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Loop Heat Pipes for Cooling Systems of Servers 用于服务器冷却系统的循环热管
Pub Date : 2010-01-08 DOI: 10.1109/TCAPT.2009.2035514
Y. Maydanik, S. Vershinin, V. Pastukhov, Stephen Fried
Loop heat pipes (LHPs) are exceptionally efficient heat-transfer devices that employ a closed loop evaporation-condensation cycle that can be used to cool densely packed electronic systems that reject large quantities of heat, including computers and their central processing units (CPUs). Tests were carried out on miniature ammonia LHPs with a CPU thermal simulator using different ways of condenser cooling. The possibility of maintaining the cooled object temperatures between 40°C and 70°C with heat load changing from 100 to 320 W was demonstrated. Subsequent tests of these devices in a 1U computer with dual core advanced micro devices Opteron CPUs, dissipating between 95 and 120 W, have confirmed the advantages and heat transfer efficiency of LHP-based cooling systems used to cool CPU in 1U chassis.
循环热管(LHPs)是一种非常高效的传热设备,它采用闭环蒸发-冷凝循环,可用于冷却密集排列的电子系统,这些系统拒绝大量的热量,包括计算机及其中央处理器(cpu)。采用不同的冷凝器冷却方式,在CPU热模拟器上对微型氨高压进行了测试。实验证明了在热负荷从100 W到320 W变化的情况下,将被冷却物体温度保持在40℃到70℃之间的可能性。随后在一台1U计算机上对这些设备进行了测试,该计算机配备了双核高级微设备Opteron CPU,耗散在95至120 W之间,证实了lhp冷却系统用于冷却1U机箱CPU的优势和传热效率。
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引用次数: 43
Optimization of the Thermomechanical Reliability of a 65 nm Cu/Low-$k$ Large-Die Flip Chip Package 65纳米Cu/Low-$k$大晶片倒装封装的热机械可靠性优化
Pub Date : 2009-12-01 DOI: 10.1109/TCAPT.2009.2020696
J. Ong, A. Tay, X. Zhang, V. Kripesh, Y. K. Lim, D. Yeo, K.C. Chan, J.B. Tan, L. Hsia, D. Sohn
The trend toward finer pitch and higher performance integrated circuit devices has driven the semiconductor industry to incorporate copper and low-k dielectric materials. However, the low-k materials have lower modulus and poorer adhesion compared to the common dielectric materials. Thus, thermomechanical failure is one of the major bottlenecks in the development of Cu/low-k larger-die flip chip packages. This paper describes the optimization of the structural design of Chartered's C65 nm 21 mm times 21 mm die size flip-chip ball grid array package incorporated with fully active and functional ninemetal Cu/low-k layers and 150 mum interconnect pitch. The lowk material used in this paper is nonporous SiCOH with a k value of 2.9. A parametric study using 2-D plane strain finite element analysis was performed to study the effect of various parameters on the reliability of the large-die package in order to arrive at an optimized design. In order to have a simple criterion to predict the reliability of the yet-to-be-built largedie package, reliability tests were carried out on some existing 15 mm times 15 mm die CvJlow-k flip chip packages which were identical to the 21mm times 21mm die package except for the size. The packages were found to pass the reliability tests. 2-D plane strain finite element analyses were then performed on the 15 mm times 15 mm die. The computed delamination stresses at the low-k layer and the strain energy density dissipation per cycle in the critical solder (DeltaW) were then used as a benchmark for the design of a larger flip chip package. The efficacy of the polymer encapsulated dicing lane technology was established. In this paper, the effect of the number of fluorosilicate glass layers, die thickness, substrate thickness, Cu post height, and underfill type on the delamination stresses in the low-k layer and DeltaW were determined. Specimens of the optimized large-die package were then fabricated and subjected to reliability tests. They were all found to pass the reliability tests. From these reliability tests, new benchmark values of the delamination stresses at the low-k layer and DeltaW are obtained, which can be used to aid in the design of large-die Cu/low-k flip chip packages.
