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A strategy to predict the current conduction mechanisms into Al/PVP:Gr-BaTiO3/p-Si Schottky structure using Artificial Neural Network 利用人工神经网络预测 Al/PVP:Gr-BaTiO3/p-Si 肖特基结构电流传导机制的策略
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-20 DOI: 10.1016/j.micrna.2024.207957
Yashar Azizian-Kalandaragh , Süleyman Özçelik , Ali Barkhordari , Şemsettin Altındal

In this work, Artificial Neural Network (ANN) algorithm is used to predict the current conduction mechanisms into the metal-semiconductor (MS) and metal-nanocomposite-semiconductor (MPS) structures along with their primary electronic parameters, such as the leak current (I0), potential barrier height (ΦB0), ideality factor (n), series/shunt resistance (Rs/Rsh), rectifying ratio (RR), and interface states density (Nss) by analyzing the I–V characteristics. The polyvinylpyrrolidone (PVP), barium titanate (BaTiO3) and graphene (Gr) nanoparticles are mixed together to create the interfacial nanocomposite layer. Training data for ANN algorithm is gathered using the thermionic emission hypothesis. In order to study the efficacy of the ANN model, the predictive power of the ANN technique for predicting the current conduction mechanisms and electronic properties of SDs has been assessed by comparing the predicted and experimental results. The ANN predictions of the current conduction mechanisms at the forward/reverse bias and the fundamental electronic specifications of the MS and MPS structures are a high level of agreement with the experimental results. Furthermore, the results show that the RR and Rsh rise whereas the n, Rs, and Nss for MS structure decrease when the PVP:Gr-BaTiO3 nanocomposite interlayer is employed.

本研究采用人工神经网络 (ANN) 算法,通过分析 I-V 特性来预测金属-半导体 (MS) 和金属-纳米复合材料-半导体 (MPS) 结构的电流传导机制及其主要电子参数,如泄漏电流 (I0)、势垒高度 (ΦB0)、意整系数 (n)、串联/并联电阻 (Rs/Rsh)、整流比 (RR) 和界面态密度 (Nss)。聚乙烯吡咯烷酮(PVP)、钛酸钡(BaTiO3)和石墨烯(Gr)纳米颗粒混合在一起,形成了界面纳米复合层。利用热释电假说为 ANN 算法收集训练数据。为了研究 ANN 模型的功效,通过比较预测结果和实验结果,评估了 ANN 技术对 SDs 电流传导机制和电子特性的预测能力。ANN 对正向/反向偏压下的电流传导机制以及 MS 和 MPS 结构的基本电子特性的预测与实验结果高度一致。此外,结果表明,当采用 PVP:Gr-BaTiO3 纳米复合材料夹层时,MS 结构的 RR 和 Rsh 上升,而 n、Rs 和 Nss 下降。
{"title":"A strategy to predict the current conduction mechanisms into Al/PVP:Gr-BaTiO3/p-Si Schottky structure using Artificial Neural Network","authors":"Yashar Azizian-Kalandaragh ,&nbsp;Süleyman Özçelik ,&nbsp;Ali Barkhordari ,&nbsp;Şemsettin Altındal","doi":"10.1016/j.micrna.2024.207957","DOIUrl":"10.1016/j.micrna.2024.207957","url":null,"abstract":"<div><p>In this work, Artificial Neural Network (ANN) algorithm is used to predict the current conduction mechanisms into the metal-semiconductor (MS) and metal-nanocomposite-semiconductor (MPS) structures along with their primary electronic parameters, such as the leak current (I<sub>0</sub>), potential barrier height (Φ<sub>B0</sub>), ideality factor (n), series/shunt resistance (R<sub>s</sub>/R<sub>sh</sub>), rectifying ratio (RR), and interface states density (N<sub>ss</sub>) by analyzing the I–V characteristics. The polyvinylpyrrolidone (PVP), barium titanate (BaTiO<sub>3</sub>) and graphene (Gr) nanoparticles are mixed together to create the interfacial nanocomposite layer. Training data for ANN algorithm is gathered using the thermionic emission hypothesis. In order to study the efficacy of the ANN model, the predictive power of the ANN technique for predicting the current conduction mechanisms and electronic properties of SDs has been assessed by comparing the predicted and experimental results. The ANN predictions of the current conduction mechanisms at the forward/reverse bias and the fundamental electronic specifications of the MS and MPS structures are a high level of agreement with the experimental results. Furthermore, the results show that the RR and R<sub>sh</sub> rise whereas the n, R<sub>s</sub>, and N<sub>ss</sub> for MS structure decrease when the PVP:Gr-BaTiO<sub>3</sub> nanocomposite interlayer is employed.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207957"},"PeriodicalIF":2.7,"publicationDate":"2024-08-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142021576","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optical assessment of vertical TFET based on heterojunction of GaSb-Si 基于 GaSb-Si 异质结的垂直 TFET 的光学评估
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-18 DOI: 10.1016/j.micrna.2024.207955
Shreyas Tiwari , Tarun Varma , Rajesh Saha

This paper investigates the electrical and opto-sensing analysis of hetero stack vertical TFETs based on III/V group Gallium antimonide (GaSb)-Si at various wavelengths within the visible spectrum. Initially, the drain current, energy band diagram, and electron density contour plot are extracted in order to study the DC and electrical behavior of the device. Following that, their performance is evaluated by altering the source side thickness and observe the tunneling rate of device. Furthermore, the photo application of the device is noticed by computing the critical optical parameter such as sensitivity (Sn), noise factor, and efficient characteristics. Finally, a comparative table is included to set the benchmark and highlight the importance of hetero stack TFET. The device's maximum reported sensitivity is approximately 25.2 and responsivity (R) is 0.8 A/Watt at 320 nm wavelength. Additionally, we examined the effect of trap charges under light state at the gate-channel, isolator-channel, and source-channel interface respectively.

