We investigate substrate overetch effect on resonance properties of sub-wavelength titanium oxide (TiO2) Guided Mode Resonance Filters (TiO2-GMRFs). The TiO2-GMRF is designed and fabricated to possess a non-polarizing behavior, which is strongly dependent on substrate (fused silica) overetch depth. For non-polarizing gratings at resonance, TE- and TM-modes have the same propagation constants. However, an overetch substrate effect results in splitting of the degenerate modes, which is studied theoretically and experimentally. The TiO2-SiO2 GMRFs are designed by Fourier Modal method (FMM) based on the rigorous calculation of electromagnetic diffraction theory at a designed wavelength of 850 nm. The TiO2-SiO2 gratings are fabricated by Atomic Layer Deposition (ALD), Electron Beam Lithography (EBL), and Reactive Ion Etching (RIE), and they are subsequently characterized structurally by Scanning Electron Microscopy (SEM) and optically by a spectroscopic ellipsometer. Several grating samples are fabricated by gradually increasing the overetch depth into fused silica and measuring the extent of TE- and TM-mode-splitting. A close agreement between the calculated and experimentally measured resonance wavelength spectral shift is found to describe the mode splitting of non-polarizing gratings.
{"title":"Mode-splitting of a non-polarizing guided mode resonance filter by substrate overetching effect","authors":"M. Saleem, S. Honkanen, J. Turunen","doi":"10.1117/12.2038116","DOIUrl":"https://doi.org/10.1117/12.2038116","url":null,"abstract":"We investigate substrate overetch effect on resonance properties of sub-wavelength titanium oxide (TiO2) Guided Mode Resonance Filters (TiO2-GMRFs). The TiO2-GMRF is designed and fabricated to possess a non-polarizing behavior, which is strongly dependent on substrate (fused silica) overetch depth. For non-polarizing gratings at resonance, TE- and TM-modes have the same propagation constants. However, an overetch substrate effect results in splitting of the degenerate modes, which is studied theoretically and experimentally. The TiO2-SiO2 GMRFs are designed by Fourier Modal method (FMM) based on the rigorous calculation of electromagnetic diffraction theory at a designed wavelength of 850 nm. The TiO2-SiO2 gratings are fabricated by Atomic Layer Deposition (ALD), Electron Beam Lithography (EBL), and Reactive Ion Etching (RIE), and they are subsequently characterized structurally by Scanning Electron Microscopy (SEM) and optically by a spectroscopic ellipsometer. Several grating samples are fabricated by gradually increasing the overetch depth into fused silica and measuring the extent of TE- and TM-mode-splitting. A close agreement between the calculated and experimentally measured resonance wavelength spectral shift is found to describe the mode splitting of non-polarizing gratings.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"71 5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115638253","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Chang, J. Patel, C. Cordoba, B. Kaminska, K. Kavanagh
An application friendly technique to increase the surface area of the ionomer membrane such as Aquivion™ has been developed. By utilizing existing micro-fabrication technologies, square pillars were fabricated onto glass and silicon substrates. In combination with a low cost heat press, the glass and silicon stamps were used to successfully hot emboss micro-features onto the ionomer membrane. Consequently, the surface area of the Aquivion™ membrane was drastically increased enabling potential improvement of sensing and energy storage technologies. Preliminary results show successful fabrication of devices with systematic higher surface area and an improved capacitance.
{"title":"Fabrication technology to increase surface area of ionomer membrane material and its application towards high surface area electric double-layer capacitors","authors":"A. Chang, J. Patel, C. Cordoba, B. Kaminska, K. Kavanagh","doi":"10.1117/12.2040273","DOIUrl":"https://doi.org/10.1117/12.2040273","url":null,"abstract":"An application friendly technique to increase the surface area of the ionomer membrane such as Aquivion™ has been developed. By utilizing existing micro-fabrication technologies, square pillars were fabricated onto glass and silicon substrates. In combination with a low cost heat press, the glass and silicon stamps were used to successfully hot emboss micro-features onto the ionomer membrane. Consequently, the surface area of the Aquivion™ membrane was drastically increased enabling potential improvement of sensing and energy storage technologies. Preliminary results show successful fabrication of devices with systematic higher surface area and an improved capacitance.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"133 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124274229","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Chemical mechanical polishing (CMP) is a technique which helps to print a smaller depth of focus and smoother surface in micro fabrication industry. In this project, boron doped polysilicon is used as a fill material for Through Silicon Vias (TSV) creating a 3D package. It is shown that the presence of boron as dopant suppresses the polysilicon polish rate. To increase the polish rate, understanding the mechanism of polish rate retardation is essential. We believe that the electrical effects play the major role in this phenomenon and by reducing this effect we are able to increase the polish rate.
