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Random broadband filters based on combination of metasurface and multilayer thin films for hyperspectral imaging 基于超表面和多层薄膜组合的随机宽带滤波器,用于高光谱成像
Pub Date : 2024-04-25 DOI: 10.1088/1361-6463/ad4370
Kai Guo, Duo Yang, Bingyi Liu, Zhongyi Guo
Metasurface based micro-spectrometer presents a promising avenue for achieving compact, lightweight, and cost-effective solutions for miniaturization of hyperspectral imaging systems. Nevertheless, this type of design encounter limitations primarily due to constrained manipulation mechanism of light field, resulting in high cross-correlation among transmission spectra and imperfect reconstructed images. In this paper, we propose and numerically demonstrate a micro-spectrometer based on metasurface combined with multilayer thin films, whose spectral response improves performance for application, i.e. achieving low spectral cross-correlation. Additionally, we incorporate particle swarm optimization with compressed sensing algorithm to optimize the proposed micro-spectrometer. This approach effectively reconstructs both narrowband and broadband hyperspectral signals with minimal error, achieving an impressive 2nm spectral resolution. The simulation results of hyperspectral imaging demonstrated that the proposed methodology successfully reconstructs broadband hyperspectral images with an average spectral fidelity of 91.42%. This method holds significant potential for integrating into smartphones and other portable spectrometers, advancing the design of compact hyperspectral imaging systems.
基于元表面的微型光谱仪是实现高光谱成像系统小型化、轻量化和成本效益解决方案的一个很有前途的途径。然而,这种类型的设计会遇到一些限制,主要是由于光场操纵机制的限制,导致透射光谱之间的高度交叉相关性和不完美的重建图像。在本文中,我们提出了一种基于元表面与多层薄膜相结合的微型光谱仪,并对其进行了数值演示,其光谱响应提高了应用性能,即实现了低光谱交叉相关性。此外,我们还将粒子群优化与压缩传感算法相结合,对所提出的微型光谱仪进行了优化。这种方法能以最小的误差有效地重建窄带和宽带高光谱信号,达到令人印象深刻的 2nm 光谱分辨率。高光谱成像的模拟结果表明,所提出的方法成功地重建了宽带高光谱图像,平均光谱保真度达到 91.42%。该方法具有集成到智能手机和其他便携式光谱仪的巨大潜力,推动了紧凑型高光谱成像系统的设计。
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引用次数: 0
Synthesis of ZnO and ZnO/Ag fine particles by plasma-assisted inkjet processing 利用等离子体辅助喷墨工艺合成氧化锌和氧化锌/银微粒
Pub Date : 2024-04-25 DOI: 10.1088/1361-6463/ad436d
Takeru Hato, Kaishu Nitta, H. Muneoka, Yoshiki Shimizu, Kazuo Terashima, Tsuyohito Ito
Zinc oxide (ZnO) and its composite particles with controlled sizes, shapes, compositions, and physical and chemical properties are required for a wide variety of applications. In this study, we report a simple method for synthesising ZnO and ZnO/Ag composite particles via atmospheric-pressure plasma processing using inkjet droplets. Depending on the initial solution concentration, ZnO particles containing voids, with average sizes ranging from submicrons to several microns can be synthesised. Energy dispersive X-ray spectroscopy measurements of the synthesised ZnO/Ag particles suggest that the molar ratio of Ag to Zn in the initial solution was retained in the synthesised particles. A high surface-enhanced Raman scattering effect was observed in the particles synthesised from the solution with an Ag molar ratio of 50 % to the total solute. The proposed method enables the synthesis of ZnO particles of various sizes, microstructures, compositions and optical properties with relatively narrow size distributions.
