首页 > 最新文献

IEEE Transactions on Components and Packaging Technologies最新文献

英文 中文
Experimental Study on Pressure Drop Characteristics of Vents 通风口压降特性的实验研究
Pub Date : 2010-03-25 DOI: 10.1109/TCAPT.2010.2041664
G. Dhanushkodi
One of the major impacts on the thermal design of electronic systems over the past decade has been the use of computational fluid dynamics and heat transfer tools. System level thermal simulation has driven the need to understand the performance and the reliability aspects of boundary conditions. In addition to the modeling inaccuracies, computation results also reflect the influence of the accuracy of input parameters. The computational fluid dynamics model of electronic enclosures requires the pressure drop details of vents to predict the system impedance and air flow through the system thereafter. The temperature of electronic components depends on the rate of airflow through the electronic system. Loss coefficient of vents appears to be the major source of error. The modeling of each vent is typically not possible and is represented by its pressure drop. An experimental setup is established to measure the pressure drop characteristics of different patterns of vents commonly used in electronic equipment. Pressure drop of different vent patterns, with hole diameter varying from 1.6 mm to 3.0 mm, the pitch varying from 3.2 mm to 6.5 mm, and the porosity varying from 20% to 45%, are measured using an experimental setup. In this paper, a practical formula for the loss coefficient of vents is presented. This formula takes into account important parameters such as hole diameter, pitch, porosity, and Reynolds number.
在过去的十年中,对电子系统热设计的主要影响之一是计算流体动力学和传热工具的使用。系统级热模拟驱动了理解边界条件的性能和可靠性方面的需求。除建模误差外,计算结果还反映了输入参数精度的影响。电子机箱的计算流体动力学模型需要通风口的压降细节来预测系统阻抗和此后通过系统的气流。电子元件的温度取决于通过电子系统的气流速率。通风口的损失系数似乎是误差的主要来源。每个通风口的建模通常是不可能的,并且由其压降表示。建立了一种实验装置,对电子设备中常用的不同型式通风口的压降特性进行了测量。采用实验装置,对孔径为1.6 ~ 3.0 mm、节距为3.2 ~ 6.5 mm、孔隙度为20% ~ 45%的不同排气孔模式下的压降进行了测量。本文给出了通风口损失系数的实用计算公式。该公式考虑了一些重要参数,如孔径、节距、孔隙度和雷诺数。
{"title":"Experimental Study on Pressure Drop Characteristics of Vents","authors":"G. Dhanushkodi","doi":"10.1109/TCAPT.2010.2041664","DOIUrl":"https://doi.org/10.1109/TCAPT.2010.2041664","url":null,"abstract":"One of the major impacts on the thermal design of electronic systems over the past decade has been the use of computational fluid dynamics and heat transfer tools. System level thermal simulation has driven the need to understand the performance and the reliability aspects of boundary conditions. In addition to the modeling inaccuracies, computation results also reflect the influence of the accuracy of input parameters. The computational fluid dynamics model of electronic enclosures requires the pressure drop details of vents to predict the system impedance and air flow through the system thereafter. The temperature of electronic components depends on the rate of airflow through the electronic system. Loss coefficient of vents appears to be the major source of error. The modeling of each vent is typically not possible and is represented by its pressure drop. An experimental setup is established to measure the pressure drop characteristics of different patterns of vents commonly used in electronic equipment. Pressure drop of different vent patterns, with hole diameter varying from 1.6 mm to 3.0 mm, the pitch varying from 3.2 mm to 6.5 mm, and the porosity varying from 20% to 45%, are measured using an experimental setup. In this paper, a practical formula for the loss coefficient of vents is presented. This formula takes into account important parameters such as hole diameter, pitch, porosity, and Reynolds number.","PeriodicalId":55013,"journal":{"name":"IEEE Transactions on Components and Packaging Technologies","volume":"33 1","pages":"432-436"},"PeriodicalIF":0.0,"publicationDate":"2010-03-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/TCAPT.2010.2041664","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"62520211","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
A Study of Hygrothermal Behavior of ACF Flip Chip Packages With Moiré Interferometry 用莫尔干涉法研究ACF倒装芯片封装的湿热行为
Pub Date : 2010-03-11 DOI: 10.1109/TCAPT.2009.2036154
Jin-Hyoung Park, Kyung-Woon Jang, K. Paik, Soon-Bok Lee
A primary factor of anisotropic conductive film (ACF) package failure is delamination between the chip and the adhesive at the edge of the chip. This delamination is mainly affected by the thermal shear strain at the edge of the chip. This shear strain was measured on various electronic ACF package specimens by micro-Moire interferometry with a phase shifting method. In order to find the effect of moisture, the reliability performance of an adhesive flip-chip in the moisture environment was investigated. The failure modes were found to be interfacial delamination and bump/pad opening which may eventually lead to total loss of electrical contact. Different geometric size specimens in terms of interconnections were discussed in the context of the significance of mismatch in coefficient of moisture expansion (CME) between the adhesive and other components in the package, which induces hygroscopic swelling stress. The effect of moisture diffusion in the package and the CME mismatch were also evaluated by using the Moire interferometry. From Moire measurement results, we could also obtain the stress intensity factor K. Through an analysis of deformations induced by thermal and moisture environments, a damage model for an adhesive flip-chip package is proposed.