{"title":"Chemical mechanical polishing of boron-doped polycrystalline silicon","authors":"H. Pirayesh, K. Cadien","doi":"10.1117/12.2036822","DOIUrl":"https://doi.org/10.1117/12.2036822","url":null,"abstract":"Chemical mechanical polishing (CMP) is a technique which helps to print a smaller depth of focus and smoother surface in micro fabrication industry. In this project, boron doped polysilicon is used as a fill material for Through Silicon Vias (TSV) creating a 3D package. It is shown that the presence of boron as dopant suppresses the polysilicon polish rate. To increase the polish rate, understanding the mechanism of polish rate retardation is essential. We believe that the electrical effects play the major role in this phenomenon and by reducing this effect we are able to increase the polish rate.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"2017 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121023718","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Lei Yuan, Xinwei Lan, Jie Huang, Hanzheng Wang, Baokai Cheng, Jie Liu, H. Xiao
A U-shaped optical fiber inline microchannel was fabricated by femtosecond laser irradiation and subsequent selective chemical wet etching. A high quality micro-cavity embedded inside the channel was obtained to construct a Fabry-Perot interferometer (FPI). A fringe visibility of 20 dB in spectrum domain was achieved. High temperature survivability of this micro device was also demonstrated. The proposed assembly-free optical fiber inline interferometer is attractive for sensing applications in high-temperature harsh environments.
{"title":"Miniaturized optical fiber Fabry-Perot interferometer fabricated by femtosecond laser irradiation and selective chemical etching","authors":"Lei Yuan, Xinwei Lan, Jie Huang, Hanzheng Wang, Baokai Cheng, Jie Liu, H. Xiao","doi":"10.1117/12.2038824","DOIUrl":"https://doi.org/10.1117/12.2038824","url":null,"abstract":"A U-shaped optical fiber inline microchannel was fabricated by femtosecond laser irradiation and subsequent selective chemical wet etching. A high quality micro-cavity embedded inside the channel was obtained to construct a Fabry-Perot interferometer (FPI). A fringe visibility of 20 dB in spectrum domain was achieved. High temperature survivability of this micro device was also demonstrated. The proposed assembly-free optical fiber inline interferometer is attractive for sensing applications in high-temperature harsh environments.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"15 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121237296","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
H. Chiamori, Minmin Hou, C. Chapin, Ashwin Shankar, D. Senesky
New milestones in space exploration can be realized through the development of radiation-hardened, temperature-tolerant materials, sensors and electronics. This enables lightweight systems (reduced packaging requirements) with increased operation lifetimes. Gallium nitride (GaN) is a ceramic, semiconductor material that is stable within high-radiation, high-temperature and chemically corrosive environments. Recently, this material platform has been utilized to realize sensors and electronics for operation under extreme harsh conditions. These devices exploit the two-dimensional electron gas (2DEG) formed at the interface between AlGaN/GaN heterostructures, which is used as the material platform in high electron mobility transistors (HEMTs). In this paper, a review of the advancements in GaN manufacturing technology such as the growth of epitaxially deposited thin films, micromachining techniques and high-temperature metallization is presented. In addition, the compelling results of fabricating and operating micro-scale GaNbased sensors within radiation environments and at elevated temperatures are shown. The paper will close with future directions GaN-based microsystems technology for down-hole, propulsion and space exploration applications.
