首页 > 最新文献

Memories - Materials, Devices, Circuits and Systems最新文献

英文 中文
First passage times of charge transport and entropy change 电荷传输和熵变的第一通过时间
Pub Date : 2024-06-20 DOI: 10.1016/j.memori.2024.100116
V.V. Ryazanov

All real physical processes, including of the first-passage time, occur with a change in entropy. This circumstance is not taken into account when studying the first-passage time, but is illustrated in this article using the example of electron transfer through a metallic double dot. The statistics of the first-passage time of a random process N(t) for electrons transferred through a metallic double dot is considered. The expressions for the average first-passage time are compared with and without taking into account the change in entropy during this time. External influences on the average value of the first-passage time are considered for the case of DC bias voltage.

所有真实的物理过程,包括第一通过时间,都伴随着熵的变化。这种情况在研究首次通过时间时并未考虑,但本文将以电子通过金属双点转移为例加以说明。本文考虑了电子通过金属双点传输的随机过程 N(t) 的首过时间统计。比较了在考虑和不考虑熵变化的情况下平均首次通过时间的表达式。在直流偏置电压的情况下,考虑了外部因素对首次通过时间平均值的影响。
{"title":"First passage times of charge transport and entropy change","authors":"V.V. Ryazanov","doi":"10.1016/j.memori.2024.100116","DOIUrl":"https://doi.org/10.1016/j.memori.2024.100116","url":null,"abstract":"<div><p>All real physical processes, including of the first-passage time, occur with a change in entropy. This circumstance is not taken into account when studying the first-passage time, but is illustrated in this article using the example of electron transfer through a metallic double dot. The statistics of the first-passage time of a random process <em>N(t)</em> for electrons transferred through a metallic double dot is considered. The expressions for the average first-passage time are compared with and without taking into account the change in entropy during this time. External influences on the average value of the first-passage time are considered for the case of <em>DC</em> bias voltage.</p></div>","PeriodicalId":100915,"journal":{"name":"Memories - Materials, Devices, Circuits and Systems","volume":"8 ","pages":"Article 100116"},"PeriodicalIF":0.0,"publicationDate":"2024-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2773064624000197/pdfft?md5=8d6365dde63a79fcdeca2275bddb3e2c&pid=1-s2.0-S2773064624000197-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141486477","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
RRAM based processing-in-memory for efficient intelligent vision tasks at the edge 基于 RRAM 的内存处理技术,实现高效的边缘智能视觉任务
Pub Date : 2024-05-23 DOI: 10.1016/j.memori.2024.100115
Ashwani Kumar , Sai Sukruth Bezugam

The work presents a proof-of-concept methodology for at edge visual data storage and processing-in-memory (PIM) as visual data preprocessing inspired from the biological visual system pipeline. This work proposes a methodology to improve the contrast of low-light low-contrast image by carefully modulating the conductance of memristive kind oxide-based resistive memory (RRAM)device. We present the level of contrast enhancement using conductance modulation of different non-filamentary RRAMs with different material stacks and also analyze the impact of RRAM variability on the contrast enhancement. For intelligent vision tasks, we implement artificial neural network (ANN) to perform the image classification and shows the best-case improvement of 1500 epochs ( 74%) using RRAM based PIM. We also implement a large sized ANN “Efficient-Det Network” to perform object recognition on low-light low-contrast dataset ”Ex-Dark” to evaluate the proposed method using PIM layer. The result shows 8% higher mAP than network without a PIM layer. The present work is a step towards the development of efficient hybrid visual system for intelligent vision tasks at edge.

