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Metamaterial structure design based on genetic algorithm and phase change material GST for multispectral camouflage 基于遗传算法和相变材料 GST 的多光谱伪装超材料结构设计
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-10 DOI: 10.1016/j.micrna.2024.207985
Yaxin Zhou , Xin Li , Sihan Nie , Pengfei Sun , Lijing Su , Yang Gao

This study proposes a multispectral camouflage tunable multilayer film metamaterial (TMFM) with thermal management function based on genetic algorithm (GA), which is composed of ZnS/YbF3/Ge/Ge2Sb2Te5 (GST)/Au multilayer film. Through numerical analysis, we assess its efficacy in visible-infrared compatibility camouflage and radiative heat dissipation. Within the visible light band, different structural colors can be produced by adjusting the thickness of the ZnS film. The average emissivity within the 3–5 μm and 8–14 μm infrared bands is measured at 0.04 and 0.14, respectively. The low emissivity facilitates effective thermal management. Moreover, an average emissivity of 0.52 within the 5–8 μm range is instrumental in achieving efficient radiation heat dissipation. Laser stealth capability is further enhanced, with an emissivity reaching 0.70 at 10.6 μm. Therefore, this metamaterial structure has broad application prospects in both military and civilian industrial fields.

本研究基于遗传算法(GA)提出了一种具有热管理功能的多光谱伪装可调多层薄膜超材料(TMFM),它由 ZnS/YbF3/Ge/Ge2Sb2Te5 (GST)/Au 多层薄膜组成。通过数值分析,我们评估了其在可见光-红外兼容伪装和辐射散热方面的功效。在可见光波段内,通过调整 ZnS 薄膜的厚度可以产生不同的结构颜色。据测量,3-5 微米和 8-14 微米红外波段的平均发射率分别为 0.04 和 0.14。低发射率有利于有效的热管理。此外,5-8 μm 范围内 0.52 的平均发射率也有助于实现高效的辐射散热。10.6 μm 处的发射率达到 0.70,进一步增强了激光的隐形能力。因此,这种超材料结构在军事和民用工业领域都具有广阔的应用前景。
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引用次数: 0
Pragmatic structure optimization: Achieving optimal crosstalk delay and gate oxide reliability of randomly mixed CNT bundle interconnects 务实的结构优化:实现随机混合碳纳米管束互连的最佳串扰延迟和栅极氧化层可靠性
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-08 DOI: 10.1016/j.micrna.2024.207983
Ritika Sharma, Mayank Kumar Rai, Rajesh Khanna

This study explores the potential of randomly mixed carbon nanotube bundle (RMCB) as a viable on-chip interconnect. Achieving high-quality carbon nanotubes (CNTs) with uniform diameters is challenging for the current framework of enhanced fabrication techniques. The Stoyan and Yaskov technique is employed to optimize CNT arrangement within a specified rectangular area. This method accounts for statistical variation in CNT diameters, offering a more realistic and fabrication-focused approach to designing CNT bundle interconnects. Eight such practical RMCB structures (RMCB-50 to RMCB-350) are selected using this technique, each characterized by distinct CNT counts and variable diameters. Comprehensive average crosstalk-delay and reliability assessments are conducted by comparing different CNT bundle interconnects with the best-optimized RMCB (O-RMCB) interconnect, placed on various dielectric substrates such as SiO2, SiC, BN. The study unequivocally indicates that O-RMCB produces highly favorable results and stands as the most suitable future solution for VLSI circuits. Additionally, the thickness optimization of O-RMCB interconnect is explored, yielding in improvements in both performance and reliability compared to other well-known CNT bundled interconnects.

本研究探讨了随机混合碳纳米管束(RMCB)作为可行片上互连器件的潜力。实现直径一致的高质量碳纳米管(CNTs)对于当前的增强型制造技术框架来说具有挑战性。Stoyan 和 Yaskov 技术用于优化指定矩形区域内的 CNT 排列。这种方法考虑了 CNT 直径的统计变化,为设计 CNT 束互连提供了一种更现实、更注重制造的方法。使用该技术选择了八种实用的 RMCB 结构(RMCB-50 至 RMCB-350),每种结构都具有不同的 CNT 数量和可变直径。通过比较不同的 CNT 束互连与最佳优化的 RMCB(O-RMCB)互连(置于各种介电质基底上,如 SiO2、SiC 和 BN),进行了全面的平均串扰延迟和可靠性评估。研究明确表明,O-RMCB 能产生非常好的效果,是未来超大规模集成电路最合适的解决方案。此外,研究还探讨了 O-RMCB 互连的厚度优化问题,结果表明与其他著名的碳纳米管捆绑互连相比,O-RMCB 的性能和可靠性都有所提高。
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引用次数: 0
A novel peony shaped ZnO and its excellent ethanol gas-sensing performance 新型牡丹形氧化锌及其优异的乙醇气体传感性能
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-07 DOI: 10.1016/j.micrna.2024.207982
Zhongming Sun , Songtao Liu , Junbo Wang , Fang Si , Haiyun Hou , Xianjun Zheng , Jianjiang Liu , Chengyu Fang

