首页 > 最新文献

Micro and Nanostructures最新文献

英文 中文
Innovative Spacer material integration in Tree-FETs for enhanced performance across Variable channel lengths 在树型场效应晶体管中集成创新的间隔材料,以提高不同沟道长度的性能
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-06 DOI: 10.1016/j.micrna.2024.207974
Dharavath Parvathi, P Prithvi

This work presents a novel three-channel Tree-FET optimized for superior DC and analog performance metrics. The device structure features nanosheets with a width (NSWD) of 9 nm, a thickness (NSTH) of 5 nm, and interbidge dimensions of 8 nm in height (IBHT) and 5 nm in width (IBWD). The Tree-FET demonstrates an exceptional on/off current ratio of 107 through meticulous engineering, significantly outperforming conventional FET configurations. Our comprehensive study explores the effects of different spacer materials, including HfO2, Al2O3, Si3N4, and SiO2, across varied channel lengths. The superior dielectric properties of HfO2 contribute to fine-tuning the device's characteristics, making it a standout choice for optimizing performance. Out of all HfO2 has been found to perform exceptionally well, offering the best combination of electrostatic control and minimized leakage currents. Because the Tree-FET has better electrostatic integrity and can keep working well with different spacer materials and channel lengths, it has much potential as a flexible and valuable part for next-generation semiconductor devices. The promising DC and analog metrics achieved through this novel design pave the way for developing more compact, high-performance electronic components.

这项研究提出了一种新型三沟道树型场效应晶体管(Tree-FET),该器件经过优化,具有卓越的直流和模拟性能指标。该器件结构的纳米片宽度(NSWD)为 9 nm,厚度(NSTH)为 5 nm,桥间尺寸高度(IBHT)为 8 nm,宽度(IBWD)为 5 nm。通过精心设计,树状场效应晶体管的导通/关断电流比高达 107,大大优于传统的场效应晶体管配置。我们的综合研究探讨了不同间隔材料(包括 HfO2、Al2O3、Si3N4 和 SiO2)对不同沟道长度的影响。HfO2 优越的介电特性有助于微调器件的特性,使其成为优化性能的最佳选择。在所有器件中,HfO2 的性能尤为出色,是静电控制和漏电流最小化的最佳组合。由于树型场效应晶体管具有更好的静电完整性,并能在使用不同的间隔材料和沟道长度时保持良好的工作状态,因此它作为下一代半导体器件的灵活而有价值的部件具有很大的潜力。通过这种新颖设计实现的直流和模拟指标前景广阔,为开发更紧凑、更高性能的电子元件铺平了道路。
{"title":"Innovative Spacer material integration in Tree-FETs for enhanced performance across Variable channel lengths","authors":"Dharavath Parvathi,&nbsp;P Prithvi","doi":"10.1016/j.micrna.2024.207974","DOIUrl":"10.1016/j.micrna.2024.207974","url":null,"abstract":"<div><p>This work presents a novel three-channel Tree-FET optimized for superior DC and analog performance metrics. The device structure features nanosheets with a width (NS<sub>WD</sub>) of 9 nm, a thickness (NS<sub>TH</sub>) of 5 nm, and interbidge dimensions of 8 nm in height (IB<sub>HT</sub>) and 5 nm in width (IB<sub>WD</sub>). The Tree-FET demonstrates an exceptional on/off current ratio of 10<sup>7</sup> through meticulous engineering, significantly outperforming conventional FET configurations. Our comprehensive study explores the effects of different spacer materials, including HfO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>, Si<sub>3</sub>N<sub>4</sub>, and SiO<sub>2</sub>, across varied channel lengths. The superior dielectric properties of HfO<sub>2</sub> contribute to fine-tuning the device's characteristics, making it a standout choice for optimizing performance. Out of all HfO<sub>2</sub> has been found to perform exceptionally well, offering the best combination of electrostatic control and minimized leakage currents. Because the Tree-FET has better electrostatic integrity and can keep working well with different spacer materials and channel lengths, it has much potential as a flexible and valuable part for next-generation semiconductor devices. The promising DC and analog metrics achieved through this novel design pave the way for developing more compact, high-performance electronic components.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207974"},"PeriodicalIF":2.7,"publicationDate":"2024-09-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142157989","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
An embedded gate gate-all-around FinFET for biosensing application 用于生物传感应用的嵌入式全栅极 FinFET
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-31 DOI: 10.1016/j.micrna.2024.207972
Hujun Jia, Wanli Yang, Weitao Cao, Linna Zhao, Qiyu Su, Xingyu Wei, Zhen Cao, Yintang Yang

A dielectric modulated embedded gate gate-all-around fin field-effect transistor (EGGAA-FinFET) has been proposed for label-free detection applications of biomolecules in this article. The design expands the biomolecule capture area by establishing a cavity below the embedded gate. The performance of EGGAA-FinFET and FinFET biosensors is analyzed in a comprehensive comparison in terms of electrical performance, sensitivity and selectivity. Some important biosensing characteristics for EGGAA-FinFET (FinFET) have been calculated to be 0.43 V (0.32 V) for threshold voltage sensitivity, 2.22 × 106 (8.32 × 104) for current switching ratio sensitivity, and 0.75 (0.65) for subthreshold swing sensitivity. To determine the optimal structure of the biosensor, the effect of structural parameters on sensitivity is investigated. In addition, the effect of the filling factor on the biosensor is considered. The real-world performance of biosensors is assessed using the linearity parameter, showing that the EGGAA-FinFET biosensor has better noise resistance compared to the FinFET biosensor.