各向异性导电膜(ACF)封装失效的一个主要因素是芯片与芯片边缘粘合剂之间的分层。这种分层主要受切屑边缘的热剪切应变的影响。采用相移微云纹干涉法测量了各种电子ACF封装试样的剪切应变。为了研究水分对胶粘剂倒装芯片在水分环境下的可靠性性能的影响。失效模式是界面分层和碰撞/垫打开,最终可能导致电接触完全丧失。讨论了不同几何尺寸的试样在相互连接方面的重要性,即粘合剂与包装中其他成分之间的湿膨胀系数(CME)不匹配会引起吸湿膨胀应力。利用云纹干涉测量法对封装内水分扩散和CME失配的影响进行了评价。从云纹测量结果中,我们还可以得到应力强度因子k。通过分析热、湿环境引起的变形,提出了粘接倒装封装的损伤模型。
{"title":"A Study of Hygrothermal Behavior of ACF Flip Chip Packages With Moiré Interferometry","authors":"Jin-Hyoung Park, Kyung-Woon Jang, K. Paik, Soon-Bok Lee","doi":"10.1109/TCAPT.2009.2036154","DOIUrl":"https://doi.org/10.1109/TCAPT.2009.2036154","url":null,"abstract":"A primary factor of anisotropic conductive film (ACF) package failure is delamination between the chip and the adhesive at the edge of the chip. This delamination is mainly affected by the thermal shear strain at the edge of the chip. This shear strain was measured on various electronic ACF package specimens by micro-Moire interferometry with a phase shifting method. In order to find the effect of moisture, the reliability performance of an adhesive flip-chip in the moisture environment was investigated. The failure modes were found to be interfacial delamination and bump/pad opening which may eventually lead to total loss of electrical contact. Different geometric size specimens in terms of interconnections were discussed in the context of the significance of mismatch in coefficient of moisture expansion (CME) between the adhesive and other components in the package, which induces hygroscopic swelling stress. The effect of moisture diffusion in the package and the CME mismatch were also evaluated by using the Moire interferometry. From Moire measurement results, we could also obtain the stress intensity factor K. Through an analysis of deformations induced by thermal and moisture environments, a damage model for an adhesive flip-chip package is proposed.","PeriodicalId":55013,"journal":{"name":"IEEE Transactions on Components and Packaging Technologies","volume":"33 1","pages":"215-221"},"PeriodicalIF":0.0,"publicationDate":"2010-03-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/TCAPT.2009.2036154","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"62519801","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 17
Integrated Liquid Cooling Systems for 3-D Stacked TSV Modules 3-D堆叠TSV模块集成液冷系统
Pub Date : 2010-03-11 DOI: 10.1109/TCAPT.2009.2033039
G. Tang, Siow Pin Tan, N. Khan, D. Pinjala, J. Lau, Ai Bin Yu, K. Vaidyanathan, K. Toh
In this paper, an integrated liquid cooling system for 3-D stacked modules with high dissipation level is proposed. The fluidic interconnects in this system are elaborated and the sealing technique for different fluid interfaces is discussed. Meanwhile, the pressure drop for each part of the system is analyzed. The optimized fluidic interconnects minimizing the pressure drop have been designed and fabricated, and the compact system is integrated. In line with the fluidic interconnect design and analysis, an experimental process for hydraulic characterization of the integrated cooling system is established. The pressure drops for different fluidic interconnects in this system are measured and compared with the analyzed results.
