Pub Date : 2024-05-16DOI: 10.1016/j.cap.2024.05.012
Yun-Chae Jeong , Minhwan Kim , Seong-Hyub Lee , Jun-Young Chang , Sug-Bong Choe , Soong-Geun Je , Duck-Ho Kim
Here we propose an experimental method for determining the magnetic anisotropy field in ferromagnetic materials. Our method involves examining the small-angle variation of spontaneous magnetization by the external magnetic field and interpreting the experimental result within the framework of the Stoner-Wohlfarth model applicable to ferromagnetic materials. This method allows for the extrapolation of magnetic anisotropy fields, even when they surpass conventional measurement limits. As a result, a broad range of magnetic anisotropy fields can be ascertained using a single experimental setup. Our proposed method serves as a versatile tool for analyzing large magnetic anisotropy energy which is an important parameter for future spintronic devices.
{"title":"A novel approach for measuring large magnetic anisotropy energy with a limited magnetic field range","authors":"Yun-Chae Jeong , Minhwan Kim , Seong-Hyub Lee , Jun-Young Chang , Sug-Bong Choe , Soong-Geun Je , Duck-Ho Kim","doi":"10.1016/j.cap.2024.05.012","DOIUrl":"10.1016/j.cap.2024.05.012","url":null,"abstract":"<div><p>Here we propose an experimental method for determining the magnetic anisotropy field in ferromagnetic materials. Our method involves examining the small-angle variation of spontaneous magnetization by the external magnetic field and interpreting the experimental result within the framework of the Stoner-Wohlfarth model applicable to ferromagnetic materials. This method allows for the extrapolation of magnetic anisotropy fields, even when they surpass conventional measurement limits. As a result, a broad range of magnetic anisotropy fields can be ascertained using a single experimental setup. Our proposed method serves as a versatile tool for analyzing large magnetic anisotropy energy which is an important parameter for future spintronic devices.</p></div>","PeriodicalId":11037,"journal":{"name":"Current Applied Physics","volume":"64 ","pages":"Pages 57-60"},"PeriodicalIF":2.4,"publicationDate":"2024-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S1567173924001081/pdfft?md5=23eab2dd1bf5c9805d5df2cba6868113&pid=1-s2.0-S1567173924001081-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141034335","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-05-15DOI: 10.1016/j.cap.2024.05.008
Joon Jang Ph.D. (Guest Editor of ICAMD2023)
{"title":"Preface to the special issue of ICAMD2023","authors":"Joon Jang Ph.D. (Guest Editor of ICAMD2023)","doi":"10.1016/j.cap.2024.05.008","DOIUrl":"10.1016/j.cap.2024.05.008","url":null,"abstract":"","PeriodicalId":11037,"journal":{"name":"Current Applied Physics","volume":"64 ","pages":"Page 82"},"PeriodicalIF":2.4,"publicationDate":"2024-05-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141047466","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-05-11DOI: 10.1016/j.cap.2024.05.007
Dooyong Lee , Sungkyun Park
Transition metal oxides (TMOs) are one of the most exciting classes of materials due to their emergent phenomena over the past few decades. In general, the emergent phenomena in TMOs are driven by the chemical state of the TMOs. Therefore, it is vital to understand the correlation between the chemical state and the physical properties of the TMOs. X-ray photoelectron spectroscopy (XPS) is the most widely used method for analyzing the chemical state of materials. However, when using XPS to investigate the chemical properties of TMOs, a lack of clear theoretical explanations for the interpretation, including discussions of oxygen vacancies, inaccurate XPS peak fitting, and inaccurate calibration, often leads to misinterpretation. In this review, we present a brief introduction to XPS, the peak fitting/deconvolution method for analyzing the chemical state of TMOs, and several case studies that use XPS to correlate the chemical state and the physical properties of TMOs.
