Pub Date : 2024-09-10DOI: 10.1016/j.micrna.2024.207985
Yaxin Zhou , Xin Li , Sihan Nie , Pengfei Sun , Lijing Su , Yang Gao
This study proposes a multispectral camouflage tunable multilayer film metamaterial (TMFM) with thermal management function based on genetic algorithm (GA), which is composed of ZnS/YbF3/Ge/Ge2Sb2Te5 (GST)/Au multilayer film. Through numerical analysis, we assess its efficacy in visible-infrared compatibility camouflage and radiative heat dissipation. Within the visible light band, different structural colors can be produced by adjusting the thickness of the ZnS film. The average emissivity within the 3–5 μm and 8–14 μm infrared bands is measured at 0.04 and 0.14, respectively. The low emissivity facilitates effective thermal management. Moreover, an average emissivity of 0.52 within the 5–8 μm range is instrumental in achieving efficient radiation heat dissipation. Laser stealth capability is further enhanced, with an emissivity reaching 0.70 at 10.6 μm. Therefore, this metamaterial structure has broad application prospects in both military and civilian industrial fields.
{"title":"Metamaterial structure design based on genetic algorithm and phase change material GST for multispectral camouflage","authors":"Yaxin Zhou , Xin Li , Sihan Nie , Pengfei Sun , Lijing Su , Yang Gao","doi":"10.1016/j.micrna.2024.207985","DOIUrl":"10.1016/j.micrna.2024.207985","url":null,"abstract":"<div><p>This study proposes a multispectral camouflage tunable multilayer film metamaterial (TMFM) with thermal management function based on genetic algorithm (GA), which is composed of ZnS/YbF<sub>3</sub>/Ge/Ge<sub>2</sub>Sb<sub>2</sub>Te<sub>5</sub> (GST)/Au multilayer film. Through numerical analysis, we assess its efficacy in visible-infrared compatibility camouflage and radiative heat dissipation. Within the visible light band, different structural colors can be produced by adjusting the thickness of the ZnS film. The average emissivity within the 3–5 μm and 8–14 μm infrared bands is measured at 0.04 and 0.14, respectively. The low emissivity facilitates effective thermal management. Moreover, an average emissivity of 0.52 within the 5–8 μm range is instrumental in achieving efficient radiation heat dissipation. Laser stealth capability is further enhanced, with an emissivity reaching 0.70 at 10.6 μm. Therefore, this metamaterial structure has broad application prospects in both military and civilian industrial fields.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207985"},"PeriodicalIF":2.7,"publicationDate":"2024-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142167207","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-09-08DOI: 10.1016/j.micrna.2024.207983
Ritika Sharma, Mayank Kumar Rai, Rajesh Khanna
This study explores the potential of randomly mixed carbon nanotube bundle (RMCB) as a viable on-chip interconnect. Achieving high-quality carbon nanotubes (CNTs) with uniform diameters is challenging for the current framework of enhanced fabrication techniques. The Stoyan and Yaskov technique is employed to optimize CNT arrangement within a specified rectangular area. This method accounts for statistical variation in CNT diameters, offering a more realistic and fabrication-focused approach to designing CNT bundle interconnects. Eight such practical RMCB structures (RMCB-50 to RMCB-350) are selected using this technique, each characterized by distinct CNT counts and variable diameters. Comprehensive average crosstalk-delay and reliability assessments are conducted by comparing different CNT bundle interconnects with the best-optimized RMCB (O-RMCB) interconnect, placed on various dielectric substrates such as SiO2, SiC, BN. The study unequivocally indicates that O-RMCB produces highly favorable results and stands as the most suitable future solution for VLSI circuits. Additionally, the thickness optimization of O-RMCB interconnect is explored, yielding in improvements in both performance and reliability compared to other well-known CNT bundled interconnects.
