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2015 IEEE International Memory Workshop (IMW)最新文献

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Integration and Electrical Evaluation of Epitaxially Grown Si and SiGe Channels for Vertical NAND Memory Applications 垂直NAND存储器外延生长Si和SiGe通道的集成和电学评价
Pub Date : 2015-05-17 DOI: 10.1109/IMW.2015.7150291
E. Capogreco, R. Degraeve, J. Lisoni, V. Luong, A. Arreghini, M. Toledano-Luque, A. Hikavyy, T. Numata, K. De Meyer, G. Van den bosch, J. van Houdt
Epitaxially grown Si and Si0.6Ge0.4 are integrated as replacement of poly-Si channel in vertical cylindrical transistors for vertical NAND memory application, in order to investigate the impact of the grain boundaries on current conduction. Epi-Si outperforms both poly-Si and Epi-SiGe channels, resulting in the best conduction, with large improvement on both sub threshold swing and transconductance (gm). The experimentally observed gm bimodal distribution for epi Si is corroborated and explained through a resistive network model: lower gm conduction occurs when current needs to cross a high resistance boundary, whereas higher gm is obtained when this boundary is not present.
为了研究晶界对电流传导的影响,将外延生长的Si和Si0.6Ge0.4集成到垂直圆柱形晶体管中,以替代多晶硅沟道用于垂直NAND存储器。Epi-Si通道优于多晶硅和Epi-SiGe通道,具有最佳导电性,在亚阈值摆动和跨导(gm)方面都有很大改善。通过电阻网络模型证实并解释了实验观察到的epi Si的gm双峰分布:当电流需要穿过高电阻边界时,会发生较低的gm导通,而当该边界不存在时,则会获得较高的gm导通。
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引用次数: 9
3X Faster Speed Solid-State Drive with a Write Order Based Garbage Collection Scheme 3X速度更快的固态硬盘,基于写顺序的垃圾回收方案
Pub Date : 2015-05-17 DOI: 10.1109/IMW.2015.7150265
C. Matsui, A. Arakawa, Chao Sun, T. Iwasaki, K. Takeuchi
Solid-state drives (SSDs) are over-taking hard disk drives (HDDs) as high-volume storage in enterprise servers and data centers. However, SSDs write performance is limited due to their inability to overwrite in-place and need for garbage collection. To reduce the garbage collection (GC) overhead, a logical block address (LBA) scrambler has been proposed. However, the LBA scrambler has two issues: (1) SSD performance decreases with a hot and random workload, and (2) the table size of the LBA scrambler may become upto 0.85% of the SSD capacity. In this work, a write order (WO) based GC scheme is proposed to solve the first issue. The number of valid pages in the NAND flash block, the write order and erase count of the block are considered for victim block selection during GC. One of the key advantages of the WO GC is that it does not require a clock inside the SSD, which will not operate if the SSD power is off. Further, to solve the second issue of the large table size, a Sector Bundling scheme is proposed. From the results, SSD performance is improved 3×, and the LBA scrambler table size is reduced 16%.
