Micrascan-92 is a 248 nm, 0.5 NA, 4X step and Scan lithography tool designed for 0.35 micron manufacturing. It is capable of printing 22x32.5 mm field on 8" wafers with 50 W/hr throughput with the required overlay on the critical process levels. The optical projection lithography technology used in MS-92 is compatible with I-Line, DUV, and VDUV exposures. The step and scan technology, on the other hand, is extendible to meet the requirements of projection X-Ray applications.
{"title":"0.35 micron step and Scan Manufacturing Lithography Tool","authors":"B. Kuyel","doi":"10.1364/sxray.1992.mb4","DOIUrl":"https://doi.org/10.1364/sxray.1992.mb4","url":null,"abstract":"Micrascan-92 is a 248 nm, 0.5 NA, 4X step and Scan lithography tool designed for 0.35 micron manufacturing. It is capable of printing 22x32.5 mm field on 8\" wafers with 50 W/hr throughput with the required overlay on the critical process levels. The optical projection lithography technology used in MS-92 is compatible with I-Line, DUV, and VDUV exposures. The step and scan technology, on the other hand, is extendible to meet the requirements of projection X-Ray applications.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"179 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126007480","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The optimization of soft x-ray production from a laser-produced plasma source is an important issue for several current lithography schemes. Recent experiments at Lawrence Livermore National Laboratory by R. Kauffman, D. Phillion, and R. Spitzer, indicate that the required conversion efficiency can be achieved using moderate laser intensities for a few select materials. Computer simulations of these experiments delineate the critical phenomena underlying these high conversion efficiencies, especially the role of the coupled hydrodynamic expansion and radiation flow in the plasma. By driving the plasma emission out of local thermodynamic equilibrium, photon output in the desired spectral region can be much greater than the black-body emissivity. These conditions can only be achieved under certain conditions which are determined by the incident laser intensity, essentially the electron temperature, and the excited electronic state populations within each ionization stage. Reliable simulations of the experiments require fairly detailed atomic physics databases since the prediction of photon output occurs in such a narrow spectral range. The computer program LASNEX is capable of coupling the hydrodynamic motion and a radiation field described by detailed atomic physics rates for laser produced plasmas. Two-dimensional simulations using this code are compared to the experimental results and are shown to be reliable in their interpretation of these results.
从激光产生的等离子体源产生软x射线的优化是当前几种光刻方案的重要问题。最近由R. Kauffman, D. Phillion和R. Spitzer在劳伦斯利弗莫尔国家实验室进行的实验表明，对于一些选定的材料，使用中等强度的激光可以达到所需的转换效率。这些实验的计算机模拟描述了这些高转换效率背后的关键现象，特别是等离子体中耦合流体动力膨胀和辐射流的作用。通过使等离子体发射脱离局部热力学平衡，在期望光谱区域的光子输出可以比黑体发射率大得多。这些条件只能在某些条件下实现，这些条件是由入射激光强度决定的，本质上是电子温度，以及每个电离阶段内的激发态居群。可靠的实验模拟需要相当详细的原子物理数据库，因为光子输出的预测发生在如此狭窄的光谱范围内。计算机程序LASNEX能够耦合流体动力学运动和由激光产生的等离子体的详细原子物理速率描述的辐射场。使用该代码的二维模拟与实验结果进行了比较，并证明了它们对这些结果的解释是可靠的。
{"title":"X-ray Plasma Source Design Issues","authors":"C. Cerjan","doi":"10.1364/sxray.1992.mc1","DOIUrl":"https://doi.org/10.1364/sxray.1992.mc1","url":null,"abstract":"The optimization of soft x-ray production from a laser-produced plasma source is an important issue for several current lithography schemes. Recent experiments at Lawrence Livermore National Laboratory by R. Kauffman, D. Phillion, and R. Spitzer, indicate that the required conversion efficiency can be achieved using moderate laser intensities for a few select materials. Computer simulations of these experiments delineate the critical phenomena underlying these high conversion efficiencies, especially the role of the coupled hydrodynamic expansion and radiation flow in the plasma. By driving the plasma emission out of local thermodynamic equilibrium, photon output in the desired spectral region can be much greater than the black-body emissivity. These conditions can only be achieved under certain conditions which are determined by the incident laser intensity, essentially the electron temperature, and the excited electronic state populations within each ionization stage. Reliable simulations of the experiments require fairly detailed atomic physics databases since the prediction of photon output occurs in such a narrow spectral range. The computer program LASNEX is capable of coupling the hydrodynamic motion and a radiation field described by detailed atomic physics rates for laser produced plasmas. Two-dimensional simulations using this code are compared to the experimental results and are shown to be reliable in their interpretation of these results.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126646254","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. MacDowell, J. Bjorkholm, K. Early, R. Freeman, M. Himel, P. Mulgrew, L. Szeto, D. Taylor, D. Tennant, O. Wood, J. Bokor, L. Eichner, T. Jewell, W. Waskiewicz, D. White, D. Windt, F. Zernike
