P. Rockett, J. Hunter, R. Olson, G. Kubiak, K. Berger, H. Shields, M. Powers
A Sandia/AT&T team is utilizing optics coated for reflection at 14 nm for projection x-ray lithography. An excimer laser-plasma source of XUV radiation has provided illumination for this work, demonstrating the viability of a laser-plasma x-ray source for ultra-large scale integration. The issues of designing such a source for projection lithography are distinct from synchrotron sources and require understanding the UV to XUV conversion process, mitigating debris from the laser-target, and establishing long-term reliability. We are approaching these problems in parallel by studying the conversion process in solid and thin-film targets, by designing an advanced tape drive as a long-lasting low-mass laser-target, and by choosing to work with excimer lasers as off-the-shelf industrial components.
{"title":"Laser-Plasma Source Development for Projection X-ray Lithography","authors":"P. Rockett, J. Hunter, R. Olson, G. Kubiak, K. Berger, H. Shields, M. Powers","doi":"10.1364/sxray.1992.mc3","DOIUrl":"https://doi.org/10.1364/sxray.1992.mc3","url":null,"abstract":"A Sandia/AT&T team is utilizing optics coated for reflection at 14 nm for projection x-ray lithography. An excimer laser-plasma source of XUV radiation has provided illumination for this work, demonstrating the viability of a laser-plasma x-ray source for ultra-large scale integration. The issues of designing such a source for projection lithography are distinct from synchrotron sources and require understanding the UV to XUV conversion process, mitigating debris from the laser-target, and establishing long-term reliability. We are approaching these problems in parallel by studying the conversion process in solid and thin-film targets, by designing an advanced tape drive as a long-lasting low-mass laser-target, and by choosing to work with excimer lasers as off-the-shelf industrial components.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"33 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130847125","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
We report on studies of optical distortion and damage thresholds of Mo-Si multilayer soft x-ray reflective coatings using 308 nm pulsed radiation from a XeCl excimer laser to simulate soft x-ray irradiation. Preliminary experimental results yielded values of 260 mJ/cm2 and 500 mJ/cm2 for distortion and damage thresholds.
{"title":"Investigation of Distortion and Damage of Mo-Si Multilayer Reflective Coatings with High Intensity UV Radiation","authors":"H. Bender, W. Silfvast, K. Beck","doi":"10.1364/sxray.1992.tub7","DOIUrl":"https://doi.org/10.1364/sxray.1992.tub7","url":null,"abstract":"We report on studies of optical distortion and damage thresholds of Mo-Si multilayer soft x-ray reflective coatings using 308 nm pulsed radiation from a XeCl excimer laser to simulate soft x-ray irradiation. Preliminary experimental results yielded values of 260 mJ/cm2 and 500 mJ/cm2 for distortion and damage thresholds.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"2013 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127363555","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
H. Kinoshita, K. Kurihara, Tutomu Mizota, Tuneyuki Haga
The ability to replicate 0.1 μm patterns using multilayer reduction optics has already been demonstrated1),. However, if we are to exploit this technology for practical lithography of VLSI devices, the problems of large exposure area and high throughput must be solved.
{"title":"Large-Area, High-Resolution Pattern Replication using a Two- Aspherical-Mirror System","authors":"H. Kinoshita, K. Kurihara, Tutomu Mizota, Tuneyuki Haga","doi":"10.1364/sxray.1992.wa2","DOIUrl":"https://doi.org/10.1364/sxray.1992.wa2","url":null,"abstract":"The ability to replicate 0.1 μm patterns using multilayer reduction optics has already been demonstrated1),. However, if we are to exploit this technology for practical lithography of VLSI devices, the problems of large exposure area and high throughput must be solved.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121835822","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Soft X-ray projection type Lithography has been expected to be most atractive technology in future electronics device production, paticularly since the realization of normal incidence soft x-ray mirror [1]. For instance, Kinoshita et al [2] and other groups [3,4] have already shown the feasibility of this technology, adopting a Schwartzschild optical system composed of normal mirrors. If neglecting process speed or throughput, it is widely accepted the projection type lithography is the one of most fascinateing candidate for future excess 1 G electronics device fabrication. For realizing this technology as a successor of Excimer and/or proximity x-ray lithography, a long range research and development have already started in Japan, at first individual necessitate component such as conpact SR source, typically SiC substrate mirror and multilayer mirror fabrications, including optical design works [5] for this purpose.
