Pub Date : 2024-08-02DOI: 10.1016/j.micrna.2024.207940
Naceur Selmane , Ali Cheknane , Hikmat S. Hilal
To avoid Shockley-Queisser limit in single p-n junctions, tandem solar cells were proposed. A new tandem cell is simulated here using the 1-dimensional SCAPS. The new cell combines two reported single solar cells together, aiming at achieving high performance by optimizing various layer characteristics. The bottom sub-cell is Mo/Si(p)/CZTSSe(p)/CdS(n)/ZnO(i)/ZnO(Al), where ZnO is an electrodeposited transparent-conductor oxide, with high UV transmittance, ZnO(i) is intrinsic layer, CZTSSe/Si is bi-absorber layer of p-CuZnSnSSe and p-Si, Mo is back contact. The optimized sub-cell exhibits a high fill factor of 85.18 % with overall efficiency 20 %. Based on literature, a perovskite CsPbI2Br layer is included in the top sub-cell Cu2O(HTL)/CsPbI2Br)/TiO2(ETL), where Cu2O is a hole-transport layer and TiO2 is electron-transport layer. The top sub-cell layers have been carefully selected for best alignment. Matching and optimizing various parameters in the two sub-cells is a simulation challenge. Therefore, layers in the two sub-cells have been studied separately, keeping in mind the proper combinations between various layers. With optimized layer thicknesses and band gaps, together with proper alignment of band edges, the proposed tandem solar cell exhibits high characteristics of 80 % fill factor and higher than 32 % overall efficiency.
{"title":"A new CsPbI2Br/CuZnSnSSe/Si tandem solar cell with higher than 32 % efficiency","authors":"Naceur Selmane , Ali Cheknane , Hikmat S. Hilal","doi":"10.1016/j.micrna.2024.207940","DOIUrl":"10.1016/j.micrna.2024.207940","url":null,"abstract":"<div><p>To avoid Shockley-Queisser limit in single p-n junctions, tandem solar cells were proposed. A new tandem cell is simulated here using the 1-dimensional SCAPS. The new cell combines two reported single solar cells together, aiming at achieving high performance by optimizing various layer characteristics. The bottom sub-cell is Mo/Si(p)/CZTSSe(p)/CdS(n)/ZnO(i)/ZnO(Al), where ZnO is an electrodeposited transparent-conductor oxide, with high UV transmittance, ZnO(i) is intrinsic layer, CZTSSe/Si is bi-absorber layer of p-CuZnSnSSe and p-Si, Mo is back contact. The optimized sub-cell exhibits a high fill factor of 85.18 % with overall efficiency 20 %. Based on literature, a perovskite CsPbI<sub>2</sub>Br layer is included in the top sub-cell Cu<sub>2</sub>O(HTL)/CsPbI<sub>2</sub>Br)/TiO<sub>2</sub>(ETL), where Cu<sub>2</sub>O is a hole-transport layer and TiO<sub>2</sub> is electron-transport layer. The top sub-cell layers have been carefully selected for best alignment. Matching and optimizing various parameters in the two sub-cells is a simulation challenge. Therefore, layers in the two sub-cells have been studied separately, keeping in mind the proper combinations between various layers. With optimized layer thicknesses and band gaps, together with proper alignment of band edges, the proposed tandem solar cell exhibits high characteristics of 80 % fill factor and higher than 32 % overall efficiency.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"194 ","pages":"Article 207940"},"PeriodicalIF":2.7,"publicationDate":"2024-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141951118","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-02DOI: 10.1016/j.micrna.2024.207947
Princy Sharma , Pankaj Kumar
Owing to the fact that the gate-all-around architecture is expected to prevail in the upcoming technology nodes, in this work we have taken up a simulation-based investigation on design of a gate-all-around junctionless transistor (GAA-JLT) based label-free gas sensor with conducting polymer (CP) gate. In the initial part of our work we have focused on the variation n device and sensor performance with initial work function of the CP, which depends upon its growth condition and primary doping. Interaction with various test gases modifies the CP characteristics, thereby changing its work function. Due to this a change in device characteristics is observed, which serves as the metric for assessing the GAA-JLT-based gas sensor performance. We have investigated the variation in device characteristics in the presence of different test gases. Further, the variation in sensor performance on interaction with the different test gases has been examined. The impact of operating conditions such as ambient temperature and partial pressure of the test gas on the sensing performance has been investigated. The impact of device dimension on the sensing performance has also been evaluated. Our computations reflect that tuning the initial work function of the CP by choosing the proper primary dopant concentration model along with proper tuning of the operating conditions can enhance the performance accuracy of the sensor.
