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Highly selective dual gas (NO & NO2) sensing depended on the operating temperature of WO3 thin films sputtered at room temperature 高选择性双气体(NO 和 NO2)传感取决于室温下溅射的 WO3 薄膜的工作温度
IF 2.4 4区 物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-15 DOI: 10.1016/j.cap.2024.11.009
Charu Dwivedi , Stuti Srivastava , Preetam Singh
We have studied the effect of film thickness (120, 180, and 286 nm) on the dual gas (NO & NO2) sensing performance of DC magnetron sputtered WO3 thin films deposited at room temperature. WO3 shows strong absorption from visible light to the infrared region. An unusual peak originates at 467.6 nm (film thickness 286 nm) instead of a broadband tail, usually found in WO3, which has been linked with oxygen vacancies. A high response of ∼196 at 150 °C for 50 ppm NO and ∼50 at 250 °C for 50 ppm NO2 is achieved for 286 nm film, which can be associated with Localized Surface Plasmon Resonance while a low response/recovery time of ∼39s/99s is obtained for 120 nm film at 200 °C for NO gas, which is its best operating temperature too (sensor response ∼100). Even under a high humidity (90 %) environment, the sensor detected 50 ppm of NO.
我们研究了薄膜厚度(120、180 和 286 nm)对室温下沉积的直流磁控溅射 WO3 薄膜的双重气体(NO & NO2)传感性能的影响。从可见光到红外区域,WO3 都有很强的吸收。一个不寻常的峰值出现在 467.6 纳米(薄膜厚度为 286 纳米),而不是通常在 WO3 中发现的宽带尾部,这与氧空位有关。286 nm 薄膜在 150 °C、50 ppm NO 和 250 °C、50 ppm NO2 条件下的响应分别为 196 和 50,这可能与局部表面等离子共振有关,而 120 nm 薄膜在 200 °C、NO 气体条件下的响应/恢复时间仅为 39s/99s,这也是其最佳工作温度(传感器响应为 100)。即使在高湿度(90%)环境下,传感器也能检测到 50 ppm 的 NO。
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引用次数: 0
Comparison of ex-situ solid and liquid iodine doping methods at different temperatures to improve electrical properties of polythiophene nanostructure films synthesized by atmospheric pressure plasma process 比较不同温度下原位固态和液态碘掺杂法改善常压等离子工艺合成的聚噻吩纳米结构薄膜的电气性能
IF 2.4 4区 物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-15 DOI: 10.1016/j.cap.2024.11.007
Habeeb Olaitan Suleiman , Eun Young Jung , Hyojun Jang , Jae Young Kim , Heung-Sik Tae
Despite advancements in research on conducting polymers, obtaining stable conductivity in thin films remains challenging. Although ex-situ iodine (I2) doping methods have exhibited promise, they often result in unstable conductivity with increasing exposure time. This study aimed to produce polythiophene (PTh) nanostructure films with stable electrical conductivity through optimized ex-situ I2-doping techniques using a newly fabricated atmospheric pressure plasma reactor for PTh deposition. I2 charge carriers in the form of solid and liquid were separately incorporated into the PTh at room temperatures and 60 °C. FE-SEM, EDS, and FT-IR revealed an enhanced molecular structure, the distribution of element and functional chemical composition of the doped PTh nanostructure films, respectively. Compared to solid I2 doping, the liquid-doped PTh exhibited improved electrical conductivity and stable conductivity over a long period. The results also proved promising for reliable applications in electronic devices, making ex-situ liquid I2 doping a good technique.
