Pub Date : 2024-09-06DOI: 10.1016/j.micrna.2024.207974
Dharavath Parvathi, P Prithvi
This work presents a novel three-channel Tree-FET optimized for superior DC and analog performance metrics. The device structure features nanosheets with a width (NSWD) of 9 nm, a thickness (NSTH) of 5 nm, and interbidge dimensions of 8 nm in height (IBHT) and 5 nm in width (IBWD). The Tree-FET demonstrates an exceptional on/off current ratio of 107 through meticulous engineering, significantly outperforming conventional FET configurations. Our comprehensive study explores the effects of different spacer materials, including HfO2, Al2O3, Si3N4, and SiO2, across varied channel lengths. The superior dielectric properties of HfO2 contribute to fine-tuning the device's characteristics, making it a standout choice for optimizing performance. Out of all HfO2 has been found to perform exceptionally well, offering the best combination of electrostatic control and minimized leakage currents. Because the Tree-FET has better electrostatic integrity and can keep working well with different spacer materials and channel lengths, it has much potential as a flexible and valuable part for next-generation semiconductor devices. The promising DC and analog metrics achieved through this novel design pave the way for developing more compact, high-performance electronic components.
{"title":"Innovative Spacer material integration in Tree-FETs for enhanced performance across Variable channel lengths","authors":"Dharavath Parvathi, P Prithvi","doi":"10.1016/j.micrna.2024.207974","DOIUrl":"10.1016/j.micrna.2024.207974","url":null,"abstract":"<div><p>This work presents a novel three-channel Tree-FET optimized for superior DC and analog performance metrics. The device structure features nanosheets with a width (NS<sub>WD</sub>) of 9 nm, a thickness (NS<sub>TH</sub>) of 5 nm, and interbidge dimensions of 8 nm in height (IB<sub>HT</sub>) and 5 nm in width (IB<sub>WD</sub>). The Tree-FET demonstrates an exceptional on/off current ratio of 10<sup>7</sup> through meticulous engineering, significantly outperforming conventional FET configurations. Our comprehensive study explores the effects of different spacer materials, including HfO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>, Si<sub>3</sub>N<sub>4</sub>, and SiO<sub>2</sub>, across varied channel lengths. The superior dielectric properties of HfO<sub>2</sub> contribute to fine-tuning the device's characteristics, making it a standout choice for optimizing performance. Out of all HfO<sub>2</sub> has been found to perform exceptionally well, offering the best combination of electrostatic control and minimized leakage currents. Because the Tree-FET has better electrostatic integrity and can keep working well with different spacer materials and channel lengths, it has much potential as a flexible and valuable part for next-generation semiconductor devices. The promising DC and analog metrics achieved through this novel design pave the way for developing more compact, high-performance electronic components.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207974"},"PeriodicalIF":2.7,"publicationDate":"2024-09-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142157989","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-31DOI: 10.1016/j.micrna.2024.207972
Hujun Jia, Wanli Yang, Weitao Cao, Linna Zhao, Qiyu Su, Xingyu Wei, Zhen Cao, Yintang Yang
A dielectric modulated embedded gate gate-all-around fin field-effect transistor (EGGAA-FinFET) has been proposed for label-free detection applications of biomolecules in this article. The design expands the biomolecule capture area by establishing a cavity below the embedded gate. The performance of EGGAA-FinFET and FinFET biosensors is analyzed in a comprehensive comparison in terms of electrical performance, sensitivity and selectivity. Some important biosensing characteristics for EGGAA-FinFET (FinFET) have been calculated to be 0.43 V (0.32 V) for threshold voltage sensitivity, 2.22 × 106 (8.32 × 104) for current switching ratio sensitivity, and 0.75 (0.65) for subthreshold swing sensitivity. To determine the optimal structure of the biosensor, the effect of structural parameters on sensitivity is investigated. In addition, the effect of the filling factor on the biosensor is considered. The real-world performance of biosensors is assessed using the linearity parameter, showing that the EGGAA-FinFET biosensor has better noise resistance compared to the FinFET biosensor.
