° deflectors. A simplified process involving a stop etch to position the surface emitting output mirror close to the waveguide and ion-beam-etching (IBE) to form the 45° deflecting mirror is presented.","PeriodicalId":365685,"journal":{"name":"Semiconductor Lasers Advanced Devices and Applications","volume":"50 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130548229","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
An Fe-InP buried 1.3-μm double heterostructure laser heteroepitaxially grown on Si 在Si上外延生长Fe-InP埋置的1.3 μm双异质结构激光器
Pub Date : 1900-01-01 DOI: 10.1364/slada.1995.wa.5
T. Yamada, M. Tachikawa, T. Sasaki, H. Mori, Y. Kadota, S. Matsumoto, K. Kishi
Opto-electronic integrated circuits (OEICs), especially photonic devices on Si, are attractive because of their potential to combine photonic functions with highly integrated silicon electronic circuits. We have already demonstrated long term cw operation of a 1.5-μm multiple quantum well laser1) and high-temperature cw operation of a 1.3-μm double heterostructure (DH) laser2) heteroepitaxially grown on Si. Low threshold current lasers are required to reduce the power consumption of OEICs. An effective approach to reduce the threshold current is burying lasers with semi-insulating InP. The semi-insulating buried structure is also indispensable to reduce parasitic capacitance for high-frequency operation. Though a semi-insulating InP layer has been successfully grown on a Si substrate,3) there are no reports on its application to devices on Si.
光电集成电路(OEICs),特别是硅上的光子器件,由于其将光子功能与高度集成的硅电子电路相结合的潜力而具有吸引力。我们已经证明了1.5 μm多量子阱激光器的长期连续波工作和1.3 μm双异质结构(DH)激光器的高温连续波工作。低阈值电流激光器需要降低oeic的功耗。用半绝缘InP埋入激光是降低阈值电流的有效方法。半绝缘埋地结构对于降低高频工作的寄生电容也是必不可少的。虽然半绝缘的InP层已经成功地生长在硅衬底上,但还没有将其应用于硅基器件的报道。
{"title":"An Fe-InP buried 1.3-μm double heterostructure laser heteroepitaxially grown on Si","authors":"T. Yamada, M. Tachikawa, T. Sasaki, H. Mori, Y. Kadota, S. Matsumoto, K. Kishi","doi":"10.1364/slada.1995.wa.5","DOIUrl":"https://doi.org/10.1364/slada.1995.wa.5","url":null,"abstract":"Opto-electronic integrated circuits (OEICs), especially photonic devices on Si, are attractive because of their potential to combine photonic functions with highly integrated silicon electronic circuits. We have already demonstrated long term cw operation of a 1.5-μm multiple quantum well laser1) and high-temperature cw operation of a 1.3-μm double heterostructure (DH) laser2) heteroepitaxially grown on Si. Low threshold current lasers are required to reduce the power consumption of OEICs. An effective approach to reduce the threshold current is burying lasers with semi-insulating InP. The semi-insulating buried structure is also indispensable to reduce parasitic capacitance for high-frequency operation. Though a semi-insulating InP layer has been successfully grown on a Si substrate,3) there are no reports on its application to devices on Si.","PeriodicalId":365685,"journal":{"name":"Semiconductor Lasers Advanced Devices and Applications","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130894335","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Modeling Considerations for UV Diode Lasers Based on GaN 基于GaN的紫外二极管激光器建模考虑
Pub Date : 1900-01-01 DOI: 10.1364/slada.1995.pdp.1
P. Eliseev, M. Osiński
The material parameters of GaN active medium are reviewed and specified for the numerical modeling of both edge- and surface-emitting laser devices. Calculations are presented for the oscillation strength, recombination coefficients, quantum yield and modal gain in GaN/GaAlN heterostructure. Threshold currents below 10 kA/cm2 at room temperature are predicted in optimized diode structures.