本文提出了一种介电调制嵌入式栅极-栅极-周围鳍式场效应晶体管(EGGAA-FinFET),用于生物分子的无标记检测应用。该设计通过在嵌入式栅极下方建立一个空腔来扩大生物分子捕获区域。本文从电学性能、灵敏度和选择性等方面对 EGGAA-FinFET 和 FinFET 生物传感器的性能进行了综合比较分析。根据计算,EGGAA-FinFET(FinFET)的一些重要生物传感特性为:阈值电压灵敏度为 0.43 V(0.32 V),电流开关比灵敏度为 2.22 × 106(8.32 × 104),阈下摆动灵敏度为 0.75(0.65)。为了确定生物传感器的最佳结构,研究了结构参数对灵敏度的影响。此外,还考虑了填充因子对生物传感器的影响。利用线性参数评估了生物传感器的实际性能,结果表明 EGGAA-FinFET 生物传感器与 FinFET 生物传感器相比具有更好的抗噪声性能。
{"title":"An embedded gate gate-all-around FinFET for biosensing application","authors":"Hujun Jia,&nbsp;Wanli Yang,&nbsp;Weitao Cao,&nbsp;Linna Zhao,&nbsp;Qiyu Su,&nbsp;Xingyu Wei,&nbsp;Zhen Cao,&nbsp;Yintang Yang","doi":"10.1016/j.micrna.2024.207972","DOIUrl":"10.1016/j.micrna.2024.207972","url":null,"abstract":"<div><p>A dielectric modulated embedded gate gate-all-around fin field-effect transistor (EGGAA-FinFET) has been proposed for label-free detection applications of biomolecules in this article. The design expands the biomolecule capture area by establishing a cavity below the embedded gate. The performance of EGGAA-FinFET and FinFET biosensors is analyzed in a comprehensive comparison in terms of electrical performance, sensitivity and selectivity. Some important biosensing characteristics for EGGAA-FinFET (FinFET) have been calculated to be 0.43 V (0.32 V) for threshold voltage sensitivity, 2.22 × 10<sup>6</sup> (8.32 × 10<sup>4</sup>) for current switching ratio sensitivity, and 0.75 (0.65) for subthreshold swing sensitivity. To determine the optimal structure of the biosensor, the effect of structural parameters on sensitivity is investigated. In addition, the effect of the filling factor on the biosensor is considered. The real-world performance of biosensors is assessed using the linearity parameter, showing that the EGGAA-FinFET biosensor has better noise resistance compared to the FinFET biosensor.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207972"},"PeriodicalIF":2.7,"publicationDate":"2024-08-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142229455","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Frequency-domain analysis of CMOS-driven interconnects utilizing doped multilayer graphene nanoribbons and mixed carbon nanotube bundles 利用掺杂多层石墨烯纳米带和混合碳纳米管束的 CMOS 驱动型互连的频域分析
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-31 DOI: 10.1016/j.micrna.2024.207973
Tajinder Kaur , Aashish Kumar , Mayank Kumar Rai

A frequency-domain model is developed to analyze isolated interconnects of multilayer graphene-nanoribbon (MLGNR) and mixed carbon-nanotube bundle (MCB) driven by CMOS gates. The model derived is founded on an equivalent-single-conductor model of MLGNR and MCB that takes thermal considerations into account (i.e. TD-ESC). The model includes the derivation of transfer function of interconnect to estimate its delay and bandwidth performance. The attained results, reveals that among the neutral MLGNR (N-MLGNR), intercalation doped MLGNR (ID-MLGNR) intercalated with FeCl3, MCB and Cu interconnects, FeCl3 ID-MLGNR achieves the best bandwidth efficiency. At a global interconnect length of 1 mm, FeCl3 ID-MLGNR outperforms N-MLGNR, MCB, and Cu in terms of bandwidth with an improved bandwidth value of 12.2 GHz, 7 GHz, and 61.4 GHz, respectively. Further, employing the proposed CMOS-gate-driven model, for FeCl3 ID-MLGNR, bandwidth is improved by nearly 7.52 × at global length (∼1 mm) in relation to the linear resistance model. Additionally, TD-ESC dependency of the proposed model reveals that FeCl3 ID-MLGNR becomes more stable as interconnect resistance increases.

