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Modeling and analysis of crosstalk induced effects in graphene-carbon nanotube composite interconnects 石墨烯-碳纳米管复合互连中的串扰诱导效应建模与分析
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-31 DOI: 10.1016/j.micrna.2024.207946

This paper proposes an equivalent circuit model for two-line coupled multilayer graphene nanoribbon - single-wall carbon nanotube (MLGNR-SWCNT) composite interconnects (MSCs), incorporating the effects of coupling capacitance and mutual inductance. We also examine the temperature-dependent crosstalk effect on the victim line of MSCs in the time domain using decoupling techniques and the ABCD parameter matrix approach. This analysis is conducted at the global level of 7 nm, 14 nm, and 22 nm technology nodes, comparing the performance of MSCs with MLGNR, SWCNT, and copper (Cu) interconnects, validated through HSPICE simulations. Our results reveal that the crosstalk delay of all interconnects induced by dynamic crosstalk exhibits superior performance in the in-phase crosstalk mode compared to the out-of-phase mode at room temperature. In particular, MSCs demonstrate less crosstalk delay in both crosstalk modes compared to SWCNT and Cu interconnects. In addition, we analyze the crosstalk delay of the victim line for two-line coupled MSCs at varying temperatures in out-of-phase crosstalk mode, comparing them with MLGNR, SWCNT, and Cu interconnects. Simulation results indicate that the crosstalk delay is temperature-dependent, increasing with rising temperatures, and the crosstalk delay of MSCs is the least of all interconnects. Furthermore, we investigate the crosstalk noise of MSCs induced by functional crosstalk at different temperatures, comparing it with MLGNR, SWCNT, and Cu interconnects. It is observed that the crosstalk noise peak remains constant with temperature changes across all interconnects; however, the holding time and width of crosstalk noise increases with rising temperatures and MSCs have the least crosstalk noise peak and crosstalk noise width of all interconnects. Also, numerical results exhibit that reducing interconnect temperature, SWCNT diameter, and edge roughness of MLGNR are effective strategies to diminish the crosstalk delay of MSCs. In addition, increasing line spacing is identified as an effective method to reduce crosstalk noise peak of MSCs of different lengths. The proposed model results show excellent agreement with HSPICE simulation data. Therefore, our analysis of crosstalk effect manifests that MLGNR-SWCNT composite can be a promising material to replace SWCNT and copper as an ideal material for global interconnect applications in thermally variable environments.

本文提出了双线耦合多层石墨烯纳米带-单壁碳纳米管(MLGNR-SWCNT)复合互连器件(MSCs)的等效电路模型,其中包含耦合电容和互感的影响。我们还利用去耦技术和 ABCD 参数矩阵方法,在时域中研究了 MSC 受害线的温度相关串扰效应。这项分析是在 7 纳米、14 纳米和 22 纳米技术节点的全球层面上进行的,比较了 MSC 与 MLGNR、SWCNT 和铜(Cu)互连器件的性能,并通过 HSPICE 仿真进行了验证。我们的研究结果表明,在室温条件下,动态串扰引起的所有互连器件的串扰延迟在同相串扰模式下均表现出优于非同相串扰模式的性能。特别是,与 SWCNT 和铜互连器件相比,MSC 在两种串扰模式下的串扰延迟都较小。此外,我们还分析了双线耦合 MSC 在不同温度下的失相串扰模式中受害线的串扰延迟,并将其与 MLGNR、SWCNT 和铜互连器件进行了比较。仿真结果表明,串音延迟与温度有关,随着温度升高而增加,而 MSC 的串音延迟是所有互连器件中最小的。此外,我们还研究了 MSC 在不同温度下由功能串扰引起的串扰噪声,并将其与 MLGNR、SWCNT 和铜互连器件进行了比较。结果表明,所有互连器件的串扰噪声峰值随温度变化保持不变;但是,串扰噪声的保持时间和宽度随温度升高而增加,在所有互连器件中,MSC 的串扰噪声峰值和串扰噪声宽度最小。数值结果还表明,降低互连温度、SWCNT 直径和 MLGNR 边缘粗糙度是减少 MSC 串扰延迟的有效策略。此外,增加线间距也是降低不同长度 MSC 串扰噪声峰值的有效方法。提出的模型结果与 HSPICE 仿真数据显示出极好的一致性。因此,我们对串扰效应的分析表明,MLGNR-SWCNT 复合材料有望取代 SWCNT 和铜,成为热变化环境中全球互连应用的理想材料。
{"title":"Modeling and analysis of crosstalk induced effects in graphene-carbon nanotube composite interconnects","authors":"","doi":"10.1016/j.micrna.2024.207946","DOIUrl":"10.1016/j.micrna.2024.207946","url":null,"abstract":"<div><p>This paper proposes an equivalent circuit model for two-line coupled multilayer graphene nanoribbon - single-wall carbon nanotube (MLGNR-SWCNT) composite interconnects (MSCs), incorporating the effects of coupling capacitance and mutual inductance. We also examine the temperature-dependent crosstalk effect on the victim line of MSCs in the time domain using decoupling techniques and the ABCD parameter matrix approach. This analysis is conducted at the global level of 7 nm, 14 nm, and 22 nm technology nodes, comparing the performance of MSCs with MLGNR, SWCNT, and copper (Cu) interconnects, validated through HSPICE simulations. Our results reveal that the crosstalk delay of all interconnects induced by dynamic crosstalk exhibits superior performance in the in-phase crosstalk mode compared to the out-of-phase mode at room temperature. In particular, MSCs demonstrate less crosstalk delay in both crosstalk modes compared to SWCNT and Cu interconnects. In addition, we analyze the crosstalk delay of the victim line for two-line coupled MSCs at varying temperatures in out-of-phase crosstalk mode, comparing them with MLGNR, SWCNT, and Cu interconnects. Simulation results indicate that the crosstalk delay is temperature-dependent, increasing with rising temperatures, and the crosstalk delay of MSCs is the least of all interconnects. Furthermore, we investigate the crosstalk noise of MSCs induced by functional crosstalk at different temperatures, comparing it with MLGNR, SWCNT, and Cu interconnects. It is observed that the crosstalk noise peak remains constant with temperature changes across all interconnects; however, the holding time and width of crosstalk noise increases with rising temperatures and MSCs have the least crosstalk noise peak and crosstalk noise width of all interconnects. Also, numerical results exhibit that reducing interconnect temperature, SWCNT diameter, and edge roughness of MLGNR are effective strategies to diminish the crosstalk delay of MSCs. In addition, increasing line spacing is identified as an effective method to reduce crosstalk noise peak of MSCs of different lengths. The proposed model results show excellent agreement with HSPICE simulation data. Therefore, our analysis of crosstalk effect manifests that MLGNR-SWCNT composite can be a promising material to replace SWCNT and copper as an ideal material for global interconnect applications in thermally variable environments.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141935180","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Influence of annealing treatment on performance of 4H–SiC SBD irradiated by heavy ions under room temperature and low temperature 退火处理对室温和低温重离子辐照下 4H-SiC SBD 性能的影响
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-31 DOI: 10.1016/j.micrna.2024.207945