{"title":"Sensitivity analysis of methanol, chloroform, and dichloromethane using GAA-JLT-based gas sensor","authors":"Princy Sharma , Pankaj Kumar","doi":"10.1016/j.micrna.2024.207947","DOIUrl":"10.1016/j.micrna.2024.207947","url":null,"abstract":"<div><p>Owing to the fact that the gate-all-around architecture is expected to prevail in the upcoming technology nodes, in this work we have taken up a simulation-based investigation on design of a gate-all-around junctionless transistor (GAA-JLT) based label-free gas sensor with conducting polymer (CP) gate. In the initial part of our work we have focused on the variation n device and sensor performance with initial work function of the CP, which depends upon its growth condition and primary doping. Interaction with various test gases modifies the CP characteristics, thereby changing its work function. Due to this a change in device characteristics is observed, which serves as the metric for assessing the GAA-JLT-based gas sensor performance. We have investigated the variation in device characteristics in the presence of different test gases. Further, the variation in sensor performance on interaction with the different test gases has been examined. The impact of operating conditions such as ambient temperature and partial pressure of the test gas on the sensing performance has been investigated. The impact of device dimension on the sensing performance has also been evaluated. Our computations reflect that tuning the initial work function of the CP by choosing the proper primary dopant concentration model along with proper tuning of the operating conditions can enhance the performance accuracy of the sensor.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"195 ","pages":"Article 207947"},"PeriodicalIF":2.7,"publicationDate":"2024-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141978563","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-07-31DOI: 10.1016/j.micrna.2024.207946
Fa Zou, Zhongliang Pan
This paper proposes an equivalent circuit model for two-line coupled multilayer graphene nanoribbon - single-wall carbon nanotube (MLGNR-SWCNT) composite interconnects (MSCs), incorporating the effects of coupling capacitance and mutual inductance. We also examine the temperature-dependent crosstalk effect on the victim line of MSCs in the time domain using decoupling techniques and the ABCD parameter matrix approach. This analysis is conducted at the global level of 7 nm, 14 nm, and 22 nm technology nodes, comparing the performance of MSCs with MLGNR, SWCNT, and copper (Cu) interconnects, validated through HSPICE simulations. Our results reveal that the crosstalk delay of all interconnects induced by dynamic crosstalk exhibits superior performance in the in-phase crosstalk mode compared to the out-of-phase mode at room temperature. In particular, MSCs demonstrate less crosstalk delay in both crosstalk modes compared to SWCNT and Cu interconnects. In addition, we analyze the crosstalk delay of the victim line for two-line coupled MSCs at varying temperatures in out-of-phase crosstalk mode, comparing them with MLGNR, SWCNT, and Cu interconnects. Simulation results indicate that the crosstalk delay is temperature-dependent, increasing with rising temperatures, and the crosstalk delay of MSCs is the least of all interconnects. Furthermore, we investigate the crosstalk noise of MSCs induced by functional crosstalk at different temperatures, comparing it with MLGNR, SWCNT, and Cu interconnects. It is observed that the crosstalk noise peak remains constant with temperature changes across all interconnects; however, the holding time and width of crosstalk noise increases with rising temperatures and MSCs have the least crosstalk noise peak and crosstalk noise width of all interconnects. Also, numerical results exhibit that reducing interconnect temperature, SWCNT diameter, and edge roughness of MLGNR are effective strategies to diminish the crosstalk delay of MSCs. In addition, increasing line spacing is identified as an effective method to reduce crosstalk noise peak of MSCs of different lengths. The proposed model results show excellent agreement with HSPICE simulation data. Therefore, our analysis of crosstalk effect manifests that MLGNR-SWCNT composite can be a promising material to replace SWCNT and copper as an ideal material for global interconnect applications in thermally variable environments.
