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Integrating convolutional neural networks for improved software engineering: A Collaborative and unbalanced data Perspective 整合卷积神经网络以改进软件工程:协作和非平衡数据视角
Pub Date : 2024-04-17 DOI: 10.1016/j.memori.2024.100106
Mohammadreza Nehzati

This study pioneers the tailored application of Convolutional Neural Networks (CNNs) for addressing the challenge of unbalanced data in software engineering, a relatively unexplored domain for CNN utilization. Unlike conventional methods, our framework demonstrates a significant precision uplift of up to 15% in software classification tasks, specifically enhancing minority class sample accuracy. This research not only delineates a novel CNN-based approach that outperforms traditional data balancing techniques but also underscores the strategic integration of AI to bolster software engineering processes. By pinpointing the ethical implications, our findings advocate for a conscientious adoption of AI, ensuring software development advances equitably and efficiently.

这项研究开创了卷积神经网络(CNN)的定制应用,以应对软件工程中不平衡数据带来的挑战,这是 CNN 应用领域中一个相对尚未开发的领域。与传统方法不同,我们的框架在软件分类任务中展示了高达 15% 的显著精度提升,特别是提高了少数类别样本的精度。这项研究不仅描述了一种基于 CNN 的新方法,其性能优于传统的数据平衡技术,而且还强调了将人工智能战略性地整合到软件工程流程中的重要性。我们的研究结果指出了人工智能的伦理意义,倡导认真采用人工智能,确保软件开发公平、高效地向前发展。
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引用次数: 0
Programmable delay line with inherent duty cycle correction 具有固有占空比校正功能的可编程延迟线
Pub Date : 2024-04-04 DOI: 10.1016/j.memori.2024.100105
Siva Charan Nimmagadda, Hari Bilash Dubey

In the recent HBM2E IO design, clock is transmitted differentially to the external DRAM and duty cycle distortion (DCD) could add to the differential clock due to traversing multiple stages in DRAM. At higher data rates, the DCD from the differential clock imposes restrictions on the timing margins. In the current work, Tx clock path is added with DCC feature to compensate for any DCD errors introduced by the clock network in the external DRAM. Linearity of the DCC is critical metric when the clock is differential and running at high speed. A new programmable delay line with inherent DCC design with good linearity is presented in this paper.

在最近的 HBM2E IO 设计中,时钟以差分方式传输到外部 DRAM,而占空比失真(DCD)可能会因穿越 DRAM 的多个阶段而增加差分时钟。在数据速率较高时,差分时钟的 DCD 会对时序裕度造成限制。在当前工作中,Tx 时钟路径增加了 DCC 功能,以补偿外部 DRAM 中时钟网络引入的任何 DCD 误差。当时钟为差分时钟且高速运行时,DCC 的线性度是关键指标。本文介绍了具有良好线性度的固有 DCC 设计的新型可编程延迟线。
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引用次数: 0
An ultra-thin meta-material including graphene patterns: Coupling application 包含石墨烯图案的超薄元材料:耦合应用
Pub Date : 2024-02-20 DOI: 10.1016/j.memori.2024.100103
Amir Ali Mohammad Khani , Ava Salmanpour , Ali Soldoozy , Elham Zandi

Here a novel ultra-thin meta-material structure is proposed, including periodic arrays of graphene rings, disks, and ribbons and SiO2 dielectric as spacer between graphene patterns layers at the terahertz (THz) range. The introduced device can couple electromagnetic waves by considering reflection and transmission channels as outputs. Electromagnetic wave coupling depends on the parameters design and the device thickness. The proposed structure can couple electromagnetic waves in multi-band and close frequencies including 2 THz, 4 THz, 6 THz, 7.5 THz, and 9.5 THz. By considering the impedance matching concept, an equivalent circuit model (ECM) is developed for the proposed meta-material. Also, the device stability is investigated in various physical coefficients, geometrical parameters, and incident wave angles to ensure optical applications such as sensors, indoor communications, security, and medical imaging.