{"title":"Characterization of gallium nitride microsystems within radiation and high-temperature environments","authors":"H. Chiamori, Minmin Hou, C. Chapin, Ashwin Shankar, D. Senesky","doi":"10.1117/12.2046690","DOIUrl":"https://doi.org/10.1117/12.2046690","url":null,"abstract":"New milestones in space exploration can be realized through the development of radiation-hardened, temperature-tolerant materials, sensors and electronics. This enables lightweight systems (reduced packaging requirements) with increased operation lifetimes. Gallium nitride (GaN) is a ceramic, semiconductor material that is stable within high-radiation, high-temperature and chemically corrosive environments. Recently, this material platform has been utilized to realize sensors and electronics for operation under extreme harsh conditions. These devices exploit the two-dimensional electron gas (2DEG) formed at the interface between AlGaN/GaN heterostructures, which is used as the material platform in high electron mobility transistors (HEMTs). In this paper, a review of the advancements in GaN manufacturing technology such as the growth of epitaxially deposited thin films, micromachining techniques and high-temperature metallization is presented. In addition, the compelling results of fabricating and operating micro-scale GaNbased sensors within radiation environments and at elevated temperatures are shown. The paper will close with future directions GaN-based microsystems technology for down-hole, propulsion and space exploration applications.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115247778","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
R. Newberry, Nathan E. Glauvitz, R. Coutu, Ivan R. Medvedev, D. Petkie
Historically, spectroscopy has been a cumbersome endeavor due to the relatively large sizes (3ft – 100ft in length) of modern spectroscopy systems. Taking advantage of the photoacoustic effect would allow for much smaller absorption chambers since the photoacoustic (PA) effect is independent of the absorption path length. In order to detect the photoacoustic waves being generated, a photoacoustic microphone would be required. This paper reports on the fabrication efforts taken in order to create microelectromechanical systems (MEMS) cantilevers for the purpose of sensing photoacoustic waves generated via terahertz (THz) radiation passing through a gaseous sample. The cantilevers are first modeled through the use of the finite element modeling software, CoventorWare®. The cantilevers fabricated with bulk micromachining processes and are 7x2x0.010mm on a silicon-on-insulator (SOI) wafer which acts as the physical structure of the cantilever. The devices are released by etching through the wafer’s backside and etching through the buried oxide with hydrofluoric acid. The cantilevers are placed in a test chamber and their vibration and deflection are measured via a Michelson type interferometer that reflects a laser off a gold tip evaporated onto the tip of the cantilever. The test chamber is machined from stainless steel and housed in a THz testing environment at Wright State University. Fabricated devices have decreased residual stress and larger radii of curvatures by approximately 10X.
{"title":"Fabrication of microelectromechanical systems (MEMS) cantilevers for photoacoustic (PA) detection of terahertz (THz) radiation","authors":"R. Newberry, Nathan E. Glauvitz, R. Coutu, Ivan R. Medvedev, D. Petkie","doi":"10.1117/12.2037376","DOIUrl":"https://doi.org/10.1117/12.2037376","url":null,"abstract":"Historically, spectroscopy has been a cumbersome endeavor due to the relatively large sizes (3ft – 100ft in length) of modern spectroscopy systems. Taking advantage of the photoacoustic effect would allow for much smaller absorption chambers since the photoacoustic (PA) effect is independent of the absorption path length. In order to detect the photoacoustic waves being generated, a photoacoustic microphone would be required. This paper reports on the fabrication efforts taken in order to create microelectromechanical systems (MEMS) cantilevers for the purpose of sensing photoacoustic waves generated via terahertz (THz) radiation passing through a gaseous sample. The cantilevers are first modeled through the use of the finite element modeling software, CoventorWare®. The cantilevers fabricated with bulk micromachining processes and are 7x2x0.010mm on a silicon-on-insulator (SOI) wafer which acts as the physical structure of the cantilever. The devices are released by etching through the wafer’s backside and etching through the buried oxide with hydrofluoric acid. The cantilevers are placed in a test chamber and their vibration and deflection are measured via a Michelson type interferometer that reflects a laser off a gold tip evaporated onto the tip of the cantilever. The test chamber is machined from stainless steel and housed in a THz testing environment at Wright State University. Fabricated devices have decreased residual stress and larger radii of curvatures by approximately 10X.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122369855","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Multiview three-dimensional (3D) display is able to provide horizontal parallax to viewers with high-resolution and fullcolor images being presented to each view. Most multiview 3D display systems are designed and implemented using multiple projectors, each generating images for one view. Although this multi-projector design strategy is conceptually straightforward, implementation of such multi-projector design often leads to a very expensive system and complicated calibration procedures. Even for a multiview system with a moderate number of projectors (e.g., 32 or 64 projectors), the cost of a multi-projector 3D display system may become prohibitive due to the cost and complexity of integrating multiple projectors. In this article, we describe an optical design technique for a class of multiview 3D display systems that use only a single projector. In this single projector multiview (SPM) system design, multiple views for the 3D display are generated in a time-multiplex fashion by the single high speed projector with specially designed optical components, a scanning mirror, and a reflective mirror array. Images of all views are generated sequentially and projected via the specially design optical system from different viewing directions towards a 3D display screen. Therefore, the single projector is able to generate equivalent number of multiview images from multiple viewing directions, thus fulfilling the tasks of multiple projectors. An obvious advantage of the proposed SPM technique is the significant reduction of cost, size, and complexity, especially when the number of views is high. The SPM strategy also alleviates the time-consuming procedures for multi-projector calibration. The design method is flexible and scalable and can accommodate systems with different number of views.