{"title":"Proper spectroscopic analysis of transition metal oxides using ex-situ X-ray photoelectron spectroscopy","authors":"Dooyong Lee , Sungkyun Park","doi":"10.1016/j.cap.2024.05.007","DOIUrl":"https://doi.org/10.1016/j.cap.2024.05.007","url":null,"abstract":"<div><p>Transition metal oxides (TMOs) are one of the most exciting classes of materials due to their emergent phenomena over the past few decades. In general, the emergent phenomena in TMOs are driven by the chemical state of the TMOs. Therefore, it is vital to understand the correlation between the chemical state and the physical properties of the TMOs. X-ray photoelectron spectroscopy (XPS) is the most widely used method for analyzing the chemical state of materials. However, when using XPS to investigate the chemical properties of TMOs, a lack of clear theoretical explanations for the interpretation, including discussions of oxygen vacancies, inaccurate XPS peak fitting, and inaccurate calibration, often leads to misinterpretation. In this review, we present a brief introduction to XPS, the peak fitting/deconvolution method for analyzing the chemical state of TMOs, and several case studies that use XPS to correlate the chemical state and the physical properties of TMOs.</p></div>","PeriodicalId":11037,"journal":{"name":"Current Applied Physics","volume":"64 ","pages":"Pages 25-33"},"PeriodicalIF":2.4,"publicationDate":"2024-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140950178","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-05-11DOI: 10.1016/j.cap.2024.05.011
Se Eun Kim , Ju Young Sung , Yewon Yun, Byeongjun Jeon, Sang Mo Moon, Han Bin Lee, Chae Hyun Lee, Hae Jun Jung, Jae-Ung Lee, Sang Woon Lee
Dynamic random-access memories (DRAMs) are used as core memories in current computing methods based on the Von Neumann architecture. The DRAM demand continuously increases because of the increased amount of data and need for artificial intelligence computing. DRAM consists of one transistor and one capacitor. Data are stored in the capacitor representing “0” and “1”. DRAM capacitors are composed of metal–insulator–metal thin films. In this review, we summarize experimental methods for development of high-k insulators and metal thin films for DRAM capacitors using the atomic layer deposition (ALD) process. Future research directions for the development of high-k and metal thin films and their ALD processes are addressed for next-generation DRAMs.
在当前基于冯-诺依曼架构的计算方法中,动态随机存取存储器(DRAM)被用作核心存储器。由于数据量的增加和人工智能计算的需要,对 DRAM 的需求不断增加。DRAM 由一个晶体管和一个电容器组成。数据存储在代表 "0 "和 "1 "的电容器中。DRAM 电容器由金属-绝缘体-金属薄膜组成。在这篇综述中,我们总结了利用原子层沉积 (ALD) 工艺开发 DRAM 电容器用高 k 绝缘体和金属薄膜的实验方法。本文还探讨了针对下一代 DRAM 开发高 K 值和金属薄膜及其 ALD 工艺的未来研究方向。
{"title":"Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: A brief review","authors":"Se Eun Kim , Ju Young Sung , Yewon Yun, Byeongjun Jeon, Sang Mo Moon, Han Bin Lee, Chae Hyun Lee, Hae Jun Jung, Jae-Ung Lee, Sang Woon Lee","doi":"10.1016/j.cap.2024.05.011","DOIUrl":"https://doi.org/10.1016/j.cap.2024.05.011","url":null,"abstract":"<div><p>Dynamic random-access memories (DRAMs) are used as core memories in current computing methods based on the Von Neumann architecture. The DRAM demand continuously increases because of the increased amount of data and need for artificial intelligence computing. DRAM consists of one transistor and one capacitor. Data are stored in the capacitor representing “0” and “1”. DRAM capacitors are composed of metal–insulator–metal thin films. In this review, we summarize experimental methods for development of high-<em>k</em> insulators and metal thin films for DRAM capacitors using the atomic layer deposition (ALD) process. Future research directions for the development of high-<em>k</em> and metal thin films and their ALD processes are addressed for next-generation DRAMs.</p></div>","PeriodicalId":11037,"journal":{"name":"Current Applied Physics","volume":"64 ","pages":"Pages 8-15"},"PeriodicalIF":2.4,"publicationDate":"2024-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140918502","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Silicide-based materials drive great potential in developing mid-temperature range thermoelectric generators (TEGs) applications. However, realizing the efficient and stable silicide materials is still a constraint for its real potential device applications. Chromium silicide will likely become p-type thermoelectric materials in this direction for thermoelectric power generation applications. However, high thermal conductivity values impede the figure-of-merit (zT). The present work adopts the chromium silicide, adding different weight percentages of well-known ZrCoSbSn compounds employing the compaction spark plasma sintering (SPS) technique. By adopting these combinations, the thermal conductivity is significantly reduced by enhanced scattering of heat-carrying phonons by multiple interfaces. Also, the maximum power factor value of ≃ 2.1 × 10−3 W/mK2 is achieved by employing a CrSi2 -ZrCoSbSn compound addition. The enhanced figure-of-merit value (zT) ≃ 0.26 is realized in the temperature at 623 K for the CrSi2-5wt% ZrCoSbSn compound material.
