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Recent advancements and challenges in highly stable all-inorganic perovskite solar cells 高稳定性全无机过氧化物太阳能电池的最新进展与挑战
Pub Date : 2024-11-22 DOI: 10.1016/j.mtelec.2024.100127
Sunkyu Kim , Muhammad Adnan , Zobia Irshad, Wonjong Lee, Siwon Yun, Hyeji Han, Jongchul Lim
Organic–inorganic perovskite solar cells (PSCs) have attracted significant attention because of their outstanding photoelectric conversion efficiency, simple fabrication process, and long exciton diffusion lengths. In particular, the power conversion efficiency of single-junction PSCs is 26.1%, whereas that of multi-junction silicon/perovskite tandem solar cells reaches an impressive 33.9%, indicating good prospects for the solar cell market. However, traditional organic–inorganic PSCs are highly sensitive to moisture, light, and heat, which negatively affect their stability and thereby commercialization. Nowadays, all-inorganic perovskites are attracting considerable attention for application in solar cells because of their potential to attain high resistance to environmental factors. All-inorganic perovskites have been considered an alternative to organic–inorganic perovskites because of their advantages over organic–inorganic perovskites, such as the capability to stabilize the photoactive phase, long-term thermal stability, and the possibility of tailoring the bandgap structure. Herein, we perform a detailed meta-analysis of materials and approaches used for the preparation of all-inorganic perovskite thin films and discuss recent advancements in key performance parameters such as efficiency, stability, and electrical and optoelectronic properties. Finally, we outline directions for future studies.
有机-无机过氧化物太阳能电池(PSCs)因其出色的光电转换效率、简单的制造工艺和较长的激子扩散长度而备受关注。其中,单结 PSC 的功率转换效率为 26.1%,而多结硅/过氧化物串联太阳能电池的功率转换效率则高达 33.9%,显示出太阳能电池市场的良好前景。然而,传统的有机-无机多晶体太阳能电池对湿度、光和热非常敏感,这对其稳定性和商业化产生了负面影响。如今,全无机过氧化物因其对环境因素的高耐受性而在太阳能电池中的应用备受关注。与有机-无机包晶石相比,全无机包晶石具有稳定光活性相的能力、长期的热稳定性以及定制带隙结构的可能性等优势,因此被认为是有机-无机包晶石的替代品。在此,我们对用于制备全无机包晶薄膜的材料和方法进行了详细的元分析,并讨论了在关键性能参数(如效率、稳定性、电学和光电特性)方面的最新进展。最后,我们概述了未来的研究方向。
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引用次数: 0
Coherent epitaxy of HfxZr1-xO2 thin films by high-pressure magnetron sputtering 通过高压磁控溅射实现 HfxZr1-xO2 薄膜的相干外延
Pub Date : 2024-11-13 DOI: 10.1016/j.mtelec.2024.100124
Tengteng Zhang , Yuyan Fan , Zhipeng Xue , Mengwei Si , Zhen Wang , Xiuyan Li , Yanwei Cao
Due to remarkable high-k and ferroelectric properties in CMOS devices, the study of crystalline HfxZr1-xO2 (HZO) thin films has attracted tremendous interest recently. However, up to now, the epitaxial growth of HZO films has only been achieved by pulse laser deposition, a technique scarcely utilized in CMOS devices. Therefore, developing appropriate epitaxial methods of HZO films (such as sputtering) is fairly necessary, but a challenge at present. In this work, high-quality single-crystalline HZO films were synthesized by high-pressure magnetron sputtering. The epitaxial growth of HZO films on yttria-stabilized zirconia (YSZ) substrate was demonstrated by a combination of high-resolution X-ray diffraction, atom force microscope, and scanning transmission electron microscope. In addition, good insulating characteristics were obtained by replacing insulating substrates with conductive substrates as electrodes. Our results provide a novel way for the epitaxial growth of the single-crystalline structure of HZO thin films towards the high performance of high-k and ferroelectric devices.