氧化锌(ZnO)及其复合颗粒的尺寸、形状、成分、物理和化学性质都需要进行控制,以满足各种应用的需要。在本研究中,我们报告了一种利用喷墨液滴通过常压等离子处理合成氧化锌和氧化锌/银复合粒子的简单方法。根据初始溶液浓度的不同,可以合成平均尺寸从亚微米到几微米不等的含有空隙的氧化锌颗粒。对合成的氧化锌/银颗粒进行的能量色散 X 射线光谱测量表明,合成颗粒中保留了初始溶液中银与锌的摩尔比。在银与总溶质摩尔比为 50% 的溶液中合成的颗粒中观察到了较高的表面增强拉曼散射效应。所提出的方法能够合成各种尺寸、微观结构、成分和光学特性的氧化锌颗粒,且尺寸分布相对较窄。
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引用次数: 0
A flexible self-cleaning/antibacterial PVDF/T-ZnO fabric based on piezo-photocatalytic coupling effect for smart mask 一种基于压电光催化耦合效应的柔性自清洁/抗菌 PVDF/T-ZnO 织物,用于智能光罩
Pub Date : 2024-04-25 DOI: 10.1088/1361-6463/ad4368
Qihao Li, Rui Lin, Zhaoxiang Tang, Shan Liang, X. Xue, Lili Xing
A novel flexible composite fabric has been engineered by combining piezoelectric poly (vinylidene fluoride) (PVDF) and tetrapod zinc oxide (T-ZnO) nanostructures, which are integrated onto a nonwoven fabric substrate. This fabric exhibits a wide array of functionalities, notably self-cleaning and antibacterial properties, facilitated by the synergistic piezo-photocatalytic coupling effect. Through the utilization of the piezoelectric effect inherent in PVDF/T-ZnO in tandem with the photocatalytic attributes of T-ZnO nanostructures, the fabric achieves concurrent degradation of organic pollutants and antibacterial efficacy when exposed to mechanical vibration and solar irradiation. The piezo-photocatalytic coupling effect engenders an internal electric field that aids in the effective separation of photo-generated carriers (electrons and holes), thereby diminishing recombination rates and augmenting the efficiency of the photocatalytic degradation process. Notably, organic pollutants such as methylene blue and azithromycin exhibit degradation levels of 96.0% and 92.6%, respectively, within a timeframe of 25 and 60 minutes. The incorporation of PVDF/T-ZnO results in an approximate 40% enhancement in the degradation rate of organic substances compared to the use of T-ZnO in isolation. Furthermore, the composite fabric showcases exceptional antibacterial efficacy, effectively inhibiting the proliferation of Staphylococcus aureus. Experimental findings reveal that the average antibacterial zone diameter of the PVDF/T-ZnO fabric measures at 7.68 mm, significantly surpassing that of the T-ZnO fabric and nonwoven fabric. Given its remarkable self-cleaning and antibacterial attributes, the PVDF/T-ZnO fabric exhibits substantial potential for diverse applications, including the development of intelligent masks tailored for deployment in healthcare settings and polluted environments.
通过将压电聚偏二氟乙烯(PVDF)和四极氧化锌(T-ZnO)纳米结构集成到无纺布基材上,设计出了一种新型柔性复合织物。这种织物具有多种功能,尤其是自清洁和抗菌特性,而协同的压电光催化耦合效应则为其提供了便利。通过利用 PVDF/T-ZnO 固有的压电效应和 T-ZnO 纳米结构的光催化特性,该织物在机械振动和太阳光照射下可同时实现有机污染物降解和抗菌功效。压电光催化耦合效应产生的内部电场有助于有效分离光产生的载流子(电子和空穴),从而降低重组率,提高光催化降解过程的效率。值得注意的是,亚甲基蓝和阿奇霉素等有机污染物在 25 分钟和 60 分钟内的降解率分别达到 96.0% 和 92.6%。与单独使用 T-ZnO 相比,PVDF/T-ZnO 的加入使有机物质的降解率提高了约 40%。此外,这种复合织物还具有卓越的抗菌功效,能有效抑制金黄色葡萄球菌的增殖。实验结果表明,PVDF/T-ZnO 织物的平均抗菌区直径为 7.68 毫米,大大超过了 T-ZnO 织物和无纺布。鉴于 PVDF/T-ZnO 织物具有出色的自清洁和抗菌特性,它在各种应用中展现出巨大的潜力,包括开发专为医疗机构和污染环境定制的智能口罩。
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引用次数: 0
