首页 > 最新文献

Nanomanufacturing and Metrology最新文献

英文 中文
Low-Cost Shadow Mask Fabrication for Nanoelectronics 纳米电子学的低成本荫罩制造
Q1 Engineering Pub Date : 2023-08-16 DOI: 10.3390/nanomanufacturing3030022
T. Pucher, Pablo Bastante, Estrella Sánchez Viso, A. Castellanos-Gomez
We present two approaches for fabricating shadow masks for the evaporation of electrodes onto nanomaterials. In the first one, we combine the use of a commercial fiber laser engraving system with readily available aluminum foil. This method is suitable for fabricating shadow masks with line widths of 50 µm and minimum feature separation of 20 µm, and using it to create masks with complex patterns is very straightforward. In the second approach, we use a commercially available vinyl cutting machine to pattern a vinyl stencil mask, and we use a glass fiber to define the separation between the electrodes. With this approach, we achieve well-defined electrodes separated by 15 µm, but this technique is less versatile in creating complex masks as compared with the laser-based one. We demonstrate the potential of these techniques by fabricating field-effect transistor devices based on MoS2. Our approach is a cost-effective and easily accessible method for fabricating shadow masks with high resolution and accuracy, making it accessible to a wider range of laboratories.
我们提出了两种制造用于电极在纳米材料上蒸发的阴影掩模的方法。在第一个,我们结合使用商业光纤激光雕刻系统与现成的铝箔。该方法适用于制作线宽为50 μ m,最小特征间距为20 μ m的阴影蒙版,并且使用它来创建具有复杂图案的蒙版非常简单。在第二种方法中,我们使用市售的乙烯基切割机来制作乙烯基模板,我们使用玻璃纤维来定义电极之间的分离。通过这种方法,我们实现了相距15 μ m的明确电极,但与基于激光的掩模相比,这种技术在创建复杂掩模方面不太通用。我们通过制造基于二硫化钼的场效应晶体管器件来证明这些技术的潜力。我们的方法是一种具有成本效益和易于获取的方法,用于制造具有高分辨率和准确性的阴影掩模,使其可用于更广泛的实验室。
{"title":"Low-Cost Shadow Mask Fabrication for Nanoelectronics","authors":"T. Pucher, Pablo Bastante, Estrella Sánchez Viso, A. Castellanos-Gomez","doi":"10.3390/nanomanufacturing3030022","DOIUrl":"https://doi.org/10.3390/nanomanufacturing3030022","url":null,"abstract":"We present two approaches for fabricating shadow masks for the evaporation of electrodes onto nanomaterials. In the first one, we combine the use of a commercial fiber laser engraving system with readily available aluminum foil. This method is suitable for fabricating shadow masks with line widths of 50 µm and minimum feature separation of 20 µm, and using it to create masks with complex patterns is very straightforward. In the second approach, we use a commercially available vinyl cutting machine to pattern a vinyl stencil mask, and we use a glass fiber to define the separation between the electrodes. With this approach, we achieve well-defined electrodes separated by 15 µm, but this technique is less versatile in creating complex masks as compared with the laser-based one. We demonstrate the potential of these techniques by fabricating field-effect transistor devices based on MoS2. Our approach is a cost-effective and easily accessible method for fabricating shadow masks with high resolution and accuracy, making it accessible to a wider range of laboratories.","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"17 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-08-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83067222","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Nanomechanical Characterization of Bone Quality Depending on Tissue Age via Bimodal Atomic Force Microscopy 通过双峰原子力显微镜研究骨质量随组织年龄的纳米力学特征
Q1 Engineering Pub Date : 2023-08-11 DOI: 10.1007/s41871-023-00208-3
Jinha Kwon, Hanna Cho
{"title":"Nanomechanical Characterization of Bone Quality Depending on Tissue Age via Bimodal Atomic Force Microscopy","authors":"Jinha Kwon, Hanna Cho","doi":"10.1007/s41871-023-00208-3","DOIUrl":"https://doi.org/10.1007/s41871-023-00208-3","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"20 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-08-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77153572","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Effect of Refresh Time on XeF2 Gas-assisted FIB Milling of GaAs 刷新时间对XeF2气助FIB铣削砷化镓的影响
Q1 Engineering Pub Date : 2023-08-08 DOI: 10.1007/s41871-023-00209-2
Jining Sun, Lei Zhang, Yi Zhang, Yunlong Han, Lei Zhang
{"title":"Effect of Refresh Time on XeF2 Gas-assisted FIB Milling of GaAs","authors":"Jining Sun, Lei Zhang, Yi Zhang, Yunlong Han, Lei Zhang","doi":"10.1007/s41871-023-00209-2","DOIUrl":"https://doi.org/10.1007/s41871-023-00209-2","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"105 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-08-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89938216","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Self-Healing Cement: A Review 自愈水泥的研究进展
Q1 Engineering Pub Date : 2023-08-01 DOI: 10.3390/nanomanufacturing3030021
G. Kordas
The self-healing of cementitious materials can be achieved by precipitation of calcium carbonate through the enzymatic hydrolysis of urea. When a crack appears in cement, the damage can be repaired by allowing bacteria to encounter the water seeping through the crack. This forms a calcium carbonate, which heals the cracks. This occurs because microorganisms begin metabolizing and precipitating the mineral, healing the damage caused by the crack. Then, bacteria are incorporated into various containers, which release microorganisms by crushing, leading to the precipitation of calcium carbonate. In addition, this paper references the superabsorbent polymers (SAP) used for self-healing and hybrid organic-inorganic core–shell SAPs, a recently developed, state-of-the-art self-healing technology for cementitious materials.