{"title":"Design of a single projector multiview 3D display system","authors":"J. Geng","doi":"10.1117/12.2036464","DOIUrl":"https://doi.org/10.1117/12.2036464","url":null,"abstract":"Multiview three-dimensional (3D) display is able to provide horizontal parallax to viewers with high-resolution and fullcolor images being presented to each view. Most multiview 3D display systems are designed and implemented using multiple projectors, each generating images for one view. Although this multi-projector design strategy is conceptually straightforward, implementation of such multi-projector design often leads to a very expensive system and complicated calibration procedures. Even for a multiview system with a moderate number of projectors (e.g., 32 or 64 projectors), the cost of a multi-projector 3D display system may become prohibitive due to the cost and complexity of integrating multiple projectors. In this article, we describe an optical design technique for a class of multiview 3D display systems that use only a single projector. In this single projector multiview (SPM) system design, multiple views for the 3D display are generated in a time-multiplex fashion by the single high speed projector with specially designed optical components, a scanning mirror, and a reflective mirror array. Images of all views are generated sequentially and projected via the specially design optical system from different viewing directions towards a 3D display screen. Therefore, the single projector is able to generate equivalent number of multiview images from multiple viewing directions, thus fulfilling the tasks of multiple projectors. An obvious advantage of the proposed SPM technique is the significant reduction of cost, size, and complexity, especially when the number of views is high. The SPM strategy also alleviates the time-consuming procedures for multi-projector calibration. The design method is flexible and scalable and can accommodate systems with different number of views.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129939808","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
We have developed a silicon MEMS optical accelerometer in which the motion of the proof mass is mechanically amplified using a V-beam mechanism prior to transduction. The output motion of the V-beam is detected using a Fabry-Pérot interferometer (FPI) which is interrogated in reflection mode via a single-mode optical fibre. Mechanical amplification allows the sensitivity of the accelerometer to be increased without compromising the resonant frequency or measurement bandwidth. We have also devised an all-optical method for calibrating the return signal from the FPI, based on photothermal actuation of the V-beam structure using fibre-delivered light of a different wavelength. A finite-element model has been used to predict the relationship between the incident optical power and the cavity length at steady state, as well as the step response which determines the minimum time for calibration. Prototype devices have been fabricated with resonant frequencies above 10 kHz and approximately linear response for accelerations in the range 0.01 to 15 g.
{"title":"Mechanically amplified MEMS optical accelerometer with FPI readout","authors":"E. Davies, D. George, A. Holmes","doi":"10.1117/12.2040022","DOIUrl":"https://doi.org/10.1117/12.2040022","url":null,"abstract":"We have developed a silicon MEMS optical accelerometer in which the motion of the proof mass is mechanically amplified using a V-beam mechanism prior to transduction. The output motion of the V-beam is detected using a Fabry-Pérot interferometer (FPI) which is interrogated in reflection mode via a single-mode optical fibre. Mechanical amplification allows the sensitivity of the accelerometer to be increased without compromising the resonant frequency or measurement bandwidth. We have also devised an all-optical method for calibrating the return signal from the FPI, based on photothermal actuation of the V-beam structure using fibre-delivered light of a different wavelength. A finite-element model has been used to predict the relationship between the incident optical power and the cavity length at steady state, as well as the step response which determines the minimum time for calibration. Prototype devices have been fabricated with resonant frequencies above 10 kHz and approximately linear response for accelerations in the range 0.01 to 15 g.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"44 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129344078","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
F. Teubl, C. Kurashima, M. Cabral, S. Fels, R. Lopes, M. Zuffo
Virtual Reality (VR) environments can offer immersion, interaction and realistic images to users. A VR system is usually expensive and requires special equipment in a complex setup. One approach is to use Commodity-Off-The-Shelf (COTS) desktop multi-projectors manually or camera based calibrated to reduce the cost of VR systems without significant decrease of the visual experience. Additionally, for non-planar screen shapes, special optics such as lenses and mirrors are required thus increasing costs. We propose a low-cost, scalable, flexible and mobile solution that allows building complex VR systems that projects images onto a variety of arbitrary surfaces such as planar, cylindrical and spherical surfaces. This approach combines three key aspects: 1) clusters of DLP-picoprojectors to provide homogeneous and continuous pixel density upon arbitrary surfaces without additional optics; 2) LED lighting technology for energy efficiency and light control; 3) smaller physical footprint for flexibility purposes. Therefore, the proposed system is scalable in terms of pixel density, energy and physical space. To achieve these goals, we developed a multi-projector software library called FastFusion that calibrates all projectors in a uniform image that is presented to viewers. FastFusion uses a camera to automatically calibrate geometric and photometric correction of projected images from ad-hoc positioned projectors, the only requirement is some few pixels overlapping amongst them. We present results with eight Pico-projectors, with 7 lumens (LED) and DLP 0.17 HVGA Chipset.