综述了氮化镓活性介质的材料参数,并为边发射和面发射激光器件的数值模拟指明了材料参数。计算了GaN/GaAlN异质结构的振荡强度、复合系数、量子产率和模态增益。在优化的二极管结构中,预测了室温下低于10 kA/cm2的阈值电流。
{"title":"Modeling Considerations for UV Diode Lasers Based on GaN","authors":"P. Eliseev, M. Osiński","doi":"10.1364/slada.1995.pdp.1","DOIUrl":"https://doi.org/10.1364/slada.1995.pdp.1","url":null,"abstract":"The material parameters of GaN active medium are reviewed and specified for the numerical modeling of both edge- and surface-emitting laser devices. Calculations are presented for the oscillation strength, recombination coefficients, quantum yield and modal gain in GaN/GaAlN heterostructure. Threshold currents below 10 kA/cm2 at room temperature are predicted in optimized diode structures.","PeriodicalId":365685,"journal":{"name":"Semiconductor Lasers Advanced Devices and Applications","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134069661","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Minimizing the Operating Current of Quantum Well Lasers with Modulation Bandwidth and Optical Power Requirements 具有调制带宽和光功率要求的量子阱激光器的最小工作电流
Pub Date : 1900-01-01 DOI: 10.1364/slada.1995.ma.3
M. McAdams, B. Zhao, T.R. Chen, J. Feng, A. Yariv
When semiconductor lasers are used in optical telecommunication and optical interconnect applications, it is desirable to have as low an electrical power consumption as possible, i.e. a low operating current. However, if used in a high data transmission rate system, there may be a minimum requisite modulation bandwidth. In addition, signal-to-noise considerations often demand a minimum optical output power. While lowering the threshold current often improves the bandwidth and output power at a given operating current, it is not true that a laser optimized solely for the lowest threshold current will have the lowest operating current when biased to meet the requirements of a particular system. In this talk we discuss how the laser device parameters are optimized to produce the lowest operating current in applications with given bandwidth and optical power requirements.
当半导体激光器用于光通信和光互连应用时,希望具有尽可能低的电力消耗,即低的工作电流。然而,如果在高数据传输速率系统中使用,则可能存在最小必要的调制带宽。此外,考虑到信噪比,通常需要最小的光输出功率。虽然降低阈值电流通常会提高给定工作电流下的带宽和输出功率,但仅针对最低阈值电流进行优化的激光器在偏置以满足特定系统的要求时并不会具有最低的工作电流。在这次演讲中,我们讨论了如何优化激光器件参数,以在给定带宽和光功率要求的应用中产生最低的工作电流。
{"title":"Minimizing the Operating Current of Quantum Well Lasers with Modulation Bandwidth and Optical Power Requirements","authors":"M. McAdams, B. Zhao, T.R. Chen, J. Feng, A. Yariv","doi":"10.1364/slada.1995.ma.3","DOIUrl":"https://doi.org/10.1364/slada.1995.ma.3","url":null,"abstract":"When semiconductor lasers are used in optical telecommunication and optical interconnect applications, it is desirable to have as low an electrical power consumption as possible, i.e. a low operating current. However, if used in a high data transmission rate system, there may be a minimum requisite modulation bandwidth. In addition, signal-to-noise considerations often demand a minimum optical output power. While lowering the threshold current often improves the bandwidth and output power at a given operating current, it is not true that a laser optimized solely for the lowest threshold current will have the lowest operating current when biased to meet the requirements of a particular system. In this talk we discuss how the laser device parameters are optimized to produce the lowest operating current in applications with given bandwidth and optical power requirements.","PeriodicalId":365685,"journal":{"name":"Semiconductor Lasers Advanced Devices and Applications","volume":"138 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127492166","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High power lasers for medical and graphic arts printing applications 用于医疗和图形艺术印刷应用的高功率激光器
Pub Date : 1900-01-01 DOI: 10.1364/slada.1995.mc.1
W. Stutius, L. Heath
Ecological concerns and time and cost saving measures have started a trend towards dry-processed, high quality image recording media for digital medical and graphic arts imaging applications. As compared to silver-halide film based systems, the photosensitive layers in most of these media are considerably less sensitive than traditional wet-processed film and therefore require a high laser power for exposure. In addition, advanced screening methods, like FM or stochastic screening, require an extremely well controlled laser spot size. The most recent developments in the graphic arts industry are directed towards eliminating film as an intermediate step for plate-making altogether and instead writing the image (comprising text, line art and pictures) directly onto plates. What these technological developments have in common is that, independent of the specific method for implementation, they all rely on various high power laser sources with extremely well controlled beam properties for writing the image. This talk will address the present status of laser requirements for non-silver-halide-based medical and graphic arts printing, as well as impending industry-wide technological changes and the resulting “wish list” for advanced laser sources.