本文开发了一个频域模型,用于分析 CMOS 栅极驱动的多层石墨烯-纳米碳(MLGNR)和混合碳-纳米管束(MCB)的隔离互连。推导出的模型建立在 MLGNR 和 MCB 的等效单导体模型基础上,该模型考虑了热因素(即 TD-ESC)。该模型包括互连传输函数的推导,以估算其延迟和带宽性能。研究结果表明,在中性 MLGNR(N-MLGNR)、掺杂 FeCl3 的插层 MLGNR(ID-MLGNR)、MCB 和铜互连器件中,FeCl3 ID-MLGNR 的带宽效率最高。在全局互连长度为 1 毫米时,FeCl3 ID-MLGNR 的带宽优于 N-MLGNR、MCB 和 Cu,带宽值分别提高了 12.2 GHz、7 GHz 和 61.4 GHz。此外,采用所提出的 CMOS 栅极驱动模型,FeCl3 ID-MLGNR 在全局长度(1 毫米)上的带宽比线性电阻模型提高了近 7.52 倍。此外,所提模型的 TD-ESC 依赖性表明,随着互连电阻的增加,FeCl3 ID-MLGNR 变得更加稳定。
{"title":"Frequency-domain analysis of CMOS-driven interconnects utilizing doped multilayer graphene nanoribbons and mixed carbon nanotube bundles","authors":"Tajinder Kaur ,&nbsp;Aashish Kumar ,&nbsp;Mayank Kumar Rai","doi":"10.1016/j.micrna.2024.207973","DOIUrl":"10.1016/j.micrna.2024.207973","url":null,"abstract":"<div><p>A frequency-domain model is developed to analyze isolated interconnects of multilayer graphene-nanoribbon (MLGNR) and mixed carbon-nanotube bundle (MCB) driven by CMOS gates. The model derived is founded on an equivalent-single-conductor model of MLGNR and MCB that takes thermal considerations into account (i.e. TD-ESC). The model includes the derivation of transfer function of interconnect to estimate its delay and bandwidth performance. The attained results, reveals that among the neutral MLGNR (N-MLGNR), intercalation doped MLGNR (ID-MLGNR) intercalated with FeCl<sub>3</sub>, MCB and <em>Cu</em> interconnects, FeCl<sub>3</sub> ID-MLGNR achieves the best bandwidth efficiency. At a global interconnect length of 1 mm, FeCl<sub>3</sub> ID-MLGNR outperforms N-MLGNR, MCB, and <em>Cu</em> in terms of bandwidth with an improved bandwidth value of 12.2 GHz, 7 GHz, and 61.4 GHz, respectively. Further, employing the proposed CMOS-gate-driven model, for FeCl<sub>3</sub> ID-MLGNR, bandwidth is improved by nearly 7.52 × at global length (∼1 mm) in relation to the linear resistance model. Additionally, TD-ESC dependency of the proposed model reveals that FeCl<sub>3</sub> ID-MLGNR becomes more stable as interconnect resistance increases.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207973"},"PeriodicalIF":2.7,"publicationDate":"2024-08-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142136542","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High performance E-mode NiO/β-Ga2O3 HJ-FET with high conduction band offset and thin recessed channel 具有高导带偏移和薄凹槽的高性能 E 模式 NiO/β-Ga2O3 HJ-FET
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-30 DOI: 10.1016/j.micrna.2024.207963
Jiaweiwen Huang , Wensuo Chen , Shenglei Zhao , Qisheng Yu , Aohang Zhang , Kunfeng Zhu , Jian Li

In this paper, an enhancement-mode (E-mode) NiO/β-Ga2O3 heterojunction field-effect transistor (HJ-FET) with high conduction band offset (ΔEC) and thin recessed channel is proposed and studied by Sentaurus TCAD. Different from the existing HJ-FET with low ΔEC alignment, the High ΔEC HJ-FET can achieve a much lower on-resistance (Ron) due to the strong electron confinement effect. More importantly, the disadvantage in the threshold voltage (Vth) is compensated by reducing the thickness of the recessed channel, maintaining an almost unchanged Ron with the help of the special surface conduction channel. Compared with the corresponding Low ΔEC HJ-FET, at the same Vth ( 0.82 V), the Ron is decreased from 135 Ω/mm to 90.7 Ω/mm and the maximum drain current is increased from 14.9 mA/mm to 83.1 mA/mm. By adding a top p-NiO layer for further optimization, a greatly improved power figure of merit (P-FOM) of 2.29 GW/cm2 is achieved among the E-mode HJ-FETs. These results show that the proposed High ΔEC HJ-FET with thin recessed channel is probably a better choice to achieve the high-performance E-mode lateral HJ-FET.

本文提出了一种具有高导带偏移(ΔEC)和薄凹槽沟道的增强型(E-mode)NiO/β-Ga2O3 异质结场效应晶体管(HJ-FET),并利用 Sentaurus TCAD 对其进行了研究。与现有的低ΔEC 排列的 HJ-FET 不同,高ΔEC HJ-FET 由于具有很强的电子约束效应,可以实现更低的导通电阻 (Ron)。更重要的是,阈值电压(Vth)方面的劣势可以通过减小凹槽厚度来弥补,在特殊表面传导沟道的帮助下保持几乎不变的导通电阻(Ron)。与相应的低ΔEC HJ-FET 相比,在相同的 Vth (∼ 0.82 V) 下,Ron 从 135 Ω/mm 减小到 90.7 Ω/mm,最大漏极电流从 14.9 mA/mm 增加到 83.1 mA/mm。通过添加顶部 p-NiO 层进行进一步优化,E 模式 HJ-FET 的功率因数(P-FOM)大大提高,达到 2.29 GW/cm2。这些结果表明,所提出的具有薄凹陷沟道的高ΔEC HJ-FET 可能是实现高性能 E 模式横向 HJ-FET 的更好选择。
{"title":"High performance E-mode NiO/β-Ga2O3 HJ-FET with high conduction band offset and thin recessed channel","authors":"Jiaweiwen Huang ,&nbsp;Wensuo Chen ,&nbsp;Shenglei Zhao ,&nbsp;Qisheng Yu ,&nbsp;Aohang Zhang ,&nbsp;Kunfeng Zhu ,&nbsp;Jian Li","doi":"10.1016/j.micrna.2024.207963","DOIUrl":"10.1016/j.micrna.2024.207963","url":null,"abstract":"<div><p>In this paper, an enhancement-mode (E-mode) NiO/β-Ga<sub>2</sub>O<sub>3</sub> heterojunction field-effect transistor (HJ-FET) with high conduction band offset (Δ<em>E</em><sub>C</sub>) and thin recessed channel is proposed and studied by Sentaurus TCAD. Different from the existing HJ-FET with low Δ<em>E</em><sub>C</sub> alignment, the High Δ<em>E</em><sub>C</sub> HJ-FET can achieve a much lower on-resistance (<em>R</em><sub>on</sub>) due to the strong electron confinement effect. More importantly, the disadvantage in the threshold voltage (<em>V</em><sub>th</sub>) is compensated by reducing the thickness of the recessed channel, maintaining an almost unchanged <em>R</em><sub>on</sub> with the help of the special surface conduction channel. Compared with the corresponding Low Δ<em>E</em><sub>C</sub> HJ-FET, at the same <em>V</em><sub>th</sub> (<span><math><mrow><mo>∼</mo></mrow></math></span> 0.82 V), the <em>R</em><sub>on</sub> is decreased from 135 Ω/mm to 90.7 Ω/mm and the maximum drain current is increased from 14.9 mA/mm to 83.1 mA/mm. By adding a top <em>p</em>-NiO layer for further optimization, a greatly improved power figure of merit (P-FOM) of 2.29 GW/cm<sup>2</sup> is achieved among the E-mode HJ-FETs. These results show that the proposed High Δ<em>E</em><sub>C</sub> HJ-FET with thin recessed channel is probably a better choice to achieve the high-performance E-mode lateral HJ-FET.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207963"},"PeriodicalIF":2.7,"publicationDate":"2024-08-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142136543","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design of a 4H–SiC Schottky barrier FET biosensor with dual-source and dual-drain on suspended beam channel 在悬梁通道上设计具有双源和双漏的 4H-SiC 肖特基势垒 FET 生物传感器
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-26 DOI: 10.1016/j.micrna.2024.207962
Hujun Jia, Linna Zhao, Qiyu Su, Weitao Cao, Wanli Yang, Xingyu Wei, Zhen Cao, Yintang Yang