本文提出了一种新型超薄元材料结构,包括石墨烯环、盘和带的周期性阵列,以及太赫兹(THz)范围内石墨烯图案层之间的二氧化硅电介质间隔。通过将反射和透射通道作为输出,引入的设备可以耦合电磁波。电磁波耦合取决于参数设计和器件厚度。所提出的结构可以耦合多频段和近频率的电磁波,包括 2 太赫兹、4 太赫兹、6 太赫兹、7.5 太赫兹和 9.5 太赫兹。通过考虑阻抗匹配概念,为所提出的元材料建立了等效电路模型(ECM)。此外,还研究了器件在各种物理系数、几何参数和入射波角度下的稳定性,以确保传感器、室内通信、安防和医学成像等光学应用。
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引用次数: 0
Design and analysis of novel La:HfO2 gate stacked ferroelectric tunnel FET for non-volatile memory applications 设计和分析用于非易失性存储器应用的新型 La:HfO2 栅极叠层铁电隧道场效应晶体管
Pub Date : 2024-02-05 DOI: 10.1016/j.memori.2024.100101
Neha Paras , Shiromani Balmukund Rahi , Abhishek Kumar Upadhyay , Manisha Bharti , Young Suh Song

Recent experimental studies have shown lanthanum-doped hafnium oxide (La:HfO2) possessing ferroelectric properties. This material is of special interest since it is based on lead-free, simple binary oxide of HfO2, and has excellent endurance property (1 × 109 field cycles without fatigue. There exists substantial information about the material aspects of La:HfO2 but it lacks proven application potential for CMOS-compatible low-power memory design. In this work, 10 % La metal cation fraction of HfO2 (La:HfO2) is proposed as the gate stack material in tunnel FET (TFET) for its potential as a memory device. 2D device simulations are carried out to show that the proposed ferroelectric TFET (FeTFET) provides the largest memory window (MW) as compared to present perovskite ferroelectric materials such as PZT, SBT (SrBi2Ta2O9) and silicon doped (4.6 % Si in HfO2) hafnium oxide (Si:HfO2). The larger window is attributed to greater polarization, and the calculation of MW is quantified by the shift in threshold voltage (Vth). The simulations carried out in this work suggest that La:HfO2 can be adopted as a potential ferroelectric material to target low-power FeTFET design at significantly reduced ferroelectric layer thickness.

最近的实验研究表明,掺杂镧的氧化铪(La:HfO2)具有铁电特性。由于这种材料基于无铅、简单的二元氧化物 HfO2,并且具有出色的耐久性能(1 × 109 场循环无疲劳),因此特别引人关注。关于 La:HfO2 的材料方面已有大量信息,但它在 CMOS 兼容型低功耗存储器设计方面的应用潜力尚未得到证实。在这项研究中,我们提出了将 10% 的 La 金属阳离子部分加入 HfO2(La:HfO2)作为隧道场效应晶体管(TFET)的栅堆材料,以挖掘其作为存储器件的潜力。二维器件模拟显示,与目前的包晶体铁电材料(如 PZT、SBT(SrBi2Ta2O9)和硅掺杂(HfO2 中含 4.6% 的硅)氧化铪(Si:HfO2))相比,所提出的铁电 TFET(FeTFET)具有最大的存储窗口(MW)。更大的窗口归因于更强的极化,而 MW 的计算则通过阈值电压(Vth)的变化来量化。这项工作中进行的模拟表明,La:HfO2 可以作为一种潜在的铁电材料,在显著减少铁电层厚度的情况下实现低功耗 FeTFET 设计。
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引用次数: 0
Flexible devices for eco-sustainable electronics: Natural polysaccharide as gate dielectric in organic transistors 用于生态可持续电子产品的柔性器件:天然多糖作为有机晶体管的栅电介质
Pub Date : 2024-02-01 DOI: 10.1016/j.memori.2024.100102
Gargi Konwar, Shree Prakash Tiwari

