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Shaping the future of lighting technology with micro/nano light emitting devices 用微型/纳米发光器件塑造照明技术的未来
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-21 DOI: 10.1016/j.micrna.2024.207932
{"title":"Shaping the future of lighting technology with micro/nano light emitting devices","authors":"","doi":"10.1016/j.micrna.2024.207932","DOIUrl":"10.1016/j.micrna.2024.207932","url":null,"abstract":"","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141772960","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Carbon dots-Zno/TiO2 ternary nanocomposite as a proficient material to enhance the performance of natural DSSC 碳点-氧化锌/二氧化钛三元纳米复合材料是提高天然 DSSC 性能的有效材料
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-20 DOI: 10.1016/j.micrna.2024.207934

A novel sustainable approach for enhancing the efficiency of dye-sensitized solar cells (DSSCs) involves the utilization of a combination of ZnO and carbon dots (CDs) derived from Citrus medica fruit extract, along with microwave-synthesized TiO2 nanoparticles for the preparation of the photoanode. Natural dyes such as Hibiscus rosa-sinensis and Allium Cepa peel are employed as sensitizers to reduce production costs. This co-activation method has demonstrated a significant improvement in the output parameters of the devices. Notably, the photoanode co-activated with ZnO-CD composite (ZnO-CD/TiO2) exhibits the most favorable output parameters when combined with Hibiscus rosa-sinensis dye (open circuit voltage (Voc) = 0.80 V, short circuit current density (Jsc) = 6.62 mA/cm2, fill factor (FF) = 64.20 %, photo conversion efficiency (PCE) = 3.40 %) and Allium Cepa peel dye (Voc = 0.81 V, Jsc = 6.79 mA/cm2, FF = 65.70 %, PCE = 3.61 %). When paired with Allium Cepa dye, the CD modified photoanode (CD/TiO2) offers Voc = 0.73 V, Jsc = 6.64 mA/cm2, FF = 61.27 % and PCE = 2.97 %. Similarly, when combined with Hibiscus rosa-sinensis dye, the output parameters of the CD/TiO2 photoanode are Voc = 0.72 V, Jsc = 6.54 mA/cm2, FF = 64.4 % and PCE = 3.03 %. In comparison to all tested devices, the unmodified photoanode (TiO2) displayed the lowest performance, with parameters such as Voc = 0.59 V, Jsc = 6.45 mA/cm2, FF = 52.5 %, PCE = 2.10 % using Allium Cepa peel dye, and Voc = 0.66 V, Jsc = 6 mA/cm2, FF = 51.60 %, PCE = 2.04 % using Hibiscus rosa-sinensis dye. Furthermore, the co-activation process has been shown to enhance the stability of the devices. While the unmodified photoanodes ceased to operate after eight days, the ZnO-CD composite co-activated photoanodes retained their initial efficiencies up to 61.50 % and 68.53 % with the Allium Cepa peel dye and Hibiscus rosa-sinensis dye, respectively. Therefore, this study underscores the potential of the synthesized composite material in enhancing the performance of natural DSSCs.