固态硬盘(ssd)正在取代硬盘驱动器(hdd)成为企业服务器和数据中心的大容量存储设备。但是,ssd的写性能受到限制,因为它们无法就地覆盖并且需要垃圾收集。为了减少垃圾收集(GC)的开销,提出了一种逻辑块地址(LBA)扰频器。然而,LBA扰频器有两个问题:(1)SSD性能随着热随机工作负载而下降;(2)LBA扰频器的表大小可能会达到SSD容量的0.85%。本文提出了一种基于写顺序(WO)的GC方案来解决第一个问题。在GC期间,会考虑NAND闪存块中有效页面的数量、块的写顺序和擦除计数,以便选择受害块。WO GC的主要优点之一是它不需要SSD内部的时钟,如果SSD电源关闭,时钟将无法运行。为了解决数据表过大的问题,提出了扇区绑定方案。从结果来看,SSD性能提高了3倍,LBA扰频表大小减少了16%。
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引用次数: 1
Junction Optimization for Embedded 40nm FN/FN Flash Memory 嵌入式40nm FN/FN快闪记忆体的结优化
Pub Date : 2015-05-17 DOI: 10.1109/IMW.2015.7150292
A. Baiano, M. van Duuren, E. van der Vegt, Bob Schippers, R. Beurze, Daniel Tajari Mofrad, H. van Zwol, Yu Chen, J. Chiang, Han Lokker, K. van Dijk, J. Verbree, Y. Chen, J. Garbe, R. Verhaar, D. Dormans
2-transistor (2T) cell technology used for embedded non-volatile memory (eNVM) has been scaled down to 40nm node. To enable aggressive cell scaling, the array architecture is modified compared to previous generations and the channel length of cell is drastically reduced requiring steep cell junctions, which give rise to new disturb phenomena. This paper describes how to safeguard the drain disturb immunity in 40nm 2T eNVM, while maintaining the intrinsic 2T robustness.
用于嵌入式非易失性存储器(eNVM)的2晶体管(2T)电池技术已缩小到40nm节点。为了实现积极的小区缩放,与前几代相比,阵列结构进行了修改,小区的信道长度急剧减少,需要陡峭的小区连接,从而产生新的干扰现象。本文介绍了如何在保持40nm 2T eNVM固有的2T鲁棒性的同时,保护其漏极干扰抗扰性。
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引用次数: 3
A Novel Approach to Identify the Carrier Transport Path and Its Correlation to the Current Variation in RRAM 一种识别载流子传输路径及其与RRAM电流变化相关性的新方法
Pub Date : 2015-05-17 DOI: 10.1109/IMW.2015.7150270
Nianduan Lu, Ling Li, P. Sun, Ming Wang, Qi Liu, H. Lv, S. Long, Ming Liu
For the first time, we proposed a physical model to link the macroscopic I-V characteristics with the material microstructure, based on the calculation of activation energy from first-principles calculations. According to the model, a new method for identifying the carrier transport path by using the calculated defect level was developed in RRAM. This developed method may be used to extract the carrier transport path of each operation and quantify the distribution of switching parameters. Based on the transport path, the intrinsic origin of current variation was identified in RRAM. The methods to improve the uniformity of switching parameters are also provided.
在第一性原理计算活化能的基础上,首次提出了将宏观I-V特性与材料微观结构联系起来的物理模型。根据该模型,提出了一种利用计算缺陷等级识别载流子传输路径的新方法。该方法可用于提取每个操作的载波传输路径和量化开关参数的分布。基于传输路径,确定了随机存储器中电流变化的内在根源。提出了提高开关参数均匀性的方法。
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引用次数: 0
Single-Poly Embedded NVM Solution for Analog Trimming and Code Storage Applications 模拟修剪和代码存储应用的单聚嵌入式NVM解决方案
Pub Date : 2015-05-17 DOI: 10.1109/IMW.2015.7150304
Sung-Kun Park, Kwang-il Choi, Nam-Yoon Kim, Jung-Hoon Kim, Young-Jun Kwon, Kwangsik Ko, I. Cho, K. Yoo
We report a single-poly embedded nonvolatile memory (eNVM) solution for analog trimming and code storage applications using a 0.13-μm BCDMOS process. Each cell has its own merits and demerits, depending on structure and operation methods. For analog trimming purposes, a conventional n-well coupling Fowler-Nordheim tunneling cell with a large unit cell size of 88 μm2 is used. On the other hand, a select gate lateral coupling (SGLC) cell for code storage purposes has a much smaller unit cell size of 2.82 μm2, which is comparable to the size of SRAM. The SGLC cell is fabricated using a combination of only 1.5-V and 5-V transistor-related processes for channel hot electron injection programming. The SGLC cell exhibits a high programming speed of 100 μs and is over-erase-free, which is suitable for a NOR array structure. In addition, both cells also had a retention lifetime of more than 10 years. Thus, these cells can be fabricated to match the requirements of various eNVM applications.