Tunable Electronic, Transport, and Optical Properties of Fluorine and Hydrogen Passivated Two-Dimensional Ga2O3 by Uniaxial Strain 通过单轴应变调节氟和氢钝化二维 Ga2O3 的电子、传输和光学特性
Pub Date : 2024-04-25 DOI: 10.1088/1361-6463/ad436e
Hui Zeng, Meng Wu, Chao Ma, Xi Fu, Haixia Gao
Two-dimensional (2D) semiconductors have shown great prospect in future-oriented optoelectronic applications, whereas the applications of conventional 2D materials are significantly impeded by the low electron mobility (≤ 200 cm2V1s1). In this work, strain mediated fluorine and hydrogen passivated 2D Ga2O3 systems (FGa2O3H) have been explored via using first-principles calculations with the Heyd-Scuseria-Ernzerh (HSE) and Perdew-Burke-Ernzerhof (PBE) functional. Our results reveal a considerable high electron mobility of FGa2O3H up to 4863.05 cm2V1s1 as the uniaxial tensile strain reaches 6%, which can be attributed to the enhanced overlapping of wave functions and bonding features. Overall, applying the uniaxial strain monotonously along a(b) direction from compressive to tensile cases, the bandgaps of 2D FGa2O3H increase initially and then decrease, which is originated from the changes of σ* anti-bonding in the CBM and π bonding states in the VBM accompanying with the lengthening Ga-O bonds. Additionally, when the tensile strain is larger than 8%, the stronger π bonding at G point leads to an indirect-to-direct transition. Besides the highest electron mobility of n-type doped 2D FGa2O3H with 6% tensile strain, the electrical conductivity is enhanced and further elevated with the temperature increase from 300K to 800K. The variations of the absorption coefficient in the ultraviolet region is negligible with the increasing tensile strain from 0% to 6%, shed light on its applications in high-power optoelectronic devices.
二维(2D)半导体在面向未来的光电应用中展现了巨大的前景,而传统 2D 材料的应用却因电子迁移率低(≤ 200 cm2V1s1)而受到严重阻碍。在这项工作中,通过使用 Heyd-Scuseria-Ernzerh (HSE) 和 Perdew-Burke-Ernzerhof (PBE) 函数进行第一原理计算,探索了应变介导的氟和氢钝化二维 Ga2O3 系统 (FGa2O3H)。我们的结果表明,当单轴拉伸应变达到 6% 时,FGa2O3H 的电子迁移率高达 4863.05 cm2V1s1,这可归因于波函数和成键特征重叠的增强。总的来说,从压缩到拉伸,沿a(b)方向施加单轴应变,二维FGa2O3H的带隙先增大后减小,这是由于随着Ga-O键的延长,CBM中的σ*反键和VBM中的π键状态发生了变化。此外,当拉伸应变大于 8%时,G 点更强的π键导致了间接到直接的转变。拉伸应变为 6% 时,n 型掺杂二维 FGa2O3H 的电子迁移率最高,此外,其导电性也得到增强,并随着温度从 300K 升高到 800K 而进一步提高。随着拉伸应变从 0% 增加到 6%,紫外区吸收系数的变化可以忽略不计,这为其在大功率光电器件中的应用提供了启示。
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引用次数: 0
A flat-top Arrayed Waveguide Grating base on cascading "A" shape Multimode Interference 基于级联 "A "型多模干涉的平顶阵列波导光栅
Pub Date : 2024-04-25 DOI: 10.1088/1361-6463/ad4372
Kanglu Zhou, Xiaochun Liu, Jialiang Zhang, Changshui Chen
To achieve spectrum flattening in the wavelength division multiplexing (WDM) device's arrayed waveguide grating (AWG), we have cascaded a special "A" shape multimode interference (MMI) structure at the end of the input waveguide. The MMI is designed by the linear spreading function (LSF), which increases the 1 dB bandwidth to 0.7 nm and the 3 dB bandwidth to 1.6 0.2 nm, the insertion loss is measured at 3.5±0.3 dB, and the channel crosstalk is below -30 dB.
