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Accuracy Analyses of FDTD Resonance Frequency Calculations for a Partially Dielectric-Filled Cavity
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-01-05 DOI: 10.1002/jnm.70011
Osman S. Bişkin, Talha Saydam, Serkan Aksoy
<div> <p>In this study, accuracy analyses of resonance frequency calculations for a three-dimensional partially dielectric-filled cavity are investigated by using finite difference time domain (FDTD) method. The calculations are performed for low- and high-contrast lossless dielectric materials. In order to excite multicavity modes, the cavity is driven by a Gaussian pulse source. The main error sources for the numerical resonance frequency calculations of the partially dielectric-filled cavity are (i) applied technique for treatment of a dielectric interface between free space and material medium and (ii) numerical dispersion of the FDTD method. The effects of these errors are analyzed both in detail. A no averaging (without any averaging), a proper averaging technique for the low-/high-contrast case, and the dielectric functioning technique with three different distances of <span></span><math> <semantics> <mrow> <mrow> <mn>3</mn> <mo>∆</mo> <mi>z</mi> </mrow> <mo>,</mo> <mrow> <mn>5</mn> <mo>∆</mo> <mi>z</mi> </mrow> <mo>,</mo> <mrow> <mtext>and</mtext> <mspace></mspace> <mrow> <mn>7</mn> <mo>∆</mo> <mi>z</mi> </mrow> </mrow> </mrow> <annotation>$$ 3Delta z,5Delta z,mathrm{and} 7Delta z $$</annotation> </semantics></math> are applied for the treatment of dielectric interface. Additionally, four spatial resolutions of <span></span><math> <semantics> <mrow> <mi>λ</mi> <mo>⁄</mo> <mn>10</mn> </mrow> <annotation>$$ lambda /10 $$</annotation> </semantics></math>, <span></span><math> <semantics> <mrow> <mi>λ</mi> <mo>⁄</mo> <mn>20</mn> </mrow> <annotation>$$ lambda /20 $$</annotation> </semantics></math>, <span></span><math> <semantics> <mrow> <mi>λ</mi> <mo>⁄</mo> <mn>30</mn> </mrow> <annotation>$$ lambda /30 $$</annotation> </semantics></math>, and <span></span><math> <semantics> <mrow> <mi>λ</mi> <mo>⁄</mo> <mn>40</mn> </mrow> <annotation>$$ lambda /40 $$</annotation> </semantics></math> are used for the numerical dispersion analyses. The calculated results
{"title":"Accuracy Analyses of FDTD Resonance Frequency Calculations for a Partially Dielectric-Filled Cavity","authors":"Osman S. Bişkin,&nbsp;Talha Saydam,&nbsp;Serkan Aksoy","doi":"10.1002/jnm.70011","DOIUrl":"https://doi.org/10.1002/jnm.70011","url":null,"abstract":"&lt;div&gt;\u0000 \u0000 &lt;p&gt;In this study, accuracy analyses of resonance frequency calculations for a three-dimensional partially dielectric-filled cavity are investigated by using finite difference time domain (FDTD) method. The calculations are performed for low- and high-contrast lossless dielectric materials. In order to excite multicavity modes, the cavity is driven by a Gaussian pulse source. The main error sources for the numerical resonance frequency calculations of the partially