{"title":"An embedded gate gate-all-around FinFET for biosensing application","authors":"Hujun Jia, Wanli Yang, Weitao Cao, Linna Zhao, Qiyu Su, Xingyu Wei, Zhen Cao, Yintang Yang","doi":"10.1016/j.micrna.2024.207972","DOIUrl":"10.1016/j.micrna.2024.207972","url":null,"abstract":"<div><p>A dielectric modulated embedded gate gate-all-around fin field-effect transistor (EGGAA-FinFET) has been proposed for label-free detection applications of biomolecules in this article. The design expands the biomolecule capture area by establishing a cavity below the embedded gate. The performance of EGGAA-FinFET and FinFET biosensors is analyzed in a comprehensive comparison in terms of electrical performance, sensitivity and selectivity. Some important biosensing characteristics for EGGAA-FinFET (FinFET) have been calculated to be 0.43 V (0.32 V) for threshold voltage sensitivity, 2.22 × 10<sup>6</sup> (8.32 × 10<sup>4</sup>) for current switching ratio sensitivity, and 0.75 (0.65) for subthreshold swing sensitivity. To determine the optimal structure of the biosensor, the effect of structural parameters on sensitivity is investigated. In addition, the effect of the filling factor on the biosensor is considered. The real-world performance of biosensors is assessed using the linearity parameter, showing that the EGGAA-FinFET biosensor has better noise resistance compared to the FinFET biosensor.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207972"},"PeriodicalIF":2.7,"publicationDate":"2024-08-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142229455","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-31DOI: 10.1016/j.micrna.2024.207973
Tajinder Kaur , Aashish Kumar , Mayank Kumar Rai
A frequency-domain model is developed to analyze isolated interconnects of multilayer graphene-nanoribbon (MLGNR) and mixed carbon-nanotube bundle (MCB) driven by CMOS gates. The model derived is founded on an equivalent-single-conductor model of MLGNR and MCB that takes thermal considerations into account (i.e. TD-ESC). The model includes the derivation of transfer function of interconnect to estimate its delay and bandwidth performance. The attained results, reveals that among the neutral MLGNR (N-MLGNR), intercalation doped MLGNR (ID-MLGNR) intercalated with FeCl3, MCB and Cu interconnects, FeCl3 ID-MLGNR achieves the best bandwidth efficiency. At a global interconnect length of 1 mm, FeCl3 ID-MLGNR outperforms N-MLGNR, MCB, and Cu in terms of bandwidth with an improved bandwidth value of 12.2 GHz, 7 GHz, and 61.4 GHz, respectively. Further, employing the proposed CMOS-gate-driven model, for FeCl3 ID-MLGNR, bandwidth is improved by nearly 7.52 × at global length (∼1 mm) in relation to the linear resistance model. Additionally, TD-ESC dependency of the proposed model reveals that FeCl3 ID-MLGNR becomes more stable as interconnect resistance increases.
{"title":"Frequency-domain analysis of CMOS-driven interconnects utilizing doped multilayer graphene nanoribbons and mixed carbon nanotube bundles","authors":"Tajinder Kaur , Aashish Kumar , Mayank Kumar Rai","doi":"10.1016/j.micrna.2024.207973","DOIUrl":"10.1016/j.micrna.2024.207973","url":null,"abstract":"<div><p>A frequency-domain model is developed to analyze isolated interconnects of multilayer graphene-nanoribbon (MLGNR) and mixed carbon-nanotube bundle (MCB) driven by CMOS gates. The model derived is founded on an equivalent-single-conductor model of MLGNR and MCB that takes thermal considerations into account (i.e. TD-ESC). The model includes the derivation of transfer function of interconnect to estimate its delay and bandwidth performance. The attained results, reveals that among the neutral MLGNR (N-MLGNR), intercalation doped MLGNR (ID-MLGNR) intercalated with FeCl<sub>3</sub>, MCB and <em>Cu</em> interconnects, FeCl<sub>3</sub> ID-MLGNR achieves the best bandwidth efficiency. At a global interconnect length of 1 mm, FeCl<sub>3</sub> ID-MLGNR outperforms N-MLGNR, MCB, and <em>Cu</em> in terms of bandwidth with an improved bandwidth value of 12.2 GHz, 7 GHz, and 61.4 GHz, respectively. Further, employing the proposed CMOS-gate-driven model, for FeCl<sub>3</sub> ID-MLGNR, bandwidth is improved by nearly 7.52 × at global length (∼1 mm) in relation to the linear resistance model. Additionally, TD-ESC dependency of the proposed model reveals that FeCl<sub>3</sub> ID-MLGNR becomes more stable as interconnect resistance increases.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207973"},"PeriodicalIF":2.7,"publicationDate":"2024-08-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142136542","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
In this paper, an enhancement-mode (E-mode) NiO/β-Ga2O3 heterojunction field-effect transistor (HJ-FET) with high conduction band offset (ΔEC) and thin recessed channel is proposed and studied by Sentaurus TCAD. Different from the existing HJ-FET with low ΔEC alignment, the High ΔEC HJ-FET can achieve a much lower on-resistance (Ron) due to the strong electron confinement effect. More importantly, the disadvantage in the threshold voltage (Vth) is compensated by reducing the thickness of the recessed channel, maintaining an almost unchanged Ron with the help of the special surface conduction channel. Compared with the corresponding Low ΔEC HJ-FET, at the same Vth ( 0.82 V), the Ron is decreased from 135 Ω/mm to 90.7 Ω/mm and the maximum drain current is increased from 14.9 mA/mm to 83.1 mA/mm. By adding a top p-NiO layer for further optimization, a greatly improved power figure of merit (P-FOM) of 2.29 GW/cm2 is achieved among the E-mode HJ-FETs. These results show that the proposed High ΔEC HJ-FET with thin recessed channel is probably a better choice to achieve the high-performance E-mode lateral HJ-FET.
