首页 > 最新文献

IEEE Journal of Quantum Electronics最新文献

英文 中文
High-Power Photodiodes With Optimized Electrode Design 优化电极设计的大功率光电二极管
IF 2.1 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-08-08 DOI: 10.1109/JQE.2025.3597249
Tengmu Chen;Xiaojun Xie;Chao Wei;Wei Pan;Lianshan Yan
we demonstrate a back-illuminated flip-chip bonded modified uni-traveling carrier photodiodes by optimizing coplanar waveguide on AlN to improve the bandwidth and output power of the photodiode. The 3-dB bandwidth of the optimized devices increased from 56 GHz to 67 GHz for the $14~mu $ m diameter photodiode, and from 39 GHz to 46 GHz for the $20~mu $ m diameter device, representing an approximate 20% improvement in both cases. Thanks to the improved high-frequency performance of the devices, the photodiodes with diameters of $22~mu $ m and $14~mu $ m exhibit high RF output powers of 23.8 dBm at 30 GHz and 17 dBm at 65 GHz, respectively. The $14~mu $ m diameter PD exhibits low phase noise, with the maximum phase variation of the RF signal remaining within 10 degrees across the photocurrent range of 5 mA to 50 mA. The phase noise of optically generated RF signals, exacerbated by coupling amplitude noise on an optical pulse train to phase noise (AM-PM), exhibits a null at 17 mA. Additionally, the fully packaged module with a $22~mu $ m diameter photodiode exhibits a 3-dB bandwidth of 40 GHz and a high RF output power of 16.6 dBm at 40 GHz. This study lays the groundwork for the development of high-performance microwave photonics system and the generation of ultra-low noise microwave signals.
通过优化AlN上的共面波导,我们设计了一种背照倒装键合的单行载流子光电二极管,以提高光电二极管的带宽和输出功率。优化后器件的3db带宽从56 GHz增加到67 GHz,对于直径为14~mu $ m的光电二极管,从39 GHz增加到46 GHz,两种情况下都提高了约20%。由于器件的高频性能得到改善,直径为22~mu $ m和14~mu $ m的光电二极管在30 GHz和65 GHz分别表现出23.8 dBm和17 dBm的高射频输出功率。直径为$14~mu $ m的PD具有较低的相位噪声,在5 mA至50 mA的光电流范围内,RF信号的最大相位变化保持在10度以内。光产生的射频信号的相位噪声,由于光脉冲串上的幅值噪声与相位噪声(AM-PM)的耦合而加剧,在17 mA时表现为零。此外,采用直径22~mu $ m光电二极管的全封装模块在40ghz时具有3db带宽和16.6 dBm的高RF输出功率。该研究为高性能微波光子学系统的发展和超低噪声微波信号的产生奠定了基础。
{"title":"High-Power Photodiodes With Optimized Electrode Design","authors":"Tengmu Chen;Xiaojun Xie;Chao Wei;Wei Pan;Lianshan Yan","doi":"10.1109/JQE.2025.3597249","DOIUrl":"https://doi.org/10.1109/JQE.2025.3597249","url":null,"abstract":"we demonstrate a back-illuminated flip-chip bonded modified uni-traveling carrier photodiodes by optimizing coplanar waveguide on AlN to improve the bandwidth and output power of the photodiode. The 3-dB bandwidth of the optimized devices increased from 56 GHz to 67 GHz for the <inline-formula> <tex-math>$14~mu $ </tex-math></inline-formula>m diameter photodiode, and from 39 GHz to 46 GHz for the <inline-formula> <tex-math>$20~mu $ </tex-math></inline-formula>m diameter device, representing an approximate 20% improvement in both cases. Thanks to the improved high-frequency performance of the devices, the photodiodes with diameters of <inline-formula> <tex-math>$22~mu $ </tex-math></inline-formula>m and <inline-formula> <tex-math>$14~mu $ </tex-math></inline-formula>m exhibit high RF output powers of 23.8 dBm at 30 GHz and 17 dBm at 65 GHz, respectively. The <inline-formula> <tex-math>$14~mu $ </tex-math></inline-formula>m diameter PD exhibits low phase noise, with the maximum phase variation of the RF signal remaining within 10 degrees across the photocurrent range of 5 mA to 50 mA. The phase noise of optically generated RF signals, exacerbated by coupling amplitude noise on an optical pulse train to phase noise (AM-PM), exhibits a null at 17 mA. Additionally, the fully packaged module with a <inline-formula> <tex-math>$22~mu $ </tex-math></inline-formula>m diameter photodiode exhibits a 3-dB bandwidth of 40 GHz and a high RF output power of 16.6 dBm at 40 GHz. This study lays the groundwork for the development of high-performance microwave photonics system and the generation of ultra-low noise microwave signals.","PeriodicalId":13200,"journal":{"name":"IEEE Journal of Quantum Electronics","volume":"61 5","pages":"1-8"},"PeriodicalIF":2.1,"publicationDate":"2025-08-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145021359","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Time-Bin Phase-Encoding Quantum-Secured LiDAR Against Spoofing Attacks 抗欺骗攻击的时bin相位编码量子安全激光雷达
