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2020 47th IEEE Photovoltaic Specialists Conference (PVSC)最新文献

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Novel Monocrystalline Silicon Texturing for supporting nano- to polycrystalline layers 支持纳米到多晶层的新型单晶硅纹理
Pub Date : 2020-06-14 DOI: 10.1109/PVSC45281.2020.9300643
Thierry de Vrijer, A. Smets
Crystalline silicon tandems with perovskites, CIGS and nanocrystalline silicon, as well as the TOPcon design are incompatible with the conventional pyramidal surface texture of silicon. Three texturing approaches, using alkaline and/or acidic wet chemical etches, are investigated in this work, that can lead to the crack-free growth of a nano- to poly-crystalline silicon material on textured surfaces. Without acidic smoothening, the fraction of <111> pyramidal surface coverage has to remain relatively small to prevent crack formation during crystalline growth. Applying an acidic etch as a function of time continuously smoothens surface features. This shifts the reflection to wider scattering angles and results in higher total reflected intensity with respect to the conventional texture, making it an interesting option for a wide variety of tandem pv applications. Finally we demonstrate crater like features on a <100> monocrystalline silicon surface using an etching process inlcuding a sacrificial layer. These craters increases light scattering into wider angles, but to a lesser extent than the former approach.
晶体硅与钙钛矿、CIGS和纳米晶硅的串联以及TOPcon设计与传统的硅金字塔表面结构不相容。本研究研究了三种织构方法,分别使用碱性和/或酸性湿化学蚀刻,这三种方法可以导致纳米到多晶硅材料在织构表面上无裂纹生长。没有酸平滑,金字塔表面覆盖的比例必须保持相对较小,以防止在晶体生长过程中形成裂纹。应用酸性蚀刻作为时间的函数连续平滑表面特征。这将反射转移到更宽的散射角度,并且相对于传统纹理产生更高的总反射强度,使其成为各种串联pv应用的有趣选择。最后,我们在单晶硅表面使用蚀刻工艺(包括牺牲层)展示了坑状特征。这些陨石坑增加了光散射到更宽的角度,但比前一种方法的程度要小。
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引用次数: 0
Indoor characterisation of thin-film PV modules installed for 4.6 years in desert conditions 在沙漠条件下安装了4.6年的薄膜光伏组件的室内特性
Pub Date : 2020-06-14 DOI: 10.1109/PVSC45281.2020.9300986
Ahmad Alheloo, J. John, Omar Albadwawi, Ali Almheiri, Hebatalla Alhamadani, Shaikha Hassan, A. Alnuaimi
Degradation of commercially available CdTe and CIGS PV modules installed in the desert conditions, are not well understood, because they have been in operation for relatively short period compared to crystalline silicon PV technology. In this paper, we investigate the degradation rate of both these thin-film technologies using indoor characterization methods. The calculated annual degradation rate of CdTe technology (1.3-2.2 percent/year) is lower than CIGS (5.3-8.8 /year). The main cause of this degradation is the reduction in fill factor caused by formation of permanent shunts. These shunts were characterized using Electroluminescence and microscopic imaging.
安装在沙漠条件下的商用CdTe和CIGS光伏组件的降解情况尚不清楚,因为与晶体硅光伏技术相比,它们的运行时间相对较短。在本文中,我们使用室内表征方法研究了这两种薄膜技术的降解率。CdTe技术的年降解率(1.3 ~ 2.2% /年)低于CIGS技术(5.3 ~ 8.8 /年)。这种退化的主要原因是由于永久分流的形成导致填充因子的减少。使用电致发光和显微成像对这些分流进行了表征。
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引用次数: 2
Determination of Series Resistance in CdSeTe/CdTe Solar Cells by the Jsc–Voc Method Jsc-Voc法测定CdSeTe/CdTe太阳能电池串联电阻
Pub Date : 2020-06-14 DOI: 10.1109/PVSC45281.2020.9300880
Carey Reich, A. Onno, Alexandra M. Bothwell, Anna Kindvall, Z. Holman, W. Sampath
While commonly used in Si solar cell characterization, the Suns– Vocmethod of determining series resistance (Rs) is rarely used for CdTe and its alloys. However, it is advantageous relative to the slope method–commonly used in the CdTe community–because it measures series resistance at the maximum power point, at which a solar cell operates. Using the self-consistent predecessor to $mathrm{Suns}-mathrm{V}_{mathrm{oc}}, mathrm{J}_{mathrm{sc}}-mathrm{V}_{mathrm{oc}}$, we determine $mathrm{R}_{mathrm{s}}$ of two different $mathrm{CdSeTe}/mathrm{CdTe}$ solar cell structures to be 0.96 and 2.72 μcm2, with repeated measurements showing little deviation.