这项研究提出了一种概念验证方法,用于边缘视觉数据存储和内存处理(PIM),作为视觉数据预处理,其灵感来自生物视觉系统管道。这项研究提出了一种方法,通过仔细调节基于氧化物的电阻式存储器(RRAM)器件的电导率来提高低光低对比度图像的对比度。我们介绍了利用不同材料堆叠的非丝状 RRAM 的电导调制提高对比度的水平,并分析了 RRAM 的变化对对比度提高的影响。对于智能视觉任务,我们采用人工神经网络(ANN)来执行图像分类,结果表明,使用基于 RRAM 的 PIM,最佳情况下可提高 ∼ 1500 个历时(∼ 74%)。我们还在低照度、低对比度数据集 "Ex-Dark "上实施了一个大型 ANN "Efficient-Det Network "来执行物体识别,以评估使用 PIM 层的建议方法。结果显示,mAP 比没有 PIM 层的网络高出 8%。本研究为开发用于边缘智能视觉任务的高效混合视觉系统迈出了一步。
{"title":"RRAM based processing-in-memory for efficient intelligent vision tasks at the edge","authors":"Ashwani Kumar ,&nbsp;Sai Sukruth Bezugam","doi":"10.1016/j.memori.2024.100115","DOIUrl":"10.1016/j.memori.2024.100115","url":null,"abstract":"<div><p>The work presents a proof-of-concept methodology for at edge visual data storage and processing-in-memory (PIM) as visual data preprocessing inspired from the biological visual system pipeline. This work proposes a methodology to improve the contrast of low-light low-contrast image by carefully modulating the conductance of memristive kind oxide-based resistive memory (RRAM)device. We present the level of contrast enhancement using conductance modulation of different non-filamentary RRAMs with different material stacks and also analyze the impact of RRAM variability on the contrast enhancement. For intelligent vision tasks, we implement artificial neural network (ANN) to perform the image classification and shows the best-case improvement of <span><math><mo>∼</mo></math></span> 1500 epochs (<span><math><mo>∼</mo></math></span> 74%) using RRAM based PIM. We also implement a large sized ANN “Efficient-Det Network” to perform object recognition on low-light low-contrast dataset ”Ex-Dark” to evaluate the proposed method using PIM layer. The result shows 8% higher mAP than network without a PIM layer. The present work is a step towards the development of efficient hybrid visual system for intelligent vision tasks at edge.</p></div>","PeriodicalId":100915,"journal":{"name":"Memories - Materials, Devices, Circuits and Systems","volume":"8 ","pages":"Article 100115"},"PeriodicalIF":0.0,"publicationDate":"2024-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2773064624000185/pdfft?md5=add14767a7cfd0e098a0b9be5114842a&pid=1-s2.0-S2773064624000185-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141137248","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Erratum regarding missing Declaration of Competing Interest statements in previously published articles 关于以前发表的文章中缺少 "竞争利益声明 "的勘误
Pub Date : 2024-05-17 DOI: 10.1016/j.memori.2024.100113
{"title":"Erratum regarding missing Declaration of Competing Interest statements in previously published articles","authors":"","doi":"10.1016/j.memori.2024.100113","DOIUrl":"https://doi.org/10.1016/j.memori.2024.100113","url":null,"abstract":"","PeriodicalId":100915,"journal":{"name":"Memories - Materials, Devices, Circuits and Systems","volume":"8 ","pages":"Article 100113"},"PeriodicalIF":0.0,"publicationDate":"2024-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2773064624000161/pdfft?md5=5ca578f512b1f71c117c362c0404f3cd&pid=1-s2.0-S2773064624000161-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140951614","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Realization of multi-functional features with ZnO nanosheets/p-Si based electronic device for energy harvesting and memristive switching 利用基于氧化锌纳米片/p-Si 的电子器件实现能量收集和薄膜开关的多功能特性
Pub Date : 2024-05-11 DOI: 10.1016/j.memori.2024.100114
Parasuraman R , Rathnakannan K

This work investigates and reports on the fabrication of a ZnO nanosheets/p-Si heterojunction energy harvester. The proposed nanostructure device exhibits two key functionalities: energy harvesting and memristive characteristics. This allows the device to perform multiple tasks. The ZnO nanostructure sheet was grown using a hydrothermal method. To minimize defect states at the electrode-substrate interface, an optimal phosphorus doping process was employed to achieve minimal substrate sheet resistance. Under an applied pushing force of 0.259 kgf, the energy harvester generated an output voltage and current of 0.5548 V and 44 μA, respectively. The proposed structure produces an output of 24.41 μW at 13 Hz for 2000 cycles. Investigation of the device's transfer characteristics revealed memristive behavior with an on/off ratio of 107. These findings suggest that the multifunctional ZnO nanosheets/p-Si electronic device reported here has promising potential for applications in the Internet of Things (IoT).