The influence of the annealing treatment on the performance of commercial 4H–SiC Schottky barrier diodes (SBDs) subjected to heavy ion irradiation under room temperature (RT) and low temperature (LT) are presented. Experimental results confirm that annealing treatment effectively eliminates defects and interface states caused by heavy ion irradiation, particularly for 4H–SiC SBD under LT irradiation. Increasing the annealing temperature leads to the slight improvement in forward current, leakage current and breakdown voltage. However, the annealing process may result in the formation of Ti and Si compounds at the interface between the Schottky metal and SiC, as well as a significant number of vacancies. Combined with Technology Computer Aided Design (TCAD) simulations, it is concluded that the interface trap charge concentrations exceeding 1 × 1012 cm−2 significantly impact the breakdown characteristics of 4H–SiC SBDs.

本文介绍了退火处理对室温(RT)和低温(LT)重离子辐照下商用 4H-SiC 肖特基势垒二极管(SBD)性能的影响。实验结果证实,退火处理能有效消除重离子辐照造成的缺陷和界面态,尤其是在低温辐照下的 4H-SiC SBD。提高退火温度可略微改善正向电流、漏电流和击穿电压。但是,退火过程可能会在肖特基金属和碳化硅之间的界面上形成 Ti 和 Si 化合物以及大量空位。结合技术计算机辅助设计(TCAD)模拟得出的结论是,界面陷阱电荷浓度超过 1 × 1012 cm-2 会严重影响 4H-SiC SBD 的击穿特性。
{"title":"Influence of annealing treatment on performance of 4H–SiC SBD irradiated by heavy ions under room temperature and low temperature","authors":"","doi":"10.1016/j.micrna.2024.207945","DOIUrl":"10.1016/j.micrna.2024.207945","url":null,"abstract":"<div><p>The influence of the annealing treatment on the performance of commercial 4H–SiC Schottky barrier diodes (SBDs) subjected to heavy ion irradiation under room temperature (RT) and low temperature (LT) are presented. Experimental results confirm that annealing treatment effectively eliminates defects and interface states caused by heavy ion irradiation, particularly for 4H–SiC SBD under LT irradiation. Increasing the annealing temperature leads to the slight improvement in forward current, leakage current and breakdown voltage. However, the annealing process may result in the formation of Ti and Si compounds at the interface between the Schottky metal and SiC, as well as a significant number of vacancies. Combined with Technology Computer Aided Design (TCAD) simulations, it is concluded that the interface trap charge concentrations exceeding 1 × 10<sup>12</sup> cm<sup>−2</sup> significantly impact the breakdown characteristics of 4H–SiC SBDs.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141952580","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Device and circuit-level performance evaluation of DG-GNR-DMG vertical tunnel FET DG-GNR-DMG 垂直隧道场效应晶体管的器件和电路级性能评估
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-30 DOI: 10.1016/j.micrna.2024.207942

This work presents the comparative study of Graphene Nanoribbon (GNR) based channel Double Gate (DG) Dual Gate Material (DMG) Vertical tunnel Field Effect Transistor (VTFET) performance with all Silicon material Tunnel Field Effect Transistor. The two-dimensional (2D) material GNR has been proposed in the channel material to enhance the device performance due to its low bandgap, high mobility, and high saturation velocity. The proposed device's DC, RF, and circuit-level performance analysis has been carried out for the first time. GNR-based channel VTFET shows a better average subthreshold swing (SSAVG) of 16 mV/decade compared to Silicon Vertical Tunnel FET (36 mV/decade) at a drain voltage VDS = 0.5 V. The study of temperature effects on the DC parameters is also included along with the analog/RF FOMs for the proposed two structures. In addition, the performances are compared with other reported works; it is observed that DG-GNR-DMG-VTFET offers better results than Silicon (Si)-based VTFET and other said TFET work. Finally, circuit-level analysis has been done by designing inverter and ring oscillator circuits for the proposed structures, and performance is compared in these two devices. The market-available Silvaco ATLAS TCAD simulator has been used for device-level simulation. Further, circuit-level analysis has been carried out in the Cadence Virtuoso tool using a look-up table-based Verilog-A model.