更细间距和更高性能集成电路器件的趋势推动了半导体工业采用铜和低k介电材料。然而,与普通介电材料相比,低k材料具有较低的模量和较差的粘附性。因此,热机械失效是铜/低钾大晶片倒装封装发展的主要瓶颈之一。本文介绍了采用全活性和功能性九金属Cu/low-k层和150 μ m互连间距的C65 nm 21 mm × 21 mm芯片尺寸倒装芯片球栅阵列封装的结构优化设计。本文采用的低钾材料为无孔SiCOH, k值为2.9。采用二维平面应变有限元方法进行了参数化分析,研究了各参数对大型模具封装可靠性的影响,从而得到优化设计方案。为了有一个简单的标准来预测尚未建成的大芯片封装的可靠性,对一些现有的15mm × 15mm的CvJlow-k倒装芯片封装进行了可靠性测试,这些封装除了尺寸不同外与21mm × 21mm的封装相同。发现这些包裹通过了可靠性测试。然后对15mm × 15mm模具进行二维平面应变有限元分析。计算出的低k层的分层应力和临界焊料中每周期的应变能密度耗散(DeltaW),然后作为设计更大倒装芯片封装的基准。验证了聚合物包封切槽技术的有效性。本文研究了氟硅酸盐玻璃层数、模具厚度、衬底厚度、铜柱高度、衬底类型对低k层和DeltaW中分层应力的影响。然后制作了优化后的大模包试样并进行了可靠性试验。他们都通过了可靠性测试。从这些可靠性测试中,获得了低k层和DeltaW的分层应力的新基准值,可用于大芯片Cu/低k倒装封装的设计。
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引用次数: 16
Effect of Permittivity and Permeability of a Flexible Magnetic Composite Material on the Performance and Miniaturization Capability of Planar Antennas for RFID and Wearable Wireless Applications 柔性磁性复合材料的介电常数和磁导率对射频识别和可穿戴无线应用中平面天线性能和小型化能力的影响
Pub Date : 2009-11-24 DOI: 10.1109/TCAPT.2009.2032767
L. Martin, S. Ooi, D. Staiculescu, Michael D. Hill, C. Wong, M. Tentzeris
This paper is an investigation of the feasibility of applying a mechanically flexible magnetic composite material to radio frequency identification (RFID) planar antennas operating in the lower ultrahigh-frequency (UHF) spectrum (~300500 MHz). A key challenge is that the magnetic loss introduced by the magnetic composite must be sufficiently low for successful application at the targeted operating frequency. A flexible magnetic composite comprised of particles of Z-phase Co hexaferrite, also known as Co2Z, in a silicone matrix was developed. To the authors' knowledge, this is the first flexible magnetic composite demonstrated to work at these frequencies. The benchmarking structure was a quarter-wavelength microstrip patch antenna. Antennas on the developed magnetic composite and pure silicone substrates were electromagnetically modeled in Ansoft High-Frequency Sounder System full wave electromagnetic software. A prototype of the antenna on the magnetic composite was fabricated, and good agreement between the simulated and measured results was found. Comparison of the antennas on the magnetic composite versus the pure silicone substrate showed miniaturization capability of 2.4 times and performance differences of increased bandwidth and reduced gain, both of which were attributed in part to the increase in the dielectric and magnetic losses. A key finding of this paper is that a small amount of permeability (mur~2.5) can provide a substantial capability for miniaturization, while sufficiently low-magnetic loss can be introduced for successful application at the targeted operating frequency. This magnetic composite shows the capability to fulfill this balance and to be a feasible option for RFID, flexible wearable, and conformal applications in the lower UHF spectrum.