这项工作研究并报告了氧化锌纳米片/对硅异质结能量收集器的制造过程。所提出的纳米结构器件具有两个关键功能:能量收集和记忆特性。这使得该器件能够执行多种任务。氧化锌纳米结构片采用水热法生长。为了尽量减少电极-基底界面上的缺陷状态,采用了最佳的磷掺杂工艺,以实现最小的基底薄片电阻。在 0.259 kgf 的外加推力下,能量收集器产生的输出电压和电流分别为 0.5548 V 和 44 μA。在 13 Hz 的频率下,拟议的结构可产生 24.41 μW 的输出,循环 2000 次。对该器件传输特性的研究表明,其具有开/关比为 107 的忆阻行为。这些研究结果表明,本文所报道的多功能氧化锌纳米片/p-硅电子器件在物联网(IoT)领域具有广阔的应用前景。
{"title":"Realization of multi-functional features with ZnO nanosheets/p-Si based electronic device for energy harvesting and memristive switching","authors":"Parasuraman R ,&nbsp;Rathnakannan K","doi":"10.1016/j.memori.2024.100114","DOIUrl":"10.1016/j.memori.2024.100114","url":null,"abstract":"<div><p>This work investigates and reports on the fabrication of a ZnO nanosheets/p-Si heterojunction energy harvester. The proposed nanostructure device exhibits two key functionalities: energy harvesting and memristive characteristics. This allows the device to perform multiple tasks. The ZnO nanostructure sheet was grown using a hydrothermal method. To minimize defect states at the electrode-substrate interface, an optimal phosphorus doping process was employed to achieve minimal substrate sheet resistance. Under an applied pushing force of 0.259 kgf, the energy harvester generated an output voltage and current of 0.5548 V and 44 μA, respectively. The proposed structure produces an output of 24.41 μW at 13 Hz for 2000 cycles. Investigation of the device's transfer characteristics revealed memristive behavior with an on/off ratio of 10<sup>7</sup>. These findings suggest that the multifunctional ZnO nanosheets/p-Si electronic device reported here has promising potential for applications in the Internet of Things (IoT).</p></div>","PeriodicalId":100915,"journal":{"name":"Memories - Materials, Devices, Circuits and Systems","volume":"8 ","pages":"Article 100114"},"PeriodicalIF":0.0,"publicationDate":"2024-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2773064624000173/pdfft?md5=e2703107978af818c579817cbc316862&pid=1-s2.0-S2773064624000173-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141023779","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Frequency selective asymmetric coupled-fed (ACS) antenna using additive manufacturing 使用增材制造技术的频率选择性非对称耦合馈电 (ACS) 天线
Pub Date : 2024-05-10 DOI: 10.1016/j.memori.2024.100111
Sanjee Lamsal , Afahaene Uya , Srikanth Itapu , Frank X. Li , Pedro Cortes , Vamsi Borra

In this study, the development of diverse antenna designs using additive manufacturing processes, specifically spanning from L-band to K-band is proposed. All designs are implemented on a flexible FR4 substrate to make them suitable for wearable sensors and biomedical applications. The fabrication process involves the utilization of aerosol jet printing with nanoparticle silver ink, followed by curing in a vacuum chamber. Additionally, screen printing with copper paste is employed as another method, with subsequent curing in a laminator. The reflection coefficient (S11) and radiation patterns for the simulated design and fabricated samples were found to align closely. The achieved return loss consistently reaching −10 dB across fairly large operating frequency range underscores the efficacy of the proposed antennas and their associated additive manufacturing mechanisms. The design and simulation were performed using Ansys high frequency structural simulator (HFSS), and the parameters under test for the fabricated antennas were validated using a vector network analyzer (VNA) to assess overall performance.

