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Experimental and theoretical study of 90Sr/90Y-n-Si/ZnO betavoltaic battery and theoretical prediction of homojunction betavoltaic cells performance 90Sr/90Y-n-Si/ZnO 光伏电池的实验和理论研究以及同质结光伏电池性能的理论预测
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-03 DOI: 10.1016/j.mssp.2024.109059
Zohreh Movahedian, Hossein Tavakoli-Anbaran
Today, betavoltaic batteries has been considered due to their high energy density and long life for operating electrical systems in inaccessible and hostile environments. Conventional electrochemical batteries, despite their widespread use in electronic devices, have a limited lifetime and tend to degrade in extreme environmental conditions. The current paper pursues three goals. The first goal is to the experimental and theoretical investigation of a n-Si/ZnO heterojunction betavoltaic battery based on 90Sr/90Y source. The second goal is to optimize ZnO, SnO2, BN, and diamond homojunction betavoltaic cells in two planar and cubical models by Monte Carlo simulation (MCNP code). The third goal is to present a new approach for estimating the standard error in calculating the parameters of betavoltaic batteries. In order to fabrication of a n-Si/ZnO heterojunction, the ZnO nanospheres were placed on the n-Si (100) substrate using chemical bath deposition (CBD) technology. The Al and Au electrodes were deposited on the formed sample. Then this sample was exposed to the radiation of an external 90Sr/90Y source with an activity of 12.8 mCi. The experimental values obtained for the short circuit current (Isc), open circuit voltage (Voc), efficiency (η), and maximum output power (Pmax) were 0.047 μA, 0.015 V, 3.4 × 10−4 percent, and 0.141 nW, respectively. To compare with the experiment, we investigated the n-Si/ZnO betavoltaic cell by MCNP code. In the simulation, the beta spectrum of the 90Sr/90Y source was considered. The calculated theoretical values for Isc, Voc, η, and Pmax were 0.063 μA, 0.020 V, 6.4 × 10−4 percent, and 0.265 nW, respectively. The experimental results show that the simulation results can be valid. In the optimization of ZnO, SnO2, BN, and diamond homojunction betavoltaic cells in two planar and cubical models by MCNP code, it was found that the Isc, Voc, η, and Pmax of the cubical model are better compared to the planar model. In the cubical model, Pmax of ZnO, SnO2, BN, and diamond betavoltaic batteries is 2633.34 nW ± 0.16 %, 1670.49 nW ± 0.15 %, 198.20 nW ± 0.17 %, and 1315.24 nW ± 0.15 %, respectively. In other words, Pmax of the ZnO betavoltaic battery is about 58 %, 1229 %, and 100 % more than Pmax of SnO2, BN, and diamond betavoltaic batteries, respectively. Pmax of the SnO2 betavoltaic battery is about 743 % and 27 % more than Pmax of BN and diamond betavoltaic batteries, respectively. The results show that ZnO and SnO2 betavoltaic batteries can perform better compared to BN and diamond betavoltaic batteries. Also, their growth process is less expensive compared to BN and diamond.