本文研究了基于 III/V 族锑化镓(GaSb)-硅的异质堆叠垂直 TFET 在可见光谱内各种波长下的电学和光传感分析。首先,提取漏极电流、能带图和电子密度等值线图,以研究器件的直流和电气行为。然后,通过改变源边厚度来评估其性能,并观察器件的隧道率。此外,通过计算灵敏度 (Sn)、噪声系数和高效特性等关键光学参数,还注意到了该器件的光电应用。最后,还列出了一个比较表,以设定基准并强调异质堆栈 TFET 的重要性。据报告,该器件在 320 纳米波长下的最大灵敏度约为 25.2,响应率 (R) 为 0.8 A/Watt 。此外,我们还分别考察了栅-沟道、隔离器-沟道和源-沟道界面在光状态下陷阱电荷的影响。
{"title":"Optical assessment of vertical TFET based on heterojunction of GaSb-Si","authors":"Shreyas Tiwari ,&nbsp;Tarun Varma ,&nbsp;Rajesh Saha","doi":"10.1016/j.micrna.2024.207955","DOIUrl":"10.1016/j.micrna.2024.207955","url":null,"abstract":"<div><p>This paper investigates the electrical and opto-sensing analysis of hetero stack vertical TFETs based on III/V group Gallium antimonide (GaSb)-Si at various wavelengths within the visible spectrum. Initially, the drain current, energy band diagram, and electron density contour plot are extracted in order to study the DC and electrical behavior of the device. Following that, their performance is evaluated by altering the source side thickness and observe the tunneling rate of device. Furthermore, the photo application of the device is noticed by computing the critical optical parameter such as sensitivity (Sn), noise factor, and efficient characteristics. Finally, a comparative table is included to set the benchmark and highlight the importance of hetero stack TFET. The device's maximum reported sensitivity is approximately 25.2 and responsivity (R) is 0.8 A/Watt at 320 nm wavelength. Additionally, we examined the effect of trap charges under light state at the gate-channel, isolator-channel, and source-channel interface respectively.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207955"},"PeriodicalIF":2.7,"publicationDate":"2024-08-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142048744","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Structure and ferroelectric photovoltaic effect modulation in the epitaxial BiFeO3/La0.5Sr0.5CO3 heterostructures 外延 BiFeO3/La0.5Sr0.5CO3 异质结构中的结构和铁电光伏效应调制
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-17 DOI: 10.1016/j.micrna.2024.207956
Chenxi Wang , Yufei Song , Linqian Wu , Chen Xue , Haoxiang Feng , Haitao Li , Jianmin Song , Xiangui Zhang , Bin Zou , Kaiming Zhu

Square-shaped BiFeO3 (BFO) thin films were prepared on SrTiO3 (STO) substrates by off-axis magnetron sputtering using La0.5Sr0.5CoO3 (LSCO) as the bottom electrode, and both LSCO and BFO are perovskite structure. The BFO crystalline quality improves and the grain size becomes larger as the thickness H increases, and both have smaller mean square roughness. The effects of BFO thickness H, light intensity Ip and ambient temperature AT on the ferroelectric photovoltaic effect (FPE) for the Pt/BFO/LSCO heterostructures are significant. With the H increase, the open-circuit voltage Voc and short-circuit current Jsc increase linearly, with Voc up to 0.44 V. The short-circuit current modulation intensity ΔJsc follows the ΔJsc-300>ΔJsc-200>ΔJsc-100 rule. With the Ip increase, Pt/BFO(300 nm)/LSCO’ Jsc increases linearly, and Voc first increases and then tends to saturation, which satisfies Glass' law. With the AT increases, Voc is linearly decreasing and Jsc shows the law: decreasing→increasing→decreasing. The polarization-modulated FPE mechanism is investigated by analyzing the Pt/BFO/LSCO energy band structure, which is attributed to the coupling effect between the BFO depolarization field (Edp) and the built-in electric field at the interface (EPt/BFO & EBFO/LSCO), and the FPE mechanism is shifted from the interface barrier domination to the ferroelectric polarization domination as H increases.

