Triazole compounds are the excellent corrosion inhibitors for copper. The degree of polymerization of triazole inhibition film is an important factor influencing their anticorrosion performance. The atom transfer radical polymerization (ATRP) reaction provides an effective method to synthesize the polymer with controlled degree of polymerization. In this work, a triazole monomer of (1-tosyl-1H-1,2,3-triazol-4-yl) methyl acrylate (TTMA) is synthesized via the CuAAC (Cu(I)-catalyzed azide-alkyne cycloaddition) “click chemistry” reaction between propynyl acrylate and p-toluenesulfonyl azide. The triazole polymer (P-TTMA) with different degree of polymerization (DP) is prepared by the ATRP reaction among TTMA monomers. The DP value of P-TTMA polymer is regulated by varying the [monomer]/[initiator] ratio in ATRP reaction. The P-TTMA polymer is assembled on copper surface by self-assembling method to form P-TTMA inhibition film protecting copper from corrosion. The electrochemical measurement results indicate that P-TTMA films show excellent protection performance for copper in 3.5 wt% NaCl solution. Their protection performance for copper is related to the DP value of P-TTMA polymer. Within a certain range of DP value, the anticorrosion performance of P-TTMA film increases with the DP value increasing. But when the DP value is too large, the anticorrosion performance of P-TTMA film decreases, contrarily. When the DP value of P-TTMA polymer is 56, the obtained P-TTMA film shows the best protection performance; its protection efficiency for copper is 95.6%. The relationship between the degree of polymerization of P-TTMA polymer and its adsorption behavior on copper surface is discussed via surface analysis and molecular dynamics (MD) simulation. The results reveal that the [monomer]/[initiator] ratio variation can yield P-TTMA with different DP values, which can form the different P-TTMA films on copper surfaces. The protection of P-TTMA film for Cu is mainly achieved via the coordination between triazole ring, O atoms in P-TTMA molecule with Cu, and the intermolecular interaction between P-TTMA molecules and Cu. The DP of P-TTMA can affect the conformation and adsorption behavior of P-TTMA film on copper surface, influencing the protection performance of P-TTMA film for copper.