生态问题以及节省时间和成本的措施已经开始趋向于干处理,用于数字医疗和图形艺术成像应用的高质量图像记录媒体。与基于卤化银薄膜的系统相比,大多数这些介质中的光敏层比传统湿处理薄膜的灵敏度低得多,因此需要高激光功率进行曝光。此外,先进的筛选方法,如调频或随机筛选,需要非常好地控制激光光斑尺寸。平面艺术行业的最新发展方向是完全消除胶片作为制版的中间步骤,而是将图像(包括文本,线条艺术和图片)直接写在板上。这些技术发展的共同之处在于,独立于具体的实现方法,它们都依赖于各种高功率激光源,这些激光源具有非常好的光束控制特性,用于写入图像。本次演讲将讨论非卤化银医学和图形艺术印刷的激光需求现状,以及即将发生的全行业技术变革和由此产生的先进激光源的“愿望清单”。
{"title":"High power lasers for medical and graphic arts printing applications","authors":"W. Stutius, L. Heath","doi":"10.1364/slada.1995.mc.1","DOIUrl":"https://doi.org/10.1364/slada.1995.mc.1","url":null,"abstract":"Ecological concerns and time and cost saving measures have started a trend towards dry-processed, high quality image recording media for digital medical and graphic arts imaging applications. As compared to silver-halide film based systems, the photosensitive layers in most of these media are considerably less sensitive than traditional wet-processed film and therefore require a high laser power for exposure. In addition, advanced screening methods, like FM or stochastic screening, require an extremely well controlled laser spot size. The most recent developments in the graphic arts industry are directed towards eliminating film as an intermediate step for plate-making altogether and instead writing the image (comprising text, line art and pictures) directly onto plates. What these technological developments have in common is that, independent of the specific method for implementation, they all rely on various high power laser sources with extremely well controlled beam properties for writing the image. This talk will address the present status of laser requirements for non-silver-halide-based medical and graphic arts printing, as well as impending industry-wide technological changes and the resulting “wish list” for advanced laser sources.","PeriodicalId":365685,"journal":{"name":"Semiconductor Lasers Advanced Devices and Applications","volume":"274 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124433254","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High Temperature Uncooled Lasers 高温非冷却激光器
Pub Date : 1900-01-01 DOI: 10.1364/slada.1995.wa.2
C. Zah, R. Bhat, T. Lee
An uncooled laser transmitter is cheaper and more reliable than a thermo-electrically cooled laser transmitter because of its simplicity in packaging. A low-cost, highly-reliable uncooled laser may have a strong influence on pushing fiber deployment closer to the home. For loop applications, the laser transmitter must operate reliably over the temperature range from -40 to 85°C. It is rather difficult to make high performance uncooled lasers in the long wavelength region (1.3-1.55 μm) using the conventional GaxIn1-xASyP1-y/InP materials system because the laser temperature performance suffers from Auger recombination in the low bandgap material and poor electron confinement resulting from the small conduction band offset (ΔEc=0.4ΔEg). We will discuss the design of uncooled lasers to minimize the changes in both threshold current and slope efficiency over the temperature range from -40 to 85 °C. To prevent carrier overflow under high-temperature operation, the electron confinement energy is increased by using the AlxGayIn1-x-yAs/InP materials system instead of the conventional GaxIn1-xASyP1-y/InP materials system. Experimental results of the AlxGayIn1-x-yAs/InP strained quantum well lasers show superior high temperature performances as discussed below.