{"title":"Modeling and analysis of crosstalk induced effects in graphene-carbon nanotube composite interconnects","authors":"Fa Zou, Zhongliang Pan","doi":"10.1016/j.micrna.2024.207946","DOIUrl":"10.1016/j.micrna.2024.207946","url":null,"abstract":"<div><p>This paper proposes an equivalent circuit model for two-line coupled multilayer graphene nanoribbon - single-wall carbon nanotube (MLGNR-SWCNT) composite interconnects (MSCs), incorporating the effects of coupling capacitance and mutual inductance. We also examine the temperature-dependent crosstalk effect on the victim line of MSCs in the time domain using decoupling techniques and the ABCD parameter matrix approach. This analysis is conducted at the global level of 7 nm, 14 nm, and 22 nm technology nodes, comparing the performance of MSCs with MLGNR, SWCNT, and copper (Cu) interconnects, validated through HSPICE simulations. Our results reveal that the crosstalk delay of all interconnects induced by dynamic crosstalk exhibits superior performance in the in-phase crosstalk mode compared to the out-of-phase mode at room temperature. In particular, MSCs demonstrate less crosstalk delay in both crosstalk modes compared to SWCNT and Cu interconnects. In addition, we analyze the crosstalk delay of the victim line for two-line coupled MSCs at varying temperatures in out-of-phase crosstalk mode, comparing them with MLGNR, SWCNT, and Cu interconnects. Simulation results indicate that the crosstalk delay is temperature-dependent, increasing with rising temperatures, and the crosstalk delay of MSCs is the least of all interconnects. Furthermore, we investigate the crosstalk noise of MSCs induced by functional crosstalk at different temperatures, comparing it with MLGNR, SWCNT, and Cu interconnects. It is observed that the crosstalk noise peak remains constant with temperature changes across all interconnects; however, the holding time and width of crosstalk noise increases with rising temperatures and MSCs have the least crosstalk noise peak and crosstalk noise width of all interconnects. Also, numerical results exhibit that reducing interconnect temperature, SWCNT diameter, and edge roughness of MLGNR are effective strategies to diminish the crosstalk delay of MSCs. In addition, increasing line spacing is identified as an effective method to reduce crosstalk noise peak of MSCs of different lengths. The proposed model results show excellent agreement with HSPICE simulation data. Therefore, our analysis of crosstalk effect manifests that MLGNR-SWCNT composite can be a promising material to replace SWCNT and copper as an ideal material for global interconnect applications in thermally variable environments.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"194 ","pages":"Article 207946"},"PeriodicalIF":2.7,"publicationDate":"2024-07-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141935180","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-07-31DOI: 10.1016/j.micrna.2024.207945
Yun Li , Xu Gao , Junzheng Gao , Zhimei Yang , Min Gong , Mingmin Huang , Yao Ma , Tian Yu
The influence of the annealing treatment on the performance of commercial 4H–SiC Schottky barrier diodes (SBDs) subjected to heavy ion irradiation under room temperature (RT) and low temperature (LT) are presented. Experimental results confirm that annealing treatment effectively eliminates defects and interface states caused by heavy ion irradiation, particularly for 4H–SiC SBD under LT irradiation. Increasing the annealing temperature leads to the slight improvement in forward current, leakage current and breakdown voltage. However, the annealing process may result in the formation of Ti and Si compounds at the interface between the Schottky metal and SiC, as well as a significant number of vacancies. Combined with Technology Computer Aided Design (TCAD) simulations, it is concluded that the interface trap charge concentrations exceeding 1 × 1012 cm−2 significantly impact the breakdown characteristics of 4H–SiC SBDs.