为了在波分复用(WDM)设备的阵列波导光栅(AWG)中实现频谱平坦化,我们在输入波导的末端级联了一个特殊的 "A "形多模干涉(MMI)结构。MMI 采用线性展宽函数(LSF)设计,将 1 dB 带宽提高到 0.7 nm,3 dB 带宽提高到 1.6 0.2 nm,插入损耗测量值为 3.5±0.3 dB,信道串扰低于 -30 dB。
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引用次数: 0
Experimental study of the influence of O2 content on electrical and optical characteristics of He/CF4 APPJ 氧气含量对 He/CF4 APPJ 电学和光学特性影响的实验研究
Pub Date : 2024-04-25 DOI: 10.1088/1361-6463/ad4366
Lijun Wang, Huan Zhao, Jie Liu, Wei Li
CF4 is an important source of reactive F-containing species (RFS) so that it is used to mix with inert gas as the working gas of atmospheric pressure plasma jet (APPJ) for material surface fluoridation modification. The addition of a small amount of O2 can increase the density of RFS in He/CF4 APPJ. Therefore, the hydrodynamic, electrical and optical properties of He/CF4/O2 APPJ interacting with the dielectric are experimentally investigated in this paper. Meanwhile, the influence of the excitation source on plasma discharge is discussed in detail and the internal mechanism of the experimental phenomenon in this paper is analyzed using the simulation results based on the model established in the previous paper. It is found that the addition of a small amount of O2 can increase the intensity and accelerate the axial propagation speed of He/CF4 APPJ due to the low ionization energy of O2 and the increase of the Penning ionization between metastable He and O2. With the increase of O2 content, the stability of the discharge is gradually enhanced due to the electron attachment reaction of O2 and the position of the primary current pulse in each half voltage cycle gradually approaches the position of the peak voltage because the increase in O2 content raises the breakdown threshold in dielectric barrier discharge (DBD) region. In the presence of downstream dielectric, the addition of 0.1%O2 does not significantly change the radial development radius of APPJ due to the higher electron attachment rate and electron collision excitation loss power. The discharge pulse intensity is generally reduced compared to the absence of dielectric and the glow discharge in the strict sense no longer exists. The continuous spectrum intensity of RFS increases with the addition of a small amount of O2 while decreases significantly when O2 content is too high.
CF4 是活性含氟物种(RFS)的重要来源,因此常被用来与惰性气体混合,作为常压等离子体射流(APPJ)的工作气体,用于材料表面氟化改性。加入少量 O2 可以增加 He/CF4 APPJ 中 RFS 的密度。因此,本文对 He/CF4/O2 APPJ 与电介质相互作用的流体力学、电学和光学特性进行了实验研究。同时,本文还详细讨论了激励源对等离子体放电的影响,并根据前文建立的模型,利用模拟结果分析了实验现象的内部机理。研究发现,由于 O2 的电离能较低,且增加了逸散 He 与 O2 之间的彭宁电离,因此加入少量 O2 可以增加 He/CF4 APPJ 的强度并加快其轴向传播速度。随着 O2 含量的增加,由于 O2 的电子附着反应,放电的稳定性逐渐增强,并且由于 O2 含量的增加提高了介质势垒放电(DBD)区的击穿阈值,每个半电压周期的初级电流脉冲位置逐渐接近峰值电压位置。在下游介质存在的情况下,由于电子附着率和电子碰撞激发损耗功率较高,添加 0.1%O2 并不会显著改变 APPJ 的径向发展半径。与没有电介质时相比,放电脉冲强度普遍降低,严格意义上的辉光放电不复存在。RFS 的连续光谱强度会随着少量氧气的加入而增加,而当氧气含量过高时则会明显降低。
{"title":"Experimental study of the influence of O2 content on electrical and optical characteristics of He/CF4 APPJ","authors":"Lijun Wang, Huan Zhao, Jie Liu, Wei Li","doi":"10.1088/1361-6463/ad4366","DOIUrl":"https://doi.org/10.1088/1361-6463/ad4366","url":null,"abstract":"\u0000 CF4 is an important source of reactive F-containing species (RFS) so that it is used to mix with inert gas as the working gas of atmospheric pressure plasma jet (APPJ) for material surface fluoridation modification. The addition of a small amount of O2 can increase the density of RFS in He/CF4 APPJ. Therefore, the hydrodynamic, electrical and optical properties of He/CF4/O2 APPJ interacting with the dielectric are experimentally investigated in this paper. Meanwhile, the influence of the excitation source on plasma discharge is discussed in detail