虽然通常用于硅太阳能电池表征,但测定串联电阻(Rs)的Suns - voc方法很少用于CdTe及其合金。然而,相对于通常用于CdTe领域的斜率法,它是有利的,因为它测量的是太阳能电池工作时最大功率点的串联电阻。利用$ mathm{太阳}- $ mathm {V}_{ mathm {oc}}、$ mathm {J}_{ mathm {sc}}- $ mathm {V}_{ mathm {c}}$两个不同的$ mathm {CdSeTe}/ mathm {CdTe}$太阳能电池结构$ mathm {R}_{ mathm {s}}$的自一致前驱体,我们确定$ mathm {R}_{ mathm {s}}$为0.96 μcm2和2.72 μcm2,重复测量显示偏差很小。
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引用次数: 0
Numerical Simulations of Time-Resolved Photoluminescence in CdSexTe1-x/CdTe Solar Cells CdSexTe1-x/CdTe太阳能电池时间分辨光致发光的数值模拟
Pub Date : 2020-06-14 DOI: 10.1109/PVSC45281.2020.9300736
J. Moseley, D. Krasikov, D. Kuciauskas
We present initial time-resolved photoluminescence (TRPL) simulations in graded CdSexTe1-e thin-film solar cells to quantify the front-interface recombination velocity, Sint,front. Our model includes several composition dependences: bandgap energy, absorption coefficient, electron affinity, and carrier lifetime. Cathodoluminescence spectrum imaging measurements on bevels provide an estimate of the bandgap and the CdSexTe1-x alloy composition through the absorber thickness. TRPL decays are simulated as a function of the laser power, Sint,front, front-interface band offset, and bulk Shockley-Read-Hall lifetime. We find the impact of Sintf,ront on the PL decay increases as the band offset shifts from a “spike” to a “cliff”. Recombination rate analysis shows that back-interface recombination could potentially dictate the later part of the TRPL decay “τ2” in high-lifetime CdSexTe1-x cells. We briefly discuss ongoing work to determine TRPL measurement conditions that maximize sensitivity to Sitnt,front.
我们在分级CdSexTe1-e薄膜太阳能电池中进行了初始时间分辨光致发光(TRPL)模拟,以量化前界面复合速度Sint,front。我们的模型包括几个成分依赖:带隙能量,吸收系数,电子亲和和载流子寿命。斜面上的阴极发光光谱成像测量通过吸收剂厚度提供了带隙和CdSexTe1-x合金成分的估计。TRPL衰减被模拟为激光功率、Sint、前、前界面带偏移和整体肖克利-里德-霍尔寿命的函数。我们发现Sintf, front对PL衰减的影响随着频带偏移从“尖峰”转变为“悬崖”而增加。重组率分析表明,在高寿命CdSexTe1-x细胞中,后界面重组可能决定了TRPL衰变的后期τ2。我们简要地讨论了正在进行的工作,以确定TRPL测量条件,最大限度地提高对Sitnt,front的灵敏度。
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引用次数: 1
Firing stability of n-type poly-Si on oxide junctions formed by quartz tube annealing 石英管退火形成的n型多晶硅氧化物结的烧成稳定性
Pub Date : 2020-06-14 DOI: 10.1109/PVSC45281.2020.9300849
C. Hollemann, F. Haase, J. Krügener, R. Brendel, R. Peibst
Passivating contacts formed by poly-Si on oxide (POLO) junctions yield high passivation qualities after an appropriate annealing process at temperatures between 800°C and 1050°C. In today's typical cell process, firing is applied in the end of cell production mainly to form screen printed contacts. Thus, a high stability of the passivation quality against this firing process is required - and also expected since a previous high-temperature process for POLO junction formation implies a much higher thermal budget. However, in this work we found a significant decrease in effective lifetimes of up to 75% for n-type POLO samples with ~ 1.5 nm interfacial oxide at firing temperatures of 620°C to 900°C. This holds without a supply of hydrogen (no capping layers). Experiments with hydrogen-rich dielectric capping layers show, however, that a coating with AlOx:H as opposed to SiNy:H (n = 2.05), can significantly increase the stability of the passivation upon firing. Capacitance-voltage measurements show that the saturation current density correlates to the density of defect states at the SiOx/c-Si interface when varying the firing temperature. Although firing with hydrogen supplying layers such as AlOx:H seems to be viable, our results may indicate that the chemical configuration of the SiOx/Si interface changes from Si-O to Si-H bonds upon firing. If this hypothesis holds true, possible implications on the long-term stability of the passivation quality should be evaluated.
