Pub Date : 2022-12-15DOI: 10.3390/nanomanufacturing2040017
K. I. Baskakova, A. Okotrub, L. G. Bulusheva, O. Sedelnikova
3D printing is a promising technology for creating polymer objects of a given architecture with specified functional properties. In fact, the choice of filaments for 3D printing is quite limited. Here, we report a process for producing polystyrene filaments with 0.0025–2 wt.% single-walled carbon nanotubes (SWCNTs) by extruding crushed polystyrene composites. The resulting filaments are characterized by a high uniformity of filler distribution and the absence of air pores. Comparison of microscopy data and electromagnetic properties of base composites and composite materials printed from filaments showed that extrusion and printing improve SWCNT dispersion. The proposed method can be used to create filaments for 3D printing of objects from various base polymers containing functional fillers up to the electrical percolation threshold and above.
{"title":"Manufacturing of Carbon Nanotube-Polystyrene Filament for 3D Printing: Nanoparticle Dispersion and Electromagnetic Properties","authors":"K. I. Baskakova, A. Okotrub, L. G. Bulusheva, O. Sedelnikova","doi":"10.3390/nanomanufacturing2040017","DOIUrl":"https://doi.org/10.3390/nanomanufacturing2040017","url":null,"abstract":"3D printing is a promising technology for creating polymer objects of a given architecture with specified functional properties. In fact, the choice of filaments for 3D printing is quite limited. Here, we report a process for producing polystyrene filaments with 0.0025–2 wt.% single-walled carbon nanotubes (SWCNTs) by extruding crushed polystyrene composites. The resulting filaments are characterized by a high uniformity of filler distribution and the absence of air pores. Comparison of microscopy data and electromagnetic properties of base composites and composite materials printed from filaments showed that extrusion and printing improve SWCNT dispersion. The proposed method can be used to create filaments for 3D printing of objects from various base polymers containing functional fillers up to the electrical percolation threshold and above.","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"30 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2022-12-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84157767","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2022-12-05DOI: 10.3390/nanomanufacturing2040016
Md Abdus Subhan, Newton Neogi, K. Choudhury
Nanomaterials (NMs) that are created with zinc oxide are very valuable for a wide variety of applications. There is a present interest in ZnO nanoparticles in a wide range of industries. This interest may be attributed to the fact that ZnO NPs have many important features. It will be necessary for ZnO NPs to possess certain qualities in order for them to rapidly find uses in industry and for these applications to have an effect on the expansion of the economy. A large surface area, a large bandgap, photocatalytic property, biosensing, bioimaging, and other qualities are included in this list. In this article, the extraordinary characteristics of ZnO NPs, as well as their novel applications in industrial settings and the challenges that come along with their utilization, will be discussed.
{"title":"Industrial Manufacturing Applications of Zinc Oxide Nanomaterials: A Comprehensive Study","authors":"Md Abdus Subhan, Newton Neogi, K. Choudhury","doi":"10.3390/nanomanufacturing2040016","DOIUrl":"https://doi.org/10.3390/nanomanufacturing2040016","url":null,"abstract":"Nanomaterials (NMs) that are created with zinc oxide are very valuable for a wide variety of applications. There is a present interest in ZnO nanoparticles in a wide range of industries. This interest may be attributed to the fact that ZnO NPs have many important features. It will be necessary for ZnO NPs to possess certain qualities in order for them to rapidly find uses in industry and for these applications to have an effect on the expansion of the economy. A large surface area, a large bandgap, photocatalytic property, biosensing, bioimaging, and other qualities are included in this list. In this article, the extraordinary characteristics of ZnO NPs, as well as their novel applications in industrial settings and the challenges that come along with their utilization, will be discussed.","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"42 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2022-12-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90053193","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2022-12-01DOI: 10.1007/s41871-022-00165-3
G. Dai, K. Hahm, Lipfert Sebastian, M. Heidelmann
{"title":"Correction: Comparison of EUV Photomask Metrology Between CD-AFM and TEM","authors":"G. Dai, K. Hahm, Lipfert Sebastian, M. Heidelmann","doi":"10.1007/s41871-022-00165-3","DOIUrl":"https://doi.org/10.1007/s41871-022-00165-3","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"4 1","pages":"440"},"PeriodicalIF":0.0,"publicationDate":"2022-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80071697","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2022-12-01DOI: 10.1007/s41871-022-00160-8
Y. Mizutani, S. Kataoka, T. Uenohara, Y. Takaya
{"title":"Correction: Ghost Imaging with Deep Learning for Position Mapping of Weakly Scattered Light Source","authors":"Y. Mizutani, S. Kataoka, T. Uenohara, Y. Takaya","doi":"10.1007/s41871-022-00160-8","DOIUrl":"https://doi.org/10.1007/s41871-022-00160-8","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"37 1","pages":"435"},"PeriodicalIF":0.0,"publicationDate":"2022-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90688208","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2022-12-01DOI: 10.1007/s41871-022-00167-1
R. Sakakibara, I. Yoshida, Yuki Kondo, M. Numada, Kenichi Yamashita
{"title":"Correction: A Proposal of Hyperbolic Fitting Method by Applying the Properties of Functions for Plateau Surface Analysis in ISO 13565–3","authors":"R. Sakakibara, I. Yoshida, Yuki Kondo, M. Numada, Kenichi Yamashita","doi":"10.1007/s41871-022-00167-1","DOIUrl":"https://doi.org/10.1007/s41871-022-00167-1","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"57 1","pages":"442"},"PeriodicalIF":0.0,"publicationDate":"2022-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73719454","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2022-12-01DOI: 10.1007/s41871-022-00163-5