{"title":"Heavy elemental compound addition enhancing thermoelectric performance of Chromium Silicide synthesized by Spark plasma sintering","authors":"Manju Yadav , Naval Kishor Upadhyay , Kishor Kumar Johari , Radhey Shyam , Sanjay R. Dhakate , Bhasker Gahtori , Saravanan Muthiah","doi":"10.1016/j.cap.2024.05.009","DOIUrl":"https://doi.org/10.1016/j.cap.2024.05.009","url":null,"abstract":"<div><p>Silicide-based materials drive great potential in developing mid-temperature range thermoelectric generators (TEGs) applications. However, realizing the efficient and stable silicide materials is still a constraint for its real potential device applications. Chromium silicide will likely become p-type thermoelectric materials in this direction for thermoelectric power generation applications. However, high thermal conductivity values impede the figure-of-merit (<em>zT</em>). The present work adopts the chromium silicide, adding different weight percentages of well-known ZrCoSbSn compounds employing the compaction spark plasma sintering (SPS) technique. By adopting these combinations, the thermal conductivity is significantly reduced by enhanced scattering of heat-carrying phonons by multiple interfaces. Also, the maximum power factor value of ≃ 2.1 × 10<sup>−3</sup> W/mK<sup>2</sup> is achieved by employing a CrSi<sub>2</sub> -ZrCoSbSn compound addition. The enhanced figure-of-merit value (<em>zT</em>) ≃ 0.26 is realized in the temperature at 623 K for the CrSi<sub>2</sub>-5wt% ZrCoSbSn compound material.</p></div>","PeriodicalId":11037,"journal":{"name":"Current Applied Physics","volume":"64 ","pages":"Pages 34-39"},"PeriodicalIF":2.4,"publicationDate":"2024-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140950174","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-05-10DOI: 10.1016/j.cap.2024.05.005
Mamoon Ur Rashid , Sobia Ali Khan , Faisal Ghafoor , Jong-Seong Bae , Yun Chang Park , Muhammad Sheeraz , Zeeshan Tahir , Chinh Tam Le , Yong Soo Kim
Interface engineering plays a pivotal role in manipulating the electrical transport and conduction mechanism of a synaptic device. In this work, the impact of Ti as an interfacial layer is systematically investigated by inserting ∼5 nm thin film at both interfaces of a functional layer (TiO2). Interestingly, it was observed that Ti layers significantly regulate the migration of oxygen ions/vacancies at the interfaces yielding an improved stability from 10 to 200 cycles, sustained over a longer period ∼8 × 103 s. Forming free and gradual transition in conductance on positive bias region under a controlled compliance current ∼0.3–17 mA demonstrates the multilevel switching highlighting the typical synaptic behavior of memristor. The ohmic conduction and space charge-limited current mechanism was found across the various resistive states signifies the trapping/de-trapping. Besides, other key parameters of synaptic device such as paired pulse facilitation, depression, and short-term memory together with the excellent transmittance in the visible spectral range makes our device adequate for innovative transparent neuromorphic applications.