In this paper, firstly, reports on use of various nature originated polysaccharides as gate dielectric candidates for organic field effect transistors (OFETs) to achieve eco-friendliness and eventual biodegradability in devices, are summarized. To emphasize the same, the performance of flexible OFETs fabricated with cyanoethyl cellulose (CEC), a synthetically modified cellulose as gate dielectric is comprehensively investigated. A widely studied TIPS-pentacene: PS blend is used to form the active layer in these devices, showing a p-channel transistor operation at a low voltage of −5 V. Along with high performance, these devices exhibited excellent repeatability and shelf life up to 10 months in ambient conditions. Effect of repeatability, bias-stress, and bending stability were investigated to confirm the decent electrical and bending stability. The device can sustain the transistor performance even after application of 200 bending cycles. Moreover, the effect of annealing temperature on transistor performance was studied to observe their suitability in real applications. These findings suggest that polysaccharides can be suitable gate dielectric for eco-sustainable electronics.

本文首先概述了有关使用各种源自自然界的多糖作为有机场效应晶体管(OFET)栅极电介质候选材料以实现器件的生态友好性和最终生物降解性的报道。为了强调这一点,我们全面研究了使用氰乙基纤维素(CEC)(一种合成改性纤维素)作为栅电介质制造的柔性场效应晶体管的性能。一种广泛研究过的 TIPS-五碳烯(TIPS-pentacene:PS 混合物来形成这些器件的有源层,并在 -5 V 的低电压下实现了 p 沟道晶体管工作。除了高性能之外,这些器件还具有出色的可重复性,在环境条件下的保质期长达 10 个月。对重复性、偏置应力和弯曲稳定性的影响进行了研究,以确认其良好的电气和弯曲稳定性。即使弯曲 200 次,该器件仍能保持晶体管性能。此外,还研究了退火温度对晶体管性能的影响,以观察其在实际应用中的适用性。这些研究结果表明,多糖可以成为生态可持续电子器件的合适栅极电介质。
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引用次数: 0
Trends and challenges in design of embedded BCH error correction codes in multi-levels NAND flash memory devices 在多级 NAND 闪存设备中设计嵌入式 BCH 纠错码的趋势和挑战
Pub Date : 2024-01-19 DOI: 10.1016/j.memori.2024.100099
Saeideh Nabipour , Javad Javidan , Rolf Drechsler

Recently, there has been a growing concern regarding the dependability of NAND flash cells, notably as the scale of their features reduces. To address this issue, implementing error correction codes (ECC) proves to be an effective solution. Among the various methods, BCH coding has gained significant interest because of its exceptional error correction capabilities. Over the last decades, there has been much research on BCH decoder design to meet the demand for reduced hardware complexities, minimized delay performance, and lower power dissipation to enable BCH decoders and their VLSI implementations to facilitate different code lengths and rates of code. This paper surveys the trends and challenges associated with BCH decoder in NAND flash memory devices, the possible solutions for overcoming of time and area overhead in architecture of BCH decoder block and an examination of the extent to which present architectures will respond to the escalating requirements on data transfer rate, bit error rate (BER) performance, power consumption, and silicon area that will be essential for the extensive acceptance of BCH code in applications that will emerge in the near future. To demonstrate the need for such solutions, we present rigorous experimental data on BCH error correction codes on various types of flash memory errors, to motivate the need for such techniques. Based on the understanding developed by the experimental characterization, we describe several area-delay efficient techniques, including three low-latency decoding strategies for implementing the BCH decoder: pipeline method, re-encoding scheme, and parallelization method, and various hardware optimization strategies for the BCH decoder, such as three area-efficient syndrome block architectures, four error locator polynomial detection algorithms, and four error position identification algorithms using the Chien search method. We investigate the increase in reliability that each of these methods brings. We also briefly address future directions that these methods and flash memory techniques could evolve into the future.