K. Nakazawa, S. Ozawa, F. Iwata
{"title":"Correction: Additive Manufacturing of Metal Micro-ring and Tube by Laser-Assisted Electrophoretic Deposition with Laguerre–Gaussian Beam","authors":"K. Nakazawa, S. Ozawa, F. Iwata","doi":"10.1007/s41871-022-00163-5","DOIUrl":"https://doi.org/10.1007/s41871-022-00163-5","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"172 1","pages":"438"},"PeriodicalIF":0.0,"publicationDate":"2022-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73160472","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2022-12-01DOI: 10.1007/s41871-022-00164-4
H. Matsukuma, K. Adachi, Takuma Sugawara, Y. Shimizu, Wei Gao, Eiji Niwa, Yoshihiro Sasaki
{"title":"Correction: Closed-Loop Control of an XYZ Micro-Stage and Designing of Mechanical Structure for Reduction in Motion Errors","authors":"H. Matsukuma, K. Adachi, Takuma Sugawara, Y. Shimizu, Wei Gao, Eiji Niwa, Yoshihiro Sasaki","doi":"10.1007/s41871-022-00164-4","DOIUrl":"https://doi.org/10.1007/s41871-022-00164-4","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"38 2","pages":"439"},"PeriodicalIF":0.0,"publicationDate":"2022-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72407007","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2022-11-29DOI: 10.3390/nanomanufacturing2040015
C. Barbero, D. Acevedo
Direct laser interference patterning (DLIP) involves the formation of patterns of light intensity using coherent laser light beams that interfere between them. Light on the ultraviolet (<350 nm) and NIR (800–2000 nm) is absorbed in chromophores present in the polymer structure or in loaded absorbing species (dyes, polymers, nanoparticles). The absorbed light induces photothermal/photochemical processes, which alter permanently the topography of the polymer surface. The success of DLIP at different wavelengths is discussed in relation to the optical/thermal properties of the polymers and previous data on laser ablation of polymers. The size of the pattern is related directly to the wavelength of the light and inversely to the sine of the angle between beams and the refractive index of the external medium. In that way, nanometric structures (<100 nm) could be produced. Since the patterning occurs in a single short pulse (<10 ns), large surfaces can be modified. Both bacterial biofilm inhibition and human cell differentiation/orientation have been achieved. Large improvements in technological devices (e.g., thin film solar cells) using DLIP structured surfaces have also been demonstrated. Prospective application of DLIP to common polymers (e.g., Teflon®) and complex polymeric systems (e.g., layer-by-layer multilayers) is discussed on the basis of reported polymer data.
{"title":"Manufacturing Functional Polymer Surfaces by Direct Laser Interference Patterning (DLIP): A Polymer Science View","authors":"C. Barbero, D. Acevedo","doi":"10.3390/nanomanufacturing2040015","DOIUrl":"https://doi.org/10.3390/nanomanufacturing2040015","url":null,"abstract":"Direct laser interference patterning (DLIP) involves the formation of patterns of light intensity using coherent laser light beams that interfere between them. Light on the ultraviolet (<350 nm) and NIR (800–2000 nm) is absorbed in chromophores present in the polymer structure or in loaded absorbing species (dyes, polymers, nanoparticles). The absorbed light induces photothermal/photochemical processes, which alter permanently the topography of the polymer surface. The success of DLIP at different wavelengths is discussed in relation to the optical/thermal properties of the polymers and previous data on laser ablation of polymers. The size of the pattern is related directly to the wavelength of the light and inversely to the sine of the angle between beams and the refractive index of the external medium. In that way, nanometric structures (<100 nm) could be produced. Since the patterning occurs in a single short pulse (<10 ns), large surfaces can be modified. Both bacterial biofilm inhibition and human cell differentiation/orientation have been achieved. Large improvements in technological devices (e.g., thin film solar cells) using DLIP structured surfaces have also been demonstrated. Prospective application of DLIP to common polymers (e.g., Teflon®) and complex polymeric systems (e.g., layer-by-layer multilayers) is discussed on the basis of reported polymer data.","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"1 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2022-11-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90251073","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2022-11-24DOI: 10.1007/s41871-022-00155-5
F. Ji, Y. Yao, T. Xin, J. Seidel
{"title":"Correction: A Comprehensive FIB Lift-out Sample Preparation Method for Scanning Probe Microscopy","authors":"F. Ji, Y. Yao, T. Xin, J. Seidel","doi":"10.1007/s41871-022-00155-5","DOIUrl":"https://doi.org/10.1007/s41871-022-00155-5","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"48 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2022-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90225125","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2022-11-23DOI: 10.1007/s41871-022-00158-2
Y. Kajihara, R. Takahashi, I. Yoshida, S. Saito, Norihiko Sekine, Shuichi Nowatari, Shigeo Miyake
{"title":"Correction: Measurement Method of Internal Residual Stress in Plastic Parts Using Terahertz Spectroscopy","authors":"Y. Kajihara, R. Takahashi, I. Yoshida, S. Saito, Norihiko Sekine, Shuichi Nowatari, Shigeo Miyake","doi":"10.1007/s41871-022-00158-2","DOIUrl":"https://doi.org/10.1007/s41871-022-00158-2","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"48 1","pages":"433"},"PeriodicalIF":0.0,"publicationDate":"2022-11-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73782521","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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