由于 HfxZr1-xO2 (HZO) 晶体薄膜在 CMOS 设备中具有显著的高 K 特性和铁电特性,其研究近来引起了人们的极大兴趣。然而,迄今为止,HZO 薄膜的外延生长只能通过脉冲激光沉积来实现,而这种技术在 CMOS 器件中还很少使用。因此,开发适当的 HZO 薄膜外延方法(如溅射)是相当必要的,但目前仍是一项挑战。本研究采用高压磁控溅射法合成了高质量的单晶 HZO 薄膜。结合高分辨率 X 射线衍射、原子力显微镜和扫描透射电子显微镜,证明了 HZO 薄膜在钇稳定氧化锆(YSZ)基底上的外延生长。此外,通过用导电基底取代绝缘基底作为电极,还获得了良好的绝缘特性。我们的研究结果为 HZO 薄膜单晶结构的外延生长提供了一种新方法,从而实现高性能的高介电和铁电器件。
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引用次数: 0
Fabrication of bilayer ITO/YZO/PMMA/Al memory devices with insight ternary switching mechanism 制造具有三元开关机制的双层 ITO/YZO/PMMA/Al 存储器件
Pub Date : 2024-11-07 DOI: 10.1016/j.mtelec.2024.100125
Anirudh Kumar , Satendra Pal Singh , Sejoon Lee , Sanjeev Kumar Sharma
Two terminal resistive switching memories are emerging candidates for the next generation of non-volatile memory in the upcoming era of artificial intelligence and big data generated globally. Much research is currently focused on developing write-once-read-many-times (WORM) memory devices, which offer the advantages of small size, high speed, improved energy consumption, and large data capacity. Nanostructured organic/inorganic heterojunction composites have garnered significant attention due to their excellent scalability and low-cost fabrication. In the present study, the YZO/PMMA hybrid nanocomposite bilayer ReRAM was fabricated on ITO substrates. The I-V characteristics of the fabricated ITO/YZO/PMMA/Al device exhibited the ternary WORM switching behavior (HRS, LRS1, and LRS2 states). It has been observed that three states of “HRS”, “LRS1” and “LRS2” exhibit a distinct current ratio of LRS1/HRS and LRS2/HRS of 101.6 and 102.4, respectively, with good data retention (up to 500 h). It was demonstrated that Y-dopant concentration into ZnO significantly transits the switching behavior of ITO/ZnO/PMMA/Al memory from binary to ternary WORM switching characteristics. Ohmic conduction and space charge-limited current (SCLC) were observed in the HRS. In LRS1, the Schottky emission mechanism was observed, while in LRS2, Ohmic conduction was observed. The physical model of the formation of permanent conducting filaments (CFs) consisting of oxygen vacancies in the device's active layer is proposed to explain the RS behavior. These findings reveal the low-cost development of high-density, non-volatile memory devices operated with very low power consumption that can be used to protect data against unauthorized software/hardware and hackers.