The first demonstration of diffraction-limited imaging at 14 nm in the soft-x-ray region, which resulted in the printing of 0.05 μm wide lines and spaces in a 60 nm thick film of PMMA resist, was produced using a multilayer-coated 20:1 reduction Schwarzschild optic.1 Unfortunately, a Schwarzschild optic possesses a central obscuration and a small image field and, hence, is not a very practical camera. A slightly more complicated optical system, but one that has already been used in a practical camera at visible wavelengths, is the 1:1 Offner ring- field optic.2 In theory a 0.0835 NA ring-field optic should be able to image 0.1 μm lines and spaces in a 100 micron wide 50 mm radius ring-shaped field at high contrast when illuminated with radiation at wavelengths shorter than 15 nm.3 In fact, an iridium-coated Offner 1:1 ring field camera was recently used to carry out projection imaging using 42 nm radiation from an undulator in the vacuum ultraviolet storage ring at Brookhaven National Laboratory.4
{"title":"Soft-X-Ray Projection Imaging Using a 1:1 Ring-Field Optic","authors":"A. MacDowell, J. Bjorkholm, K. Early, R. Freeman, M. Himel, P. Mulgrew, L. Szeto, D. Taylor, D. Tennant, O. Wood, J. Bokor, L. Eichner, T. Jewell, W. Waskiewicz, D. White, D. Windt, F. Zernike","doi":"10.1364/sxray.1992.wa3","DOIUrl":"https://doi.org/10.1364/sxray.1992.wa3","url":null,"abstract":"The first demonstration of diffraction-limited imaging at 14 nm in the soft-x-ray region, which resulted in the printing of 0.05 μm wide lines and spaces in a 60 nm thick film of PMMA resist, was produced using a multilayer-coated 20:1 reduction Schwarzschild optic.1 Unfortunately, a Schwarzschild optic possesses a central obscuration and a small image field and, hence, is not a very practical camera. A slightly more complicated optical system, but one that has already been used in a practical camera at visible wavelengths, is the 1:1 Offner ring- field optic.2 In theory a 0.0835 NA ring-field optic should be able to image 0.1 μm lines and spaces in a 100 micron wide 50 mm radius ring-shaped field at high contrast when illuminated with radiation at wavelengths shorter than 15 nm.3 In fact, an iridium-coated Offner 1:1 ring field camera was recently used to carry out projection imaging using 42 nm radiation from an undulator in the vacuum ultraviolet storage ring at Brookhaven National Laboratory.4","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125401691","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Because multilayer x-ray structures are bandpass reflectors, the variation in multilayer period across the surfaces of near normal-incidence soft x-ray focussing optics has implications for performance of imaging systems. We have investigated these issues as they relate to Schwarzschild objectives coated with Mo/Si multilayers for use at wavelengths ranging from roughly 12.4 to 21.0 nm. The results can be generalized to other types of compound reflective imaging or projection systems and wavelength ranges.
{"title":"Multilayer Period Uniformity and Performance of Soft X-ray Imaging Systems","authors":"J. Kortright, R. Watts","doi":"10.1364/sxray.1991.thb2","DOIUrl":"https://doi.org/10.1364/sxray.1991.thb2","url":null,"abstract":"Because multilayer x-ray structures are bandpass reflectors, the variation in multilayer period across the surfaces of near normal-incidence soft x-ray focussing optics has implications for performance of imaging systems. We have investigated these issues as they relate to Schwarzschild objectives coated with Mo/Si multilayers for use at wavelengths ranging from roughly 12.4 to 21.0 nm. The results can be generalized to other types of compound reflective imaging or projection systems and wavelength ranges.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124405042","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
D. Allred, Y. Shi, M. Berrondo, R. Perkins, F. Yuan, L. Knight, A. Reyes-Mena
We have investigated producing aspheric mirrors for x rays with order-of-magnitude improvements in surface finish, figure, and lightness for x-ray mirror blanks.
{"title":"Precision bending of substrate for high perfomance x-ray optics","authors":"D. Allred, Y. Shi, M. Berrondo, R. Perkins, F. Yuan, L. Knight, A. Reyes-Mena","doi":"10.1364/sxray.1992.tua7","DOIUrl":"https://doi.org/10.1364/sxray.1992.tua7","url":null,"abstract":"We have investigated producing aspheric mirrors for x rays with order-of-magnitude improvements in surface finish, figure, and lightness for x-ray mirror blanks.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"63 4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116026495","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
J. K. Shurtleff, D. Allred, R. Perkins, L. Knight, J. Thorne, J. D. Phillips
We are investigating atomic layer growth which can produce crystalline superlattices or amorphous multilayers with smaller periods and better uniformity than currently available.