本作品介绍了基于石墨烯纳米带(GNR)的沟道双栅(DG)双栅材料垂直隧道场效应晶体管(VTFET)与全硅材料隧道场效应晶体管性能的比较研究。由于二维(2D)材料 GNR 具有低带隙、高迁移率和高饱和速率的特性,因此建议将其作为沟道材料,以提高器件性能。我们首次对该器件进行了直流、射频和电路级性能分析。在漏极电压 V = 0.5 V 时,与硅垂直隧道场效应晶体管(36 mV/decade)相比,基于 GNR 的沟道 VTFET 平均阈下摆幅 (SS) 为 16 mV/decade,表现更佳。此外,还研究了温度对直流参数的影响以及这两种结构的模拟/射频 FOM。此外,还将其性能与其他已报道的作品进行了比较;结果表明,DG-GNR-DMG-VTFET 比基于硅(Si)的 VTFET 和其他上述 TFET 作品具有更好的性能。最后,通过为拟议结构设计逆变器和环形振荡器电路,进行了电路级分析,并比较了这两种器件的性能。器件级仿真使用了市场上销售的 Silvaco ATLAS TCAD 仿真器。此外,还使用基于查找表的 Verilog-A 模型在 Cadence Virtuoso 工具中进行了电路级分析。
{"title":"Device and circuit-level performance evaluation of DG-GNR-DMG vertical tunnel FET","authors":"","doi":"10.1016/j.micrna.2024.207942","DOIUrl":"10.1016/j.micrna.2024.207942","url":null,"abstract":"<div><p>This work presents the comparative study of Graphene Nanoribbon (GNR) based channel Double Gate (DG) Dual Gate Material (DMG) Vertical tunnel Field Effect Transistor (VTFET) performance with all Silicon material Tunnel Field Effect Transistor. The two-dimensional (2D) material GNR has been proposed in the channel material to enhance the device performance due to its low bandgap, high mobility, and high saturation velocity. The proposed device's DC, RF, and circuit-level performance analysis has been carried out for the first time. GNR-based channel VTFET shows a better average subthreshold swing (SS<sub>AVG</sub>) of 16 mV/decade compared to Silicon Vertical Tunnel FET (36 mV/decade) at a drain voltage V<sub>DS</sub> = 0.5 V. The study of temperature effects on the DC parameters is also included along with the analog/RF FOMs for the proposed two structures. In addition, the performances are compared with other reported works; it is observed that DG-GNR-DMG-VTFET offers better results than Silicon (Si)-based VTFET and other said TFET work. Finally, circuit-level analysis has been done by designing inverter and ring oscillator circuits for the proposed structures, and performance is compared in these two devices. The market-available Silvaco ATLAS TCAD simulator has been used for device-level simulation. Further, circuit-level analysis has been carried out in the Cadence Virtuoso tool using a look-up table-based Verilog-A model.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141935181","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Ge quantum well channel P-MOSFET for 2.45 GHz wireless weak energy harvesting 用于 2.45 GHz 无线微弱能量采集的 Ge 量子阱沟道 P-MOSFET
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-30 DOI: 10.1016/j.micrna.2024.207938

Wireless energy harvesting is an important application of microwave wireless energy transmission system, but due to the weak energy of RF signals in the 2.45 GHz band, its rectification efficiency is not ideal. As one of the core rectifier components of wireless weak energy harvesting system, the performance of MOSFET determines the rectification efficiency of the system, and its optimized design to improve the rectification efficiency is an important direction of current research in the field. In view of this, this paper proposes and designs Ge quantum well channel PMOS for wireless weak energy harvesting at 2.45 GHz, aiming to improve the rectification efficiency of wireless weak energy harvesting systems. Starting from adjusting the structural physical parameters of the MOS tubes, the absolute value of the threshold voltage is reduced in the weak energy density region, which in turn improves the rectification efficiency of the device. Then, the novel diode connection with the introduction of substrate bias effect is compared with the conventional connection using an ADS simulation circuit, and the simulation results show that the leakage current is smaller and the rectification efficiency is higher under the novel connection. On this basis, a Ge quantum well channel PMOS device is proposed. Compared with the Ge surface channel, the hole mobility of the quantum well channel will be greatly improved, and its rectification efficiency can also be improved. The device is connected to the rectifier circuit with a novel connection and simulated using Silvaco's Mixedmode module. The results show that the rectification efficiencies of the Ge quantum well channel MOS reach 13.53 % and 32 % at low input powers of −20.34 dBm and −6.28 dBm, respectively, which are 3.3 and 1.14 times higher than those of the conventional surface channel MOS.

