Pub Date : 2024-08-20DOI: 10.1016/j.micrna.2024.207957
Yashar Azizian-Kalandaragh , Süleyman Özçelik , Ali Barkhordari , Şemsettin Altındal
In this work, Artificial Neural Network (ANN) algorithm is used to predict the current conduction mechanisms into the metal-semiconductor (MS) and metal-nanocomposite-semiconductor (MPS) structures along with their primary electronic parameters, such as the leak current (I0), potential barrier height (ΦB0), ideality factor (n), series/shunt resistance (Rs/Rsh), rectifying ratio (RR), and interface states density (Nss) by analyzing the I–V characteristics. The polyvinylpyrrolidone (PVP), barium titanate (BaTiO3) and graphene (Gr) nanoparticles are mixed together to create the interfacial nanocomposite layer. Training data for ANN algorithm is gathered using the thermionic emission hypothesis. In order to study the efficacy of the ANN model, the predictive power of the ANN technique for predicting the current conduction mechanisms and electronic properties of SDs has been assessed by comparing the predicted and experimental results. The ANN predictions of the current conduction mechanisms at the forward/reverse bias and the fundamental electronic specifications of the MS and MPS structures are a high level of agreement with the experimental results. Furthermore, the results show that the RR and Rsh rise whereas the n, Rs, and Nss for MS structure decrease when the PVP:Gr-BaTiO3 nanocomposite interlayer is employed.
本研究采用人工神经网络 (ANN) 算法,通过分析 I-V 特性来预测金属-半导体 (MS) 和金属-纳米复合材料-半导体 (MPS) 结构的电流传导机制及其主要电子参数,如泄漏电流 (I0)、势垒高度 (ΦB0)、意整系数 (n)、串联/并联电阻 (Rs/Rsh)、整流比 (RR) 和界面态密度 (Nss)。聚乙烯吡咯烷酮(PVP)、钛酸钡(BaTiO3)和石墨烯(Gr)纳米颗粒混合在一起,形成了界面纳米复合层。利用热释电假说为 ANN 算法收集训练数据。为了研究 ANN 模型的功效,通过比较预测结果和实验结果,评估了 ANN 技术对 SDs 电流传导机制和电子特性的预测能力。ANN 对正向/反向偏压下的电流传导机制以及 MS 和 MPS 结构的基本电子特性的预测与实验结果高度一致。此外,结果表明,当采用 PVP:Gr-BaTiO3 纳米复合材料夹层时,MS 结构的 RR 和 Rsh 上升,而 n、Rs 和 Nss 下降。
{"title":"A strategy to predict the current conduction mechanisms into Al/PVP:Gr-BaTiO3/p-Si Schottky structure using Artificial Neural Network","authors":"Yashar Azizian-Kalandaragh , Süleyman Özçelik , Ali Barkhordari , Şemsettin Altındal","doi":"10.1016/j.micrna.2024.207957","DOIUrl":"10.1016/j.micrna.2024.207957","url":null,"abstract":"<div><p>In this work, Artificial Neural Network (ANN) algorithm is used to predict the current conduction mechanisms into the metal-semiconductor (MS) and metal-nanocomposite-semiconductor (MPS) structures along with their primary electronic parameters, such as the leak current (I<sub>0</sub>), potential barrier height (Φ<sub>B0</sub>), ideality factor (n), series/shunt resistance (R<sub>s</sub>/R<sub>sh</sub>), rectifying ratio (RR), and interface states density (N<sub>ss</sub>) by analyzing the I–V characteristics. The polyvinylpyrrolidone (PVP), barium titanate (BaTiO<sub>3</sub>) and graphene (Gr) nanoparticles are mixed together to create the interfacial nanocomposite layer. Training data for ANN algorithm is gathered using the thermionic emission hypothesis. In order to study the efficacy of the ANN model, the predictive power of the ANN technique for predicting the current conduction mechanisms and electronic properties of SDs has been assessed by comparing the predicted and experimental results. The ANN predictions of the current conduction mechanisms at the forward/reverse bias and the fundamental electronic specifications of the MS and MPS structures are a high level of agreement with the experimental results. Furthermore, the results show that the RR and R<sub>sh</sub> rise whereas the n, R<sub>s</sub>, and N<sub>ss</sub> for MS structure decrease when the PVP:Gr-BaTiO<sub>3</sub> nanocomposite interlayer is employed.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207957"},"PeriodicalIF":2.7,"publicationDate":"2024-08-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142021576","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-18DOI: 10.1016/j.micrna.2024.207955
Shreyas Tiwari , Tarun Varma , Rajesh Saha
This paper investigates the electrical and opto-sensing analysis of hetero stack vertical TFETs based on III/V group Gallium antimonide (GaSb)-Si at various wavelengths within the visible spectrum. Initially, the drain current, energy band diagram, and electron density contour plot are extracted in order to study the DC and electrical behavior of the device. Following that, their performance is evaluated by altering the source side thickness and observe the tunneling rate of device. Furthermore, the photo application of the device is noticed by computing the critical optical parameter such as sensitivity (Sn), noise factor, and efficient characteristics. Finally, a comparative table is included to set the benchmark and highlight the importance of hetero stack TFET. The device's maximum reported sensitivity is approximately 25.2 and responsivity (R) is 0.8 A/Watt at 320 nm wavelength. Additionally, we examined the effect of trap charges under light state at the gate-channel, isolator-channel, and source-channel interface respectively.