{"title":"The State of Soft X-ray Projection Lithography in Japan","authors":"S. Ogura","doi":"10.1364/sxray.1992.ma4","DOIUrl":"https://doi.org/10.1364/sxray.1992.ma4","url":null,"abstract":"Soft X-ray projection type Lithography has been expected to be most atractive technology in future electronics device production, paticularly since the realization of normal incidence soft x-ray mirror [1]. For instance, Kinoshita et al [2] and other groups [3,4] have already shown the feasibility of this technology, adopting a Schwartzschild optical system composed of normal mirrors. If neglecting process speed or throughput, it is widely accepted the projection type lithography is the one of most fascinateing candidate for future excess 1 G electronics device fabrication. For realizing this technology as a successor of Excimer and/or proximity x-ray lithography, a long range research and development have already started in Japan, at first individual necessitate component such as conpact SR source, typically SiC substrate mirror and multilayer mirror fabrications, including optical design works [5] for this purpose.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123226110","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
K. Early, D. Tennant, D. Jeon, P. Mulgrew, A. MacDowell, O. Wood, G. Kubiak, D. Tichenor
To be useful for integrated circuit (IC) manufacturing, a resist process must be capable of high throughput and exhibit good pattern transfer capability, as well as demonstrate high resolution. In 1990, imaging of 50 nm-wide lines and spaces in polymethyl methacrylate (PMMA) resist, using a 20× Schwarzschild optic at λ = 14 nm, was reported.1,2 PMMA has long been known for its extremely high resolution and good process latitude, but its low sensitivity and poor plasma etch resistance make it an unlikely candidate for an IC fabrication process.
{"title":"Characterization of Ray-PN Resist for Soft-X-Ray Projection Lithography","authors":"K. Early, D. Tennant, D. Jeon, P. Mulgrew, A. MacDowell, O. Wood, G. Kubiak, D. Tichenor","doi":"10.1364/sxray.1992.wc3","DOIUrl":"https://doi.org/10.1364/sxray.1992.wc3","url":null,"abstract":"To be useful for integrated circuit (IC) manufacturing, a resist process must be capable of high throughput and exhibit good pattern transfer capability, as well as demonstrate high resolution. In 1990, imaging of 50 nm-wide lines and spaces in polymethyl methacrylate (PMMA) resist, using a 20× Schwarzschild optic at λ = 14 nm, was reported.1,2 PMMA has long been known for its extremely high resolution and good process latitude, but its low sensitivity and poor plasma etch resistance make it an unlikely candidate for an IC fabrication process.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"25 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131179272","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Because of the growing importance of extreme ultraviolet radiation, there is considerable interest in high intensity laboratory sources for this spectral range. A variety of sources have been proposed for these wavelengths, and many of these are described in the classic book of Samson (1967). Most of these sources have substantial limitations, especially those that are intended for use below 1200 Å. We (Paresce et al. 1971) and others have developed continuous discharge sources which are stable and maintenance-free and which provide a large number of intense lines at wavelengths down to ~300 Å. Soft X-ray sources of the type developed and refined by Henke (1975) are capable of producing substantial amounts of soft X-ray radiation. However, these sources have severe limitations for use at wavelengths longer than ~50 Å. For example, much of the radiation produced is continuum radiation with rather low flux at any specific line. In addition, the flux is peaked at shorter wavelengths. When dispersed by a grazing incidence monochromator, wavelengths at first order and many higher orders emerge from the exit slit, rather than a true monochromatic flux which is usually desired. Essentially the only sources available that can provide reasonable flux levels at wavelengths between 50 and 300 Å are capacitive discharge sources with attendant problems of severe electromagnetic interference, and plasma discharge sources.
由于极紫外辐射的重要性日益增加，对这一光谱范围的高强度实验室光源有相当大的兴趣。针对这些波长提出了各种各样的光源，其中许多都在Samson(1967)的经典著作中进行了描述。这些来源中的大多数都有很大的限制，特别是那些打算用于1200 Å以下的来源。我们(Paresce et al. 1971)和其他人已经开发出稳定且免维护的连续放电源，并在波长低至~300 Å的情况下提供大量强谱线。Henke(1975)开发和改进的软x射线源能够产生大量的软x射线辐射。然而，这些光源对于波长超过~50 Å的使用有严重的限制。例如，产生的大部分辐射是连续辐射，在任何特定线上的通量都相当低。此外，通量在较短波长处达到峰值。当被掠入射单色器分散时，一阶和许多更高阶的波长从出口狭缝出现，而不是通常期望的真正的单色通量。从本质上讲，唯一可用的可以在波长50到300 Å之间提供合理通量水平的源是伴随严重电磁干扰问题的电容放电源和等离子体放电源。
{"title":"A Continuous Emission Source Covering the 50 to 300 Angstrom Band","authors":"S. Bowyer","doi":"10.1364/sxray.1992.mc4","DOIUrl":"https://doi.org/10.1364/sxray.1992.mc4","url":null,"abstract":"Because of the growing importance of extreme ultraviolet radiation, there is considerable interest in high intensity laboratory sources for this spectral range. A variety of sources have been proposed for these wavelengths, and many of these are described in the classic book of Samson (1967). Most of these sources have substantial limitations, especially those that are intended for use below 1200 Å. We (Paresce et al. 1971) and others have developed continuous discharge sources which are stable and maintenance-free and which provide a large number of intense lines at wavelengths down to ~300 Å. Soft X-ray sources of the type developed and refined by Henke (1975) are capable of producing substantial amounts of soft X-ray radiation. However, these sources have severe limitations for use at wavelengths longer than ~50 Å. For example, much of the radiation produced is continuum radiation with rather low flux at any specific line. In addition, the flux is peaked at shorter wavelengths. When dispersed by a grazing incidence monochromator, wavelengths at first order and many higher orders emerge from the exit slit, rather than a true monochromatic flux which is usually desired. Essentially the only sources available that can provide reasonable flux levels at wavelengths between 50 and 300 Å are capacitive discharge sources with attendant problems of severe electromagnetic interference, and plasma discharge sources.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116076901","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