and the internal mechanism of the experimental phenomenon in this paper is analyzed using the simulation results based on the model established in the previous paper. It is found that the addition of a small amount of O2 can increase the intensity and accelerate the axial propagation speed of He/CF4 APPJ due to the low ionization energy of O2 and the increase of the Penning ionization between metastable He and O2. With the increase of O2 content, the stability of the discharge is gradually enhanced due to the electron attachment reaction of O2 and the position of the primary current pulse in each half voltage cycle gradually approaches the position of the peak voltage because the increase in O2 content raises the breakdown threshold in dielectric barrier discharge (DBD) region. In the presence of downstream dielectric, the addition of 0.1%O2 does not significantly change the radial development radius of APPJ due to the higher electron attachment rate and electron collision excitation loss power. The discharge pulse intensity is generally reduced compared to the absence of dielectric and the glow discharge in the strict sense no longer exists. The continuous spectrum intensity of RFS increases with the addition of a small amount of O2 while decreases significantly when O2 content is too high.","PeriodicalId":507822,"journal":{"name":"Journal of Physics D: Applied Physics","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2024-04-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140658442","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Enhanced second harmonic generation from supercavity mode and magnetic resonance in dumbbell-shaped silicon nanoblock 哑铃形硅纳米块中超腔模式和磁共振产生的增强型二次谐波
Pub Date : 2024-04-25 DOI: 10.1088/1361-6463/ad436f
Yuwei Yuan, Yunbao Zheng, Ouyang Min, Haihua Fan, Qiaofeng Dai, Haiying Liu, Li-Jun Wu
Electromagnetic multipole resonance can be excited by dielectric nanostructures of appropriate size to effectively promote light-matter interaction. The interactions between light and nanostructures have the capability to enhance the electromagnetic field in the near field, thereby improving the nonlinear effect of nanostructures. We illustrate that the supercavity mode and magnetic dipole resonance are activated by a single dumbbell-shaped silicon nanoblock (DS-SiNB), to trap the near-field electromagnetic field energy. Enhanced second harmonic generation is achieved by exploiting the localized electromagnetic field at the surface of the nanostructure. Numerical simulations reveal that magnetic quadrupole (MQ) and total electric dipole (TED) can be coupled to the same radiation channel by adjusting continuously the aspect ratio Lout/Ly (the outer edge length to the length of DS-SiNB) of the nanoblock. When the aspect ratio Lout/Ly = 1, the supercavity mode formed by the interference of MQ and TED is excited at λ1 = 1124 nm. And, the strong magnetic resonance mode formed by the coupling of two magnetic dipoles (MD) in the same direction is also excited at λ2 = 1124 nm. Supercavity mode and strong magnetic dipole resonance can effectively capture electromagnetic fields on the surface of nanostructures to attain enhanced second harmonic generation (SHG). Our study presents a novel approach to enhance the nonlinear optical effect of a single silicon nanostructure, which can lead to the development of more efficient nonlinear optical devices.
适当尺寸的介电纳米结构可以激发电磁多极共振,从而有效促进光与物质的相互作用。光与纳米结构之间的相互作用能够增强近场的电磁场,从而改善纳米结构的非线性效应。我们展示了单个哑铃形硅纳米块(DS-SiNB)激活的超空腔模式和磁偶极子共振,从而捕获近场电磁场能量。通过利用纳米结构表面的局部电磁场,增强了二次谐波的产生。数值模拟显示,通过不断调整纳米块的长宽比 Lout/Ly(外边缘长度与 DS-SiNB 长度之比),磁四极(MQ)和全电偶极子(TED)可以耦合到同一辐射通道。当长宽比 Lout/Ly = 1 时,由 MQ 和 TED 干涉形成的超空腔模式在 λ1 = 1124 nm 处被激发。此外,由两个同方向磁偶极子(MD)耦合形成的强磁共振模式也在λ2 = 1124 nm处被激发。超空腔模式和强磁偶极子共振能有效捕捉纳米结构表面的电磁场,从而实现增强的二次谐波发生(SHG)。我们的研究提出了一种增强单个硅纳米结构非线性光学效应的新方法,这将有助于开发更高效的非线性光学器件。