{"title":"Optical assessment of vertical TFET based on heterojunction of GaSb-Si","authors":"Shreyas Tiwari , Tarun Varma , Rajesh Saha","doi":"10.1016/j.micrna.2024.207955","DOIUrl":"10.1016/j.micrna.2024.207955","url":null,"abstract":"<div><p>This paper investigates the electrical and opto-sensing analysis of hetero stack vertical TFETs based on III/V group Gallium antimonide (GaSb)-Si at various wavelengths within the visible spectrum. Initially, the drain current, energy band diagram, and electron density contour plot are extracted in order to study the DC and electrical behavior of the device. Following that, their performance is evaluated by altering the source side thickness and observe the tunneling rate of device. Furthermore, the photo application of the device is noticed by computing the critical optical parameter such as sensitivity (Sn), noise factor, and efficient characteristics. Finally, a comparative table is included to set the benchmark and highlight the importance of hetero stack TFET. The device's maximum reported sensitivity is approximately 25.2 and responsivity (R) is 0.8 A/Watt at 320 nm wavelength. Additionally, we examined the effect of trap charges under light state at the gate-channel, isolator-channel, and source-channel interface respectively.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207955"},"PeriodicalIF":2.7,"publicationDate":"2024-08-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142048744","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-17DOI: 10.1016/j.micrna.2024.207956
Chenxi Wang , Yufei Song , Linqian Wu , Chen Xue , Haoxiang Feng , Haitao Li , Jianmin Song , Xiangui Zhang , Bin Zou , Kaiming Zhu
Square-shaped BiFeO3 (BFO) thin films were prepared on SrTiO3 (STO) substrates by off-axis magnetron sputtering using La0.5Sr0.5CoO3 (LSCO) as the bottom electrode, and both LSCO and BFO are perovskite structure. The BFO crystalline quality improves and the grain size becomes larger as the thickness H increases, and both have smaller mean square roughness. The effects of BFO thickness H, light intensity Ip and ambient temperature AT on the ferroelectric photovoltaic effect (FPE) for the Pt/BFO/LSCO heterostructures are significant. With the H increase, the open-circuit voltage Voc and short-circuit current Jsc increase linearly, with Voc up to 0.44 V. The short-circuit current modulation intensity ΔJsc follows the ΔJsc-300>ΔJsc-200>ΔJsc-100 rule. With the Ip increase, Pt/BFO(300 nm)/LSCO’ Jsc increases linearly, and Voc first increases and then tends to saturation, which satisfies Glass' law. With the AT increases, Voc is linearly decreasing and Jsc shows the law: decreasing→increasing→decreasing. The polarization-modulated FPE mechanism is investigated by analyzing the Pt/BFO/LSCO energy band structure, which is attributed to the coupling effect between the BFO depolarization field (Edp) and the built-in electric field at the interface (EPt/BFO & EBFO/LSCO), and the FPE mechanism is shifted from the interface barrier domination to the ferroelectric polarization domination as H increases.