In order to improve the gas-sensing performance of ZnO, a novel peony shaped ZnO stacked with nanosheets were prepared using hydrothermal method, and the obtained ZnO was characterized and tested for gas sensitivity. The results showed that the particle distribution of the peony shaped ZnO was uniform, with a particle size of about 0.8 μm. The gas-sensing response test results show that the peony shaped ZnO has excellent selectivity to ethanol gas. When the concentration of ethanol gas is 100 ppm, the gas-sensing response of the peony shaped ZnO to ethanol gas reaches 17.4, and the response time and recovery time are 8 s and 12 s, respectively. Even at an ethanol gas concentration of 2 ppm, the gas-sensing response of the peony shaped ZnO to ethanol gas can reach 2.1. Compared to existing literature reports, the peony shaped ZnO prepared in this paper has better gas-sensing performance. This study will provide data support and theoretical reference for the development of high-performance gas sensors.

为了提高氧化锌的气敏性能,采用水热法制备了一种新型的牡丹形氧化锌叠层纳米片,并对得到的氧化锌进行了表征和气敏测试。结果表明,牡丹形氧化锌的颗粒分布均匀,粒径约为 0.8 μm。气敏响应测试结果表明,牡丹形氧化锌对乙醇气体具有极佳的选择性。当乙醇气体浓度为 100 ppm 时,牡丹形 ZnO 对乙醇气体的气敏响应达到 17.4,响应时间和恢复时间分别为 8 秒和 12 秒。即使乙醇气体浓度为 2 ppm,牡丹形 ZnO 对乙醇气体的气敏响应也能达到 2.1。与现有文献报道相比,本文制备的牡丹形 ZnO 具有更好的气敏性能。该研究将为高性能气体传感器的开发提供数据支持和理论参考。
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引用次数: 0
Innovative Spacer material integration in Tree-FETs for enhanced performance across Variable channel lengths 在树型场效应晶体管中集成创新的间隔材料,以提高不同沟道长度的性能
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-06 DOI: 10.1016/j.micrna.2024.207974
Dharavath Parvathi, P Prithvi

This work presents a novel three-channel Tree-FET optimized for superior DC and analog performance metrics. The device structure features nanosheets with a width (NSWD) of 9 nm, a thickness (NSTH) of 5 nm, and interbidge dimensions of 8 nm in height (IBHT) and 5 nm in width (IBWD). The Tree-FET demonstrates an exceptional on/off current ratio of 107 through meticulous engineering, significantly outperforming conventional FET configurations. Our comprehensive study explores the effects of different spacer materials, including HfO2, Al2O3, Si3N4, and SiO2, across varied channel lengths. The superior dielectric properties of HfO2 contribute to fine-tuning the device's characteristics, making it a standout choice for optimizing performance. Out of all HfO2 has been found to perform exceptionally well, offering the best combination of electrostatic control and minimized leakage currents. Because the Tree-FET has better electrostatic integrity and can keep working well with different spacer materials and channel lengths, it has much potential as a flexible and valuable part for next-generation semiconductor devices. The promising DC and analog metrics achieved through this novel design pave the way for developing more compact, high-performance electronic components.

