The structural properties and soft x-ray normal incidence reflectivity of Mo-Si multilayers fabricated using ion-assisted dc magnetron sputter deposition are reported.
报道了离子辅助直流磁控溅射法制备Mo-Si多层膜的结构特性和软x射线入射反射率。
{"title":"Structural Modification of Mo-Si X-Ray Multilayer Mirrors: Ion-Assisted Sputter Deposition","authors":"S. Vernon, D. Stearns, R. S. Rosen","doi":"10.1364/sxray.1992.tub3","DOIUrl":"https://doi.org/10.1364/sxray.1992.tub3","url":null,"abstract":"The structural properties and soft x-ray normal incidence reflectivity of Mo-Si multilayers fabricated using ion-assisted dc magnetron sputter deposition are reported.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132381293","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
We define the "front-end" or illumination system to include all those components necessary to produce the x-rays, and to transport them to and appropriately illuminate the mask. We will provide a systematic discussion of the constraints that limit the design of an illumination system for soft x-ray projection lithography.
{"title":"Design Considerations for a \"Front End\" Illumination System for Soft X-ray Projection Lithography","authors":"N. Ceglio","doi":"10.1364/sxray.1992.mb1","DOIUrl":"https://doi.org/10.1364/sxray.1992.mb1","url":null,"abstract":"We define the \"front-end\" or illumination system to include all those components necessary to produce the x-rays, and to transport them to and appropriately illuminate the mask. We will provide a systematic discussion of the constraints that limit the design of an illumination system for soft x-ray projection lithography.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131355557","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. MacDowell, J. Bjorkholm, K. Early, R. Freeman, M. Himel, P. Mulgrew, L. Szeto, D. Taylor, D. Tennant, O. Wood, J. Bokor, L. Eichner, T. Jewell, W. Waskiewicz, D. White, D. Windt, F. Zernike
The first demonstration of diffraction-limited imaging at 14 nm in the soft-x-ray region, which resulted in the printing of 0.05 μm wide lines and spaces in a 60 nm thick film of PMMA resist, was produced using a multilayer-coated 20:1 reduction Schwarzschild optic.1 Unfortunately, a Schwarzschild optic possesses a central obscuration and a small image field and, hence, is not a very practical camera. A slightly more complicated optical system, but one that has already been used in a practical camera at visible wavelengths, is the 1:1 Offner ring- field optic.2 In theory a 0.0835 NA ring-field optic should be able to image 0.1 μm lines and spaces in a 100 micron wide 50 mm radius ring-shaped field at high contrast when illuminated with radiation at wavelengths shorter than 15 nm.3 In fact, an iridium-coated Offner 1:1 ring field camera was recently used to carry out projection imaging using 42 nm radiation from an undulator in the vacuum ultraviolet storage ring at Brookhaven National Laboratory.4
{"title":"Soft-X-Ray Projection Imaging Using a 1:1 Ring-Field Optic","authors":"A. MacDowell, J. Bjorkholm, K. Early, R. Freeman, M. Himel, P. Mulgrew, L. Szeto, D. Taylor, D. Tennant, O. Wood, J. Bokor, L. Eichner, T. Jewell, W. Waskiewicz, D. White, D. Windt, F. Zernike","doi":"10.1364/sxray.1992.wa3","DOIUrl":"https://doi.org/10.1364/sxray.1992.wa3","url":null,"abstract":"The first demonstration of diffraction-limited imaging at 14 nm in the soft-x-ray region, which resulted in the printing of 0.05 μm wide lines and spaces in a 60 nm thick film of PMMA resist, was produced using a multilayer-coated 20:1 reduction Schwarzschild optic.1 Unfortunately, a Schwarzschild optic possesses a central obscuration and a small image field and, hence, is not a very practical camera. A slightly more complicated optical system, but one that has already been used in a practical camera at visible wavelengths, is the 1:1 Offner ring- field optic.2 In theory a 0.0835 NA ring-field optic should be able to image 0.1 μm lines and spaces in a 100 micron wide 50 mm radius ring-shaped field at high contrast when illuminated with radiation at wavelengths shorter than 15 nm.3 In fact, an iridium-coated Offner 1:1 ring field camera was recently used to carry out projection imaging using 42 nm radiation from an undulator in the vacuum ultraviolet storage ring at Brookhaven National Laboratory.4","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125401691","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
D. Allred, Y. Shi, M. Berrondo, R. Perkins, F. Yuan, L. Knight, A. Reyes-Mena
We have investigated producing aspheric mirrors for x rays with order-of-magnitude improvements in surface finish, figure, and lightness for x-ray mirror blanks.
