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Effects of Multiple Oxide Layers in Multi-Junction VCSELs Under Different Pulse Conditions 不同脉冲条件下多结VCSELs中多氧化层的影响
IF 2.1 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-28 DOI: 10.1109/JQE.2025.3593150
Wei-Hao Huang;Cheng-Chun Chen;Ji-Yao Shan;Kai-Lun Chi;Tien-Chang Lu
This report investigates 940 nm vertical-cavity surface-emitting lasers (VCSELs) with three-junction (3J) designs under various pulsed driving conditions, focusing on the influence of oxide layer configurations on electrical and optical performance. Heat accumulation is a critical issue in VCSEL operation; therefore, reducing pulse width effectively minimizes heat generation. This not only enhances the thermal characteristics of the devices but also suppresses lateral carrier diffusion—particularly important in longer resonant cavity structures such as multi-junction VCSELs. At room temperature, a 3J 940 nm VCSEL with a $10mu $ m oxide aperture driven by 2 ns pulses achieved a slope efficiency (SE) of 3.2 W/A using a three-layer oxide structure, compared to 2.37 W/A for a single-layer oxide design. Both devices exhibited a red spectral shift of less than 1 nm, corresponding to a temperature rise below $12~^{circ }$ C, indicating improved thermal management. Notably, a unique behavior was observed in the three-oxide-layer 3J VCSEL: as the injection current increased, the beam divergence angle decreased from 17° to 5°. These findings highlight the advantages of multi-junction VCSELs with optimized oxide designs, demonstrating their potential for future high-performance sensing applications.
本文研究了不同脉冲驱动条件下940 nm三结垂直腔面发射激光器(VCSELs),重点研究了氧化层结构对电学和光学性能的影响。热积累是VCSEL运行中的关键问题;因此,减小脉冲宽度可以有效地减少热量的产生。这不仅提高了器件的热特性,而且抑制了横向载流子扩散,这在较长的谐振腔结构(如多结VCSELs)中尤为重要。在室温下,由2 ns脉冲驱动的3J 940 nm氧化孔径为$10mu $ m的VCSEL,采用三层氧化结构的斜率效率(SE)为3.2 W/ a,而单层氧化结构的斜率效率为2.37 W/ a。两种器件的红光谱位移均小于1 nm,对应的温升低于$12~^{circ}$ C,表明热管理得到改善。值得注意的是,在三氧化层3J VCSEL中观察到一个独特的行为:随着注入电流的增加,光束发散角从17°减小到5°。这些发现突出了具有优化氧化物设计的多结vcsel的优势,展示了它们在未来高性能传感应用中的潜力。
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引用次数: 0
IEEE Journal of Quantum Electronics information for authors IEEE量子电子学杂志作者信息
IF 2.2 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3582130
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引用次数: 0
Blank Page 空白页
IF 2.2 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3582132
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引用次数: 0
IEEE Journal of Quantum Electronics publication information IEEE量子电子学杂志出版信息
IF 2.2 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3582126
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引用次数: 0
Editorial JQE 60th Anniversary: The 80’s 社论JQE 60周年:80年代
IF 2.2 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3583096
John M. Dallesasse
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引用次数: 0
Electrooptical Effects in Silicon 硅中的电光效应
IF 2.2 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3587556
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引用次数: 0
High Magnitude Spin-Dependent Shift and Field Enhancement in BaTiO3-Based Plasmonics for Quantum Photonic Applications 量子光子应用中基于batio3的等离子体的高量级自旋相关位移和场增强
IF 2.1 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3592448
Vinit Kumar;Ajit Kumar;Rupam Srivastava;Anuj K. Sharma;Yogendra Kumar Prajapati
This research investigates the integration of photonic spin-orbit interaction (SOI) with plasmonic phenomenon using Barium Titanate (BaTiO3) as the active material. A remarkable transverse spin-dependent shift (SDS) of $838~boldsymbol {mu }mathbf {m}$ is demonstrated—approximately 28 times larger than that observed in conventional plasmonic material such as silver (Ag). The study further explores the interplay between the enhanced electric field and spin-dependent splitting under resonance conditions, revealing that the resonance angle is strongly influenced by both SDS magnitude and field enhancement. Leveraging this enhanced spin-based interaction, we demonstrate the potential for quantum-enabled optical device design, including an optical differentiator and a high-sensitivity sensor. The proposed differentiator structure exhibits a power weight of 414.96 for the co-polarized (V–V) component and 0.35 for the cross-polarized (V–H/H–V) component. Moreover, the photonic spin-based sensor architecture achieves a sensitivity enhancement of $sim~52times $ compared to a standard plasmonic system at a refractive index of 1.33. These findings establish BaTiO3-integrated plasmonic platforms as promising candidates for advanced spin-based photonic devices in the realm of quantum technologies.