界面工程在操纵突触设备的电传输和传导机制方面起着举足轻重的作用。在这项工作中,通过在功能层(TiO2)的两个界面上插入 ∼5 nm 薄膜,系统地研究了钛作为界面层的影响。在 0.3-17 mA 的受控顺应电流下,正偏压区的电导形成自由和渐进的过渡,这表明多级开关突显了忆阻器的典型突触行为。在不同的电阻状态下,发现了欧姆传导和空间电荷限制电流机制,这表明了捕获/去捕获。此外,突触器件的其他关键参数,如配对脉冲促进、抑制和短期记忆,以及在可见光谱范围内的出色透射率,都使我们的器件足以用于创新的透明神经形态应用。
{"title":"Role of Ti interfacial layer in the stability of TiO2 based transparent synaptic device","authors":"Mamoon Ur Rashid , Sobia Ali Khan , Faisal Ghafoor , Jong-Seong Bae , Yun Chang Park , Muhammad Sheeraz , Zeeshan Tahir , Chinh Tam Le , Yong Soo Kim","doi":"10.1016/j.cap.2024.05.005","DOIUrl":"https://doi.org/10.1016/j.cap.2024.05.005","url":null,"abstract":"<div><p>Interface engineering plays a pivotal role in manipulating the electrical transport and conduction mechanism of a synaptic device. In this work, the impact of Ti as an interfacial layer is systematically investigated by inserting ∼5 nm thin film at both interfaces of a functional layer (TiO<sub>2</sub>). Interestingly, it was observed that Ti layers significantly regulate the migration of oxygen ions/vacancies at the interfaces yielding an improved stability from 10 to 200 cycles, sustained over a longer period ∼8 × 10<sup>3</sup> s. Forming free and gradual transition in conductance on positive bias region under a controlled compliance current ∼0.3–17 mA demonstrates the multilevel switching highlighting the typical synaptic behavior of memristor. The ohmic conduction and space charge-limited current mechanism was found across the various resistive states signifies the trapping/de-trapping. Besides, other key parameters of synaptic device such as paired pulse facilitation, depression, and short-term memory together with the excellent transmittance in the visible spectral range makes our device adequate for innovative transparent neuromorphic applications.</p></div>","PeriodicalId":11037,"journal":{"name":"Current Applied Physics","volume":"64 ","pages":"Pages 16-24"},"PeriodicalIF":2.4,"publicationDate":"2024-05-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140947643","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-05-09DOI: 10.1016/j.cap.2024.05.002
Waqas Shoukat , Muhammad Zahir Iqbal , Asma Khizar , Imran Murtaza , Shahid Alam , Rashid Ali , Saikh Mohammad Wabaidur , Mian Muhammad Faisal
The elevated energy demand and crises have rooted the urge to develop advanced electrode materials that can overcome the energy dilemma present all over the globe. Metal-organic frameworks (MOFs) have emerged as promising electrode materials in recent times due to their better electrochemical properties. Herein the metal ligand synergy produced in MOFs is observed for the same metal center (Cu) with different ligands i.e., benzene-1,3,5-tricarboxylate (1,3,5-BTC) and benzene-1,2-dicarboxylate (1,2-BDC). The hybrid device of the best performing MOF (Cu-1,3,5-BTC//AC) reveals the energy and power density of 88.32 Wh kg−1 and 680 W kg−1, respectively. Even at the highest current density of 15 A/g, the device retained the Es of 21.25 Wh kg−1 and Ps of 12,750 W kg−1. Furthermore, the semi-empirical approach was utilized for the evaluation of capacitive and diffusive contributions.