以 La0.5Sr0.5CoO3(LSCO)为底电极,通过离轴磁控溅射法在 SrTiO3(STO)衬底上制备了方形 BiFeO3(BFO)薄膜,LSCO 和 BFO 均为包晶结构。随着厚度 H 的增加,BFO 的结晶质量提高,晶粒尺寸变大,且二者的均方粗糙度都较小。BFO 厚度 H、光照强度 Ip 和环境温度 AT 对 Pt/BFO/LSCO 异质结构的铁电光伏效应(FPE)有显著影响。随着 H 的增加,开路电压 Voc 和短路电流 Jsc 呈线性增加,其中 Voc 最高可达 0.44 V;短路电流调制强度 ΔJsc 遵循 ΔJsc-300>ΔJsc-200>ΔJsc-100 规律。随着 Ip 的增加,Pt/BFO(300 nm)/LSCO' Jsc 线性增加,Voc 先增加后趋于饱和,符合格拉斯定律。随着 AT 的增加,Voc 呈线性下降,Jsc 呈下降→增加→减少的规律。通过分析 Pt/BFO/LSCO 能带结构,研究了极化调制 FPE 机制,该机制归因于 BFO 去极化场(Edp)与界面内置电场(EPt/BFO & EBFO/LSCO)之间的耦合效应,随着 H 的增加,FPE 机制从界面势垒主导转向铁电极化主导。
{"title":"Structure and ferroelectric photovoltaic effect modulation in the epitaxial BiFeO3/La0.5Sr0.5CO3 heterostructures","authors":"Chenxi Wang ,&nbsp;Yufei Song ,&nbsp;Linqian Wu ,&nbsp;Chen Xue ,&nbsp;Haoxiang Feng ,&nbsp;Haitao Li ,&nbsp;Jianmin Song ,&nbsp;Xiangui Zhang ,&nbsp;Bin Zou ,&nbsp;Kaiming Zhu","doi":"10.1016/j.micrna.2024.207956","DOIUrl":"10.1016/j.micrna.2024.207956","url":null,"abstract":"<div><p>Square-shaped BiFeO<sub>3</sub> (BFO) thin films were prepared on SrTiO<sub>3</sub> (STO) substrates by off-axis magnetron sputtering using La<sub>0.5</sub>Sr<sub>0.5</sub>CoO<sub>3</sub> (LSCO) as the bottom electrode, and both LSCO and BFO are perovskite structure. The BFO crystalline quality improves and the grain size becomes larger as the thickness H increases, and both have smaller mean square roughness. The effects of BFO thickness H, light intensity I<sub>p</sub> and ambient temperature AT on the ferroelectric photovoltaic effect (FPE) for the Pt/BFO/LSCO heterostructures are significant. With the H increase, the open-circuit voltage V<sub>oc</sub> and short-circuit current J<sub>sc</sub> increase linearly, with V<sub>oc</sub> up to 0.44 V. The short-circuit current modulation intensity ΔJ<sub>sc</sub> follows the ΔJ<sub>sc-300</sub>&gt;ΔJ<sub>sc-200</sub>&gt;ΔJ<sub>sc-100</sub> rule. With the I<sub>p</sub> increase, Pt/BFO(300 nm)/LSCO’ J<sub>sc</sub> increases linearly, and V<sub>oc</sub> first increases and then tends to saturation, which satisfies Glass' law. With the AT increases, V<sub>oc</sub> is linearly decreasing and J<sub>sc</sub> shows the law: decreasing→increasing→decreasing. The polarization-modulated FPE mechanism is investigated by analyzing the Pt/BFO/LSCO energy band structure, which is attributed to the coupling effect between the BFO depolarization field (E<sub>dp</sub>) and the built-in electric field at the interface (E<sub>Pt/BFO</sub> &amp; E<sub>BFO/LSCO</sub>), and the FPE mechanism is shifted from the interface barrier domination to the ferroelectric polarization domination as H increases.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207956"},"PeriodicalIF":2.7,"publicationDate":"2024-08-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142011418","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Graphene-based MEMS devices for gas sensing applications: A review 用于气体传感应用的石墨烯基 MEMS 器件:综述
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-15 DOI: 10.1016/j.micrna.2024.207954
Tirad Owais , Mahmoud Khater , Hussain Al-Qahtani

Microelectromechanical systems (MEMS) that utilize graphene-based materials have gained significant attention for gas-sensing applications owing to their unique properties. Graphene is a two-dimensional sheet of carbon atoms arranged in a hexagonal lattice that exhibits exceptional mechanical strength, high electrical conductivity, and large surface area. These properties make graphene an ideal candidate for gas sensing applications. In this study, we examined the fundamental characteristics of graphene, with emphasis on its practical use in sensors. We explored the latest techniques for synthesizing graphene, highlighting the importance of continual advancements in these manufacturing processes which are crucial for bringing graphene-based products to the market. We present various examples of how graphene is employed in MEMS for mass/gas sensing applications and discuss the advantages and challenges associated with devices using these materials. For successful incorporation of these materials into MEMS systems, it is essential to establish effective designs and integration processes that yield high results. Additionally, this analysis delves into the latest developments in graphene-based solid-state and movable MEMS devices, highlighting their promising gas-sensing applications.

利用石墨烯基材料的微机电系统(MEMS)因其独特的性能而在气体传感应用领域备受关注。石墨烯是由碳原子组成的二维薄片,呈六边形晶格排列,具有超强的机械强度、高导电性和大表面积。这些特性使石墨烯成为气体传感应用的理想候选材料。在本研究中,我们研究了石墨烯的基本特性,重点是其在传感器中的实际应用。我们探讨了合成石墨烯的最新技术,强调了这些制造工艺不断进步的重要性,这对于将基于石墨烯的产品推向市场至关重要。我们介绍了在质量/气体传感应用的微机电系统中如何使用石墨烯的各种实例,并讨论了与使用这些材料的设备相关的优势和挑战。要想成功地将这些材料应用到 MEMS 系统中,就必须建立有效的设计和集成流程,以获得更高的成果。此外,本分析还深入探讨了基于石墨烯的固态和可移动 MEMS 器件的最新发展,重点介绍了这些器件在气体传感方面的应用前景。
{"title":"Graphene-based MEMS devices for gas sensing applications: A review","authors":"Tirad Owais ,&nbsp;Mahmoud Khater ,&nbsp;Hussain Al-Qahtani","doi":"10.1016/j.micrna.2024.207954","DOIUrl":"10.1016/j.micrna.2024.207954","url":null,"abstract":"<div><p>Microelectromechanical systems (MEMS) that utilize graphene-based materials have gained significant attention for gas-sensing applications owing to their unique properties. Graphene is a two-dimensional sheet of carbon atoms arranged in a hexagonal lattice that exhibits exceptional mechanical strength, high electrical conductivity, and large surface area. These properties make graphene an ideal candidate for gas sensing applications. In this study, we examined the fundamental characteristics of graphene, with emphasis on its practical use in sensors. We explored the latest techniques for synthesizing graphene, highlighting the importance of continual advancements in these manufacturing processes which are crucial for bringing graphene-based products to the market. We present various examples of how graphene is employed in MEMS for mass/gas sensing applications and discuss the advantages and challenges associated with devices using these materials. For successful incorporation of these materials into MEMS systems, it is essential to establish effective designs and integration processes that yield high results. Additionally, this analysis delves into the latest developments in graphene-based solid-state and movable MEMS devices, highlighting their promising gas-sensing applications.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207954"},"PeriodicalIF":2.7,"publicationDate":"2024-08-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142011419","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Steep subthreshold swing Double - Gate tunnel FET using source pocket engineering: Design guidelines 利用源极袋工程设计陡峭的亚阈值摆动双 - 栅极隧道场效应晶体管:设计指南
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-13 DOI: 10.1016/j.micrna.2024.207951
Nisha Yadav , Sunil Jadav , Gaurav Saini