一种提高染料敏化太阳能电池(DSSC)效率的新型可持续方法是将氧化锌和从柑橘类水果提取物中提取的碳点(CD)与微波合成的二氧化钛纳米粒子结合起来用于制备光阳极。为降低生产成本,还采用了芙蓉和薤白皮等天然染料作为敏化剂。这种共激活方法显著改善了设备的输出参数。值得注意的是,与 ZnO-CD 复合材料(ZnO-CD/TiO2)共同激活的光阳极在与芙蓉染料结合时显示出最有利的输出参数(开路电压 (Voc) = 0.80 V、短路电流密度 (Jsc) = 6.62 mA/cm2、填充因子 (FF) = 64.20 %、光转换效率 (PCE) = 3.40 %)和薤白染料(Voc = 0.81 V、Jsc = 6.79 mA/cm2、FF = 65.70 %、PCE = 3.61 %)时,显示出最有利的输出参数。与薤白染料配对时,CD 修饰光阳极(CD/TiO2)的 Voc = 0.73 V,Jsc = 6.64 mA/cm2,FF = 61.27 %,PCE = 2.97 %。同样,当与芙蓉染料结合使用时,CD/TiO2 光阳极的输出参数为 Voc = 0.72 V、Jsc = 6.54 mA/cm2、FF = 64.4 % 和 PCE = 3.03 %。与所有测试装置相比,未改性光阳极(TiO2)的性能最低,使用葱皮染料时的参数为 Voc = 0.59 V,Jsc = 6.45 mA/cm2,FF = 52.5 %,PCE = 2.10 %;使用芙蓉染料时的参数为 Voc = 0.66 V,Jsc = 6 mA/cm2,FF = 51.60 %,PCE = 2.04 %。此外,共活化过程还提高了器件的稳定性。未改性的光阳极在八天后停止工作,而 ZnO-CD 复合共活化光阳极在使用葱皮染料和木槿染料时的初始效率分别高达 61.50 % 和 68.53 %。因此,本研究强调了合成的复合材料在提高天然 DSSC 性能方面的潜力。
{"title":"Carbon dots-Zno/TiO2 ternary nanocomposite as a proficient material to enhance the performance of natural DSSC","authors":"","doi":"10.1016/j.micrna.2024.207934","DOIUrl":"10.1016/j.micrna.2024.207934","url":null,"abstract":"<div><p>A novel sustainable approach for enhancing the efficiency of dye-sensitized solar cells (DSSCs) involves the utilization of a combination of ZnO and carbon dots (CDs) derived from Citrus medica fruit extract, along with microwave-synthesized TiO<sub>2</sub> nanoparticles for the preparation of the photoanode. Natural dyes such as <em>Hibiscus rosa-sinensis</em> and <em>Allium Cepa</em> peel are employed as sensitizers to reduce production costs. This co-activation method has demonstrated a significant improvement in the output parameters of the devices. Notably, the photoanode co-activated with ZnO-CD composite (ZnO-CD/TiO<sub>2</sub>) exhibits the most favorable output parameters when combined with <em>Hibiscus rosa-sinensis</em> dye (open circuit voltage (Voc) = 0.80 V, short circuit current density (Jsc) = 6.62 mA/cm<sup>2</sup>, fill factor (FF) = 64.20 %, photo conversion efficiency (PCE) = 3.40 %) and <em>Allium Cepa</em> peel dye (Voc = 0.81 V, Jsc = 6.79 mA/cm<sup>2</sup>, FF = 65.70 %, PCE = 3.61 %). When paired with <em>Allium Cepa</em> dye, the CD modified photoanode (CD/TiO<sub>2</sub>) offers Voc = 0.73 V, Jsc = 6.64 mA/cm<sup>2</sup>, FF = 61.27 % and PCE = 2.97 %. Similarly, when combined with <em>Hibiscus rosa-sinensis</em> dye, the output parameters of the CD/TiO<sub>2</sub> photoanode are Voc = 0.72 V, Jsc = 6.54 mA/cm<sup>2</sup>, FF = 64.4 % and PCE = 3.03 %. In comparison to all tested devices, the unmodified photoanode (TiO<sub>2</sub>) displayed the lowest performance, with parameters such as Voc = 0.59 V, Jsc = 6.45 mA/cm<sup>2</sup>, FF = 52.5 %, PCE = 2.10 % using <em>Allium Cepa</em> peel dye, and Voc = 0.66 V, Jsc = 6 mA/cm<sup>2</sup>, FF = 51.60 %, PCE = 2.04 % using <em>Hibiscus rosa-sinensis</em> dye. Furthermore, the co-activation process has been shown to enhance the stability of the devices. While the unmodified photoanodes ceased to operate after eight days, the ZnO-CD composite co-activated photoanodes retained their initial efficiencies up to 61.50 % and 68.53 % with the <em>Allium Cepa</em> peel dye and <em>Hibiscus rosa-sinensis</em> dye, respectively. Therefore, this study underscores the potential of the synthesized composite material in enhancing the performance of natural DSSCs.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141849075","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A P+ pocket doped 4H–SiC Schottky barrier FET as highly sensitive label-free biosensor 作为高灵敏度无标记生物传感器的 P+ 袋掺杂 4H-SiC 肖特基势垒场效应晶体管
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-19 DOI: 10.1016/j.micrna.2024.207931

In this paper, a 4H–SiC Schottky barrier field-effect transistor with a P+ doping Pocket based on dielectric modulation effect for label-free detection of biomolecules has been proposed. Upon optimization of the length and position of P+ doping pocket, the sensitivity of the biosensor achieves the maximum when it is located within the channel 1 nm away from the Schottky contact with a length of 5 nm. Simulations have been performed for different dielectric constants and biomolecules with different charge densities by Sentaurus TCAD. The results show that the new structure has an on-current sensitivity of 1.03 × 108, a maximum transconductance sensitivity of 6.24 × 107, a threshold voltage sensitivity of 65 mV, and an Ion/Ioff ratio sensitivity of 1.8 × 104 for neutral biomolecules with K = 12. In addition, the fill factor of the cavity and linearity of the proposed structure are considered in this paper. Further, the on-current sensitivity of our proposed structure is gauged against state of the art, which demonstrate a high sensitivity of our proposed biosensors. The smaller size and prominent sensitivity characteristics of the biosensor proposed in this paper have made it widely used in the field of biomedical detection that requires high integration and efficient detection.

本文提出了一种基于介电调制效应、带有 P+ 掺杂袋的 4H-SiC 肖特基势垒场效应晶体管,用于无标记生物分子检测。通过优化 P+掺杂袋的长度和位置,当 P+掺杂袋位于距离肖特基触点 1 nm、长度为 5 nm 的沟道内时,生物传感器的灵敏度达到最大。我们利用 Sentaurus TCAD 对不同介电常数和不同电荷密度的生物分子进行了模拟。结果表明,对于 K = 12 的中性生物分子,新结构的导通电流灵敏度为 1.03 × 108,最大跨导灵敏度为 6.24 × 107,阈值电压灵敏度为 65 mV,离子/关断比灵敏度为 1.8 × 104。此外,本文还考虑了空腔的填充因子和拟议结构的线性度。此外,本文还将拟议结构的导通电流灵敏度与现有技术进行了比较,结果表明我们提出的生物传感器具有很高的灵敏度。本文提出的生物传感器具有体积小、灵敏度高的特点,因此被广泛应用于要求高集成度和高效检测的生物医学检测领域。
{"title":"A P+ pocket doped 4H–SiC Schottky barrier FET as highly sensitive label-free biosensor","authors":"","doi":"10.1016/j.micrna.2024.207931","DOIUrl":"10.1016/j.micrna.2024.207931","url":null,"abstract":"<div><p>In this paper, a 4H–SiC Schottky barrier field-effect transistor with a P<sup>+</sup> doping Pocket based on dielectric modulation effect for label-free detection of biomolecules has been proposed. Upon optimization of the length and position of P<sup>+</sup> doping pocket, the sensitivity of the biosensor achieves the maximum when it is located within the channel 1 nm away from the Schottky contact with a length of 5 nm. Simulations have been performed for different dielectric constants and biomolecules with different charge densities by Sentaurus TCAD. The results show that the new structure has an on-current sensitivity of 1.03 × 10<sup>8</sup>, a maximum transconductance sensitivity of 6.24 × 10<sup>7</sup>, a threshold voltage sensitivity of 65 mV, and an I<sub>on</sub>/I<sub>off</sub> ratio sensitivity of 1.8 × 10<sup>4</sup> for neutral biomolecules with K = 12. In addition, the fill factor of the cavity and linearity of the proposed structure are considered in this paper. Further, the on-current sensitivity of our proposed structure is gauged against state of the art, which demonstrate a high sensitivity of our proposed biosensors. The smaller size and prominent sensitivity characteristics of the biosensor proposed in this paper have made it widely used in the field of biomedical detection that requires high integration and efficient detection.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141848263","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Cutting-edge vertical tunnel FETs: GaSb/InSb heterojunction source-all-around tunnel FET with I60 of 2.73×10⁻⁴ A/μm and Sub-10 mV/dec SS 最先进的垂直隧道场效应晶体管:I60 为 2.73×10-⁴ A/μm 且 SS 低于 10 mV/dec 的镓硒/铟硒异质结源环隧道场效应晶体管
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-19 DOI: 10.1016/j.micrna.2024.207933