最近,人们越来越关注 NAND 闪存单元的可靠性,特别是随着其功能规模的缩小。为解决这一问题,实施纠错码 (ECC) 被证明是一种有效的解决方案。在各种方法中,BCH 编码因其卓越的纠错能力而备受关注。在过去的几十年中,为了满足降低硬件复杂性、最大限度地减少延迟性能和降低功耗的需求,BCH 解码器及其 VLSI 实现已经在 BCH 解码器设计方面开展了大量研究,以促进不同码长和码率的编码。本文探讨了与 NAND 闪存设备中 BCH 解码器相关的趋势和挑战、克服 BCH 解码器模块架构中时间和面积开销的可能解决方案,并研究了现有架构在多大程度上能满足对数据传输速率、误码率 (BER) 性能、功耗和硅面积不断提高的要求,这些要求对 BCH 代码在不久的将来出现的应用中被广泛接受至关重要。为了证明此类解决方案的必要性,我们提供了 BCH 纠错码在各种闪存错误上的严格实验数据,以激发对此类技术的需求。基于对实验特征的理解,我们介绍了几种面积-延迟高效技术,包括实现 BCH 解码器的三种低延迟解码策略:流水线方法、重编码方案和并行化方法,以及 BCH 解码器的各种硬件优化策略,如三种面积高效综合征块架构、四种错误定位器多项式检测算法和四种使用 Chien 搜索方法的错误位置识别算法。我们研究了每种方法带来的可靠性提升。我们还简要讨论了这些方法和闪存技术未来的发展方向。
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引用次数: 0
Sputter grown CuO thin films: Impact of growth pressure and annealing temperature on their microstructural architectures 溅射生长的氧化铜薄膜:生长压力和退火温度对其微观结构的影响
Pub Date : 2024-01-12 DOI: 10.1016/j.memori.2024.100100
Ambati Mounika Sai Krishna , Kumar Babu Busi , Brindha Ramasubramanian , Vundrala Sumedha Reddy , Aniket Samanta , Seeram Ramakrishna , Siddhartha Ghosh , Sabyasachi Chakrabortty , Goutam Kumar Dalapati

High-quality copper oxide (CuO) thin films were deposited on the silicon (Si) substrate at the room temperature using the physical vapour deposition (PVD) technique named radio frequency (RF) sputtering. The copper-oxide thin-films were single crystalline and of uniform thickness. Subsequently, the influence of growth pressure (low gas pressure - 3 mTorr and high gas pressure - 100 mTorr) and post growth annealing at different temperatures (300 °C to 700 °C) were investigated to understand the microstructural and morphological changes of the thin film. With the influence of growth pressure and post thermal annealing temperature, significant changes in crystallinity, surface roughness, and surface oxidation rate of the CuO thin film were detected, which were adequately analyzed via several characterization techniques. X-ray diffraction (XRD) patterns revealed the phase formation with good crystallinity of the film, which is substantiated by Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) characterization. Atomic force microscopy (AFM) images disclosed that the surface roughness of the film and grain size. By gaining insights into the structural and surface properties of CuO/Si thin films, this research presents new prospects for tuning of CuO phases, structures, and compositions for multifunctional applications.

利用名为射频(RF)溅射的物理气相沉积(PVD)技术,在室温下将高质量的氧化铜(CuO)薄膜沉积在硅(Si)基底上。氧化铜薄膜为单晶,厚度均匀。随后,研究了生长压力(低气体压力 - 3 mTorr 和高气体压力 - 100 mTorr)和不同温度(300 °C 至 700 °C)下生长后退火的影响,以了解薄膜的微观结构和形态变化。在生长压力和后热退火温度的影响下,发现氧化铜薄膜的结晶度、表面粗糙度和表面氧化率发生了显著变化,并通过多种表征技术对这些变化进行了充分分析。X 射线衍射(XRD)图显示薄膜形成了具有良好结晶度的相,拉曼光谱和 X 射线光电子能谱(XPS)表征也证实了这一点。原子力显微镜(AFM)图像显示了薄膜的表面粗糙度和晶粒尺寸。通过深入了解氧化铜/硅薄膜的结构和表面特性,这项研究为调整氧化铜相、结构和组成以实现多功能应用开辟了新的前景。
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引用次数: 0
Meta-surface filter for visible frequency range based on meta-materials 基于元材料的可见光频率范围元表面滤波器
Pub Date : 2024-01-01 DOI: 10.1016/j.memori.2023.100098
Ali Soldoozy , Ilghar Rezaei , Masoud Soltani Zanjani , Hassan Sadrnia