本文提出了一种用于高耗散度三维堆叠模块的集成液冷系统。阐述了该系统中的流体连接点,并讨论了不同流体界面的密封技术。同时,对系统各部分的压降进行了分析。设计和制造了压力降最小的优化流体互连,实现了紧凑的系统集成。在流体互连设计与分析的基础上,建立了综合冷却系统水力特性的实验流程。测量了系统中不同流体连接点的压降,并与分析结果进行了比较。
{"title":"Integrated Liquid Cooling Systems for 3-D Stacked TSV Modules","authors":"G. Tang, Siow Pin Tan, N. Khan, D. Pinjala, J. Lau, Ai Bin Yu, K. Vaidyanathan, K. Toh","doi":"10.1109/TCAPT.2009.2033039","DOIUrl":"https://doi.org/10.1109/TCAPT.2009.2033039","url":null,"abstract":"In this paper, an integrated liquid cooling system for 3-D stacked modules with high dissipation level is proposed. The fluidic interconnects in this system are elaborated and the sealing technique for different fluid interfaces is discussed. Meanwhile, the pressure drop for each part of the system is analyzed. The optimized fluidic interconnects minimizing the pressure drop have been designed and fabricated, and the compact system is integrated. In line with the fluidic interconnect design and analysis, an experimental process for hydraulic characterization of the integrated cooling system is established. The pressure drops for different fluidic interconnects in this system are measured and compared with the analyzed results.","PeriodicalId":55013,"journal":{"name":"IEEE Transactions on Components and Packaging Technologies","volume":"33 1","pages":"184-195"},"PeriodicalIF":0.0,"publicationDate":"2010-03-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/TCAPT.2009.2033039","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"62520181","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 49
Shot Noise Thermometry for Thermal Characterization of Templated Carbon Nanotubes 模板化碳纳米管热表征的弹态噪声测温法
Pub Date : 2010-03-11 DOI: 10.1109/TCAPT.2009.2038488
R. Sayer, Sunkook Kim, A. Franklin, S. Mohammadi, T. Fisher
A carbon nanotube (CNT) thermometer that operates on the principles of electrical shot noise is reported. Shot noise thermometry is a self-calibrating measurement technique that relates statistical fluctuations in dc current across a device to temperature. A structure consisting of vertical, top, and bottom-contacted single-walled carbon nanotubes in a porous anodic alumina template was fabricated and used to measure shot noise. Frequencies between 60 and 100 kHz were observed to preclude significant influence from Vf noise, which does not contain thermally relevant information. Because isothermal models do not accurately reproduce the observed noise trends, a self-heating shot noise model has been developed and applied to experimental data to determine the thermal resistance of a CNT device consisting of an array of vertical single-walled CNTs supported in a porous anodic alumina template. The thermal surface resistance at the nanotube-dielectric interface is found to be 1.5 × 108 K/W, which is consistent with measurements by other techniques.
报道了一种基于电射噪声原理的碳纳米管(CNT)温度计。散粒噪声测温是一种自校准测量技术,它将设备上直流电流的统计波动与温度联系起来。在多孔阳极氧化铝模板中制备了由垂直、顶部和底部接触的单壁碳纳米管组成的结构,并用于测量射击噪声。观察到频率在60至100千赫之间,以排除不包含热相关信息的Vf噪声的重大影响。由于等温模型不能准确地再现所观察到的噪声趋势,因此开发了一种自加热散粒噪声模型,并将其应用于实验数据,以确定由多孔阳极氧化铝模板中支撑的垂直单壁碳纳米管阵列组成的碳纳米管器件的热阻。在纳米管-介质界面处的热表面电阻为1.5 × 108 K/W,这与其他技术的测量结果一致。
{"title":"Shot Noise Thermometry for Thermal Characterization of Templated Carbon Nanotubes","authors":"R. Sayer, Sunkook Kim, A. Franklin, S. Mohammadi, T. Fisher","doi":"10.1109/TCAPT.2009.2038488","DOIUrl":"https://doi.org/10.1109/TCAPT.2009.2038488","url":null,"abstract":"A carbon nanotube (CNT) thermometer that operates on the principles of electrical shot noise is reported. Shot noise thermometry is a self-calibrating measurement technique that relates statistical fluctuations in dc current across a device to temperature. A structure consisting of vertical, top, and bottom-contacted single-walled carbon nanotubes in a porous anodic alumina template was fabricated and used to measure shot noise. Frequencies between 60 and 100 kHz were observed to preclude significant influence from Vf noise, which does not contain thermally relevant information. Because isothermal models do not accurately reproduce the observed noise trends, a self-heating shot noise model has been developed and applied to experimental data to determine the thermal resistance of a CNT device consisting of an array of vertical single-walled CNTs supported in a porous anodic alumina template. The thermal surface resistance at the nanotube-dielectric interface is found to be 1.5 × 108 K/W, which is consistent with measurements by other techniques.","PeriodicalId":55013,"journal":{"name":"IEEE Transactions on Components and Packaging Technologies","volume":"18 1","pages":"178-183"},"PeriodicalIF":0.0,"publicationDate":"2010-03-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/TCAPT.2009.2038488","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"62519918","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
Modeling Heat Transport in Thermal Interface Materials Enhanced With MEMS-Based Microinterconnects 基于mems微互连的热界面材料热传递建模
Pub Date : 2010-03-01 DOI: 10.1109/TCAPT.2009.2018834
Fan Zhou, P. Arunasalam, B. Murray, B. Sammakia
Thermal management of device-level packaging continues to present many technical challenges in the electronics industry. In a device/heat sink assembly, the highest resistance to heat flow typically comes from the thermal interface material (TIM). The thermal conductivities of TIMs remain in the range of 1-4 W/mK due to the properties and structure of small dispersed solids in polymer matrices. As a result of the rising design power and heat flux at the silicon die, new ways to improve the effective in situ thermal conductivity of interface materials are required. This paper analyzes a unique TIM enhanced with ultrahigh-density wafer-level thin film-compliant interconnects referred to as smart three axis compliant (STAC) interconnects. MEMS technology is used to directly fabricate STAC interconnects onto a silicon wafer and embed them into the TIM to provide an enhanced conductive path between the die/package and the heat sink. Here, results from a theoretical analysis of the thermal conduction in a TIM embedded with STAC interconnects are reported. The objective of the study is to provide comprehensive design strategies for effective implementation of this type of TIM for specific applications. Parametric studies are performed to examine the thermal resistance of the microinterconnect-enhanced TIM for varying materials, configurations, and geometry of the microinterconnects. A periodic element model of a chip-TIM configuration with top heat sink is used to evaluate the conductive effect of the microinterconnects. In addition, an investigation of the conductive transport in a more complicated chip stack is considered. A 3-D thermal analysis is conducted for a multichip stack package with and without through-silicon vias. The numerical results show that the microinterconnects significantly improve the thermal performance of the TIM. Finally, further steps toward achieving a chip-level design optimization and fabrication process using a STAC microinterconnect structured TIM is proposed.