由聚硅氧化物(POLO)结形成的钝化触点在800°C至1050°C的温度下经过适当的退火处理后,产生高的钝化质量。在今天的典型电池工艺中,烧制主要应用于电池生产的最后,以形成丝网印刷的触点。因此,需要在该烧制过程中保持高稳定性的钝化质量,并且由于之前的高温工艺形成POLO结意味着更高的热收支,因此也期望如此。然而,在这项工作中,我们发现在620°C至900°C的烧制温度下,具有~ 1.5 nm界面氧化物的n型POLO样品的有效寿命显著降低了75%。在没有氢气供应的情况下(没有封盖层),这种情况仍然存在。然而,对富氢介质覆盖层的实验表明,与SiNy:H (n = 2.05)相比,AlOx:H涂层可以显著提高烧结钝化的稳定性。电容电压测量结果表明,当烧结温度变化时,饱和电流密度与SiOx/c-Si界面缺陷态密度相关。虽然用像AlOx:H这样的供氢层烧制似乎是可行的,但我们的研究结果可能表明,SiOx/Si界面的化学构型在烧制时从Si- o键转变为Si-H键。如果这一假设成立,对钝化质量的长期稳定性可能产生的影响应该进行评估。
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引用次数: 5
A Novel Method to Evaluate Irradiance in PV Field without Irradiance Sensors 一种无需辐照度传感器评估光伏场辐照度的新方法
Pub Date : 2020-06-14 DOI: 10.1109/PVSC45281.2020.9300796
Li Feng, F. Hamelmann, Jingwei Zhang, Kun Ding, Matthias Diehl, Thomas Pfeil, Steffen Brandt, Werner Friedrich, N. Amin
In order to develop scientific research on the performance analysis and faults detection for monitoring status in photovoltaic (PV) array, an accurate and reliable irradiance evaluation are required. The mathematical expressions for irradiance evaluation at module level and array level are presented by the measured current and voltage of the PV module and PV array. The proposed method is verified with three typical weathers and a big dataset of one year. The results of module level show that the proposed method has performed good R2 errors of 0.9957 on a sunny day, 0.9978 on a cloudy day and 0.9898 on a day with low irradiance. The average percentage errors are 4.9%., 7.4% and 8.3% respectively. At the array level, the average error for one year is achieved by 6.51%., and 50% of average irradiance ranges are from 200 W/m2 to 600 W/m2 during the whole year. It is proved to be rarely affected by uncertainties from weather changes. The proposed method is suitable to calculate irradiance and obtain input energy of PV array in engineering application.