dielectric-filled cavity are (i) applied technique for treatment of a dielectric interface between free space and material medium and (ii) numerical dispersion of the FDTD method. The effects of these errors are analyzed both in detail. A no averaging (without any averaging), a proper averaging technique for the low-/high-contrast case, and the dielectric functioning technique with three different distances of &lt;span&gt;&lt;/span&gt;&lt;math&gt;\u0000 &lt;semantics&gt;\u0000 &lt;mrow&gt;\u0000 &lt;mrow&gt;\u0000 &lt;mn&gt;3&lt;/mn&gt;\u0000 &lt;mo&gt;∆&lt;/mo&gt;\u0000 &lt;mi&gt;z&lt;/mi&gt;\u0000 &lt;/mrow&gt;\u0000 &lt;mo&gt;,&lt;/mo&gt;\u0000 &lt;mrow&gt;\u0000 &lt;mn&gt;5&lt;/mn&gt;\u0000 &lt;mo&gt;∆&lt;/mo&gt;\u0000 &lt;mi&gt;z&lt;/mi&gt;\u0000 &lt;/mrow&gt;\u0000 &lt;mo&gt;,&lt;/mo&gt;\u0000 &lt;mrow&gt;\u0000 &lt;mtext&gt;and&lt;/mtext&gt;\u0000 &lt;mspace&gt;&lt;/mspace&gt;\u0000 &lt;mrow&gt;\u0000 &lt;mn&gt;7&lt;/mn&gt;\u0000 &lt;mo&gt;∆&lt;/mo&gt;\u0000 &lt;mi&gt;z&lt;/mi&gt;\u0000 &lt;/mrow&gt;\u0000 &lt;/mrow&gt;\u0000 &lt;/mrow&gt;\u0000 &lt;annotation&gt;$$ 3Delta z,5Delta z,mathrm{and} 7Delta z $$&lt;/annotation&gt;\u0000 &lt;/semantics&gt;&lt;/math&gt; are applied for the treatment of dielectric interface. Additionally, four spatial resolutions of &lt;span&gt;&lt;/span&gt;&lt;math&gt;\u0000 &lt;semantics&gt;\u0000 &lt;mrow&gt;\u0000 &lt;mi&gt;λ&lt;/mi&gt;\u0000 &lt;mo&gt;⁄&lt;/mo&gt;\u0000 &lt;mn&gt;10&lt;/mn&gt;\u0000 &lt;/mrow&gt;\u0000 &lt;annotation&gt;$$ lambda /10 $$&lt;/annotation&gt;\u0000 &lt;/semantics&gt;&lt;/math&gt;, &lt;span&gt;&lt;/span&gt;&lt;math&gt;\u0000 &lt;semantics&gt;\u0000 &lt;mrow&gt;\u0000 &lt;mi&gt;λ&lt;/mi&gt;\u0000 &lt;mo&gt;⁄&lt;/mo&gt;\u0000 &lt;mn&gt;20&lt;/mn&gt;\u0000 &lt;/mrow&gt;\u0000 &lt;annotation&gt;$$ lambda /20 $$&lt;/annotation&gt;\u0000 &lt;/semantics&gt;&lt;/math&gt;, &lt;span&gt;&lt;/span&gt;&lt;math&gt;\u0000 &lt;semantics&gt;\u0000 &lt;mrow&gt;\u0000 &lt;mi&gt;λ&lt;/mi&gt;\u0000 &lt;mo&gt;⁄&lt;/mo&gt;\u0000 &lt;mn&gt;30&lt;/mn&gt;\u0000 &lt;/mrow&gt;\u0000 &lt;annotation&gt;$$ lambda /30 $$&lt;/annotation&gt;\u0000 &lt;/semantics&gt;&lt;/math&gt;, and &lt;span&gt;&lt;/span&gt;&lt;math&gt;\u0000 &lt;semantics&gt;\u0000 &lt;mrow&gt;\u0000 &lt;mi&gt;λ&lt;/mi&gt;\u0000 &lt;mo&gt;⁄&lt;/mo&gt;\u0000 &lt;mn&gt;40&lt;/mn&gt;\u0000 &lt;/mrow&gt;\u0000 &lt;annotation&gt;$$ lambda /40 $$&lt;/annotation&gt;\u0000 &lt;/semantics&gt;&lt;/math&gt; are used for the numerical dispersion analyses. The calculated results ","PeriodicalId":50300,"journal":{"name":"International Journal of Numerical Modelling-Electronic Networks Devices and Fields","volume":"38 1","pages":""},"PeriodicalIF":1.6,"publicationDate":"2025-01-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143112194","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Hyperparameter Optimized SVR Model Based on Particle Swarm Algorithm for RF Power Transistors
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-01-05 DOI: 10.1002/jnm.70013
Zhiwei Gao, Bo Liu, Giovanni Crupi, Jialin Cai