尽管导电聚合物的研究取得了进展,但要在薄膜中获得稳定的导电性仍然具有挑战性。虽然原位碘(I2)掺杂方法已显示出前景,但随着暴露时间的延长,这些方法往往会导致导电性不稳定。本研究旨在利用新制造的用于 PTh 沉积的常压等离子反应器,通过优化的原位 I2 掺杂技术制备具有稳定导电性的聚噻吩(PTH)纳米结构薄膜。I2 电荷载流子以固态和液态形式分别在室温和 60 °C 下掺入 PTh 中。FE-SEM、EDS 和 FT-IR 分别显示了掺杂 PTh 纳米结构薄膜的分子结构、元素分布和功能化学成分。与固体 I2 掺杂相比,液体掺杂的 PTh 具有更高的导电性和长期稳定的导电性。这些结果也证明了液态 I2 原位掺杂技术在电子器件中的可靠应用前景。
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引用次数: 0
Carrier concentration dependence of optical and magnetic properties in epitaxial manganese-doped indium tin oxide films with different manganese concentrations 不同锰浓度的掺杂铟锡氧化物外延薄膜的光学和磁学特性与载流子浓度的关系
IF 2.4 4区 物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-15 DOI: 10.1016/j.cap.2024.11.008
Saiki Kitagawa , Toshihiro Nakamura
Epitaxial manganese-doped indium tin oxide (Mn-doped ITO) films with different Mn concentrations were deposited on single-crystal yttria-stabilized zirconia substrates using radio-frequency magnetron sputtering. The carrier concentration of the epitaxial Mn-doped ITO films could be controlled by changing the Mn doping concentration. The optical bandgaps of the films increased with the increase in the carrier concentration. Room-temperature ferromagnetism was observed in all films irrespective of the Mn concentration. The saturation magnetizations of the films increased with the increase in the carrier concentration, which suggests that delocalized charge carrier-mediated interaction model is one of the most probable mechanisms of the ferromagnetism in the Mn-doped ITO films. We found that the carrier concentration plays a crucial role in controlling optical and magnetic properties of the Mn-doped ITO films. The results of this study provide useful insight into the application of Mn-doped ITO films to ferromagnetic electrodes in spintronic devices.
利用射频磁控溅射技术在单晶钇稳定氧化锆基底上沉积了不同锰浓度的掺锰氧化铟锡(掺锰氧化铟锡)外延薄膜。外延掺锰 ITO 薄膜的载流子浓度可通过改变掺锰浓度来控制。薄膜的光带隙随着载流子浓度的增加而增大。无论锰的浓度如何,所有薄膜都具有室温铁磁性。薄膜的饱和磁化率随着载流子浓度的增加而增加,这表明电荷载流子介导的非局域相互作用模型是掺锰 ITO 薄膜铁磁性的最可能机制之一。我们发现,载流子浓度在控制掺锰 ITO 薄膜的光学和磁学特性方面起着至关重要的作用。这项研究的结果为将掺锰 ITO 薄膜应用于自旋电子器件中的铁磁电极提供了有益的启示。
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引用次数: 0
Transient heat-flux method for measuring heat capacity: Examples from Cu and VO2 测量热容量的瞬态热流法:以铜和 VO2 为例
IF 2.4 4区 物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-13 DOI: 10.1016/j.cap.2024.11.005
Dongjin Jang , Minsik Kong , Jong Mok Ok
Many quantum materials undergo phase transitions above room temperature. However, thermodynamic evidence of these phase transitions is relatively scarce. For instance, detailed specific heat anomalies have rarely been reported for the transitions. In addition to considering intrinsic factors that obscure the thermodynamic manifestation of relevant degrees of freedom, it is also important to revisit measurement techniques based on firmly established physical principles. In this study, we introduce a transient heat-flux method for measuring heat capacity of solids, and report a specific heat anomaly in VO2, along with the reproduction of the standard specific heat capacity data of Cu. At present, our method is capable of measuring heat capacities ranging from 1 J/mol⋅K to 400 J/mol⋅K with an uncertainty of 5% across a temperature range from room temperature to 100 °C.