在即将到来的人工智能和全球大数据时代,两端电阻开关存储器是下一代非易失性存储器的新兴候选器件。目前,许多研究都集中在开发一次写入、多次读取(WORM)存储器件上,这种存储器件具有体积小、速度快、能耗低和数据容量大等优点。纳米结构的有机/无机异质结复合材料因其出色的可扩展性和低成本制造而备受关注。本研究在 ITO 基底上制造了 YZO/PMMA 混合纳米复合材料双层 ReRAM。制备的 ITO/YZO/PMMA/Al 器件的 I-V 特性表现出三元 WORM 开关行为(HRS、LRS1 和 LRS2 状态)。据观察,"HRS"、"LRS1 "和 "LRS2 "三种状态下的 LRS1/HRS 和 LRS2/HRS 的电流比分别为 101.6 和 102.4,数据保持良好(长达 500 小时)。研究表明,ZnO 中的 Y 掺杂浓度极大地改变了 ITO/ZnO/PMMA/Al 存储器的开关行为,使其从二元 WORM 开关特性转变为三元 WORM 开关特性。在 HRS 中观察到了欧姆传导和空间电荷限制电流 (SCLC)。在 LRS1 中观察到了肖特基发射机制,而在 LRS2 中则观察到了欧姆传导。我们提出了由器件活性层中氧空位组成的永久导电丝(CF)形成的物理模型来解释 RS 行为。这些发现揭示了高密度、非易失性存储器件的低成本开发,其运行功耗极低,可用于保护数据免受未经授权的软件/硬件和黑客攻击。
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引用次数: 0
Thermoelectric performance of Cu3InSnSe5 and MnSe pseudo-binary solid solution Cu3InSnSe5 和 MnSe 伪二元固溶体的热电性能
Pub Date : 2024-11-07 DOI: 10.1016/j.mtelec.2024.100126
Guanzheng Luo, Wang Li, Yingchao Wei, Yao Dai, Wenjie Shu, Linyao Wu, Xin Li, Yubo Luo, Junyou Yang
Cu3InSnSe5 is a newly discovered copper-based diamond-like thermoelectric semiconductor, whose thermoelectric performance can be further enhanced by the MnSe alloying herein. We observed the formation of MnSe2 precipitates that effectively scattered low-frequency phonons, which significantly reduced the lattice thermal conductivity at mid-to-low temperatures. While a high amount of MnSe alloying led to the formation of MnSe2 precipitates which enhanced the phonons scattering, a smaller MnSe content improved the power factor in a certain as well. Ultimately, our research achieved a peak ZT of 1.00 and an average ZT of 0.50 over the 300–773 K temperature range by 10 mol.% MnSe alloyed Cu3InSnSe5 pseudo-binary solid solution, demonstrating the potential of MnSe alloying for optimizing the thermoelectric performance of copper-based diamond-like semiconductor materials.
Cu3InSnSe5 是一种新发现的铜基类金刚石热电半导体,其中的 MnSe 合金可进一步提高其热电性能。我们观察到 MnSe2 沉淀的形成有效地分散了低频声子,从而显著降低了中低温下的晶格热导率。虽然大量的 MnSe 合金会导致 MnSe2 沉淀的形成,从而增强声子散射,但较少的 MnSe 含量也会在一定程度上提高功率因数。最终,我们的研究通过 10 mol.% MnSe 合金 Cu3InSnSe5 伪二元固溶体,在 300-773 K 温度范围内实现了 1.00 的峰值 ZT 和 0.50 的平均 ZT,证明了 MnSe 合金在优化铜基类金刚石半导体材料热电性能方面的潜力。
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引用次数: 0
Monolayer nodal line semimetal AgTe as gate-reconfigurable ‘cold’ Ohmic contact to 2D semiconductors MoSi2N4 and WSi2N4 单层结线半金属 AgTe 作为二维半导体 MoSi2N4 和 WSi2N4 的栅极可重新配置的 "冷 "欧姆触点
Pub Date : 2024-10-16 DOI: 10.1016/j.mtelec.2024.100123
Tong Su , Yueyan Li , Weiwei Zhao , Liemao Cao , Yee Sin Ang
<div><div>MoSi<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>N<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span> and WSi<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>N<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span> are air-stable two-dimensional (2D) semiconductors promising for next-generation electronics applications. However, the challenge of forming high-quality Ohmic contacts with these materials must be addressed before their potential can be fully unlocked. In this work, we investigate the role of AgTe, a recently synthesized topological nodal line semimetal, as a high work function (<span><math><msub><mrow><mi>W</mi></mrow><mrow><mtext>M</mtext></mrow></msub></math></span>) semimetallic contact for MoSi<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>N<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span> and WSi<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>N<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span> using first-principles density functional theory (DFT) simulations. Phonon dispersion and <em>ab initio</em> molecular dynamics simulations confirm the structural stability of AgTe/MoSi<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>N<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span> and