在本研究中,我们提出了利用快速成型制造工艺开发多种天线设计的方案,具体涵盖 L 波段到 K 波段。所有设计均在柔性 FR4 基板上实现,使其适用于可穿戴传感器和生物医学应用。制造过程包括使用纳米银墨水进行气溶胶喷射印刷,然后在真空室中固化。此外,另一种方法是使用铜浆进行丝网印刷,然后在层压机中固化。模拟设计和制造样品的反射系数(S11)和辐射模式非常接近。在相当大的工作频率范围内,回波损耗始终保持在-10 dB,这凸显了所建议的天线及其相关增材制造机制的功效。设计和仿真使用 Ansys 高频结构仿真器 (HFSS) 进行,并使用矢量网络分析仪 (VNA) 验证了制造天线的测试参数,以评估整体性能。
{"title":"Frequency selective asymmetric coupled-fed (ACS) antenna using additive manufacturing","authors":"Sanjee Lamsal ,&nbsp;Afahaene Uya ,&nbsp;Srikanth Itapu ,&nbsp;Frank X. Li ,&nbsp;Pedro Cortes ,&nbsp;Vamsi Borra","doi":"10.1016/j.memori.2024.100111","DOIUrl":"https://doi.org/10.1016/j.memori.2024.100111","url":null,"abstract":"<div><p>In this study, the development of diverse antenna designs using additive manufacturing processes, specifically spanning from L-band to K-band is proposed. All designs are implemented on a flexible FR4 substrate to make them suitable for wearable sensors and biomedical applications. The fabrication process involves the utilization of aerosol jet printing with nanoparticle silver ink, followed by curing in a vacuum chamber. Additionally, screen printing with copper paste is employed as another method, with subsequent curing in a laminator. The reflection coefficient (S11) and radiation patterns for the simulated design and fabricated samples were found to align closely. The achieved return loss consistently reaching −10 dB across fairly large operating frequency range underscores the efficacy of the proposed antennas and their associated additive manufacturing mechanisms. The design and simulation were performed using Ansys high frequency structural simulator (HFSS), and the parameters under test for the fabricated antennas were validated using a vector network analyzer (VNA) to assess overall performance.</p></div>","PeriodicalId":100915,"journal":{"name":"Memories - Materials, Devices, Circuits and Systems","volume":"8 ","pages":"Article 100111"},"PeriodicalIF":0.0,"publicationDate":"2024-05-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2773064624000136/pdfft?md5=a045b7b1b005e5d65c337d5adb5ffc64&pid=1-s2.0-S2773064624000136-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140951613","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Improving signal isolation in hybrid RF duplexer utilizing a band-pass filter 利用带通滤波器提高混合射频双工器的信号隔离度
Pub Date : 2024-05-09 DOI: 10.1016/j.memori.2024.100112
Amir Ali Mohammad Khani , Ali Soldoozy , Farzane Soleimani Rudi , Elham Zandi

This study deals with a passive RF duplexer integrated with a two-notch band. To design the model, a band-pass filter is considered. Using micro-strip technology, the RF duplexer substation is simulated. It is a rectangular in parallel coupling with frequency bands of 1 and 5 GHz while existing three ports. Moreover, to enhance the impedance coefficient and decrease the admittance, the method of complementary paired resonators is taken into account. Furthermore, scattering parameters were used by the step impedance method to make an integrated monolayer substrate from signal branching in duplex mode. Thus, the band-pass filter making the frequency cut-off bands allows designing GSM-4G radars. The low cut-off microwave band is included in these bands at the 77 MHz central frequency and the second cut-off band for GSM-4G radars at the 437 MHz central frequency. The duplexer has the total dimensions of 14 mm × 99 mm and the presented RF duplexer is simulated in CST.

本研究涉及一个集成了双缺口带的无源射频双工器。在设计模型时,考虑了带通滤波器。使用微带技术模拟了射频双工器分站。它是一个矩形并联耦合器,频带为 1 和 5 GHz,同时存在三个端口。此外,为了提高阻抗系数和降低导纳,还考虑了互补成对谐振器的方法。此外,通过阶跃阻抗法使用散射参数,在双工模式下从信号分支中制作集成单层衬底。因此,设计 GSM-4G 雷达时,可以使用带通滤波器制作频率截止带。在这些频段中,低截止微波频段的中心频率为 77 MHz,GSM-4G 雷达的第二个截止频率为 437 MHz。双工器的总尺寸为 14 毫米 × 99 毫米,并在 CST 中对所介绍的射频双工器进行了仿真。
{"title":"Improving signal isolation in hybrid RF duplexer utilizing a band-pass filter","authors":"Amir Ali Mohammad Khani ,&nbsp;Ali Soldoozy ,&nbsp;Farzane Soleimani Rudi ,&nbsp;Elham Zandi","doi":"10.1016/j.memori.2024.100112","DOIUrl":"https://doi.org/10.1016/j.memori.2024.100112","url":null,"abstract":"<div><p>This study deals with a passive RF duplexer integrated with a two-notch band. To design the model, a band-pass filter is considered. Using micro-strip technology, the RF duplexer substation is simulated. It is a rectangular in parallel coupling with frequency bands of 1 and 5 GHz while existing three ports. Moreover, to enhance the impedance coefficient and decrease the admittance, the method of complementary paired resonators is taken into account. Furthermore, scattering parameters were used by the step impedance method to make an integrated monolayer substrate from signal branching in duplex mode. Thus, the band-pass filter making the frequency cut-off bands allows designing GSM-4G radars. The low cut-off microwave band is included in these bands at the 77 MHz central frequency and the second cut-off band for GSM-4G radars at the 437 MHz central frequency. The duplexer has the total dimensions of 14 mm × 99 mm and the presented RF duplexer is simulated in CST.</p></div>","PeriodicalId":100915,"journal":{"name":"Memories - Materials, Devices, Circuits and Systems","volume":"8 ","pages":"Article 100112"},"PeriodicalIF":0.0,"publicationDate":"2024-05-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2773064624000148/pdfft?md5=eabc26f9b5b78d298dce26adddac8b9d&pid=1-s2.0-S2773064624000148-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140948341","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Towards wake-up free ferroelectrics and scaling: Al-doped HZO and its crystallographic texture 实现无唤醒铁电和扩展:掺铝 HZO 及其晶体纹理
Pub Date : 2024-05-07 DOI: 10.1016/j.memori.2024.100110
Ayse Sünbül , David Lehninger , Amir Pourjafar , Shouzhuo Yang , Franz Müller , Ricardo Olivo , Thomas Kämpfe , Konrad Seidel , Lukas Eng , Maximilian Lederer