胶凝材料的自愈可以通过酶解尿素沉淀碳酸钙来实现。当水泥出现裂缝时,可以通过让细菌接触从裂缝中渗出的水来修复损坏。这就形成了碳酸钙,可以修复裂缝。这是因为微生物开始代谢和沉淀矿物质,愈合裂缝造成的损害。然后,将细菌放入各种容器中,这些容器通过破碎释放出微生物,导致碳酸钙的沉淀。此外,本文还引用了用于自修复的高吸水性聚合物(SAP)和最近开发的最先进的胶凝材料自修复技术——有机-无机核-壳复合聚合物(SAP)。
{"title":"Self-Healing Cement: A Review","authors":"G. Kordas","doi":"10.3390/nanomanufacturing3030021","DOIUrl":"https://doi.org/10.3390/nanomanufacturing3030021","url":null,"abstract":"The self-healing of cementitious materials can be achieved by precipitation of calcium carbonate through the enzymatic hydrolysis of urea. When a crack appears in cement, the damage can be repaired by allowing bacteria to encounter the water seeping through the crack. This forms a calcium carbonate, which heals the cracks. This occurs because microorganisms begin metabolizing and precipitating the mineral, healing the damage caused by the crack. Then, bacteria are incorporated into various containers, which release microorganisms by crushing, leading to the precipitation of calcium carbonate. In addition, this paper references the superabsorbent polymers (SAP) used for self-healing and hybrid organic-inorganic core–shell SAPs, a recently developed, state-of-the-art self-healing technology for cementitious materials.","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"14 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89847844","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Angle Measurement Based on Second Harmonic Generation Using Artificial Neural Network 基于二次谐波产生的人工神经网络角度测量
Q1 Engineering Pub Date : 2023-07-27 DOI: 10.1007/s41871-023-00206-5
Kuangyi Li, Zhi-Li Zhang, Jiahui Lin, R. Sato, H. Matsukuma, W. Gao
{"title":"Angle Measurement Based on Second Harmonic Generation Using Artificial Neural Network","authors":"Kuangyi Li, Zhi-Li Zhang, Jiahui Lin, R. Sato, H. Matsukuma, W. Gao","doi":"10.1007/s41871-023-00206-5","DOIUrl":"https://doi.org/10.1007/s41871-023-00206-5","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"170 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76763869","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Calculation Model for the Steady-State Vibration Amplitude of a New Type of Cascaded Composite Structure-Based Ultrasonic Transducer 一种新型级联复合结构超声换能器稳态振幅计算模型
Q1 Engineering Pub Date : 2023-07-24 DOI: 10.1007/s41871-023-00204-7
Hongjie Zhang, Xinyue Gao, Xiaochen Liu, Junqiang Wu
{"title":"Calculation Model for the Steady-State Vibration Amplitude of a New Type of Cascaded Composite Structure-Based Ultrasonic Transducer","authors":"Hongjie Zhang, Xinyue Gao, Xiaochen Liu, Junqiang Wu","doi":"10.1007/s41871-023-00204-7","DOIUrl":"https://doi.org/10.1007/s41871-023-00204-7","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"10 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74949095","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Bridging the Divide Between Iterative Optical Polishing and Automation 跨越迭代光学抛光和自动化之间的鸿沟
Q1 Engineering Pub Date : 2023-07-21 DOI: 10.1007/s41871-023-00197-3
David Walker, J. I. Ahuir-Torres, Yasemin Akar, Paul A. Bingham, Xun Chen, Michal Darowski, O. Fähnle, Philippe Gambron, Frankie F. Jackson, Hongyu Li, Luke Mason, Rakesh Mishra, Abdullah Shahjalal, Guoyu Yu
{"title":"Bridging the Divide Between Iterative Optical Polishing and Automation","authors":"David Walker, J. I. Ahuir-Torres, Yasemin Akar, Paul A. Bingham, Xun Chen, Michal Darowski, O. Fähnle, Philippe Gambron, Frankie F. Jackson, Hongyu Li, Luke Mason, Rakesh Mishra, Abdullah Shahjalal, Guoyu Yu","doi":"10.1007/s41871-023-00197-3","DOIUrl":"https://doi.org/10.1007/s41871-023-00197-3","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"70 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84448545","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Effect of Textured Glasses on Conversion Efficiency in Dye-Sensitized Solar Cells 纹理玻璃对染料敏化太阳能电池转换效率的影响
Q1 Engineering Pub Date : 2023-07-05 DOI: 10.3390/nanomanufacturing3030020
Ryutaro Kimura, Yuji Nishiyasu, C. Oka, S. Hata, J. Sakurai
In this paper, three types of optical textured glass substrates were prepared at the glass/transparent conductive oxide interface using polydimethylsiloxane nanoimprint lithography to increase the conversion efficiency of dye-sensitized solar cells (DSSCs). There were three types of textures: nanotexture, microtexture, and micro/nano double texture. In terms of optical characteristics, it was confirmed that the reflectance of all of the textured glass substrates was lower than that of flat glass in the mean value of the 400–800 nm wavelength band. Further, the diffuse transmittance was higher than that of flat glass for all of the textured glass substrates, and the D-Tx was particularly high. DSSCs were fabricated using N749 and N719 dyes; their size was 6 mm2. The conversion efficiencies of the N749 DSSCs were improved by 11% for the N-Tx (η of 2.41%) and 10% for the D-Tx (η of 2.38%) compared with flat glass (η of 2.17%) DSSCs. On the other hand, the M-Tx did not improve it. The conversion efficiencies of the N719 DSSCs with textured glass substrates were improved by 7.5% for the M-Tx (η of 2.74%), 18% for the N-Tx (η of 3.01%), and 26% for the D-Tx (η of 3.22%) compared with flat glass (η of 2.55%) DSSCs.