本文介绍了退火处理对室温(RT)和低温(LT)重离子辐照下商用 4H-SiC 肖特基势垒二极管(SBD)性能的影响。实验结果证实,退火处理能有效消除重离子辐照造成的缺陷和界面态,尤其是在低温辐照下的 4H-SiC SBD。提高退火温度可略微改善正向电流、漏电流和击穿电压。但是,退火过程可能会在肖特基金属和碳化硅之间的界面上形成 Ti 和 Si 化合物以及大量空位。结合技术计算机辅助设计(TCAD)模拟得出的结论是,界面陷阱电荷浓度超过 1 × 1012 cm-2 会严重影响 4H-SiC SBD 的击穿特性。
{"title":"Influence of annealing treatment on performance of 4H–SiC SBD irradiated by heavy ions under room temperature and low temperature","authors":"Yun Li , Xu Gao , Junzheng Gao , Zhimei Yang , Min Gong , Mingmin Huang , Yao Ma , Tian Yu","doi":"10.1016/j.micrna.2024.207945","DOIUrl":"10.1016/j.micrna.2024.207945","url":null,"abstract":"<div><p>The influence of the annealing treatment on the performance of commercial 4H–SiC Schottky barrier diodes (SBDs) subjected to heavy ion irradiation under room temperature (RT) and low temperature (LT) are presented. Experimental results confirm that annealing treatment effectively eliminates defects and interface states caused by heavy ion irradiation, particularly for 4H–SiC SBD under LT irradiation. Increasing the annealing temperature leads to the slight improvement in forward current, leakage current and breakdown voltage. However, the annealing process may result in the formation of Ti and Si compounds at the interface between the Schottky metal and SiC, as well as a significant number of vacancies. Combined with Technology Computer Aided Design (TCAD) simulations, it is concluded that the interface trap charge concentrations exceeding 1 × 10<sup>12</sup> cm<sup>−2</sup> significantly impact the breakdown characteristics of 4H–SiC SBDs.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"194 ","pages":"Article 207945"},"PeriodicalIF":2.7,"publicationDate":"2024-07-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141952580","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
This work presents the comparative study of Graphene Nanoribbon (GNR) based channel Double Gate (DG) Dual Gate Material (DMG) Vertical tunnel Field Effect Transistor (VTFET) performance with all Silicon material Tunnel Field Effect Transistor. The two-dimensional (2D) material GNR has been proposed in the channel material to enhance the device performance due to its low bandgap, high mobility, and high saturation velocity. The proposed device's DC, RF, and circuit-level performance analysis has been carried out for the first time. GNR-based channel VTFET shows a better average subthreshold swing (SSAVG) of 16 mV/decade compared to Silicon Vertical Tunnel FET (36 mV/decade) at a drain voltage VDS = 0.5 V. The study of temperature effects on the DC parameters is also included along with the analog/RF FOMs for the proposed two structures. In addition, the performances are compared with other reported works; it is observed that DG-GNR-DMG-VTFET offers better results than Silicon (Si)-based VTFET and other said TFET work. Finally, circuit-level analysis has been done by designing inverter and ring oscillator circuits for the proposed structures, and performance is compared in these two devices. The market-available Silvaco ATLAS TCAD simulator has been used for device-level simulation. Further, circuit-level analysis has been carried out in the Cadence Virtuoso tool using a look-up table-based Verilog-A model.
{"title":"Device and circuit-level performance evaluation of DG-GNR-DMG vertical tunnel FET","authors":"Zohming liana , Manas Ranjan Tripathy , Bijit Choudhuri , Brinda Bhowmick","doi":"10.1016/j.micrna.2024.207942","DOIUrl":"10.1016/j.micrna.2024.207942","url":null,"abstract":"<div><p>This work presents the comparative study of Graphene Nanoribbon (GNR) based channel Double Gate (DG) Dual Gate Material (DMG) Vertical tunnel Field Effect Transistor (VTFET) performance with all Silicon material Tunnel Field Effect Transistor. The two-dimensional (2D) material GNR has been proposed in the channel material to enhance the device performance due to its low bandgap, high mobility, and high saturation velocity. The proposed device's DC, RF, and circuit-level performance analysis has been carried out for the first time. GNR-based channel VTFET shows a better average subthreshold swing (SS<sub>AVG</sub>) of 16 mV/decade compared to Silicon Vertical Tunnel FET (36 mV/decade) at a drain voltage V<sub>DS</sub> = 0.5 V. The study of temperature effects on the DC parameters is also included along with the analog/RF FOMs for the proposed two structures. In addition, the performances are compared with other reported works; it is observed that DG-GNR-DMG-VTFET offers better results than Silicon (Si)-based VTFET and other said TFET work. Finally, circuit-level analysis has been done by designing inverter and ring oscillator circuits for the proposed structures, and performance is compared in these two devices. The market-available Silvaco ATLAS TCAD simulator has been used for device-level simulation. Further, circuit-level analysis has been carried out in the Cadence Virtuoso tool using a look-up table-based Verilog-A model.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"194 ","pages":"Article 207942"},"PeriodicalIF":2.7,"publicationDate":"2024-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141935181","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-07-30DOI: 10.1016/j.micrna.2024.207938
Yue Wu, Jianjun Song, Ailan Tang, Jianjun Mao
Wireless energy harvesting is an important application of microwave wireless energy transmission system, but due to the weak energy of RF signals in the 2.45 GHz band, its rectification efficiency is not ideal. As one of the core rectifier components of wireless weak energy harvesting system, the performance of MOSFET determines the rectification efficiency of the system, and its optimized design to improve the rectification efficiency is an important direction of current research in the field. In view of this, this paper proposes and designs Ge quantum well channel PMOS for wireless weak energy harvesting at 2.45 GHz, aiming to improve the rectification efficiency of wireless weak energy harvesting systems. Starting from adjusting the structural physical parameters of the MOS tubes, the absolute value of the threshold voltage is reduced in the weak energy density region, which in turn improves the rectification efficiency of the device. Then, the novel diode connection with the introduction of substrate bias effect is compared with the conventional connection using an ADS simulation circuit, and the simulation results show that the leakage current is smaller and the rectification efficiency is higher under the novel connection. On this basis, a Ge quantum well channel PMOS device is proposed. Compared with the Ge surface channel, the hole mobility of the quantum well channel will be greatly improved, and its rectification efficiency can also be improved. The device is connected to the rectifier circuit with a novel connection and simulated using Silvaco's Mixedmode module. The results show that the rectification efficiencies of the Ge quantum well channel MOS reach 13.53 % and 32 % at low input powers of −20.34 dBm and −6.28 dBm, respectively, which are 3.3 and 1.14 times higher than those of the conventional surface channel MOS.