如今,光伏电池因其能量密度高、寿命长,可用于在难以接近和恶劣的环境中运行电气系统而受到重视。传统的电化学电池尽管在电子设备中广泛使用,但寿命有限,而且在极端环境条件下容易退化。本文有三个目标。第一个目标是对基于 90Sr/90Y 源的正硅/氧化锌异质结光伏电池进行实验和理论研究。第二个目标是通过蒙特卡洛模拟(MCNP 代码)优化两个平面和立方体模型中的氧化锌、二氧化锡、BN 和金刚石同结光伏电池。第三个目标是提出一种估算光伏电池参数计算标准误差的新方法。为了制造正硅/氧化锌异质结,利用化学沉积(CBD)技术将氧化锌纳米球置于正硅(100)基板上。铝和金电极沉积在形成的样品上。然后将该样品暴露在活度为 12.8 mCi 的外部 90Sr/90Y 源辐射下。短路电流 (Isc)、开路电压 (Voc)、效率 (η) 和最大输出功率 (Pmax) 的实验值分别为 0.047 μA、0.015 V、3.4 × 10-4% 和 0.141 nW。为了与实验进行比较,我们用 MCNP 代码研究了 n-Si/ZnO 光伏电池。在模拟中,考虑了 90Sr/90Y 源的β谱。计算得出的 Isc、Voc、η 和 Pmax 理论值分别为 0.063 μA、0.020 V、6.4 × 10-4% 和 0.265 nW。实验结果表明,模拟结果是有效的。在利用 MCNP 代码优化 ZnO、SnO2、BN 和金刚石同结光伏电池的两种平面模型和立方体模型时,发现立方体模型的 Isc、Voc、η 和 Pmax 比平面模型更好。在立方体模型中,ZnO、SnO2、BN 和金刚石光伏电池的 Pmax 分别为 2633.34 nW ± 0.16 %、1670.49 nW ± 0.15 %、198.20 nW ± 0.17 % 和 1315.24 nW ± 0.15 %。换言之,氧化锌光伏电池的 Pmax 分别比二氧化锡、BN 和金刚石光伏电池的 Pmax 高出约 58 %、1229 % 和 100 %。二氧化锡光伏电池的 Pmax 分别比 BN 和金刚石光伏电池的 Pmax 高出约 743% 和 27%。结果表明,氧化锌和二氧化锡光伏电池的性能优于硼和金刚石光伏电池。此外,与 BN 和金刚石相比,它们的生长过程成本更低。
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引用次数: 0
Semiconductor WO3 thin films deposited by pulsed reactive magnetron sputtering 通过脉冲反应磁控溅射沉积的半导体 WO3 薄膜
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-02 DOI: 10.1016/j.mssp.2024.109034
A. Písaříková , H. Krýsová , A. Kapran , P. Písařík , M. Čada , J. Olejníček , R. Hippler , Z. Hubička
A pulsed reactive magnetron sputtering system with a tungsten target and a gas mixture of argon and oxygen was investigated as a source for the deposition of semiconductor WO3 thin films on soda lime glass substrates and on the glass with transparent conductive SnO2:F (FTO) electrode. The reactive sputtering process was performed in HiPIMS mode with low pulse repetition frequency fp ≈ 50–100 Hz and short pulse duration in HiPIMS discharge Ton = 100 μs. The second mode investigated was the mid-frequency (MF) magnetron discharge with pulse frequency fp = 40 kHz and pulse length Ton = 15 μs. The plasma parameters were investigated for both HiPIMS and MF modes using the planar RF probe operating at the frequency fprobe = 350 kHz and the grid QCM with biased collector electrode. Ion density ni and tail electron temperature (Te) were determined in both pulsed reactive magnetron sputtering discharge modes with time resolution. The maximum value ni ≈ 5 · 1017 m−3 was found in the reactive HiPIMS mode, and the maximum value ni ≈ 7 · 1016 m−3 was found in the reactive MF (40 kHz) mode. The degree of ionization of sputtered particles in reactive HiPIMS was determined for different values of (QO2) and was found to be in the range of ri ≈ 0.1–0.3. The deposition rate determined by QCM in reactive HiPIMS was practically independent on (QO2), but in the case of reactive MF, the measured deposition rate decreased significantly with increasing (QO2). The WO3 films deposited in both modes have a predominantly monoclinic crystal structure. The light and dark conductivity and the light/dark conductivity ratio (Ld) were measured under dark conditions and UV light illumination. At higher (QO2), the maximum value of Ld ≈ 300 was found for MF deposited WO3 and the maximum value of Ld ≈ 30 was found for HiPIMS deposited WO3. The photoelectrochemical measurement of WO3 deposited on FTO electrodes confirmed the n-type conductivity, and these films functioned as photoanodes in photoelectrochemical cells. MF deposited WO3 films systematically exhibited slightly higher photocurrents than HiPIMS deposited WO3. It was shown that these optimum photocurrents for HiPIMS and MF were found at QO2 ≈ 80 sccm and could not be improved by further increasing of (QO2).