器件级封装的热管理在电子工业中仍然存在许多技术挑战。在器件/散热器组件中,最高的热流阻力通常来自热界面材料(TIM)。TIMs的热导率保持在1 ~ 4 W/mK,这是由聚合物基体中分散的小固体的性质和结构决定的。由于硅晶片设计功率和热流密度的不断提高,需要新的方法来提高界面材料的有效原位导热系数。本文分析了一种独特的以超高密度晶圆级薄膜柔性互连增强的TIM,称为智能三轴柔性互连(STAC)。MEMS技术用于直接在硅片上制造STAC互连,并将其嵌入到TIM中,以在芯片/封装和散热器之间提供增强的导电路径。本文报道了嵌入STAC互连的TIM热传导的理论分析结果。本研究的目的是提供全面的设计策略,以有效地实施这种类型的TIM的具体应用。参数研究是为了检查微互连增强的TIM对不同材料、配置和微互连几何形状的热阻。采用带顶部散热器的芯片- tim结构的周期元素模型,对微互连的导电效果进行了评价。此外,还考虑了在更复杂的芯片堆中导电传输的研究。对带和不带硅通孔的多芯片堆叠封装进行了三维热分析。数值结果表明,微互连显著改善了TIM的热性能。最后,提出了利用STAC微互连结构TIM实现芯片级设计优化和制造工艺的进一步步骤。
{"title":"Modeling Heat Transport in Thermal Interface Materials Enhanced With MEMS-Based Microinterconnects","authors":"Fan Zhou, P. Arunasalam, B. Murray, B. Sammakia","doi":"10.1109/TCAPT.2009.2018834","DOIUrl":"https://doi.org/10.1109/TCAPT.2009.2018834","url":null,"abstract":"Thermal management of device-level packaging continues to present many technical challenges in the electronics industry. In a device/heat sink assembly, the highest resistance to heat flow typically comes from the thermal interface material (TIM). The thermal conductivities of TIMs remain in the range of 1-4 W/mK due to the properties and structure of small dispersed solids in polymer matrices. As a result of the rising design power and heat flux at the silicon die, new ways to improve the effective in situ thermal conductivity of interface materials are required. This paper analyzes a unique TIM enhanced with ultrahigh-density wafer-level thin film-compliant interconnects referred to as smart three axis compliant (STAC) interconnects. MEMS technology is used to directly fabricate STAC interconnects onto a silicon wafer and embed them into the TIM to provide an enhanced conductive path between the die/package and the heat sink. Here, results from a theoretical analysis of the thermal conduction in a TIM embedded with STAC interconnects are reported. The objective of the study is to provide comprehensive design strategies for effective implementation of this type of TIM for specific applications. Parametric studies are performed to examine the thermal resistance of the microinterconnect-enhanced TIM for varying materials, configurations, and geometry of the microinterconnects. A periodic element model of a chip-TIM configuration with top heat sink is used to evaluate the conductive effect of the microinterconnects. In addition, an investigation of the conductive transport in a more complicated chip stack is considered. A 3-D thermal analysis is conducted for a multichip stack package with and without through-silicon vias. The numerical results show that the microinterconnects significantly improve the thermal performance of the TIM. Finally, further steps toward achieving a chip-level design optimization and fabrication process using a STAC microinterconnect structured TIM is proposed.","PeriodicalId":55013,"journal":{"name":"IEEE Transactions on Components and Packaging Technologies","volume":"33 1","pages":"16-24"},"PeriodicalIF":0.0,"publicationDate":"2010-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/TCAPT.2009.2018834","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"62518844","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 11
Mechanical Reliability of Sn-Ag BGA Solder Joints With Various Electroless Ni-P and Ni-B Plating Layers 不同化学镀Ni-P和Ni-B层Sn-Ag BGA焊点的机械可靠性
Pub Date : 2010-03-01 DOI: 10.1109/TCAPT.2009.2028134
Jeong-Won Yoon, Bo-In Noh, Seung-Boo Jung
The mechanical reliability of Sn-3.5 wt.%Ag solder joints with four different electroless Ni plating layers [Ni-1B, Ni-3B, Ni-7P, and Ni-10P (in wt.%)] was investigated as a function of aging time up to 60 days at 150° C. The ultimate shear stresses for fracture were higher in the ball shear tests when using Ni-B samples than those with Ni-P metallization if the aging treatment at 150° C was shorter than 15 days, and vice versa when the aging time was higher than 45 days. In all the joints, Ni3Sn4 intermetallic compounds (IMCs) were formed at the interfaces. The thickness of the IMC layer increased with decreasing B or P content, i.e., increasing Ni content. The reaction rate between the Sn-Ag solder and Ni-P was slower than that between the Sn-Ag solder and Ni-B. In the shear test, the failure mode switched from a bulk-related failure (ductile fracture) to an interface-related failure (brittle fracture), depending on the aging time. After prolonged aging treatment, weak solder/Ni3Sn4 interfaces led to a failure mode of brittle fracture for all the solder joints, due to the formation of thick Ni3Sn4 IMCs. The failure for the Sn-Ag/Ni-B joints was more abrupt and brittle due to the formation of the thick, interfacial Ni3Sn4 IMC. The results demonstrated that the Sn-Ag/Ni-P joint was more reliable than the Sn-Ag/Ni-B joint from the viewpoints of interfacial IMC thickness and long-term mechanical reliability.