本研究以钛酸钡(BaTiO3)为活性材料,研究了光子自旋轨道相互作用(SOI)与等离子体现象的集成。一个显著的横向自旋相关位移(SDS) $838~boldsymbol {mu }mathbf {m}$被证明-大约28倍于观察到的传统等离子体材料,如银(Ag)。研究进一步探讨了共振条件下增强电场与自旋依赖分裂之间的相互作用,发现共振角受到SDS大小和场增强的强烈影响。利用这种增强的基于自旋的相互作用,我们展示了量子光学器件设计的潜力,包括光学微分器和高灵敏度传感器。该微分器结构的共极化(V-V)分量的功率权重为414.96,交叉极化(V-H / H-V)分量的功率权重为0.35。此外,与折射率为1.33的标准等离子体系统相比,基于光子自旋的传感器结构实现了$sim~52times $的灵敏度增强。这些发现确立了batio3集成等离子体平台作为量子技术领域先进自旋光子器件的有希望的候选者。
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引用次数: 0
Device Engineering of a New Lead Free All Inorganic CsSnI₃/CsSnCl₃-Based Graded Perovskite Absorber Structure for High Performance Solar Cell 高性能太阳能电池用新型无铅全无机CsSnI₃/CsSnCl₃梯度钙钛矿吸收结构的器件工程
IF 2.1 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3592472
Smriti Baruah;Janmoni Borah;Santanu Maity
Future developments in perovskite solar cells (PSCs) focuses on lead-free versions because of their lower toxicity. However, lead-free PSCs’ limited Power Conversion Efficiency (PCE) compared to their lead-based counterparts prevents them from being used more widely. This issue can be successfully resolved with the multi-absorber approach since it maximizes the use of the solar spectrum. Therefore, this article incorporates numerical modeling guided optimization of a lead free all inorganic ITO/ETL/CsSnI3/CsSnCl3/HTL dual absorbers-based heterojunction structure to improve the performance of Cesium Tin Iodide (CsSnI3) and Cesium Tin Chloride (CsSnCl3) based single absorber PSCs. The critical device’s parameters, such as absorber layer and carrier transport layer thickness, defect density, temperature, doping concentration, series and shunt resistances are thoroughly optimized and evaluated using Solar cell capacitance simulator (SCAPS-1D). The proposed dual absorber composition produces a substantial enhancement in performance with PCE ( $eta $ ) of 24%, Short Circuit Current ( $J_{mathrm {sc}}$ ) of 28.5 mA/cm2, Open Circuit Voltage ( $V_{mathrm {oc}}$ ) of 0.96 V, and Field Factor (FF) of 85.87% at a device defect density of $10^{15}$ cm−3 outperforming the 12.96% and 9.66% of PCE attained with the reported CsSnI3 and CsSnCl3 single junction counterparts.