以 La0.5Sr0.5CoO3(LSCO)为底电极,通过离轴磁控溅射法在 SrTiO3(STO)衬底上制备了方形 BiFeO3(BFO)薄膜,LSCO 和 BFO 均为包晶结构。随着厚度 H 的增加,BFO 的结晶质量提高,晶粒尺寸变大,且二者的均方粗糙度都较小。BFO 厚度 H、光照强度 Ip 和环境温度 AT 对 Pt/BFO/LSCO 异质结构的铁电光伏效应(FPE)有显著影响。随着 H 的增加,开路电压 Voc 和短路电流 Jsc 呈线性增加,其中 Voc 最高可达 0.44 V;短路电流调制强度 ΔJsc 遵循 ΔJsc-300>ΔJsc-200>ΔJsc-100 规律。随着 Ip 的增加,Pt/BFO(300 nm)/LSCO' Jsc 线性增加,Voc 先增加后趋于饱和,符合格拉斯定律。随着 AT 的增加,Voc 呈线性下降,Jsc 呈下降→增加→减少的规律。通过分析 Pt/BFO/LSCO 能带结构,研究了极化调制 FPE 机制,该机制归因于 BFO 去极化场(Edp)与界面内置电场(EPt/BFO & EBFO/LSCO)之间的耦合效应,随着 H 的增加,FPE 机制从界面势垒主导转向铁电极化主导。
{"title":"Structure and ferroelectric photovoltaic effect modulation in the epitaxial BiFeO3/La0.5Sr0.5CO3 heterostructures","authors":"Chenxi Wang , Yufei Song , Linqian Wu , Chen Xue , Haoxiang Feng , Haitao Li , Jianmin Song , Xiangui Zhang , Bin Zou , Kaiming Zhu","doi":"10.1016/j.micrna.2024.207956","DOIUrl":"10.1016/j.micrna.2024.207956","url":null,"abstract":"<div><p>Square-shaped BiFeO<sub>3</sub> (BFO) thin films were prepared on SrTiO<sub>3</sub> (STO) substrates by off-axis magnetron sputtering using La<sub>0.5</sub>Sr<sub>0.5</sub>CoO<sub>3</sub> (LSCO) as the bottom electrode, and both LSCO and BFO are perovskite structure. The BFO crystalline quality improves and the grain size becomes larger as the thickness H increases, and both have smaller mean square roughness. The effects of BFO thickness H, light intensity I<sub>p</sub> and ambient temperature AT on the ferroelectric photovoltaic effect (FPE) for the Pt/BFO/LSCO heterostructures are significant. With the H increase, the open-circuit voltage V<sub>oc</sub> and short-circuit current J<sub>sc</sub> increase linearly, with V<sub>oc</sub> up to 0.44 V. The short-circuit current modulation intensity ΔJ<sub>sc</sub> follows the ΔJ<sub>sc-300</sub>>ΔJ<sub>sc-200</sub>>ΔJ<sub>sc-100</sub> rule. With the I<sub>p</sub> increase, Pt/BFO(300 nm)/LSCO’ J<sub>sc</sub> increases linearly, and V<sub>oc</sub> first increases and then tends to saturation, which satisfies Glass' law. With the AT increases, V<sub>oc</sub> is linearly decreasing and J<sub>sc</sub> shows the law: decreasing→increasing→decreasing. The polarization-modulated FPE mechanism is investigated by analyzing the Pt/BFO/LSCO energy band structure, which is attributed to the coupling effect between the BFO depolarization field (E<sub>dp</sub>) and the built-in electric field at the interface (E<sub>Pt/BFO</sub> & E<sub>BFO/LSCO</sub>), and the FPE mechanism is shifted from the interface barrier domination to the ferroelectric polarization domination as H increases.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207956"},"PeriodicalIF":2.7,"publicationDate":"2024-08-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142011418","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-15DOI: 10.1016/j.micrna.2024.207954
Tirad Owais , Mahmoud Khater , Hussain Al-Qahtani
Microelectromechanical systems (MEMS) that utilize graphene-based materials have gained significant attention for gas-sensing applications owing to their unique properties. Graphene is a two-dimensional sheet of carbon atoms arranged in a hexagonal lattice that exhibits exceptional mechanical strength, high electrical conductivity, and large surface area. These properties make graphene an ideal candidate for gas sensing applications. In this study, we examined the fundamental characteristics of graphene, with emphasis on its practical use in sensors. We explored the latest techniques for synthesizing graphene, highlighting the importance of continual advancements in these manufacturing processes which are crucial for bringing graphene-based products to the market. We present various examples of how graphene is employed in MEMS for mass/gas sensing applications and discuss the advantages and challenges associated with devices using these materials. For successful incorporation of these materials into MEMS systems, it is essential to establish effective designs and integration processes that yield high results. Additionally, this analysis delves into the latest developments in graphene-based solid-state and movable MEMS devices, highlighting their promising gas-sensing applications.