许多量子材料在室温以上会发生相变。然而,这些相变的热力学证据却相对较少。例如,有关相变的详细比热反常现象就鲜有报道。除了考虑遮蔽相关自由度热力学表现的内在因素外,重新审视基于牢固确立的物理原理的测量技术也很重要。在本研究中,我们介绍了一种测量固体热容的瞬态热流方法,并报告了 VO2 中的比热异常现象,同时还再现了铜的标准比热容数据。目前,我们的方法能够测量从 1 J/mol⋅K 到 400 J/mol⋅K 的热容量,测量温度范围从室温到 100 °C,不确定度为 5%。
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引用次数: 0
Interplay of surface plasmon and Fabry-Perot resonances in metallic hole arrays on dielectric layers 介电层上金属孔阵列中表面等离子体与法布里-珀罗共振的相互作用
IF 2.4 4区 物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-13 DOI: 10.1016/j.cap.2024.11.006
J. Jeon , H.J. Kim , B.S. Chun , S.J. Lee
This study investigates the resonant behavior of a nanostructured absorber consisting of a metal hole array (MHA) on a dielectric layer (BCB) forming a cavity on a metal ground plane (MGP). By varying the thickness of the BCB layer, the resonance spectra were analyzed under different conditions. Our simulations reveal the intricate interplay between surface plasmon and Fabry-Perot resonances within the MHA-BCB-MGP structure. We observe that as the dielectric thickness changes, the resonance peaks shift, exhibiting phenomena such as Rabi splitting and bifurcation. These features are particularly pronounced under transverse magnetic polarization, indicating the complex interaction between different resonance modes and polarization states. In addition, changes in MHA diameter affected the dominance of either surface plasmon or Fabry-Perot resonances, illustrating the complex relationship between structure and resonance behavior. Reflection spectra under different polarizations and angles of incidence showed agreement between simulation and experiment, validating the proposed model.
本研究探讨了纳米结构吸收器的共振行为,该吸收器由介质层(BCB)上的金属孔阵列(MHA)组成,在金属地平面(MGP)上形成一个空腔。通过改变 BCB 层的厚度,我们分析了不同条件下的共振频谱。我们的模拟揭示了 MHA-BCB-MGP 结构中表面等离子体和法布里-珀罗共振之间错综复杂的相互作用。我们观察到,随着电介质厚度的变化,共振峰也会发生变化,表现出拉比分裂和分叉等现象。这些特征在横向磁极化条件下尤为明显,表明不同共振模式和极化态之间存在复杂的相互作用。此外,MHA 直径的变化会影响表面等离子体或法布里-珀罗共振的主导地位,这说明了结构与共振行为之间的复杂关系。不同偏振和入射角下的反射光谱显示模拟与实验结果一致,验证了所提出的模型。
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引用次数: 0
Permeability modulation of Fe-Ni/nanoparticle (Ni, Zn) soft magnetic composites 铁-镍/纳米粒子(镍、锌)软磁复合材料的渗透性调制
IF 2.4 4区 物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-05 DOI: 10.1016/j.cap.2024.10.016
Sang Woo Kim, Yeon Jun Choi, Ye Rae Kim, Deok Hyeon Kim, Ye Jin In, Tae Han Kim, Bo Wha Lee
In this study, we investigated how adding nanopowders to a micropowder affects the packing fraction and permeability. The micropowder used was a Fe-Ni crystalline alloy, which was sieved to less than 38 μm to minimize the effect of particle size distribution. The nanopowders, magnetic Ni and nonmagnetic Zn, were added to the Fe-Ni at weight ratios of 95:5, 90:10, 85:15, and 80:20. The results showed that the permeability of Fe-Ni was higher when sieved to 38 μm compared to the overall particle size. When the magnetic Ni nanopowder was added to the Fe-Ni powder sieved to 38 μm, both the packing fraction and permeability increased up to a ratio of 85:15 and then decreased. On the other hand, when the nonmagnetic Zn nanopowder was added, the packing fraction increased up to a ratio of 85:15 and then decreased, while the permeability continued to decrease.