{"title":"High performance E-mode NiO/β-Ga2O3 HJ-FET with high conduction band offset and thin recessed channel","authors":"Jiaweiwen Huang , Wensuo Chen , Shenglei Zhao , Qisheng Yu , Aohang Zhang , Kunfeng Zhu , Jian Li","doi":"10.1016/j.micrna.2024.207963","DOIUrl":"10.1016/j.micrna.2024.207963","url":null,"abstract":"<div><p>In this paper, an enhancement-mode (E-mode) NiO/β-Ga<sub>2</sub>O<sub>3</sub> heterojunction field-effect transistor (HJ-FET) with high conduction band offset (Δ<em>E</em><sub>C</sub>) and thin recessed channel is proposed and studied by Sentaurus TCAD. Different from the existing HJ-FET with low Δ<em>E</em><sub>C</sub> alignment, the High Δ<em>E</em><sub>C</sub> HJ-FET can achieve a much lower on-resistance (<em>R</em><sub>on</sub>) due to the strong electron confinement effect. More importantly, the disadvantage in the threshold voltage (<em>V</em><sub>th</sub>) is compensated by reducing the thickness of the recessed channel, maintaining an almost unchanged <em>R</em><sub>on</sub> with the help of the special surface conduction channel. Compared with the corresponding Low Δ<em>E</em><sub>C</sub> HJ-FET, at the same <em>V</em><sub>th</sub> (<span><math><mrow><mo>∼</mo></mrow></math></span> 0.82 V), the <em>R</em><sub>on</sub> is decreased from 135 Ω/mm to 90.7 Ω/mm and the maximum drain current is increased from 14.9 mA/mm to 83.1 mA/mm. By adding a top <em>p</em>-NiO layer for further optimization, a greatly improved power figure of merit (P-FOM) of 2.29 GW/cm<sup>2</sup> is achieved among the E-mode HJ-FETs. These results show that the proposed High Δ<em>E</em><sub>C</sub> HJ-FET with thin recessed channel is probably a better choice to achieve the high-performance E-mode lateral HJ-FET.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207963"},"PeriodicalIF":2.7,"publicationDate":"2024-08-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142136543","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-26DOI: 10.1016/j.micrna.2024.207962
Hujun Jia, Linna Zhao, Qiyu Su, Weitao Cao, Wanli Yang, Xingyu Wei, Zhen Cao, Yintang Yang
In this paper, a Schottky barrier field effect transistor biosensor with dual-source, dual-drain, and a suspended beam channel (DSDD-SB-FET) is proposed and its biosensor performance is investigated by simulation. The simulation results show that compared with the conventional 6H–SiC Schottky barrier field effect transistor (6H-SiC-SB-FET) biosensor, the new structure proposed in this paper has superior sensitivity characteristics. The SIon is 1.83 × 108, Sgm,max is 1.44 × 108, SIon/Ioff is 1.53 × 107, and SSS is 83 % at K = 12, which are respectively 554 times, 476 times, 2.76 × 104 times, and 61 % higher than those of the 6H-SiC-SB-FET. In addition, we also investigate the effects of non-ideal filling conditions and temperature variations on its performance in practical applications, and conclude that the DSDD-SB-FET biosensor has excellent sensing performance in practical applications as well.