AgTe/WSi<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>N<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span> heterostructures. The high-<span><math><msub><mrow><mi>W</mi></mrow><mrow><mtext>M</mtext></mrow></msub></math></span> nature of AgTe leads to <span><math><mi>p</mi></math></span>-type Schottky contacts. We show that electrostatic gate-induced charge doping, which can be introduced using practically achievable gating conditions, can tune the heterostructure between <span><math><mi>n</mi></math></span>-type and <span><math><mi>p</mi></math></span>-type Ohmic contacts, thus suggesting the potential of AgTe/MoSi<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>N<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span> and AgTe/WSi<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>N<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span> as gate-reconfigurable contact useful for CMOS device applications. Notably, the presence of a ‘mini gap’ above the semimetallic bands in AgTe enables the formation of <span><math><mi>n</mi></math></span>-type ‘cold’ Ohmic contact which is useful for steep-slope device beyond the <em>Boltzmann’s tyranny</em>. These findings reveal the potential of AgTe as an electrically tunable Ohmic contacts to MoSi<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>N<span><math><msub><mrow></mrow><mrow><mn>4</mn><
MoSi2N4 和 WSi2N4 是空气稳定的二维(2D)半导体,有望应用于下一代电子产品。然而,在充分挖掘这些材料的潜力之前,必须解决与这些材料形成高质量欧姆接触的难题。在这项工作中,我们利用第一原理密度泛函理论(DFT)模拟,研究了最近合成的拓扑结线半金属 AgTe 作为 MoSi2N4 和 WSi2N4 的高功函数(WM)半金属触点的作用。声子色散和 ab initio 分子动力学模拟证实了 AgTe/MoSi2N4 和 AgTe/WSi2N4 异质结构的结构稳定性。AgTe 的高 WM 特性导致了 p 型肖特基接触。我们的研究表明,静电栅极诱导的电荷掺杂(可在实际可实现的栅极条件下引入)可调整 n 型和 p 型欧姆触点之间的异质结构,从而表明 AgTe/MoSi2N4 和 AgTe/WSi2N4 有潜力成为 CMOS 器件应用中的栅极可重构触点。值得注意的是,在 AgTe 的半金属带上方存在一个 "微型间隙",这使得 n 型 "冷 "欧姆触点的形成成为可能,这对于超越玻尔兹曼暴政的陡坡器件非常有用。这些发现揭示了 AgTe 作为 MoSi2N4 和 WSi2N4 的电可调欧姆接触的潜力,从而为开发基于二维半导体的高性能电子器件铺平了道路。
{"title":"Monolayer nodal line semimetal AgTe as gate-reconfigurable ‘cold’ Ohmic contact to 2D semiconductors MoSi2N4 and WSi2N4","authors":"Tong Su ,&nbsp;Yueyan Li ,&nbsp;Weiwei Zhao ,&nbsp;Liemao Cao ,&nbsp;Yee Sin Ang","doi":"10.1016/j.mtelec.2024.100123","DOIUrl":"10.1016/j.mtelec.2024.100123","url":null,"abstract":"&lt;div&gt;&lt;div&gt;MoSi&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;2&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt;N&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;4&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt; and WSi&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;2&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt;N&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;4&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt; are air-stable two-dimensional (2D) semiconductors promising for next-generation electronics applications. However, the challenge of forming high-quality Ohmic contacts with these materials must be addressed before their potential can be fully unlocked. In this work, we investigate the role of AgTe, a recently synthesized topological nodal line semimetal, as a high work function (&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;mi&gt;W&lt;/mi&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mtext&gt;M&lt;/mtext&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt;) semimetallic contact for MoSi&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;2&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt;N&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;4&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt; and WSi&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;2&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt;N&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;4&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt; using first-principles density functional