{"title":"Pragmatic structure optimization: Achieving optimal crosstalk delay and gate oxide reliability of randomly mixed CNT bundle interconnects","authors":"Ritika Sharma, Mayank Kumar Rai, Rajesh Khanna","doi":"10.1016/j.micrna.2024.207983","DOIUrl":"10.1016/j.micrna.2024.207983","url":null,"abstract":"<div><p>This study explores the potential of randomly mixed carbon nanotube bundle (RMCB) as a viable on-chip interconnect. Achieving high-quality carbon nanotubes (CNTs) with uniform diameters is challenging for the current framework of enhanced fabrication techniques. The Stoyan and Yaskov technique is employed to optimize CNT arrangement within a specified rectangular area. This method accounts for statistical variation in CNT diameters, offering a more realistic and fabrication-focused approach to designing CNT bundle interconnects. Eight such practical RMCB structures (RMCB-50 to RMCB-350) are selected using this technique, each characterized by distinct CNT counts and variable diameters. Comprehensive average crosstalk-delay and reliability assessments are conducted by comparing different CNT bundle interconnects with the best-optimized RMCB (O-RMCB) interconnect, placed on various dielectric substrates such as SiO<sub>2</sub>, SiC, BN. The study unequivocally indicates that O-RMCB produces highly favorable results and stands as the most suitable future solution for VLSI circuits. Additionally, the thickness optimization of O-RMCB interconnect is explored, yielding in improvements in both performance and reliability compared to other well-known CNT bundled interconnects.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207983"},"PeriodicalIF":2.7,"publicationDate":"2024-09-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142167206","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-09-07DOI: 10.1016/j.micrna.2024.207982
Zhongming Sun , Songtao Liu , Junbo Wang , Fang Si , Haiyun Hou , Xianjun Zheng , Jianjiang Liu , Chengyu Fang
In order to improve the gas-sensing performance of ZnO, a novel peony shaped ZnO stacked with nanosheets were prepared using hydrothermal method, and the obtained ZnO was characterized and tested for gas sensitivity. The results showed that the particle distribution of the peony shaped ZnO was uniform, with a particle size of about 0.8 μm. The gas-sensing response test results show that the peony shaped ZnO has excellent selectivity to ethanol gas. When the concentration of ethanol gas is 100 ppm, the gas-sensing response of the peony shaped ZnO to ethanol gas reaches 17.4, and the response time and recovery time are 8 s and 12 s, respectively. Even at an ethanol gas concentration of 2 ppm, the gas-sensing response of the peony shaped ZnO to ethanol gas can reach 2.1. Compared to existing literature reports, the peony shaped ZnO prepared in this paper has better gas-sensing performance. This study will provide data support and theoretical reference for the development of high-performance gas sensors.
{"title":"A novel peony shaped ZnO and its excellent ethanol gas-sensing performance","authors":"Zhongming Sun , Songtao Liu , Junbo Wang , Fang Si , Haiyun Hou , Xianjun Zheng , Jianjiang Liu , Chengyu Fang","doi":"10.1016/j.micrna.2024.207982","DOIUrl":"10.1016/j.micrna.2024.207982","url":null,"abstract":"<div><p>In order to improve the gas-sensing performance of ZnO, a novel peony shaped ZnO stacked with nanosheets were prepared using hydrothermal method, and the obtained ZnO was characterized and tested for gas sensitivity. The results showed that the particle distribution of the peony shaped ZnO was uniform, with a particle size of about 0.8 μm. The gas-sensing response test results show that the peony shaped ZnO has excellent selectivity to ethanol gas. When the concentration of ethanol gas is 100 ppm, the gas-sensing response of the peony shaped ZnO to ethanol gas reaches 17.4, and the response time and recovery time are 8 s and 12 s, respectively. Even at an ethanol gas concentration of 2 ppm, the gas-sensing response of the peony shaped ZnO to ethanol gas can reach 2.1. Compared to existing literature reports, the peony shaped ZnO prepared in this paper has better gas-sensing performance. This study will provide data support and theoretical reference for the development of high-performance gas sensors.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207982"},"PeriodicalIF":2.7,"publicationDate":"2024-09-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142162189","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-09-06DOI: 10.1016/j.micrna.2024.207974