在这项研究中,我们探讨了在微粉中添加纳米粉体如何影响填料分数和渗透性。使用的微粉是铁镍结晶合金,经过筛分后粒径小于 38 μm,以尽量减少粒径分布的影响。纳米粉末、磁性镍和非磁性锌分别以 95:5、90:10、85:15 和 80:20 的重量比添加到铁-镍中。结果表明,与整体粒径相比,当筛分至 38 μm 时,Fe-Ni 的渗透率更高。当将磁性纳米镍粉添加到过筛至 38 μm 的镍铁粉中时,堆积分数和渗透率都会增加,最高比例为 85:15,然后降低。另一方面,当加入非磁性纳米 Zn 粉末时,填料分数增加到 85:15 的比例,然后下降,而渗透率则继续下降。
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引用次数: 0
Effect of cadmium sulphide on poly (ethyl methacrylate) (PEMA) based electrolyte nanocomposite and its application in dye sensitized solar cell (DSSC) 硫化镉对聚(甲基丙烯酸乙酯)(PEMA)电解质纳米复合材料的影响及其在染料敏化太阳能电池(DSSC)中的应用
IF 2.4 4区 物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-02 DOI: 10.1016/j.cap.2024.10.017
Palvinder Singh , Amit Sachdeva , Parmod K. Singh , M.Z.A. Yahya , S.N.F. Yusuf , Markus Diantoro , Famiza Abdul Latif
The detail study of structural and ionic conductivity characterization of Poly (ethyl methacrylate) (PEMA) based polymer composite electrolyte were modified by the incorporation of Cadmium sulphide (CdS) nanomaterial. PEMA in addition with 40 % wt. potassium iodide (KI) and ethylene carbonate (EC) having 60 % wt., has the highest ionic conductivity of 4.65 × 10−5 S/cm when employed the solution casting technique. Cadmium Sulphide (CdS) was incorporated with PEMA + KI 40 % wt. + EC 60 % wt. sample to get maximum conductivity sample. The highest ionic conductivity 2.65×10−3S/cm, was attained at 7 % weight percentage of Cadmium sulphide (CdS). The conductive sample's morphology was examined using SEM, its amorphicity and crystalline structure was investigated using Fourier transform infrared (FTIR) technique, and FTIR 'wavenumbers of the maximum conductive sample of PEMA polymer + KI salt + EC plastizer and PEMA polymer + KI salt + EC plastizer + CdS nanoparticles were compared. X-ray diffraction (XRD) was used to identify the amorphous nature of the maximum conductive sample of polymer composite electrolyte. Differential scanning calorimetry (DSC) analysis was used to find out the glass transition (Tg) temperature of maximum conducting sample of polymer composite. The doctor blade method was employed to develop the dye sensitized solar cell (DSSC), and it had been observed that, under one sunlight situation, the energy conversion efficiency was 2.09 %, having parameters fill factor was 79.77 %.