In this work, we propose a promising source engineered Double - Gate (DG) Tunnel Field Effect Transistor (TFET) device capable of providing remarkably low value of Subthreshold Swing (SS) with sufficiently high drive current. Using Sentaurus TCAD simulations, we demonstrate that counter-doped horizontal pockets (doping of pocket is kept opposite to that of source) when placed in the source region introduces a built-in band bending at the source-pocket junction. This lowers the minima of Conduction Band (CB) in pocket region thereby reducing the barrier width as the pocket CB moves closer to source Valence Band (VB). As a result, stronger electric field is observed thereby reducing the threshold voltage (onset of band-to-band tunneling (BTBT)) and subsequent reduction in subthreshold swing. To boost the ON-current and suppress ambipolarity, high-k dielectric material along with low work-function gate material is introduced at source side and low-k gate dielectric along with high work-function gate material is introduced at drain side. Compared to point tunneling in conventional TFETs, the gate overlapped pockets in the proposed structure result in an increase in cross-section area available for BTBT thereby leading to line tunneling of carriers from the source to the pocket, resulting in higher ON-current. In this work, we discuss the role of source engineering in boosting the performance of Hetero-Dielectric (HD) Dual-Metal-Double-Gate (DMDG) TFET. We provide design guidelines to achieve steeper subthreshold swing while considering pocket doping and pocket thickness as the key parameters. A comparative study of conventional DG-TFET and HD-DG-TFET with the proposed Gate-over-Pockets (GoP) HD-DMDG-TFET structure is done. When compared to the conventional DG-TFET with same geometrical parameters, the proposed structure provides 33× steeper SS, more than two order improved ON-current, two order lower ambipolar current and 133 folds better Ion/Ioff thus becomes the perfect choice for low power applications.

在这项研究中,我们提出了一种前景看好的源极工程双栅极(DG)隧道场效应晶体管(TFET)器件,该器件能够以足够高的驱动电流提供极低值的亚阈值波动(SS)。利用 Sentaurus TCAD 仿真,我们证明了反掺杂水平口袋(口袋的掺杂与源极相反)放置在源极区域时,会在源极-口袋交界处引入内置带弯曲。这就降低了口袋区域的导带(CB)最小值,从而在口袋 CB 靠近源价带(VB)时减小了势垒宽度。因此,可以观察到更强的电场,从而降低阈值电压(带对带隧穿(BTBT)的开始),并随之降低阈下摆幅。为了提高导通电流并抑制伏极性,在源极一侧引入了高介电材料和低功耗栅极材料,在漏极一侧引入了低介电材料和高功耗栅极材料。与传统 TFET 中的点隧穿相比,拟议结构中的栅极重叠口袋增加了可用于 BTBT 的横截面积,从而导致载流子从源极到口袋的线隧穿,从而产生更高的导通电流。在这项工作中,我们讨论了源极工程在提高异质介质(HD)双金属双栅极(DMDG)TFET 性能中的作用。我们提供了实现更陡峭阈下摆动的设计指南,同时考虑了作为关键参数的口袋掺杂和口袋厚度。我们对传统的 DG-TFET 和 HD-DG-TFET 与所提出的栅极过袋 (GoP) HD-DMDG-TFET 结构进行了比较研究。与具有相同几何参数的传统 DG-TFET 相比,所提出的结构提供了 ∼33 倍的陡峭 SS、提高了两个数量级以上的导通电流、降低了两个数量级的安培极电流以及 133 倍的离子/关断性能,因此成为低功耗应用的最佳选择。
{"title":"Steep subthreshold swing Double - Gate tunnel FET using source pocket engineering: Design guidelines","authors":"Nisha Yadav ,&nbsp;Sunil Jadav ,&nbsp;Gaurav Saini","doi":"10.1016/j.micrna.2024.207951","DOIUrl":"10.1016/j.micrna.2024.207951","url":null,"abstract":"<div><p>In this work, we propose a promising source engineered Double - Gate (DG) Tunnel Field Effect Transistor (TFET) device capable of providing remarkably low value of Subthreshold Swing (SS) with sufficiently high drive current. Using Sentaurus TCAD simulations, we demonstrate that counter-doped horizontal pockets (doping of pocket is kept opposite to that of source) when placed in the source region introduces a built-in band bending at the source-pocket junction. This lowers the minima of Conduction Band (CB) in pocket region thereby reducing the barrier width as the pocket CB moves closer to source Valence Band (VB). As a result, stronger electric field is observed thereby reducing the threshold voltage (onset of band-to-band tunneling (BTBT)) and subsequent reduction in subthreshold swing. To boost the ON-current and suppress ambipolarity, high-<em>k</em> dielectric material along with low work-function gate material is introduced at source side and low-<em>k</em> gate dielectric along with high work-function gate material is introduced at drain side. Compared to point tunneling in conventional TFETs, the gate overlapped pockets in the proposed structure result in an increase in cross-section area available for BTBT thereby leading to line tunneling of carriers from the source to the pocket, resulting in higher ON-current. In this work, we discuss the role of source engineering in boosting the performance of Hetero-Dielectric (HD) Dual-Metal-Double-Gate (DMDG) TFET. We provide design guidelines to achieve steeper subthreshold swing while considering pocket doping and pocket thickness as the key parameters. A comparative study of conventional DG-TFET and HD-DG-TFET with the proposed Gate-over-Pockets (GoP) HD-DMDG-TFET structure is done. When compared to the conventional DG-TFET with same geometrical parameters, the proposed structure provides <span><math><mo>∼</mo><mn>33</mn><mo>×</mo></math></span> steeper SS, more than two order improved ON-current, two order lower ambipolar current and 133 folds better <em>I</em><sub><em>on</em></sub>/<em>I</em><sub><em>off</em></sub> thus becomes the perfect choice for low power applications.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207951"},"PeriodicalIF":2.7,"publicationDate":"2024-08-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141985627","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
SiC/PtSe2 van der Waals heterostructure: A high-efficiency direct Z-scheme photocatalyst for overall water splitting predicted from first-principles study SiC/PtSe2范德华异质结构:第一原理研究预测的用于整体水分离的高效直接 Z 型光催化剂
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-12 DOI: 10.1016/j.micrna.2024.207953
Jia-Hui Li, Yan Zhang, Shu-Zhuan Sun, Yong-Sen Yang, Yu-Fei Luo, Li Duan