A novel approach for optimizing the hyperparameters of a support vector regression (SVR) model is presented for radio frequency (RF) power transistors. In standard SVR models, hyperparameters are enhanced using grid search optimization (GSO), which can be inefficient. In this study, particle swarm optimization (PSO) is introduced as a method for optimizing hyperparameters in a SVR model that increases the model optimization efficiency significantly in comparison with GSO while maintaining a high level of performance. To verify the accuracy and effectiveness of the model, a 10-W GaN power transistor produced by Wolfspeed is used. In comparison to the existing GSO-SVR model, the proposed PSO-SVR model demonstrates superior performance and efficiency.

{"title":"Hyperparameter Optimized SVR Model Based on Particle Swarm Algorithm for RF Power Transistors","authors":"Zhiwei Gao,&nbsp;Bo Liu,&nbsp;Giovanni Crupi,&nbsp;Jialin Cai","doi":"10.1002/jnm.70013","DOIUrl":"https://doi.org/10.1002/jnm.70013","url":null,"abstract":"<div>\u0000 \u0000 <p>A novel approach for optimizing the hyperparameters of a support vector regression (SVR) model is presented for radio frequency (RF) power transistors. In standard SVR models, hyperparameters are enhanced using grid search optimization (GSO), which can be inefficient. In this study, particle swarm optimization (PSO) is introduced as a method for optimizing hyperparameters in a SVR model that increases the model optimization efficiency significantly in comparison with GSO while maintaining a high level of performance. To verify the accuracy and effectiveness of the model, a 10-W GaN power transistor produced by Wolfspeed is used. In comparison to the existing GSO-SVR model, the proposed PSO-SVR model demonstrates superior performance and efficiency.</p>\u0000 </div>","PeriodicalId":50300,"journal":{"name":"International Journal of Numerical Modelling-Electronic Networks Devices and Fields","volume":"38 1","pages":""},"PeriodicalIF":1.6,"publicationDate":"2025-01-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143112411","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
An Analytical Subthreshold I–V Model of SiC Double Gate JFETs
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-12-26 DOI: 10.1002/jnm.70008
Yi Li, Tao Zhou, Zixuan Guo, Yuqiu Yang, Junyao Wu, Huan Cai, Jun Wang, Jungang Yin, Qin Liu, Linfeng Deng

SiC double gate (DG) junction field effect transistor (JFET) is promising for low-noise and high-temperature electronics. Existing studies indicate that JFETs can be considered a special case of MOSFETs when the oxide layer thickness approaches zero. In this article, we exploited the structural similarity between the DG JFETs and the DG MOSFETs. By obtaining the 2D Poisson's equation for the DG MOSFETs and deriving the limits, we developed a model for calculating the channel current of SiC DG JFETs in the subthreshold region. The model is derived from device physics, requiring no fitting parameters and offering relatively low computational complexity. The results indicate that, whether for enhancement mode or depletion mode JFETs, the calculated values of this model are in good agreement with the 2D numerical analysis results obtained from Silvaco Atlas. Moreover, for enhancement mode JFETs, even when significant short-channel effects occur, the subthreshold current can still be well predicted. In addition, the model displays predictive capability for the depletion-mode JFETs.

{"title":"An Analytical Subthreshold I–V Model of SiC Double Gate JFETs","authors":"Yi Li,&nbsp;Tao Zhou,&nbsp;Zixuan Guo,&nbsp;Yuqiu Yang,&nbsp;Junyao Wu,&nbsp;Huan Cai,&nbsp;Jun Wang,&nbsp;Jungang Yin,&nbsp;Qin Liu,&nbsp;Linfeng Deng","doi":"10.1002/jnm.70008","DOIUrl":"https://doi.org/10.1002/jnm.70008","url":null,"abstract":"<div>\u0000 \u0000 <p>SiC double gate (DG) junction field effect transistor (JFET) is promising for low-noise and high-temperature electronics. Existing studies indicate that JFETs can be considered a special case of MOSFETs when the oxide layer thickness approaches zero. In this article, we exploited the structural similarity between the DG JFETs and the DG MOSFETs. By obtaining the 2D Poisson's equation for the DG MOSFETs and deriving the limits, we developed a model for calculating the channel current of SiC DG JFETs in the subthreshold region. The model is derived from device physics, requiring no fitting parameters and offering relatively low computational complexity. The results indicate that, whether for enhancement mode or depletion mode JFETs, the calculated values of this model are in good agreement with the 2D numerical analysis results obtained from Silvaco Atlas. Moreover, for enhancement mode JFETs, even when significant short-channel effects occur, the subthreshold current can still be well predicted. In addition, the model displays predictive capability for the depletion-mode JFETs.</p>\u0000 </div>","PeriodicalId":50300,"journal":{"name":"International Journal of Numerical Modelling-Electronic Networks Devices and Fields","volume":"38 1","pages":""},"PeriodicalIF":1.6,"publicationDate":"2024-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143119492","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design and Analysis of High-Performance Schottky Barrier β-Ga2O3 MOSFET With Enhanced Drain Current, Breakdown Voltage, and PFOM
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-12-25 DOI: 10.1002/jnm.70009
Md Zafar Alam, Imran Ahmed Khan, S. Intekhab Amin, Aadil Anam, Mirza Tariq Beg

