The current photolithographic methods employ shorter wavelength light for finer resolving power as exemplified in the rapid transition from g-line to i-line steppers now taking place. The application of new technological attempts like phase-shift or partial illumination methods will further pursuit this trend. Then comes the deep-UV lithography with Eximer laser used as the light source, with which it seems possible to attain 0.2 5µm resolution for production LSIs.
{"title":"LSI Lithography: Present Status and Future Trends","authors":"S. Yoshida","doi":"10.1364/sxray.1992.ma1","DOIUrl":"https://doi.org/10.1364/sxray.1992.ma1","url":null,"abstract":"The current photolithographic methods employ shorter wavelength light for finer resolving power as exemplified in the rapid transition from g-line to i-line steppers now taking place. The application of new technological attempts like phase-shift or partial illumination methods will further pursuit this trend. Then comes the deep-UV lithography with Eximer laser used as the light source, with which it seems possible to attain 0.2 5µm resolution for production LSIs.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"50 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115679996","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
As part of its commitment to support the microelectronics industry, NIST has begun a metrology program in die area of normal incidence, soft x-ray optical systems for use in both basic and applied research. At present, this program consists of dual efforts in the fields of surface figure and surface finish characterization and optical component soft x-ray reflectometry. In this paper, we will focus our discussion on the work performed at NIST using the existing soft x-ray reflectometer, the design characteristics of a new reflectometer which will replace the present instrument, and our plans to build an optical characterization facility based on a real time, two dimensional, soft x-ray imaging system with an ultimate resolution of a few tens of nanometers.
{"title":"NIST Metrology for Soft X-Ray Multilayer Optics","authors":"R. Watts, D. Ederer, T. Lucatorto, M. Isaacson","doi":"10.1364/sxray.1991.fa3","DOIUrl":"https://doi.org/10.1364/sxray.1991.fa3","url":null,"abstract":"As part of its commitment to support the microelectronics industry, NIST has begun a metrology program in die area of normal incidence, soft x-ray optical systems for use in both basic and applied research. At present, this program consists of dual efforts in the fields of surface figure and surface finish characterization and optical component soft x-ray reflectometry. In this paper, we will focus our discussion on the work performed at NIST using the existing soft x-ray reflectometer, the design characteristics of a new reflectometer which will replace the present instrument, and our plans to build an optical characterization facility based on a real time, two dimensional, soft x-ray imaging system with an ultimate resolution of a few tens of nanometers.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121149763","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"X-Ray Mask Inspection and Qualification","authors":"J. Wiley","doi":"10.1364/sxray.1992.wd2","DOIUrl":"https://doi.org/10.1364/sxray.1992.wd2","url":null,"abstract":"Summary not available at time of publication.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"25 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123905121","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
There is a surprising variety of interesting optical designs for possible use in soft X-ray lithography. The requirements for the projection system are more difficult than those for the beam handling and mask illuminator optics, and it is only the projection optics that will be discussed here.
{"title":"Soft X-ray projection optics","authors":"D. Shafer","doi":"10.1364/sxray.1991.the1","DOIUrl":"https://doi.org/10.1364/sxray.1991.the1","url":null,"abstract":"There is a surprising variety of interesting optical designs for possible use in soft X-ray lithography. The requirements for the projection system are more difficult than those for the beam handling and mask illuminator optics, and it is only the projection optics that will be discussed here.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"331 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122819844","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A number of reflective imaging systems have been designed for use in soft X-ray projection lithography.1,2 Optical surface figure errors in these imaging systems, however, degrade resolution as well as cause changes in image positions, which in turn degrade overlay accuracy. We therefore evaluate the figure tolerances of a four-mirror imaging system by ray-tracing calculations.
{"title":"Tolerances of a Reflective Imaging System","authors":"Masaaki Itou, T. Terasawa","doi":"10.1364/sxray.1992.tua5","DOIUrl":"https://doi.org/10.1364/sxray.1992.tua5","url":null,"abstract":"A number of reflective imaging systems have been designed for use in soft X-ray projection lithography.1,2 Optical surface figure errors in these imaging systems, however, degrade resolution as well as cause changes in image positions, which in turn degrade overlay accuracy. We therefore evaluate the figure tolerances of a four-mirror imaging system by ray-tracing calculations.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132310918","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The rapidly emerging technology of soft X-ray projection microlithography requires very stringent tolerances upon the residual surface errors inherent with any optical fabrication process. The scattering effects of these optical fabrication errors can severely degrade system performance. These optical fabrication errors must therefore be controlled over the entire range of relevant spatial frequencies, including "mid" spatial frequency surface irregularities that bridge the gap between the traditional "figure" and "finish"errors. The surface power spectral density (PSD) function thus becomes the natural quantity to monitor during the optical fabrication process.