{"title":"Graphene-based MEMS devices for gas sensing applications: A review","authors":"Tirad Owais , Mahmoud Khater , Hussain Al-Qahtani","doi":"10.1016/j.micrna.2024.207954","DOIUrl":"10.1016/j.micrna.2024.207954","url":null,"abstract":"<div><p>Microelectromechanical systems (MEMS) that utilize graphene-based materials have gained significant attention for gas-sensing applications owing to their unique properties. Graphene is a two-dimensional sheet of carbon atoms arranged in a hexagonal lattice that exhibits exceptional mechanical strength, high electrical conductivity, and large surface area. These properties make graphene an ideal candidate for gas sensing applications. In this study, we examined the fundamental characteristics of graphene, with emphasis on its practical use in sensors. We explored the latest techniques for synthesizing graphene, highlighting the importance of continual advancements in these manufacturing processes which are crucial for bringing graphene-based products to the market. We present various examples of how graphene is employed in MEMS for mass/gas sensing applications and discuss the advantages and challenges associated with devices using these materials. For successful incorporation of these materials into MEMS systems, it is essential to establish effective designs and integration processes that yield high results. Additionally, this analysis delves into the latest developments in graphene-based solid-state and movable MEMS devices, highlighting their promising gas-sensing applications.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207954"},"PeriodicalIF":2.7,"publicationDate":"2024-08-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142011419","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-13DOI: 10.1016/j.micrna.2024.207951
Nisha Yadav , Sunil Jadav , Gaurav Saini
In this work, we propose a promising source engineered Double - Gate (DG) Tunnel Field Effect Transistor (TFET) device capable of providing remarkably low value of Subthreshold Swing (SS) with sufficiently high drive current. Using Sentaurus TCAD simulations, we demonstrate that counter-doped horizontal pockets (doping of pocket is kept opposite to that of source) when placed in the source region introduces a built-in band bending at the source-pocket junction. This lowers the minima of Conduction Band (CB) in pocket region thereby reducing the barrier width as the pocket CB moves closer to source Valence Band (VB). As a result, stronger electric field is observed thereby reducing the threshold voltage (onset of band-to-band tunneling (BTBT)) and subsequent reduction in subthreshold swing. To boost the ON-current and suppress ambipolarity, high-k dielectric material along with low work-function gate material is introduced at source side and low-k gate dielectric along with high work-function gate material is introduced at drain side. Compared to point tunneling in conventional TFETs, the gate overlapped pockets in the proposed structure result in an increase in cross-section area available for BTBT thereby leading to line tunneling of carriers from the source to the pocket, resulting in higher ON-current. In this work, we discuss the role of source engineering in boosting the performance of Hetero-Dielectric (HD) Dual-Metal-Double-Gate (DMDG) TFET. We provide design guidelines to achieve steeper subthreshold swing while considering pocket doping and pocket thickness as the key parameters. A comparative study of conventional DG-TFET and HD-DG-TFET with the proposed Gate-over-Pockets (GoP) HD-DMDG-TFET structure is done. When compared to the conventional DG-TFET with same geometrical parameters, the proposed structure provides steeper SS, more than two order improved ON-current, two order lower ambipolar current and 133 folds better Ion/Ioff thus becomes the perfect choice for low power applications.
{"title":"Steep subthreshold swing Double - Gate tunnel FET using source pocket engineering: Design guidelines","authors":"Nisha Yadav , Sunil Jadav , Gaurav Saini","doi":"10.1016/j.micrna.2024.207951","DOIUrl":"10.1016/j.micrna.2024.207951","url":null,"abstract":"<div><p>In this work, we propose a promising source engineered Double - Gate (DG) Tunnel Field Effect Transistor (TFET) device capable of providing remarkably low value of Subthreshold Swing (SS) with sufficiently high drive current. Using Sentaurus TCAD simulations, we demonstrate that counter-doped horizontal pockets (doping of pocket is kept opposite to that of source) when placed in the source region introduces a built-in band bending at the source-pocket junction. This lowers the minima of Conduction Band (CB) in pocket region thereby reducing the barrier width as the pocket CB moves closer to source Valence Band (VB). As a result, stronger electric field is observed thereby reducing