sn - 3.5的机械可靠性wt. % Ag焊点与四个不同的化学镀镍层(Ni-1B, Ni-3B、Ni-7P Ni-10P (wt. %)]研究了老化时间的函数60天在150°C的终极剪切应力骨折在球高剪切测试当使用Ni-B样本对镍磷金属化比如果时效处理在150°C是短于15天,反之亦然,当老化时间高于45天。在所有接头的界面处均形成了Ni3Sn4金属间化合物(IMCs)。随着B或P含量的降低,即Ni含量的增加,IMC层的厚度增加。Sn-Ag钎料与Ni-P的反应速率比Sn-Ag钎料与Ni-B的反应速率慢。在剪切试验中,根据时效时间的不同,破坏模式从与体相关的破坏(韧性断裂)切换到与界面相关的破坏(脆性断裂)。经过长时间时效处理后,由于形成较厚的Ni3Sn4 imc,弱焊料/Ni3Sn4界面导致所有焊点的失效模式为脆性断裂。由于形成了厚的Ni3Sn4界面IMC, Sn-Ag/Ni-B接头的破坏更为突然和脆性。结果表明,从界面IMC厚度和长期力学可靠性的角度来看,Sn-Ag/Ni-P接头比Sn-Ag/Ni-B接头更可靠。
{"title":"Mechanical Reliability of Sn-Ag BGA Solder Joints With Various Electroless Ni-P and Ni-B Plating Layers","authors":"Jeong-Won Yoon, Bo-In Noh, Seung-Boo Jung","doi":"10.1109/TCAPT.2009.2028134","DOIUrl":"https://doi.org/10.1109/TCAPT.2009.2028134","url":null,"abstract":"The mechanical reliability of Sn-3.5 wt.%Ag solder joints with four different electroless Ni plating layers [Ni-1B, Ni-3B, Ni-7P, and Ni-10P (in wt.%)] was investigated as a function of aging time up to 60 days at 150° C. The ultimate shear stresses for fracture were higher in the ball shear tests when using Ni-B samples than those with Ni-P metallization if the aging treatment at 150° C was shorter than 15 days, and vice versa when the aging time was higher than 45 days. In all the joints, Ni3Sn4 intermetallic compounds (IMCs) were formed at the interfaces. The thickness of the IMC layer increased with decreasing B or P content, i.e., increasing Ni content. The reaction rate between the Sn-Ag solder and Ni-P was slower than that between the Sn-Ag solder and Ni-B. In the shear test, the failure mode switched from a bulk-related failure (ductile fracture) to an interface-related failure (brittle fracture), depending on the aging time. After prolonged aging treatment, weak solder/Ni3Sn4 interfaces led to a failure mode of brittle fracture for all the solder joints, due to the formation of thick Ni3Sn4 IMCs. The failure for the Sn-Ag/Ni-B joints was more abrupt and brittle due to the formation of the thick, interfacial Ni3Sn4 IMC. The results demonstrated that the Sn-Ag/Ni-P joint was more reliable than the Sn-Ag/Ni-B joint from the viewpoints of interfacial IMC thickness and long-term mechanical reliability.","PeriodicalId":55013,"journal":{"name":"IEEE Transactions on Components and Packaging Technologies","volume":"33 1","pages":"222-228"},"PeriodicalIF":0.0,"publicationDate":"2010-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/TCAPT.2009.2028134","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"62519405","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 12
Numerical Study of Free Convection Dominated Melting in an Isolated Cavity Heated by Three Protruding Electronic Components 由三个突出的电子元件加热的隔离腔内自由对流主导熔化的数值研究
Pub Date : 2010-03-01 DOI: 10.1109/TCAPT.2009.2029086
M. Faraji, H. El Qarnia
This paper presents the results of a numerical study of the melting and natural convection in a rectangular enclosure heated with three discrete protruding electronic components (heat sources) mounted on a conducting vertical plate. The heat sources generate heat at a constant and uniform volumetric rate. A part of the power generated in the heat sources is dissipated in phase change material (PCM, n-eicosane with melting temperature, Tm = 36°C) that filled the enclosure. The advantage of using this cooling strategy is that the PCMs are able to absorb a high amount of heat generated by electronic components without activating the fan. To investigate the thermal behavior of the proposed cooling system, a mathematical model, based on the mass, momentum, and energy conservation equations, was developed. The governing equations are next discretized using a finite volume method in a staggered mesh, and a pressure correction equation method is employed for the pressure-velocity coupling. The energy conservation equation for the PCM is solved using the enthalpy method. The solid regions (substrate and heat sources) are treated as fluid regions with infinite viscosity. A parametric study was conducted in order to optimize the thermal performance of the heat sink. The optimization involves determination of the key parameter values that maximize the time required by the electronic component to reach the critical temperature (T < Tcr).