To enhance the efficiency of exposure in greenhouses during specific cultivation periods, it is essential to design a meta-face that effectively filters the green part of visible light. This targeted filtering function will enable optimal control of the light spectrum, resulting in better cultivation conditions and increased productivity. Leveraging innovative concepts and advanced methods, a highly efficient meta-surface design aimed at filtering the green portion of the visible light spectrum is proposed. The proposed structure comprises periodic arrays of graphene disks and rings strategically positioned on both sides of a silicon oxide substrate. This straightforward coated layer configuration offers a practical solution for greenhouses and controlled agriculture applications, facilitating improved light management and tailored growth conditions. Through two separate simulation paths, the validity and accuracy of our proposed approach were investigated. Both theoretical analysis and simulation results demonstrate that the proposed structure attenuates the green part of visible light. Filtered output waves prove to be highly beneficial for indoor cultivation, during the flowering period, offering improved control over light conditions. The design methodology relies on an equivalent circuit model and impedance matching criteria. Additionally, full-wave simulation is performed to verify the effectiveness of the employed modeling. According to the simulation results, the proposed meta-surface effectively filters the green part of visible light, while allowing the transmission of the red spectrum.

为了提高温室在特定栽培时期的光照效率,必须设计一种能有效过滤可见光绿色部分的元面罩。这种有针对性的过滤功能可实现对光谱的最佳控制,从而改善栽培条件并提高生产率。利用创新概念和先进方法,我们提出了一种旨在过滤可见光光谱绿色部分的高效元面设计。所提出的结构包括战略性放置在氧化硅基底两侧的石墨烯圆盘和圆环的周期性阵列。这种直接的涂层配置为温室和可控农业应用提供了实用的解决方案,有利于改善光管理和定制生长条件。通过两个独立的模拟路径,我们对所提出方法的有效性和准确性进行了研究。理论分析和模拟结果都表明,所提出的结构可以衰减可见光的绿色部分。事实证明,在开花期,过滤后的输出波对室内栽培非常有益,能更好地控制光照条件。设计方法依赖于等效电路模型和阻抗匹配标准。此外,还进行了全波仿真,以验证所采用建模的有效性。根据仿真结果,所提出的元表面能有效过滤可见光的绿色部分,同时允许红色光谱的传输。
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引用次数: 0
Improvement of low-frequency noise behavior with chloridic precursor materials at ALD process 在 ALD 工艺中使用含氯前驱体材料改善低频噪声性能
Pub Date : 2023-12-29 DOI: 10.1016/j.memori.2023.100095
Daniel Hessler , Ricardo Olivo , Tim Baldauf , Konrad Seidel , Raik Hoffmann , Chaiwon Woo , Maximilian Lederer , Yannick Raffel

This article reports an improvement in the low-frequency noise characteristics in hafnium oxide-based (HfO2) field-effect transistors by different precursor materials at ALD process. The Hafniumoxide on the devices were fabricated once with organic precursor materials and once with chloridic precursor materials. The investigation shows an improvement in the noise behavior when using chloridic precursor materials. Regarding the main noise source, which are divided into fluctuation of the number of carriers (ΔN) and fluctuation of the effective transistor mobility (Δμ), the results show that the devices fabricated with organic precursor materials show typical behavior of ΔN noise, where the devices fabricated with chloridic precursor materials show typical behavior of Δμ noise.