无线能量采集是微波无线能量传输系统的重要应用,但由于2.45 GHz频段射频信号能量较弱,其整流效率并不理想。作为无线微弱能量采集系统的核心整流元件之一,MOSFET 的性能决定了系统的整流效率,对其进行优化设计以提高整流效率是当前该领域研究的重要方向。有鉴于此,本文提出并设计了用于 2.45 GHz 无线弱能量收集的 Ge 量子井沟道 PMOS,旨在提高无线弱能量收集系统的整流效率。从调整 MOS 管的结构物理参数入手,降低了弱能量密度区的阈值电压绝对值,从而提高了器件的整流效率。然后,利用 ADS 仿真电路将引入衬底偏压效应的新型二极管连接与传统连接进行了比较,仿真结果表明,新型连接下的漏电流更小,整流效率更高。在此基础上,提出了一种 Ge 量子阱沟道 PMOS 器件。与 Ge 表面沟道相比,量子阱沟道的空穴迁移率将大大提高,其整流效率也能得到改善。该器件采用新颖的连接方式与整流电路相连,并使用 Silvaco 的 Mixedmode 模块进行了仿真。结果表明,在 -20.34 dBm 和 -6.28 dBm 的低输入功率下,Ge 量子阱沟道 MOS 的整流效率分别达到 13.53 % 和 32 %,分别是传统表面沟道 MOS 的 3.3 倍和 1.14 倍。
{"title":"Ge quantum well channel P-MOSFET for 2.45 GHz wireless weak energy harvesting","authors":"","doi":"10.1016/j.micrna.2024.207938","DOIUrl":"10.1016/j.micrna.2024.207938","url":null,"abstract":"<div><p>Wireless energy harvesting is an important application of microwave wireless energy transmission system, but due to the weak energy of RF signals in the 2.45 GHz band, its rectification efficiency is not ideal. As one of the core rectifier components of wireless weak energy harvesting system, the performance of MOSFET determines the rectification efficiency of the system, and its optimized design to improve the rectification efficiency is an important direction of current research in the field. In view of this, this paper proposes and designs Ge quantum well channel PMOS for wireless weak energy harvesting at 2.45 GHz, aiming to improve the rectification efficiency of wireless weak energy harvesting systems. Starting from adjusting the structural physical parameters of the MOS tubes, the absolute value of the threshold voltage is reduced in the weak energy density region, which in turn improves the rectification efficiency of the device. Then, the novel diode connection with the introduction of substrate bias effect is compared with the conventional connection using an ADS simulation circuit, and the simulation results show that the leakage current is smaller and the rectification efficiency is higher under the novel connection. On this basis, a Ge quantum well channel PMOS device is proposed. Compared with the Ge surface channel, the hole mobility of the quantum well channel will be greatly improved, and its rectification efficiency can also be improved. The device is connected to the rectifier circuit with a novel connection and simulated using Silvaco's Mixedmode module. The results show that the rectification efficiencies of the Ge quantum well channel MOS reach 13.53 % and 32 % at low input powers of −20.34 dBm and −6.28 dBm, respectively, which are 3.3 and 1.14 times higher than those of the conventional surface channel MOS.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141935182","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Theoretical analysis of InAs based Bi-tunable narrow band terahertz perfect absorber for thermal sensing application 用于热感应应用的基于 InAs 的双可调窄带太赫兹完美吸收器的理论分析
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-30 DOI: 10.1016/j.micrna.2024.207936

In this paper, a bi-tunable metamaterial absorber comprising a subwavelength resonator of semiconducting material InAs and a metallic plane adhered to a dielectric layer has been proposed in the terahertz regime. Absorption of about 99.8 % is achieved at 4.446 THz with the application of magnetic field B = 0.4 T and a high tunability rate of 0.4 THz/T in the central resonance frequency due to the presence of a magnetostatically tunable H-shaped InAs resonator and polyimide dielectric layer. The same structure supports dual control over the resonance by replacing polyimide dielectric layer with InSb, as InSb possesses temperature- and magnetic field-dependent dielectric properties. The replacement of polyimide dielectric layer with InSb provides near unity absorption of 99.99 % at B = 0.4 T but when the effect of temperature on the absorption is taken, it provides a high absorptivity of 99.99 % at T = 285 K with a blue shift in the maximum resonance frequency, providing tunability of 0.016 THz/K on increasing the temperature from 280 K to 295 K. Thus, the proposed absorber not only provides dual control over the resonance spectrum but also progresses towards more practical applications in the sensing and detection of temperature variance.