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引用次数: 0
Synergistic combination of 2-D MXene and MoO3 nanoparticles for improved gas sensing at room temperature 二维 MXene 和 MoO3 纳米粒子的协同组合可在室温下提高气体传感能力
Pub Date : 2024-04-25 DOI: 10.1088/1361-6463/ad436b
Shravani Kale, Dhanashree Sable, Rajat Srivastava, Vaishali Phatak Londhe, S. Kale
MXene Ti3C2Tx (with 30% HF-etched, named Ti3C2Tx-30) plays a pivotal role in the substantial enhancement of the structural modification of molybdenum trioxide (MoO3). Additionally, as the surface MoO3 molecules come in contact with reducing gas moieties, they actively participate in gas sensing at room temperature. The percentage of Ti3C2Tx-30 in the MoO3 matrix was varied as 10%, 20%, and 40%, denoted as MM-10, MM-20, and MM-40, respectively. Structural analysis confirmed the composition of the basic elements, and evolution of TiO2 at higher percentage of Ti3C2Tx-30. Spectroscopy analysis shows the interactions between Ti3C2Tx-30 and MoO3, showcasing work functions of 6.91 eV, 6.75 eV, and 7.21 eV for MM-10, MM-20, and MM-40, respectively, confirming the MM-20 to be an optimum composition. When the samples were exposed to ammonia gas, MM-20 showed high response (93% for 100 ppm) at room temperature, with the response time ~ 10 s. As compared to bare MoO3 these samples showed ten-fold improvement. The excess electrons on the surface of Ti3C2Tx-30 facilitate the formation of O2- species, which also provides stability to the, otherwise-highly-reactive, MXene surface. These species actively react with ammonia molecules in the presence of adsorbed MoO3, thereby changing the resistance of the system. This can be a significant step towards imparting high gas sensitivity to metal oxides at room temperature via incorporation of optimum percentage of optimised Ti3C2Tx.
MXene Ti3C2Tx(经 30% 高频蚀刻,命名为 Ti3C2Tx-30)在大幅提高三氧化钼(MoO3)的结构改性方面发挥了关键作用。此外,由于表面 MoO3 分子与还原气体分子接触,它们在室温下积极参与气体传感。Ti3C2Tx-30 在 MoO3 基体中的比例分别为 10%、20% 和 40%,分别称为 MM-10、MM-20 和 MM-40。结构分析证实了基本元素的组成,以及在 Ti3C2Tx-30 的比例较高时 TiO2 的演变。光谱分析显示了 Ti3C2Tx-30 和 MoO3 之间的相互作用,MM-10、MM-20 和 MM-40 的功函数分别为 6.91 eV、6.75 eV 和 7.21 eV,这证实 MM-20 是最佳成分。当样品暴露在氨气中时,MM-20 在室温下显示出较高的响应(100 ppm 时为 93%),响应时间约为 10 秒。Ti3C2Tx-30 表面上的过剩电子促进了 O2- 物种的形成,这也为原本高反应性的 MXene 表面提供了稳定性。在吸附了 MoO3 的情况下,这些物质会积极与氨分子发生反应,从而改变系统的电阻。通过加入最佳比例的优化 Ti3C2Tx,在室温下赋予金属氧化物高气体灵敏度方面迈出了重要一步。
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引用次数: 0
Effect of polarization on tunnelling electroresistance in ferroelectric tunnel junctions 极化对铁电隧道结中隧道电阻的影响
Pub Date : 2024-04-25 DOI: 10.1088/1361-6463/ad4369
Tongxin Ge, Haoming Wei, Yangqing Wu, Tengzhou Yang, Bingqiang Cao
High-quality epitaxial BiFeO3 (BFO) films were grown on (001)-, (110)-, and (111)-oriented Nb:SrTiO3 (NSTO) substrates by pulsed laser deposition. The types of domain structures can be modulated by BFO ferroelectric films with different crystalline orientations. The ON/OFF ratios are 6E3, 3E4 and 2E5 obtained in (001)-, (110)-, and (111)-oriented Au/BFO/NSTO ferroelectric tunnel junctions (FTJs), respectively. The analysis of the I-V curves of tunneling current and average BFO ferroelectric barrier height prove that the polarization intensity of the BFO films modulate both ferroelectric barrier and Schottky barrier profile, which further influences the electronic tunneling probability in the BFO FTJs. This work will be useful for further study on achieving giant ON/OFF ratio and developing insights on the barrier profile and transport mechanism of MFS-type FTJs.