Dharavath Parvathi, P Prithvi
This work presents a novel three-channel Tree-FET optimized for superior DC and analog performance metrics. The device structure features nanosheets with a width (NSWD) of 9 nm, a thickness (NSTH) of 5 nm, and interbidge dimensions of 8 nm in height (IBHT) and 5 nm in width (IBWD). The Tree-FET demonstrates an exceptional on/off current ratio of 107 through meticulous engineering, significantly outperforming conventional FET configurations. Our comprehensive study explores the effects of different spacer materials, including HfO2, Al2O3, Si3N4, and SiO2, across varied channel lengths. The superior dielectric properties of HfO2 contribute to fine-tuning the device's characteristics, making it a standout choice for optimizing performance. Out of all HfO2 has been found to perform exceptionally well, offering the best combination of electrostatic control and minimized leakage currents. Because the Tree-FET has better electrostatic integrity and can keep working well with different spacer materials and channel lengths, it has much potential as a flexible and valuable part for next-generation semiconductor devices. The promising DC and analog metrics achieved through this novel design pave the way for developing more compact, high-performance electronic components.
{"title":"Innovative Spacer material integration in Tree-FETs for enhanced performance across Variable channel lengths","authors":"Dharavath Parvathi, P Prithvi","doi":"10.1016/j.micrna.2024.207974","DOIUrl":"10.1016/j.micrna.2024.207974","url":null,"abstract":"<div><p>This work presents a novel three-channel Tree-FET optimized for superior DC and analog performance metrics. The device structure features nanosheets with a width (NS<sub>WD</sub>) of 9 nm, a thickness (NS<sub>TH</sub>) of 5 nm, and interbidge dimensions of 8 nm in height (IB<sub>HT</sub>) and 5 nm in width (IB<sub>WD</sub>). The Tree-FET demonstrates an exceptional on/off current ratio of 10<sup>7</sup> through meticulous engineering, significantly outperforming conventional FET configurations. Our comprehensive study explores the effects of different spacer materials, including HfO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>, Si<sub>3</sub>N<sub>4</sub>, and SiO<sub>2</sub>, across varied channel lengths. The superior dielectric properties of HfO<sub>2</sub> contribute to fine-tuning the device's characteristics, making it a standout choice for optimizing performance. Out of all HfO<sub>2</sub> has been found to perform exceptionally well, offering the best combination of electrostatic control and minimized leakage currents. Because the Tree-FET has better electrostatic integrity and can keep working well with different spacer materials and channel lengths, it has much potential as a flexible and valuable part for next-generation semiconductor devices. The promising DC and analog metrics achieved through this novel design pave the way for developing more compact, high-performance electronic components.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207974"},"PeriodicalIF":2.7,"publicationDate":"2024-09-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142157989","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-31DOI: 10.1016/j.micrna.2024.207972
Hujun Jia, Wanli Yang, Weitao Cao, Linna Zhao, Qiyu Su, Xingyu Wei, Zhen Cao, Yintang Yang
A dielectric modulated embedded gate gate-all-around fin field-effect transistor (EGGAA-FinFET) has been proposed for label-free detection applications of biomolecules in this article. The design expands the biomolecule capture area by establishing a cavity below the embedded gate. The performance of EGGAA-FinFET and FinFET biosensors is analyzed in a comprehensive comparison in terms of electrical performance, sensitivity and selectivity. Some important biosensing characteristics for EGGAA-FinFET (FinFET) have been calculated to be 0.43 V (0.32 V) for threshold voltage sensitivity, 2.22 × 106 (8.32 × 104) for current switching ratio sensitivity, and 0.75 (0.65) for subthreshold swing sensitivity. To determine the optimal structure of the biosensor, the effect of structural parameters on sensitivity is investigated. In addition, the effect of the filling factor on the biosensor is considered. The real-world performance of biosensors is assessed using the linearity parameter, showing that the EGGAA-FinFET biosensor has better noise resistance compared to the FinFET biosensor.