theory (DFT) simulations. Phonon dispersion and &lt;em&gt;ab initio&lt;/em&gt; molecular dynamics simulations confirm the structural stability of AgTe/MoSi&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;2&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt;N&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;4&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt; and AgTe/WSi&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;2&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt;N&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;4&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt; heterostructures. The high-&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;mi&gt;W&lt;/mi&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mtext&gt;M&lt;/mtext&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt; nature of AgTe leads to &lt;span&gt;&lt;math&gt;&lt;mi&gt;p&lt;/mi&gt;&lt;/math&gt;&lt;/span&gt;-type Schottky contacts. We show that electrostatic gate-induced charge doping, which can be introduced using practically achievable gating conditions, can tune the heterostructure between &lt;span&gt;&lt;math&gt;&lt;mi&gt;n&lt;/mi&gt;&lt;/math&gt;&lt;/span&gt;-type and &lt;span&gt;&lt;math&gt;&lt;mi&gt;p&lt;/mi&gt;&lt;/math&gt;&lt;/span&gt;-type Ohmic contacts, thus suggesting the potential of AgTe/MoSi&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;2&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt;N&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;4&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt; and AgTe/WSi&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;2&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt;N&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;4&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt; as gate-reconfigurable contact useful for CMOS device applications. Notably, the presence of a ‘mini gap’ above the semimetallic bands in AgTe enables the formation of &lt;span&gt;&lt;math&gt;&lt;mi&gt;n&lt;/mi&gt;&lt;/math&gt;&lt;/span&gt;-type ‘cold’ Ohmic contact which is useful for steep-slope device beyond the &lt;em&gt;Boltzmann’s tyranny&lt;/em&gt;. These findings reveal the potential of AgTe as an electrically tunable Ohmic contacts to MoSi&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;2&lt;/mn&gt;&lt;/mrow&gt;&lt;/msub&gt;&lt;/math&gt;&lt;/span&gt;N&lt;span&gt;&lt;math&gt;&lt;msub&gt;&lt;mrow&gt;&lt;/mrow&gt;&lt;mrow&gt;&lt;mn&gt;4&lt;/mn&gt;&lt;","PeriodicalId":100893,"journal":{"name":"Materials Today Electronics","volume":"10 ","pages":"Article 100123"},"PeriodicalIF":0.0,"publicationDate":"2024-10-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142533929","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Recent progress in the development of metal halide perovskite electronics for sensing applications 开发用于传感应用的金属卤化物过氧化物电子学的最新进展
Pub Date : 2024-09-29 DOI: 10.1016/j.mtelec.2024.100122
Albert Buertey Buer , Nana Yaw Asare Boateng , Benjamin Asafo-Adjei , Sooncheol Kwon, Jea Woong Jo
Metal–halide perovskites have attracted significant attention recently owing to their exceptional optoelectronic performance. Their unique optical and electronic properties, combined with their ease of fabrication and high sensitivity to varied stimuli, render them promising candidates for next-generation efficient sensors. These materials have demonstrated outstanding sensing performance, with record-breaking sensitivities, rapid response times, and superior selectivity. This review comprehensively evaluates the recent progress in the applications of metal-halide perovskite-based sensors. Furthermore, this study addresses the remaining challenges and future perspectives crucial for the advancement of metal–halide perovskites in sensing technologies.