为了提高染料敏化太阳能电池(DSSCs)的转换效率,采用聚二甲基硅氧烷纳米压印光刻技术在玻璃/透明导电氧化物界面上制备了三种光学纹理玻璃基板。纹理有三种类型:纳米纹理、微纹理和微纳双纹理。在光学特性方面,证实了在400-800 nm波段内,所有纹理玻璃基板的反射率均低于平板玻璃的反射率平均值。此外,所有纹理玻璃基板的漫射透过率均高于平板玻璃,且D-Tx特别高。采用N749和N719染料制备DSSCs;它们的大小为6平方毫米。与平板玻璃(η为2.17%)DSSCs相比,N-Tx (η为2.41%)和D-Tx (η为2.38%)的转换效率分别提高了11%和10%。另一方面,M-Tx并没有改进它。与平板玻璃(η为2.55%)相比,M-Tx (η为2.74%)、N-Tx (η为3.01%)和D-Tx (η为3.22%)的N719 DSSCs的转换效率分别提高了7.5%、18%和26%。
{"title":"Effect of Textured Glasses on Conversion Efficiency in Dye-Sensitized Solar Cells","authors":"Ryutaro Kimura, Yuji Nishiyasu, C. Oka, S. Hata, J. Sakurai","doi":"10.3390/nanomanufacturing3030020","DOIUrl":"https://doi.org/10.3390/nanomanufacturing3030020","url":null,"abstract":"In this paper, three types of optical textured glass substrates were prepared at the glass/transparent conductive oxide interface using polydimethylsiloxane nanoimprint lithography to increase the conversion efficiency of dye-sensitized solar cells (DSSCs). There were three types of textures: nanotexture, microtexture, and micro/nano double texture. In terms of optical characteristics, it was confirmed that the reflectance of all of the textured glass substrates was lower than that of flat glass in the mean value of the 400–800 nm wavelength band. Further, the diffuse transmittance was higher than that of flat glass for all of the textured glass substrates, and the D-Tx was particularly high. DSSCs were fabricated using N749 and N719 dyes; their size was 6 mm2. The conversion efficiencies of the N749 DSSCs were improved by 11% for the N-Tx (η of 2.41%) and 10% for the D-Tx (η of 2.38%) compared with flat glass (η of 2.17%) DSSCs. On the other hand, the M-Tx did not improve it. The conversion efficiencies of the N719 DSSCs with textured glass substrates were improved by 7.5% for the M-Tx (η of 2.74%), 18% for the N-Tx (η of 3.01%), and 26% for the D-Tx (η of 3.22%) compared with flat glass (η of 2.55%) DSSCs.","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"129 10 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77527626","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Area-Specific Positioning of Metallic Glass Nanowires on Si Substrate 金属玻璃纳米线在Si衬底上的区域定位
Q1 Engineering Pub Date : 2023-07-05 DOI: 10.1007/s41871-023-00205-6
S. Theeda, G. Kumar
{"title":"Area-Specific Positioning of Metallic Glass Nanowires on Si Substrate","authors":"S. Theeda, G. Kumar","doi":"10.1007/s41871-023-00205-6","DOIUrl":"https://doi.org/10.1007/s41871-023-00205-6","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"58 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76071141","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of Probe Lifting Height in Jumping Mode AFM for Living Cell Imaging 跳模AFM中探针升降高度对活细胞成像的影响
Q1 Engineering Pub Date : 2023-07-03 DOI: 10.1007/s41871-023-00196-4
Can Cheng, Xingyue Wang, Jianjun Dong, Zuobin Wang
{"title":"Effect of Probe Lifting Height in Jumping Mode AFM for Living Cell Imaging","authors":"Can Cheng, Xingyue Wang, Jianjun Dong, Zuobin Wang","doi":"10.1007/s41871-023-00196-4","DOIUrl":"https://doi.org/10.1007/s41871-023-00196-4","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"5 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84618238","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Nanomanufacturing and Metrology
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1