The discovery of effective photocatalytic substances is crucial in reducing energy shortages and ecological contamination. This research involves creating SiC/PtSe2 van der Waals heterostructure with both SiC and PtSe2 monolayers, employing first-principles calculations for comprehensive theoretical analysis of their structural stability, electronic characteristics, optical features, Bader charge, and solar-to-hydrogen (STH) efficiency. Findings indicate that the SiC/PtSe2 heterostructure is a semiconductor with an indirect bandgap of 1.52 eV and a direct Z-scheme charge transfer path, facilitating more efficient segregation of photogenerated electron-hole pairs. The Bader charge indicates that the SiC layer accumulates positive charges and the PtSe2 layer accumulates negative charges, constituting a built-in electric field pointing from the SiC side to the PtSe2 side at the interface region, which can impede the complexation of the photogenerated electron-hole pairs. Furthermore, the SiC/PtSe2 heterostructure exhibits excellent optical absorption properties across both the ultraviolet and visible spectra, coupled with an exceptionally high STH efficiency of 34.7 %, significantly enhancing solar energy utilization. Ultimately, the Gibbs free energy calculations reveal the significant catalytic efficiency of the SiC/PtSe2 heterostructure for redox reactions. Based on these results, the SiC/PtSe2 heterostructure is a direct Z-scheme photocatalyst for overall water splitting.

发现有效的光催化物质对于减少能源短缺和生态污染至关重要。这项研究包括创建具有 SiC 和 PtSe2 单层的 SiC/PtSe2 范德华异质结构,并利用第一性原理计算对其结构稳定性、电子特性、光学特征、Bader 电荷和太阳能制氢(STH)效率进行全面的理论分析。研究结果表明,SiC/PtSe2 异质结构是一种具有 1.52 eV 间接带隙和直接 Z 型电荷转移路径的半导体,有利于光生电子-空穴对更有效地分离。Bader 电荷表明,SiC 层积累了正电荷,而 PtSe2 层积累了负电荷,在界面区构成了一个从 SiC 侧指向 PtSe2 侧的内置电场,这会阻碍光生电子-空穴对的复合。此外,SiC/PtSe2 异质结构在紫外和可见光谱范围内均表现出优异的光吸收特性,同时具有 34.7% 的超高 STH 效率,大大提高了太阳能的利用率。吉布斯自由能计算最终揭示了 SiC/PtSe2 异质结构在氧化还原反应中的显著催化效率。基于这些结果,SiC/PtSe2 异质结构是一种直接用于整体水分离的 Z 型光催化剂。
{"title":"SiC/PtSe2 van der Waals heterostructure: A high-efficiency direct Z-scheme photocatalyst for overall water splitting predicted from first-principles study","authors":"Jia-Hui Li,&nbsp;Yan Zhang,&nbsp;Shu-Zhuan Sun,&nbsp;Yong-Sen Yang,&nbsp;Yu-Fei Luo,&nbsp;Li Duan","doi":"10.1016/j.micrna.2024.207953","DOIUrl":"10.1016/j.micrna.2024.207953","url":null,"abstract":"<div><p>The discovery of effective photocatalytic substances is crucial in reducing energy shortages and ecological contamination. This research involves creating SiC/PtSe<sub>2</sub> van der Waals heterostructure with both SiC and PtSe<sub>2</sub> monolayers, employing first-principles calculations for comprehensive theoretical analysis of their structural stability, electronic characteristics, optical features, Bader charge, and solar-to-hydrogen (STH) efficiency. Findings indicate that the SiC/PtSe<sub>2</sub> heterostructure is a semiconductor with an indirect bandgap of 1.52 eV and a direct Z-scheme charge transfer path, facilitating more efficient segregation of photogenerated electron-hole pairs. The Bader charge indicates that the SiC layer accumulates positive charges and the PtSe<sub>2</sub> layer accumulates negative charges, constituting a built-in electric field pointing from the SiC side to the PtSe<sub>2</sub> side at the interface region, which can impede the complexation of the photogenerated electron-hole pairs. Furthermore, the SiC/PtSe<sub>2</sub> heterostructure exhibits excellent optical absorption properties across both the ultraviolet and visible spectra, coupled with an exceptionally high STH efficiency of 34.7 %, significantly enhancing solar energy utilization. Ultimately, the Gibbs free energy calculations reveal the significant catalytic efficiency of the SiC/PtSe<sub>2</sub> heterostructure for redox reactions. Based on these results, the SiC/PtSe<sub>2</sub> heterostructure is a direct Z-scheme photocatalyst for overall water splitting.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207953"},"PeriodicalIF":2.7,"publicationDate":"2024-08-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142040489","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Application of (MoTe2)xSb1-x thin films with high speed and high stability in phase-change memory 具有高速度和高稳定性的 (MoTe2)xSb1-x 薄膜在相变存储器中的应用
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-08 DOI: 10.1016/j.micrna.2024.207952
Jinyang Huang , Yifeng Hu , Xiaoqin Zhu