In this paper, a Schottky barrier field effect transistor biosensor with dual-source, dual-drain, and a suspended beam channel (DSDD-SB-FET) is proposed and its biosensor performance is investigated by simulation. The simulation results show that compared with the conventional 6H–SiC Schottky barrier field effect transistor (6H-SiC-SB-FET) biosensor, the new structure proposed in this paper has superior sensitivity characteristics. The SIon is 1.83 × 108, Sgm,max is 1.44 × 108, SIon/Ioff is 1.53 × 107, and SSS is 83 % at K = 12, which are respectively 554 times, 476 times, 2.76 × 104 times, and 61 % higher than those of the 6H-SiC-SB-FET. In addition, we also investigate the effects of non-ideal filling conditions and temperature variations on its performance in practical applications, and conclude that the DSDD-SB-FET biosensor has excellent sensing performance in practical applications as well.

本文提出了一种具有双源、双漏和悬梁沟道的肖特基势垒场效应晶体管生物传感器(DSDD-SB-FET),并对其生物传感器性能进行了仿真研究。仿真结果表明,与传统的 6H-SiC 肖特基势垒场效应晶体管(6H-SiC-SB-FET)生物传感器相比,本文提出的新结构具有更优越的灵敏度特性。在 K = 12 时,SIon 为 1.83 × 108,Sgm,max 为 1.44 × 108,SIon/Ioff 为 1.53 × 107,SSS 为 83 %,分别是 6H-SiC-SB-FET 的 554 倍、476 倍、2.76 × 104 倍和 61 %。此外,我们还研究了非理想填充条件和温度变化对其实际应用性能的影响,并得出结论:DSDD-SB-FET 生物传感器在实际应用中也具有优异的传感性能。
{"title":"Design of a 4H–SiC Schottky barrier FET biosensor with dual-source and dual-drain on suspended beam channel","authors":"Hujun Jia,&nbsp;Linna Zhao,&nbsp;Qiyu Su,&nbsp;Weitao Cao,&nbsp;Wanli Yang,&nbsp;Xingyu Wei,&nbsp;Zhen Cao,&nbsp;Yintang Yang","doi":"10.1016/j.micrna.2024.207962","DOIUrl":"10.1016/j.micrna.2024.207962","url":null,"abstract":"<div><p>In this paper, a Schottky barrier field effect transistor biosensor with dual-source, dual-drain, and a suspended beam channel (DSDD-SB-FET) is proposed and its biosensor performance is investigated by simulation. The simulation results show that compared with the conventional 6H–SiC Schottky barrier field effect transistor (6H-SiC-SB-FET) biosensor, the new structure proposed in this paper has superior sensitivity characteristics. The S<sub>Ion</sub> is 1.83 × 10<sup>8</sup>, S<sub>gm,max</sub> is 1.44 × 10<sup>8</sup>, S<sub>Ion/Ioff</sub> is 1.53 × 10<sup>7</sup>, and S<sub>SS</sub> is 83 % at K = 12, which are respectively 554 times, 476 times, 2.76 × 10<sup>4</sup> times, and 61 % higher than those of the 6H-SiC-SB-FET. In addition, we also investigate the effects of non-ideal filling conditions and temperature variations on its performance in practical applications, and conclude that the DSDD-SB-FET biosensor has excellent sensing performance in practical applications as well.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207962"},"PeriodicalIF":2.7,"publicationDate":"2024-08-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142088942","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
P-type doped AlxGa1-xAs nanowire photocathode: A theoretical perspective on structural and optoelectronic properties P 型掺杂 AlxGa1-xAs 纳米线光电阴极:结构和光电特性的理论视角
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-24 DOI: 10.1016/j.micrna.2024.207959
Yu Diao , Sihao Xia