我们报告了一种采用0.13 μm BCDMOS工艺的单聚嵌入式非易失性存储器(eNVM)解决方案,用于模拟修剪和代码存储应用。每个电池都有自己的优点和缺点,这取决于结构和操作方法。为了模拟修剪的目的,使用了传统的n阱耦合的Fowler-Nordheim隧穿电池,其单位尺寸为88 μm2。另一方面,用于代码存储的选择门横向耦合(SGLC)单元的单元尺寸要小得多,为2.82 μm2,与SRAM的大小相当。SGLC电池仅使用1.5 v和5 v晶体管相关工艺的组合来制造通道热电子注入编程。SGLC单元具有100 μs的高编程速度和无过擦除性,适用于NOR阵列结构。此外,这两种细胞的保留寿命都超过了10年。因此,可以制造这些单元以匹配各种eNVM应用程序的需求。
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引用次数: 6
1T1MTJ STT-MRAM Cell Array Design with an Adaptive Reference Voltage Generator for Improving Device Variation Tolerance 基于自适应基准电压发生器的STT-MRAM单元阵列设计
Pub Date : 2015-05-17 DOI: 10.1109/IMW.2015.7150264
H. Koike, S. Miura, H. Honjo, Tosinari Watanabe, Hideo Sato, S. Sato, T. Nasuno, Y. Noguchi, M. Yasuhira, T. Tanigawa, M. Muraguchi, M. Niwa, Kenchi Ito, S. Ikeda, H. Ohno, T. Endoh
A device-variation-tolerant spin-transfer-torque magnetic random access memory (STT-MRAM) cell array design with a high-signal-margin reference generator circuit was developed to create high-density 1T1MTJ STT-MRAMs. To realize an appropriate STT-MRAM design, fluctuations in the memory cell characteristics were first measured using a 1-kbit STT-MRAM test chip. Based on these measurements, a reference generator and an STT-MRAM cell array architecture were proposed. This cell array was evaluated in terms of the signal margin for read operation and its tolerance to device variation by means of Monte-Carlo SPICE circuit simulations. The proposed design enables a 50% improvement in the signal margin compared with the conventional cell array circuit.
为实现高密度1T1MTJ型STT-MRAM,设计了一种器件可变自旋-传递-转矩磁随机存取存储器(STT-MRAM)单元阵列,该阵列具有高信号裕度参考发生器电路。为了实现合适的STT-MRAM设计,首先使用1 kbit STT-MRAM测试芯片测量存储单元特性的波动。在此基础上,提出了参考发生器和STT-MRAM单元阵列结构。通过蒙特卡洛SPICE电路仿真,对该单元阵列的读操作信号裕度及其对器件变化的容忍度进行了评估。与传统的单元阵列电路相比,所提出的设计使信号裕度提高了50%。
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引用次数: 16
A 55 nm Logic-Process-Compatible, Split-Gate Flash Memory Array Fully Demonstrated at Automotive Temperature with High Access Speed and Reliability 一种55纳米逻辑工艺兼容的分闸闪存阵列,在汽车温度下具有高存取速度和可靠性
Pub Date : 2015-05-17 DOI: 10.1109/IMW.2015.7150267
N. Do, L. Tee, S. Hariharan, S. Lemke, M. Tadayoni, W. Yang, M. Wu, JinHo Kim, Yueh-Hsin Chen, C. Su, V. Tiwari, Stephen Zhou, R. Qian, I. Yue
In this paper, a Flash macro designed with high-density arrays of split-gate (SG) SuperFlash® cells, compatibly embedded in a 55 nm Low Power (LP) logic process is demonstrated with full functionality and excellent reliability at automotive temperature range. This split-gate Flash memory technology can be seamlessly and universally embedded in multiple logic process platforms, and can continually be scaled to 40 nm and smaller lithographically nodes, without compromising performance and reliability.