the threshold voltage (onset of band-to-band tunneling (BTBT)) and subsequent reduction in subthreshold swing. To boost the ON-current and suppress ambipolarity, high-<em>k</em> dielectric material along with low work-function gate material is introduced at source side and low-<em>k</em> gate dielectric along with high work-function gate material is introduced at drain side. Compared to point tunneling in conventional TFETs, the gate overlapped pockets in the proposed structure result in an increase in cross-section area available for BTBT thereby leading to line tunneling of carriers from the source to the pocket, resulting in higher ON-current. In this work, we discuss the role of source engineering in boosting the performance of Hetero-Dielectric (HD) Dual-Metal-Double-Gate (DMDG) TFET. We provide design guidelines to achieve steeper subthreshold swing while considering pocket doping and pocket thickness as the key parameters. A comparative study of conventional DG-TFET and HD-DG-TFET with the proposed Gate-over-Pockets (GoP) HD-DMDG-TFET structure is done. When compared to the conventional DG-TFET with same geometrical parameters, the proposed structure provides <span><math><mo>∼</mo><mn>33</mn><mo>×</mo></math></span> steeper SS, more than two order improved ON-current, two order lower ambipolar current and 133 folds better <em>I</em><sub><em>on</em></sub>/<em>I</em><sub><em>off</em></sub> thus becomes the perfect choice for low power applications.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207951"},"PeriodicalIF":2.7,"publicationDate":"2024-08-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141985627","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-12DOI: 10.1016/j.micrna.2024.207953
Jia-Hui Li, Yan Zhang, Shu-Zhuan Sun, Yong-Sen Yang, Yu-Fei Luo, Li Duan
The discovery of effective photocatalytic substances is crucial in reducing energy shortages and ecological contamination. This research involves creating SiC/PtSe2 van der Waals heterostructure with both SiC and PtSe2 monolayers, employing first-principles calculations for comprehensive theoretical analysis of their structural stability, electronic characteristics, optical features, Bader charge, and solar-to-hydrogen (STH) efficiency. Findings indicate that the SiC/PtSe2 heterostructure is a semiconductor with an indirect bandgap of 1.52 eV and a direct Z-scheme charge transfer path, facilitating more efficient segregation of photogenerated electron-hole pairs. The Bader charge indicates that the SiC layer accumulates positive charges and the PtSe2 layer accumulates negative charges, constituting a built-in electric field pointing from the SiC side to the PtSe2 side at the interface region, which can impede the complexation of the photogenerated electron-hole pairs. Furthermore, the SiC/PtSe2 heterostructure exhibits excellent optical absorption properties across both the ultraviolet and visible spectra, coupled with an exceptionally high STH efficiency of 34.7 %, significantly enhancing solar energy utilization. Ultimately, the Gibbs free energy calculations reveal the significant catalytic efficiency of the SiC/PtSe2 heterostructure for redox reactions. Based on these results, the SiC/PtSe2 heterostructure is a direct Z-scheme photocatalyst for overall water splitting.
发现有效的光催化物质对于减少能源短缺和生态污染至关重要。这项研究包括创建具有 SiC 和 PtSe2 单层的 SiC/PtSe2 范德华异质结构,并利用第一性原理计算对其结构稳定性、电子特性、光学特征、Bader 电荷和太阳能制氢(STH)效率进行全面的理论分析。研究结果表明,SiC/PtSe2 异质结构是一种具有 1.52 eV 间接带隙和直接 Z 型电荷转移路径的半导体,有利于光生电子-空穴对更有效地分离。Bader 电荷表明,SiC 层积累了正电荷,而 PtSe2 层积累了负电荷,在界面区构成了一个从 SiC 侧指向 PtSe2 侧的内置电场,这会阻碍光生电子-空穴对的复合。此外,SiC/PtSe2 异质结构在紫外和可见光谱范围内均表现出优异的光吸收特性,同时具有 34.7% 的超高 STH 效率,大大提高了太阳能的利用率。吉布斯自由能计算最终揭示了 SiC/PtSe2 异质结构在氧化还原反应中的显著催化效率。基于这些结果,SiC/PtSe2 异质结构是一种直接用于整体水分离的 Z 型光催化剂。
{"title":"SiC/PtSe2 van der Waals heterostructure: A high-efficiency direct Z-scheme photocatalyst for overall water splitting predicted from first-principles study","authors":"Jia-Hui Li, Yan Zhang, Shu-Zhuan Sun, Yong-Sen Yang, Yu-Fei Luo, Li Duan","doi":"10.1016/j.micrna.2024.207953","DOIUrl":"10.1016/j.micrna.2024.207953","url":null,"abstract":"<div><p>The discovery of effective photocatalytic substances is crucial in reducing energy shortages and ecological contamination. This research involves creating SiC/PtSe<sub>2</sub> van der Waals heterostructure with both SiC and PtSe<sub>2</sub> monolayers, employing first-principles calculations for comprehensive theoretical analysis of their structural stability, electronic characteristics, optical features, Bader charge, and solar-to-hydrogen (STH) efficiency. Findings indicate that the SiC/PtSe<sub>2</sub> heterostructure is a semiconductor with an indirect bandgap of 1.52 eV and a direct Z-scheme charge transfer path, facilitating more efficient segregation of photogenerated electron-hole pairs. The Bader charge