In this work, the effect of p-type doping on the structural, electronic, and optical properties of AlxGa1-xAs nanowires are investigated by first-principles calculations. Different doping elements (Be, Mg, Zn), doping methods (interstitial and substitution doping) and doping concentration are considered. The calculations of formation energy suggest that the structural stability of p-type AlxGa1-xAs nanowires is gradually weaken as the rise of doping concentration and Al composition. Besides, the difficulty of forming substitution doping for different doping elements obeys the following order: Be < Mg < Zn. In addition, the substitution doping atom tends to replace Ga atom rather than Al atom to form substitution doping structure. After substitution doping, all energy bands shift to higher energy region due to the orbital hybridization of electronic states induced by impurity atom and nanowire atoms. Moreover, the substitution doping leads to the Fermi level entering into the valence band, resulting in obviously p-type conductivity. The p-type modulation doping is indeed effective in the axial type AlxGa1-xAs nanowires with p-type carrier concentration varying between 1.85 × 1020 cm−3 and 4.42 × 1020 cm−3, and the conductivity will be further enhanced with increasing substitution doping concentration or Al composition. Finally, the optical absorption of AlxGa1-xAs nanowire photocathodes can be effectively enhanced through BeGa doping. Our findings not only present a comprehensive understanding of p-type doping mechanism of AlxGa1-xAs nanowires, but also provide a theoretical basis for preparing AlxGa1-xAs nanowire based photoelectric devices with p-type properties.

本文通过第一原理计算研究了 p 型掺杂对 AlxGa1-xAs 纳米线的结构、电子和光学特性的影响。考虑了不同的掺杂元素(Be、Mg、Zn)、掺杂方法(间隙掺杂和置换掺杂)和掺杂浓度。形成能的计算表明,随着掺杂浓度和铝成分的增加,p 型 AlxGa1-xAs 纳米线的结构稳定性逐渐减弱。此外,不同掺杂元素形成替代掺杂的难度服从以下顺序:Be < Mg < Zn。此外,取代掺杂原子倾向于取代 Ga 原子而不是 Al 原子,从而形成取代掺杂结构。替代掺杂后,由于杂质原子和纳米线原子诱导的电子态轨道杂化,所有能带都向高能区移动。此外,置换掺杂导致费米级进入价带,从而产生明显的 p 型导电性。在轴向型 AlxGa1-xAs 纳米线中,p 型载流子浓度在 1.85 × 1020 cm-3 和 4.42 × 1020 cm-3 之间,p 型调制掺杂确实有效。最后,AlxGa1-xAs 纳米线光电阴极的光吸收可以通过掺杂 BeGa 得到有效增强。我们的研究结果不仅全面揭示了 AlxGa1-xAs 纳米线的 p 型掺杂机理,而且为制备具有 p 型特性的 AlxGa1-xAs 纳米线光电器件提供了理论依据。
{"title":"P-type doped AlxGa1-xAs nanowire photocathode: A theoretical perspective on structural and optoelectronic properties","authors":"Yu Diao ,&nbsp;Sihao Xia","doi":"10.1016/j.micrna.2024.207959","DOIUrl":"10.1016/j.micrna.2024.207959","url":null,"abstract":"<div><p>In this work, the effect of p-type doping on the structural, electronic, and optical properties of Al<sub>x</sub>Ga<sub>1-x</sub>As nanowires are investigated by first-principles calculations. Different doping elements (Be, Mg, Zn), doping methods (interstitial and substitution doping) and doping concentration are considered. The calculations of formation energy suggest that the structural stability of p-type Al<sub>x</sub>Ga<sub>1-x</sub>As nanowires is gradually weaken as the rise of doping concentration and Al composition. Besides, the difficulty of forming substitution doping for different doping elements obeys the following order: Be &lt; Mg &lt; Zn. In addition, the substitution doping atom tends to replace Ga atom rather than Al atom to form substitution doping structure. After substitution doping, all energy bands shift to higher energy region due to the orbital hybridization of electronic states induced by impurity atom and nanowire atoms. Moreover, the substitution doping leads to the Fermi level entering into the valence band, resulting in obviously p-type conductivity. The p-type modulation doping is indeed effective in the axial type Al<sub>x</sub>Ga<sub>1-x</sub>As nanowires with p-type carrier concentration varying between 1.85 × 10<sup>20</sup> cm<sup>−3</sup> and 4.42 × 10<sup>20</sup> cm<sup>−3</sup>, and the conductivity will be further enhanced with increasing substitution doping concentration or Al composition. Finally, the optical absorption of Al<sub>x</sub>Ga<sub>1-x</sub>As nanowire photocathodes can be effectively enhanced through Be<sub>Ga</sub> doping. Our findings not only present a comprehensive understanding of p-type doping mechanism of Al<sub>x</sub>Ga<sub>1-x</sub>As nanowires, but also provide a theoretical basis for preparing Al<sub>x</sub>Ga<sub>1-x</sub>As nanowire based photoelectric devices with p-type properties.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207959"},"PeriodicalIF":2.7,"publicationDate":"2024-08-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142075937","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Improvement of digital, analog/RF and linearity performances of charge plasma based junctionless FinFET through spacer layer engineering 通过间隔层工程改善基于电荷等离子体的无结 FinFET 的数字、模拟/射频和线性性能
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-24 DOI: 10.1016/j.micrna.2024.207961
Kallolini Banerjee , Abhijit Biswas

We investigate the digital, analog/RF, and linearity performance of four CP FinFETs distinguished by spacer layers: (i) single low-k spacer on both sides of the gate (D1), (ii) single high-k spacer on both sides of the gate (D2), (iii) a combination of high-k spacer and air on the source side and high-k spacer on the drain side (D3), and (iv) a combination of high-k spacer and air symmetrically placed on both sides of the gate (D4) at 10 nm technology node. Our results highlight the superior digital performance of the D4 device, demonstrating significant enhancements in various analog/RF figures of merit (FOMs) including transconductance, transconductance efficiency, unity gain cut-off frequency (FT), and gain bandwidth product (GBP). Notably, the D4 device exhibits a remarkable 256 % improvement in FT and a substantial 456.13 % enhancement in GBP compared to D1. Additionally, we analyze linearity and intermodulation distortion performance, suggesting the D4 device as the optimal architecture for high-performance digital and analog/RF applications.