In this article, a Schottky barrier β-Ga2O3 MOSFET is proposed. It shows improvements in drain saturation current, Ion/Ioff ratio, transconductance, and off-state breakdown voltage. The proposed design, which implements the Schottky barrier source and drain contacts, has led to reduced on-state resistance (Ron), reduced forward voltage drops, faster switching speed, higher frequency, and improved efficiency. After device optimization, we determined that a source and drain having a work function of 3.90 eV result in the highest drain saturation current of (Ids) 264 mA. Additionally, in the transfer characteristics, we demonstrate that increasing the channel doping concentration led to a shift toward depletion mode operation, while decreasing the doping concentration moved the device toward enhancement mode at the cost of drain current. Analysis of lattice temperature and self-heating effects on different substrates has also been performed. Furthermore, introducing a passivation layer of SiO2 as a gate oxide and an unintentionally doped (UID) layer of 400 nm doping concentration of 1.5 × 1015 cm−3, results in further significant improvements in the drain saturation current (Ids) of 624 mA and transconductance of 38.09 mS, approximately doubling their values compared with the device without a passivation layer of SiO2 and an Ion/Ioff ratio of 1015, and the device's performance at various substrate temperatures has been evaluated. In addition, the inclusion of a passivation layer of SiO2 improves the breakdown voltage to 2385 V, which is significantly high compared with the conventional device. Moreover, the lower specific-on-resistance Ron,sp of 7.6 mΩ/cm2 and higher breakdown voltage then the high-power figure of merit (PFOM) (BV2/Ron,sp) of 748 MW/cm2 have been achieved.

{"title":"Design and Analysis of High-Performance Schottky Barrier β-Ga2O3 MOSFET With Enhanced Drain Current, Breakdown Voltage, and PFOM","authors":"Md Zafar Alam,&nbsp;Imran Ahmed Khan,&nbsp;S. Intekhab Amin,&nbsp;Aadil Anam,&nbsp;Mirza Tariq Beg","doi":"10.1002/jnm.70009","DOIUrl":"https://doi.org/10.1002/jnm.70009","url":null,"abstract":"<div>\u0000 \u0000 <p>In this article, a Schottky barrier β-Ga<sub>2</sub>O<sub>3</sub> MOSFET is proposed. It shows improvements in drain saturation current, <i>I</i><sub>on</sub>/<i>I</i><sub>off</sub> ratio, transconductance, and off-state breakdown voltage. The proposed design, which implements the Schottky barrier source and drain contacts, has led to reduced on-state resistance (<i>R</i><sub>on</sub>), reduced forward voltage drops, faster switching speed, higher frequency, and improved efficiency. After device optimization, we determined that a source and drain having a work function of 3.90 eV result in the highest drain saturation current of (<i>I</i><sub>ds</sub>) 264 mA. Additionally, in the transfer characteristics, we demonstrate that increasing the channel doping concentration led to a shift toward depletion mode operation, while decreasing the doping concentration moved the device toward enhancement mode at the cost of drain current. Analysis of lattice temperature and self-heating effects on different substrates has also been performed. Furthermore, introducing a passivation layer of SiO<sub>2</sub> as a gate oxide and an unintentionally doped (UID) layer of 400 nm doping concentration of 1.5 × 10<sup>15</sup> cm<sup>−3</sup>, results in further significant improvements in the drain saturation current (<i>I</i><sub>ds</sub>) of 624 mA and transconductance of 38.09 mS, approximately doubling their values compared with the device without a passivation layer of SiO<sub>2</sub> and an <i>I</i><sub>on</sub>/<i>I</i><sub>off</sub> ratio of 10<sup>15</sup>, and the device's performance at various substrate temperatures has been evaluated. In addition, the inclusion of a passivation layer of SiO<sub>2</sub> improves the breakdown voltage to 2385 V, which is significantly high compared with the conventional device. Moreover, the lower specific-on-resistance <i>R</i><sub>on,sp</sub> of 7.6 mΩ/cm<sup>2</sup> and higher breakdown voltage then the high-power figure of merit (PFOM) (BV<sup>2</sup>/<i>R</i><sub>on,sp</sub>) of 748 MW/cm<sup>2</sup> have been achieved.</p>\u0000 </div>","PeriodicalId":50300,"journal":{"name":"International Journal of Numerical Modelling-Electronic Networks Devices and Fields","volume":"38 1","pages":""},"PeriodicalIF":1.6,"publicationDate":"2024-12-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143119110","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design and Optimization of Multilayered Microwave Absorber Structures for X-Band Frequencies: Application on Composite Materials Comprising Ceramic, Polyaniline/Magnetite, and Carbon Nanotubes
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-12-25 DOI: 10.1002/jnm.70006
Benzaoui Karim, Ales Achour, Medjaouri Youcef Amin, Zaoui Abdelhalim