本文研究了将机械柔性磁性复合材料应用于低频超高频(~ 300500mhz)平面射频识别天线的可行性。一个关键的挑战是,磁性复合材料引入的磁损耗必须足够低,才能在目标工作频率下成功应用。研究了一种由z相钴六铁氧体(也称为Co2Z)颗粒组成的柔性磁性复合材料。据作者所知,这是第一个在这些频率下工作的柔性磁性复合材料。基准结构为四分之一波长微带贴片天线。在Ansoft高频测深系统全波电磁软件中对所研制的磁性复合材料和纯硅基板上的天线进行了电磁建模。在磁性复合材料上制作了天线样机,仿真结果与实测结果吻合较好。与纯硅基板相比,磁性复合材料天线的小型化能力提高了2.4倍,带宽增加,增益降低,两者的性能差异部分归因于介质损耗和磁损耗的增加。本文的一个关键发现是,少量的磁导率(mur~2.5)可以为小型化提供实质性的能力,同时可以引入足够低的磁损耗,以便在目标工作频率下成功应用。这种磁性复合材料显示了实现这种平衡的能力,并且是RFID,灵活可穿戴和低UHF频谱保形应用的可行选择。
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引用次数: 37
Dielectric Response of Tantalum Oxide Deposited on Polyethylene Terephthalate (PET) Film by Low-Temperature Pulsed-DC Sputtering for Wound Capacitors 聚对苯二甲酸乙二醇酯(PET)薄膜上低温脉冲直流溅射沉积氧化钽的介电响应
Pub Date : 2009-11-17 DOI: 10.1109/TCAPT.2009.2025960
G. Sethi, R. Sahul, C. Min, P. Tewari, E. Furman, M. Horn, M. Lanagan
Deposition of high-k tantalum oxide thin films on thin polymer substrates was investigated, using low-temperature (-100degC) pulsed-dc reactive sputtering. Degradation of two different polymers, polyethylene terephthalate (PET) and polypropylene (PP), were studied as a function of sputtering conditions. Two different deposition configurations have been explored for polymer films with aluminum electrode on one side. In one configuration, tantalum oxide was deposited on the nonelectroded side of the polymer, while in the other the deposition was on the electroded side of the polymer. The two fabricated structures have been characterized for dielectric permittivity, loss, and ac conductivity as a function of frequency and temperature. Sputtering tantalum oxide on the nonelectroded side of PET substrates results in a 37% higher permittivity for PET than the series model prediction of permittivity. Higher dielectric loss and ac conductivity accompany the higher permittivity. The alpha bulk relaxation in PET moves to slightly higher temperatures, indicating that there is an increase in the crystallinity of the bulk polymer. This observation is supported by the broader glass transition and an additional endothermic peak around 200degC in PET/Ta2O5 compared to neat PET. In addition, modifications of the space charge activation energy in PET from 1.35 eV to 1.82 eV and of dc conductivity in PET from 6 times10-15 S/m to 4 times10-14 S/m is observed. Sputtering Ta2O5 on the electroded side of the PET, under the same sputtering conditions, results in the formation of high-k tantalum oxide with dielectric permittivity, loss, and ac conductivity of 30, <5%, and 10-7S/m at 1 kHz, respectively.