通过加入纳米硫化镉(CdS)材料,对基于聚(甲基丙烯酸乙酯)(PEMA)的聚合物复合电解质的结构和离子电导特性进行了详细研究。当采用溶液浇铸技术时,添加了 40% 重量的碘化钾(KI)和 60% 重量的碳酸乙烯酯(EC)的 PEMA 具有最高的离子电导率(4.65 × 10-5 S/cm)。硫化镉(CdS)与 PEMA + KI 40% wt.+ 60% 重量比的样品中加入硫化镉(CdS),以获得导电率最高的样品。硫化镉(CdS)的重量百分比为 7%时,离子电导率最高,达到 2.65×10-3S/cm。使用扫描电子显微镜检查了导电样品的形态,使用傅立叶变换红外(FTIR)技术研究了其非晶态和晶体结构,并比较了 PEMA 聚合物 + KI 盐 + EC 增塑剂和 PEMA 聚合物 + KI 盐 + EC 增塑剂 + CdS 纳米颗粒的最高导电性样品的傅立叶变换红外'波长'。X 射线衍射(XRD)被用来确定聚合物复合电解质最大导电性样品的无定形性质。差示扫描量热法(DSC)分析用于确定聚合物复合电解质最大导电性样品的玻璃化转变温度(Tg)。采用刮刀法开发了染料敏化太阳能电池(DSSC),并观察到在一束阳光下,能量转换效率为 2.09%,参数填充因子为 79.77%。
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引用次数: 0
Strain-dependent Rashba effect, and spin Hall conductivity in the altermagnetic Janus V2SeTeO monolayer 随应变变化的拉什巴效应,以及变磁性 Janus V2SeTeO 单层中的自旋霍尔电导率
IF 2.4 4区 物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-10-30 DOI: 10.1016/j.cap.2024.10.014
Brahim Marfoua , Jisang Hong
Altermagnets represent a distinctive class of antiferromagnetic materials characterized by non-overlapping spin bands and attract extensive research efforts. Herein, we investigate the interplay among electronic, magnetic, and spin transport phenomena of the Janus V2SeTeO monolayer. The Janus monolayer has a direct band gap of 0.32 eV. The Janus V2SeTeO layer has an in-plane magnetic anisotropy along (110) direction. The incorporation of spin-orbit coupling (SOC) induces a Rashba-type band structure with a Rashba coefficient of 1.02 eV Å. The Rashba coefficient is insensitive to the compressive strain. In contrast, it is suppressed with tensile strain and becomes almost zero at 3 % tensile strain. The maximum SHC of around ∼ −65 (ℏ/e)S/cm is achieved with hole doping. The magnitudes of SHC remain comparable to those in typical topological materials. Overall, this investigation provides fundamental insights into the magnetic, Rashba, and spin transport properties of the Janus V2SeTeO altermagnet monolayer.
超磁是一类独特的反铁磁材料,其特点是自旋带不重叠,吸引了大量研究人员的关注。在此,我们研究了 Janus V2SeTeO 单层的电子、磁性和自旋传输现象之间的相互作用。Janus 单层的直接带隙为 0.32 eV。Janus V2SeTeO 层具有沿 (110) 方向的面内磁各向异性。自旋轨道耦合(SOC)的加入诱发了拉什巴系数为 1.02 eV Å 的拉什巴型带状结构。相反,拉伸应变会抑制拉什巴系数,当拉伸应变达到 3% 时,拉什巴系数几乎为零。掺入空穴后,SHC 的最大值约为∼ -65 (ℏ/e)S/cm 。SHC 的大小与典型拓扑材料的 SHC 大小相当。总之,这项研究提供了对 Janus V2SeTeO 变磁体单层的磁性、Rashba 和自旋传输特性的基本见解。
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引用次数: 0
Design and fabrication of ultrathin silicon-based strain gauges for piezoresistive pressure sensor 设计和制造用于压阻压力传感器的超薄硅基应变片
IF 2.4 4区 物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-10-30 DOI: 10.1016/j.cap.2024.10.015
Jun-Hwan Choi, Jung-Sik Kim
Ultra-thin (20 μm) silicon strain gauges were fabricated with silicon-on-insulator (SOI) wafer by a newly-conceived wet etching process. Buffered oxide etchant (BOE, NH4F: HF = 6:1) solution with additives of octylamine and octanol was used for wet etching process in which the operating temperature was 50°C. Photoresist as a passivation layer was deposited on the upper side of SOI wafer to minimize strain gauge damage by chemical etchants. Small amount of octylamine and octanol were added to BOE solution to improve surface wettability and SiO2/Si selectivity. The fabricated strain gauges were attached to the pressure diaphragm and the performance of strain gauge was investigated by measuring with the hydraulic pressure system. The resistance changed linearly with tensile and compressive strains. Maximum values of non-linearity, hysteresis, thermal coefficient of resistance (TCR) and sensitivity were -0.341 %, 0.909 %, 4128 ppm/°C and 34.22 mV/V respectively. The fabricated strain gauges might be well applicable to the hydrogen pressure sensor which is detectable for high pressure range (0–900 bar).