{"title":"An embedded gate gate-all-around FinFET for biosensing application","authors":"Hujun Jia, Wanli Yang, Weitao Cao, Linna Zhao, Qiyu Su, Xingyu Wei, Zhen Cao, Yintang Yang","doi":"10.1016/j.micrna.2024.207972","DOIUrl":"10.1016/j.micrna.2024.207972","url":null,"abstract":"<div><p>A dielectric modulated embedded gate gate-all-around fin field-effect transistor (EGGAA-FinFET) has been proposed for label-free detection applications of biomolecules in this article. The design expands the biomolecule capture area by establishing a cavity below the embedded gate. The performance of EGGAA-FinFET and FinFET biosensors is analyzed in a comprehensive comparison in terms of electrical performance, sensitivity and selectivity. Some important biosensing characteristics for EGGAA-FinFET (FinFET) have been calculated to be 0.43 V (0.32 V) for threshold voltage sensitivity, 2.22 × 10<sup>6</sup> (8.32 × 10<sup>4</sup>) for current switching ratio sensitivity, and 0.75 (0.65) for subthreshold swing sensitivity. To determine the optimal structure of the biosensor, the effect of structural parameters on sensitivity is investigated. In addition, the effect of the filling factor on the biosensor is considered. The real-world performance of biosensors is assessed using the linearity parameter, showing that the EGGAA-FinFET biosensor has better noise resistance compared to the FinFET biosensor.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207972"},"PeriodicalIF":2.7,"publicationDate":"2024-08-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142229455","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-31DOI: 10.1016/j.micrna.2024.207973
Tajinder Kaur , Aashish Kumar , Mayank Kumar Rai
A frequency-domain model is developed to analyze isolated interconnects of multilayer graphene-nanoribbon (MLGNR) and mixed carbon-nanotube bundle (MCB) driven by CMOS gates. The model derived is founded on an equivalent-single-conductor model of MLGNR and MCB that takes thermal considerations into account (i.e. TD-ESC). The model includes the derivation of transfer function of interconnect to estimate its delay and bandwidth performance. The attained results, reveals that among the neutral MLGNR (N-MLGNR), intercalation doped MLGNR (ID-MLGNR) intercalated with FeCl3, MCB and Cu interconnects, FeCl3 ID-MLGNR achieves the best bandwidth efficiency. At a global interconnect length of 1 mm, FeCl3 ID-MLGNR outperforms N-MLGNR, MCB, and Cu in terms of bandwidth with an improved bandwidth value of 12.2 GHz, 7 GHz, and 61.4 GHz, respectively. Further, employing the proposed CMOS-gate-driven model, for FeCl3 ID-MLGNR, bandwidth is improved by nearly 7.52 × at global length (∼1 mm) in relation to the linear resistance model. Additionally, TD-ESC dependency of the proposed model reveals that FeCl3 ID-MLGNR becomes more stable as interconnect resistance increases.