The characteristics of multilayered microwave absorbing materials are very efficient compared with those of single layer. In this article, a hybrid optimization algorithm (genetic algorithm + pattern search) combined with transmission line matrix method has been presented. The selection of parameters, including the arrangement of layers, thickness of layers, absorption index, and shielding efficiency, forms the foundation of this process. The optimization algorithm was applied to two new multilayered structures. The first structure consists of conductive layers (CLs) of carbon nanotube (CNT) with ceramic layers of zirconium dioxide ZrO2$$ left({mathrm{ZrO}}_2right) $$. The second structure includes CLs of CNT with layers based on magnetite polyaniline nanomaterial (PANI_Fe3O4$$ {mathrm{Fe}}_3{mathrm{O}}_4 $$). Performances of both structures were evaluated in the X-band frequency range. Simulation results showed that both designs have higher absorption index picks (> 90%) and, low S11$$ {S}_{11} $$ magnitude value with low layer thickness. This approach offers a solid foundation for future experimental trials in the development of efficient microwave absorbing and shielding structures with tunable electromagnetic performances suitable for X-band applications.

{"title":"Design and Optimization of Multilayered Microwave Absorber Structures for X-Band Frequencies: Application on Composite Materials Comprising Ceramic, Polyaniline/Magnetite, and Carbon Nanotubes","authors":"Benzaoui Karim,&nbsp;Ales Achour,&nbsp;Medjaouri Youcef Amin,&nbsp;Zaoui Abdelhalim","doi":"10.1002/jnm.70006","DOIUrl":"https://doi.org/10.1002/jnm.70006","url":null,"abstract":"<div>\u0000 \u0000 <p>The characteristics of multilayered microwave absorbing materials are very efficient compared with those of single layer. In this article, a hybrid optimization algorithm (genetic algorithm + pattern search) combined with transmission line matrix method has been presented. The selection of parameters, including the arrangement of layers, thickness of layers, absorption index, and shielding efficiency, forms the foundation of this process. The optimization algorithm was applied to two new multilayered structures. The first structure consists of conductive layers (CLs) of carbon nanotube (CNT) with ceramic layers of zirconium dioxide <span></span><math>\u0000 <semantics>\u0000 <mrow>\u0000 <mfenced>\u0000 <msub>\u0000 <mi>ZrO</mi>\u0000 <mn>2</mn>\u0000 </msub>\u0000 </mfenced>\u0000 </mrow>\u0000 <annotation>$$ left({mathrm{ZrO}}_2right) $$</annotation>\u0000 </semantics></math>. The second structure includes CLs of CNT with layers based on magnetite polyaniline nanomaterial (PANI_<span></span><math>\u0000 <semantics>\u0000 <mrow>\u0000 <msub>\u0000 <mi>Fe</mi>\u0000 <mn>3</mn>\u0000 </msub>\u0000 <msub>\u0000 <mi>O</mi>\u0000 <mn>4</mn>\u0000 </msub>\u0000 </mrow>\u0000 <annotation>$$ {mathrm{Fe}}_3{mathrm{O}}_4 $$</annotation>\u0000 </semantics></math>). Performances of both structures were evaluated in the X-band frequency range. Simulation results showed that both designs have higher absorption index picks (&gt; 90%) and, low <span></span><math>\u0000 <semantics>\u0000 <mrow>\u0000 <msub>\u0000 <mi>S</mi>\u0000 <mn>11</mn>\u0000 </msub>\u0000 </mrow>\u0000 <annotation>$$ {S}_{11} $$</annotation>\u0000 </semantics></math> magnitude value with low layer thickness. This approach offers a solid foundation for future experimental trials in the development of efficient microwave absorbing and shielding structures with tunable electromagnetic performances suitable for X-band applications.</p>\u0000 </div>","PeriodicalId":50300,"journal":{"name":"International Journal of Numerical Modelling-Electronic Networks Devices and Fields","volume":"38 1","pages":""},"PeriodicalIF":1.6,"publicationDate":"2024-12-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143119166","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design and Analysis of Microstrip Line Fed Gap Coupled Triple Band Slotted Patch Antenna for WiMAX, WLAN, and Sub-6 GHz 5G Applications 用于WiMAX、WLAN和Sub-6 GHz 5G应用的微带线馈隙耦合三带开槽贴片天线设计与分析
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-12-10 DOI: 10.1002/jnm.70005
Ramesh Kumar Verma, Vikram Bali, Akhilesh Kumar, Prabina Pattanayak, Ravi Kant Prasad, Maninder Singh