本文提出了一种太赫兹范围内的双可调谐超材料吸收器,包括一个由半导体材料 InAs 和粘附在介电层上的金属平面组成的亚波长谐振器。在应用磁场 B = 0.4 T 时,在 4.446 THz 频率下实现了约 99.8 % 的吸收率,由于存在磁致可调的 H 型 InAs 谐振器和聚酰亚胺介电层,中心谐振频率的可调率高达 0.4 THz/T。由于铟锑具有随温度和磁场变化的介电特性,因此用铟锑取代聚酰亚胺介电层后,相同的结构可支持对谐振的双重控制。用 InSb 取代聚酰亚胺介电层可在 B = 0.4 T 时提供 99.99 % 的近乎统一吸收率,但如果考虑到温度对吸收率的影响,则可在 T = 285 K 时提供 99.99 % 的高吸收率,同时最大共振频率发生蓝移,温度从 280 K 升至 295 K 时的可调谐性为 0.016 THz/K。
{"title":"Theoretical analysis of InAs based Bi-tunable narrow band terahertz perfect absorber for thermal sensing application","authors":"","doi":"10.1016/j.micrna.2024.207936","DOIUrl":"10.1016/j.micrna.2024.207936","url":null,"abstract":"<div><p>In this paper, a bi-tunable metamaterial absorber comprising a subwavelength resonator of semiconducting material InAs and a metallic plane adhered to a dielectric layer has been proposed in the terahertz regime. Absorption of about 99.8 % is achieved at 4.446 THz with the application of magnetic field B = 0.4 T and a high tunability rate of 0.4 THz/T in the central resonance frequency due to the presence of a magnetostatically tunable H-shaped InAs resonator and polyimide dielectric layer. The same structure supports dual control over the resonance by replacing polyimide dielectric layer with InSb, as InSb possesses temperature- and magnetic field-dependent dielectric properties. The replacement of polyimide dielectric layer with InSb provides near unity absorption of 99.99 % at B = 0.4 T but when the effect of temperature on the absorption is taken, it provides a high absorptivity of 99.99 % at T = 285 K with a blue shift in the maximum resonance frequency, providing tunability of 0.016 THz/K on increasing the temperature from 280 K to 295 K. Thus, the proposed absorber not only provides dual control over the resonance spectrum but also progresses towards more practical applications in the sensing and detection of temperature variance.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141863291","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Influence of low-temperature cap layer thickness on the structure and luminescence of InGaN/GaN multiple quantum wells 低温盖层厚度对 InGaN /GaN 多量子阱结构和发光的影响
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-27 DOI: 10.1016/j.micrna.2024.207943

In order to effectively regulate the luminescence performance of MQW and enhance its optical quality, it is crucial to investigate the InGaN/GaN MQW's structure and luminescence properties. In this study the focus is how they are affected by low-temperature cap (LT-cap) layer's thickness which is grown above each InGaN well layer during growth process of InGaN/GaN multiple quantum well (MQW) samples in MOCVD system. This was achieved by analyzing high resolution X-ray diffraction (HRXRD) spectra, electroluminescence (EL) spectra, temperature-dependent photoluminescence (TDPL) spectra, and micro-area fluorescence imaging of these samples. The results show that changes in LT-cap layer's thickness even have no significant impact on some structural parameters of MQW, such as the thickness of the well layer, but have an influence on the In component of the well layer. Due to the existence of LT-cap layer, dissociation of InGaN can be effectually reduced. In addition, the augmentation of LT-cap layer's thickness will make polarization effect of the QW sample more remarkable, so that the blue shift of the EL peak with the augmentation of current injection increases. The change of LT-cap layer's thickness will also influence distribution of the tail states of the quantum wells, which leads to a different localization states for injected carriers. As LT-cap layer becomes getting thicker, the material's internal quantum efficiency (IQE) tends to decrease, which may result from an increase in non-radiative recombination centers.

为了有效调节 MQW 的发光性能并提高其光学质量,研究 InGaN/GaN MQW 的结构和发光特性至关重要。本研究的重点是在 MOCVD 系统中生长 InGaN/GaN 多量子阱 (MQW) 样品的过程中,在每个 InGaN 阱层上方生长的低温帽(LT-cap)层厚度对它们的影响。这是通过分析这些样品的高分辨率 X 射线衍射 (HRXRD) 光谱、电致发光 (EL) 光谱、温度相关光致发光 (TDPL) 光谱和微区荧光成像实现的。结果表明,LT-cap 层厚度的变化甚至对 MQW 的某些结构参数(如阱层厚度)没有显著影响,但对阱层的 In 分量有影响。由于 LT 盖层的存在,可以有效减少 InGaN 的解离。此外,LT-cap 层厚度的增加会使 QW 样品的极化效应更加显著,从而使 EL 峰的蓝移随着注入电流的增加而增加。LT-cap 层厚度的变化还会影响量子阱尾态的分布,从而导致注入载流子的定位态不同。随着 LT-cap 层越来越厚,材料的内部量子效率(IQE)趋于降低,这可能是非辐射重组中心增加的结果。
{"title":"Influence of low-temperature cap layer thickness on the structure and luminescence of InGaN/GaN multiple quantum wells","authors":"","doi":"10.1016/j.micrna.2024.207943","DOIUrl":"10.1016/j.micrna.2024.207943","url":null,"abstract":"<div><p>In order to effectively regulate the luminescence performance of MQW and enhance its optical quality, it is crucial to investigate the InGaN/GaN MQW's structure and luminescence properties. In this study the focus is how they are affected by low-temperature cap (LT-cap) layer's thickness which is grown above each InGaN well layer during growth process of InGaN/GaN multiple quantum well (MQW) samples in MOCVD system. This was achieved by analyzing high resolution X-ray diffraction (HRXRD) spectra, electroluminescence (EL) spectra, temperature-dependent photoluminescence (TDPL) spectra, and micro-area fluorescence imaging of these samples. The results show that changes in LT-cap layer's thickness even have no significant impact on some structural parameters of MQW, such as the thickness of the well layer, but have an influence on the In component of the well layer. Due to the existence of LT-cap layer, dissociation of InGaN can be effectually reduced. In addition, the augmentation of LT-cap layer's thickness will make polarization effect of the QW sample more remarkable, so that the blue shift of the EL peak with the augmentation of current injection increases. The change of LT-cap layer's thickness will also influence distribution of the tail states of the quantum wells, which leads to <del>a</del> different localization states for injected carriers. As LT-cap layer becomes getting thicker, the material's internal quantum efficiency (IQE) tends to decrease, which may result from an increase in non-radiative recombination centers.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2773012324001924/pdfft?md5=fefddd026151c2d6621e63a853b87b51&pid=1-s2.0-S2773012324001924-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141843455","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Coherent coupling of localized surface plasmons and surface plasmons in borophene-based metamaterial 硼吩基超材料中局部表面质子与表面质子的相干耦合
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-26 DOI: 10.1016/j.micrna.2024.207941