这项研究提出了一种新型三沟道树型场效应晶体管(Tree-FET),该器件经过优化,具有卓越的直流和模拟性能指标。该器件结构的纳米片宽度(NSWD)为 9 nm,厚度(NSTH)为 5 nm,桥间尺寸高度(IBHT)为 8 nm,宽度(IBWD)为 5 nm。通过精心设计,树状场效应晶体管的导通/关断电流比高达 107,大大优于传统的场效应晶体管配置。我们的综合研究探讨了不同间隔材料(包括 HfO2、Al2O3、Si3N4 和 SiO2)对不同沟道长度的影响。HfO2 优越的介电特性有助于微调器件的特性,使其成为优化性能的最佳选择。在所有器件中,HfO2 的性能尤为出色,是静电控制和漏电流最小化的最佳组合。由于树型场效应晶体管具有更好的静电完整性,并能在使用不同的间隔材料和沟道长度时保持良好的工作状态,因此它作为下一代半导体器件的灵活而有价值的部件具有很大的潜力。通过这种新颖设计实现的直流和模拟指标前景广阔,为开发更紧凑、更高性能的电子元件铺平了道路。
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引用次数: 0
An embedded gate gate-all-around FinFET for biosensing application 用于生物传感应用的嵌入式全栅极 FinFET
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-31 DOI: 10.1016/j.micrna.2024.207972
Hujun Jia, Wanli Yang, Weitao Cao, Linna Zhao, Qiyu Su, Xingyu Wei, Zhen Cao, Yintang Yang

A dielectric modulated embedded gate gate-all-around fin field-effect transistor (EGGAA-FinFET) has been proposed for label-free detection applications of biomolecules in this article. The design expands the biomolecule capture area by establishing a cavity below the embedded gate. The performance of EGGAA-FinFET and FinFET biosensors is analyzed in a comprehensive comparison in terms of electrical performance, sensitivity and selectivity. Some important biosensing characteristics for EGGAA-FinFET (FinFET) have been calculated to be 0.43 V (0.32 V) for threshold voltage sensitivity, 2.22 × 106 (8.32 × 104) for current switching ratio sensitivity, and 0.75 (0.65) for subthreshold swing sensitivity. To determine the optimal structure of the biosensor, the effect of structural parameters on sensitivity is investigated. In addition, the effect of the filling factor on the biosensor is considered. The real-world performance of biosensors is assessed using the linearity parameter, showing that the EGGAA-FinFET biosensor has better noise resistance compared to the FinFET biosensor.

本文提出了一种介电调制嵌入式栅极-栅极-周围鳍式场效应晶体管(EGGAA-FinFET),用于生物分子的无标记检测应用。该设计通过在嵌入式栅极下方建立一个空腔来扩大生物分子捕获区域。本文从电学性能、灵敏度和选择性等方面对 EGGAA-FinFET 和 FinFET 生物传感器的性能进行了综合比较分析。根据计算,EGGAA-FinFET(FinFET)的一些重要生物传感特性为:阈值电压灵敏度为 0.43 V(0.32 V),电流开关比灵敏度为 2.22 × 106(8.32 × 104),阈下摆动灵敏度为 0.75(0.65)。为了确定生物传感器的最佳结构,研究了结构参数对灵敏度的影响。此外,还考虑了填充因子对生物传感器的影响。利用线性参数评估了生物传感器的实际性能,结果表明 EGGAA-FinFET 生物传感器与 FinFET 生物传感器相比具有更好的抗噪声性能。
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引用次数: 0
Frequency-domain analysis of CMOS-driven interconnects utilizing doped multilayer graphene nanoribbons and mixed carbon nanotube bundles 利用掺杂多层石墨烯纳米带和混合碳纳米管束的 CMOS 驱动型互连的频域分析
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-31 DOI: 10.1016/j.micrna.2024.207973
Tajinder Kaur , Aashish Kumar , Mayank Kumar Rai

A frequency-domain model is developed to analyze isolated interconnects of multilayer graphene-nanoribbon (MLGNR) and mixed carbon-nanotube bundle (MCB) driven by CMOS gates. The model derived is founded on an equivalent-single-conductor model of MLGNR and MCB that takes thermal considerations into account (i.e. TD-ESC). The model includes the derivation of transfer function of interconnect to estimate its delay and bandwidth performance. The attained results, reveals that among the neutral MLGNR (N-MLGNR), intercalation doped MLGNR (ID-MLGNR) intercalated with FeCl3, MCB and Cu interconnects, FeCl3 ID-MLGNR achieves the best bandwidth efficiency. At a global interconnect length of 1 mm, FeCl3 ID-MLGNR outperforms N-MLGNR, MCB, and Cu in terms of bandwidth with an improved bandwidth value of 12.2 GHz, 7 GHz, and 61.4 GHz, respectively. Further, employing the proposed CMOS-gate-driven model, for FeCl3 ID-MLGNR, bandwidth is improved by nearly 7.52 × at global length (∼1 mm) in relation to the linear resistance model. Additionally, TD-ESC dependency of the proposed model reveals that FeCl3 ID-MLGNR becomes more stable as interconnect resistance increases.