为了开展光伏阵列状态监测的性能分析和故障检测的科学研究,需要准确可靠的辐照度评估。通过测量光伏组件和光伏阵列的电流和电压,给出了组件级和阵列级辐照度评估的数学表达式。用3个典型天气和1年的大数据集对该方法进行了验证。模块水平的结果表明,该方法具有良好的R2误差,晴天为0.9957,阴天为0.9978,低照度日为0.9898。平均错误率为4.9%。、7.4%和8.3%。在阵列级,一年的平均误差为6.51%。,全年平均辐照度有50%在200w /m2 ~ 600w /m2之间。事实证明,它很少受到天气变化的不确定性的影响。该方法适用于光伏阵列辐照度计算和输入能量获取的工程应用。
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引用次数: 0
Insights into Na+ Diffusion in Silicon Modules under Operating Conditions: Measuring Low Concentrations by D-SIMS 在工作条件下对硅模块中Na+扩散的见解:用D-SIMS测量低浓度
Pub Date : 2020-06-14 DOI: 10.1109/PVSC45281.2020.9300773
Jacob Clenney, Erick M Loran, G. von Gastrow, D. Fenning, R. Meier, M. Bertoni
Sodium induced shunting under an electric field is a challenging reliability issue in crystalline Si solar modules. THe source of this Potential-Induced Degradation of the Shunting type (PID-s) is well understood [1] and its influence on power loss has been intensively studied based on phenomenological models on cell or module level relating the experimental power-loss to stressing parameters (time, temperature, voltage) [1]. However, little is known about the Na ion migration kinetics, responsible for PID on a microscopic level, and its quantitative relation to the efficiency degradation. In this paper we present our investigations of sodium ion migration in Ethylene-Vinyl Acetate (EVA) and silicon through Dynamic Secondary Ion Mass Spectroscopy (D-SIMS). Each sample was annealed at field relevant temperatures from 60–90 °C to address typical migration mechanisms of common PV installations. Analysis of the SIMS migration profiles revealed a diffusivity constant D0,EVA = 0.09 ± 0.14 cm2/s and an activation energy EA,EVA = 0.85 ± .04 eV for Na in EVA and diffusivities higher than extrapolated literature values in silicon (D0,Si = (3.03 ± 2.42)x10−5 cm2/s, and EA,Si = 0.98 ± 0.02 eV). The new insight will be included in a drift-diffusion based degradation model accounting for the partition coefficient across all relevant interfaces. This model can assist in predicting PID-failure in the field based on the given mudle stack and the diffusion of Na+ through each material. This tool can be used for process optimization as well as material selection significantly reducing the cost and time to validate a technology.
电场下的钠诱导分流是晶体硅太阳能组件可靠性的一个挑战。这种电势诱导的分流型(PID-s)退化的来源已经被很好地理解[1],它对功率损耗的影响已经基于电池或模块水平的现象模型进行了深入研究,该模型将实验功率损耗与应力参数(时间、温度、电压)联系起来[1]。然而,在微观水平上,对导致PID的Na离子迁移动力学及其与效率退化的定量关系知之甚少。本文用动态二次离子质谱(D-SIMS)研究了钠离子在乙烯-醋酸乙烯酯(EVA)和硅中的迁移。每个样品在60-90°C的现场相关温度下退火,以解决常见光伏装置的典型迁移机制。对SIMS迁移剖面的分析显示,Na在EVA中的扩散系数为D0,EVA = 0.09±0.14 cm2/s,活化能EA,EVA = 0.85±0.04 eV,扩散系数高于硅中的外推文献值(D0,Si =(3.03±2.42)x10−5 cm2/s, EA,Si = 0.98±0.02 eV)。新的见解将包括在一个基于漂移-扩散的退化模型中,该模型考虑了所有相关界面的分配系数。该模型可以根据给定的模堆和Na+在每种材料中的扩散情况,帮助预测现场pid失效。该工具可用于工艺优化和材料选择,大大降低了技术验证的成本和时间。
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引用次数: 1
Proton induced degradation of liquid phase crystallized poly-Si thin-film solar cells 质子诱导降解液相结晶多晶硅薄膜太阳能电池
Pub Date : 2020-06-14 DOI: 10.1109/PVSC45281.2020.9300392
Tim Frijnts, C. Pellegrino, S. Gall, H. Neitzert
Liquid phase crystallized poly-Si thin-film solar cells on glass with a-Si heterojunction emitters were irradiated with 68 MeV protons with different fluences up to 1013 protons/cm2. The degradation of devices with n-type and p-type absorber has been compared. A significantly stronger decrease of the solar cell performance parameters for devices with n-type absorber has been observed as compared to the p-type absorber case. This result corresponds to the different decrease of the minority carrier diffusion lengths with regard to the different poly-Si absorber materials.