This paper presents a gap coupled triple band slot loaded microstrip patch antenna with parasitic patches. It consist inverted U-shape and inverted T-shape open-ended slots along with a rectangular slot at center of patch. The inverted U-shape open-ended slot generates a driven patch at bottom side and an inverted U-shape parasitic patch at middle side of patch while inverted T-shape open-ended slot generates two rectangular shape parasitic patches of same dimension at top side of patch. The proposed gap coupled antenna covers 2.29 to 2.77 GHz in first band, 3.25 to 3.65 GHz in second band and 4.67 to 5.72 GHz in third band with return losses of −23.2, −19.90, and −38.06 dB, respectively. The proposed antenna resonates at 2.57, 3.48, and 5.37 GHz with fractional bandwidth of 18.97% (480 MHz), 11.59% (400 MHz), and 20.21% (1050 MHz), respectively. The return loss and bandwidth of presented antenna is increases gradually by loading inverted U-shape and inverted T-shape open-ended slots along with a rectangular slot in antenna patch. The proposed antenna exhibits stable peak gain of 4.45, 4.81, and 5.26 dBi and efficiency of 89.5%, 89%, and 90% in three resonating bands. The antenna resonating bands are applicable for WiMAX: 2.5/3.5/5.5 GHz (2.5–2.69, 3.4–3.69, and 5.25–5.85 GHz), WLAN: 2.4/5.2 GHz (2.4–2.484 and 5.15–5.35 GHz) and sub-6 GHz 5G: 3.5 GHz (3.3–3.8 GHz). The size of antenna is 40 mm × 50 mm (0.34 × 0.43λ02$$ 0.43{lambda}_0^2 $$ at frequency 2.57 GHz). The gap coupled antenna geometry is fed by microstrip line feed and simulated by IE3D simulation tool.

提出了一种带寄生贴片的间隙耦合三频带缝隙加载微带贴片天线。由倒u型开口槽和倒t型开口槽组成,并在贴片中心开有一个矩形槽。倒u形开口槽在贴片的底部产生一个驱动贴片,在贴片的中部产生一个倒u形寄生贴片,而倒t形开口槽在贴片的顶部产生两个相同尺寸的矩形寄生贴片。该间隙耦合天线覆盖第一频段2.29 ~ 2.77 GHz、第二频段3.25 ~ 3.65 GHz和第三频段4.67 ~ 5.72 GHz,回波损耗分别为- 23.2、- 19.90和- 38.06 dB。该天线谐振频率为2.57、3.48和5.37 GHz,分数带宽为18.97% (480 MHz), 11.59% (400 MHz), and 20.21% (1050 MHz), respectively. The return loss and bandwidth of presented antenna is increases gradually by loading inverted U-shape and inverted T-shape open-ended slots along with a rectangular slot in antenna patch. The proposed antenna exhibits stable peak gain of 4.45, 4.81, and 5.26 dBi and efficiency of 89.5%, 89%, and 90% in three resonating bands. The antenna resonating bands are applicable for WiMAX: 2.5/3.5/5.5 GHz (2.5–2.69, 3.4–3.69, and 5.25–5.85 GHz), WLAN: 2.4/5.2 GHz (2.4–2.484 and 5.15–5.35 GHz) and sub-6 GHz 5G: 3.5 GHz (3.3–3.8 GHz). The size of antenna is 40 mm × 50 mm (0.34 ×  0.43 λ 0 2 $$ 0.43{lambda}_0^2 $$ at frequency 2.57 GHz). The gap coupled antenna geometry is fed by microstrip line feed and simulated by IE3D simulation tool.
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引用次数: 0
Enhancing FeFET Structures for Non-Volatile On-Chip Memories: Design and Comparative Analysis 增强非易失性片上存储器的ffet结构:设计与比较分析
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-12-04 DOI: 10.1002/jnm.70004
Mandeep Singh, Tarun Chaudhary, Balwinder Raj