本文开发了一个频域模型,用于分析 CMOS 栅极驱动的多层石墨烯-纳米碳(MLGNR)和混合碳-纳米管束(MCB)的隔离互连。推导出的模型建立在 MLGNR 和 MCB 的等效单导体模型基础上,该模型考虑了热因素(即 TD-ESC)。该模型包括互连传输函数的推导,以估算其延迟和带宽性能。研究结果表明,在中性 MLGNR(N-MLGNR)、掺杂 FeCl3 的插层 MLGNR(ID-MLGNR)、MCB 和铜互连器件中,FeCl3 ID-MLGNR 的带宽效率最高。在全局互连长度为 1 毫米时,FeCl3 ID-MLGNR 的带宽优于 N-MLGNR、MCB 和 Cu,带宽值分别提高了 12.2 GHz、7 GHz 和 61.4 GHz。此外,采用所提出的 CMOS 栅极驱动模型,FeCl3 ID-MLGNR 在全局长度(1 毫米)上的带宽比线性电阻模型提高了近 7.52 倍。此外,所提模型的 TD-ESC 依赖性表明,随着互连电阻的增加,FeCl3 ID-MLGNR 变得更加稳定。
{"title":"Frequency-domain analysis of CMOS-driven interconnects utilizing doped multilayer graphene nanoribbons and mixed carbon nanotube bundles","authors":"Tajinder Kaur ,&nbsp;Aashish Kumar ,&nbsp;Mayank Kumar Rai","doi":"10.1016/j.micrna.2024.207973","DOIUrl":"10.1016/j.micrna.2024.207973","url":null,"abstract":"<div><p>A frequency-domain model is developed to analyze isolated interconnects of multilayer graphene-nanoribbon (MLGNR) and mixed carbon-nanotube bundle (MCB) driven by CMOS gates. The model derived is founded on an equivalent-single-conductor model of MLGNR and MCB that takes thermal considerations into account (i.e. TD-ESC). The model includes the derivation of transfer function of interconnect to estimate its delay and bandwidth performance. The attained results, reveals that among the neutral MLGNR (N-MLGNR), intercalation doped MLGNR (ID-MLGNR) intercalated with FeCl<sub>3</sub>, MCB and <em>Cu</em> interconnects, FeCl<sub>3</sub> ID-MLGNR achieves the best bandwidth efficiency. At a global interconnect length of 1 mm, FeCl<sub>3</sub> ID-MLGNR outperforms N-MLGNR, MCB, and <em>Cu</em> in terms of bandwidth with an improved bandwidth value of 12.2 GHz, 7 GHz, and 61.4 GHz, respectively. Further, employing the proposed CMOS-gate-driven model, for FeCl<sub>3</sub> ID-MLGNR, bandwidth is improved by nearly 7.52 × at global length (∼1 mm) in relation to the linear resistance model. Additionally, TD-ESC dependency of the proposed model reveals that FeCl<sub>3</sub> ID-MLGNR becomes more stable as interconnect resistance increases.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207973"},"PeriodicalIF":2.7,"publicationDate":"2024-08-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142136542","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High performance E-mode NiO/β-Ga2O3 HJ-FET with high conduction band offset and thin recessed channel 具有高导带偏移和薄凹槽的高性能 E 模式 NiO/β-Ga2O3 HJ-FET
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-30 DOI: 10.1016/j.micrna.2024.207963
Jiaweiwen Huang , Wensuo Chen , Shenglei Zhao , Qisheng Yu , Aohang Zhang , Kunfeng Zhu , Jian Li

In this paper, an enhancement-mode (E-mode) NiO/β-Ga2O3 heterojunction field-effect transistor (HJ-FET) with high conduction band offset (ΔEC) and thin recessed channel is proposed and studied by Sentaurus TCAD. Different from the existing HJ-FET with low ΔEC alignment, the High ΔEC HJ-FET can achieve a much lower on-resistance (Ron) due to the strong electron confinement effect. More importantly, the disadvantage in the threshold voltage (Vth) is compensated by reducing the thickness of the recessed channel, maintaining an almost unchanged Ron with the help of the special surface conduction channel. Compared with the corresponding Low ΔEC HJ-FET, at the same Vth ( 0.82 V), the Ron is decreased from 135 Ω/mm to 90.7 Ω/mm and the maximum drain current is increased from 14.9 mA/mm to 83.1 mA/mm. By adding a top p-NiO layer for further optimization, a greatly improved power figure of merit (P-FOM) of 2.29 GW/cm2 is achieved among the E-mode HJ-FETs. These results show that the proposed High ΔEC HJ-FET with thin recessed channel is probably a better choice to achieve the high-performance E-mode lateral HJ-FET.