This work introduces an innovative Source-All-Around Vertical Tunnel Field-Effect Transistor (SAA-VTFET) design based on III-V semiconductors. The unique combination of a GaSb/InSb heterojunction, a wider tunneling space, and an n+ source pocket significantly enhances band-to-band tunneling (BTBT), leading to exceptional on-current levels. The device architecture utilizes InSb in the source pocket and channel, materials chosen for their properties that enable efficient carrier transport, ultimately boosting overall device performance. Through meticulous optimization, the SAA-VTFET achieves an I60 (Ids at SS = 60mV/dec) of 2.73 × 10−4 A/μm, an exceptionally low off-current of 1.7 × 10−17 A/μm, a low threshold voltage of 0.16 V, an outstanding ION/IOFF Ratio of 1.64 × 1013, and an attractive subthreshold swing (point SS of 4 mV/dec, average SS of 7 mV/dec). These remarkable achievements underscore the SAA-VTFET's potential to surpass conventional TFETs, paving the way for advanced low-power, high-speed electronics.

这项研究介绍了一种基于 III-V 半导体的创新型源环垂直隧道场效应晶体管 (SAA-VTFET) 设计。GaSb/InSb 异质结、更宽的隧道空间和 n+ 源口袋的独特组合大大增强了带对带隧道效应 (BTBT),从而实现了卓越的导通电流水平。该器件结构在源极袋和沟道中使用了 InSb,这些材料因其可实现高效载流子传输的特性而被选用,最终提高了器件的整体性能。通过精心优化,SAA-VTFET 实现了 2.73 × 10-4 A/μm 的 I60(SS = 60mV/dec 时的 Ids)、1.7 × 10-17 A/μm 的超低关断电流、0.16 V 的低阈值电压、1.64 × 1013 的出色 ION/IOFF 比以及极具吸引力的亚阈值摆幅(点 SS 为 4 mV/dec,平均 SS 为 7 mV/dec)。这些卓越的成就彰显了 SAA-VTFET 超越传统 TFET 的潜力,为先进的低功耗、高速电子器件铺平了道路。
{"title":"Cutting-edge vertical tunnel FETs: GaSb/InSb heterojunction source-all-around tunnel FET with I60 of 2.73×10⁻⁴ A/μm and Sub-10 mV/dec SS","authors":"","doi":"10.1016/j.micrna.2024.207933","DOIUrl":"10.1016/j.micrna.2024.207933","url":null,"abstract":"<div><p>This work introduces an innovative Source-All-Around Vertical Tunnel Field-Effect Transistor (SAA-VTFET) design based on III-V semiconductors. The unique combination of a GaSb/InSb heterojunction, a wider tunneling space, and an n<sup>+</sup> source pocket significantly enhances band-to-band tunneling (BTBT), leading to exceptional on-current levels. The device architecture utilizes InSb in the source pocket and channel, materials chosen for their properties that enable efficient carrier transport, ultimately boosting overall device performance. Through meticulous optimization, the SAA-VTFET achieves an I<sub>60</sub> (I<sub>ds</sub> at SS = 60mV/dec) of 2.73 × 10<sup>−4</sup> A/μm, an exceptionally low off-current of 1.7 × 10<sup>−17</sup> A/μm, a low threshold voltage of 0.16 V, an outstanding I<sub>ON</sub>/I<sub>OFF</sub> Ratio of 1.64 × 10<sup>13</sup>, and an attractive subthreshold swing (point SS of 4 mV/dec, average SS of 7 mV/dec). These remarkable achievements underscore the SAA-VTFET's potential to surpass conventional TFETs, paving the way for advanced low-power, high-speed electronics.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141853052","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analysis of nano sheet field effect transistor based on performance under different temperature and doping concentrations for 12 nm device 基于 12 纳米器件在不同温度和掺杂浓度下性能的纳米片场效应晶体管分析
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-19 DOI: 10.1016/j.micrna.2024.207929