无线能量采集是微波无线能量传输系统的重要应用,但由于2.45 GHz频段射频信号能量较弱,其整流效率并不理想。作为无线微弱能量采集系统的核心整流元件之一,MOSFET 的性能决定了系统的整流效率,对其进行优化设计以提高整流效率是当前该领域研究的重要方向。有鉴于此,本文提出并设计了用于 2.45 GHz 无线弱能量收集的 Ge 量子井沟道 PMOS,旨在提高无线弱能量收集系统的整流效率。从调整 MOS 管的结构物理参数入手,降低了弱能量密度区的阈值电压绝对值,从而提高了器件的整流效率。然后,利用 ADS 仿真电路将引入衬底偏压效应的新型二极管连接与传统连接进行了比较,仿真结果表明,新型连接下的漏电流更小,整流效率更高。在此基础上,提出了一种 Ge 量子阱沟道 PMOS 器件。与 Ge 表面沟道相比,量子阱沟道的空穴迁移率将大大提高,其整流效率也能得到改善。该器件采用新颖的连接方式与整流电路相连,并使用 Silvaco 的 Mixedmode 模块进行了仿真。结果表明,在 -20.34 dBm 和 -6.28 dBm 的低输入功率下,Ge 量子阱沟道 MOS 的整流效率分别达到 13.53 % 和 32 %,分别是传统表面沟道 MOS 的 3.3 倍和 1.14 倍。
{"title":"Ge quantum well channel P-MOSFET for 2.45 GHz wireless weak energy harvesting","authors":"Yue Wu, Jianjun Song, Ailan Tang, Jianjun Mao","doi":"10.1016/j.micrna.2024.207938","DOIUrl":"10.1016/j.micrna.2024.207938","url":null,"abstract":"<div><p>Wireless energy harvesting is an important application of microwave wireless energy transmission system, but due to the weak energy of RF signals in the 2.45 GHz band, its rectification efficiency is not ideal. As one of the core rectifier components of wireless weak energy harvesting system, the performance of MOSFET determines the rectification efficiency of the system, and its optimized design to improve the rectification efficiency is an important direction of current research in the field. In view of this, this paper proposes and designs Ge quantum well channel PMOS for wireless weak energy harvesting at 2.45 GHz, aiming to improve the rectification efficiency of wireless weak energy harvesting systems. Starting from adjusting the structural physical parameters of the MOS tubes, the absolute value of the threshold voltage is reduced in the weak energy density region, which in turn improves the rectification efficiency of the device. Then, the novel diode connection with the introduction of substrate bias effect is compared with the conventional connection using an ADS simulation circuit, and the simulation results show that the leakage current is smaller and the rectification efficiency is higher under the novel connection. On this basis, a Ge quantum well channel PMOS device is proposed. Compared with the Ge surface channel, the hole mobility of the quantum well channel will be greatly improved, and its rectification efficiency can also be improved. The device is connected to the rectifier circuit with a novel connection and simulated using Silvaco's Mixedmode module. The results show that the rectification efficiencies of the Ge quantum well channel MOS reach 13.53 % and 32 % at low input powers of −20.34 dBm and −6.28 dBm, respectively, which are 3.3 and 1.14 times higher than those of the conventional surface channel MOS.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"194 ","pages":"Article 207938"},"PeriodicalIF":2.7,"publicationDate":"2024-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141935182","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-07-30DOI: 10.1016/j.micrna.2024.207936
Neha Niharika, Sangeeta Singh
In this paper, a bi-tunable metamaterial absorber comprising a subwavelength resonator of semiconducting material InAs and a metallic plane adhered to a dielectric layer has been proposed in the terahertz regime. Absorption of about 99.8 % is achieved at 4.446 THz with the application of magnetic field B = 0.4 T and a high tunability rate of 0.4 THz/T in the central resonance frequency due to the presence of a magnetostatically tunable H-shaped InAs resonator and polyimide dielectric layer. The same structure supports dual control over the resonance by replacing polyimide dielectric layer with InSb, as InSb possesses temperature- and magnetic field-dependent dielectric properties. The replacement of polyimide dielectric layer with InSb provides near unity absorption of 99.99 % at B = 0.4 T but when the effect of temperature on the absorption is taken, it provides a high absorptivity of 99.99 % at T = 285 K with a blue shift in the maximum resonance frequency, providing tunability of 0.016 THz/K on increasing the temperature from 280 K to 295 K. Thus, the proposed absorber not only provides dual control over the resonance spectrum but also progresses towards more practical applications in the sensing and detection of temperature variance.