本文给出了由安装在导电垂直板上的三个分立的突出电子元件(热源)加热的矩形外壳内熔化和自然对流的数值研究结果。热源以恒定和均匀的体积率产生热量。在热源中产生的一部分能量在充满外壳的相变材料(PCM,熔化温度为Tm = 36°C的n-二十烷)中消散。使用这种冷却策略的优点是pcm能够在不激活风扇的情况下吸收电子元件产生的大量热量。为了研究所提出的冷却系统的热行为,建立了一个基于质量、动量和能量守恒方程的数学模型。采用有限体积法在交错网格中离散控制方程,并采用压力修正方程法求解压力-速度耦合。用焓法求解了相变介质的能量守恒方程。固体区域(基材和热源)被视为具有无限粘度的流体区域。为了优化散热器的热性能,进行了参数化研究。优化包括确定关键参数值,使电子元件达到临界温度(T < Tcr)所需的时间最大化。
{"title":"Numerical Study of Free Convection Dominated Melting in an Isolated Cavity Heated by Three Protruding Electronic Components","authors":"M. Faraji, H. El Qarnia","doi":"10.1109/TCAPT.2009.2029086","DOIUrl":"https://doi.org/10.1109/TCAPT.2009.2029086","url":null,"abstract":"This paper presents the results of a numerical study of the melting and natural convection in a rectangular enclosure heated with three discrete protruding electronic components (heat sources) mounted on a conducting vertical plate. The heat sources generate heat at a constant and uniform volumetric rate. A part of the power generated in the heat sources is dissipated in phase change material (PCM, n-eicosane with melting temperature, Tm = 36°C) that filled the enclosure. The advantage of using this cooling strategy is that the PCMs are able to absorb a high amount of heat generated by electronic components without activating the fan. To investigate the thermal behavior of the proposed cooling system, a mathematical model, based on the mass, momentum, and energy conservation equations, was developed. The governing equations are next discretized using a finite volume method in a staggered mesh, and a pressure correction equation method is employed for the pressure-velocity coupling. The energy conservation equation for the PCM is solved using the enthalpy method. The solid regions (substrate and heat sources) are treated as fluid regions with infinite viscosity. A parametric study was conducted in order to optimize the thermal performance of the heat sink. The optimization involves determination of the key parameter values that maximize the time required by the electronic component to reach the critical temperature (T < Tcr).","PeriodicalId":55013,"journal":{"name":"IEEE Transactions on Components and Packaging Technologies","volume":"33 1","pages":"167-177"},"PeriodicalIF":0.0,"publicationDate":"2010-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/TCAPT.2009.2029086","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"62519412","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 13
An Examination of Underfill Flow in Large Dies With Nonuniform Bump Patterns 具有非均匀凸型的大型凹模下填料流动的研究
Pub Date : 2010-03-01 DOI: 10.1109/TCAPT.2009.2029564
L. Zheng, Ying Sun
In this paper, numerical modeling and experimental results are presented for underfill flow in a large die with a nonuniform bump pattern in a flip-chip packaging configuration. Two different 2-D flow models coupled with the volume-of-fluid method are applied to track the underfill flow front during the simulation of the flip-chip encapsulation process. The first model employs the modified Washburn model and uses a time-dependent inlet velocity to account for the flow resistance across the gap direction in the presence of bump interconnects. The second model introduces a momentum source term in the Stokes equation to represent the gapwise flow resistance. Rheological properties, surface tension, and dynamic contact angles for commercial underfill material and the effect of flux residue on underfill wetting properties are experimentally determined. Simulation results based on the two models are compared with in-situ flow visualization conducted using bumped quartz dies. The modified Stokes model yields better predictions of the underfill penetration length as a function of time and the total flow-out time. This model is then used to investigate the effects of dynamic contact angles and temperature-dependent underfill viscosity on underfill flow in a large die with a nonuniform bump pattern.