{"title":"Frequency-domain analysis of CMOS-driven interconnects utilizing doped multilayer graphene nanoribbons and mixed carbon nanotube bundles","authors":"Tajinder Kaur , Aashish Kumar , Mayank Kumar Rai","doi":"10.1016/j.micrna.2024.207973","DOIUrl":"10.1016/j.micrna.2024.207973","url":null,"abstract":"<div><p>A frequency-domain model is developed to analyze isolated interconnects of multilayer graphene-nanoribbon (MLGNR) and mixed carbon-nanotube bundle (MCB) driven by CMOS gates. The model derived is founded on an equivalent-single-conductor model of MLGNR and MCB that takes thermal considerations into account (i.e. TD-ESC). The model includes the derivation of transfer function of interconnect to estimate its delay and bandwidth performance. The attained results, reveals that among the neutral MLGNR (N-MLGNR), intercalation doped MLGNR (ID-MLGNR) intercalated with FeCl<sub>3</sub>, MCB and <em>Cu</em> interconnects, FeCl<sub>3</sub> ID-MLGNR achieves the best bandwidth efficiency. At a global interconnect length of 1 mm, FeCl<sub>3</sub> ID-MLGNR outperforms N-MLGNR, MCB, and <em>Cu</em> in terms of bandwidth with an improved bandwidth value of 12.2 GHz, 7 GHz, and 61.4 GHz, respectively. Further, employing the proposed CMOS-gate-driven model, for FeCl<sub>3</sub> ID-MLGNR, bandwidth is improved by nearly 7.52 × at global length (∼1 mm) in relation to the linear resistance model. Additionally, TD-ESC dependency of the proposed model reveals that FeCl<sub>3</sub> ID-MLGNR becomes more stable as interconnect resistance increases.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207973"},"PeriodicalIF":2.7,"publicationDate":"2024-08-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142136542","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
In this paper, an enhancement-mode (E-mode) NiO/β-Ga2O3 heterojunction field-effect transistor (HJ-FET) with high conduction band offset (ΔEC) and thin recessed channel is proposed and studied by Sentaurus TCAD. Different from the existing HJ-FET with low ΔEC alignment, the High ΔEC HJ-FET can achieve a much lower on-resistance (Ron) due to the strong electron confinement effect. More importantly, the disadvantage in the threshold voltage (Vth) is compensated by reducing the thickness of the recessed channel, maintaining an almost unchanged Ron with the help of the special surface conduction channel. Compared with the corresponding Low ΔEC HJ-FET, at the same Vth ( 0.82 V), the Ron is decreased from 135 Ω/mm to 90.7 Ω/mm and the maximum drain current is increased from 14.9 mA/mm to 83.1 mA/mm. By adding a top p-NiO layer for further optimization, a greatly improved power figure of merit (P-FOM) of 2.29 GW/cm2 is achieved among the E-mode HJ-FETs. These results show that the proposed High ΔEC HJ-FET with thin recessed channel is probably a better choice to achieve the high-performance E-mode lateral HJ-FET.
{"title":"High performance E-mode NiO/β-Ga2O3 HJ-FET with high conduction band offset and thin recessed channel","authors":"Jiaweiwen Huang , Wensuo Chen , Shenglei Zhao , Qisheng Yu , Aohang Zhang , Kunfeng Zhu , Jian Li","doi":"10.1016/j.micrna.2024.207963","DOIUrl":"10.1016/j.micrna.2024.207963","url":null,"abstract":"<div><p>In this paper, an enhancement-mode (E-mode) NiO/β-Ga<sub>2</sub>O<sub>3</sub> heterojunction field-effect transistor (HJ-FET) with high conduction band offset (Δ<em>E</em><sub>C</sub>) and thin recessed channel is proposed and studied by Sentaurus TCAD. Different from the existing HJ-FET with low Δ<em>E</em><sub>C</sub> alignment, the High Δ<em>E</em><sub>C</sub> HJ-FET can achieve a much lower on-resistance (<em>R</em><sub>on</sub>) due to the strong electron confinement effect. More importantly, the disadvantage in the threshold voltage (<em>V</em><sub>th</sub>) is compensated by reducing the thickness of the recessed channel, maintaining an almost unchanged <em>R</em><sub>on</sub> with the help of the special surface conduction channel. Compared with the corresponding Low Δ<em>E</em><sub>C</sub> HJ-FET, at the same <em>V</em><sub>th</sub> (<span><math><mrow><mo>∼</mo></mrow></math></span> 0.82 V), the <em>R</em><sub>on</sub> is decreased from 135 Ω/mm to 90.7 Ω/mm and the maximum drain current is increased from 14.9 mA/mm to 83.1 mA/mm. By adding a top <em>p</em>-NiO layer for further optimization, a greatly improved power figure of merit (P-FOM) of 2.29 GW/cm<sup>2</sup> is achieved among the E-mode HJ-FETs. These results show that the proposed High Δ<em>E</em><sub>C</sub> HJ-FET with thin recessed channel is probably a better choice to achieve the high-performance E-mode lateral HJ-FET.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207963"},"PeriodicalIF":2.7,"publicationDate":"2024-08-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142136543","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-26DOI: 10.1016/j.micrna.2024.207962