indicates that the SiC layer accumulates positive charges and the PtSe<sub>2</sub> layer accumulates negative charges, constituting a built-in electric field pointing from the SiC side to the PtSe<sub>2</sub> side at the interface region, which can impede the complexation of the photogenerated electron-hole pairs. Furthermore, the SiC/PtSe<sub>2</sub> heterostructure exhibits excellent optical absorption properties across both the ultraviolet and visible spectra, coupled with an exceptionally high STH efficiency of 34.7 %, significantly enhancing solar energy utilization. Ultimately, the Gibbs free energy calculations reveal the significant catalytic efficiency of the SiC/PtSe<sub>2</sub> heterostructure for redox reactions. Based on these results, the SiC/PtSe<sub>2</sub> heterostructure is a direct Z-scheme photocatalyst for overall water splitting.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207953"},"PeriodicalIF":2.7,"publicationDate":"2024-08-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142040489","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-08DOI: 10.1016/j.micrna.2024.207952
Jinyang Huang , Yifeng Hu , Xiaoqin Zhu
Nanoscale phase change films of (MoTe2)xSb1-x were prepared using magnetron sputtering technique. The investigation focused on the influence of the presence of MoTe2 on the phase change characteristics of Sb materials as well as the electrical properties of devices. (MoTe2)xSb1-x phase change films showed good thermal stability, especially for (MoTe2)0.08Sb0.92 films. (MoTe2)xSb1-x films had higher phase change temperature (∼185 °C), larger crystallization activation energy (∼4.0 eV), smaller resistance drift index (∼0.03582), and wider band gap (0.629 eV) than pure Sb films, indicating better thermal stability. According to X-Ray Diffraction and Atomic Force Microscope, it could be found that doping MoTe2 in Sb could inhibit the grain growth and make the surface of Sb film flatter. According to the outcomes stemming from X-ray photoelectron spectroscopy, some bonds involving Mo–Te and Sb–Sb underwent breakage and actively contributed to the formation process of other chemical bonds at the interface. The formation of small Sb2Te3 and Sb grains in the as-deposited state played a role in inducing crystallization and accelerating phase transition. The band gap in (MoTe2)xSb1-x films augmented with the increase of MoTe2 content. The power consumption of the (MoTe2)0.08Sb0.92-based phase-change memory device was considerably reduced compared to GST film and could achieve ultra-fast resistance transition within 10 ns. The results showed that (MoTe2)xSb1-x phase change films have the advantages of high stability, low power consumption, and rapid speed, which is a potential choice for phase change memory.
{"title":"Application of (MoTe2)xSb1-x thin films with high speed and high stability in phase-change memory","authors":"Jinyang Huang , Yifeng Hu , Xiaoqin Zhu","doi":"10.1016/j.micrna.2024.207952","DOIUrl":"10.1016/j.micrna.2024.207952","url":null,"abstract":"<div><p>Nanoscale phase change films of (MoTe<sub>2</sub>)<sub>x</sub>Sb<sub>1-x</sub> were prepared using magnetron sputtering technique. The investigation focused on the influence of the presence of MoTe<sub>2</sub> on the phase change characteristics of Sb materials as well as the electrical properties of devices. (MoTe<sub>2</sub>)<sub>x</sub>Sb<sub>1-x</sub> phase change films showed good thermal stability, especially for (MoTe<sub>2</sub>)<sub>0.08</sub>Sb<sub>0.92</sub> films. (MoTe<sub>2</sub>)<sub>x</sub>Sb<sub>1-x</sub> films had higher phase change temperature (∼185 °C), larger crystallization activation energy (∼4.0 eV), smaller resistance drift index (∼0.03582), and wider band gap (0.629 eV) than pure Sb films, indicating better thermal stability. According to X-Ray Diffraction and Atomic Force Microscope, it could be found that doping MoTe<sub>2</sub> in Sb could inhibit the grain growth and make the surface of Sb film flatter. According to the outcomes stemming from X-ray photoelectron spectroscopy, some bonds involving Mo–Te and Sb–Sb underwent breakage and actively contributed to the formation process of other chemical bonds at the interface. The formation of small Sb<sub>2</sub>Te<sub>3</sub> and Sb grains in the as-deposited state played a role in inducing crystallization and accelerating phase transition. The band gap in (MoTe<sub>2</sub>)<sub>x</sub>Sb<sub>1-x</sub> films augmented with the increase of MoTe<sub>2</sub> content. The power consumption of the (MoTe<sub>2</sub>)<sub>0.08</sub>Sb<sub>0.92</sub>-based phase-change memory device was considerably reduced compared to GST film and could achieve ultra-fast resistance transition within 10 ns. The results showed that (MoTe<sub>2</sub>)<sub>x</sub>Sb<sub>1-x</sub> phase change films have the advantages of high stability, low power consumption, and rapid speed, which is a potential choice for phase change memory.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207952"},"PeriodicalIF":2.7,"publicationDate":"2024-08-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141978562","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