{"title":"Design of a 4H–SiC Schottky barrier FET biosensor with dual-source and dual-drain on suspended beam channel","authors":"Hujun Jia, Linna Zhao, Qiyu Su, Weitao Cao, Wanli Yang, Xingyu Wei, Zhen Cao, Yintang Yang","doi":"10.1016/j.micrna.2024.207962","DOIUrl":"10.1016/j.micrna.2024.207962","url":null,"abstract":"<div><p>In this paper, a Schottky barrier field effect transistor biosensor with dual-source, dual-drain, and a suspended beam channel (DSDD-SB-FET) is proposed and its biosensor performance is investigated by simulation. The simulation results show that compared with the conventional 6H–SiC Schottky barrier field effect transistor (6H-SiC-SB-FET) biosensor, the new structure proposed in this paper has superior sensitivity characteristics. The S<sub>Ion</sub> is 1.83 × 10<sup>8</sup>, S<sub>gm,max</sub> is 1.44 × 10<sup>8</sup>, S<sub>Ion/Ioff</sub> is 1.53 × 10<sup>7</sup>, and S<sub>SS</sub> is 83 % at K = 12, which are respectively 554 times, 476 times, 2.76 × 10<sup>4</sup> times, and 61 % higher than those of the 6H-SiC-SB-FET. In addition, we also investigate the effects of non-ideal filling conditions and temperature variations on its performance in practical applications, and conclude that the DSDD-SB-FET biosensor has excellent sensing performance in practical applications as well.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207962"},"PeriodicalIF":2.7,"publicationDate":"2024-08-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142088942","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-24DOI: 10.1016/j.micrna.2024.207959
Yu Diao , Sihao Xia
In this work, the effect of p-type doping on the structural, electronic, and optical properties of AlxGa1-xAs nanowires are investigated by first-principles calculations. Different doping elements (Be, Mg, Zn), doping methods (interstitial and substitution doping) and doping concentration are considered. The calculations of formation energy suggest that the structural stability of p-type AlxGa1-xAs nanowires is gradually weaken as the rise of doping concentration and Al composition. Besides, the difficulty of forming substitution doping for different doping elements obeys the following order: Be < Mg < Zn. In addition, the substitution doping atom tends to replace Ga atom rather than Al atom to form substitution doping structure. After substitution doping, all energy bands shift to higher energy region due to the orbital hybridization of electronic states induced by impurity atom and nanowire atoms. Moreover, the substitution doping leads to the Fermi level entering into the valence band, resulting in obviously p-type conductivity. The p-type modulation doping is indeed effective in the axial type AlxGa1-xAs nanowires with p-type carrier concentration varying between 1.85 × 1020 cm−3 and 4.42 × 1020 cm−3, and the conductivity will be further enhanced with increasing substitution doping concentration or Al composition. Finally, the optical absorption of AlxGa1-xAs nanowire photocathodes can be effectively enhanced through BeGa doping. Our findings not only present a comprehensive understanding of p-type doping mechanism of AlxGa1-xAs nanowires, but also provide a theoretical basis for preparing AlxGa1-xAs nanowire based photoelectric devices with p-type properties.