本文提出了一种太赫兹范围内的双可调谐超材料吸收器,包括一个由半导体材料 InAs 和粘附在介电层上的金属平面组成的亚波长谐振器。在应用磁场 B = 0.4 T 时,在 4.446 THz 频率下实现了约 99.8 % 的吸收率,由于存在磁致可调的 H 型 InAs 谐振器和聚酰亚胺介电层,中心谐振频率的可调率高达 0.4 THz/T。由于铟锑具有随温度和磁场变化的介电特性,因此用铟锑取代聚酰亚胺介电层后,相同的结构可支持对谐振的双重控制。用 InSb 取代聚酰亚胺介电层可在 B = 0.4 T 时提供 99.99 % 的近乎统一吸收率,但如果考虑到温度对吸收率的影响,则可在 T = 285 K 时提供 99.99 % 的高吸收率,同时最大共振频率发生蓝移,温度从 280 K 升至 295 K 时的可调谐性为 0.016 THz/K。
{"title":"Theoretical analysis of InAs based Bi-tunable narrow band terahertz perfect absorber for thermal sensing application","authors":"Neha Niharika, Sangeeta Singh","doi":"10.1016/j.micrna.2024.207936","DOIUrl":"10.1016/j.micrna.2024.207936","url":null,"abstract":"<div><p>In this paper, a bi-tunable metamaterial absorber comprising a subwavelength resonator of semiconducting material InAs and a metallic plane adhered to a dielectric layer has been proposed in the terahertz regime. Absorption of about 99.8 % is achieved at 4.446 THz with the application of magnetic field B = 0.4 T and a high tunability rate of 0.4 THz/T in the central resonance frequency due to the presence of a magnetostatically tunable H-shaped InAs resonator and polyimide dielectric layer. The same structure supports dual control over the resonance by replacing polyimide dielectric layer with InSb, as InSb possesses temperature- and magnetic field-dependent dielectric properties. The replacement of polyimide dielectric layer with InSb provides near unity absorption of 99.99 % at B = 0.4 T but when the effect of temperature on the absorption is taken, it provides a high absorptivity of 99.99 % at T = 285 K with a blue shift in the maximum resonance frequency, providing tunability of 0.016 THz/K on increasing the temperature from 280 K to 295 K. Thus, the proposed absorber not only provides dual control over the resonance spectrum but also progresses towards more practical applications in the sensing and detection of temperature variance.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"194 ","pages":"Article 207936"},"PeriodicalIF":2.7,"publicationDate":"2024-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141863291","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-07-27DOI: 10.1016/j.micrna.2024.207943
Yanheng Song , Haoran Sun , Pinyu Pan , Xujing Zhang , Degang Zhao , Mei Zhou
In order to effectively regulate the luminescence performance of MQW and enhance its optical quality, it is crucial to investigate the InGaN/GaN MQW's structure and luminescence properties. In this study the focus is how they are affected by low-temperature cap (LT-cap) layer's thickness which is grown above each InGaN well layer during growth process of InGaN/GaN multiple quantum well (MQW) samples in MOCVD system. This was achieved by analyzing high resolution X-ray diffraction (HRXRD) spectra, electroluminescence (EL) spectra, temperature-dependent photoluminescence (TDPL) spectra, and micro-area fluorescence imaging of these samples. The results show that changes in LT-cap layer's thickness even have no significant impact on some structural parameters of MQW, such as the thickness of the well layer, but have an influence on the In component of the well layer. Due to the existence of LT-cap layer, dissociation of InGaN can be effectually reduced. In addition, the augmentation of LT-cap layer's thickness will make polarization effect of the QW sample more remarkable, so that the blue shift of the EL peak with the augmentation of current injection increases. The change of LT-cap layer's thickness will also influence distribution of the tail states of the quantum wells, which leads to a different localization states for injected carriers. As LT-cap layer becomes getting thicker, the material's internal quantum efficiency (IQE) tends to decrease, which may result from an increase in non-radiative recombination centers.