Hujun Jia, Linna Zhao, Qiyu Su, Weitao Cao, Wanli Yang, Xingyu Wei, Zhen Cao, Yintang Yang
In this paper, a Schottky barrier field effect transistor biosensor with dual-source, dual-drain, and a suspended beam channel (DSDD-SB-FET) is proposed and its biosensor performance is investigated by simulation. The simulation results show that compared with the conventional 6H–SiC Schottky barrier field effect transistor (6H-SiC-SB-FET) biosensor, the new structure proposed in this paper has superior sensitivity characteristics. The SIon is 1.83 × 108, Sgm,max is 1.44 × 108, SIon/Ioff is 1.53 × 107, and SSS is 83 % at K = 12, which are respectively 554 times, 476 times, 2.76 × 104 times, and 61 % higher than those of the 6H-SiC-SB-FET. In addition, we also investigate the effects of non-ideal filling conditions and temperature variations on its performance in practical applications, and conclude that the DSDD-SB-FET biosensor has excellent sensing performance in practical applications as well.
{"title":"Design of a 4H–SiC Schottky barrier FET biosensor with dual-source and dual-drain on suspended beam channel","authors":"Hujun Jia, Linna Zhao, Qiyu Su, Weitao Cao, Wanli Yang, Xingyu Wei, Zhen Cao, Yintang Yang","doi":"10.1016/j.micrna.2024.207962","DOIUrl":"10.1016/j.micrna.2024.207962","url":null,"abstract":"<div><p>In this paper, a Schottky barrier field effect transistor biosensor with dual-source, dual-drain, and a suspended beam channel (DSDD-SB-FET) is proposed and its biosensor performance is investigated by simulation. The simulation results show that compared with the conventional 6H–SiC Schottky barrier field effect transistor (6H-SiC-SB-FET) biosensor, the new structure proposed in this paper has superior sensitivity characteristics. The S<sub>Ion</sub> is 1.83 × 10<sup>8</sup>, S<sub>gm,max</sub> is 1.44 × 10<sup>8</sup>, S<sub>Ion/Ioff</sub> is 1.53 × 10<sup>7</sup>, and S<sub>SS</sub> is 83 % at K = 12, which are respectively 554 times, 476 times, 2.76 × 10<sup>4</sup> times, and 61 % higher than those of the 6H-SiC-SB-FET. In addition, we also investigate the effects of non-ideal filling conditions and temperature variations on its performance in practical applications, and conclude that the DSDD-SB-FET biosensor has excellent sensing performance in practical applications as well.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207962"},"PeriodicalIF":2.7,"publicationDate":"2024-08-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142088942","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-24DOI: 10.1016/j.micrna.2024.207959
Yu Diao , Sihao Xia
In this work, the effect of p-type doping on the structural, electronic, and optical properties of AlxGa1-xAs nanowires are investigated by first-principles calculations. Different doping elements (Be, Mg, Zn), doping methods (interstitial and substitution doping) and doping concentration are considered. The calculations of formation energy suggest that the structural stability of p-type AlxGa1-xAs nanowires is gradually weaken as the rise of doping concentration and Al composition. Besides, the difficulty of forming substitution doping for different doping elements obeys the following order: Be < Mg < Zn. In addition, the substitution doping atom tends to replace Ga atom rather than Al atom to form substitution doping structure. After substitution doping, all energy bands shift to higher energy region due to the orbital hybridization of electronic states induced by impurity atom and nanowire atoms. Moreover, the substitution doping leads to the Fermi level entering into the valence band, resulting in obviously p-type conductivity. The p-type modulation doping is indeed effective in the axial type AlxGa1-xAs nanowires with p-type carrier concentration varying between 1.85 × 1020 cm−3 and 4.42 × 1020 cm−3, and the conductivity will be further enhanced with increasing substitution doping concentration or Al composition. Finally, the optical absorption of AlxGa1-xAs nanowire photocathodes can be effectively enhanced through BeGa doping. Our findings not only present a comprehensive understanding of p-type doping mechanism of AlxGa1-xAs nanowires, but also provide a theoretical basis for preparing AlxGa1-xAs nanowire based photoelectric devices with p-type properties.