研究了一种脉冲反应磁控溅射系统,该系统采用钨靶和氩氧混合气体作为源,用于在钠钙玻璃基片和带有透明导电 SnO2:F (FTO) 电极的玻璃上沉积半导体 WO3 薄膜。反应溅射过程在 HiPIMS 模式下进行,低脉冲重复频率 fp ≈ 50-100 Hz,HiPIMS 放电 Ton = 100 μs 脉冲持续时间短。研究的第二种模式是中频(MF)磁控管放电,脉冲频率 fp = 40 kHz,脉冲长度 Ton = 15 μs。利用频率为 fprobe = 350 kHz 的平面射频探头和带有偏置集电极的栅格 QCM,对 HiPIMS 和 MF 模式的等离子体参数进行了研究。两种脉冲反应磁控溅射放电模式下的离子密度 ni 和尾电子温度 (Te) 都是以时间分辨率测定的。在反应式 HiPIMS 模式下,最大值 ni ≈ 5 - 1017 m-3,而在反应式 MF(40 kHz)模式下,最大值 ni ≈ 7 - 1016 m-3。针对不同的 (QO2) 值,测定了反应式 HiPIMS 中溅射粒子的电离度,发现其范围为 ri ≈ 0.1-0.3。在反应式 HiPIMS 中,QCM 测定的沉积速率实际上与 (QO2) 无关,但在反应式 MF 中,随着 (QO2) 的增加,测得的沉积速率显著下降。在这两种模式下沉积的 WO3 薄膜主要具有单斜晶体结构。在黑暗条件和紫外光照射下测量了光导率、暗导率以及光/暗导率比 (Ld)。在较高(QO2)的条件下,发现 MF 沉积的 WO3 的最大值 Ld ≈ 300,而 HiPIMS 沉积的 WO3 的最大值 Ld ≈ 30。对沉积在 FTO 电极上的 WO3 进行的光电化学测量证实了其 n 型导电性,这些薄膜可用作光电化学电池中的光阳极。MF 沉积的 WO3 薄膜系统地显示出比 HiPIMS 沉积的 WO3 稍高的光电流。研究表明,HiPIMS 和 MF 的最佳光电流出现在 QO2 ≈ 80 sccm 时,并且不能通过进一步增加 (QO2) 来提高。
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引用次数: 0
Tuning of electrical properties and persistent photoconductivity of SnO2 thin films via La doping for optical memory applications 通过掺杂 La 调节 SnO2 薄膜的电学特性和持久光电导性以实现光存储应用
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-02 DOI: 10.1016/j.mssp.2024.109073
P. Asha Hind , Pawan Kumar , U.K. Goutam , B.V. Rajendra
This work explored the potential of utilizing Lanthanum doped tin oxide Sn1−xLaxO2 (x = 0.01 to 0.1) based Metal-Semiconductor-Metal Ohmic photoconductors for optical memory applications making use of the persistent photoconductivity (PPC) property. The structural, optical, and electrical properties of Sn1−xLaxO2 thin films deposited on glass substrates using the spray pyrolysis method, with a focus on the impact of lanthanum concentration on the photoresponse characteristics was investigated. Raman spectroscopy confirmed the presence of oxygen vacancies and nanometric grain size in the films along with the typical Raman active modes of tin oxide. The Sn4+ and La3+ oxidation states in Sn1−xLaxO2 as well as the contributions from lattice oxygen and oxygen vacancies were identified using XPS. Photoluminescence studies revealed emissions in the UV, violet, blue, and yellow regions, corresponding to tin interstitials, oxygen vacancies, and other defects, with intensity variations based on La concentration. All films exhibited n-type conductivity, with La content influencing both resistivity and carrier concentration. Photoconductivity measurements demonstrated enhanced photocurrent under UV illumination, with La doping affecting energy levels and defect states. The Sn0.90La0.10O2 film possessed a photocurrent retention of nearly 64 % within a span of 104 s, showing that higher concentration of La favoured the enhancement of retention of photocurrent for a comparatively longer duration. The significant persistent photoconductivity requires the conditions like optically active materials, a built-in electric field to separate electron-hole pairs, and defect states to trap carriers, which are all met by the prepared Sn1-xLaxO2 photoconductor with higher La doping levels, confirming the suitability of these films for practical use as optical non-volatile memory elements.