{"title":"Influence of low-temperature cap layer thickness on the structure and luminescence of InGaN/GaN multiple quantum wells","authors":"Yanheng Song , Haoran Sun , Pinyu Pan , Xujing Zhang , Degang Zhao , Mei Zhou","doi":"10.1016/j.micrna.2024.207943","DOIUrl":"10.1016/j.micrna.2024.207943","url":null,"abstract":"<div><p>In order to effectively regulate the luminescence performance of MQW and enhance its optical quality, it is crucial to investigate the InGaN/GaN MQW's structure and luminescence properties. In this study the focus is how they are affected by low-temperature cap (LT-cap) layer's thickness which is grown above each InGaN well layer during growth process of InGaN/GaN multiple quantum well (MQW) samples in MOCVD system. This was achieved by analyzing high resolution X-ray diffraction (HRXRD) spectra, electroluminescence (EL) spectra, temperature-dependent photoluminescence (TDPL) spectra, and micro-area fluorescence imaging of these samples. The results show that changes in LT-cap layer's thickness even have no significant impact on some structural parameters of MQW, such as the thickness of the well layer, but have an influence on the In component of the well layer. Due to the existence of LT-cap layer, dissociation of InGaN can be effectually reduced. In addition, the augmentation of LT-cap layer's thickness will make polarization effect of the QW sample more remarkable, so that the blue shift of the EL peak with the augmentation of current injection increases. The change of LT-cap layer's thickness will also influence distribution of the tail states of the quantum wells, which leads to <del>a</del> different localization states for injected carriers. As LT-cap layer becomes getting thicker, the material's internal quantum efficiency (IQE) tends to decrease, which may result from an increase in non-radiative recombination centers.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"194 ","pages":"Article 207943"},"PeriodicalIF":2.7,"publicationDate":"2024-07-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2773012324001924/pdfft?md5=fefddd026151c2d6621e63a853b87b51&pid=1-s2.0-S2773012324001924-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141843455","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-07-26DOI: 10.1016/j.micrna.2024.207941
Pan Yizhao , Chen Fang , Li Yuchang , Yang Wenxing , Yi Zao , Ke Shaolin
The strong coherent coupling in different electromagnetic modes can control the light-matter interaction more conveniently. Here, we theoretically researched the hybridization between the borophene surface plasmon (BSP) mode and the borophene localized surface plasmon (BLSP) mode in borophene grating structure. This coupling effect leads to the emergence of multiple hybrid modes. The absorption spectra of the system are investigated through finite difference time domain (FDTD) simulation and coupled oscillator model (COM). Results show that the coherent coupling of BSP and BLSP can be achieved by adjusting the carrier density of the borophene gratings. A Rabi splitting effect with frequency of 21.6 THz can be observed. Furthermore, we investigated the effects of geometric structural parameters, incident angle, and relaxation time on the correlated coupling spectra. Our work may deepen the understanding of light–matter interactions and provide a reference for borophene-based active photonic devices in the near-infrared region.