最近,金属卤化物过氧化物因其卓越的光电性能而备受关注。它们具有独特的光学和电子特性,而且易于制造,对各种刺激具有高灵敏度,因此很有希望成为下一代高效传感器的候选材料。这些材料已显示出出色的传感性能,具有破纪录的灵敏度、快速响应时间和卓越的选择性。本综述全面评估了基于金属卤化物的过氧化物传感器的最新应用进展。此外,本研究还探讨了金属卤化物包光体在传感技术中的应用所面临的挑战和未来发展前景。
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引用次数: 0
Insight into the origins of mobility deterioration in indium phosphide-based epitaxial layer 洞察磷化铟外延层迁移率劣化的根源
Pub Date : 2024-09-21 DOI: 10.1016/j.mtelec.2024.100121
Si Li , Yongkang Jiang , Hua Wei , Hanbao Liu , Xiaoda Ye , Xingkai Zhao , Feihong Chen , Jiayun Deng , Jie Yang , Chong Wang , Tingfang Liu , Tinglong Liu , Gang Tang , Shikun Pu , Qingju Liu , Feng Hui , Feng Qiu

Ultra-high mobility speciality is a critical figure of merit for ultrapure materials and high-speed optoelectronic devices. However, unintentional doping-inducing various scattering frequently deteriorates mobility capacity. Therefore, how to elucidate the origin of mobility deterioration is still an open and technically challenging issue. Here we report that unintentional-doping silicon ion would be propagated into the indium phosphide (InP)’s epitaxial layer via analysis of time-of-flight and dynamic secondary ion mass spectrometry. The unintentional silicon ion in the InP wafer surface is responsible for the subsequent InGaAs epitaxial layer's mobility attenuation. The first-principles calculations and Boltzmann transport theory prove that polar optical phonon scattering (Fröhlich scattering) in non-doping InGaAs is the dominant scattering mechanism at high temperatures over 100 K. In contrast, the low-temperature scattering process is dominated by ionized impurities scattering. The unintentional silicon ion improves the Fröhlich scattering-dominated critical temperature. Our findings provide insight into the mobility degeneration originating from unintentional pollution and underlying scattering mechanisms, which lay a solid foundation for developing high-grade, super-speed, and low-power photoelectronic devices.

超高迁移率特性是超纯材料和高速光电设备的一个重要优点。然而,无意掺杂引起的各种散射经常会降低迁移率。因此,如何阐明迁移率劣化的根源仍然是一个具有技术挑战性的开放性问题。在此,我们通过飞行时间质谱和动态二次离子质谱分析,报告了无意掺杂的硅离子会传播到磷化铟(InP)的外延层中。InP 晶圆表面的无意硅离子是随后 InGaAs 外延层迁移率衰减的原因。第一原理计算和玻尔兹曼输运理论证明,非掺杂 InGaAs 中的极性光学声子散射(Fröhlich 散射)是 100 K 以上高温下的主要散射机制。无意的硅离子提高了弗洛里希散射主导的临界温度。我们的研究结果让人们深入了解了无意污染引起的迁移率退化及其背后的散射机制,这为开发高品位、超高速和低功耗光电子器件奠定了坚实的基础。
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引用次数: 0
High responsivity and detectivity β-Ga2O3 solar-blind photodetectors optimized by oxygen vacancy engineering 通过氧空位工程优化高响应度和探测度 β-Ga2O3 太阳盲光电探测器
Pub Date : 2024-09-14 DOI: 10.1016/j.mtelec.2024.100116
Yi Long , Kun Ba , Jie Liu , Xiaolei Deng , Yunxiang Di , Ke Xiong , Yan Chen , Xudong Wang , Chang Liu , Ziqing Li , Dandan Liu , Xiaosheng Fang , Qi Liu , Jianlu Wang

Solar-blind photodetectors (SBPDs) are core essential components for many critical applications such as precision guidance, fire warning, and space communications. Ultra-wide bandgap semiconductor β-Ga2O3 is considered to be an ideal material for the fabrication of SBPDs. However, synthetizing β-Ga2O3 with high quality factor while simultaneously in situ modulation of electronic and optoelectronic properties to enhance performance has been challenging. Here, pulsed laser deposition (PLD) technology is used to synthesize high-quality β-Ga2O3 thin films on a sapphire substrate. The oxygen vacancy engineered β-Ga2O3 films can achieve in situ precise control of their surface morphology, optical parameters, and optoelectronic properties by simply adjusting the oxygen pressure. Meanwhile, the optimal thickness of the β-Ga2O3 film for the developing high-performance SBPD is ∼221 nm, determined by fitting and analyzing the optical parameters measured by the ellipsometry. Subsequently, the influence of oxygen pressure on the performance of β-Ga2O3 SBPD is thoroughly explored, considering the optimization of electrode size and deposition time. When the oxygen pressure is set to 15 Pa, the β-Ga2O3-based SBPD achieves highly competitive responsivity (R) and detectivity (D*) at 250 nm, with values of 1080 A·W−1 and 1.4 × 1016 cm·W−1·Hz1/2, respectively. Additionally, the noise component of the β-Ga2O3 SBPD is further studied to calibrated the traditional device performance results. This work introduces a simple and straightforward approach to in situ tuning of the optoelectronic properties of β-Ga2O3, which is important for advancing β-Ga2O3 film growth technology and fabricating high-performance photodetectors.