{"title":"Investigating the influence of copper benzene-1,2-dicarboxylate (Cu-BDC) and benzene-1,3,5-tricarboxylate ligands (Cu-BTC) on the electrochemical capacity of hybrid supercapacitors","authors":"Waqas Shoukat , Muhammad Zahir Iqbal , Asma Khizar , Imran Murtaza , Shahid Alam , Rashid Ali , Saikh Mohammad Wabaidur , Mian Muhammad Faisal","doi":"10.1016/j.cap.2024.05.002","DOIUrl":"10.1016/j.cap.2024.05.002","url":null,"abstract":"<div><p>The elevated energy demand and crises have rooted the urge to develop advanced electrode materials that can overcome the energy dilemma present all over the globe. Metal-organic frameworks (MOFs) have emerged as promising electrode materials in recent times due to their better electrochemical properties. Herein the metal ligand synergy produced in MOFs is observed for the same metal center (Cu) with different ligands i.e., benzene-1,3,5-tricarboxylate (1,3,5-BTC) and benzene-1,2-dicarboxylate (1,2-BDC). The hybrid device of the best performing MOF (Cu-1,3,5-BTC//AC) reveals the energy and power density of 88.32 Wh kg<sup>−1</sup> and 680 W kg<sup>−1</sup>, respectively. Even at the highest current density of 15 A/g, the device retained the E<sub>s</sub> of 21.25 Wh kg<sup>−1</sup> and P<sub>s</sub> of 12,750 W kg<sup>−1</sup>. Furthermore, the semi-empirical approach was utilized for the evaluation of capacitive and diffusive contributions.</p></div>","PeriodicalId":11037,"journal":{"name":"Current Applied Physics","volume":"64 ","pages":"Pages 40-47"},"PeriodicalIF":2.4,"publicationDate":"2024-05-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141029219","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-05-08DOI: 10.1016/j.cap.2024.05.006
Tianyu Yu , Yunlei Jiang , Suxia Liang , Zhiguo Zhao , Sheng Zou , Jie Su , Renjie Hua , Cang Liang , Wangfan Chen , Mi Zhang , Wenjun Zhang , Lei Shi , Yuan Dong
Tungsten doped indium oxide (In2O3: W, IWO) thin films have been attracting increasing attention due to their excellent optoelectronic properties. Here, a series of IWO thin films were prepared using direct current (DC) magnetron sputtering method, by varying the sputtering pressure. Analysis revealed that the IWO films prepared under sputtering pressure of 0.4 Pa exhibited excellent optoelectronic performance, with low square resistance, resistivity, high carrier concentration and mobility. The resulting semi-transparent perovskite solar cells (ST-PSCs), with IWO fabricated under 0.4 Pa, yield a PCE of 15.71 % for the large area modules of 100 cm2 (active area 64.8 cm2).
掺杂钨的氧化铟(In2O3: W,IWO)薄膜因其卓越的光电特性而受到越来越多的关注。本文采用直流(DC)磁控溅射法,通过改变溅射压力制备了一系列 IWO 薄膜。分析表明,在 0.4 Pa 的溅射压力下制备的 IWO 薄膜具有优异的光电性能,方阻、电阻率低,载流子浓度和迁移率高。在 0.4 Pa 的溅射压力下制备的 IWO 所产生的半透明过氧化物太阳能电池(ST-PSCs),在 100 平方厘米(有效面积 64.8 平方厘米)的大面积模块中,PCE 为 15.71%。
{"title":"Effect of sputtering pressure on the properties of large area IWO thin films deposited by direct current magnetron sputtering","authors":"Tianyu Yu , Yunlei Jiang , Suxia Liang , Zhiguo Zhao , Sheng Zou , Jie Su , Renjie Hua , Cang Liang , Wangfan Chen , Mi Zhang , Wenjun Zhang , Lei Shi , Yuan Dong","doi":"10.1016/j.cap.2024.05.006","DOIUrl":"https://doi.org/10.1016/j.cap.2024.05.006","url":null,"abstract":"<div><p>Tungsten doped indium oxide (In<sub>2</sub>O<sub>3</sub>: W, IWO) thin films have been attracting increasing attention due to their excellent optoelectronic properties. Here, a series of IWO thin films were prepared using direct current (DC) magnetron sputtering method, by varying the sputtering pressure. Analysis revealed that the IWO films prepared under sputtering pressure of 0.4 Pa exhibited excellent optoelectronic performance, with low square resistance, resistivity, high carrier concentration and mobility. The resulting semi-transparent perovskite solar cells (ST-PSCs), with IWO fabricated under 0.4 Pa, yield a PCE of 15.71 % for the large area modules of 100 cm<sup>2</sup> (active area 64.8 cm<sup>2</sup>).</p></div>","PeriodicalId":11037,"journal":{"name":"Current Applied Physics","volume":"64 ","pages":"Pages 1-7"},"PeriodicalIF":2.4,"publicationDate":"2024-05-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140918503","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-05-03DOI: 10.1016/j.cap.2024.05.004