The strong coherent coupling in different electromagnetic modes can control the light-matter interaction more conveniently. Here, we theoretically researched the hybridization between the borophene surface plasmon (BSP) mode and the borophene localized surface plasmon (BLSP) mode in borophene grating structure. This coupling effect leads to the emergence of multiple hybrid modes. The absorption spectra of the system are investigated through finite difference time domain (FDTD) simulation and coupled oscillator model (COM). Results show that the coherent coupling of BSP and BLSP can be achieved by adjusting the carrier density of the borophene gratings. A Rabi splitting effect with frequency of 21.6 THz can be observed. Furthermore, we investigated the effects of geometric structural parameters, incident angle, and relaxation time on the correlated coupling spectra. Our work may deepen the understanding of light–matter interactions and provide a reference for borophene-based active photonic devices in the near-infrared region.

不同电磁模式的强相干耦合可以更方便地控制光物质相互作用。在此,我们从理论上研究了硼吩光栅结构中的硼吩表面等离子体(BSP)模式和硼吩局域表面等离子体(BLSP)模式之间的杂化。这种耦合效应导致了多种混合模式的出现。通过有限差分时域(FDTD)模拟和耦合振荡器模型(COM)研究了系统的吸收光谱。结果表明,通过调整硼吩光栅的载流子密度,可以实现 BSP 和 BLSP 的相干耦合。可以观察到频率为 21.6 THz 的拉比分裂效应。此外,我们还研究了几何结构参数、入射角和弛豫时间对相关耦合光谱的影响。我们的工作可能会加深对光物质相互作用的理解,并为近红外区域基于硼吩的有源光子器件提供参考。
{"title":"Coherent coupling of localized surface plasmons and surface plasmons in borophene-based metamaterial","authors":"","doi":"10.1016/j.micrna.2024.207941","DOIUrl":"10.1016/j.micrna.2024.207941","url":null,"abstract":"<div><p>The strong coherent coupling in different electromagnetic modes can control the light-matter interaction more conveniently. Here, we theoretically researched the hybridization between the borophene surface plasmon (BSP) mode and the borophene localized surface plasmon (BLSP) mode in borophene grating structure. This coupling effect leads to the emergence of multiple hybrid modes. The absorption spectra of the system are investigated through finite difference time domain (FDTD) simulation and coupled oscillator model (COM). Results show that the coherent coupling of BSP and BLSP can be achieved by adjusting the carrier density of the borophene gratings. A Rabi splitting effect with frequency of 21.6 THz can be observed. Furthermore, we investigated the effects of geometric structural parameters, incident angle, and relaxation time on the correlated coupling spectra. Our work may deepen the understanding of light–matter interactions and provide a reference for borophene-based active photonic devices in the near-infrared region.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141843026","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Linearity and noise evaluation based analysis of extended source heterojunction double gate tunnel FET 基于线性度和噪声评估的扩展源异质结双栅极隧道场效应晶体管分析
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-25 DOI: 10.1016/j.micrna.2024.207939

This research work evaluates a performance analysis of heterostructure (SiGe/Si) double gate extended source Tunnel FET (Hetero-ES-TFET) to enhance the analog performance, linearity and noise performance. At the source-channel junction, a Hetero-ES-TFET's source is extended into the channel to increase point and line tunneling in the device. The Hetero-ES-TFET exhibits a high ION/IOFF of 3.57 × 1012 and a maximum cut off frequency fT of 54.19 GHz for optimization of device structural parameters. This analysis is conducted using a calibrated SILVACO, technology computer-aided design (TCAD) simulator. The proposed structure includes evaluation of linearity and noise performance characteristics. Furthermore, a linearity analysis as a figure of merit was conducted for the proposed device under study, including different parameters such as 3rd order intermodulation distortion point (IMD3), 3rd order intermodulation intercept point (IIP3), 2nd and 3rd order voltage intercept point (VIP2 and VIP3). The proposed Hetero-ES-TFET has achieved an incredibly high ON current and low threshold voltage. The effect of increasing source width has been examined in this work while sub-threshold swing (SS) remains unchanged during the analysis. There is an improvement in threshold voltage and ION/IOFF value by using silicon-germanium (SiGe) as a source material.