本文通过第一原理计算研究了 p 型掺杂对 AlxGa1-xAs 纳米线的结构、电子和光学特性的影响。考虑了不同的掺杂元素(Be、Mg、Zn)、掺杂方法(间隙掺杂和置换掺杂)和掺杂浓度。形成能的计算表明,随着掺杂浓度和铝成分的增加,p 型 AlxGa1-xAs 纳米线的结构稳定性逐渐减弱。此外,不同掺杂元素形成替代掺杂的难度服从以下顺序:Be < Mg < Zn。此外,取代掺杂原子倾向于取代 Ga 原子而不是 Al 原子,从而形成取代掺杂结构。替代掺杂后,由于杂质原子和纳米线原子诱导的电子态轨道杂化,所有能带都向高能区移动。此外,置换掺杂导致费米级进入价带,从而产生明显的 p 型导电性。在轴向型 AlxGa1-xAs 纳米线中,p 型载流子浓度在 1.85 × 1020 cm-3 和 4.42 × 1020 cm-3 之间,p 型调制掺杂确实有效。最后,AlxGa1-xAs 纳米线光电阴极的光吸收可以通过掺杂 BeGa 得到有效增强。我们的研究结果不仅全面揭示了 AlxGa1-xAs 纳米线的 p 型掺杂机理,而且为制备具有 p 型特性的 AlxGa1-xAs 纳米线光电器件提供了理论依据。
{"title":"P-type doped AlxGa1-xAs nanowire photocathode: A theoretical perspective on structural and optoelectronic properties","authors":"Yu Diao , Sihao Xia","doi":"10.1016/j.micrna.2024.207959","DOIUrl":"10.1016/j.micrna.2024.207959","url":null,"abstract":"<div><p>In this work, the effect of p-type doping on the structural, electronic, and optical properties of Al<sub>x</sub>Ga<sub>1-x</sub>As nanowires are investigated by first-principles calculations. Different doping elements (Be, Mg, Zn), doping methods (interstitial and substitution doping) and doping concentration are considered. The calculations of formation energy suggest that the structural stability of p-type Al<sub>x</sub>Ga<sub>1-x</sub>As nanowires is gradually weaken as the rise of doping concentration and Al composition. Besides, the difficulty of forming substitution doping for different doping elements obeys the following order: Be < Mg < Zn. In addition, the substitution doping atom tends to replace Ga atom rather than Al atom to form substitution doping structure. After substitution doping, all energy bands shift to higher energy region due to the orbital hybridization of electronic states induced by impurity atom and nanowire atoms. Moreover, the substitution doping leads to the Fermi level entering into the valence band, resulting in obviously p-type conductivity. The p-type modulation doping is indeed effective in the axial type Al<sub>x</sub>Ga<sub>1-x</sub>As nanowires with p-type carrier concentration varying between 1.85 × 10<sup>20</sup> cm<sup>−3</sup> and 4.42 × 10<sup>20</sup> cm<sup>−3</sup>, and the conductivity will be further enhanced with increasing substitution doping concentration or Al composition. Finally, the optical absorption of Al<sub>x</sub>Ga<sub>1-x</sub>As nanowire photocathodes can be effectively enhanced through Be<sub>Ga</sub> doping. Our findings not only present a comprehensive understanding of p-type doping mechanism of Al<sub>x</sub>Ga<sub>1-x</sub>As nanowires, but also provide a theoretical basis for preparing Al<sub>x</sub>Ga<sub>1-x</sub>As nanowire based photoelectric devices with p-type properties.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207959"},"PeriodicalIF":2.7,"publicationDate":"2024-08-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142075937","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-24DOI: 10.1016/j.micrna.2024.207961
Kallolini Banerjee , Abhijit Biswas
We investigate the digital, analog/RF, and linearity performance of four CP FinFETs distinguished by spacer layers: (i) single low-k spacer on both sides of the gate (D1), (ii) single high-k spacer on both sides of the gate (D2), (iii) a combination of high-k spacer and air on the source side and high-k spacer on the drain side (D3), and (iv) a combination of high-k spacer and air symmetrically placed on both sides of the gate (D4) at 10 nm technology node. Our results highlight the superior digital performance of the D4 device, demonstrating significant enhancements in various analog/RF figures of merit (FOMs) including transconductance, transconductance efficiency, unity gain cut-off frequency (FT), and gain bandwidth product (GBP). Notably, the D4 device exhibits a remarkable 256 % improvement in FT and a substantial 456.13 % enhancement in GBP compared to D1. Additionally, we analyze linearity and intermodulation distortion performance, suggesting the D4 device as the optimal architecture for high-performance digital and analog/RF applications.