日光盲区光电探测器(SBPD)是精确制导、火灾预警和空间通信等许多关键应用的核心重要组件。超宽带隙半导体 β-Ga2O3 被认为是制造 SBPD 的理想材料。然而,合成具有高品质因数的 β-Ga2O3,同时原位调制其电子和光电特性以提高性能一直是一项挑战。本文采用脉冲激光沉积(PLD)技术在蓝宝石衬底上合成高质量的 β-Ga2O3 薄膜。只需调节氧压,氧空位工程化的 β-Ga2O3 薄膜就能实现对其表面形貌、光学参数和光电特性的原位精确控制。同时,通过对椭偏仪测得的光学参数进行拟合和分析,确定了开发高性能 SBPD 所需的β-Ga2O3 薄膜的最佳厚度为 ∼221 nm。随后,考虑到电极尺寸和沉积时间的优化,深入探讨了氧压对β-Ga2O3 SBPD 性能的影响。当氧压设定为 15 Pa 时,基于 β-Ga2O3 的 SBPD 在 250 nm 波长处实现了极具竞争力的响应率(R)和检测率(D*),其值分别为 1080 A-W-1 和 1.4 × 1016 cm-W-1-Hz1/2。此外,还进一步研究了 β-Ga2O3 SBPD 的噪声成分,以校准传统器件的性能结果。这项工作介绍了一种简单直接的原位调节 β-Ga2O3 光电特性的方法,这对于推进 β-Ga2O3 薄膜生长技术和制造高性能光电探测器非常重要。
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引用次数: 0
Multi-step switchable superdomain architecture with enhanced photoelectrical performance in epitaxial ferroelectrics 外延铁电体中具有增强光电性能的多级可切换超域结构
Pub Date : 2024-09-01 DOI: 10.1016/j.mtelec.2024.100115
Sheng-Zhu Ho , Yu-Chen Liu , Meng-Xun Xie , Yu-Huai Li , Kai-An Tsai , Chun-Wei Huang , Ying-Chih Pu , Jan-Chi Yang , Yi-Chun Chen

Ferroic domains and relevant topological defects, such as domain walls and vortices, have gained significant attention as functional units for potential advancements in nanoelectronics. Pb(ZrxTi1-x)O3 (PZT) is a tetragonal ferroelectric material at room-temperature, exhibiting remarkable piezoelectricity and intricate domain structures. In this work, we explore the ferroelectric properties, photoelectric reactions, and efficient manipulation pathways of the unconventional superstructures in epitaxial (101)-oriented PZT thin films. Employing piezoresponse force microscopy (PFM) and conductive atomic force microscopy (cAFM), we unveil the three-dimensional polarization configurations of the superdomain structures inherently featuring conductive charged domain walls. Our findings reveal an increase in photoactivity at the head-side charged domain walls, attributed to the band-bending mechanism. Additionally, we discover the enhanced photoelectrochemical (PEC) performance in the superdomain structures compared to the (101)-oriented PZT films with conventional c/a domains. Furthermore, time-dependent pulse voltages are utilized to dynamically assess local currents and realize direct conductivity modulation by manipulating distinct polarization states. The elucidation of the photoelectrical mechanism and delineation of diverse pathways for intermediate state control underscore the potential of ferroelectric superdomains in constructing functional photoelectronic nanodevices.