IF 2.1 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-08-04 DOI: 10.1109/JQE.2025.3595820
Dong Wang;Liangjiang Zhou;Juanying Zhao;Yibo Zhao
Robust and secure ranging is essential for numerous light detection and ranging (LiDAR) applications. Traditional LiDAR systems, however, are susceptible to deception jamming, such as intercept-and-resend spoofing attacks, due to their use of classical signals for interrogating non-cooperative targets. While quantum-secured imaging protocols have been proposed to counter these attacks, practical models have been scarce. This paper presents a quantum-secured LiDAR protocol using time-bin phase-encoded quantum states for simultaneous ranging and security assessment. Ranging is done via cross-correlating signals, and security assessment by statistically analyzing error rates. We develop an analytical model to evaluate the system’s resilience against intercept-resend spoofing attacks, demonstrating through numerical simulations that such attacks can be detected with high probability and low false-alarm rates under certain conditions. The scheme is robust against polarization disturbances and phase drifts, and can be implemented using existing technology, signifying its potential in quantum radar applications to improve the security and reliability of optical ranging and imaging systems.
强大和安全的测距对于许多光探测和测距(LiDAR)应用至关重要。然而,传统的激光雷达系统容易受到欺骗干扰,例如拦截和重发欺骗攻击,因为它们使用经典信号来询问非合作目标。虽然已经提出了量子安全成像协议来对抗这些攻击,但实际模型却很少。本文提出了一种量子安全激光雷达协议,该协议使用时间bin相位编码量子态进行同步测距和安全评估。测距是通过相互关联的信号完成的,安全评估是通过统计分析错误率完成的。我们开发了一个分析模型来评估系统对拦截重发欺骗攻击的弹性,通过数值模拟证明,在某些条件下,这种攻击可以以高概率和低误报率被检测到。该方案对极化干扰和相位漂移具有鲁棒性,可以利用现有技术实现,这表明其在量子雷达应用中具有提高光学测距和成像系统安全性和可靠性的潜力。
{"title":"Time-Bin Phase-Encoding Quantum-Secured LiDAR Against Spoofing Attacks","authors":"Dong Wang;Liangjiang Zhou;Juanying Zhao;Yibo Zhao","doi":"10.1109/JQE.2025.3595820","DOIUrl":"https://doi.org/10.1109/JQE.2025.3595820","url":null,"abstract":"Robust and secure ranging is essential for numerous light detection and ranging (LiDAR) applications. Traditional LiDAR systems, however, are susceptible to deception jamming, such as intercept-and-resend spoofing attacks, due to their use of classical signals for interrogating non-cooperative targets. While quantum-secured imaging protocols have been proposed to counter these attacks, practical models have been scarce. This paper presents a quantum-secured LiDAR protocol using time-bin phase-encoded quantum states for simultaneous ranging and security assessment. Ranging is done via cross-correlating signals, and security assessment by statistically analyzing error rates. We develop an analytical model to evaluate the system’s resilience against intercept-resend spoofing attacks, demonstrating through numerical simulations that such attacks can be detected with high probability and low false-alarm rates under certain conditions. The scheme is robust against polarization disturbances and phase drifts, and can be implemented using existing technology, signifying its potential in quantum radar applications to improve the security and reliability of optical ranging and imaging systems.","PeriodicalId":13200,"journal":{"name":"IEEE Journal of Quantum Electronics","volume":"61 5","pages":"1-11"},"PeriodicalIF":2.1,"publicationDate":"2025-08-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144990016","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effects of Multiple Oxide Layers in Multi-Junction VCSELs Under Different Pulse Conditions 不同脉冲条件下多结VCSELs中多氧化层的影响
IF 2.1 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-28 DOI: 10.1109/JQE.2025.3593150
Wei-Hao Huang;Cheng-Chun Chen;Ji-Yao Shan;Kai-Lun Chi;Tien-Chang Lu