我们对四种 CP FinFET 的数字、模拟/射频和线性度性能进行了研究,这四种 CP FinFET 采用了不同的间隔层:(i) 栅极两侧的单个低 k 间隔层 (D1);(ii) 栅极两侧的单个高 k 间隔层 (D2);(iii) 源极侧高 k 间隔层和空气的组合以及漏极侧高 k 间隔层 (D3);(iv) 栅极两侧对称放置的高 k 间隔层和空气的组合 (D4)。我们的研究结果凸显了 D4 器件卓越的数字性能,在各种模拟/射频性能指标 (FOM) 方面都有显著提高,包括跨导、跨导效率、统一增益截止频率 (FT) 和增益带宽乘积 (GBP)。值得注意的是,与 D1 器件相比,D4 器件的 FT 和 GBP 分别显著提高了 256% 和 456.13%。此外,我们还分析了线性和互调失真性能,认为 D4 器件是高性能数字和模拟/射频应用的最佳架构。
{"title":"Improvement of digital, analog/RF and linearity performances of charge plasma based junctionless FinFET through spacer layer engineering","authors":"Kallolini Banerjee , Abhijit Biswas","doi":"10.1016/j.micrna.2024.207961","DOIUrl":"10.1016/j.micrna.2024.207961","url":null,"abstract":"<div><p>We investigate the digital, analog/RF, and linearity performance of four CP FinFETs distinguished by spacer layers: (i) single low-k spacer on both sides of the gate (D<sub>1</sub>), (ii) single high-k spacer on both sides of the gate (D<sub>2</sub>), (iii) a combination of high-k spacer and air on the source side and high-k spacer on the drain side (D<sub>3</sub>), and (iv) a combination of high-k spacer and air symmetrically placed on both sides of the gate (D<sub>4</sub>) at 10 nm technology node. Our results highlight the superior digital performance of the D<sub>4</sub> device, demonstrating significant enhancements in various analog/RF figures of merit (FOMs) including transconductance, transconductance efficiency, unity gain cut-off frequency (F<sub>T</sub>), and gain bandwidth product (GBP). Notably, the D<sub>4</sub> device exhibits a remarkable 256 % improvement in F<sub>T</sub> and a substantial 456.13 % enhancement in GBP compared to D<sub>1</sub>. Additionally, we analyze linearity and intermodulation distortion performance, suggesting the D<sub>4</sub> device as the optimal architecture for high-performance digital and analog/RF applications.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207961"},"PeriodicalIF":2.7,"publicationDate":"2024-08-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142099490","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-22DOI: 10.1016/j.micrna.2024.207960
Shweta Yadav, R.K. Chauhan, Rajan Mishra
A material like CZTSSe, belonging to the Kesterite family, serves as a guiding light for researchers due to its ability to tunable bandgap and exhibit a high optical coefficient exceeding 104 cm−1, crucial for solar cell applications. These characteristics not only render it suitable for single-junction solar cells but also enhance its overall acceptance. Meanwhile, the material Cu2ZnSn(Sx, Se1-x)4 (CZTSSe) has increasingly captivated the attention of researchers owing to its cost-effectiveness, eco-friendliness, high absorption coefficient, and adjustable bandgap. This paper explores the conventional structure of CZTSSe solar cells comprising Al:ZnO/Zn(O,S)/CZTSSe/different Cu-based HTL, underscoring the importance of identifying an optimal HTL. Consequently, a comparative analysis of solar cells with various HTLs is conducted, facilitated by the SCAPS-1D numerical simulation software for property evaluation and efficiency optimization. Furthermore, varying parameters such as absorber layer thickness, defect densities, doping concentrations, and temperature shed light on the responses of open-circuit voltage (VOC), short-circuit current (JSC), fill factor (FF), and efficiency (PCE) of the solar cell. Among different Cu-based HTLs, Cu2O emerges as a promising candidate for maximizing CZTSSe-based solar cell performance. Additionally, the discussion delves into the impacts of layer parameters like thickness, doping density, and carrier concentrations. Following device optimization, considerations extend to operating temperature variations and the effects of series and shunt resistance. Notably, our endeavors culminate in cell performance metrics: efficiency = 30.65 %, short-circuit current density = 42.15 mA/cm2, open-circuit voltage = 0.84 V, and fill factor = 85.60 %.