采用低温(-100℃)脉冲直流反应溅射技术,研究了在薄聚合物衬底上沉积高k氧化钽薄膜。研究了两种不同聚合物——聚对苯二甲酸乙二醇酯(PET)和聚丙烯(PP)在溅射条件下的降解特性。以铝电极为一侧的聚合物薄膜,探索了两种不同的沉积结构。在一种构型中,氧化钽沉积在聚合物的非带电侧,而在另一种构型中,沉积在聚合物的带电侧。这两种结构的介电常数、损耗和交流电导率是频率和温度的函数。在PET衬底的非电极侧溅射氧化钽导致PET的介电常数比串联模型预测的介电常数高37%。更高的介电损耗和交流电导率伴随着更高的介电常数。PET中的α体弛豫移动到稍高的温度,表明体聚合物的结晶度有所增加。与纯PET相比,PET/Ta2O5的玻璃转变范围更广,吸热峰在200℃左右,这一观察结果得到了支持。此外,PET的空间电荷活化能从1.35 eV提高到1.82 eV,直流电导率从6倍10-15 S/m提高到4倍10-14 S/m。在相同的溅射条件下,在PET的电极侧溅射Ta2O5,可以形成高k的氧化钽,其介电常数、损耗和交流电导率在1 kHz时分别为30、<5%和10-7S/m。
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引用次数: 6
Coplanar Waveguide Filters Based on Multibehavior Etched-Ground Stubs 基于多行为蚀刻接地桩的共面波导滤波器
Pub Date : 2009-11-06 DOI: 10.1109/TCAPT.2009.2030418
M. Aziz, A. Safwat, F. Podevin, A. Vilcot
In this paper, coplanar waveguide filters with etched-ground stubs that have multiple behaviors are proposed. The response of a unit cell is a band reject with one or more transmission zeros according to the number and the lengths of the stubs. A library of transmission line models is being built for the basic cells and then used for the design of more elaborated structures. The potential of these new topologies is highlighted by providing different filtering structures with interesting features: a second-order narrow bandpass filter, and two configurations for a lowpass filter with a wide stopband. All theoretical predictions have been verified by electromagnetic simulation and measurements.
本文提出了一种具有多种行为的刻蚀接地存根共面波导滤波器。单元格的响应是带阻,根据存根的数量和长度有一个或多个传输零。正在为基本单元建立传输线模型库,然后用于设计更复杂的结构。这些新拓扑的潜力通过提供具有有趣特征的不同滤波结构来突出:二阶窄带通滤波器和两种具有宽阻带的低通滤波器配置。所有的理论预测都通过电磁模拟和测量得到了验证。
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引用次数: 8
China as Hegemon of the Global Electronics Industry: How It Got That Way and Why It Won't Change 中国作为全球电子工业的霸主:它是如何做到的,为什么它不会改变
Pub Date : 2009-11-03 DOI: 10.1109/TCAPT.2009.2032830
M. Pecht, L. Zuga
By the end of 2008, companies based on the business model of offshore production were observed to be rethinking their business models, tending to consider the repatriation of production bases in order to lower costs and shorten delivery times. In this article, the authors of China's Electronics Industry (2009 Edition), M. Pecht and L. Zuga, (City University of Hong Kong Press, Hong Kong, China, 2009) argue that repatriation is not likely to occur in the electronics industry, where expensive and complex production facilities have been moved offshore over a period of several decades. In particular, China has taken advantage of the West's offshore production model and its associated technology transfer to develop a manufacturing capability that has resulted in the ldquoChina Pricerdquo in electronics. As a result, China now has the infrastructure and electronics supply chain necessary to produce a wide range of products, from simple components to embedded systems and systems integration. This gives China the capability to produce complex electronics applications domestically, including computers, automotive controls, medical instrumentation, avionics, and even sophisticated military command and control systems. The resultant gain in Chinese capabilities, commensurate with the loss in Western capabilities through use of the offshore production model, makes the repatriation of the electronics industry to its former bastions in the United States and Western Europe doubtful. This will have a strong impact on resource allocation, research planning, and innovation. The authors present their argument through a series of brief case studies.