Ferroelectric (FE) hafnium zirconium oxide (HZO) is an excellent candidate for data storage applications. However, it has some reliability limitations such as imprint and retention. Herein, we explore Al doping of HZO to overcome these limitations. FE behavior is tuned by the aluminum (Al) concentrations in the films and by annealing temperature. A correlation is done between electrical behavior, crystallographic texture, and FE phases determined by grazing-incidence X-ray diffraction (GIXRD) measurements. Reduced coercive field (2Ec) values and wake-up free HZO-based ferroelectrics are explored. We show the tunability of remanent polarization (2Pr) and 2Ec with respect to Al-doping concentration and anneal temperature, hence crystallographic texture.

铁电(FE)氧化锆铪(HZO)是数据存储应用的绝佳候选材料。然而,它也有一些可靠性方面的限制,如印记和保持力。在此,我们探讨了如何通过在 HZO 中掺入铝来克服这些限制。薄膜中的铝(Al)浓度和退火温度可调整 FE 行为。通过掠入射 X 射线衍射 (GIXRD) 测量确定了电学行为、晶体纹理和 FE 相之间的相关性。我们探索了降低的矫顽力场 (2Ec) 值和无唤醒 HZO 基铁电。我们展示了剩电势极化(2Pr)和 2Ec 随掺铝浓度和退火温度的变化而变化的可调性,以及晶体学质地。
{"title":"Towards wake-up free ferroelectrics and scaling: Al-doped HZO and its crystallographic texture","authors":"Ayse Sünbül ,&nbsp;David Lehninger ,&nbsp;Amir Pourjafar ,&nbsp;Shouzhuo Yang ,&nbsp;Franz Müller ,&nbsp;Ricardo Olivo ,&nbsp;Thomas Kämpfe ,&nbsp;Konrad Seidel ,&nbsp;Lukas Eng ,&nbsp;Maximilian Lederer","doi":"10.1016/j.memori.2024.100110","DOIUrl":"10.1016/j.memori.2024.100110","url":null,"abstract":"<div><p>Ferroelectric (FE) hafnium zirconium oxide (HZO) is an excellent candidate for data storage applications. However, it has some reliability limitations such as imprint and retention. Herein, we explore Al doping of HZO to overcome these limitations. FE behavior is tuned by the aluminum (Al) concentrations in the films and by annealing temperature. A correlation is done between electrical behavior, crystallographic texture, and FE phases determined by grazing-incidence X-ray diffraction (GIXRD) measurements. Reduced coercive field (2E<span><math><msub><mrow></mrow><mrow><mi>c</mi></mrow></msub></math></span>) values and wake-up free HZO-based ferroelectrics are explored. We show the tunability of remanent polarization (2P<span><math><msub><mrow></mrow><mrow><mi>r</mi></mrow></msub></math></span>) and 2E<span><math><msub><mrow></mrow><mrow><mi>c</mi></mrow></msub></math></span> with respect to Al-doping concentration and anneal temperature, hence crystallographic texture.</p></div>","PeriodicalId":100915,"journal":{"name":"Memories - Materials, Devices, Circuits and Systems","volume":"8 ","pages":"Article 100110"},"PeriodicalIF":0.0,"publicationDate":"2024-05-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2773064624000124/pdfft?md5=445e0ff8e7f5c9c884fff43f49e16f99&pid=1-s2.0-S2773064624000124-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141028383","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design and reliability assessment of an ultra-thin body electrostatically doped bipolar transistor for mixed signal applications 用于混合信号应用的超薄静电掺杂双极晶体管的设计与可靠性评估
Pub Date : 2024-04-25 DOI: 10.1016/j.memori.2024.100108
Abhishek Sahu, Abhishek Kumar, Anurag Dwivedi, Shree Prakash Tiwari