通过脉冲激光沉积法,在(001)-、(110)-和(111)-取向的 Nb:SrTiO3 (NSTO) 基质上生长出了高质量的外延 BiFeO3 (BFO) 薄膜。不同晶体取向的 BFO 铁电薄膜可以调节畴结构的类型。在(001)-、(110)-和(111)-取向的金/BFO/NSTO铁电隧道结(FTJ)中,导通/关断比分别为6E3、3E4和2E5。对隧穿电流的 I-V 曲线和 BFO 铁电势垒平均高度的分析表明,BFO 薄膜的极化强度会调节铁电势垒和肖特基势垒剖面,从而进一步影响 BFO FTJ 中的电子隧穿概率。这项工作将有助于进一步研究如何实现巨大的导通/关断比,并深入了解 MFS 型 FTJ 的势垒剖面和传输机制。
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引用次数: 0
Direct growth of highly oriented GaN thin films on silicon by remote plasma CVD 通过远程等离子体 CVD 在硅上直接生长高取向氮化镓薄膜
Pub Date : 2024-04-25 DOI: 10.1088/1361-6463/ad436c
Lise Watrin, François Silva, Cyril Jadaud, P. Bulkin, J. Vanel, Dominique Muller, Erik V Johnson, Karim Ouaras, P. Roca i Cabarrocas
We report on low-temperature (500°C) and low-pressure (0.3 mbar) direct growth of GaN thin films on silicon (100) substrates using Remote Plasma Chemical Vapor Deposition (RP-CVD). In the custom-designed reactor, an RF Inductively Coupled Plasma (ICP) is generated remotely from the substrate's area to facilitate the decomposition of group-V precursor, N2 with added H2, while group-III precursor Trimethylgallium (TMGa), is directly injected into the growth chamber mixed with H2 carrier gas. Growth parameters such as RF power, process pressure and gas flow rates have been optimized to achieve a film growth rate of about 0.6 µm/h. Several characterization techniques were used to investigate the plasma and the properties of the grown thin films in terms of their crystallinity, morphology, topography, and composition. The films are highly textured with a preferential orientation along the c-axis of the wurtzite structure. They present a small roughness in the nanometer range and a columnar microstructure with a grain size of one hundred nanometers, and a gallium polarity (+c plane oriented). RBS and NRA analysis show that the chemical composition is homogeneous through the depth of the layer, with a III/V ratio close to 1, a very low content of oxygen (below the detection limit ~1%) and a carbon content up to 11%. It was shown that that the increase of plasma power helps to reduce this carbon contamination down to 8%. This research paves the way for a growth method compatible with cost reduction of III-V thin film production achieved through reduced gas consumption facilitated by RP-CVD operation at low pressure.
我们报告了利用远程等离子体化学气相沉积(RP-CVD)技术在硅(100)基底上低温(500°C)、低压(0.3 毫巴)直接生长 GaN 薄膜的情况。在定制设计的反应器中,射频电感耦合等离子体 (ICP) 在远离基底区域的地方产生,以促进 V 族前驱体 N2 与添加的 H2 的分解,而 III 族前驱体三甲基镓 (TMGa) 则与 H2 载气混合直接注入生长室。对射频功率、工艺压力和气体流速等生长参数进行了优化,以达到约 0.6 µm/h 的薄膜生长速度。我们使用了多种表征技术来研究等离子体和生长薄膜在结晶度、形态、形貌和成分方面的特性。薄膜的纹理非常清晰,并沿着乌兹结构的 c 轴优先取向。薄膜的粗糙度在纳米范围内较小,呈柱状微结构,晶粒大小为 100 纳米,镓极性(+c 平面定向)。RBS 和 NRA 分析表明,整个层深度的化学成分是均匀的,III/V 比率接近 1,氧含量非常低(低于检测限 ~1%),碳含量高达 11%。研究表明,等离子体功率的增加有助于将碳污染降低到 8%。这项研究为降低 III-V 薄膜生产成本的生长方法铺平了道路,通过在低压下进行 RP-CVD 操作可减少气体消耗。
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引用次数: 0
期刊
Journal of Physics D: Applied Physics
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