我们正在研究原子层生长，它可以产生晶体超晶格或非晶多层，具有比目前可用的更小的周期和更好的均匀性。
{"title":"Atomic Layer Growth of Tungsten and Boron for Multilayer X-ray Optics","authors":"J. K. Shurtleff, D. Allred, R. Perkins, L. Knight, J. Thorne, J. D. Phillips","doi":"10.1364/sxray.1992.pd4","DOIUrl":"https://doi.org/10.1364/sxray.1992.pd4","url":null,"abstract":"We are investigating atomic layer growth which can produce crystalline superlattices or amorphous multilayers with smaller periods and better uniformity than currently available.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129915876","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A toroidal plasma device (tokamak) with electron temperature in the range of 150-200 eV and density ~1013 particles/cm3 can be built as a very compact and relatively inexpensive machine (~3 M$). A tokamak with a major radius R ≈ 1m, minor radius r ≈ 0.1m, and confining magnetic field ~ 5k Gauss is not a very attractive for fusion research, however it can be an excellent source of soft X-ray radiation. In particular if operated in a steady state regime or at a high repetition rate it can provide several orders of magnitude more soft X-ray radiation than a small synchrotron with an undulator. This can be seen easily by comparing the total radiated power of a small tokamak and a small sychrotron, taking into account the spectral intensity distribution of line radiation from the tokamak plasma and of continuum radiation from synchrotron. We will present related calculations. Based on the calculations we will discuss the usefulness of a small tokamak for X-ray projection and proximity lithography and simple methods to change the dominant lines in the plasma radiation spectrum.
{"title":"Small Scale Tokamak for X-Ray Lithography","authors":"S. Suckewer, L. Bromberg, D. Cohn","doi":"10.1364/sxray.1992.wb3","DOIUrl":"https://doi.org/10.1364/sxray.1992.wb3","url":null,"abstract":"A toroidal plasma device (tokamak) with electron temperature in the range of 150-200 eV and density ~1013 particles/cm3 can be built as a very compact and relatively inexpensive machine (~3 M$). A tokamak with a major radius R ≈ 1m, minor radius r ≈ 0.1m, and confining magnetic field ~ 5k Gauss is not a very attractive for fusion research, however it can be an excellent source of soft X-ray radiation. In particular if operated in a steady state regime or at a high repetition rate it can provide several orders of magnitude more soft X-ray radiation than a small synchrotron with an undulator. This can be seen easily by comparing the total radiated power of a small tokamak and a small sychrotron, taking into account the spectral intensity distribution of line radiation from the tokamak plasma and of continuum radiation from synchrotron. We will present related calculations. Based on the calculations we will discuss the usefulness of a small tokamak for X-ray projection and proximity lithography and simple methods to change the dominant lines in the plasma radiation spectrum.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133556966","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
One of the most important general reguirements for soft X-ray optics, and X-ray lithography in particular, is high reflectivity at normal incidence for long wavelength X-rays. Dependence of the multilayer structure on the deposition parameters and identification of appropriate conditions for the growth of multilayers having optimally smooth and sharp interfaces has been reported elsewhere1,2,3,4.
{"title":"Observation of Influence of Electrical Isolation of Dielectric Substrates on Structure and Reflectivity of Mo/Si Multilayer Coatings","authors":"G. Gutman, Richard A. Watts","doi":"10.1364/sxray.1992.pd7","DOIUrl":"https://doi.org/10.1364/sxray.1992.pd7","url":null,"abstract":"One of the most important general reguirements for soft X-ray optics, and X-ray lithography in particular, is high reflectivity at normal incidence for long wavelength X-rays. Dependence of the multilayer structure on the deposition parameters and identification of appropriate conditions for the growth of multilayers having optimally smooth and sharp interfaces has been reported elsewhere1,2,3,4.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"25 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133206143","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Current soft x-ray projection lithography (SXPL) system designs require multilayer coated optics to operate at levels approaching predicted maximums for near normal incidence reflectivity. Effects that (potentially) degrade multilayer performance in the SXPL environment are discussed. Appropriate repair strategies are suggested, and preliminary results are presented.
{"title":"Multilayer Damage and Repair Issues in Soft-X-Ray Projection Lithography","authors":"D. Gaines, R. Spitzer, N. Ceglio","doi":"10.1364/sxray.1992.tub5","DOIUrl":"https://doi.org/10.1364/sxray.1992.tub5","url":null,"abstract":"Current soft x-ray projection lithography (SXPL) system designs require multilayer coated optics to operate at levels approaching predicted maximums for near normal incidence reflectivity. Effects that (potentially) degrade multilayer performance in the SXPL environment are discussed. Appropriate repair strategies are suggested, and preliminary results are presented.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133981719","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The properties of important high-resolution resist systems will be briefly reviewed. Techniques for resist characterization will be discussed including experimental techniques, models for exposure (latent image formation), modifications of the latent image including diffusion and amplification, and development.
{"title":"Resist Characterization and Lithography Simulation","authors":"A. Neureuther, W. Oldham","doi":"10.1364/sxray.1991.thd1","DOIUrl":"https://doi.org/10.1364/sxray.1991.thd1","url":null,"abstract":"The properties of important high-resolution resist systems will be briefly reviewed. Techniques for resist characterization will be discussed including experimental techniques, models for exposure (latent image formation), modifications of the latent image including diffusion and amplification, and development.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134443131","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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