到2008年底,基于离岸生产商业模式的公司被观察到正在重新思考他们的商业模式,倾向于考虑生产基地的遣返,以降低成本和缩短交货时间。在这篇文章中,《中国电子工业》(2009年版)的作者M. Pecht和L. Zuga(香港城市大学出版社,中国香港,2009年)认为,在电子工业中,遣返不太可能发生,在几十年的时间里,昂贵而复杂的生产设施已经转移到海外。特别是,中国利用西方的离岸生产模式及其相关的技术转让来发展制造能力,从而导致了电子产品的低中国价格。因此,中国现在拥有生产各种产品所需的基础设施和电子供应链,从简单的组件到嵌入式系统和系统集成。这使中国有能力在国内生产复杂的电子应用,包括计算机、汽车控制、医疗仪器、航空电子设备,甚至复杂的军事指挥和控制系统。通过使用离岸生产模式,中国能力的增加与西方能力的损失相称,这使得电子工业回归其在美国和西欧的前堡垒令人怀疑。这将对资源配置、研究规划和创新产生重大影响。作者通过一系列简短的案例研究来阐述他们的论点。
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引用次数: 1
A Quality-Improved Folded Inductor Embedded in MCM-L Organic Packaging Substrate Using an Unfilled Via Process 采用无填充过孔工艺嵌入MCM-L有机封装基板的一种提高质量的折叠电感器
Pub Date : 2009-10-30 DOI: 10.1109/TCAPT.2009.2032923
Sang‐Woong Yoon, J. Laskar
This paper presents a folded inductor implemented with a multichip module, which involves a laminate organic packaging technology with an unfilled via process. The folded inductor had an increased inductor layer surface area because of the unfilled vias along the inductor layer. Thus, the quality (Q) factor of the inductor improved as the series resistance, resulting from the skin effect, decreased. The Q-factor for a folded inductor showed a maximum improvement of 32% by including contact resistances, in comparison with the Q -factors of a normal planar inductor.
本文提出了一种多芯片模块实现的折叠电感器,该电感器采用无填充孔工艺的层压板有机封装技术。由于沿电感层的未填充过孔,折叠电感具有增加的电感层表面积。因此,电感的质量(Q)因数随着集肤效应引起的串联电阻的减小而提高。与普通平面电感器的Q因子相比,折叠电感器的Q因子在加入接触电阻后最大提高了32%。
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引用次数: 0
Design of Shock Table Tests to Mimic Real-Life Drop Conditions 模拟真实跌落条件的冲击台试验设计
Pub Date : 2009-10-30 DOI: 10.1109/TCAPT.2009.2020695
C.Y. Zhou, T. Yu, E. Suhir
A systematic study, both experimentally and analytically, is conducted to evaluate the feasibility of using appropriate shock table tests to mimic the drop impact environment for components and systems adopted in portable electronics. Firstly, experiments are carried out to observe the dynamic characteristics of typical portable electronic systems and components under drop impact. Then a series of shock table tests with different constraint conditions are designed to mimic the real-life impact state. By comparing the typical results from shock table tests and those from drop tests, the correlation of shock table test parameters and drop tests conditions is investigated. The results reveal that the conventional fully constrained shock table test cannot mimic the real-life drop impact conditions, while an appropriate shock table test method should allow the sample to rotate freely. Theoretical analysis is developed to explain the mechanics of the impact scenarios. It is found that due to Hertz contact spring effect and the rotational acceleration during the impact, the acceleration of the centroid sample is significantly different to that of the table. In addition, acceleration estimated by traditional force-divided-by-mass method may underestimate the real acceleration of components inside the products.
本文从实验和分析两方面进行了系统的研究,以评估使用适当的冲击台试验来模拟便携式电子产品中采用的组件和系统的跌落冲击环境的可行性。首先,对典型便携式电子系统及部件在跌落冲击下的动态特性进行了实验研究。然后设计了一系列不同约束条件下的冲击台试验来模拟真实的冲击状态。通过比较冲击台试验和跌落试验的典型结果,探讨了冲击台试验参数与跌落试验条件的相关性。结果表明,传统的全约束冲击台试验不能模拟真实的跌落冲击条件,而适当的冲击台试验方法应允许试样自由旋转。理论分析的发展是为了解释碰撞情景的机制。研究发现,由于赫兹接触弹簧效应和撞击时的旋转加速度,质心样品的加速度与表的加速度有显著差异。此外,传统的力除以质量法估计的加速度可能会低估产品内部组件的实际加速度。
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引用次数: 11
The Thermal Resistance of Solder Joints in High Brightness Light Emitting Diode (HB LED) Packages 高亮度发光二极管(HB LED)封装中焊点的热阻
Pub Date : 2009-10-30 DOI: 10.1109/TCAPT.2009.2033414
Y. Yoon, Jin-Woo Park
We present a framework to calculate the thermal resistance of Au-Sn eutectic solder joint (Rth, Au-Sn joint) in high brightness light emitting diode (HB LED) packages whose heat extraction capability controls the optical efficiency and reliability of HB LEDs. Using the transient thermal measurement combined with the structure function based analytical method and the finite element method, we find that the thermal conductivity (k) of the thin solder joint becomes significantly smaller than the Au-Sn alloy after joining; hence, Rth, Au-Sn joint constitutes a large portion of the total Rth of the package (Rth PKG).