这项研究工作评估了异质结构(硅基/硅)双栅扩展源极隧道场效应晶体管(Hetero-ES-TFET)的性能分析,以提高模拟性能、线性度和噪声性能。在源极-沟道结点,Hetero-ES-TFET 的源极延伸到沟道中,以增加器件中的点隧道和线隧道。Hetero-ES-TFET 的 ION/IOFF 高达 3.57 × 1012,最大截止频率 fT 为 54.19 GHz,可用于优化器件结构参数。该分析使用校准过的 SILVACO 技术计算机辅助设计 (TCAD) 模拟器进行。建议的结构包括线性和噪声性能特征评估。此外,还对所研究的拟议器件进行了线性分析,包括三阶互调失真点(IMD3)、三阶互调截取点(IIP3)、二阶和三阶电压截取点(VIP2 和 VIP3)等不同参数。所提出的 Hetero-ES-TFET 实现了难以置信的高导通电流和低阈值电压。在分析过程中,在阈下摆值(SS)保持不变的情况下,本研究还考察了增加源极宽度的效果。使用硅锗(SiGe)作为源材料,阈值电压和 ION/IOFF 值都有所提高。
{"title":"Linearity and noise evaluation based analysis of extended source heterojunction double gate tunnel FET","authors":"","doi":"10.1016/j.micrna.2024.207939","DOIUrl":"10.1016/j.micrna.2024.207939","url":null,"abstract":"<div><p>This research work evaluates a performance analysis of heterostructure (SiGe/Si) double gate extended source Tunnel FET (Hetero-ES-TFET) to enhance the analog performance, linearity and noise performance. At the source-channel junction, a Hetero-ES-TFET's source is extended into the channel to increase point and line tunneling in the device. The Hetero-ES-TFET exhibits a high <em>I</em><sub><em>ON</em></sub><em>/I</em><sub><em>OFF</em></sub> of 3.57 × 10<sup>12</sup> and a maximum cut off frequency <em>f</em><sub><em>T</em></sub> of 54.19 GHz for optimization of device structural parameters. This analysis is conducted using a calibrated SILVACO, technology computer-aided design (TCAD) simulator. The proposed structure includes evaluation of linearity and noise performance characteristics. Furthermore, a linearity analysis as a figure of merit was conducted for the proposed device under study, including different parameters such as 3<sup>rd</sup> order intermodulation distortion point (IMD<sub>3</sub>), 3<sup>rd</sup> order intermodulation intercept point (IIP<sub>3</sub>), 2<sup>nd</sup> and 3<sup>rd</sup> order voltage intercept point (VIP<sub>2</sub> and VIP<sub>3</sub>). The proposed Hetero-ES-TFET has achieved an incredibly high ON current and low threshold voltage. The effect of increasing source width has been examined in this work while sub-threshold swing (SS) remains unchanged during the analysis. There is an improvement in threshold voltage and <em>I</em><sub><em>ON</em></sub><em>/I</em><sub><em>OFF</em></sub> value by using silicon-germanium (SiGe) as a source material.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141841834","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Low-bandgap material engineering based TFET device for next-generation biosensor application-A comprehensive review on device structure and sensitivity 基于低带隙材料工程的 TFET 器件用于下一代生物传感器应用--器件结构与灵敏度综述。
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-23 DOI: 10.1016/j.micrna.2024.207935

The Tunnel Field Effect Transistor (TFET) device has emerged as the potential candidate to replace the Field Effect Transistor (FET)--based biosensor for the label-free detection of biomolecules using the dielectric modulation (DM) technique. The superior subthreshold swing characteristics with the unique band-to-band tunneling (BTBT) of charge carriers, the TFET-based biosensor can accomplish features of Point of Care Testing (PoCT) tools. Researchers proposed various techniques to enhance the performance of TFET-based biosensors in terms of high ON(ION) current sensitivity, which is treated as the performance stumbling block for TFET devices. In this review, a systematic investigation of the low bandgap material engineering technique applied to the TFET-based biosensors is carried out to understand the functionality and work. The heterojunction-based TFET biosensors with SiGe, Ge, and GaAs material are investigated thoroughly. The hetero material-based junction less TFET biosensors are also included in this review to exhibit the advantage of the material engineering approach for JLTFET biosensors. The bandgap engineering technique for the heterojunction TFET biosensor is investigated by considering other performance approaches like structural engineering, Gate work function, and source engineering. The performance of these heterojunction TFET biosensors was studied by taking the parameters like energy bandgap, on current, drain current sensitivity and subthreshold swing of the device. In this work, a detailed roadmap is created to understand how the low bandgap material engineering can be applied to the TFET biosensor to enhance its performance in terms of sensitivity and speed of detection.