This paper presents a simulation study on a 12 nm Gate-all-around n-type Metal Oxide Semiconductor (GAA-nMOSFET), investigating the effects of temperature variations and doping concentrations. The structure of the device has three fins, and the channel is surrounded by gate material to reduce the short channel effect (SCE) and electrostatic capacitance. Various parameters such as threshold voltage (Vth), Ion/Ioff ratio, drain-induced barrier lowering (DIBL), and sub-threshold swing (SS) are evaluated at different temperatures 250 K, 300 K, and 350 K, doping concentrations of 1016cm−3, 1017cm−3, and 1018cm−3, with a high voltage of 0.65V. At a temperature of 250 K, in comparison to the 1016cm−3 doping concentration attention, the Vth is observed to be 0.31V, while the Ion/Ioff ratio is measured at 0.33e−14. Moreover, the DIBL experiences a reduction of 25 %, whereas the SS increases by 76 %. Furthermore, when the temperature is raised to 300 K relative to the 1017cm−3 doping concentration, the Vth increases to 0.32 V, and the Ion/Ioff current ratio rises to 0.45e−14. Meanwhile, the DIBL experiences a decrease of 20 %, and the SS increases by 71 %. Finally, at a temperature of 350 K concerning 1018cm−3 doping concentration, the Vth is measured at 0.34 V, and the Ion/Ioff current ratio reaches 0.47e−14 Concurrently, the DIBL shows a decrease of 28 %, While the SS increases to 79 %. To reduce electrostatic capacitance and leakage current, the use of a high-k dielectric material in a GAA-nMOSFET device is investigated. Improved performance traits such as decreased SCE, low DIBL, and strong SS are displayed. Additionally, the connection between threshold voltage and doping concentration is investigated. The effect of temperature variations and doping concentration on many essential characteristics of 12 nm GAA-nMOSFET shows the potential benefits of the device's unique architecture and material. The conclusions are supported through circuit schematics, simulations, and experimental data in this article.

本文介绍了对 12 nm 全栅极 n 型金属氧化物半导体(GAA-nMOSFET)的模拟研究,探讨了温度变化和掺杂浓度的影响。该器件的结构有三个鳍片,沟道被栅极材料包围,以减少短沟道效应(SCE)和静电电容。在不同温度(250 K、300 K 和 350 K)、掺杂浓度(10 厘米、10 厘米和 10 厘米)和 0.65V 高电压下,对阈值电压 (V)、I/I 比、漏极诱导势垒降低 (DIBL) 和阈下摆动 (SS) 等各种参数进行了评估。在 250 K 的温度下,与 10cm 的掺杂浓度相比,电压为 0.31V,而 I/I 比为 0.33e。此外,DIBL 下降了 25%,而 SS 则增加了 76%。此外,当温度相对于 10 厘米掺杂浓度升高到 300 K 时,V 值升高到 0.32 V,I/I 电流比升高到 0.45e。同时,DIBL 下降了 20%,SS 增加了 71%。最后,在温度为 350 K、掺杂浓度为 10cm 的条件下,测量到的 V 值为 0.34 V,I/I 电流比达到 0.47e 同时,DIBL 下降了 28%,而 SS 则增加了 79%。为了减少静电电容和漏电流,研究了在 GAA-nMOSFET 器件中使用高介电材料的问题。结果表明,该器件的性能特征得到了改善,如 SCE 减小、DIBL 降低和 SS 增强。此外,还研究了阈值电压与掺杂浓度之间的联系。温度变化和掺杂浓度对 12 nm GAA-nMOSFET 许多基本特性的影响显示了该器件独特结构和材料的潜在优势。本文通过电路原理图、仿真和实验数据为结论提供了支持。
{"title":"Analysis of nano sheet field effect transistor based on performance under different temperature and doping concentrations for 12 nm device","authors":"","doi":"10.1016/j.micrna.2024.207929","DOIUrl":"10.1016/j.micrna.2024.207929","url":null,"abstract":"<div><p>This paper presents a simulation study on a 12 nm Gate-all-around n-type Metal Oxide Semiconductor (GAA-nMOSFET), investigating the effects of temperature variations and doping concentrations. The structure of the device has three fins, and the channel is surrounded by gate material to reduce the short channel effect (SCE) and electrostatic capacitance. Various parameters such as threshold voltage (V<sub>th</sub>), I<sub>on</sub>/I<sub>off</sub> ratio, drain-induced barrier lowering (DIBL), and sub-threshold swing (SS) are evaluated at different temperatures 250 K, 300 K, and 350 K, doping concentrations of 10<sup>16</sup>cm<sup>−3</sup>, 10<sup>17</sup>cm<sup>−3</sup>, and 10<sup>18</sup>cm<sup>−3</sup>, with a high voltage of 0.65V. At a temperature of 250 K, in comparison to the 10<sup>16</sup>cm<sup>−3</sup> doping concentration attention, the V<sub>th</sub> is observed to be 0.31V, while the I<sub>on</sub>/I<sub>off</sub> ratio is measured at 0.33e<sup>−14</sup>. Moreover, the DIBL experiences a reduction of 25 %, whereas the SS increases by 76 %. Furthermore, when the temperature is raised to 300 K relative to the 10<sup>17</sup>cm<sup>−3</sup> doping concentration, the V<sub>th</sub> increases to 0.32 V, and the I<sub>on</sub>/I<sub>off</sub> current ratio rises to 0.45e<sup>−14</sup>. Meanwhile, the DIBL experiences a decrease of 20 %, and the SS increases by 71 %. Finally, at a temperature of 350 K concerning 10<sup>18</sup>cm<sup>−3</sup> doping concentration, the V<sub>th</sub> is measured at 0.34 V, and the I<sub>on</sub>/I<sub>off</sub> current ratio reaches 0.47e<sup>−14</sup> Concurrently, the DIBL shows a decrease of 28 %, While the SS increases to 79 %. To reduce electrostatic capacitance and leakage current, the use of a high-k dielectric material in a GAA-nMOSFET device is investigated. Improved performance traits such as decreased SCE, low DIBL, and strong SS are displayed. Additionally, the connection between threshold voltage and doping concentration is investigated. The effect of temperature variations and doping concentration on many essential characteristics of 12 nm GAA-nMOSFET shows the potential benefits of the device's unique architecture and material. The conclusions are supported through circuit schematics, simulations, and experimental data in this article.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141772961","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Numerical simulation of GaN single-crystal processing using diamond abrasives under graphene lubrication 石墨烯润滑条件下使用金刚石磨料加工氮化镓单晶的数值模拟
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-18 DOI: 10.1016/j.micrna.2024.207930