{"title":"A scalable multi-DLP pico-projector system for virtual reality","authors":"F. Teubl, C. Kurashima, M. Cabral, S. Fels, R. Lopes, M. Zuffo","doi":"10.1117/12.2040402","DOIUrl":"https://doi.org/10.1117/12.2040402","url":null,"abstract":"Virtual Reality (VR) environments can offer immersion, interaction and realistic images to users. A VR system is usually expensive and requires special equipment in a complex setup. One approach is to use Commodity-Off-The-Shelf (COTS) desktop multi-projectors manually or camera based calibrated to reduce the cost of VR systems without significant decrease of the visual experience. Additionally, for non-planar screen shapes, special optics such as lenses and mirrors are required thus increasing costs. We propose a low-cost, scalable, flexible and mobile solution that allows building complex VR systems that projects images onto a variety of arbitrary surfaces such as planar, cylindrical and spherical surfaces. This approach combines three key aspects: 1) clusters of DLP-picoprojectors to provide homogeneous and continuous pixel density upon arbitrary surfaces without additional optics; 2) LED lighting technology for energy efficiency and light control; 3) smaller physical footprint for flexibility purposes. Therefore, the proposed system is scalable in terms of pixel density, energy and physical space. To achieve these goals, we developed a multi-projector software library called FastFusion that calibrates all projectors in a uniform image that is presented to viewers. FastFusion uses a camera to automatically calibrate geometric and photometric correction of projected images from ad-hoc positioned projectors, the only requirement is some few pixels overlapping amongst them. We present results with eight Pico-projectors, with 7 lumens (LED) and DLP 0.17 HVGA Chipset.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"2018 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128114388","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
U. Zeitner, T. Harzendorf, F. Fuchs, M. Banasch, H. Schmidt, E. Kley
The fabrication of complex nano-optical structures for plasmonics, photonic-crystals, or meta-materials on application relevant areas by electron-beam lithography requires a highly parallel writing strategy. In case of periodic pattern as they are found in most of the mentioned optical elements this can be achieved by a so called character projection writing principle where complex exposure pattern are coded in a stencil mask and exposed with a single shot. Resulting shotcount and writing time reductions compared to standard Variable-Shaped-Beam exposures can be in the order of 100...10000. The limitation in flexibility by using hard-coded exposure shapes can be overcome by implementing the character projection principle with a highly precise motorized aperture stage capable of carrying several 1000 different apertures. Examples of nano-optical elements fabricated with the new character projection principle are presented.
{"title":"Efficient fabrication of complex nano-optical structures by E-beam lithography based on character projection","authors":"U. Zeitner, T. Harzendorf, F. Fuchs, M. Banasch, H. Schmidt, E. Kley","doi":"10.1117/12.2040206","DOIUrl":"https://doi.org/10.1117/12.2040206","url":null,"abstract":"The fabrication of complex nano-optical structures for plasmonics, photonic-crystals, or meta-materials on application relevant areas by electron-beam lithography requires a highly parallel writing strategy. In case of periodic pattern as they are found in most of the mentioned optical elements this can be achieved by a so called character projection writing principle where complex exposure pattern are coded in a stencil mask and exposed with a single shot. Resulting shotcount and writing time reductions compared to standard Variable-Shaped-Beam exposures can be in the order of 100...10000. The limitation in flexibility by using hard-coded exposure shapes can be overcome by implementing the character projection principle with a highly precise motorized aperture stage capable of carrying several 1000 different apertures. Examples of nano-optical elements fabricated with the new character projection principle are presented.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121957211","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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