This report investigates 940 nm vertical-cavity surface-emitting lasers (VCSELs) with three-junction (3J) designs under various pulsed driving conditions, focusing on the influence of oxide layer configurations on electrical and optical performance. Heat accumulation is a critical issue in VCSEL operation; therefore, reducing pulse width effectively minimizes heat generation. This not only enhances the thermal characteristics of the devices but also suppresses lateral carrier diffusion—particularly important in longer resonant cavity structures such as multi-junction VCSELs. At room temperature, a 3J 940 nm VCSEL with a $10mu $ m oxide aperture driven by 2 ns pulses achieved a slope efficiency (SE) of 3.2 W/A using a three-layer oxide structure, compared to 2.37 W/A for a single-layer oxide design. Both devices exhibited a red spectral shift of less than 1 nm, corresponding to a temperature rise below $12~^{circ }$ C, indicating improved thermal management. Notably, a unique behavior was observed in the three-oxide-layer 3J VCSEL: as the injection current increased, the beam divergence angle decreased from 17° to 5°. These findings highlight the advantages of multi-junction VCSELs with optimized oxide designs, demonstrating their potential for future high-performance sensing applications.
本文研究了不同脉冲驱动条件下940 nm三结垂直腔面发射激光器(VCSELs),重点研究了氧化层结构对电学和光学性能的影响。热积累是VCSEL运行中的关键问题;因此,减小脉冲宽度可以有效地减少热量的产生。这不仅提高了器件的热特性,而且抑制了横向载流子扩散,这在较长的谐振腔结构(如多结VCSELs)中尤为重要。在室温下,由2 ns脉冲驱动的3J 940 nm氧化孔径为$10mu $ m的VCSEL,采用三层氧化结构的斜率效率(SE)为3.2 W/ a,而单层氧化结构的斜率效率为2.37 W/ a。两种器件的红光谱位移均小于1 nm,对应的温升低于$12~^{circ}$ C,表明热管理得到改善。值得注意的是,在三氧化层3J VCSEL中观察到一个独特的行为:随着注入电流的增加,光束发散角从17°减小到5°。这些发现突出了具有优化氧化物设计的多结vcsel的优势,展示了它们在未来高性能传感应用中的潜力。
{"title":"Effects of Multiple Oxide Layers in Multi-Junction VCSELs Under Different Pulse Conditions","authors":"Wei-Hao Huang;Cheng-Chun Chen;Ji-Yao Shan;Kai-Lun Chi;Tien-Chang Lu","doi":"10.1109/JQE.2025.3593150","DOIUrl":"https://doi.org/10.1109/JQE.2025.3593150","url":null,"abstract":"This report investigates 940 nm vertical-cavity surface-emitting lasers (VCSELs) with three-junction (3J) designs under various pulsed driving conditions, focusing on the influence of oxide layer configurations on electrical and optical performance. Heat accumulation is a critical issue in VCSEL operation; therefore, reducing pulse width effectively minimizes heat generation. This not only enhances the thermal characteristics of the devices but also suppresses lateral carrier diffusion—particularly important in longer resonant cavity structures such as multi-junction VCSELs. At room temperature, a 3J 940 nm VCSEL with a <inline-formula> <tex-math>$10mu $ </tex-math></inline-formula> m oxide aperture driven by 2 ns pulses achieved a slope efficiency (SE) of 3.2 W/A using a three-layer oxide structure, compared to 2.37 W/A for a single-layer oxide design. Both devices exhibited a red spectral shift of less than 1 nm, corresponding to a temperature rise below <inline-formula> <tex-math>$12~^{circ }$ </tex-math></inline-formula>C, indicating improved thermal management. Notably, a unique behavior was observed in the three-oxide-layer 3J VCSEL: as the injection current increased, the beam divergence angle decreased from 17° to 5°. These findings highlight the advantages of multi-junction VCSELs with optimized oxide designs, demonstrating their potential for future high-performance sensing applications.","PeriodicalId":13200,"journal":{"name":"IEEE Journal of Quantum Electronics","volume":"61 5","pages":"1-6"},"PeriodicalIF":2.1,"publicationDate":"2025-07-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144990000","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IEEE Journal of Quantum Electronics information for authors IEEE量子电子学杂志作者信息
IF 2.2 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3582130
{"title":"IEEE Journal of Quantum Electronics information for authors","authors":"","doi":"10.1109/JQE.2025.3582130","DOIUrl":"https://doi.org/10.1109/JQE.2025.3582130","url":null,"abstract":"","PeriodicalId":13200,"journal":{"name":"IEEE Journal of Quantum Electronics","volume":"61 3","pages":"C3-C3"},"PeriodicalIF":2.2,"publicationDate":"2025-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=11095970","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144695524","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Blank Page 空白页