{"title":"Coherent coupling of localized surface plasmons and surface plasmons in borophene-based metamaterial","authors":"Pan Yizhao , Chen Fang , Li Yuchang , Yang Wenxing , Yi Zao , Ke Shaolin","doi":"10.1016/j.micrna.2024.207941","DOIUrl":"10.1016/j.micrna.2024.207941","url":null,"abstract":"<div><p>The strong coherent coupling in different electromagnetic modes can control the light-matter interaction more conveniently. Here, we theoretically researched the hybridization between the borophene surface plasmon (BSP) mode and the borophene localized surface plasmon (BLSP) mode in borophene grating structure. This coupling effect leads to the emergence of multiple hybrid modes. The absorption spectra of the system are investigated through finite difference time domain (FDTD) simulation and coupled oscillator model (COM). Results show that the coherent coupling of BSP and BLSP can be achieved by adjusting the carrier density of the borophene gratings. A Rabi splitting effect with frequency of 21.6 THz can be observed. Furthermore, we investigated the effects of geometric structural parameters, incident angle, and relaxation time on the correlated coupling spectra. Our work may deepen the understanding of light–matter interactions and provide a reference for borophene-based active photonic devices in the near-infrared region.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"194 ","pages":"Article 207941"},"PeriodicalIF":2.7,"publicationDate":"2024-07-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141843026","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-07-25DOI: 10.1016/j.micrna.2024.207939
Sheetal Singh, Subodh Wairya
This research work evaluates a performance analysis of heterostructure (SiGe/Si) double gate extended source Tunnel FET (Hetero-ES-TFET) to enhance the analog performance, linearity and noise performance. At the source-channel junction, a Hetero-ES-TFET's source is extended into the channel to increase point and line tunneling in the device. The Hetero-ES-TFET exhibits a high ION/IOFF of 3.57 × 1012 and a maximum cut off frequency fT of 54.19 GHz for optimization of device structural parameters. This analysis is conducted using a calibrated SILVACO, technology computer-aided design (TCAD) simulator. The proposed structure includes evaluation of linearity and noise performance characteristics. Furthermore, a linearity analysis as a figure of merit was conducted for the proposed device under study, including different parameters such as 3rd order intermodulation distortion point (IMD3), 3rd order intermodulation intercept point (IIP3), 2nd and 3rd order voltage intercept point (VIP2 and VIP3). The proposed Hetero-ES-TFET has achieved an incredibly high ON current and low threshold voltage. The effect of increasing source width has been examined in this work while sub-threshold swing (SS) remains unchanged during the analysis. There is an improvement in threshold voltage and ION/IOFF value by using silicon-germanium (SiGe) as a source material.
{"title":"Linearity and noise evaluation based analysis of extended source heterojunction double gate tunnel FET","authors":"Sheetal Singh, Subodh Wairya","doi":"10.1016/j.micrna.2024.207939","DOIUrl":"10.1016/j.micrna.2024.207939","url":null,"abstract":"<div><p>This research work evaluates a performance analysis of heterostructure (SiGe/Si) double gate extended source Tunnel FET (Hetero-ES-TFET) to enhance the analog performance, linearity and noise performance. At the source-channel junction, a Hetero-ES-TFET's source is extended into the channel to increase point and line tunneling in the device. The Hetero-ES-TFET exhibits a high <em>I</em><sub><em>ON</em></sub><em>/I</em><sub><em>OFF</em></sub> of 3.57 × 10<sup>12</sup> and a maximum cut off frequency <em>f</em><sub><em>T</em></sub> of 54.19 GHz for optimization of device structural parameters. This analysis is conducted using a calibrated SILVACO, technology computer-aided design (TCAD) simulator. The proposed structure includes evaluation of linearity and noise performance characteristics. Furthermore, a linearity analysis as a figure of merit was conducted for the proposed device under study, including different parameters such as 3<sup>rd</sup> order intermodulation distortion point (IMD<sub>3</sub>), 3<sup>rd</sup> order intermodulation intercept point (IIP<sub>3</sub>), 2<sup>nd</sup> and 3<sup>rd</sup> order voltage intercept point (VIP<sub>2</sub> and VIP<sub>3</sub>). The proposed Hetero-ES-TFET has achieved an incredibly high ON current and low threshold voltage. The effect of increasing source width has been examined in this work while sub-threshold swing (SS) remains unchanged during the analysis. There is an improvement in threshold voltage and <em>I</em><sub><em>ON</em></sub><em>/I</em><sub><em>OFF</em></sub> value by using silicon-germanium (SiGe) as a source material.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"194 ","pages":"Article 207939"},"PeriodicalIF":2.7,"publicationDate":"2024-07-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141841834","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}