Nanoscale phase change films of (MoTe2)xSb1-x were prepared using magnetron sputtering technique. The investigation focused on the influence of the presence of MoTe2 on the phase change characteristics of Sb materials as well as the electrical properties of devices. (MoTe2)xSb1-x phase change films showed good thermal stability, especially for (MoTe2)0.08Sb0.92 films. (MoTe2)xSb1-x films had higher phase change temperature (∼185 °C), larger crystallization activation energy (∼4.0 eV), smaller resistance drift index (∼0.03582), and wider band gap (0.629 eV) than pure Sb films, indicating better thermal stability. According to X-Ray Diffraction and Atomic Force Microscope, it could be found that doping MoTe2 in Sb could inhibit the grain growth and make the surface of Sb film flatter. According to the outcomes stemming from X-ray photoelectron spectroscopy, some bonds involving Mo–Te and Sb–Sb underwent breakage and actively contributed to the formation process of other chemical bonds at the interface. The formation of small Sb2Te3 and Sb grains in the as-deposited state played a role in inducing crystallization and accelerating phase transition. The band gap in (MoTe2)xSb1-x films augmented with the increase of MoTe2 content. The power consumption of the (MoTe2)0.08Sb0.92-based phase-change memory device was considerably reduced compared to GST film and could achieve ultra-fast resistance transition within 10 ns. The results showed that (MoTe2)xSb1-x phase change films have the advantages of high stability, low power consumption, and rapid speed, which is a potential choice for phase change memory.

利用磁控溅射技术制备了 (MoTe2)xSb1-x 的纳米级相变薄膜。研究重点是 MoTe2 的存在对锑材料相变特性以及器件电性能的影响。(MoTe2)xSb1-x相变薄膜表现出良好的热稳定性,尤其是(MoTe2)0.08Sb0.92薄膜。(与纯 Sb 薄膜相比,(MoTe2)xSb1-x 薄膜具有更高的相变温度(∼185 °C)、更大的结晶活化能(∼4.0 eV)、更小的电阻漂移指数(∼0.03582)和更宽的带隙(0.629 eV),表明其具有更好的热稳定性。根据 X 射线衍射和原子力显微镜研究发现,在锑中掺杂 MoTe2 可抑制晶粒生长,使锑薄膜表面更平整。根据 X 射线光电子能谱的结果,一些涉及 Mo-Te 和 Sb-Sb 的键发生了断裂,并积极促进了界面上其他化学键的形成过程。在沉积状态下形成的小 Sb2Te3 和 Sb 晶粒在诱导结晶和加速相变方面发挥了作用。随着 MoTe2 含量的增加,(MoTe2)xSb1-x 薄膜的带隙也随之增大。与 GST 薄膜相比,(MoTe2)0.08Sb0.92 相变存储器件的功耗大大降低,并能在 10 ns 内实现超快电阻转换。结果表明,(MoTe2)xSb1-x 相变薄膜具有稳定性高、功耗低、速度快等优点,是相变存储器的潜在选择。
{"title":"Application of (MoTe2)xSb1-x thin films with high speed and high stability in phase-change memory","authors":"Jinyang Huang ,&nbsp;Yifeng Hu ,&nbsp;Xiaoqin Zhu","doi":"10.1016/j.micrna.2024.207952","DOIUrl":"10.1016/j.micrna.2024.207952","url":null,"abstract":"<div><p>Nanoscale phase change films of (MoTe<sub>2</sub>)<sub>x</sub>Sb<sub>1-x</sub> were prepared using magnetron sputtering technique. The investigation focused on the influence of the presence of MoTe<sub>2</sub> on the phase change characteristics of Sb materials as well as the electrical properties of devices. (MoTe<sub>2</sub>)<sub>x</sub>Sb<sub>1-x</sub> phase change films showed good thermal stability, especially for (MoTe<sub>2</sub>)<sub>0.08</sub>Sb<sub>0.92</sub> films. (MoTe<sub>2</sub>)<sub>x</sub>Sb<sub>1-x</sub> films had higher phase change temperature (∼185 °C), larger crystallization activation energy (∼4.0 eV), smaller resistance drift index (∼0.03582), and wider band gap (0.629 eV) than pure Sb films, indicating better thermal stability. According to X-Ray Diffraction and Atomic Force Microscope, it could be found that doping MoTe<sub>2</sub> in Sb could inhibit the grain growth and make the surface of Sb film flatter. According to the outcomes stemming from X-ray photoelectron spectroscopy, some bonds involving Mo–Te and Sb–Sb underwent breakage and actively contributed to the formation process of other chemical bonds at the interface. The formation of small Sb<sub>2</sub>Te<sub>3</sub> and Sb grains in the as-deposited state played a role in inducing crystallization and accelerating phase transition. The band gap in (MoTe<sub>2</sub>)<sub>x</sub>Sb<sub>1-x</sub> films augmented with the increase of MoTe<sub>2</sub> content. The power consumption of the (MoTe<sub>2</sub>)<sub>0.08</sub>Sb<sub>0.92</sub>-based phase-change memory device was considerably reduced compared to GST film and could achieve ultra-fast resistance transition within 10 ns. The results showed that (MoTe<sub>2</sub>)<sub>x</sub>Sb<sub>1-x</sub> phase change films have the advantages of high stability, low power consumption, and rapid speed, which is a potential choice for phase change memory.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207952"},"PeriodicalIF":2.7,"publicationDate":"2024-08-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141978562","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Simulation-based optimization of barrier and spacer layers in InAlN/GaN HEMTs for improved 2DEG density 基于仿真优化 InAlN/GaN HEMT 中的阻挡层和间隔层以提高 2DEG 密度
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-08 DOI: 10.1016/j.micrna.2024.207950
Abdelmalek Douara , Abdelaziz Rabehi , Mawloud Guermoui , Rania Daha , Imad Eddine Tibermacine