本文给出了在倒装芯片封装结构中具有非均匀凹凸图案的大模内的下填料流动的数值模拟和实验结果。在倒装芯片封装过程仿真中,采用了两种不同的二维流动模型,结合流体体积法对充填体流锋进行了跟踪。第一个模型采用改进的Washburn模型,并使用与时间相关的进口速度来考虑存在凹凸互连时跨间隙方向的流动阻力。第二种模型在Stokes方程中引入动量源项来表示间隙流动阻力。实验确定了商用底填料的流变性能、表面张力和动态接触角,以及残馀助熔剂对底填料润湿性能的影响。将基于两种模型的仿真结果与利用凸模进行的现场流动显示进行了比较。修正后的Stokes模型能较好地预测下填体穿透长度与时间和总流出时间的关系。然后,该模型用于研究动态接触角和温度相关的下填料粘度对具有非均匀凹凸图案的大型模具中下填料流动的影响。
{"title":"An Examination of Underfill Flow in Large Dies With Nonuniform Bump Patterns","authors":"L. Zheng, Ying Sun","doi":"10.1109/TCAPT.2009.2029564","DOIUrl":"https://doi.org/10.1109/TCAPT.2009.2029564","url":null,"abstract":"In this paper, numerical modeling and experimental results are presented for underfill flow in a large die with a nonuniform bump pattern in a flip-chip packaging configuration. Two different 2-D flow models coupled with the volume-of-fluid method are applied to track the underfill flow front during the simulation of the flip-chip encapsulation process. The first model employs the modified Washburn model and uses a time-dependent inlet velocity to account for the flow resistance across the gap direction in the presence of bump interconnects. The second model introduces a momentum source term in the Stokes equation to represent the gapwise flow resistance. Rheological properties, surface tension, and dynamic contact angles for commercial underfill material and the effect of flux residue on underfill wetting properties are experimentally determined. Simulation results based on the two models are compared with in-situ flow visualization conducted using bumped quartz dies. The modified Stokes model yields better predictions of the underfill penetration length as a function of time and the total flow-out time. This model is then used to investigate the effects of dynamic contact angles and temperature-dependent underfill viscosity on underfill flow in a large die with a nonuniform bump pattern.","PeriodicalId":55013,"journal":{"name":"IEEE Transactions on Components and Packaging Technologies","volume":"33 1","pages":"196-205"},"PeriodicalIF":0.0,"publicationDate":"2010-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/TCAPT.2009.2029564","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"62519446","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Comparison of Interfacial Stability of Pb-Free Solders (Sn—3.5Ag, Sn—3.5Ag—0.7Cu, and Sn—0.7Cu) on ENIG-Plated Cu During Aging 无铅钎料(Sn-3.5Ag、Sn-3.5Ag - 0.7Cu和Sn-0.7Cu)在enigg镀铜表面时效过程中的界面稳定性比较
Pub Date : 2010-03-01 DOI: 10.1109/TCAPT.2009.2025961
Jeong-Won Yoon, Bo-In Noh, Seung-Boo Jung
The solid-state interfacial reactions of Pb-free solders (Sn-3.5Ag, Sn-3.5Ag-0.7Cu, and Sn-0.7Cu) with electroless nickel-immersion gold (ENIG)-plated Cu substrate, and the growth of interfacial intermetallic compound (IMC) layers were investigated and compared during aging at 200°C for up to 1000 h. The Sn-3.5Ag-0.7Cu solder exhibited a higher IMC growth rate and a higher consumption rate of the Ni(P) layer than the other two Pb-free solders. The interfacial reaction of the Sn-0.7Cu/ENIG-plated Cu system during aging was the slowest among the three kinds of solder joint. The thickness of the interfacial IMCs were ranked in the order Sn-3.5Ag-0.7Cu > Sn-3.5Ag > Sn-0.7Cu. The higher melting temperature of the Sn-0.7Cu solder and the presence of Cu element within the solder suppressed the growth of the interfacial IMC layer and the consumption of the Ni(P) layer, resulting in the superior interfacial stability of the solder joint at high temperature of 200°C.