Shrinking of the thickness of silicon on insulator (SOI) has been proposed as a potential solution for scaling down the physical base length of symmetric lateral electrostatically doped bipolar transistors. An ultra-thin body device that utilizes the full SOI thickness has been presented and the performance of the same is investigated in detail. The device features two distinct doping techniques: work function-induced electrostatic doping (WED) and bias-induced electrostatic doping (BED). The proposed design approach leads to significant improvements in gain and cut-off frequency compared to previously reported designs. The resulting devices exhibit peak current gain β values >1100, ft>500 GHz, fmax>1300 GHz. Moreover, these improved device performance matrices get translated into better performance of universal gates with low rise and fall time of 1.3 ns, and improved noise margin performance in static random access memory (SRAM) device of 0.43 and 0.41 for WED and BED based devices respectively. Furthermore, the study investigates the reliability of the device concerning breakdown voltage and its response to different temperature conditions. The findings reveal a decline in the β value for WED-based devices when subjected to temperatures exceeding 340 K. In contrast, BED-based devices demonstrate a comparatively smaller variation in β at temperatures above 340 K. These results show the potential of the proposed device for mixed-signal and digital circuit applications.

缩小绝缘体上硅(SOI)的厚度是缩小对称横向静电掺杂双极晶体管物理基极长度的潜在解决方案。我们提出了一种利用全 SOI 厚度的超薄体器件,并对其性能进行了详细研究。该器件采用了两种不同的掺杂技术:功函数诱导静电掺杂(WED)和偏置诱导静电掺杂(BED)。与之前报道的设计相比,所提出的设计方法显著提高了增益和截止频率。由此产生的器件显示出峰值电流增益β值>1100,ft>500 GHz,fmax>1300 GHz。此外,这些改进的器件性能矩阵可转化为通用门的更佳性能,上升和下降时间低至 1.3 ns,基于 WED 和 BED 的器件在静态随机存取存储器 (SRAM) 器件中的噪声裕度性能分别提高到 0.43 和 0.41。此外,研究还调查了器件在击穿电压方面的可靠性及其对不同温度条件的响应。研究结果表明,当温度超过 340 K 时,基于 WED 的器件的 β 值会下降;相比之下,基于 BED 的器件在温度超过 340 K 时,β 值的变化相对较小。
{"title":"Design and reliability assessment of an ultra-thin body electrostatically doped bipolar transistor for mixed signal applications","authors":"Abhishek Sahu,&nbsp;Abhishek Kumar,&nbsp;Anurag Dwivedi,&nbsp;Shree Prakash Tiwari","doi":"10.1016/j.memori.2024.100108","DOIUrl":"10.1016/j.memori.2024.100108","url":null,"abstract":"<div><p>Shrinking of the thickness of silicon on insulator (SOI) has been proposed as a potential solution for scaling down the physical base length of symmetric lateral electrostatically doped bipolar transistors. An ultra-thin body device that utilizes the full SOI thickness has been presented and the performance of the same is investigated in detail. The device features two distinct doping techniques: work function-induced electrostatic doping (WED) and bias-induced electrostatic doping (BED). The proposed design approach leads to significant improvements in gain and cut-off frequency compared to previously reported designs. The resulting devices exhibit peak current gain <span><math><mi>β</mi></math></span> values <span><math><mrow><mo>&gt;</mo><mn>1100</mn></mrow></math></span>, <span><math><mrow><msub><mrow><mi>f</mi></mrow><mrow><mi>t</mi></mrow></msub><mo>&gt;</mo><mn>500</mn></mrow></math></span> GHz, <span><math><mrow><msub><mrow><mi>f</mi></mrow><mrow><mi>m</mi><mi>a</mi><mi>x</mi></mrow></msub><mo>&gt;</mo><mn>1300</mn></mrow></math></span> GHz. Moreover, these improved device performance matrices get translated into better performance of universal gates with low rise and fall time of <span><math><mrow><mo>∼</mo><mn>1</mn><mo>.</mo><mn>3</mn></mrow></math></span> ns, and improved noise margin performance in static random access memory (SRAM) device of 0.43 and 0.41 for WED and BED based devices respectively. Furthermore, the study investigates the reliability of the device concerning breakdown voltage and its response to different temperature conditions. The findings reveal a decline in the <span><math><mi>β</mi></math></span> value for WED-based devices when subjected to temperatures exceeding <span><math><mrow><mn>340</mn></mrow></math></span> K. In contrast, BED-based devices demonstrate a comparatively smaller variation in <span><math><mi>β</mi></math></span> at temperatures above <span><math><mrow><mn>340</mn></mrow></math></span> K. These results show the potential of the proposed device for mixed-signal and digital circuit applications.</p></div>","PeriodicalId":100915,"journal":{"name":"Memories - Materials, Devices, Circuits and Systems","volume":"8 ","pages":"Article 100108"},"PeriodicalIF":0.0,"publicationDate":"2024-04-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2773064624000100/pdfft?md5=c694a161afbe2608c45c4d4abd28f820&pid=1-s2.0-S2773064624000100-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140763480","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design and Simulation of Reversible Logic Gate Using HCS Macro-Model 使用 HCS 宏模型设计和模拟可逆逻辑门
Pub Date : 2024-04-20 DOI: 10.1016/j.memori.2024.100109
Snigdha Chowdhury Kolay , Amrita Chatterjee , Subrata Chattopadhyay