Molecular dynamics simulations were performed to investigate a novel technique for cutting gallium nitride (GaN) with the help of graphene lubrication. A scratch model of GaN coated with graphene was developed, and changes in the surface topography, atomic displacement, atomic cutting force, temperature, defect atoms, and the process of graphene fracture. The graphene coating on the surface of the GaN workpiece inhibits the movement of atoms in the workpiece during the scratching process, with minimal chip deposition in front of the abrasive. The amount of defective atoms rises as the depth of the scratch increases. Graphene is more susceptible to fracture at larger depths. In addition, using graphene lubrication to cut GaN can enhance surface integrity while concurrently diminishing material removal effectiveness. Furthermore, using graphene as a solid lubricant on various materials, can also greatly reduce friction. These findings provide insights for the design and processing of these brittle materials.

分子动力学模拟研究了一种借助石墨烯润滑切割氮化镓(GaN)的新技术。建立了涂有石墨烯的氮化镓的划痕模型,研究了表面形貌、原子位移、原子切削力、温度、缺陷原子以及石墨烯断裂过程的变化。在划痕过程中,氮化镓工件表面的石墨烯涂层抑制了工件中原子的运动,磨料前的切屑沉积极少。缺陷原子的数量随着划痕深度的增加而增加。划痕深度越大,石墨烯越容易断裂。此外,使用石墨烯润滑来切割 GaN 可以提高表面完整性,同时降低材料去除效果。此外,在各种材料上使用石墨烯作为固体润滑剂,也能大大减少摩擦。这些发现为这些脆性材料的设计和加工提供了启示。
{"title":"Numerical simulation of GaN single-crystal processing using diamond abrasives under graphene lubrication","authors":"","doi":"10.1016/j.micrna.2024.207930","DOIUrl":"10.1016/j.micrna.2024.207930","url":null,"abstract":"<div><p>Molecular dynamics simulations were performed to investigate a novel technique for cutting gallium nitride (GaN) with the help of graphene lubrication. A scratch model of GaN coated with graphene was developed, and changes in the surface topography, atomic displacement, atomic cutting force, temperature, defect atoms, and the process of graphene fracture. The graphene coating on the surface of the GaN workpiece inhibits the movement of atoms in the workpiece during the scratching process, with minimal chip deposition in front of the abrasive. The amount of defective atoms rises as the depth of the scratch increases. Graphene is more susceptible to fracture at larger depths. In addition, using graphene lubrication to cut GaN can enhance surface integrity while concurrently diminishing material removal effectiveness. Furthermore, using graphene as a solid lubricant on various materials, can also greatly reduce friction. These findings provide insights for the design and processing of these brittle materials.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141736751","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A novel Pumice@PVA membrane with high separation efficiency for oil-water emulsion application 新型浮石@PVA 膜在油水乳液应用中具有高分离效率
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-08 DOI: 10.1016/j.micrna.2024.207928

Oil pollution poses a major threat to both human health and economic development, and therefore the development and improvement of oil-water separation technology is urgent. Traditional methods have problems such as complicated preparation, high cost and the vulnerability of lipophilic materials to oil contamination. Therefore, finding an inorganic material that meets the requirements of underwater superoleophobic performance and reduces surface modification has become a new demand. In this study, natural pumice was found for the first time to have excellent underwater superoleophobic performance and chemical stability, and the underwater superoleophobic filter membrane was prepared by vacuum adsorption using hydrogen bond cross-linking between natural pumice and PVA. The experimental data show that the prepared PVA/natural pumice ultrafiltration membrane has superhydrophilic and superoleophobic properties, and exhibits excellent stability (OWA>150°) under the harsh environment of strong acid and strong alkali. In addition, the composite membrane has good emulsion separation efficiency (>97 %) and a separation flux of 39.91 Lm-2h-1. It is demonstrated that the composite membrane has oleophobic and wettable properties, and is capable of separating both oil-water mixtures without phase mixing and oil-in-water emulsions without oil contamination. This study provides a new idea for the preparation of superoleophobic materials for oil-water separation, which has the potential for large-scale application.

