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Ambipolar Conduction of λ-DNA Transistor Fabricated on SiO2/Si Structure SiO2/Si结构λ-DNA晶体管的双极性导电
Pub Date : 2022-01-01 DOI: 10.1587/transele.2021ecp5049
N. Matsuo, K. Yoshida, K. Sumitomo, K. Yamana, T. Tabei
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引用次数: 0
The Effect of Inter Layers on the Ferroelectric Undoped HfO2 Formation 中间层对铁电未掺杂HfO2形成的影响
Pub Date : 2022-01-01 DOI: 10.1587/transele.2021fup0004
Masakazu Tanuma, Joong‐Won Shin, S. Ohmi
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引用次数: 2
SRAM: A Septum-Type Polarizer Design Method Based on Superposed Even- and Odd-Mode Excitation Analysis SRAM:一种基于奇偶模叠加激励分析的隔膜型偏振片设计方法
Pub Date : 2022-01-01 DOI: 10.1587/transele.2021ecp5012
Tomoki Kaneko, H. Saito, A. Hirose
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引用次数: 2
Topology Optimal Design of NRD Guide Devices Using Function Expansion Method and Evolutionary Approaches 基于函数展开法和进化方法的NRD导向装置拓扑优化设计
Pub Date : 2022-01-01 DOI: 10.1587/transele.2021esp0005
Naoya Hieda, K. Morimoto, A. Iguchi, Y. Tsuji, T. Kashiwa
{"title":"Topology Optimal Design of NRD Guide Devices Using Function Expansion Method and Evolutionary Approaches","authors":"Naoya Hieda, K. Morimoto, A. Iguchi, Y. Tsuji, T. Kashiwa","doi":"10.1587/transele.2021esp0005","DOIUrl":"https://doi.org/10.1587/transele.2021esp0005","url":null,"abstract":"","PeriodicalId":13259,"journal":{"name":"IEICE Trans. Electron.","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2022-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76261020","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
A Discussion on Physical Optics Approximation for Edge Diffraction by A Conducting Wedge 关于导楔边缘衍射的物理光学近似的讨论
Pub Date : 2022-01-01 DOI: 10.1587/transele.2021ecp5031
Duc Minh Nguyen, H. Shirai
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引用次数: 0
Deep-Learning-Assisted Single-Pixel Imaging for Gesture Recognition in Consideration of Privacy 考虑隐私的深度学习辅助单像素手势识别
Pub Date : 2022-01-01 DOI: 10.1587/transele.2021dii0002
Naoya Mukojima, Masaki Yasugi, Y. Mizutani, T. Yasui, Hirotsugu Yamamoto
SUMMARY We have utilized single-pixel imaging and deep-learning to solve the privacy-preserving problem in gesture recognition for interactive display. Silhouette images of hand gestures were acquired by use of a display panel as an illumination. Reconstructions of gesture images have been performed by numerical experiments on single-pixel imaging by changing the number of illumination mask patterns. For the training and the image restoration with deep learning, we prepared reconstructed data with 250 and 500 illuminations as datasets. For each of the 250 and 500 illuminations, we prepared 9000 datasets in which original images and reconstructed data were paired. Of these data, 8500 data were used for training a neural network (6800 data for training and 1700 data for validation), and 500 data were used to evaluate the accuracy of image restoration. Our neural network, based on U-net, was able to restore images close to the original images even from reconstructed data with greatly reduced number of illuminations, which is 1/40 of the single-pixel imaging without deep learning. Compared restoration accuracy between cases using shadowgraph (black on white background) and negative-positive reversed images (white on black background) as silhouette image, the accuracy of the restored image was lower for negative-positive-reversed images when the number of illuminations was small. Moreover, we found that the restoration accuracy decreased in the order of rock, scissor, and paper. Shadowgraph is suitable for gesture silhouette, and it is necessary to prepare training data and construct neural networks, to avoid the restoration accuracy between gestures when further reducing the number of illuminations.