本文报告了在 ALD 工艺中使用不同前驱体材料对氧化铪基场效应晶体管(HfO2)低频噪声特性的改进。器件上的氧化铪一次用有机前驱体材料制造,一次用氯化前驱体材料制造。调查显示,使用含氯前驱体材料时,噪声表现有所改善。关于主要噪声源(分为载流子数量波动(ΔN)和有效晶体管迁移率波动(Δμ)),结果表明,使用有机前驱体材料制造的器件显示出典型的ΔN 噪声行为,而使用含氯前驱体材料制造的器件显示出典型的Δμ噪声行为。
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引用次数: 0
A review of crosstalk polymorphic circuits and their scalability 串扰多态电路及其可扩展性综述
Pub Date : 2023-12-19 DOI: 10.1016/j.memori.2023.100094
Md Arif Iqbal , Srinivas Rahul Sapireddy , Sumanth Dasari , Kazi Asifuzzaman , Mostafizur Rahman

Using a control variable, the functionality of Polymorphic circuits can be modified, making them adaptable and useful for reconfiguring circuit behavior — all the way from gate level to system level. State-of-the art polymorphic circuits are based on custom non-linear circuit design or emerging devices such as ambipolar FET, configurable magnetic devices etc. While some of these approaches are inefficient in performance, others involve exotic devices. The Crosstalk computing based polymorphic circuits offer a fresh perspective. In Crosstalk, the interconnect interference between nanoscale metal lines is intentionally engineered to exhibit the programmable Boolean logic behavior. This approach relies on the coupling between metal lines and not on the transistors for computing, resulting in better scalability, security by obscurity, and fault tolerance by reconfiguration. Our novel approach is backed by the mathematical formulation that conveys the rationale to generalize and achieve a wide variety of polymorphic circuits. Our experiments, including design, simulation, and Power Performance Area (PPA) characterization results indicate that crosstalk circuits provide significant improvement in transistor count (about 3x), switching energy (2x), and speed (1.5x) for polymorphic logic circuits. In the best-case scenario, the transistor count reduction is 5x. This paper presents Crosstalk computing’s fundamentals, polymorphism and the scalability aspects to compete/co-exist with CMOS for digital logic implementations below 10 nm. Our scalability study uses Open Source 7 nm PDK, considers all process variation aspects and accommodates worst-case scenarios. The study results for various benchmark circuits show that the Crosstalk technology is a viable alternative to CMOS for digital logic implementations below 10 nm, having 48% density, 57% power, and 10% performance gains over equivalent CMOS counterparts. Finally, we compare Crosstalk Polymorphic Circuit design technique with similar approaches described in related works and discuss its features and constraints.

利用控制变量,可以修改多态电路的功能,使其适应性强,有助于重新配置电路行为--从门级到系统级。最先进的多态电路基于定制非线性电路设计或新兴器件,如伏极场效应晶体管、可配置磁性器件等。其中一些方法性能效率不高,而另一些方法则涉及奇特的器件。基于串扰计算的多态电路提供了一个全新的视角。在串扰计算中,纳米级金属线之间的互连干扰被有意设计为可编程布尔逻辑行为。这种方法依靠金属线之间的耦合而不是晶体管进行计算,因此具有更好的可扩展性、隐蔽安全性和通过重新配置实现的容错性。我们的新方法以数学公式为支撑,传达了概括和实现各种多态电路的原理。我们的实验,包括设计、仿真和功率性能面积(PPA)表征结果表明,串扰电路显著改善了多态逻辑电路的晶体管数量(约 3 倍)、开关能量(2 倍)和速度(1.5 倍)。在最佳情况下,晶体管数量减少了 5 倍。本文介绍了串扰计算的基本原理、多态性和可扩展性方面的内容,以便在 10 纳米以下的数字逻辑实现中与 CMOS 竞争/共存。我们的可扩展性研究使用开源 7 纳米 PDK,考虑了所有工艺变化方面,并考虑了最坏情况。对各种基准电路的研究结果表明,在 10 纳米以下的数字逻辑实现中,串扰技术是 CMOS 的可行替代方案,与同等的 CMOS 相比,密度提高了 48%,功耗降低了 57%,性能提高了 10%。最后,我们将串行多态电路设计技术与相关著作中描述的类似方法进行了比较,并讨论了其特点和限制因素。
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Memories - Materials, Devices, Circuits and Systems
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