本文通过第一原理计算研究了 p 型掺杂对 AlxGa1-xAs 纳米线的结构、电子和光学特性的影响。考虑了不同的掺杂元素(Be、Mg、Zn)、掺杂方法(间隙掺杂和置换掺杂)和掺杂浓度。形成能的计算表明,随着掺杂浓度和铝成分的增加,p 型 AlxGa1-xAs 纳米线的结构稳定性逐渐减弱。此外,不同掺杂元素形成替代掺杂的难度服从以下顺序:Be < Mg < Zn。此外,取代掺杂原子倾向于取代 Ga 原子而不是 Al 原子,从而形成取代掺杂结构。替代掺杂后,由于杂质原子和纳米线原子诱导的电子态轨道杂化,所有能带都向高能区移动。此外,置换掺杂导致费米级进入价带,从而产生明显的 p 型导电性。在轴向型 AlxGa1-xAs 纳米线中,p 型载流子浓度在 1.85 × 1020 cm-3 和 4.42 × 1020 cm-3 之间,p 型调制掺杂确实有效。最后,AlxGa1-xAs 纳米线光电阴极的光吸收可以通过掺杂 BeGa 得到有效增强。我们的研究结果不仅全面揭示了 AlxGa1-xAs 纳米线的 p 型掺杂机理,而且为制备具有 p 型特性的 AlxGa1-xAs 纳米线光电器件提供了理论依据。
{"title":"P-type doped AlxGa1-xAs nanowire photocathode: A theoretical perspective on structural and optoelectronic properties","authors":"Yu Diao , Sihao Xia","doi":"10.1016/j.micrna.2024.207959","DOIUrl":"10.1016/j.micrna.2024.207959","url":null,"abstract":"<div><p>In this work, the effect of p-type doping on the structural, electronic, and optical properties of Al<sub>x</sub>Ga<sub>1-x</sub>As nanowires are investigated by first-principles calculations. Different doping elements (Be, Mg, Zn), doping methods (interstitial and substitution doping) and doping concentration are considered. The calculations of formation energy suggest that the structural stability of p-type Al<sub>x</sub>Ga<sub>1-x</sub>As nanowires is gradually weaken as the rise of doping concentration and Al composition. Besides, the difficulty of forming substitution doping for different doping elements obeys the following order: Be < Mg < Zn. In addition, the substitution doping atom tends to replace Ga atom rather than Al atom to form substitution doping structure. After substitution doping, all energy bands shift to higher energy region due to the orbital hybridization of electronic states induced by impurity atom and nanowire atoms. Moreover, the substitution doping leads to the Fermi level entering into the valence band, resulting in obviously p-type conductivity. The p-type modulation doping is indeed effective in the axial type Al<sub>x</sub>Ga<sub>1-x</sub>As nanowires with p-type carrier concentration varying between 1.85 × 10<sup>20</sup> cm<sup>−3</sup> and 4.42 × 10<sup>20</sup> cm<sup>−3</sup>, and the conductivity will be further enhanced with increasing substitution doping concentration or Al composition. Finally, the optical absorption of Al<sub>x</sub>Ga<sub>1-x</sub>As nanowire photocathodes can be effectively enhanced through Be<sub>Ga</sub> doping. Our findings not only present a comprehensive understanding of p-type doping mechanism of Al<sub>x</sub>Ga<sub>1-x</sub>As nanowires, but also provide a theoretical basis for preparing Al<sub>x</sub>Ga<sub>1-x</sub>As nanowire based photoelectric devices with p-type properties.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207959"},"PeriodicalIF":2.7,"publicationDate":"2024-08-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142075937","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-24DOI: 10.1016/j.micrna.2024.207961
Kallolini Banerjee , Abhijit Biswas