In this study, we utilize Nextnano device simulation software to systematically investigate the dependence of 2-DEG (two-dimensional electron gas) density on the barrier and spacer Layers in InAlN/GaN high electron mobility transistors (HEMTs). By simulating a range of barrier thicknesses, In mole fractions, and spacer layer thicknesses, we reveal the intricate ways in which these parameters influence device performance. Our simulations demonstrate that precise control of the InAlN barrier thickness and In mole fraction, along with the AlN spacer thickness, is crucial for optimizing 2DEG density and, consequently, the overall electrical properties of the HEMTs. Notably, our results highlight that an InAlN barrier thickness below 12 nm, coupled with an optimized In mole fraction and a finely tuned AlN spacer thickness close to 1 nm, significantly enhances 2DEG density without compromising mobility. These insights provide a detailed understanding of the material and structural dependencies critical for the design and development of high-performance InAlN/GaN HEMTs. Our study includes detailed calculations of the device's I–V characteristics. Notably, the highest peak output current is observed at a 1 nm AlN spacer thickness, reaching 0.91 A/mm. Our findings highlight a noteworthy agreement between the results derived from our computational simulations and experimental measurements.
{"title":"Simulation-based optimization of barrier and spacer layers in InAlN/GaN HEMTs for improved 2DEG density","authors":"Abdelmalek Douara , Abdelaziz Rabehi , Mawloud Guermoui , Rania Daha , Imad Eddine Tibermacine","doi":"10.1016/j.micrna.2024.207950","DOIUrl":"10.1016/j.micrna.2024.207950","url":null,"abstract":"<div><p>In this study, we utilize Nextnano device simulation software to systematically investigate the dependence of 2-DEG (two-dimensional electron gas) density on the barrier and spacer Layers in InAlN/GaN high electron mobility transistors (HEMTs). By simulating a range of barrier thicknesses, In mole fractions, and spacer layer thicknesses, we reveal the intricate ways in which these parameters influence device performance. Our simulations demonstrate that precise control of the InAlN barrier thickness and In mole fraction, along with the AlN spacer thickness, is crucial for optimizing 2DEG density and, consequently, the overall electrical properties of the HEMTs. Notably, our results highlight that an InAlN barrier thickness below 12 nm, coupled with an optimized In mole fraction and a finely tuned AlN spacer thickness close to 1 nm, significantly enhances 2DEG density without compromising mobility. These insights provide a detailed understanding of the material and structural dependencies critical for the design and development of high-performance InAlN/GaN HEMTs. Our study includes detailed calculations of the device's I–V characteristics. Notably, the highest peak output current is observed at a 1 nm AlN spacer thickness, reaching 0.91 A/mm. Our findings highlight a noteworthy agreement between the results derived from our computational simulations and experimental measurements.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207950"},"PeriodicalIF":2.7,"publicationDate":"2024-08-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141935151","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-06DOI: 10.1016/j.micrna.2024.207949
Yuee Wang , Xuefeng Zou , Huiwen Luo , Huo Zhang , Zhi Li , Fangrong Hu , Zhijin Qiu
A double hexagonal single ‘S’ metamaterial (DHSSM), exhibiting plasmon-induced transparency (PIT) in its spectral response is studied in this paper. Amplitude modulation of the PIT window is achieved by varying the azimuth angle of substructure ‘S’. Theoretical investigations into the PIT effect are conducted through numerical simulations. Moreover, an equivalent coupling circuit and Lorentz model are constructed to elucidate the PIT modulation mechanism. The results reveal that the PIT physical mechanism of the DHSSM has originated in destructive interference between bright-bright modes, which is directly excited by terahertz waves on the double hexagonal split rings and the ‘S’ substructure. For slow optical propagation performance, the structure has a high group delay (up to 41.92 ps) while allowing for the adjustment of the transparency window amplitude. The proposed metamaterial holds promising prospects for applications in slow light devices, switches, and filters within the terahertz frequency range.