我们提出了一个计算高亮度发光二极管(HB LED)封装中Au-Sn共晶焊点(Rth, Au-Sn接头)的热阻的框架,其热提取能力控制着HB LED的光学效率和可靠性。利用瞬态热测量结合基于结构函数的解析方法和有限元方法,我们发现薄焊点的导热系数(k)在连接后明显小于Au-Sn合金;因此,Rth, Au-Sn接头构成了总Rth (Rth PKG)的很大一部分。
{"title":"The Thermal Resistance of Solder Joints in High Brightness Light Emitting Diode (HB LED) Packages","authors":"Y. Yoon, Jin-Woo Park","doi":"10.1109/TCAPT.2009.2033414","DOIUrl":"https://doi.org/10.1109/TCAPT.2009.2033414","url":null,"abstract":"We present a framework to calculate the thermal resistance of Au-Sn eutectic solder joint (Rth, Au-Sn joint) in high brightness light emitting diode (HB LED) packages whose heat extraction capability controls the optical efficiency and reliability of HB LEDs. Using the transient thermal measurement combined with the structure function based analytical method and the finite element method, we find that the thermal conductivity (k) of the thin solder joint becomes significantly smaller than the Au-Sn alloy after joining; hence, Rth, Au-Sn joint constitutes a large portion of the total Rth of the package (Rth PKG).","PeriodicalId":55013,"journal":{"name":"IEEE Transactions on Components and Packaging Technologies","volume":"32 1","pages":"825-831"},"PeriodicalIF":0.0,"publicationDate":"2009-10-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/TCAPT.2009.2033414","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"62520202","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 18
High-Density Embedded Deep Trench Capacitors in Silicon With Enhanced Breakdown Voltage 具有增强击穿电压的硅中高密度嵌入式深沟槽电容器
Pub Date : 2009-10-20 DOI: 10.1109/TCAPT.2009.2024210
H. Johari, F. Ayazi
This paper reports on the design, implementation, and characterization of high-density trench-refilled capacitors in complementary metal-oxide-semiconductor (CMOS) grade silicon (1-10 Omegacm). High aspect ratio trench-refilled capacitors offer a capacitance density improvement of three orders of magnitude compared to thin-film capacitors with the same die area and dielectric thickness. Also, dielectric materials such as low-pressure chemical vapor deposition (LPCVD) silicon oxide and silicon nitride are utilized to enhance the breakdown voltage of these devices. The high aspect ratio polysilicon and single crystal silicon process was utilized to implement these capacitors, giving a gap aspect ratio of . This ultrahigh vertical capacitance area achieves an ultralarge capacitance density without requiring thin-or high-k dielectric material. High-value capacitors of values ranging from 40 nF to 4 muF with capacitance density of 58 (nF/mm 2) were implemented in silicon as arrays of 170 mum-deep trenches. LPCVD silicon dioxide and silicon nitride were employed as dielectric materials to provide robust deposition inside the high aspect ratio trenches. Trench-refilled capacitors show quality factors (Q) of 230 and 8, respectively, at 45 nF and 4 muF capacitances. The breakdown voltage in trench-refilled capacitors with 35 nm-thick Si3N4 is recorded to be as high as 17-V, which is ~4x to 10x larger than that of BaTiO3 and PbZrxTi1 - xO3 (PZT) thin-film capacitors with the same dielectric thickness. Furthermore, the capacitances were measured over a temperature range of 25 to 155degC, showing less than 1.8% variation in 45 nF devices. This implies that trench-refilled capacitors are free from the very strong temperature sensitivity exhibited by most high-k materials.