IF 2.2 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3582132
{"title":"Blank Page","authors":"","doi":"10.1109/JQE.2025.3582132","DOIUrl":"https://doi.org/10.1109/JQE.2025.3582132","url":null,"abstract":"","PeriodicalId":13200,"journal":{"name":"IEEE Journal of Quantum Electronics","volume":"61 3","pages":"C4-C4"},"PeriodicalIF":2.2,"publicationDate":"2025-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=11095907","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144695654","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IEEE Journal of Quantum Electronics publication information IEEE量子电子学杂志出版信息
IF 2.2 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3582126
{"title":"IEEE Journal of Quantum Electronics publication information","authors":"","doi":"10.1109/JQE.2025.3582126","DOIUrl":"https://doi.org/10.1109/JQE.2025.3582126","url":null,"abstract":"","PeriodicalId":13200,"journal":{"name":"IEEE Journal of Quantum Electronics","volume":"61 3","pages":"C2-C2"},"PeriodicalIF":2.2,"publicationDate":"2025-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=11095908","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144695522","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Editorial JQE 60th Anniversary: The 80’s 社论JQE 60周年:80年代
IF 2.2 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3583096
John M. Dallesasse
{"title":"Editorial JQE 60th Anniversary: The 80’s","authors":"John M. Dallesasse","doi":"10.1109/JQE.2025.3583096","DOIUrl":"https://doi.org/10.1109/JQE.2025.3583096","url":null,"abstract":"","PeriodicalId":13200,"journal":{"name":"IEEE Journal of Quantum Electronics","volume":"61 3","pages":"1-2"},"PeriodicalIF":2.2,"publicationDate":"2025-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=11095905","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144695655","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Electrooptical Effects in Silicon 硅中的电光效应
IF 2.2 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3587556
{"title":"Electrooptical Effects in Silicon","authors":"","doi":"10.1109/JQE.2025.3587556","DOIUrl":"https://doi.org/10.1109/JQE.2025.3587556","url":null,"abstract":"","PeriodicalId":13200,"journal":{"name":"IEEE Journal of Quantum Electronics","volume":"61 3","pages":"1-7"},"PeriodicalIF":2.2,"publicationDate":"2025-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144695487","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High Magnitude Spin-Dependent Shift and Field Enhancement in BaTiO3-Based Plasmonics for Quantum Photonic Applications 量子光子应用中基于batio3的等离子体的高量级自旋相关位移和场增强
IF 2.1 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3592448
Vinit Kumar;Ajit Kumar;Rupam Srivastava;Anuj K. Sharma;Yogendra Kumar Prajapati
This research investigates the integration of photonic spin-orbit interaction (SOI) with plasmonic phenomenon using Barium Titanate (BaTiO3) as the active material. A remarkable transverse spin-dependent shift (SDS) of $838~boldsymbol {mu }mathbf {m}$ is demonstrated—approximately 28 times larger than that observed in conventional plasmonic material such as silver (Ag). The study further explores the interplay between the enhanced electric field and spin-dependent splitting under resonance conditions, revealing that the resonance angle is strongly influenced by both SDS magnitude and field enhancement. Leveraging this enhanced spin-based interaction, we demonstrate the potential for quantum-enabled optical device design, including an optical differentiator and a high-sensitivity sensor. The proposed differentiator structure exhibits a power weight of 414.96 for the co-polarized (V–V) component and 0.35 for the cross-polarized (V–H/H–V) component. Moreover, the photonic spin-based sensor architecture achieves a sensitivity enhancement of $sim~52times $ compared to a standard plasmonic system at a refractive index of 1.33. These findings establish BaTiO3-integrated plasmonic platforms as promising candidates for advanced spin-based photonic devices in the realm of quantum technologies.