本文提出了一种具有高导带偏移(ΔEC)和薄凹槽沟道的增强型(E-mode)NiO/β-Ga2O3 异质结场效应晶体管(HJ-FET),并利用 Sentaurus TCAD 对其进行了研究。与现有的低ΔEC 排列的 HJ-FET 不同,高ΔEC HJ-FET 由于具有很强的电子约束效应,可以实现更低的导通电阻 (Ron)。更重要的是,阈值电压(Vth)方面的劣势可以通过减小凹槽厚度来弥补,在特殊表面传导沟道的帮助下保持几乎不变的导通电阻(Ron)。与相应的低ΔEC HJ-FET 相比,在相同的 Vth (∼ 0.82 V) 下,Ron 从 135 Ω/mm 减小到 90.7 Ω/mm,最大漏极电流从 14.9 mA/mm 增加到 83.1 mA/mm。通过添加顶部 p-NiO 层进行进一步优化,E 模式 HJ-FET 的功率因数(P-FOM)大大提高,达到 2.29 GW/cm2。这些结果表明,所提出的具有薄凹陷沟道的高ΔEC HJ-FET 可能是实现高性能 E 模式横向 HJ-FET 的更好选择。
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引用次数: 0
Design of a 4H–SiC Schottky barrier FET biosensor with dual-source and dual-drain on suspended beam channel 在悬梁通道上设计具有双源和双漏的 4H-SiC 肖特基势垒 FET 生物传感器
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-26 DOI: 10.1016/j.micrna.2024.207962
Hujun Jia, Linna Zhao, Qiyu Su, Weitao Cao, Wanli Yang, Xingyu Wei, Zhen Cao, Yintang Yang

In this paper, a Schottky barrier field effect transistor biosensor with dual-source, dual-drain, and a suspended beam channel (DSDD-SB-FET) is proposed and its biosensor performance is investigated by simulation. The simulation results show that compared with the conventional 6H–SiC Schottky barrier field effect transistor (6H-SiC-SB-FET) biosensor, the new structure proposed in this paper has superior sensitivity characteristics. The SIon is 1.83 × 108, Sgm,max is 1.44 × 108, SIon/Ioff is 1.53 × 107, and SSS is 83 % at K = 12, which are respectively 554 times, 476 times, 2.76 × 104 times, and 61 % higher than those of the 6H-SiC-SB-FET. In addition, we also investigate the effects of non-ideal filling conditions and temperature variations on its performance in practical applications, and conclude that the DSDD-SB-FET biosensor has excellent sensing performance in practical applications as well.

本文提出了一种具有双源、双漏和悬梁沟道的肖特基势垒场效应晶体管生物传感器(DSDD-SB-FET),并对其生物传感器性能进行了仿真研究。仿真结果表明,与传统的 6H-SiC 肖特基势垒场效应晶体管(6H-SiC-SB-FET)生物传感器相比,本文提出的新结构具有更优越的灵敏度特性。在 K = 12 时,SIon 为 1.83 × 108,Sgm,max 为 1.44 × 108,SIon/Ioff 为 1.53 × 107,SSS 为 83 %,分别是 6H-SiC-SB-FET 的 554 倍、476 倍、2.76 × 104 倍和 61 %。此外,我们还研究了非理想填充条件和温度变化对其实际应用性能的影响,并得出结论:DSDD-SB-FET 生物传感器在实际应用中也具有优异的传感性能。
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引用次数: 0
P-type doped AlxGa1-xAs nanowire photocathode: A theoretical perspective on structural and optoelectronic properties P 型掺杂 AlxGa1-xAs 纳米线光电阴极:结构和光电特性的理论视角
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-24 DOI: 10.1016/j.micrna.2024.207959
Yu Diao , Sihao Xia