—Reversible Logic Gates have become very popular for their uninhibited merits like, low power consumption, low garbage output, decreasing the quantum cost, least propagation delay etc. Several circuits have been designed for reversible logic ICs using conventional CMOS technology. But, as the CMOS technology is suffering from scaling down problems, the researchers have moved themselves towards post CMOS devices for further fabrication of Reversible ICs. Among different post CMOS devices, in SET, electrons are tunnelling through the channel one by one, so it offers ultra-low power dissipation compared to the traditional CMOS though it has high speed, high gain like properties. So the hybridization of CMOS-SET can achieve a useful effect on VLSI design, and the new technology is known as Hybrid CMOS-SET (HCS). But as the Hybrid CMOS-SET requires two distinct software, the HCS macro model has become very useful, as it can be simulated by using a single software. In this present paper, the reversible logic gate has been designed using the HCS macro model and is also being simulated using a single software, MATLAB with SIMULINK, with low power consumption.

-可逆逻辑门因其低功耗、低垃圾输出、降低量子成本、传播延迟最小等优点而广受欢迎。利用传统的 CMOS 技术,人们已经为可逆逻辑集成电路设计了多种电路。但是,由于 CMOS 技术存在规模缩小的问题,研究人员开始转向后 CMOS 器件,以进一步制造可逆集成电路。在不同的后 CMOS 器件中,在 SET 中,电子是逐个隧穿通道的,因此与传统的 CMOS 相比,它虽然具有高速、高增益等特性,但却能提供超低的功耗。因此,CMOS-SET 的杂交在超大规模集成电路设计中可以达到很好的效果,这种新技术被称为混合 CMOS-SET (HCS)。但由于混合 CMOS-SET 需要两个不同的软件,因此 HCS 宏模型变得非常有用,因为只需使用一个软件就能对其进行仿真。本文使用 HCS 宏模型设计了可逆逻辑门,并使用 MATLAB 和 SIMULINK 这两个软件对其进行了低功耗仿真。
{"title":"Design and Simulation of Reversible Logic Gate Using HCS Macro-Model","authors":"Snigdha Chowdhury Kolay ,&nbsp;Amrita Chatterjee ,&nbsp;Subrata Chattopadhyay","doi":"10.1016/j.memori.2024.100109","DOIUrl":"https://doi.org/10.1016/j.memori.2024.100109","url":null,"abstract":"<div><p>—Reversible Logic Gates have become very popular for their uninhibited merits like, low power consumption, low garbage output, decreasing the quantum cost, least propagation delay etc. Several circuits have been designed for reversible logic ICs using conventional CMOS technology. But, as the CMOS technology is suffering from scaling down problems, the researchers have moved themselves towards post CMOS devices for further fabrication of Reversible ICs. Among different post CMOS devices, in SET, electrons are tunnelling through the channel one by one, so it offers ultra-low power dissipation compared to the traditional CMOS though it has high speed, high gain like properties. So the hybridization of CMOS-SET can achieve a useful effect on VLSI design, and the new technology is known as Hybrid CMOS-SET (HCS). But as the Hybrid CMOS-SET requires two distinct software, the HCS macro model has become very useful, as it can be simulated by using a single software. In this present paper, the reversible logic gate has been designed using the HCS macro model and is also being simulated using a single software, MATLAB with SIMULINK, with low power consumption.</p></div>","PeriodicalId":100915,"journal":{"name":"Memories - Materials, Devices, Circuits and Systems","volume":"8 ","pages":"Article 100109"},"PeriodicalIF":0.0,"publicationDate":"2024-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2773064624000112/pdfft?md5=749770b78b3f743288f1fc9b4fe3ca83&pid=1-s2.0-S2773064624000112-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140639348","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fully active and highly reliable combined ring voltage controlled CMOS oscillator 全主动、高可靠性组合式环形压控 CMOS 振荡器
Pub Date : 2024-04-19 DOI: 10.1016/j.memori.2024.100107
Ilghar Rezaei , Ava Salmanpour , Ali Soldoozy , Toktam Aghaee