由于封装简单,非冷却激光发射机比热电冷却激光发射机更便宜、更可靠。一种低成本、高可靠的非冷却激光器可能会对推动光纤部署更接近家庭产生重大影响。对于环路应用,激光发射器必须在-40至85°C的温度范围内可靠地工作。传统的GaxIn1-xASyP1-y/InP材料体系在长波长区域(1.3 ~ 1.55 μm)制备高性能非冷却激光器是相当困难的,因为低带隙材料中存在俄歇复合,并且导带偏移小(ΔEc=0.4ΔEg)导致了较差的电子约束。我们将讨论非冷却激光器的设计,以尽量减少阈值电流和斜率效率在-40至85°C温度范围内的变化。为了防止高温下载流子溢出,采用AlxGayIn1-x-yAs/InP材料体系代替传统的GaxIn1-xASyP1-y/InP材料体系增加了电子约束能。实验结果表明,AlxGayIn1-x-yAs/InP应变量子阱激光器具有优异的高温性能,如下所述。
{"title":"High Temperature Uncooled Lasers","authors":"C. Zah, R. Bhat, T. Lee","doi":"10.1364/slada.1995.wa.2","DOIUrl":"https://doi.org/10.1364/slada.1995.wa.2","url":null,"abstract":"An uncooled laser transmitter is cheaper and more reliable than a\u0000 thermo-electrically cooled laser transmitter because of its simplicity\u0000 in packaging. A low-cost, highly-reliable uncooled laser may have a\u0000 strong influence on pushing fiber deployment closer to the home. For\u0000 loop applications, the laser transmitter must operate reliably over\u0000 the temperature range from -40 to 85°C. It is rather difficult to make\u0000 high performance uncooled lasers in the long wavelength region\u0000 (1.3-1.55 μm) using the conventional\u0000 GaxIn1-xASyP1-y/InP\u0000 materials system because the laser temperature performance suffers\u0000 from Auger recombination in the low bandgap material and poor electron\u0000 confinement resulting from the small conduction band offset\u0000 (ΔEc=0.4ΔEg). We will discuss the design of\u0000 uncooled lasers to minimize the changes in both threshold current and\u0000 slope efficiency over the temperature range from -40 to 85 °C. To\u0000 prevent carrier overflow under high-temperature operation, the\u0000 electron confinement energy is increased by using the\u0000 AlxGayIn1-x-yAs/InP materials system\u0000 instead of the conventional\u0000 GaxIn1-xASyP1-y/InP\u0000 materials system. Experimental results of the\u0000 AlxGayIn1-x-yAs/InP strained quantum\u0000 well lasers show superior high temperature performances as discussed\u0000 below.","PeriodicalId":365685,"journal":{"name":"Semiconductor Lasers Advanced Devices and Applications","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130688344","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
1.5 μm Vertical-Cavity Surface-Emitting Lasers 1.5 μm垂直腔面发射激光器
Pub Date : 1900-01-01 DOI: 10.1364/slada.1995.tud.2
M. Fisher, Y.-Z. Huang, A. J. Dann, D. Elton, M. Harlow, S. Perrin, J. Reed, I. Reid, H. Wickes, M. Adams
VCSELs emitting in the 1.3 and 1.55 μm regions could be particularly useful as low cost sources for optical fibre telecommunications applications because mode-matched devices can be coupled to single-mode fibres with high efficiency and good alignment tolerance. The absence of cleaved facets also permits on-wafer characterisation of devices.
在1.3和1.55 μm区域发射的vcsel作为光纤通信应用的低成本光源特别有用,因为模式匹配器件可以以高效率和良好的对准公差耦合到单模光纤。没有劈裂面也允许器件的晶圆上表征。
{"title":"1.5 μm Vertical-Cavity Surface-Emitting Lasers","authors":"M. Fisher, Y.-Z. Huang, A. J. Dann, D. Elton, M. Harlow, S. Perrin, J. Reed, I. Reid, H. Wickes, M. Adams","doi":"10.1364/slada.1995.tud.2","DOIUrl":"https://doi.org/10.1364/slada.1995.tud.2","url":null,"abstract":"VCSELs emitting in the 1.3 and 1.55 μm regions could be particularly useful as low cost sources for optical fibre telecommunications applications because mode-matched devices can be coupled to single-mode fibres with high efficiency and good alignment tolerance. The absence of cleaved facets also permits on-wafer characterisation of devices.","PeriodicalId":365685,"journal":{"name":"Semiconductor Lasers Advanced Devices and Applications","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117249463","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Quantum Interference Effect and Electric Field Domains in Multiple Quantum Well Structures 多量子阱结构中的量子干涉效应和电场域
Pub Date : 1900-01-01 DOI: 10.1364/slada.1995.tue.16
Yuanjian Xu, A. Shakouri, A. Yariv
There has been great interest in studying optical and transport properties of multiple quantum well (MQW) structures. In these “artificial molecules”, energy quantization and the wave nature of the carriers have been used to design new devices, e.g., intersubband lasers. The understanding of carrier transport in MQWs is important for the design of lasers with high modulation speed. In this talk, we report on a new observation of a quantum interference effect in the photocurrent spectrum of weakly coupled bound-to-continuum MQWs. Using this effect, we analyze the electric field domain (EFD) formation in the superlattice [1].