In this work, the effect of p-type doping on the structural, electronic, and optical properties of AlxGa1-xAs nanowires are investigated by first-principles calculations. Different doping elements (Be, Mg, Zn), doping methods (interstitial and substitution doping) and doping concentration are considered. The calculations of formation energy suggest that the structural stability of p-type AlxGa1-xAs nanowires is gradually weaken as the rise of doping concentration and Al composition. Besides, the difficulty of forming substitution doping for different doping elements obeys the following order: Be < Mg < Zn. In addition, the substitution doping atom tends to replace Ga atom rather than Al atom to form substitution doping structure. After substitution doping, all energy bands shift to higher energy region due to the orbital hybridization of electronic states induced by impurity atom and nanowire atoms. Moreover, the substitution doping leads to the Fermi level entering into the valence band, resulting in obviously p-type conductivity. The p-type modulation doping is indeed effective in the axial type AlxGa1-xAs nanowires with p-type carrier concentration varying between 1.85 × 1020 cm−3 and 4.42 × 1020 cm−3, and the conductivity will be further enhanced with increasing substitution doping concentration or Al composition. Finally, the optical absorption of AlxGa1-xAs nanowire photocathodes can be effectively enhanced through BeGa doping. Our findings not only present a comprehensive understanding of p-type doping mechanism of AlxGa1-xAs nanowires, but also provide a theoretical basis for preparing AlxGa1-xAs nanowire based photoelectric devices with p-type properties.

本文通过第一原理计算研究了 p 型掺杂对 AlxGa1-xAs 纳米线的结构、电子和光学特性的影响。考虑了不同的掺杂元素(Be、Mg、Zn)、掺杂方法(间隙掺杂和置换掺杂)和掺杂浓度。形成能的计算表明,随着掺杂浓度和铝成分的增加,p 型 AlxGa1-xAs 纳米线的结构稳定性逐渐减弱。此外,不同掺杂元素形成替代掺杂的难度服从以下顺序:Be < Mg < Zn。此外,取代掺杂原子倾向于取代 Ga 原子而不是 Al 原子,从而形成取代掺杂结构。替代掺杂后,由于杂质原子和纳米线原子诱导的电子态轨道杂化,所有能带都向高能区移动。此外,置换掺杂导致费米级进入价带,从而产生明显的 p 型导电性。在轴向型 AlxGa1-xAs 纳米线中,p 型载流子浓度在 1.85 × 1020 cm-3 和 4.42 × 1020 cm-3 之间,p 型调制掺杂确实有效。最后,AlxGa1-xAs 纳米线光电阴极的光吸收可以通过掺杂 BeGa 得到有效增强。我们的研究结果不仅全面揭示了 AlxGa1-xAs 纳米线的 p 型掺杂机理,而且为制备具有 p 型特性的 AlxGa1-xAs 纳米线光电器件提供了理论依据。
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引用次数: 0
Improvement of digital, analog/RF and linearity performances of charge plasma based junctionless FinFET through spacer layer engineering 通过间隔层工程改善基于电荷等离子体的无结 FinFET 的数字、模拟/射频和线性性能
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-24 DOI: 10.1016/j.micrna.2024.207961
Kallolini Banerjee , Abhijit Biswas

We investigate the digital, analog/RF, and linearity performance of four CP FinFETs distinguished by spacer layers: (i) single low-k spacer on both sides of the gate (D1), (ii) single high-k spacer on both sides of the gate (D2), (iii) a combination of high-k spacer and air on the source side and high-k spacer on the drain side (D3), and (iv) a combination of high-k spacer and air symmetrically placed on both sides of the gate (D4) at 10 nm technology node. Our results highlight the superior digital performance of the D4 device, demonstrating significant enhancements in various analog/RF figures of merit (FOMs) including transconductance, transconductance efficiency, unity gain cut-off frequency (FT), and gain bandwidth product (GBP). Notably, the D4 device exhibits a remarkable 256 % improvement in FT and a substantial 456.13 % enhancement in GBP compared to D1. Additionally, we analyze linearity and intermodulation distortion performance, suggesting the D4 device as the optimal architecture for high-performance digital and analog/RF applications.

我们对四种 CP FinFET 的数字、模拟/射频和线性度性能进行了研究,这四种 CP FinFET 采用了不同的间隔层:(i) 栅极两侧的单个低 k 间隔层 (D1);(ii) 栅极两侧的单个高 k 间隔层 (D2);(iii) 源极侧高 k 间隔层和空气的组合以及漏极侧高 k 间隔层 (D3);(iv) 栅极两侧对称放置的高 k 间隔层和空气的组合 (D4)。我们的研究结果凸显了 D4 器件卓越的数字性能,在各种模拟/射频性能指标 (FOM) 方面都有显著提高,包括跨导、跨导效率、统一增益截止频率 (FT) 和增益带宽乘积 (GBP)。值得注意的是,与 D1 器件相比,D4 器件的 FT 和 GBP 分别显著提高了 256% 和 456.13%。此外,我们还分析了线性和互调失真性能,认为 D4 器件是高性能数字和模拟/射频应用的最佳架构。
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引用次数: 0
期刊
Micro and Nanostructures
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