{"title":"Tunable plasmon-induced transparency and its slow light performance based on terahertz metamaterials","authors":"Yuee Wang , Xuefeng Zou , Huiwen Luo , Huo Zhang , Zhi Li , Fangrong Hu , Zhijin Qiu","doi":"10.1016/j.micrna.2024.207949","DOIUrl":"10.1016/j.micrna.2024.207949","url":null,"abstract":"<div><p>A double hexagonal single ‘S’ metamaterial (DHSSM), exhibiting plasmon-induced transparency (PIT) in its spectral response is studied in this paper. Amplitude modulation of the PIT window is achieved by varying the azimuth angle of substructure ‘S’. Theoretical investigations into the PIT effect are conducted through numerical simulations. Moreover, an equivalent coupling circuit and Lorentz model are constructed to elucidate the PIT modulation mechanism. The results reveal that the PIT physical mechanism of the DHSSM has originated in destructive interference between bright-bright modes, which is directly excited by terahertz waves on the double hexagonal split rings and the ‘S’ substructure. For slow optical propagation performance, the structure has a high group delay (up to 41.92 ps) while allowing for the adjustment of the transparency window amplitude. The proposed metamaterial holds promising prospects for applications in slow light devices, switches, and filters within the terahertz frequency range.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207949"},"PeriodicalIF":2.7,"publicationDate":"2024-08-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141935178","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-03DOI: 10.1016/j.micrna.2024.207948
H. Xie , X.J. Zhou , Y. Xing
Based on the effective mass approximation and the compact density matrix theory, the electronic states and optical absorption properties of intersubband transitions between the conduction-band energy levels in zinc blende InGaN/GaN/InGaN/GaN core-shell quantum dots (CSQDs) are investigated by using the finite difference method. The effects of hydrogen-like impurity and In component on the wave functions, transition energies, and optical absorption properties are discussed in detail. The results show that hydrogen-like impurity can cause the peak positions of optical absorption coefficients (OACs) and refractive index changes (RICs) to move to high energy area, and the peak values of OACs rise. Increasing In component of InGaN crystal in the core region of a CSQD has the same effect. But an opposite tendency will be found when increasing In component in the shell-well of a CSQD, i.e. optical absorption peaks move to low energy area and their values decrease. Comparing to the shell-well, the core region has more powerful confinement effect on electrons. So the better absorption properties are more likely to be obtained for this type of multi-layer InGaN/GaN CSQDs when In component in the core is larger than that in the shell-well.
基于有效质量近似和紧凑密度矩阵理论,利用有限差分法研究了锌掺杂InGaN/GaN/InGaN/GaN核壳量子点(CSQDs)中导带能级之间的带间跃迁的电子态和光吸收性。详细讨论了类氢杂质和 In 成分对波函数、跃迁能和光吸收特性的影响。结果表明,类氢杂质会导致光吸收系数(OAC)和折射率变化(RIC)的峰值位置向高能区移动,OAC 的峰值升高。在 CSQD 的核心区域增加 InGaN 晶体的 In 分量也会产生同样的效果。但在 CSQD 的壳阱中增加 In 分量时,则会出现相反的趋势,即光吸收峰会移动到低能区,其值也会降低。与壳阱相比,核区对电子的束缚作用更强。因此,当核中的 In 分量大于壳阱中的 In 分量时,这种多层 InGaN/GaN CSQD 更有可能获得更好的吸收特性。
{"title":"Optical absorption properties in multi-layer InGaN/GaN core-shell quantum dots: The influences of ternary mixed crystal effect and hydrogen-like impurity","authors":"H. Xie , X.J. Zhou , Y. Xing","doi":"10.1016/j.micrna.2024.207948","DOIUrl":"10.1016/j.micrna.2024.207948","url":null,"abstract":"<div><p>Based on the effective mass approximation and the compact density matrix theory, the electronic states and optical absorption properties of intersubband transitions between the conduction-band energy levels in zinc blende InGaN/GaN/InGaN/GaN core-shell quantum dots (CSQDs) are investigated by using the finite difference method. The effects of hydrogen-like impurity and In component on the wave functions, transition energies, and optical absorption properties are discussed in detail. The results show that hydrogen-like impurity can cause the peak positions of optical absorption coefficients (OACs) and refractive index changes (RICs) to move to high energy area, and the peak values of OACs rise. Increasing In component of InGaN crystal in the core region of a CSQD has the same effect. But an opposite tendency will be found when increasing In component in the shell-well of a CSQD, i.e. optical absorption peaks move to low energy area and their values decrease. Comparing to the shell-well, the core region has more powerful confinement effect on electrons. So the better absorption properties are more likely to be obtained for this type of multi-layer InGaN/GaN CSQDs when In component in the core is larger than that in the shell-well.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207948"},"PeriodicalIF":2.7,"publicationDate":"2024-08-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141985628","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}