{"title":"Upgrading CZTSSe solar cell performance through numerical investigation of Cu-based hole transport layers","authors":"Shweta Yadav, R.K. Chauhan, Rajan Mishra","doi":"10.1016/j.micrna.2024.207960","DOIUrl":"10.1016/j.micrna.2024.207960","url":null,"abstract":"<div><p>A material like CZTSSe, belonging to the Kesterite family, serves as a guiding light for researchers due to its ability to tunable bandgap and exhibit a high optical coefficient exceeding 10<sup>4</sup> cm<sup>−1</sup>, crucial for solar cell applications. These characteristics not only render it suitable for single-junction solar cells but also enhance its overall acceptance. Meanwhile, the material Cu<sub>2</sub>ZnSn(S<sub>x</sub>, Se<sub>1-x</sub>)<sub>4</sub> (CZTSSe) has increasingly captivated the attention of researchers owing to its cost-effectiveness, eco-friendliness, high absorption coefficient, and adjustable bandgap. This paper explores the conventional structure of CZTSSe solar cells comprising Al:ZnO/Zn(O,S)/CZTSSe/different Cu-based HTL, underscoring the importance of identifying an optimal HTL. Consequently, a comparative analysis of solar cells with various HTLs is conducted, facilitated by the SCAPS-1D numerical simulation software for property evaluation and efficiency optimization. Furthermore, varying parameters such as absorber layer thickness, defect densities, doping concentrations, and temperature shed light on the responses of open-circuit voltage (V<sub>OC</sub>), short-circuit current (J<sub>SC</sub>), fill factor (FF), and efficiency (PCE) of the solar cell. Among different Cu-based HTLs, Cu<sub>2</sub>O emerges as a promising candidate for maximizing CZTSSe-based solar cell performance. Additionally, the discussion delves into the impacts of layer parameters like thickness, doping density, and carrier concentrations. Following device optimization, considerations extend to operating temperature variations and the effects of series and shunt resistance. Notably, our endeavors culminate in cell performance metrics: efficiency = 30.65 %, short-circuit current density = 42.15 mA/cm<sup>2</sup>, open-circuit voltage = 0.84 V, and fill factor = 85.60 %.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207960"},"PeriodicalIF":2.7,"publicationDate":"2024-08-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142058557","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-21DOI: 10.1016/j.micrna.2024.207958
Xiaoyu Tang, Rongjia Zhu, Yujie Liu, Zhezhe Han
This work presents specific exploration on the novel gate stack strategies for the intriguing Ge p-MOSFET, where high pressure oxidation (HPO) process is utilized for sufficient oxidation and thus fewer oxygen vacancies, while yttrium doping is developed to strengthen the dielectric bonding for higher ruggedness. Superior gate controllability and stability have been achieved correspondingly, where then detailed comparison on the gate dielectric reliability is conducted. The HPO based GeO2 gate stack exhibits larger susceptibility to the gate bias stress, and could even breakdown under negative bias, which has been attributed to the local bond breakage that facilitates the irreversible network change. The yttrium-doped GeO2, on the other hand, presents impressive ruggedness against gate bias stress. Based on detailed bond breakage analysis, cation-doping in GeO2 is suggested to be effective in enhancing the bond rigidness, promising for a wider safe operation range for the gate bias in Ge MOSFET.
本研究对引人入胜的 Ge p-MOSFET 的新型栅极堆叠策略进行了具体探索,其中高压氧化(HPO)工艺可实现充分氧化,从而减少氧空位,而掺钇工艺则可加强介电结合,提高坚固性。栅极的可控性和稳定性也相应得到了提高,随后对栅极介电可靠性进行了详细比较。基于 HPO 的 GeO2 栅极堆栈对栅极偏压应力表现出更大的敏感性,甚至会在负偏压下击穿,这归因于局部键的断裂促进了不可逆的网络变化。另一方面,掺钇的 GeO2 对栅极偏压应力的耐受性令人印象深刻。根据详细的键断裂分析,GeO2 中的阳离子掺杂可有效增强键的刚性,从而有望扩大 Ge MOSFET 栅极偏压的安全工作范围。
{"title":"Ge-friendly gate stacks: Initial property and long-term reliability","authors":"Xiaoyu Tang, Rongjia Zhu, Yujie Liu, Zhezhe Han","doi":"10.1016/j.micrna.2024.207958","DOIUrl":"10.1016/j.micrna.2024.207958","url":null,"abstract":"<div><p>This work presents specific exploration on the novel gate stack strategies for the intriguing Ge <em>p</em>-MOSFET, where high pressure oxidation (HPO) process is utilized for sufficient oxidation and thus fewer oxygen vacancies, while yttrium doping is developed to strengthen the dielectric bonding for higher ruggedness. Superior gate controllability and stability have been achieved correspondingly, where then detailed comparison on the gate dielectric reliability is conducted. The HPO based GeO<sub>2</sub> gate stack exhibits larger susceptibility to the gate bias stress, and could even breakdown under negative bias, which has been attributed to the local bond breakage that facilitates the irreversible network change. The yttrium-doped GeO<sub>2</sub>, on the other hand, presents impressive ruggedness against gate bias stress. Based on detailed bond breakage analysis, cation-doping in GeO<sub>2</sub> is suggested to be effective in enhancing the bond rigidness, promising for a wider safe operation range for the gate bias in Ge MOSFET.