本研究以钛酸钡(BaTiO3)为活性材料,研究了光子自旋轨道相互作用(SOI)与等离子体现象的集成。一个显著的横向自旋相关位移(SDS) $838~boldsymbol {mu }mathbf {m}$被证明-大约28倍于观察到的传统等离子体材料,如银(Ag)。研究进一步探讨了共振条件下增强电场与自旋依赖分裂之间的相互作用,发现共振角受到SDS大小和场增强的强烈影响。利用这种增强的基于自旋的相互作用,我们展示了量子光学器件设计的潜力,包括光学微分器和高灵敏度传感器。该微分器结构的共极化(V-V)分量的功率权重为414.96,交叉极化(V-H / H-V)分量的功率权重为0.35。此外,与折射率为1.33的标准等离子体系统相比,基于光子自旋的传感器结构实现了$sim~52times $的灵敏度增强。这些发现确立了batio3集成等离子体平台作为量子技术领域先进自旋光子器件的有希望的候选者。
{"title":"High Magnitude Spin-Dependent Shift and Field Enhancement in BaTiO3-Based Plasmonics for Quantum Photonic Applications","authors":"Vinit Kumar;Ajit Kumar;Rupam Srivastava;Anuj K. Sharma;Yogendra Kumar Prajapati","doi":"10.1109/JQE.2025.3592448","DOIUrl":"https://doi.org/10.1109/JQE.2025.3592448","url":null,"abstract":"This research investigates the integration of photonic spin-orbit interaction (SOI) with plasmonic phenomenon using Barium Titanate (BaTiO3) as the active material. A remarkable transverse spin-dependent shift (SDS) of <inline-formula> <tex-math>$838~boldsymbol {mu }mathbf {m}$ </tex-math></inline-formula> is demonstrated—approximately 28 times larger than that observed in conventional plasmonic material such as silver (Ag). The study further explores the interplay between the enhanced electric field and spin-dependent splitting under resonance conditions, revealing that the resonance angle is strongly influenced by both SDS magnitude and field enhancement. Leveraging this enhanced spin-based interaction, we demonstrate the potential for quantum-enabled optical device design, including an optical differentiator and a high-sensitivity sensor. The proposed differentiator structure exhibits a power weight of 414.96 for the co-polarized (V–V) component and 0.35 for the cross-polarized (V–H/H–V) component. Moreover, the photonic spin-based sensor architecture achieves a sensitivity enhancement of <inline-formula> <tex-math>$sim~52times $ </tex-math></inline-formula> compared to a standard plasmonic system at a refractive index of 1.33. These findings establish BaTiO3-integrated plasmonic platforms as promising candidates for advanced spin-based photonic devices in the realm of quantum technologies.","PeriodicalId":13200,"journal":{"name":"IEEE Journal of Quantum Electronics","volume":"61 5","pages":"1-8"},"PeriodicalIF":2.1,"publicationDate":"2025-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144990307","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Theory of the Linewidth of Semiconductor Lasers 半导体激光器线宽理论
IF 2.2 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3587557
{"title":"Theory of the Linewidth of Semiconductor Lasers","authors":"","doi":"10.1109/JQE.2025.3587557","DOIUrl":"https://doi.org/10.1109/JQE.2025.3587557","url":null,"abstract":"","PeriodicalId":13200,"journal":{"name":"IEEE Journal of Quantum Electronics","volume":"61 3","pages":"1-6"},"PeriodicalIF":2.2,"publicationDate":"2025-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144695621","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
IEEE Journal of Quantum Electronics
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1