隧道场效应晶体管(TFET)器件已成为替代场效应晶体管(FET)生物传感器的潜在候选器件,可利用介电调制(DM)技术对生物分子进行无标记检测。基于 TFET 的生物传感器具有优越的阈下摆动特性和独特的电荷载流子带间隧道(BTBT)特性,可以实现医疗点检测(PoCT)工具的功能。研究人员提出了各种技术来提高基于 TFET 的生物传感器在高导通(离子)电流灵敏度方面的性能,而导通(离子)电流灵敏度是 TFET 器件性能的绊脚石。在这篇综述中,我们对应用于基于 TFET 的生物传感器的低带隙材料工程技术进行了系统研究,以了解其功能和工作原理。本文深入研究了使用 SiGe、Ge 和 GaAs 材料的异质结 TFET 生物传感器。本综述还包括基于异质材料结的 TFET 生物传感器,以展示 JLTFET 生物传感器材料工程方法的优势。通过考虑结构工程、栅极功函数和源工程等其他性能方法,研究了异质结 TFET 生物传感器的带隙工程技术。通过对器件的能带隙、导通电流、漏极电流灵敏度和亚阈值摆动等参数的测量,研究了这些异质结 TFET 生物传感器的性能。这项研究绘制了详细的路线图,以了解如何将低带隙材料工程应用于 TFET 生物传感器,从而提高其灵敏度和检测速度。
{"title":"Low-bandgap material engineering based TFET device for next-generation biosensor application-A comprehensive review on device structure and sensitivity","authors":"","doi":"10.1016/j.micrna.2024.207935","DOIUrl":"10.1016/j.micrna.2024.207935","url":null,"abstract":"<div><p>The Tunnel Field Effect Transistor (TFET) device has emerged as the potential candidate to replace the Field Effect Transistor (FET)--based biosensor for the label-free detection of biomolecules using the dielectric modulation (DM) technique. The superior subthreshold swing characteristics with the unique band-to-band tunneling (BTBT) of charge carriers, the TFET-based biosensor can accomplish features of Point of Care Testing (PoCT) tools. Researchers proposed various techniques to enhance the performance of TFET-based biosensors in terms of high ON(ION) current sensitivity, which is treated as the performance stumbling block for TFET devices. In this review, a systematic investigation of the low bandgap material engineering technique applied to the TFET-based biosensors is carried out to understand the functionality and work. The heterojunction-based TFET biosensors with SiGe, Ge, and GaAs material are investigated thoroughly. The hetero material-based junction less TFET biosensors are also included in this review to exhibit the advantage of the material engineering approach for JLTFET biosensors. The bandgap engineering technique for the heterojunction TFET biosensor is investigated by considering other performance approaches like structural engineering, Gate work function, and source engineering. The performance of these heterojunction TFET biosensors was studied by taking the parameters like energy bandgap, on current, drain current sensitivity and subthreshold swing of the device. In this work, a detailed roadmap is created to understand how the low bandgap material engineering can be applied to the TFET biosensor to enhance its performance in terms of sensitivity and speed of detection<strong>.</strong></p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141772958","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Impacts of electric gating and divacancies on optical absorption spectra of zigzag buckling silicene nanoribbons 电门控和空位对之字形屈曲硅纳米带光学吸收光谱的影响
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-22 DOI: 10.1016/j.micrna.2024.207937

In this study, by combining the tight-binding description with the gradient approximation, we investigated the impacts of electric gating and divacancies on the optical characteristics of zigzag buckling silicene nanoribbons. Our results show that the back-gate electric potential tends to shift the peak structure to higher frequencies in the free-defective structures, while the side-gate electric potentials intensify the intensity of the excitation channels obeying the selection rule ΔJ=even. In particular, applying the potentials in a suitable range can improve the optical absorption efficiency at a certain frequency with the back gate or widen the threshold absorption intensity from Jv=1 to Jc=1 with the side gates. Besides, the defective structures' absorption spectra exhibit richer features than the perfect one, with the appearance of new optical excitations due to the transitions between the local minimum or maximum in the low-energy bands around the Fermi level. Moreover, applying electric gating in defective structures can also tune the absorption spectra with additional features.

在本研究中,我们结合紧密束缚描述和梯度近似,研究了电门和空位对之字形降伏硅纳米带光学特性的影响。结果表明,在自由缺陷结构中,后栅极电势倾向于将峰值结构移向更高频率,而侧栅极电势则加强了符合选择规则的激发通道强度。特别是,在适当的范围内施加电势,可以提高背栅极在某一频率的光吸收效率,或扩大侧栅极从到的阈值吸收强度。此外,缺陷结构的吸收光谱比完美结构的吸收光谱显示出更丰富的特征,由于费米级附近低能带的局部最小值或最大值之间的跃迁,出现了新的光激发。此外,在有缺陷的结构中应用电门控还能调整吸收光谱,使其具有更多特征。
{"title":"Impacts of electric gating and divacancies on optical absorption spectra of zigzag buckling silicene nanoribbons","authors":"","doi":"10.1016/j.micrna.2024.207937","DOIUrl":"10.1016/j.micrna.2024.207937","url":null,"abstract":"<div><p>In this study, by combining the tight-binding description with the gradient approximation, we investigated the impacts of electric gating and divacancies on the optical characteristics of zigzag buckling silicene nanoribbons. Our results show that the back-gate electric potential tends to shift the peak structure to higher frequencies in the free-defective structures, while the side-gate electric potentials intensify the intensity of the excitation channels obeying the selection rule <span><math><mrow><mo>Δ</mo><mi>J</mi><mo>=</mo><mtext>even</mtext></mrow></math></span>. In particular, applying the potentials in a suitable range can improve the optical absorption efficiency at a certain frequency with the back gate or widen the threshold absorption intensity from <span><math><mrow><msup><mi>J</mi><mi>v</mi></msup><mo>=</mo><mn>1</mn></mrow></math></span> to <span><math><mrow><msup><mi>J</mi><mi>c</mi></msup><mo>=</mo><mn>1</mn></mrow></math></span> with the side gates. Besides, the defective structures' absorption spectra exhibit richer features than the perfect one, with the appearance of new optical excitations due to the transitions between the local minimum or maximum in the low-energy bands around the Fermi level. Moreover, applying electric gating in defective structures can also tune the absorption spectra with additional features.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141772959","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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