{"title":"Specifying Optical Fabrication Tolerances for Soft X-ray Projection Lithography Systems","authors":"J. Harvey","doi":"10.1364/sxray.1991.fb3","DOIUrl":"https://doi.org/10.1364/sxray.1991.fb3","url":null,"abstract":"The rapidly emerging technology of soft X-ray projection microlithography requires very stringent tolerances upon the residual surface errors inherent with any optical fabrication process. The scattering effects of these optical fabrication errors can severely degrade system performance. These optical fabrication errors must therefore be controlled over the entire range of relevant spatial frequencies, including \"mid\" spatial frequency surface irregularities that bridge the gap between the traditional \"figure\" and \"finish\"errors. The surface power spectral density (PSD) function thus becomes the natural quantity to monitor during the optical fabrication process.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127478476","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
An extensive series of one- and two-dimensional LASNEX simulations have been performed to establish the parameter range for efficient conversion of laser light into soft-x-rays in spectral regions of interest to x-ray lithography. In particular, the calculations assumed that 1.06 µm and .53 µm laser light of varying intensity was deposited on stainless steel and Tantalum slab targets. The subsequent emission of radiation in several spectral regions, between 10-14 Å and at 124 Å, was monitored as the high-temperature plasma evolved, and the overall conversion efficiency was calculated after the emission ended.
{"title":"Simulation of Soft -X-Ray Production by Laser Irradiation","authors":"C. Cerjan, M. Rosen","doi":"10.1364/sxray.1991.thc2","DOIUrl":"https://doi.org/10.1364/sxray.1991.thc2","url":null,"abstract":"An extensive series of one- and two-dimensional LASNEX simulations have been performed to establish the parameter range for efficient conversion of laser light into soft-x-rays in spectral regions of interest to x-ray lithography. In particular, the calculations assumed that 1.06 µm and .53 µm laser light of varying intensity was deposited on stainless steel and Tantalum slab targets. The subsequent emission of radiation in several spectral regions, between 10-14 Å and at 124 Å, was monitored as the high-temperature plasma evolved, and the overall conversion efficiency was calculated after the emission ended.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127591849","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Optical projection lithography using exposure wavelengths less than 100 nm is being developed to produce integrated circuits with feature sizes less than 0.2 µm while providing a total depth of focus (DOF) of ~1 µm. With such short wavelengths, all-reflective projection systems with reflective masks will be required. Since six to seven reflections at normal incidence will be necessary to attain large, diffraction-limited images ≥1 cm2, high mirror reflectance is very important for future high- volume production. As a result, present attempts to develop soft-x-ray projection lithography are focused mainly around 13 nm [1-3] where relatively high reflectance ~60% has been attained with Mo/Si multilayer mirrors.
{"title":"XUV Projection Lithography System Design Based on Single-Surface Reflecting Optics*","authors":"B. Newnam, V. Viswanathan","doi":"10.1364/sxray.1992.mb2","DOIUrl":"https://doi.org/10.1364/sxray.1992.mb2","url":null,"abstract":"Optical projection lithography using exposure wavelengths less than 100 nm is being developed to produce integrated circuits with feature sizes less than 0.2 µm while providing a total depth of focus (DOF) of ~1 µm. With such short wavelengths, all-reflective projection systems with reflective masks will be required. Since six to seven reflections at normal incidence will be necessary to attain large, diffraction-limited images ≥1 cm2, high mirror reflectance is very important for future high- volume production. As a result, present attempts to develop soft-x-ray projection lithography are focused mainly around 13 nm [1-3] where relatively high reflectance ~60% has been attained with Mo/Si multilayer mirrors.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"41 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126326828","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Soft x ray projection lithography allows the printing of feature sizes of 1μm and smaller with reasonable depth of focus because the very short wavelength allows a small numerical aperture. Because attainable mirror reflectivities are low in this wavelength region, the number of mirrors has to be kept to a minimum. Here again the low numerical aperture helps. Compared to present deep UV (248nm.) systems, there are a number of clearcut differences that impact the design and the construction of such a system.
{"title":"Issues Associated with the Design and Construction of an Imaging System for Soft X-ray Lithography","authors":"F. Zernike","doi":"10.1364/sxray.1992.tua1","DOIUrl":"https://doi.org/10.1364/sxray.1992.tua1","url":null,"abstract":"Soft x ray projection lithography allows the printing of feature sizes of 1μm and smaller with reasonable depth of focus because the very short wavelength allows a small numerical aperture. Because attainable mirror reflectivities are low in this wavelength region, the number of mirrors has to be kept to a minimum. Here again the low numerical aperture helps. Compared to present deep UV (248nm.) systems, there are a number of clearcut differences that impact the design and the construction of such a system.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129073579","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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