Leveraging two types of enhanced delay stages to form an oscillation loop, results in a highly reliable CMOS ring oscillator versus external interventions. The idea is investigated via symbolic delay calculations and the HSPICE circuit simulator while 0.18 μm CMOS is exploited. Based on two described inverters, three-ring oscillators are presented. The two ones use only one type of delay stage while the third is combined using two basic inverters and a single current-starved inverter. The basic type inverter is the fastest while is sensitive to power supply and temperature variations. On the other hand, the sensitivity of the current starved inverter is acceptable but this delay stage shows a large delay time, reducing oscillation frequency. This work tries to address this tradeoff between speed and sensitivity by proposing an oscillation loop. The delay times analysis and simulation results verify the robust performance of the proposed oscillator.

利用两种类型的增强型延迟级形成一个振荡回路,从而产生了一种相对于外部干预的高可靠性 CMOS 环形振荡器。我们通过符号延迟计算和 HSPICE 电路模拟器对这一想法进行了研究,同时采用了 0.18 μm CMOS。在两个所述逆变器的基础上,提出了三环振荡器。其中两种只使用一种延迟级,而第三种则结合使用了两个基本型逆变器和一个单电流限制型逆变器。基本型逆变器速度最快,但对电源和温度变化比较敏感。另一方面,电流饥渴型逆变器的灵敏度可以接受,但这种延迟级的延迟时间较长,从而降低了振荡频率。这项工作试图通过提出一个振荡回路来解决速度和灵敏度之间的权衡问题。延迟时间分析和仿真结果验证了所提振荡器的稳健性能。
{"title":"Fully active and highly reliable combined ring voltage controlled CMOS oscillator","authors":"Ilghar Rezaei ,&nbsp;Ava Salmanpour ,&nbsp;Ali Soldoozy ,&nbsp;Toktam Aghaee","doi":"10.1016/j.memori.2024.100107","DOIUrl":"https://doi.org/10.1016/j.memori.2024.100107","url":null,"abstract":"<div><p>Leveraging two types of enhanced delay stages to form an oscillation loop, results in a highly reliable CMOS ring oscillator versus external interventions. The idea is investigated via symbolic delay calculations and the HSPICE circuit simulator while 0.18 μm CMOS is exploited. Based on two described inverters, three-ring oscillators are presented. The two ones use only one type of delay stage while the third is combined using two basic inverters and a single current-starved inverter. The basic type inverter is the fastest while is sensitive to power supply and temperature variations. On the other hand, the sensitivity of the current starved inverter is acceptable but this delay stage shows a large delay time, reducing oscillation frequency. This work tries to address this tradeoff between speed and sensitivity by proposing an oscillation loop. The delay times analysis and simulation results verify the robust performance of the proposed oscillator.</p></div>","PeriodicalId":100915,"journal":{"name":"Memories - Materials, Devices, Circuits and Systems","volume":"8 ","pages":"Article 100107"},"PeriodicalIF":0.0,"publicationDate":"2024-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2773064624000094/pdfft?md5=c13283fe13871a3ff3194ba7184b2491&pid=1-s2.0-S2773064624000094-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140645537","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Memories - Materials, Devices, Circuits and Systems
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1