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207958"},"PeriodicalIF":2.7,"publicationDate":"2024-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142048760","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-20DOI: 10.1016/j.micrna.2024.207957
Yashar Azizian-Kalandaragh , Süleyman Özçelik , Ali Barkhordari , Şemsettin Altındal
In this work, Artificial Neural Network (ANN) algorithm is used to predict the current conduction mechanisms into the metal-semiconductor (MS) and metal-nanocomposite-semiconductor (MPS) structures along with their primary electronic parameters, such as the leak current (I0), potential barrier height (ΦB0), ideality factor (n), series/shunt resistance (Rs/Rsh), rectifying ratio (RR), and interface states density (Nss) by analyzing the I–V characteristics. The polyvinylpyrrolidone (PVP), barium titanate (BaTiO3) and graphene (Gr) nanoparticles are mixed together to create the interfacial nanocomposite layer. Training data for ANN algorithm is gathered using the thermionic emission hypothesis. In order to study the efficacy of the ANN model, the predictive power of the ANN technique for predicting the current conduction mechanisms and electronic properties of SDs has been assessed by comparing the predicted and experimental results. The ANN predictions of the current conduction mechanisms at the forward/reverse bias and the fundamental electronic specifications of the MS and MPS structures are a high level of agreement with the experimental results. Furthermore, the results show that the RR and Rsh rise whereas the n, Rs, and Nss for MS structure decrease when the PVP:Gr-BaTiO3 nanocomposite interlayer is employed.
本研究采用人工神经网络 (ANN) 算法,通过分析 I-V 特性来预测金属-半导体 (MS) 和金属-纳米复合材料-半导体 (MPS) 结构的电流传导机制及其主要电子参数,如泄漏电流 (I0)、势垒高度 (ΦB0)、意整系数 (n)、串联/并联电阻 (Rs/Rsh)、整流比 (RR) 和界面态密度 (Nss)。聚乙烯吡咯烷酮(PVP)、钛酸钡(BaTiO3)和石墨烯(Gr)纳米颗粒混合在一起,形成了界面纳米复合层。利用热释电假说为 ANN 算法收集训练数据。为了研究 ANN 模型的功效,通过比较预测结果和实验结果,评估了 ANN 技术对 SDs 电流传导机制和电子特性的预测能力。ANN 对正向/反向偏压下的电流传导机制以及 MS 和 MPS 结构的基本电子特性的预测与实验结果高度一致。此外,结果表明,当采用 PVP:Gr-BaTiO3 纳米复合材料夹层时,MS 结构的 RR 和 Rsh 上升,而 n、Rs 和 Nss 下降。
{"title":"A strategy to predict the current conduction mechanisms into Al/PVP:Gr-BaTiO3/p-Si Schottky structure using Artificial Neural Network","authors":"Yashar Azizian-Kalandaragh , Süleyman Özçelik , Ali Barkhordari , Şemsettin Altındal","doi":"10.1016/j.micrna.2024.207957","DOIUrl":"10.1016/j.micrna.2024.207957","url":null,"abstract":"<div><p>In this work, Artificial Neural Network (ANN) algorithm is used to predict the current conduction mechanisms into the metal-semiconductor (MS) and metal-nanocomposite-semiconductor (MPS) structures along with their primary electronic parameters, such as the leak current (I<sub>0</sub>), potential barrier height (Φ<sub>B0</sub>), ideality factor (n), series/shunt resistance (R<sub>s</sub>/R<sub>sh</sub>), rectifying ratio (RR), and interface states density (N<sub>ss</sub>) by analyzing the I–V characteristics. The polyvinylpyrrolidone (PVP), barium titanate (BaTiO<sub>3</sub>) and graphene (Gr) nanoparticles are mixed together to create the interfacial nanocomposite layer. Training data for ANN algorithm is gathered using the thermionic emission hypothesis. In order to study the efficacy of the ANN model, the predictive power of the ANN technique for predicting the current conduction mechanisms and electronic properties of SDs has been assessed by comparing the predicted and experimental results. The ANN predictions of the current conduction mechanisms at the forward/reverse bias and the fundamental electronic specifications of the MS and MPS structures are a high level of agreement with the experimental results. Furthermore, the results show that the RR and R<sub>sh</sub> rise whereas the n, R<sub>s</sub>, and N<sub>ss</sub> for MS structure decrease when the PVP:Gr-BaTiO<sub>3</sub> nanocomposite interlayer is employed.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207957"},"PeriodicalIF":2.7,"publicationDate":"2024-08-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142021576","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}