钙钛矿太阳能电池(PSCs)的未来发展重点是无铅版本,因为它们的毒性较低。然而,与基于铅的同类产品相比,无铅psc的有限功率转换效率(PCE)阻碍了它们的更广泛应用。这个问题可以通过多吸收器方法成功解决,因为它最大限度地利用了太阳光谱。因此,本文采用数值模拟指导优化无铅全无机ITO/ETL/ CsSnCl3/ CsSnCl3/ html双吸收剂异质结结构,以提高基于碘化锡铯(cssn3)和氯化锡铯(CsSnCl3)的单吸收剂psc的性能。利用太阳能电池电容模拟器(SCAPS-1D)对吸收层和载流子输运层厚度、缺陷密度、温度、掺杂浓度、串联电阻和分流电阻等关键器件参数进行了全面优化和评估。在器件缺陷密度为$10^{15}$ cm−3的情况下,所提出的双吸收器组合产生了显著的性能提升,PCE ($eta $)为24%,短路电流($J_{mathrm {sc}}$)为28.5 mA/cm2,开路电压($V_{mathrm {oc}}$)为0.96 V,场因子(FF)为85.87%,优于已报道的CsSnCl3和CsSnCl3单结对应器件的PCE(12.96%和9.66%)。
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引用次数: 0
Theory of the Linewidth of Semiconductor Lasers 半导体激光器线宽理论
IF 2.2 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-24 DOI: 10.1109/JQE.2025.3587557
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引用次数: 0
Design Challenges in Binary 4H-SiC NUV-Enhanced SACM APDs 二进制4H-SiC nuv增强型SACM apd的设计挑战
IF 2.1 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-07-23 DOI: 10.1109/JQE.2025.3591762
Jonathan Schuster;Daniel B. Habersat;Franklin L. Nouketcha;Brenda L. VanMil;Jeremy L. Smith;Gregory A. Garrett;Michael A. Derenge;Tilak Hewagama;Shahid Aslam;Dina M. Bower;Anand V. Sampath;Michael Wraback
Near-ultraviolet (NUV) Geiger-mode avalanche photodiodes (NUV-GM-APD) require high unity-gain quantum efficiency (QE), while operating above avalanche breakdown. 4H-SiC has long been established as a proven GM-APD in the UV-C (<280> $lt 3~mu $ m thick) to a separate-absorption charge-multiplication (SACM) architecture. However, using a SACM architecture to improve the NUV unity-gain QE has unique challenges: including deviating from existing front-side absorber SACM architectures to a very thick backside one. This is further compounded when binary semiconductor materials are used (e.g., 4H-SiC) instead of alloyed heterostructures (e.g., InGaP or HgCdTe), removing what is arguably the most versatile design parameter, the mole fraction of the alloy. To overcome these challenges, we have implemented a numerical model with a calibrated 4H-SiC material library for the development of APDs and leveraged it to design NUV-enhanced SACM structures, where both non-reach-through (NRT) and reach-through (RT) architectures have been considered. For the NRT-SACM case, it was determined that the doping profiles must be engineered such that two competing mechanisms are balanced: maximizing the minority carrier diffusion length in the absorber layer (AL, longest at lower AL doping), while minimizing the corresponding potential barrier at the AL/charge layer (CL) interface (lowest at higher AL doping). Conversely, in a RT-SACM architecture, it was determined that a narrow range of total charge in the CL properly modulated the electric field to be non-zero in the AL and sufficiently large in the multiplication layer (ML) to operate above avalanche breakdown. As such, it was determined that the CL design is exceptionally intolerant to variations in either layer thickness or doping. Leveraging design rules learned and reported in this paper, we have designed both types of SACM architectures: NRT-SACM APDs and RT-SACM APDs, with unity gain QE at 340 nm up to 32% and 71% respectively, while maintaining a large electric field in the ML required for Geiger-mode operation.
近紫外(NUV)盖革模式雪崩光电二极管(NUV- gm - apd)工作在雪崩击穿之上,需要较高的单位增益量子效率(QE)。4H-SiC在UV-C ($lt 3~mu $ m厚)中被证明是一种成熟的GM-APD,具有分离吸收电荷倍增(SACM)结构。然而,使用SACM架构来改善NUV单位增益QE具有独特的挑战:包括从现有的前部吸收器SACM架构到非常厚的后部SACM架构。当使用二元半导体材料(例如,4H-SiC)而不是合金异质结构(例如,InGaP或HgCdTe)时,这种情况进一步复杂化,从而消除了可以说是最通用的设计参数,即合金的摩尔分数。为了克服这些挑战,我们已经实现了一个带有校准的4H-SiC材料库的数值模型,用于apd的开发,并利用它来设计nuv增强的SACM结构,其中考虑了非直通(NRT)和直通(RT)架构。对于NRT-SACM的情况,我们确定掺杂谱必须设计成平衡两种竞争机制:最大化吸收层中的少数载流子扩散长度(AL,低AL掺杂时最长),同时最小化AL/电荷层(CL)界面上相应的势垒(高AL掺杂时最低)。相反,在RT-SACM体系结构中,确定了CL中窄范围的总电荷适当地调制了AL中的非零电场,并且在倍增层(ML)中足够大以在雪崩击穿之上运行。因此,确定CL设计异常不耐受层厚度或掺杂的变化。利用本文中学习和报道的设计规则,我们设计了两种类型的SACM架构:NRT-SACM apd和RT-SACM apd,在340 nm处的单位增益QE分别高达32%和71%,同时在ML中保持了盖革模式操作所需的大电场。
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IEEE Journal of Quantum Electronics
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