研究了无铅钎料(Sn-3.5Ag、Sn-3.5Ag-0.7Cu和Sn-0.7Cu)与化学镀镍金(ENIG) Cu衬底在200℃时效1000 h时的固相界面反应和界面金属间化合物(IMC)层的生长情况。结果表明,与其他两种无铅钎料相比,Sn-3.5Ag-0.7Cu钎料具有更高的IMC生长速率和更高的Ni(P)层消耗率。Sn-0.7Cu/ enigg -镀Cu体系在时效过程中的界面反应是三种焊点中最慢的。界面imc的厚度依次为Sn-3.5Ag-0.7 cu > Sn-3.5Ag > Sn-0.7Cu。Sn-0.7Cu钎料较高的熔化温度和钎料中Cu元素的存在抑制了界面IMC层的生长和Ni(P)层的消耗,使得焊点在200℃高温下具有优异的界面稳定性。
{"title":"Comparison of Interfacial Stability of Pb-Free Solders (Sn—3.5Ag, Sn—3.5Ag—0.7Cu, and Sn—0.7Cu) on ENIG-Plated Cu During Aging","authors":"Jeong-Won Yoon, Bo-In Noh, Seung-Boo Jung","doi":"10.1109/TCAPT.2009.2025961","DOIUrl":"https://doi.org/10.1109/TCAPT.2009.2025961","url":null,"abstract":"The solid-state interfacial reactions of Pb-free solders (Sn-3.5Ag, Sn-3.5Ag-0.7Cu, and Sn-0.7Cu) with electroless nickel-immersion gold (ENIG)-plated Cu substrate, and the growth of interfacial intermetallic compound (IMC) layers were investigated and compared during aging at 200°C for up to 1000 h. The Sn-3.5Ag-0.7Cu solder exhibited a higher IMC growth rate and a higher consumption rate of the Ni(P) layer than the other two Pb-free solders. The interfacial reaction of the Sn-0.7Cu/ENIG-plated Cu system during aging was the slowest among the three kinds of solder joint. The thickness of the interfacial IMCs were ranked in the order Sn-3.5Ag-0.7Cu > Sn-3.5Ag > Sn-0.7Cu. The higher melting temperature of the Sn-0.7Cu solder and the presence of Cu element within the solder suppressed the growth of the interfacial IMC layer and the consumption of the Ni(P) layer, resulting in the superior interfacial stability of the solder joint at high temperature of 200°C.","PeriodicalId":55013,"journal":{"name":"IEEE Transactions on Components and Packaging Technologies","volume":"33 1","pages":"64-70"},"PeriodicalIF":0.0,"publicationDate":"2010-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/TCAPT.2009.2025961","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"62519597","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 24
Dynamic Finite Element Analysis of Failure in Alternating Phase-Shift Masks Caused by Megasonic Cleaning 高频清洗引起交变相移掩模失效的动态有限元分析
Pub Date : 2010-03-01 DOI: 10.1109/TCAPT.2009.2021393
X. Yin, K. Komvopoulos
The mechanical response of alternating phase-shift mask (APSM) microstructures subjected to dynamic pressure loadings relevant to those encountered in megasonic cleaning was analyzed with the finite element method (FEM). A parametric study of the effects of microstructure dimensions, pressure amplitude, and loading frequency on the mask structural integrity was performed for two typical chromium/quartz APSM patterns. Failure due to microfracture and plastic deformation processes which may occur during megasonic cleaning was examined for loading frequencies of 1, 5, and 10 MHz. The FEM results provide insight into possible failure modes and critical microstructure dimensions for instantaneous microstructure damage. Different failure scenarios revealed by the FEM results are in qualitative agreement with experimental observations. The results of this study have direct implications to the design of extreme ultraviolet lithography masks and the optimization of the megasonic cleaning process.
采用有限元法分析了与超音速清洗相关的动压力载荷作用下交变相移掩膜(APSM)微结构的力学响应。对两种典型的铬/石英APSM模式进行了微观结构尺寸、压力幅值和加载频率对掩膜结构完整性的影响参数化研究。在1、5和10 MHz的加载频率下,研究了在超声速清洗过程中可能发生的微断裂和塑性变形过程。有限元分析结果揭示了瞬时微观结构损伤的可能破坏模式和临界微观结构尺寸。有限元分析结果所揭示的不同破坏情况与试验结果在定性上一致。本研究结果对极紫外光刻掩模的设计和超声速清洗工艺的优化具有直接意义。
{"title":"Dynamic Finite Element Analysis of Failure in Alternating Phase-Shift Masks Caused by Megasonic Cleaning","authors":"X. Yin, K. Komvopoulos","doi":"10.1109/TCAPT.2009.2021393","DOIUrl":"https://doi.org/10.1109/TCAPT.2009.2021393","url":null,"abstract":"The mechanical response of alternating phase-shift mask (APSM) microstructures subjected to dynamic pressure loadings relevant to those encountered in megasonic cleaning was analyzed with the finite element method (FEM). A parametric study of the effects of microstructure dimensions, pressure amplitude, and loading frequency on the mask structural integrity was performed for two typical chromium/quartz APSM patterns. Failure due to microfracture and plastic deformation processes which may occur during megasonic cleaning was examined for loading frequencies of 1, 5, and 10 MHz. The FEM results provide insight into possible failure modes and critical microstructure dimensions for instantaneous microstructure damage. Different failure scenarios revealed by the FEM results are in qualitative agreement with experimental observations. The results of this study have direct implications to the design of extreme ultraviolet lithography masks and the optimization of the megasonic cleaning process.","PeriodicalId":55013,"journal":{"name":"IEEE Transactions on Components and Packaging Technologies","volume":"33 1","pages":"46-55"},"PeriodicalIF":0.0,"publicationDate":"2010-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/TCAPT.2009.2021393","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"62519679","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
期刊
IEEE Transactions on Components and Packaging Technologies
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1