铁电畴和相关拓扑缺陷(如畴壁和漩涡)作为可能推动纳米电子学发展的功能单元,受到了广泛关注。Pb(ZrxTi1-x)O3 (PZT) 是一种室温下的四方铁电材料,具有显著的压电性和复杂的畴结构。在这项研究中,我们探索了外延(101)取向 PZT 薄膜的铁电特性、光电反应以及非常规超结构的有效操作途径。利用压电响应力显微镜(PFM)和导电原子力显微镜(cAFM),我们揭示了以导电带电畴壁为固有特征的超畴结构的三维极化配置。我们的研究结果表明,由于带弯曲机制,头部带电畴壁的光活性有所提高。此外,与具有传统 c/a 结构的 (101) 取向 PZT 薄膜相比,我们还发现超域结构具有更强的光电化学 (PEC) 性能。此外,我们还利用随时间变化的脉冲电压来动态评估局部电流,并通过操纵不同的极化状态来实现直接电导率调制。对光电机制的阐明以及对中间状态控制的多种途径的界定,凸显了铁电超域在构建功能性光电纳米器件方面的潜力。
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引用次数: 0
Ion dynamics in metal halide perovskites for resistive-switching memory and neuromorphic memristors 用于电阻开关存储器和神经形态忆阻器的金属卤化物过氧化物中的离子动力学
Pub Date : 2024-08-23 DOI: 10.1016/j.mtelec.2024.100114
Sumin Lee , Jeonghyeon Son , Beomjin Jeong

Resistive-switching (RS) memory devices, or memristors, necessitate active materials of which electronic resistance is tunable by an external electric field. Metal halide perovskites (MHP) are representative RS materials wherein the electronic resistance is modulated by migration of intrinsic native or extrinsic impurity mobile ions. Since the first demonstration of MHP-based RS memory nearly a decade ago, MHPs have proven their great potential for energy-efficient nonvolatile memory devices. Dynamic transport of the mobile ions further allows MHPs to exhibit multistate resistance tunability at multiple timescale, which can be harnessed for neuromorphic memristors. Herein, we provide a comprehensive review on progress in RS memory devices with MHPs and their applications for neuromorphic memristors. We discuss how the electronic resistance of the MHPs is modulated by dynamic mobile ions, and focus on the ionic-electronic correlation that involves doping phenomena in MHPs on account of previous theoretical predictions and experimental verifications. Finally, we provide our perspective on major hurdles of MHPs for real-world applications of emerging nonvolatile memory and neuromorphic memristor technology.

电阻开关(RS)存储器件或忆阻器需要使用电子电阻可通过外部电场调节的活性材料。金属卤化物过氧化物(MHP)是具有代表性的 RS 材料,其电子电阻可通过固有的本机离子或外来的杂质移动离子的迁移进行调节。自近十年前首次展示基于 MHP 的 RS 存储器以来,MHP 已证明了其在高能效非易失性存储器件方面的巨大潜力。移动离子的动态传输进一步使 MHPs 在多个时间尺度上表现出多态电阻可调性,可用于神经形态忆阻器。在此,我们全面回顾了采用 MHP 的 RS 存储器件的研究进展及其在神经形态忆阻器中的应用。我们讨论了 MHPs 的电子电阻如何受到动态移动离子的调制,并根据之前的理论预测和实验验证,重点研究了 MHPs 中涉及掺杂现象的离子-电子关联。最后,我们就 MHP 在新兴非易失性存储器和神经形态忆阻器技术的实际应用中所面临的主要障碍提出了自己的看法。
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引用次数: 0
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Materials Today Electronics
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