采用a-Si异质结发射体对玻璃上的液相结晶多晶硅薄膜太阳能电池进行68 MeV质子辐照,辐照强度可达1013个质子/cm2。比较了n型和p型吸收器器件的退化情况。与p型吸收体相比,n型吸收体的太阳能电池性能参数明显下降。这一结果对应于不同的多晶硅吸收材料对少数载流子扩散长度减小的不同。
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引用次数: 0
Transparent conductive polycrystalline Ti and H co-doped In2O3 films by RF sputtering technique 采用射频溅射技术制备透明导电多晶Ti和H共掺杂In2O3薄膜
Pub Date : 2020-06-14 DOI: 10.1109/PVSC45281.2020.9300616
G.H. Wang, C. Shi, L. Zhao, L. Mo, H. Diao, W. Wang
Ti and H co-doped In2O3 transparent conductive polycrystalline films (ITHO) were grown at a low substrate temperature of 150 °C by radio frequency magnetron sputtering for the applications of silicon-based heterojunction or other thin film solar cell. The effect of H2 flow rate on the structure, electrical and optical properties of the films was investigated. We will further improve film properties and employ it as electrode of heterojunction solar cell in the future.
采用射频磁控溅射技术,在150°C的低衬底温度下,制备了Ti和H共掺杂In2O3透明导电多晶薄膜(ITHO),用于硅基异质结或其他薄膜太阳能电池。研究了H2流速对膜结构、电学和光学性能的影响。我们将进一步改善薄膜的性能,并将其用作异质结太阳能电池的电极。
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引用次数: 0
Influence of Process Parameters and Absorber Thickness on Efficiency of Polycrystalline CdSeTe/CdTe Thin Film Solar Cells 工艺参数和吸收层厚度对多晶CdSeTe/CdTe薄膜太阳能电池效率的影响
Pub Date : 2020-06-14 DOI: 10.1109/PVSC45281.2020.9300840
T. Shimpi, Carey Reich, A. Danielson, A. Munshi, Anna Kindvall, Ramesh Pandey, K. Barth, W. Sampath
Graded absorbers devices with with CdSe0.4Te0.6 (molar basis) and CdTe were fabricated. CdCl2 treatment time, post-deposition CdCl2 anneal time and thicknesses of CdSeTe and CdTe layers were varied. Photoluminescence and electrical measurements were performed on the fabricated devices. Results revealed that the individual thicknesses of CdSeTe and CdTe is critical to overall efficiency of the devices. Device fabricated on substrate with 0.5 µm CdSeTe, 3 µm CdTe with rest of process parameters kept unchanged, produced an efficiency of 20.14%. We report highest device efficiency among academia and research institutions.
制备了CdSe0.4Te0.6(摩尔基)和CdTe的梯度吸收器件。CdCl2处理时间、沉积后CdCl2退火时间以及CdSeTe和CdTe层厚度均有变化。对制备的器件进行了光致发光和电学测量。结果表明,CdSeTe和CdTe的厚度对器件的整体效率至关重要。在其余工艺参数不变的情况下,在0.5µm CdSeTe和3µm CdTe衬底上制备的器件效率为20.14%。我们报告了学术界和研究机构中最高的设备效率。
{"title":"Influence of Process Parameters and Absorber Thickness on Efficiency of Polycrystalline CdSeTe/CdTe Thin Film Solar Cells","authors":"T. Shimpi, Carey Reich, A. Danielson, A. Munshi, Anna Kindvall, Ramesh Pandey, K. Barth, W. Sampath","doi":"10.1109/PVSC45281.2020.9300840","DOIUrl":"https://doi.org/10.1109/PVSC45281.2020.9300840","url":null,"abstract":"Graded absorbers devices with with CdSe0.4Te0.6 (molar basis) and CdTe were fabricated. CdCl2 treatment time, post-deposition CdCl2 anneal time and thicknesses of CdSeTe and CdTe layers were varied. Photoluminescence and electrical measurements were performed on the fabricated devices. Results revealed that the individual thicknesses of CdSeTe and CdTe is critical to overall efficiency of the devices. Device fabricated on substrate with 0.5 µm CdSeTe, 3 µm CdTe with rest of process parameters kept unchanged, produced an efficiency of 20.14%. We report highest device efficiency among academia and research institutions.","PeriodicalId":6773,"journal":{"name":"2020 47th IEEE Photovoltaic Specialists Conference (PVSC)","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2020-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81833848","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
期刊
2020 47th IEEE Photovoltaic Specialists Conference (PVSC)
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