石油污染对人类健康和经济发展都构成了重大威胁,因此开发和改进油水分离技术迫在眉睫。传统方法存在制备复杂、成本高、亲油材料易受油污染等问题。因此,寻找一种既能满足水下超疏油性能要求,又能减少表面改性的无机材料成为新的需求。本研究首次发现天然浮石具有优异的水下超疏油性能和化学稳定性,并利用天然浮石与 PVA 之间的氢键交联,通过真空吸附法制备了水下超疏油滤膜。实验数据表明,制备的 PVA/天然浮石超滤膜具有超亲水性和超疏水性,在强酸、强碱等恶劣环境下表现出优异的稳定性(OWA>150°)。此外,该复合膜还具有良好的乳液分离效率(97%)和 39.91 Lm-2h-1 的分离通量。研究表明,该复合膜具有疏油和可润湿的特性,既能分离油水混合物而不发生相混合,也能分离水包油乳液而不产生油污染。这项研究为制备用于油水分离的超疏油材料提供了新思路,具有大规模应用的潜力。
{"title":"A novel Pumice@PVA membrane with high separation efficiency for oil-water emulsion application","authors":"","doi":"10.1016/j.micrna.2024.207928","DOIUrl":"10.1016/j.micrna.2024.207928","url":null,"abstract":"<div><p>Oil pollution poses a major threat to both human health and economic development, and therefore the development and improvement of oil-water separation technology is urgent. Traditional methods have problems such as complicated preparation, high cost and the vulnerability of lipophilic materials to oil contamination. Therefore, finding an inorganic material that meets the requirements of underwater superoleophobic performance and reduces surface modification has become a new demand. In this study, natural pumice was found for the first time to have excellent underwater superoleophobic performance and chemical stability, and the underwater superoleophobic filter membrane was prepared by vacuum adsorption using hydrogen bond cross-linking between natural pumice and PVA. The experimental data show that the prepared PVA/natural pumice ultrafiltration membrane has superhydrophilic and superoleophobic properties, and exhibits excellent stability (OWA&gt;150°) under the harsh environment of strong acid and strong alkali. In addition, the composite membrane has good emulsion separation efficiency (&gt;97 %) and a separation flux of 39.91 Lm<sup>-2</sup>h<sup>-1</sup>. It is demonstrated that the composite membrane has oleophobic and wettable properties, and is capable of separating both oil-water mixtures without phase mixing and oil-in-water emulsions without oil contamination. This study provides a new idea for the preparation of superoleophobic materials for oil-water separation, which has the potential for large-scale application.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141637362","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of AZO seed layers on the ultraviolet photoresponse of Ag/ZnO NRs Schottky junctions AZO 种子层对 Ag/ZnO NRs 肖特基结紫外线光响应的影响
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-06 DOI: 10.1016/j.micrna.2024.207927
Shaobo Shi , Ding Liu , Jianping Xu , Lan Li

Al-doped ZnO (AZO) thin films with different layers were prepared by sol-gel method. The SEM, XRD and AFM for three layers thin films demonstrates high crystal quality and low roughness. ZnO nanorods arrays (NRs) with different AZO seed layers were fabricated using hydrothermal process, and the effect of AZO seed layers on the structural, optical, and electrical characteristics was investigated. When there are three AZO seed layers present, ZnO NRs exhibit fewer surface states, smaller interface charge transfer resistance (Rce = 6.1 × 103Ωand Rct = 6.6 × 106Ω), longer carrier lifetimes (τe = 4.0 ms), higher carrier concentration (ND = 4.73 × 1019 cm−3), and narrower depletion region width W = 3.1 nm. Under weak UV light 381 nm (5.68 mW/cm2) at a bias −0.5 V, Ag/ZnO NRs Schottky devices with three AZO seed layers display a comparatively strong responsivity 34.64 mA/W. Appropriate AZO seed layers are favorable for highly efficient ZnO NRs-based photoelectric conversion devices.

采用溶胶-凝胶法制备了不同层的铝掺杂氧化锌(AZO)薄膜。三层薄膜的扫描电子显微镜(SEM)、X射线衍射(XRD)和原子力显微镜(AFM)均显示出较高的晶体质量和较低的粗糙度。利用水热法制备了具有不同 AZO 种子层的 ZnO 纳米棒阵列(NRs),并研究了 AZO 种子层对其结构、光学和电学特性的影响。当存在三个 AZO 种子层时,ZnO NRs 的表面状态更少,界面电荷转移电阻更小(= 6.1 × 10Ω 和 = 6.6 × 10Ω),载流子寿命更长(= 4.0 ms),载流子浓度更高(= 4.73 × 10 cm),耗尽区宽度更窄(= 3.1 nm)。在偏压为 -0.5 V、波长为 381 nm(5.68 mW/cm)的弱紫外光下,具有三个 AZO 种子层的 Ag/ZnO NRs 肖特基器件显示出相对较强的响应率 34.64 mA/W。适当的 AZO 种子层有利于实现基于 ZnO NRs 的高效光电转换器件。
{"title":"Effect of AZO seed layers on the ultraviolet photoresponse of Ag/ZnO NRs Schottky junctions","authors":"Shaobo Shi ,&nbsp;Ding Liu ,&nbsp;Jianping Xu ,&nbsp;Lan Li","doi":"10.1016/j.micrna.2024.207927","DOIUrl":"10.1016/j.micrna.2024.207927","url":null,"abstract":"<div><p>Al-doped ZnO (AZO) thin films with different layers were prepared by sol-gel method. The SEM, XRD and AFM for three layers thin films demonstrates high crystal quality and low roughness. ZnO nanorods arrays (NRs) with different AZO seed layers were fabricated using hydrothermal process, and the effect of AZO seed layers on the structural, optical, and electrical characteristics was investigated. When there are three AZO seed layers present, ZnO NRs exhibit fewer surface states, smaller interface charge transfer resistance (<em>R</em><sub><em>ce</em></sub> = 6.1 × 10<sup>3</sup>Ωand <em>R</em><sub><em>ct</em></sub> = 6.6 × 10<sup>6</sup>Ω), longer carrier lifetimes (<span><math><mrow><msub><mi>τ</mi><mi>e</mi></msub></mrow></math></span> = 4.0 ms), higher carrier concentration (<em>N</em><sub><em>D</em></sub> = 4.73 × 10<sup>19</sup> cm<sup>−3</sup>), and narrower depletion region width <em>W</em> = 3.1 nm. Under weak UV light 381 nm (5.68 mW/cm<sup>2</sup>) at a bias −0.5 V, Ag/ZnO NRs Schottky devices with three AZO seed layers display a comparatively strong responsivity 34.64 mA/W. Appropriate AZO seed layers are favorable for highly efficient ZnO NRs-based photoelectric conversion devices.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141587461","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Applying the high-k dielectric materials in vertical multilayer graphene nanoribbon (V-MLGNR) based interconnect for improving transmission performance 在基于垂直多层石墨烯纳米带(V-MLGNR)的互联中应用高介电材料以提高传输性能
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-04 DOI: 10.1016/j.micrna.2024.207926
Peng Xu , Huan Huang , Fa Zou , Lei Xie