We investigate the digital, analog/RF, and linearity performance of four CP FinFETs distinguished by spacer layers: (i) single low-k spacer on both sides of the gate (D1), (ii) single high-k spacer on both sides of the gate (D2), (iii) a combination of high-k spacer and air on the source side and high-k spacer on the drain side (D3), and (iv) a combination of high-k spacer and air symmetrically placed on both sides of the gate (D4) at 10 nm technology node. Our results highlight the superior digital performance of the D4 device, demonstrating significant enhancements in various analog/RF figures of merit (FOMs) including transconductance, transconductance efficiency, unity gain cut-off frequency (FT), and gain bandwidth product (GBP). Notably, the D4 device exhibits a remarkable 256 % improvement in FT and a substantial 456.13 % enhancement in GBP compared to D1. Additionally, we analyze linearity and intermodulation distortion performance, suggesting the D4 device as the optimal architecture for high-performance digital and analog/RF applications.
我们对四种 CP FinFET 的数字、模拟/射频和线性度性能进行了研究,这四种 CP FinFET 采用了不同的间隔层:(i) 栅极两侧的单个低 k 间隔层 (D1);(ii) 栅极两侧的单个高 k 间隔层 (D2);(iii) 源极侧高 k 间隔层和空气的组合以及漏极侧高 k 间隔层 (D3);(iv) 栅极两侧对称放置的高 k 间隔层和空气的组合 (D4)。我们的研究结果凸显了 D4 器件卓越的数字性能,在各种模拟/射频性能指标 (FOM) 方面都有显著提高,包括跨导、跨导效率、统一增益截止频率 (FT) 和增益带宽乘积 (GBP)。值得注意的是,与 D1 器件相比,D4 器件的 FT 和 GBP 分别显著提高了 256% 和 456.13%。此外,我们还分析了线性和互调失真性能,认为 D4 器件是高性能数字和模拟/射频应用的最佳架构。
{"title":"Improvement of digital, analog/RF and linearity performances of charge plasma based junctionless FinFET through spacer layer engineering","authors":"Kallolini Banerjee , Abhijit Biswas","doi":"10.1016/j.micrna.2024.207961","DOIUrl":"10.1016/j.micrna.2024.207961","url":null,"abstract":"<div><p>We investigate the digital, analog/RF, and linearity performance of four CP FinFETs distinguished by spacer layers: (i) single low-k spacer on both sides of the gate (D<sub>1</sub>), (ii) single high-k spacer on both sides of the gate (D<sub>2</sub>), (iii) a combination of high-k spacer and air on the source side and high-k spacer on the drain side (D<sub>3</sub>), and (iv) a combination of high-k spacer and air symmetrically placed on both sides of the gate (D<sub>4</sub>) at 10 nm technology node. Our results highlight the superior digital performance of the D<sub>4</sub> device, demonstrating significant enhancements in various analog/RF figures of merit (FOMs) including transconductance, transconductance efficiency, unity gain cut-off frequency (F<sub>T</sub>), and gain bandwidth product (GBP). Notably, the D<sub>4</sub> device exhibits a remarkable 256 % improvement in F<sub>T</sub> and a substantial 456.13 % enhancement in GBP compared to D<sub>1</sub>. Additionally, we analyze linearity and intermodulation distortion performance, suggesting the D<sub>4</sub> device as the optimal architecture for high-performance digital and analog/RF applications.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207961"},"PeriodicalIF":2.7,"publicationDate":"2024-08-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142099490","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}