Anza Farooq , Fatimah Mohammed A. Alzahrani , Norah Alomayrah , Alina Manzoor , Z.A. Alrowaili , M.S. Al-Buriahi , Imran Shakir , Mamoona Anwar , Muhammad Farooq Warsi
Different dyes and drugs used in industries when released without any treatment in water bodies cause water pollution. There is a need of synthesizing cost-effective and efficient photocatalyst for their degradation. Herein, Ba and Nd co-doped bismuth ferrite BFO (Ba0.5 Bi0.5 Nd0.5 Fe1.5 O3) and BFO@G (Ba0.5 Bi0.5 Nd0.5 Fe1.5 O3/Gr0.375) were successfully fabricated. X-ray Diffraction and Fourier Transform Infrared Spectroscopy were performed to confirm the synthesis of samples. Electrochemical measurements were carried out to further evaluate the characteristics of fabricated catalysts and Rct values of 3.90 Ω and 2.06 Ω were observed for BFO and BFO@G. BFO@G showed 72.72 % degradation of CV and 80.26 % of PC. The composite material showed enhanced performance due to the integration of graphene which provide additional conductive pathways and reduces the rate of electron-hole pair recombination. This research contributes valuable insights into the development of efficient photocatalytic materials for environmental applications.
{"title":"Solar light driven enhanced photocatalytic efficiency of Graphene based composite of co-doped Bismuth Ferrite (Ba0.5 Bi0.5 Nd0.5 Fe1.5 O3/Gr0.375) for Crystal Violet and Paracetamol","authors":"Anza Farooq , Fatimah Mohammed A. Alzahrani , Norah Alomayrah , Alina Manzoor , Z.A. Alrowaili , M.S. Al-Buriahi , Imran Shakir , Mamoona Anwar , Muhammad Farooq Warsi","doi":"10.1016/j.cap.2024.05.004","DOIUrl":"https://doi.org/10.1016/j.cap.2024.05.004","url":null,"abstract":"<div><p>Different dyes and drugs used in industries when released without any treatment in water bodies cause water pollution. There is a need of synthesizing cost-effective and efficient photocatalyst for their degradation. Herein, Ba and Nd co-doped bismuth ferrite BFO (Ba<sub>0.5</sub> Bi<sub>0.5</sub> Nd<sub>0.5</sub> Fe<sub>1.5</sub> O<sub>3</sub>) and BFO@G (Ba<sub>0.5</sub> Bi<sub>0.5</sub> Nd<sub>0.5</sub> Fe<sub>1.5</sub> O<sub>3</sub>/Gr<sub>0.375</sub>) were successfully fabricated. X-ray Diffraction and Fourier Transform Infrared Spectroscopy were performed to confirm the synthesis of samples. Electrochemical measurements were carried out to further evaluate the characteristics of fabricated catalysts and R<sub>ct</sub> values of 3.90 Ω and 2.06 Ω were observed for BFO and BFO@G. BFO@G showed 72.72 % degradation of CV and 80.26 % of PC. The composite material showed enhanced performance due to the integration of graphene which provide additional conductive pathways and reduces the rate of electron-hole pair recombination. This research contributes valuable insights into the development of efficient photocatalytic materials for environmental applications<strong>.</strong></p></div>","PeriodicalId":11037,"journal":{"name":"Current Applied Physics","volume":"63 ","pages":"Pages 126-135"},"PeriodicalIF":2.4,"publicationDate":"2024-05-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140894833","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}