FeFET architectures for non-volatile on-chip memory are designed and compared in this investigation study. Because of its inherent non-volatile properties and low power requirements, FeFETs are attracting a lot of interest as prospective candidates for future memory technology. The aim of this paper is to investigate several FeFET designs and assess how well they function in terms of important factors including durability, retention, speed, and endurance. Using device simulations and experimental data, a number of FeFET architectures, such as MFS, MFIS, MFMIS, and MF-ABO3, are analyzed and contrasted. Comparative study gives light on the advantages and disadvantages of various FeFET architectures; improving our comprehension of how well-suited they are for non-volatile on-chip memory. This work will contribute to the improvement of FeFET devices for upcoming integrated circuits and progress the development of sophisticated FeFET-based memory techniques.

本研究设计并比较了非易失性片上存储器的效应场效应晶体管结构。由于其固有的非易失性和低功耗要求,fefet作为未来存储技术的潜在候选者吸引了很多人的兴趣。本文的目的是研究几种FeFET设计,并评估它们在耐用性、保持性、速度和耐用性等重要因素方面的功能。利用器件仿真和实验数据,对MFS、MFIS、MFMIS和MF-ABO3等几种ffet结构进行了分析和对比。比较研究揭示了各种ffet结构的优缺点;提高我们对它们如何适合非易失性片上存储器的理解。这项工作将有助于未来集成电路中ffet器件的改进,并推动基于ffet的复杂存储技术的发展。
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引用次数: 0
SG-FET Based Spiking Neuron With Ultra-Low Energy Consumption for ECG Signal Classification 基于SG-FET的超低能耗尖峰神经元心电信号分类
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-12-02 DOI: 10.1002/jnm.70003
Babar M. Zargar, Mudasir A. Khanday, Farooq A. Khanday

This paper presents an energy-efficient single-transistor leaky integrate-and-fire neuron, based on Suspended Gate-FET (SG-FET), for signal classification and neuromorphic computing applications. By leveraging the SG-FET model, extensive simulations were conducted to demonstrate the device's remarkable neuronal ability. The device faithfully emulated the intricate behaviour of biological neurons, without the need for external circuitry. One of the standout achievements lies in the device's astonishingly low energy consumption of 94.5 aJ per spike. Therefore, it outperforms the previously proposed one-transistor (1-T) neurons, which makes it a potential candidate for energy-efficient neuromorphic computing. To verify the practical viability of the device, an emulation was seamlessly integrated into a spiking neural network framework, allowing for real-time signal classification. In this specific case, the device excelled in the classification of electrocardiogram (ECG) signals, achieving an impressive accuracy rate of 85.6%. This outcome highlights the device's efficacy in handling real-world signal processing tasks with remarkable precision and efficiency.