In order to solve the electrical performance limitations of horizontal multilayer graphene nanoribbon (H-MLGNR) based interconnect, a new geometric structure of vertical multilayer graphene nanoribbon (V-MLGNR) based interconnect is proposed in this paper. A numerical model for H-MLGNR and V-MLGNR based interconnects is established to investigate the performance in time and frequency domain, where the high-k dielectric materials (HKDM) are introduced for improving their transmission performance. The computation results demonstrate that the delay time for H-MLGNR and V-MLGNR based interconnects with embedded BaTiO3–Ni case can be reduced over 89.601 % and 93.723 % in comparison to the original H-MLGNR and V-MLGNR based interconnects, respectively. The corresponding 3-dB bandwidth for them can be expanded over 1.928 and 2.957 times, respectively. Moreover, it is manifested that the delay time of V-MLGNR based interconnect for the original, embedding the HfO2, TiO2, SrTiO3, BaTiO3, 6.0 vol% BaTiO3–Ni and 12.0 vol% BaTiO3–Ni cases can be reduced over 11.644 %, 13.269 %, 16.851 %, 22.311 %, 27.589 %, 33.608 % and 46.556 % as compared with the conventional H-MLGNR based interconnect, respectively. Meanwhile the corresponding 3-dB bandwidth of the former for the original, embedding the HfO2, TiO2, SrTiO3, BaTiO3, 6.0 vol% BaTiO3–Ni and 12.0 vol% BaTiO3–Ni cases can be enhanced over 1.113, 1.126, 1.155, 1.207, 1.266, 1.366 and 1.737 times as compared with the latter, respectively. In addition, the signal integrity of the proposed V-MLGNR based interconnects with embedded HKDM is greater than H-MLGNR based interconnects, while the power consumption of the former is slightly higher than the latter. Therefore, the proposed new interconnect structure concerning the V-MLGNR with embedded HKDM would be rewarding to enhance transmission performance of interconnect system in VLIS circuits.

为了解决基于水平多层石墨烯纳米带(H-MLGNR)互连的电气性能限制,本文提出了一种基于垂直多层石墨烯纳米带(V-MLGNR)互连的新型几何结构。本文建立了基于 H-MLGNR 和 V-MLGNR 互连的数值模型,以研究其在时域和频域的性能,其中引入了高介电材料 (HKDM) 以改善其传输性能。计算结果表明,与原始的 H-MLGNR 和 V-MLGNR 互连相比,嵌入 BaTiO-Ni 的 H-MLGNR 和 V-MLGNR 互连的延迟时间分别缩短了 89.601 % 和 93.723 %。相应的 3-dB 带宽分别扩大了 1.928 倍和 2.957 倍。此外,基于 V-MLGNR 的互联线路的延迟时间表现为原始线路、嵌入 HfO、TiO、SrTiO、BaTiO、6.0 vol% BaTiO-Ni 和 12.与基于 H-MLGNR 的传统互连相比,嵌入 HfO、TiO、SrTiO、BaTiO、6.0 vol% BaTiO-Ni 和 12.0 vol% BaTiO-Ni 的情况可分别减少 11.644 %、13.269 %、16.851 %、22.311 %、27.589 %、33.608 % 和 46.556 %。同时,与后者相比,前者在原始、嵌入 HfO、TiO、SrTiO、BaTiO、6.0 vol% BaTiO-Ni 和 12.0 vol% BaTiO-Ni 情况下的相应 3-dB 带宽分别提高了 1.113、1.126、1.155、1.207、1.266、1.366 和 1.737 倍。此外,基于嵌入式 HKDM 的拟议 V-MLGNR 互连的信号完整性高于基于 H-MLGNR 的互连,而前者的功耗略高于后者。因此,所提出的带有嵌入式 HKDM 的 V-MLGNR 新型互连结构将有助于提高 VLIS 电路中互连系统的传输性能。
{"title":"Applying the high-k dielectric materials in vertical multilayer graphene nanoribbon (V-MLGNR) based interconnect for improving transmission performance","authors":"Peng Xu ,&nbsp;Huan Huang ,&nbsp;Fa Zou ,&nbsp;Lei Xie","doi":"10.1016/j.micrna.2024.207926","DOIUrl":"10.1016/j.micrna.2024.207926","url":null,"abstract":"<div><p>In order to solve the electrical performance limitations of horizontal multilayer graphene nanoribbon (H-MLGNR) based interconnect, a new geometric structure of vertical multilayer graphene nanoribbon (V-MLGNR) based interconnect is proposed in this paper. A numerical model for H-MLGNR and V-MLGNR based interconnects is established to investigate the performance in time and frequency domain, where the high-k dielectric materials (HKDM) are introduced for improving their transmission performance. The computation results demonstrate that the delay time for H-MLGNR and V-MLGNR based interconnects with embedded BaTiO<sub>3</sub>–Ni case can be reduced over 89.601 % and 93.723 % in comparison to the original H-MLGNR and V-MLGNR based interconnects, respectively. The corresponding 3-dB bandwidth for them can be expanded over 1.928 and 2.957 times, respectively. Moreover, it is manifested that the delay time of V-MLGNR based interconnect for the original, embedding the HfO<sub>2</sub>, TiO<sub>2</sub>, SrTiO<sub>3</sub>, BaTiO<sub>3</sub>, 6.0 vol% BaTiO<sub>3</sub>–Ni and 12.0 vol% BaTiO<sub>3</sub>–Ni cases can be reduced over 11.644 %, 13.269 %, 16.851 %, 22.311 %, 27.589 %, 33.608 % and 46.556 % as compared with the conventional H-MLGNR based interconnect, respectively. Meanwhile the corresponding 3-dB bandwidth of the former for the original, embedding the HfO<sub>2</sub>, TiO<sub>2</sub>, SrTiO<sub>3</sub>, BaTiO<sub>3</sub>, 6.0 vol% BaTiO<sub>3</sub>–Ni and 12.0 vol% BaTiO<sub>3</sub>–Ni cases can be enhanced over 1.113, 1.126, 1.155, 1.207, 1.266, 1.366 and 1.737 times as compared with the latter, respectively. In addition, the signal integrity of the proposed V-MLGNR based interconnects with embedded HKDM is greater than H-MLGNR based interconnects, while the power consumption of the former is slightly higher than the latter. Therefore, the proposed new interconnect structure concerning the V-MLGNR with embedded HKDM would be rewarding to enhance transmission performance of interconnect system in VLIS circuits.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141587462","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Noise and sensitivity analysis of the dielectric modulated reconfigurable SiNW-SBT for biosensor applications 用于生物传感器应用的介电调制可重构 SiNW-SBT 的噪声和灵敏度分析
IF 2.7 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2024-07-01 DOI: 10.1016/j.micrna.2024.207923
Anil Kumar, Sumit Kale