在本文中,采用高密度分栅(SG) SuperFlash®单元阵列设计的Flash宏,兼容地嵌入到55 nm低功耗(LP)逻辑工艺中,在汽车温度范围内具有完整的功能和出色的可靠性。这种分栅闪存技术可以无缝地、普遍地嵌入到多种逻辑处理平台中,并且可以不断地扩展到40纳米和更小的光刻节点,而不会影响性能和可靠性。
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引用次数: 8
Technology Scaling Challenge and Future Prospects of DRAM and NAND Flash Memory DRAM和NAND快闪记忆体的技术规模挑战与未来展望
Pub Date : 2015-05-17 DOI: 10.1109/IMW.2015.7150307
Sung-Kye Park
Memory manufactures are facing the challenges of technology scaling beyond 1xnm node DRAM and NAND flash memory. Even though we are managing to overcome patterning issue, we are still fighting against cost reduction and electrical limitation. In this paper, the scaling limitations and challenges of both DRAM and NAND are reviewed, and the future prospects with promising solutions are also addressed for high density DRAM and 3D NAND flash memory.
存储器制造商正面临着超越1xnm节点DRAM和NAND闪存的技术扩展挑战。尽管我们正在设法克服模式问题,但我们仍然在与降低成本和电力限制作斗争。本文回顾了DRAM和NAND的规模限制和挑战,并展望了高密度DRAM和3D NAND闪存的未来前景。
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引用次数: 81
A Survey of Trends in Non-Volatile Memory Technologies: 2000-2014 非易失性存储技术趋势调查:2000-2014
Pub Date : 2015-05-17 DOI: 10.1109/IMW.2015.7150274
Kosuke Suzuki, S. Swanson
We present a survey of non-volatile memory technology papers published between 2000 and 2014 in leading journals and conference proceedings in the area of integrated circuit design and semiconductor devices. We present a summary of the data provided in these papers and use that data to model basic aspects of their performance at an architectural level. The full data set and complete bibliography will be published online.
我们对2000年至2014年间发表在集成电路设计和半导体器件领域的主要期刊和会议论文集上的非易失性存储器技术论文进行了调查。我们对这些论文中提供的数据进行了总结,并使用这些数据在体系结构级别上对其性能的基本方面进行建模。完整的数据集和完整的参考书目将在网上发布。
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引用次数: 41
From Memory in our Brain to Emerging Resistive Memories in Neuromorphic Systems 从我们大脑中的记忆到神经形态系统中出现的抵抗记忆
Pub Date : 2015-05-17 DOI: 10.1109/IMW.2015.7150286
B. Desalvo, E. Vianello, D. Garbin, O. Bichler, L. Perniola
In this work, we will focus on the role that new nonvolatile resistive memory technologies (as OxRAM and CBRAM) can play in emerging fields of application, such as neuromorphic circuits, to save energy and increase performance. We will present large-scale energy efficient neuromorphic systems based on ReRAM as stochastic-binary synapses. Prototype applications such as complex visual- and auditory-pattern extraction will be discussed using feedforward spiking neural networks. A parallel will be drawn between these systems and human memory, as recent discoveries on the human brain and cognitive processes may bring benefits and open new perspectives for intelligent data processing.
在这项工作中,我们将重点关注新的非易失性电阻式存储技术(如OxRAM和CBRAM)在新兴应用领域(如神经形态电路)中的作用,以节省能源和提高性能。我们将提出基于ReRAM的大规模能量高效神经形态系统作为随机二元突触。原型应用,如复杂的视觉和听觉模式提取将讨论使用前馈脉冲神经网络。这些系统和人类记忆之间的平行关系将被绘制出来,因为最近关于人类大脑和认知过程的发现可能会带来好处,并为智能数据处理开辟新的视角。
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引用次数: 11
期刊
2015 IEEE International Memory Workshop (IMW)
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