我们对四种 CP FinFET 的数字、模拟/射频和线性度性能进行了研究,这四种 CP FinFET 采用了不同的间隔层:(i) 栅极两侧的单个低 k 间隔层 (D1);(ii) 栅极两侧的单个高 k 间隔层 (D2);(iii) 源极侧高 k 间隔层和空气的组合以及漏极侧高 k 间隔层 (D3);(iv) 栅极两侧对称放置的高 k 间隔层和空气的组合 (D4)。我们的研究结果凸显了 D4 器件卓越的数字性能,在各种模拟/射频性能指标 (FOM) 方面都有显著提高,包括跨导、跨导效率、统一增益截止频率 (FT) 和增益带宽乘积 (GBP)。值得注意的是,与 D1 器件相比,D4 器件的 FT 和 GBP 分别显著提高了 256% 和 456.13%。此外,我们还分析了线性和互调失真性能,认为 D4 器件是高性能数字和模拟/射频应用的最佳架构。
{"title":"Improvement of digital, analog/RF and linearity performances of charge plasma based junctionless FinFET through spacer layer engineering","authors":"Kallolini Banerjee ,&nbsp;Abhijit Biswas","doi":"10.1016/j.micrna.2024.207961","DOIUrl":"10.1016/j.micrna.2024.207961","url":null,"abstract":"<div><p>We investigate the digital, analog/RF, and linearity performance of four CP FinFETs distinguished by spacer layers: (i) single low-k spacer on both sides of the gate (D<sub>1</sub>), (ii) single high-k spacer on both sides of the gate (D<sub>2</sub>), (iii) a combination of high-k spacer and air on the source side and high-k spacer on the drain side (D<sub>3</sub>), and (iv) a combination of high-k spacer and air symmetrically placed on both sides of the gate (D<sub>4</sub>) at 10 nm technology node. Our results highlight the superior digital performance of the D<sub>4</sub> device, demonstrating significant enhancements in various analog/RF figures of merit (FOMs) including transconductance, transconductance efficiency, unity gain cut-off frequency (F<sub>T</sub>), and gain bandwidth product (GBP). Notably, the D<sub>4</sub> device exhibits a remarkable 256 % improvement in F<sub>T</sub> and a substantial 456.13 % enhancement in GBP compared to D<sub>1</sub>. Additionally, we analyze linearity and intermodulation distortion performance, suggesting the D<sub>4</sub> device as the optimal architecture for high-performance digital and analog/RF applications.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207961"},"PeriodicalIF":2.7,"publicationDate":"2024-08-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142099490","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Upgrading CZTSSe solar cell performance through numerical investigation of Cu-based hole transport layers 通过数值研究铜基空穴传输层提升 CZTSSe 太阳能电池性能
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-22 DOI: 10.1016/j.micrna.2024.207960
Shweta Yadav, R.K. Chauhan, Rajan Mishra

A material like CZTSSe, belonging to the Kesterite family, serves as a guiding light for researchers due to its ability to tunable bandgap and exhibit a high optical coefficient exceeding 104 cm−1, crucial for solar cell applications. These characteristics not only render it suitable for single-junction solar cells but also enhance its overall acceptance. Meanwhile, the material Cu2ZnSn(Sx, Se1-x)4 (CZTSSe) has increasingly captivated the attention of researchers owing to its cost-effectiveness, eco-friendliness, high absorption coefficient, and adjustable bandgap. This paper explores the conventional structure of CZTSSe solar cells comprising Al:ZnO/Zn(O,S)/CZTSSe/different Cu-based HTL, underscoring the importance of identifying an optimal HTL. Consequently, a comparative analysis of solar cells with various HTLs is conducted, facilitated by the SCAPS-1D numerical simulation software for property evaluation and efficiency optimization. Furthermore, varying parameters such as absorber layer thickness, defect densities, doping concentrations, and temperature shed light on the responses of open-circuit voltage (VOC), short-circuit current (JSC), fill factor (FF), and efficiency (PCE) of the solar cell. Among different Cu-based HTLs, Cu2O emerges as a promising candidate for maximizing CZTSSe-based solar cell performance. Additionally, the discussion delves into the impacts of layer parameters like thickness, doping density, and carrier concentrations. Following device optimization, considerations extend to operating temperature variations and the effects of series and shunt resistance. Notably, our endeavors culminate in cell performance metrics: efficiency = 30.65 %, short-circuit current density = 42.15 mA/cm2, open-circuit voltage = 0.84 V, and fill factor = 85.60 %.