本文报道了在互补金属氧化物半导体(CMOS)级硅(1-10 Omegacm)中高密度沟槽填充电容器的设计、实现和特性。高宽高比沟槽填充电容器与具有相同模面积和介质厚度的薄膜电容器相比,电容密度提高了三个数量级。此外,介质材料如低压化学气相沉积(LPCVD)氧化硅和氮化硅被用来提高这些器件的击穿电压。利用高纵横比多晶硅和单晶硅工艺来实现这些电容器,其间隙纵横比为。这种超高垂直电容区域无需薄或高k介电材料即可实现超大电容密度。高值电容器的电容密度为58 (nF/ mm2),范围从40 nF到4 muF,以170 μ m深的沟槽阵列在硅中实现。采用LPCVD二氧化硅和氮化硅作为介质材料,在高纵横比沟槽内提供坚固的沉积。沟槽填充电容器在45 nF和4 muF电容下的质量因数(Q)分别为230和8。在35 nm厚的Si3N4沟槽填充电容器中,击穿电压高达17 v,比相同介电厚度的BaTiO3和PbZrxTi1 - xO3 (PZT)薄膜电容器的击穿电压高4 ~ 10倍。此外,在温度范围为25至155摄氏度的范围内测量电容,显示45 nF器件的变化小于1.8%。这意味着沟槽填充电容器没有大多数高k材料所表现出的非常强的温度敏感性。
{"title":"High-Density Embedded Deep Trench Capacitors in Silicon With Enhanced Breakdown Voltage","authors":"H. Johari, F. Ayazi","doi":"10.1109/TCAPT.2009.2024210","DOIUrl":"https://doi.org/10.1109/TCAPT.2009.2024210","url":null,"abstract":"This paper reports on the design, implementation, and characterization of high-density trench-refilled capacitors in complementary metal-oxide-semiconductor (CMOS) grade silicon (1-10 Omegacm). High aspect ratio trench-refilled capacitors offer a capacitance density improvement of three orders of magnitude compared to thin-film capacitors with the same die area and dielectric thickness. Also, dielectric materials such as low-pressure chemical vapor deposition (LPCVD) silicon oxide and silicon nitride are utilized to enhance the breakdown voltage of these devices. The high aspect ratio polysilicon and single crystal silicon process was utilized to implement these capacitors, giving a gap aspect ratio of . This ultrahigh vertical capacitance area achieves an ultralarge capacitance density without requiring thin-or high-k dielectric material. High-value capacitors of values ranging from 40 nF to 4 muF with capacitance density of 58 (nF/mm 2) were implemented in silicon as arrays of 170 mum-deep trenches. LPCVD silicon dioxide and silicon nitride were employed as dielectric materials to provide robust deposition inside the high aspect ratio trenches. Trench-refilled capacitors show quality factors (Q) of 230 and 8, respectively, at 45 nF and 4 muF capacitances. The breakdown voltage in trench-refilled capacitors with 35 nm-thick Si3N4 is recorded to be as high as 17-V, which is ~4x to 10x larger than that of BaTiO3 and PbZrxTi1 - xO3 (PZT) thin-film capacitors with the same dielectric thickness. Furthermore, the capacitances were measured over a temperature range of 25 to 155degC, showing less than 1.8% variation in 45 nF devices. This implies that trench-refilled capacitors are free from the very strong temperature sensitivity exhibited by most high-k materials.","PeriodicalId":55013,"journal":{"name":"IEEE Transactions on Components and Packaging Technologies","volume":"32 1","pages":"808-815"},"PeriodicalIF":0.0,"publicationDate":"2009-10-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/TCAPT.2009.2024210","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"62519471","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 40
期刊
IEEE Transactions on Components and Packaging Technologies
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