采用新构思的湿法蚀刻工艺,在硅绝缘体(SOI)晶片上制作了超薄(20 微米)硅应变片。湿法蚀刻工艺采用了添加辛胺和辛醇的缓冲氧化物蚀刻剂(BOE,NH4F:HF = 6:1)溶液,工作温度为 50°C。光刻胶作为钝化层沉积在 SOI 晶圆的上侧,以减少化学蚀刻剂对应变计的损坏。在 BOE 溶液中加入少量辛胺和辛醇,以改善表面润湿性和二氧化硅/硅的选择性。将制作好的应变片连接到压力膜片上,利用液压系统测量应变片的性能。电阻随拉伸和压缩应变呈线性变化。非线性、滞后、热阻系数(TCR)和灵敏度的最大值分别为-0.341 %、0.909 %、4128 ppm/°C 和 34.22 mV/V。所制作的应变片可很好地应用于氢气压力传感器,在高压范围(0-900 巴)内均可检测。
{"title":"Design and fabrication of ultrathin silicon-based strain gauges for piezoresistive pressure sensor","authors":"Jun-Hwan Choi,&nbsp;Jung-Sik Kim","doi":"10.1016/j.cap.2024.10.015","DOIUrl":"10.1016/j.cap.2024.10.015","url":null,"abstract":"<div><div>Ultra-thin (20 μm) silicon strain gauges were fabricated with silicon-on-insulator (SOI) wafer <strong>by a newly-conceived wet etching process. Buffered oxide etchant (BOE, NH</strong><sub><strong>4</strong></sub><strong>F: HF = 6:1) solution with additives of octylamine and octanol was used for wet etching process in which the operating temperature was 50°C.</strong> Photoresist as a passivation layer was deposited on the upper side of SOI wafer to minimize strain gauge damage by chemical etchants. Small amount of octylamine and octanol were added to BOE solution to improve surface wettability and SiO<sub>2</sub>/Si selectivity. The fabricated strain gauges were attached to the pressure diaphragm and the performance of strain gauge was investigated by measuring with the hydraulic pressure system. The resistance changed linearly with tensile and compressive strains. <strong>Maximum values of non-linearity, hysteresis, thermal coefficient of resistance (TCR) and sensitivity were -0.341 %, 0.909 %, 4128 ppm/°C and 34.22 mV/V respectively. The fabricated strain gauges might be well applicable to the hydrogen pressure sensor which is detectable for high pressure range (0–900 bar).</strong></div></div>","PeriodicalId":11037,"journal":{"name":"Current Applied Physics","volume":"69 ","pages":"Pages 28-35"},"PeriodicalIF":2.4,"publicationDate":"2024-10-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142573268","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Advanced spectroscopic methods for probing in-gap defect states in amorphous SiNx for charge trap memory applications 探测电荷阱存储器应用中非晶氮化硅隙内缺陷态的先进光谱方法
IF 2.4 4区 物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-10-24 DOI: 10.1016/j.cap.2024.10.007
Hyun Don Kim , Minseon Gu , Kyu-Myung Lee , Hanyeol Ahn , Jinwoo Byun , Gukhyon Yon , Junghyun Beak , Hyeongjoon Lim , Jaemo Jung , Jaehyeon Park , Jwa Soon Kim , HaeJoon Hahm , Soobang Kim , Won Ja Min , Moon Seop Hyun , Yun Chang Park , Gyungtae Kim , Yongsup Park , Moonsup Han , Eunjip Choi , Young Jun Chang
Silicon nitride (SiNx) serves as the charge trap layer in current 3D NAND flash memory devices. The precise formation mechanism and electronic structure of localized defect trap states in SiNx remain elusive. Here, we present a refined experimental methodology to elucidate the in-gap defect states and the band gaps in amorphous SiNx thin films. Our approach integrates high-resolution reflection electron energy loss spectroscopy (REELS) and spectroscopic ellipsometry (SE) for comprehensive analysis. By systematical analysis, we aim to provide a robust method for determining in-gap electronic states in SiNx. We investigated two different SiNx films prepared by plasma-enhanced chemical vapor deposition and sputtering. Our analysis revealed several distinct in-gap states and determined band gap energies. This approach not only provide advanced spectroscopic methods to characterize the defect electronic states in SiNx, but also applicable to other large band gap semiconductors or dielectrics to predict device-level characteristics for future devices.