For the first time, we reported the noise and sensitivity analysis of the Dielectric Modulated Reconfigurable Silicon Nanowire-based Schottky Barrier Transistor (DMR SiNW-SBT) for biosensor applications. To validate the simulation, we present experimental calibration of the DMR SiNW-SBT biosensor. The biomolecules having different dielectric constants and charge densities are immobilized in the cavity region under the control gate. These biomolecules modulate the Schottky junction width at the source channel interface and enhance the drain current of the biosensor. The simulation results indicate that the proposed device ION and VTH sensitivity improved by 54.65 % and 85.71 %, respectively, with the state-of-the-art biosensors. Noise analysis shows that the NFmin decreased by 190.32 % and offers a low source impedance of 70Ω, which minimizes signal loss and distortion. Additionally, we investigate the linearity parameters that outperformed the FET-based biosensors. The gm3 experiences a reduction of 123.21 %, while the VIP3 sees an increase of 7.87 % and the IIP3 shows a rise of 7.21 %. Furthermore, we have conducted device optimization by varying the cavity length and thickness. We also outline potential fabrication steps for the DMR SiNW-SBT biosensor. Thus, results show that the proposed biosensor emerges as a promising candidate for advanced biosensing applications with high sensitivity, enhanced linearity, and robust noise resilience.

我们首次报道了用于生物传感器应用的介质调制可重构硅纳米线肖特基势垒晶体管(DMR SiNW-SBT)的噪声和灵敏度分析。为了验证模拟结果,我们对 DMR SiNW-SBT 生物传感器进行了实验校准。具有不同介电常数和电荷密度的生物分子被固定在控制栅极下的空腔区域。这些生物分子可调节源通道接口的肖特基结宽度,并增强生物传感器的漏极电流。仿真结果表明,与最先进的生物传感器相比,拟议器件的 ION 和 VTH 灵敏度分别提高了 54.65% 和 85.71%。噪声分析表明,NFmin 降低了 190.32%,并提供了 70Ω 的低源阻抗,从而最大限度地减少了信号损失和失真。此外,我们还对线性参数进行了研究,结果表明其性能优于基于 FET 的生物传感器。gm3 下降了 123.21%,VIP3 上升了 7.87%,IIP3 上升了 7.21%。此外,我们还通过改变空腔长度和厚度对器件进行了优化。我们还概述了 DMR SiNW-SBT 生物传感器的潜在制造步骤。因此,研究结果表明,所提出的生物传感器具有灵敏度高、线性度强、抗噪声能力强等优点,是先进生物传感应用的理想候选器件。
{"title":"Noise and sensitivity analysis of the dielectric modulated reconfigurable SiNW-SBT for biosensor applications","authors":"Anil Kumar,&nbsp;Sumit Kale","doi":"10.1016/j.micrna.2024.207923","DOIUrl":"https://doi.org/10.1016/j.micrna.2024.207923","url":null,"abstract":"<div><p>For the first time, we reported the noise and sensitivity analysis of the Dielectric Modulated Reconfigurable Silicon Nanowire-based Schottky Barrier Transistor (DMR SiNW-SBT) for biosensor applications. To validate the simulation, we present experimental calibration of the DMR SiNW-SBT biosensor. The biomolecules having different dielectric constants and charge densities are immobilized in the cavity region under the control gate. These biomolecules modulate the Schottky junction width at the source channel interface and enhance the drain current of the biosensor. The simulation results indicate that the proposed device <em>I</em><sub><em>ON</em></sub> and <em>V</em><sub><em>TH</em></sub> sensitivity improved by 54.65 % and 85.71 %, respectively, with the state-of-the-art biosensors. Noise analysis shows that the <em>NF</em><sub>min</sub> decreased by 190.32 % and offers a low source impedance of 70Ω, which minimizes signal loss and distortion. Additionally, we investigate the linearity parameters that outperformed the FET-based biosensors. The gm3 experiences a reduction of 123.21 %, while the VIP3 sees an increase of 7.87 % and the IIP3 shows a rise of 7.21 %. Furthermore, we have conducted device optimization by varying the cavity length and thickness. We also outline potential fabrication steps for the DMR SiNW-SBT biosensor. Thus, results show that the proposed biosensor emerges as a promising candidate for advanced biosensing applications with high sensitivity, enhanced linearity, and robust noise resilience.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":2.7,"publicationDate":"2024-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141542466","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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