One of the most important requirements for soft x-ray optics is high normal incidence reflectivity. But to ensure a high throughput optical system, Schwarzchild objectives in particular, it is not only necessary to fabricate multilayer coatings with the highest possible reflectivity but to achieve the designed d-spacing uniformity/grading and match the d-spacings of the concave and convex mirrors. The latter is especially important for high throughput multi-mirror lithography optical schemes.[1]
{"title":"Multilayer Performance for Soft X-ray Schwarzchild Optics","authors":"G. Gutman, K. Parker, J. Wood, R. Watts","doi":"10.1364/sxray.1992.tub4","DOIUrl":"https://doi.org/10.1364/sxray.1992.tub4","url":null,"abstract":"One of the most important requirements for soft x-ray optics is high normal incidence reflectivity. But to ensure a high throughput optical system, Schwarzchild objectives in particular, it is not only necessary to fabricate multilayer coatings with the highest possible reflectivity but to achieve the designed d-spacing uniformity/grading and match the d-spacings of the concave and convex mirrors. The latter is especially important for high throughput multi-mirror lithography optical schemes.[1]","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"44 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124840276","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
30 layers of Ta/Si alternative structure prepared by plane magneton sputtering has been ehoosen for 234A x-ray mirror. Its characterizations indicated that it is expected to get the real reflectivity of about 10%.
{"title":"Sputtering Deposited Ta/Si Soft X-ray Multilayer Mirror","authors":"Shao Jianda, Fan Zhengxiu","doi":"10.1364/sxray.1992.pd6","DOIUrl":"https://doi.org/10.1364/sxray.1992.pd6","url":null,"abstract":"30 layers of Ta/Si alternative structure prepared by plane magneton sputtering has been ehoosen for 234A x-ray mirror. Its characterizations indicated that it is expected to get the real reflectivity of about 10%.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129994224","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
K. Tanaka, M. Kado, H. Daido, T. Yamanaka, S. Nakai, K. Yamashita, S. Kitamoto
X-ray imaging optics have been essential diagnostics in inertial confinement fusion (ICF) research. A micro pellet (<1mm dia.) is irradiated by a giant multi-beam laser system. This pellet is imploded to create a thermonuclear fusion condition, making use of the inertia of the imploding pellet wall. It is of critical importance for ICF to measure nonuniformities at the implosion core(~ 100μm) or the laser spot in order to drive the pellet to a very high density. Such measurements require a spatial resolution of less than 1μm. We have chosen to build a Schwarzschild type x-ray microscope with a magnification of 15. This x-ray microscope can be applied to fields other than laser fusion, such as lithography, biology’ and medicine. This can be a powerful tool when coupled with laser plasma x rays(LAPLAX), since the high brightness and temporal resolution (<1ns) of LAPLAX is added to the high spatial resolution.
{"title":"Schwarzschild microscope at λ =7 nm","authors":"K. Tanaka, M. Kado, H. Daido, T. Yamanaka, S. Nakai, K. Yamashita, S. Kitamoto","doi":"10.1364/sxray.1991.tha3","DOIUrl":"https://doi.org/10.1364/sxray.1991.tha3","url":null,"abstract":"X-ray imaging optics have been essential diagnostics in inertial confinement fusion (ICF) research. A micro pellet (<1mm dia.) is irradiated by a giant multi-beam laser system. This pellet is imploded to create a thermonuclear fusion condition, making use of the inertia of the imploding pellet wall. It is of critical importance for ICF to measure nonuniformities at the implosion core(~ 100μm) or the laser spot in order to drive the pellet to a very high density. Such measurements require a spatial resolution of less than 1μm. We have chosen to build a Schwarzschild type x-ray microscope with a magnification of 15. This x-ray microscope can be applied to fields other than laser fusion, such as lithography, biology’ and medicine. This can be a powerful tool when coupled with laser plasma x rays(LAPLAX), since the high brightness and temporal resolution (<1ns) of LAPLAX is added to the high spatial resolution.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"41 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126988393","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Illumination systems are often given too little thought, since the main lens in a projector is usually much more difficult, and because many of the effects of non-optimimum illumination are too small to be noticed in many applications. For modern chip lithography, however, nothing can be assumed negligible.
{"title":"Illumination Requirements for Optical Projectors: and how to think about them","authors":"D. Goodman","doi":"10.1364/sxray.1991.fb1","DOIUrl":"https://doi.org/10.1364/sxray.1991.fb1","url":null,"abstract":"Illumination systems are often given too little thought, since the main lens in a projector is usually much more difficult, and because many of the effects of non-optimimum illumination are too small to be noticed in many applications. For modern chip lithography, however, nothing can be assumed negligible.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123738932","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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