多量子阱(MQW)结构的光学性质和输运性质的研究引起了人们极大的兴趣。在这些“人造分子”中,能量量子化和载流子的波动性质已被用于设计新设备,例如子带间激光器。了解mqw中的载流子输运对高调制速度激光器的设计具有重要意义。在这次演讲中,我们报告了弱耦合束缚连续mqw光电流谱中量子干涉效应的新观察。利用这一效应,我们分析了超晶格中电场域(EFD)的形成[1]。
{"title":"Quantum Interference Effect and Electric Field Domains in Multiple Quantum Well Structures","authors":"Yuanjian Xu, A. Shakouri, A. Yariv","doi":"10.1364/slada.1995.tue.16","DOIUrl":"https://doi.org/10.1364/slada.1995.tue.16","url":null,"abstract":"There has been great interest in studying optical and transport properties of multiple quantum well (MQW) structures. In these “artificial molecules”, energy quantization and the wave nature of the carriers have been used to design new devices, e.g., intersubband lasers. The understanding of carrier transport in MQWs is important for the design of lasers with high modulation speed. In this talk, we report on a new observation of a quantum interference effect in the photocurrent spectrum of weakly coupled bound-to-continuum MQWs. Using this effect, we analyze the electric field domain (EFD) formation in the superlattice [1].","PeriodicalId":365685,"journal":{"name":"Semiconductor Lasers Advanced Devices and Applications","volume":"183 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123728445","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analysis of Segmented Tapered Rib-Waveguide Semiconductor Optical Amplifiers 分段锥形肋波导半导体光放大器的分析
Pub Date : 1900-01-01 DOI: 10.1364/slada.1995.tue.15
P. Spencer, I. Middlemast, R. Balasubramanyam, J. Sarma, K. Shore
A single stripe semiconductor laser typically produces about 10mW of output power. This figure can be increased to about 50-60 mW by using some complicated fabrications techniques, but the goal of achieving higher powers and maintaining single mode operation has proved elusive. When the drive current to a single stripe laser is increased two effects may occur to limit the output power: the inversion population starts to saturate, and Catastrophic Optical Damage, (COD), starts to destroy the facets. Several approaches to these problems have been tried, eg., increased active area, and laser arrays, and have generally been found to be unsatisfactory. Increasing the active area does indeed result in increased output power but at the expense of the far-field pattern; and, unfortunately, increasing the active area generally leads to multi-mode operation, and hence a poor far-field.
一个单条半导体激光器通常产生大约10mW的输出功率。通过使用一些复杂的制造技术,这个数字可以增加到大约50-60兆瓦,但是实现更高功率和保持单模操作的目标被证明是难以实现的。当单条纹激光器的驱动电流增加时,可能会出现两种效应来限制输出功率:反转人口开始饱和,以及灾难性光损伤(COD)开始破坏facet。解决这些问题的几种方法已经尝试过了。,增加的活跃面积,和激光阵列,并普遍发现是不令人满意的。增加有源面积确实会增加输出功率,但以牺牲远场模式为代价;而且,不幸的是,增加有源面积通常会导致多模式操作,因此远场效果很差。
{"title":"Analysis of Segmented Tapered Rib-Waveguide Semiconductor Optical Amplifiers","authors":"P. Spencer, I. Middlemast, R. Balasubramanyam, J. Sarma, K. Shore","doi":"10.1364/slada.1995.tue.15","DOIUrl":"https://doi.org/10.1364/slada.1995.tue.15","url":null,"abstract":"A single stripe semiconductor laser typically produces about 10mW of output power. This figure can be increased to about 50-60 mW by using some complicated fabrications techniques, but the goal of achieving higher powers and maintaining single mode operation has proved elusive. When the drive current to a single stripe laser is increased two effects may occur to limit the output power: the inversion population starts to saturate, and Catastrophic Optical Damage, (COD), starts to destroy the facets. Several approaches to these problems have been tried, eg., increased active area, and laser arrays, and have generally been found to be unsatisfactory. Increasing the active area does indeed result in increased output power but at the expense of the far-field pattern; and, unfortunately, increasing the active area generally leads to multi-mode operation, and hence a poor far-field.","PeriodicalId":365685,"journal":{"name":"Semiconductor Lasers Advanced Devices and Applications","volume":"54 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127070548","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Semiconductor Lasers Advanced Devices and Applications
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