{"title":"Precision bending of substrate for high perfomance x-ray optics","authors":"D. Allred, Y. Shi, M. Berrondo, R. Perkins, F. Yuan, L. Knight, A. Reyes-Mena","doi":"10.1364/sxray.1992.tua7","DOIUrl":"https://doi.org/10.1364/sxray.1992.tua7","url":null,"abstract":"We have investigated producing aspheric mirrors for x rays with order-of-magnitude improvements in surface finish, figure, and lightness for x-ray mirror blanks.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"63 4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116026495","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Because multilayer x-ray structures are bandpass reflectors, the variation in multilayer period across the surfaces of near normal-incidence soft x-ray focussing optics has implications for performance of imaging systems. We have investigated these issues as they relate to Schwarzschild objectives coated with Mo/Si multilayers for use at wavelengths ranging from roughly 12.4 to 21.0 nm. The results can be generalized to other types of compound reflective imaging or projection systems and wavelength ranges.
{"title":"Multilayer Period Uniformity and Performance of Soft X-ray Imaging Systems","authors":"J. Kortright, R. Watts","doi":"10.1364/sxray.1991.thb2","DOIUrl":"https://doi.org/10.1364/sxray.1991.thb2","url":null,"abstract":"Because multilayer x-ray structures are bandpass reflectors, the variation in multilayer period across the surfaces of near normal-incidence soft x-ray focussing optics has implications for performance of imaging systems. We have investigated these issues as they relate to Schwarzschild objectives coated with Mo/Si multilayers for use at wavelengths ranging from roughly 12.4 to 21.0 nm. The results can be generalized to other types of compound reflective imaging or projection systems and wavelength ranges.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124405042","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
J. K. Shurtleff, D. Allred, R. Perkins, L. Knight, J. Thorne, J. D. Phillips
We are investigating atomic layer growth which can produce crystalline superlattices or amorphous multilayers with smaller periods and better uniformity than currently available.
我们正在研究原子层生长，它可以产生晶体超晶格或非晶多层，具有比目前可用的更小的周期和更好的均匀性。
{"title":"Atomic Layer Growth of Tungsten and Boron for Multilayer X-ray Optics","authors":"J. K. Shurtleff, D. Allred, R. Perkins, L. Knight, J. Thorne, J. D. Phillips","doi":"10.1364/sxray.1992.pd4","DOIUrl":"https://doi.org/10.1364/sxray.1992.pd4","url":null,"abstract":"We are investigating atomic layer growth which can produce crystalline superlattices or amorphous multilayers with smaller periods and better uniformity than currently available.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129915876","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
One of the most important general reguirements for soft X-ray optics, and X-ray lithography in particular, is high reflectivity at normal incidence for long wavelength X-rays. Dependence of the multilayer structure on the deposition parameters and identification of appropriate conditions for the growth of multilayers having optimally smooth and sharp interfaces has been reported elsewhere1,2,3,4.