氮化硅(SiNx)是当前三维 NAND 闪存设备中的电荷陷阱层。氮化硅中局部缺陷陷阱态的精确形成机制和电子结构仍然难以捉摸。在此,我们提出了一种精炼的实验方法来阐明非晶 SiNx 薄膜中的隙内缺陷态和带隙。我们的方法整合了高分辨率反射电子能量损失光谱(REELS)和光谱椭偏仪(SE)进行综合分析。通过系统分析,我们旨在为确定 SiNx 的隙内电子状态提供一种可靠的方法。我们研究了通过等离子体增强化学气相沉积和溅射法制备的两种不同的 SiNx 薄膜。我们的分析揭示了几种不同的隙内态,并确定了带隙能量。这种方法不仅提供了表征 SiNx 中缺陷电子态的先进光谱方法,而且适用于其他大带隙半导体或电介质,以预测未来设备的器件级特性。
{"title":"Advanced spectroscopic methods for probing in-gap defect states in amorphous SiNx for charge trap memory applications","authors":"Hyun Don Kim ,&nbsp;Minseon Gu ,&nbsp;Kyu-Myung Lee ,&nbsp;Hanyeol Ahn ,&nbsp;Jinwoo Byun ,&nbsp;Gukhyon Yon ,&nbsp;Junghyun Beak ,&nbsp;Hyeongjoon Lim ,&nbsp;Jaemo Jung ,&nbsp;Jaehyeon Park ,&nbsp;Jwa Soon Kim ,&nbsp;HaeJoon Hahm ,&nbsp;Soobang Kim ,&nbsp;Won Ja Min ,&nbsp;Moon Seop Hyun ,&nbsp;Yun Chang Park ,&nbsp;Gyungtae Kim ,&nbsp;Yongsup Park ,&nbsp;Moonsup Han ,&nbsp;Eunjip Choi ,&nbsp;Young Jun Chang","doi":"10.1016/j.cap.2024.10.007","DOIUrl":"10.1016/j.cap.2024.10.007","url":null,"abstract":"<div><div>Silicon nitride (SiN<sub>x</sub>) serves as the charge trap layer in current 3D NAND flash memory devices. The precise formation mechanism and electronic structure of localized defect trap states in SiN<sub>x</sub> remain elusive. Here, we present a refined experimental methodology to elucidate the in-gap defect states and the band gaps in amorphous SiN<sub>x</sub> thin films. Our approach integrates high-resolution reflection electron energy loss spectroscopy (REELS) and spectroscopic ellipsometry (SE) for comprehensive analysis. By systematical analysis, we aim to provide a robust method for determining in-gap electronic states in SiN<sub>x</sub>. We investigated two different SiN<sub>x</sub> films prepared by plasma-enhanced chemical vapor deposition and sputtering. Our analysis revealed several distinct in-gap states and determined band gap energies. This approach not only provide advanced spectroscopic methods to characterize the defect electronic states in SiN<sub>x</sub>, but also applicable to other large band gap semiconductors or dielectrics to predict device-level characteristics for future devices.</div></div>","PeriodicalId":11037,"journal":{"name":"Current Applied Physics","volume":"69 ","pages":"Pages 21-27"},"PeriodicalIF":2.4,"publicationDate":"2024-10-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142553008","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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Current Applied Physics
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