本文提出了一种基于悬浮栅场效应晶体管(SG-FET)的高能效单晶体管漏积点火神经元,用于信号分类和神经形态计算。通过利用SG-FET模型,进行了大量的模拟,以证明该设备具有卓越的神经元能力。该装置忠实地模拟了生物神经元的复杂行为,而不需要外部电路。其中一个突出的成就在于该器件的能耗低得惊人,每脉冲94.5 aJ。因此,它优于先前提出的单晶体管(1-T)神经元,这使其成为节能神经形态计算的潜在候选者。为了验证该设备的实际可行性,仿真被无缝集成到一个峰值神经网络框架中,允许实时信号分类。在这个特定的案例中,该设备在心电图(ECG)信号的分类方面表现出色,达到了令人印象深刻的85.6%的准确率。这一结果突出了该设备在处理现实世界信号处理任务方面的功效,具有显著的精度和效率。
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引用次数: 0
A FinFET-Based Low-Power Static Random Access Memory Cell With Improved Stability 一种基于finfet的低功耗静态随机存取存储单元
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-28 DOI: 10.1002/jnm.70002
Gautam Rana, Ashish Sachdeva, M. Elangovan, Kulbhushan Sharma

This work presents a FinFET-based stable, and low-power consuming static random access memory (SRAM) bit-cell that used eight transistors. The performance parameter of proposed feedback-cutting 8T (FC8T) is compared with four pre-published cell circuits, i.e., 6T, read-decoupled 8T(8TRD), Schmitt-trigger based 10T (10TST), and Schmitt-trigger-based modified 10 T (10TMST). The write power in proposed design is reduced by 1.36×/1.32×/1.88×/1.47× compared to 6T/8TRD/10TST/10TMST cells. The write and read stability of proposed design is improved by 1.15×/1.86×/1.28×/1.148× and 2.27×/1×/1.57×/1.11×, respectively. The proposed design also shows the low variability compared to other SRAM bit-cells.

这项工作提出了一个基于finfet的稳定,低功耗的静态随机存取存储器(SRAM)位单元,使用8个晶体管。将提出的反馈切割8T(FC8T)的性能参数与四种预发布的单元电路,即6T、读解耦8T(8TRD)、基于施密特触发器的10T (10TST)和基于施密特触发器的改进10T (10TMST)进行了比较。与6T/8TRD/10TST/10TMST单元相比,本设计的写入功率降低了1.36×/1.32×/1.88×/1.47×。所提设计的写入和读取稳定性分别提高了1.15×/1.86×/1.28×/1.148×和2.27×/1×/1.57×/1.11×。与其他SRAM位单元相比,所提出的设计还显示出低可变性。
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引用次数: 0
Accelerated Characteristic Mode Calculation for PEC Objects Using ACA-QR-SVD Algorithm 使用 ACA-QR-SVD 算法加速 PEC 物体的特征模式计算
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-21 DOI: 10.1002/jnm.3313
Pengfei Zhang, Shaode Huang, Jiejun Zhang, Jianhua Zhou, Tao Hong

Characteristic mode (CM) analysis serves as a powerful tool for evaluating the radiation and scattering characteristics of objects. CM formulations within the method of moments (MoM) framework are widely favored due to their ability to offer clear physical insights, handle complex shapes, and facilitate straightforward implementation. However, MoM-based CM formulations become inefficient when applied to electrically large objects due to the dense matrices involved. This article introduces a novel approach using a fast low-rank decomposition-based implicitly restarted Arnoldi method (IRAM) to accelerate CM computations. The adaptive cross approximation (ACA) and QR-SVD algorithms are employed to efficiently compute the low-rank decomposition of matrices. The ACA-QR-SVD algorithm offers advantages in matrix filling, LU factorization, and matrix–vector multiplication processes, thereby enhancing efficiency. Numerical simulations on two representative objects demonstrate that the proposed algorithm notably improves computational speed and reduces memory requirements while maintaining high computational accuracy.

特性模式(CM)分析是评估物体辐射和散射特性的有力工具。由于矩量法(MoM)框架内的 CM 公式能够提供清晰的物理洞察力、处理复杂形状并便于直接实施,因此广受青睐。然而,由于涉及密集矩阵,基于矩量法的 CM 公式在应用于大型电气物体时变得效率低下。本文介绍了一种新方法,使用基于快速低阶分解的隐式重启阿诺迪方法(IRAM)来加速 CM 计算。采用自适应交叉逼近(ACA)和 QR-SVD 算法来高效计算矩阵的低秩分解。ACA-QR-SVD 算法在矩阵填充、LU 因式分解和矩阵向量乘法过程中具有优势,从而提高了效率。对两个具有代表性的对象进行的数值模拟证明,所提出的算法在保持高计算精度的同时,显著提高了计算速度,降低了内存需求。
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引用次数: 0
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International Journal of Numerical Modelling-Electronic Networks Devices and Fields
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