{"title":"Observation of Influence of Electrical Isolation of Dielectric Substrates on Structure and Reflectivity of Mo/Si Multilayer Coatings","authors":"G. Gutman, Richard A. Watts","doi":"10.1364/sxray.1992.pd7","DOIUrl":"https://doi.org/10.1364/sxray.1992.pd7","url":null,"abstract":"One of the most important general reguirements for soft X-ray optics, and X-ray lithography in particular, is high reflectivity at normal incidence for long wavelength X-rays. Dependence of the multilayer structure on the deposition parameters and identification of appropriate conditions for the growth of multilayers having optimally smooth and sharp interfaces has been reported elsewhere1,2,3,4.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"25 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133206143","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A toroidal plasma device (tokamak) with electron temperature in the range of 150-200 eV and density ~1013 particles/cm3 can be built as a very compact and relatively inexpensive machine (~3 M$). A tokamak with a major radius R ≈ 1m, minor radius r ≈ 0.1m, and confining magnetic field ~ 5k Gauss is not a very attractive for fusion research, however it can be an excellent source of soft X-ray radiation. In particular if operated in a steady state regime or at a high repetition rate it can provide several orders of magnitude more soft X-ray radiation than a small synchrotron with an undulator. This can be seen easily by comparing the total radiated power of a small tokamak and a small sychrotron, taking into account the spectral intensity distribution of line radiation from the tokamak plasma and of continuum radiation from synchrotron. We will present related calculations. Based on the calculations we will discuss the usefulness of a small tokamak for X-ray projection and proximity lithography and simple methods to change the dominant lines in the plasma radiation spectrum.
{"title":"Small Scale Tokamak for X-Ray Lithography","authors":"S. Suckewer, L. Bromberg, D. Cohn","doi":"10.1364/sxray.1992.wb3","DOIUrl":"https://doi.org/10.1364/sxray.1992.wb3","url":null,"abstract":"A toroidal plasma device (tokamak) with electron temperature in the range of 150-200 eV and density ~1013 particles/cm3 can be built as a very compact and relatively inexpensive machine (~3 M$). A tokamak with a major radius R ≈ 1m, minor radius r ≈ 0.1m, and confining magnetic field ~ 5k Gauss is not a very attractive for fusion research, however it can be an excellent source of soft X-ray radiation. In particular if operated in a steady state regime or at a high repetition rate it can provide several orders of magnitude more soft X-ray radiation than a small synchrotron with an undulator. This can be seen easily by comparing the total radiated power of a small tokamak and a small sychrotron, taking into account the spectral intensity distribution of line radiation from the tokamak plasma and of continuum radiation from synchrotron. We will present related calculations. Based on the calculations we will discuss the usefulness of a small tokamak for X-ray projection and proximity lithography and simple methods to change the dominant lines in the plasma radiation spectrum.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133556966","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Current soft x-ray projection lithography (SXPL) system designs require multilayer coated optics to operate at levels approaching predicted maximums for near normal incidence reflectivity. Effects that (potentially) degrade multilayer performance in the SXPL environment are discussed. Appropriate repair strategies are suggested, and preliminary results are presented.
{"title":"Multilayer Damage and Repair Issues in Soft-X-Ray Projection Lithography","authors":"D. Gaines, R. Spitzer, N. Ceglio","doi":"10.1364/sxray.1992.tub5","DOIUrl":"https://doi.org/10.1364/sxray.1992.tub5","url":null,"abstract":"Current soft x-ray projection lithography (SXPL) system designs require multilayer coated optics to operate at levels approaching predicted maximums for near normal incidence reflectivity. Effects that (potentially) degrade multilayer performance in the SXPL environment are discussed. Appropriate repair strategies are suggested, and preliminary results are presented.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133981719","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The properties of important high-resolution resist systems will be briefly reviewed. Techniques for resist characterization will be discussed including experimental techniques, models for exposure (latent image formation), modifications of the latent image including diffusion and amplification, and development.
{"title":"Resist Characterization and Lithography Simulation","authors":"A. Neureuther, W. Oldham","doi":"10.1364/sxray.1991.thd1","DOIUrl":"https://doi.org/10.1364/sxray.1991.thd1","url":null,"abstract":"The properties of important high-resolution resist systems will be briefly reviewed. Techniques for resist characterization will be discussed including experimental techniques, models for exposure (latent image formation), modifications of the latent image including diffusion and amplification, and development.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134443131","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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