In this study, we utilize Nextnano device simulation software to systematically investigate the dependence of 2-DEG (two-dimensional electron gas) density on the barrier and spacer Layers in InAlN/GaN high electron mobility transistors (HEMTs). By simulating a range of barrier thicknesses, In mole fractions, and spacer layer thicknesses, we reveal the intricate ways in which these parameters influence device performance. Our simulations demonstrate that precise control of the InAlN barrier thickness and In mole fraction, along with the AlN spacer thickness, is crucial for optimizing 2DEG density and, consequently, the overall electrical properties of the HEMTs. Notably, our results highlight that an InAlN barrier thickness below 12 nm, coupled with an optimized In mole fraction and a finely tuned AlN spacer thickness close to 1 nm, significantly enhances 2DEG density without compromising mobility. These insights provide a detailed understanding of the material and structural dependencies critical for the design and development of high-performance InAlN/GaN HEMTs. Our study includes detailed calculations of the device's I–V characteristics. Notably, the highest peak output current is observed at a 1 nm AlN spacer thickness, reaching 0.91 A/mm. Our findings highlight a noteworthy agreement between the results derived from our computational simulations and experimental measurements.

在这项研究中,我们利用 Nextnano 器件仿真软件系统地研究了 2-DEG(二维电子气体)密度对 InAlN/GaN 高电子迁移率晶体管 (HEMT) 中的势垒层和间隔层的依赖性。通过模拟一系列的势垒厚度、铟摩尔分数和间隔层厚度,我们揭示了这些参数影响器件性能的复杂方式。我们的模拟结果表明,精确控制 InAlN 势垒厚度和 In 摩尔分数以及 AlN 间隔层厚度,对于优化 2DEG 密度以及 HEMT 的整体电气性能至关重要。值得注意的是,我们的研究结果表明,低于 12 nm 的 InAlN 势垒厚度,加上优化的 In 摩尔分数和接近 1 nm 的 AlN 间隔层厚度,可以在不影响迁移率的情况下显著提高 2DEG 密度。这些见解为设计和开发高性能 InAlN/GaN HEMT 提供了对材料和结构相关性的详细了解。我们的研究包括器件 I-V 特性的详细计算。值得注意的是,在 1 nm AlN 间隔层厚度时,输出电流峰值最高,达到 0.91 A/mm。我们的研究结果凸显了计算模拟和实验测量结果之间值得注意的一致性。
{"title":"Simulation-based optimization of barrier and spacer layers in InAlN/GaN HEMTs for improved 2DEG density","authors":"Abdelmalek Douara ,&nbsp;Abdelaziz Rabehi ,&nbsp;Mawloud Guermoui ,&nbsp;Rania Daha ,&nbsp;Imad Eddine Tibermacine","doi":"10.1016/j.micrna.2024.207950","DOIUrl":"10.1016/j.micrna.2024.207950","url":null,"abstract":"<div><p>In this study, we utilize Nextnano device simulation software to systematically investigate the dependence of 2-DEG (two-dimensional electron gas) density on the barrier and spacer Layers in InAlN/GaN high electron mobility transistors (HEMTs). By simulating a range of barrier thicknesses, In mole fractions, and spacer layer thicknesses, we reveal the intricate ways in which these parameters influence device performance. Our simulations demonstrate that precise control of the InAlN barrier thickness and In mole fraction, along with the AlN spacer thickness, is crucial for optimizing 2DEG density and, consequently, the overall electrical properties of the HEMTs. Notably, our results highlight that an InAlN barrier thickness below 12 nm, coupled with an optimized In mole fraction and a finely tuned AlN spacer thickness close to 1 nm, significantly enhances 2DEG density without compromising mobility. These insights provide a detailed understanding of the material and structural dependencies critical for the design and development of high-performance InAlN/GaN HEMTs. Our study includes detailed calculations of the device's I–V characteristics. Notably, the highest peak output current is observed at a 1 nm AlN spacer thickness, reaching 0.91 A/mm. Our findings highlight a noteworthy agreement between the results derived from our computational simulations and experimental measurements.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207950"},"PeriodicalIF":2.7,"publicationDate":"2024-08-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141935151","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Tunable plasmon-induced transparency and its slow light performance based on terahertz metamaterials 基于太赫兹超材料的可调谐等离子体诱导透明度及其慢光性能
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-06 DOI: 10.1016/j.micrna.2024.207949
Yuee Wang , Xuefeng Zou , Huiwen Luo , Huo Zhang , Zhi Li , Fangrong Hu , Zhijin Qiu

A double hexagonal single ‘S’ metamaterial (DHSSM), exhibiting plasmon-induced transparency (PIT) in its spectral response is studied in this paper. Amplitude modulation of the PIT window is achieved by varying the azimuth angle of substructure ‘S’. Theoretical investigations into the PIT effect are conducted through numerical simulations. Moreover, an equivalent coupling circuit and Lorentz model are constructed to elucidate the PIT modulation mechanism. The results reveal that the PIT physical mechanism of the DHSSM has originated in destructive interference between bright-bright modes, which is directly excited by terahertz waves on the double hexagonal split rings and the ‘S’ substructure. For slow optical propagation performance, the structure has a high group delay (up to 41.92 ps) while allowing for the adjustment of the transparency window amplitude. The proposed metamaterial holds promising prospects for applications in slow light devices, switches, and filters within the terahertz frequency range.