我们利用单像素成像和深度学习来解决交互式显示手势识别中的隐私保护问题。手势的轮廓图像是通过使用显示面板作为照明来获得的。通过改变照明掩模模式的数目,在单像素成像上进行了手势图像的重建实验。为了训练和深度学习图像恢复,我们准备了250和500照度的重建数据作为数据集。对于250和500照明中的每一个,我们准备了9000个数据集,其中原始图像和重建数据配对。其中8500个数据用于训练神经网络(6800个数据用于训练,1700个数据用于验证),500个数据用于评估图像恢复的准确性。我们基于U-net的神经网络,即使在光照数量大大减少的情况下,也能从重建的数据中恢复接近原始图像的图像,这是没有深度学习的单像素成像的1/40。对比阴影图(白色背景上的黑色)和正负反转图(黑色背景上的白色)作为剪影图像的恢复精度,光照数较少时正负反转图像的恢复精度较低。此外,我们发现恢复精度依次为岩石、剪刀和纸。阴影图适合于手势剪影,需要准备训练数据和构建神经网络,以避免在进一步减少光照数量时手势之间的恢复精度降低。
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引用次数: 2
Analysis of Efficiency-Limiting Factors Resulting from Transistor Current Source on Class-F and Inverse Class-F Power Amplifiers f类和反f类功率放大器晶体管电流源限制效率的因素分析
Pub Date : 2022-01-01 DOI: 10.1587/transele.2022mmi0003
H. Yamamoto, K. Kikuchi, V. Vadalà, G. Bosi, A. Raffo, G. Vannini
SUMMARY This paper describes the efficiency-limiting factors resulting from transistor current source in the case of class-F and inverse class-F (F -1 ) operations under saturated region. We investigated the influence of knee voltage and gate-voltage clipping behaviors on drain efficiency as limiting factors for the current source. Numerical analysis using a simplified transistor model was carried out. As a result, we have demonstrated that the limiting factor for class-F -1 operation is the gate-diode conduction rather than knee voltage. On the other hand, class-F PA is restricted by the knee voltage effects. Furthermore, nonlinear measurements carried out on a GaN HEMT validate our analytical results.
本文描述了在饱和区F类和反F类(F -1)操作的情况下,晶体管电流源产生的效率限制因素。作为电流源的限制因素,我们研究了膝电压和门电压截断行为对漏极效率的影响。采用简化的晶体管模型进行了数值分析。因此,我们已经证明了f -1类操作的限制因素是门二极管导通而不是膝电压。另一方面,f类PA受到膝关节电压效应的限制。此外,在GaN HEMT上进行的非线性测量验证了我们的分析结果。
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引用次数: 3
28nm Atom-Switch FPGA: Static Timing Analysis and Evaluation 28nm原子开关FPGA:静态时序分析与评估
Pub Date : 2022-01-01 DOI: 10.1587/transele.2021fus0005
X. Bai, R. Nebashi, M. Miyamura, Kazunori Funahashi, N. Banno, K. Okamoto, Hideaki Numata, N. Iguchi, T. Sugibayashi, T. Sakamoto, M. Tada
{"title":"28nm Atom-Switch FPGA: Static Timing Analysis and Evaluation","authors":"X. Bai, R. Nebashi, M. Miyamura, Kazunori Funahashi, N. Banno, K. Okamoto, Hideaki Numata, N. Iguchi, T. Sugibayashi, T. Sakamoto, M. Tada","doi":"10.1587/transele.2021fus0005","DOIUrl":"https://doi.org/10.1587/transele.2021fus0005","url":null,"abstract":"","PeriodicalId":13259,"journal":{"name":"IEICE Trans. Electron.","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2022-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81947829","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Self-Powered Flyback Pulse Resonant Circuit for Combined Piezoelectric and Thermoelectric Energy Harvesting 一种用于压电和热电联合能量收集的自供电反激脉冲谐振电路
Pub Date : 2022-01-01 DOI: 10.1587/transele.2021ecp5003
Huakang Xia, Yidie Ye, Xiudeng Wang, Ge Shi, Zhidong Chen, Libo Qian, Yinshui Xia
{"title":"A Self-Powered Flyback Pulse Resonant Circuit for Combined Piezoelectric and Thermoelectric Energy Harvesting","authors":"Huakang Xia, Yidie Ye, Xiudeng Wang, Ge Shi, Zhidong Chen, Libo Qian, Yinshui Xia","doi":"10.1587/transele.2021ecp5003","DOIUrl":"https://doi.org/10.1587/transele.2021ecp5003","url":null,"abstract":"","PeriodicalId":13259,"journal":{"name":"IEICE Trans. Electron.","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2022-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89261765","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Sputtering Gas Pressure Dependence on the LaBxNy Insulator Formation for Pentacene-Based Back-Gate Type Floating-Gate Memory with an Amorphous Rubrene Passivation Layer 溅射气体压力对具有非晶Rubrene钝化层的五苯基背栅式浮栅存储器LaBxNy绝缘体形成的影响
Pub Date : 2022-01-01 DOI: 10.1587/transele.2021fup0005
E. Hong, K. Park, S. Ohmi
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引用次数: 0
期刊
IEICE Trans. Electron.
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