像 CZTSSe 这样属于 Kesterite 家族的材料,因其具有可调带隙的能力和超过 104 cm-1 的高光学系数而成为研究人员的指路明灯,这对太阳能电池的应用至关重要。这些特性不仅使其适用于单结太阳能电池,还提高了其整体接受度。与此同时,Cu2ZnSn(Sx, Se1-x)4(CZTSSe)材料因其成本效益、生态友好性、高吸收系数和可调带隙而日益受到研究人员的关注。本文探讨了由 Al:ZnO/Zn(O,S)/CZTSSe/不同铜基 HTL 组成的 CZTSSe 太阳能电池的传统结构,强调了确定最佳 HTL 的重要性。因此,在 SCAPS-1D 数值模拟软件的帮助下,对采用不同 HTL 的太阳能电池进行了比较分析,以进行性能评估和效率优化。此外,不同的参数,如吸收层厚度、缺陷密度、掺杂浓度和温度,都会对太阳能电池的开路电压(VOC)、短路电流(JSC)、填充因子(FF)和效率(PCE)产生影响。在不同的铜基 HTL 中,Cu2O 有望成为最大化 CZTSSe 太阳能电池性能的候选材料。此外,讨论还深入探讨了层参数(如厚度、掺杂密度和载流子浓度)的影响。在器件优化之后,我们还考虑了工作温度变化以及串联和并联电阻的影响。值得注意的是,我们的努力最终实现了电池性能指标:效率 = 30.65%,短路电流密度 = 42.15 mA/cm2,开路电压 = 0.84 V,填充因子 = 85.60%。
{"title":"Upgrading CZTSSe solar cell performance through numerical investigation of Cu-based hole transport layers","authors":"Shweta Yadav,&nbsp;R.K. Chauhan,&nbsp;Rajan Mishra","doi":"10.1016/j.micrna.2024.207960","DOIUrl":"10.1016/j.micrna.2024.207960","url":null,"abstract":"<div><p>A material like CZTSSe, belonging to the Kesterite family, serves as a guiding light for researchers due to its ability to tunable bandgap and exhibit a high optical coefficient exceeding 10<sup>4</sup> cm<sup>−1</sup>, crucial for solar cell applications. These characteristics not only render it suitable for single-junction solar cells but also enhance its overall acceptance. Meanwhile, the material Cu<sub>2</sub>ZnSn(S<sub>x</sub>, Se<sub>1-x</sub>)<sub>4</sub> (CZTSSe) has increasingly captivated the attention of researchers owing to its cost-effectiveness, eco-friendliness, high absorption coefficient, and adjustable bandgap. This paper explores the conventional structure of CZTSSe solar cells comprising Al:ZnO/Zn(O,S)/CZTSSe/different Cu-based HTL, underscoring the importance of identifying an optimal HTL. Consequently, a comparative analysis of solar cells with various HTLs is conducted, facilitated by the SCAPS-1D numerical simulation software for property evaluation and efficiency optimization. Furthermore, varying parameters such as absorber layer thickness, defect densities, doping concentrations, and temperature shed light on the responses of open-circuit voltage (V<sub>OC</sub>), short-circuit current (J<sub>SC</sub>), fill factor (FF), and efficiency (PCE) of the solar cell. Among different Cu-based HTLs, Cu<sub>2</sub>O emerges as a promising candidate for maximizing CZTSSe-based solar cell performance. Additionally, the discussion delves into the impacts of layer parameters like thickness, doping density, and carrier concentrations. Following device optimization, considerations extend to operating temperature variations and the effects of series and shunt resistance. Notably, our endeavors culminate in cell performance metrics: efficiency = 30.65 %, short-circuit current density = 42.15 mA/cm<sup>2</sup>, open-circuit voltage = 0.84 V, and fill factor = 85.60 %.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207960"},"PeriodicalIF":2.7,"publicationDate":"2024-08-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142058557","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Ge-friendly gate stacks: Initial property and long-term reliability Ge-friendly 栅极堆栈:初始特性和长期可靠性
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-21 DOI: 10.1016/j.micrna.2024.207958
Xiaoyu Tang, Rongjia Zhu, Yujie Liu, Zhezhe Han

This work presents specific exploration on the novel gate stack strategies for the intriguing Ge p-MOSFET, where high pressure oxidation (HPO) process is utilized for sufficient oxidation and thus fewer oxygen vacancies, while yttrium doping is developed to strengthen the dielectric bonding for higher ruggedness. Superior gate controllability and stability have been achieved correspondingly, where then detailed comparison on the gate dielectric reliability is conducted. The HPO based GeO2 gate stack exhibits larger susceptibility to the gate bias stress, and could even breakdown under negative bias, which has been attributed to the local bond breakage that facilitates the irreversible network change. The yttrium-doped GeO2, on the other hand, presents impressive ruggedness against gate bias stress. Based on detailed bond breakage analysis, cation-doping in GeO2 is suggested to be effective in enhancing the bond rigidness, promising for a wider safe operation range for the gate bias in Ge MOSFET.

本研究对引人入胜的 Ge p-MOSFET 的新型栅极堆叠策略进行了具体探索,其中高压氧化(HPO)工艺可实现充分氧化,从而减少氧空位,而掺钇工艺则可加强介电结合,提高坚固性。栅极的可控性和稳定性也相应得到了提高,随后对栅极介电可靠性进行了详细比较。基于 HPO 的 GeO2 栅极堆栈对栅极偏压应力表现出更大的敏感性,甚至会在负偏压下击穿,这归因于局部键的断裂促进了不可逆的网络变化。另一方面,掺钇的 GeO2 对栅极偏压应力的耐受性令人印象深刻。根据详细的键断裂分析,GeO2 中的阳离子掺杂可有效增强键的刚性,从而有望扩大 Ge MOSFET 栅极偏压的安全工作范围。
{"title":"Ge-friendly gate stacks: Initial property and long-term reliability","authors":"Xiaoyu Tang,&nbsp;Rongjia Zhu,&nbsp;Yujie Liu,&nbsp;Zhezhe Han","doi":"10.1016/j.micrna.2024.207958","DOIUrl":"10.1016/j.micrna.2024.207958","url":null,"abstract":"<div><p>This work presents specific exploration on the novel gate stack strategies for the intriguing Ge <em>p</em>-MOSFET, where high pressure oxidation (HPO) process is utilized for sufficient oxidation and thus fewer oxygen vacancies, while yttrium doping is developed to strengthen the dielectric bonding for higher ruggedness. Superior gate controllability and stability have been achieved correspondingly, where then detailed comparison on the gate dielectric reliability is conducted. The HPO based GeO<sub>2</sub> gate stack exhibits larger susceptibility to the gate bias stress, and could even breakdown under negative bias, which has been attributed to the local bond breakage that facilitates the irreversible network change. The yttrium-doped GeO<sub>2</sub>, on the other hand, presents impressive ruggedness against gate bias stress. Based on detailed bond breakage analysis, cation-doping in GeO<sub>2</sub> is suggested to be effective in enhancing the bond rigidness, promising for a wider safe operation range for the gate bias in Ge MOSFET.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207958"},"PeriodicalIF":2.7,"publicationDate":"2024-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142048760","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A strategy to predict the current conduction mechanisms into Al/PVP:Gr-BaTiO3/p-Si Schottky structure using Artificial Neural Network 利用人工神经网络预测 Al/PVP:Gr-BaTiO3/p-Si 肖特基结构电流传导机制的策略
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-08-20 DOI: 10.1016/j.micrna.2024.207957
Yashar Azizian-Kalandaragh , Süleyman Özçelik , Ali Barkhordari , Şemsettin Altındal