本文研究了一种双六边形单 "S "超材料(DHSSM),它的光谱响应表现出等离子体诱导透明(PIT)。通过改变子结构 "S "的方位角,实现了 PIT 窗口的振幅调制。通过数值模拟对 PIT 效应进行了理论研究。此外,还构建了等效耦合电路和洛伦兹模型,以阐明 PIT 调制机制。研究结果表明,DHSSM 的 PIT 物理机制源于亮-亮模式之间的破坏性干涉,这种干涉由太赫兹波直接激发双六边形分裂环和 "S "子结构。为了实现慢速光传播性能,该结构具有较高的群延迟(高达 41.92 ps),同时允许调节透明窗口振幅。这种超材料有望应用于太赫兹频率范围内的慢光器件、开关和滤波器。
{"title":"Tunable plasmon-induced transparency and its slow light performance based on terahertz metamaterials","authors":"Yuee Wang ,&nbsp;Xuefeng Zou ,&nbsp;Huiwen Luo ,&nbsp;Huo Zhang ,&nbsp;Zhi Li ,&nbsp;Fangrong Hu ,&nbsp;Zhijin Qiu","doi":"10.1016/j.micrna.2024.207949","DOIUrl":"10.1016/j.micrna.2024.207949","url":null,"abstract":"<div><p>A double hexagonal single ‘S’ metamaterial (DHSSM), exhibiting plasmon-induced transparency (PIT) in its spectral response is studied in this paper. Amplitude modulation of the PIT window is achieved by varying the azimuth angle of substructure ‘S’. Theoretical investigations into the PIT effect are conducted through numerical simulations. Moreover, an equivalent coupling circuit and Lorentz model are constructed to elucidate the PIT modulation mechanism. The results reveal that the PIT physical mechanism of the DHSSM has originated in destructive interference between bright-bright modes, which is directly excited by terahertz waves on the double hexagonal split rings and the ‘S’ substructure. For slow optical propagation performance, the structure has a high group delay (up to 41.92 ps) while allowing for the adjustment of the transparency window amplitude. The proposed metamaterial holds promising prospects for applications in slow light devices, switches, and filters within the terahertz frequency range.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207949"},"PeriodicalIF":2.7,"publicationDate":"2024-08-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141935178","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optical absorption properties in multi-layer InGaN/GaN core-shell quantum dots: The influences of ternary mixed crystal effect and hydrogen-like impurity 多层 InGaN/GaN 核壳量子点的光吸收特性:三元混晶效应和类氢杂质的影响
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-03 DOI: 10.1016/j.micrna.2024.207948
H. Xie , X.J. Zhou , Y. Xing

Based on the effective mass approximation and the compact density matrix theory, the electronic states and optical absorption properties of intersubband transitions between the conduction-band energy levels in zinc blende InGaN/GaN/InGaN/GaN core-shell quantum dots (CSQDs) are investigated by using the finite difference method. The effects of hydrogen-like impurity and In component on the wave functions, transition energies, and optical absorption properties are discussed in detail. The results show that hydrogen-like impurity can cause the peak positions of optical absorption coefficients (OACs) and refractive index changes (RICs) to move to high energy area, and the peak values of OACs rise. Increasing In component of InGaN crystal in the core region of a CSQD has the same effect. But an opposite tendency will be found when increasing In component in the shell-well of a CSQD, i.e. optical absorption peaks move to low energy area and their values decrease. Comparing to the shell-well, the core region has more powerful confinement effect on electrons. So the better absorption properties are more likely to be obtained for this type of multi-layer InGaN/GaN CSQDs when In component in the core is larger than that in the shell-well.

基于有效质量近似和紧凑密度矩阵理论,利用有限差分法研究了锌掺杂InGaN/GaN/InGaN/GaN核壳量子点(CSQDs)中导带能级之间的带间跃迁的电子态和光吸收性。详细讨论了类氢杂质和 In 成分对波函数、跃迁能和光吸收特性的影响。结果表明,类氢杂质会导致光吸收系数(OAC)和折射率变化(RIC)的峰值位置向高能区移动,OAC 的峰值升高。在 CSQD 的核心区域增加 InGaN 晶体的 In 分量也会产生同样的效果。但在 CSQD 的壳阱中增加 In 分量时,则会出现相反的趋势,即光吸收峰会移动到低能区,其值也会降低。与壳阱相比,核区对电子的束缚作用更强。因此,当核中的 In 分量大于壳阱中的 In 分量时,这种多层 InGaN/GaN CSQD 更有可能获得更好的吸收特性。
{"title":"Optical absorption properties in multi-layer InGaN/GaN core-shell quantum dots: The influences of ternary mixed crystal effect and hydrogen-like impurity","authors":"H. Xie ,&nbsp;X.J. Zhou ,&nbsp;Y. Xing","doi":"10.1016/j.micrna.2024.207948","DOIUrl":"10.1016/j.micrna.2024.207948","url":null,"abstract":"<div><p>Based on the effective mass approximation and the compact density matrix theory, the electronic states and optical absorption properties of intersubband transitions between the conduction-band energy levels in zinc blende InGaN/GaN/InGaN/GaN core-shell quantum dots (CSQDs) are investigated by using the finite difference method. The effects of hydrogen-like impurity and In component on the wave functions, transition energies, and optical absorption properties are discussed in detail. The results show that hydrogen-like impurity can cause the peak positions of optical absorption coefficients (OACs) and refractive index changes (RICs) to move to high energy area, and the peak values of OACs rise. Increasing In component of InGaN crystal in the core region of a CSQD has the same effect. But an opposite tendency will be found when increasing In component in the shell-well of a CSQD, i.e. optical absorption peaks move to low energy area and their values decrease. Comparing to the shell-well, the core region has more powerful confinement effect on electrons. So the better absorption properties are more likely to be obtained for this type of multi-layer InGaN/GaN CSQDs when In component in the core is larger than that in the shell-well.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207948"},"PeriodicalIF":2.7,"publicationDate":"2024-08-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141985628","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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Micro and Nanostructures
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