In this work, Artificial Neural Network (ANN) algorithm is used to predict the current conduction mechanisms into the metal-semiconductor (MS) and metal-nanocomposite-semiconductor (MPS) structures along with their primary electronic parameters, such as the leak current (I0), potential barrier height (ΦB0), ideality factor (n), series/shunt resistance (Rs/Rsh), rectifying ratio (RR), and interface states density (Nss) by analyzing the I–V characteristics. The polyvinylpyrrolidone (PVP), barium titanate (BaTiO3) and graphene (Gr) nanoparticles are mixed together to create the interfacial nanocomposite layer. Training data for ANN algorithm is gathered using the thermionic emission hypothesis. In order to study the efficacy of the ANN model, the predictive power of the ANN technique for predicting the current conduction mechanisms and electronic properties of SDs has been assessed by comparing the predicted and experimental results. The ANN predictions of the current conduction mechanisms at the forward/reverse bias and the fundamental electronic specifications of the MS and MPS structures are a high level of agreement with the experimental results. Furthermore, the results show that the RR and Rsh rise whereas the n, Rs, and Nss for MS structure decrease when the PVP:Gr-BaTiO3 nanocomposite interlayer is employed.

本研究采用人工神经网络 (ANN) 算法,通过分析 I-V 特性来预测金属-半导体 (MS) 和金属-纳米复合材料-半导体 (MPS) 结构的电流传导机制及其主要电子参数,如泄漏电流 (I0)、势垒高度 (ΦB0)、意整系数 (n)、串联/并联电阻 (Rs/Rsh)、整流比 (RR) 和界面态密度 (Nss)。聚乙烯吡咯烷酮(PVP)、钛酸钡(BaTiO3)和石墨烯(Gr)纳米颗粒混合在一起,形成了界面纳米复合层。利用热释电假说为 ANN 算法收集训练数据。为了研究 ANN 模型的功效,通过比较预测结果和实验结果,评估了 ANN 技术对 SDs 电流传导机制和电子特性的预测能力。ANN 对正向/反向偏压下的电流传导机制以及 MS 和 MPS 结构的基本电子特性的预测与实验结果高度一致。此外,结果表明,当采用 PVP:Gr-BaTiO3 纳米复合材料夹层时,MS 结构的 RR 和 Rsh 上升,而 n、Rs 和 Nss 下降。
{"title":"A strategy to predict the current conduction mechanisms into Al/PVP:Gr-BaTiO3/p-Si Schottky structure using Artificial Neural Network","authors":"Yashar Azizian-Kalandaragh ,&nbsp;Süleyman Özçelik ,&nbsp;Ali Barkhordari ,&nbsp;Şemsettin Altındal","doi":"10.1016/j.micrna.2024.207957","DOIUrl":"10.1016/j.micrna.2024.207957","url":null,"abstract":"<div><p>In this work, Artificial Neural Network (ANN) algorithm is used to predict the current conduction mechanisms into the metal-semiconductor (MS) and metal-nanocomposite-semiconductor (MPS) structures along with their primary electronic parameters, such as the leak current (I<sub>0</sub>), potential barrier height (Φ<sub>B0</sub>), ideality factor (n), series/shunt resistance (R<sub>s</sub>/R<sub>sh</sub>), rectifying ratio (RR), and interface states density (N<sub>ss</sub>) by analyzing the I–V characteristics. The polyvinylpyrrolidone (PVP), barium titanate (BaTiO<sub>3</sub>) and graphene (Gr) nanoparticles are mixed together to create the interfacial nanocomposite layer. Training data for ANN algorithm is gathered using the thermionic emission hypothesis. In order to study the efficacy of the ANN model, the predictive power of the ANN technique for predicting the current conduction mechanisms and electronic properties of SDs has been assessed by comparing the predicted and experimental results. The ANN predictions of the current conduction mechanisms at the forward/reverse bias and the fundamental electronic specifications of the MS and MPS structures are a high level of agreement with the experimental results. Furthermore, the results show that the RR and R<sub>sh</sub> rise whereas the n, R<sub>s</sub>, and N<sub>ss</sub> for MS structure decrease when the PVP:Gr-BaTiO<sub>3</sub> nanocomposite interlayer is employed.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207957"},"PeriodicalIF":2.7,"publicationDate":"2024-08-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142021576","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Micro and Nanostructures
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1