这项研究探索了基于金属半导体-金属欧姆光电导体的掺镧氧化锡 Sn1-xLaxO2(x = 0.01 至 0.1)在光存储应用中利用持久光电导(PPC)特性的潜力。研究人员采用喷雾热解方法研究了沉积在玻璃基底上的 Sn1-xLaxO2 薄膜的结构、光学和电学特性,重点研究了镧浓度对光响应特性的影响。拉曼光谱证实了薄膜中存在氧空位和纳米粒度,以及典型的氧化锡拉曼活性模式。利用 XPS 确定了 Sn1-xLaxO2 中的 Sn4+ 和 La3+ 氧化态,以及晶格氧和氧空位的贡献。光致发光研究揭示了紫外、紫光、蓝光和黄光区域的辐射,这些辐射与锡间隙、氧空位和其他缺陷相对应,其强度随 La 浓度的变化而变化。所有薄膜都表现出 n 型导电性,而 La 的含量会影响电阻率和载流子浓度。光导率测量结果表明,在紫外线照射下光电流增强,掺入 La 会影响能级和缺陷状态。在 104 秒的时间跨度内,Sn0.90La0.10O2 薄膜的光电流保持率接近 64%,这表明较高浓度的 La 有利于延长光电流的保持时间。显著的持续光电导能力需要光学活性材料、分离电子-空穴对的内置电场和捕获载流子的缺陷态等条件,而掺杂较高 La 的 Sn1-xLaxO2 光电导体均满足这些条件,这证实了这些薄膜适合作为光学非易失性存储器元件实际使用。
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引用次数: 0
Homoepitaxial growth of device-grade GaAs using low-pressure remote plasma CVD 利用低压远程等离子体化学气相沉积技术实现器件级砷化镓的同层外延生长
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-02 DOI: 10.1016/j.mssp.2024.109069
Lise Watrin , François Silva , Ludovic Largeau , Nathaniel Findling , Mirella Al Katrib , Muriel Bouttemy , Kassiogé Dembélé , Nicolas Vaissière , Cyril Jadaud , Pavel Bulkin , Jean-Charles Vanel , Erik V. Johnson , Karim Ouaras , Pere Roca i Cabarrocas
We have achieved the growth of high-quality, homoepitaxial 100 GaAs thin films at 0.5 mbar and 500 °C using a Remote Plasma Chemical Vapor Deposition (RP-CVD) reactor. With this process, we demonstrate a film growth rate up to 3 μm/h, comparable to the conventional MOCVD technique. The resulting films exhibit structural characteristics close to those of commercial GaAs wafers, with excellent crystalline quality as confirmed by SAED patterns and XRD rocking-curve measurements for the 004 peak with a FWHM of 0.004°. AFM measurements reveal a surface roughness of 0.2 nm, similar to that of a polished wafer. Analysis of the chemical composition – as determined through XPS surface and depth-profiled measurements – indicates that the film is homogeneous, with a constant III/V ratio of 1 throughout the whole layer, and has no detectable carbon or oxygen contamination. Additionally, the films demonstrate a sharp photoluminescence peak (FWHM of 55 meV), a p-type doping concentration of 1.1018 cm−3, and a hole mobility of 172 cm2 V⁻1.s⁻1. This work thus demonstrates a cost-effective growth method for III-V devices, enabled by the reduced gas consumption (only a few sccm, compared to tens of L/min in MOCVD) in RP-CVD operation at low pressure.
我们利用远程等离子体化学气相沉积(RP-CVD)反应器,在 0.5 毫巴和 500 °C条件下生长出了高质量的同外延 100 GaAs 薄膜。通过这一工艺,我们展示了高达 3 μm/h 的薄膜生长速度,与传统的 MOCVD 技术相当。所制备的薄膜具有接近商用砷化镓晶片的结构特征,SAED 图样和全宽为 0.004° 的 004 峰 XRD 摇摆曲线测量结果均证实了其优异的结晶质量。原子力显微镜测量显示其表面粗糙度为 0.2 纳米,与抛光晶片的粗糙度相似。通过 XPS 表面和深度剖面测量确定的化学成分分析表明,薄膜是均匀的,整个薄膜层的 III/V 比值恒定为 1,并且没有可检测到的碳或氧污染。此外,薄膜还显示出尖锐的光致发光峰(FWHM 为 55 meV),p 型掺杂浓度为 1.1018 cm-3,空穴迁移率为 172 cm2 V-1.s-1。因此,这项工作展示了一种经济高效的 III-V 器件生长方法,在低压下进行 RP-CVD 操作时,气体消耗量降低(仅为几毫微克,而 MOCVD 则为几十升/分钟)。
{"title":"Homoepitaxial growth of device-grade GaAs using low-pressure remote plasma CVD","authors":"Lise Watrin ,&nbsp;François Silva ,&nbsp;Ludovic Largeau ,&nbsp;Nathaniel Findling ,&nbsp;Mirella Al Katrib ,&nbsp;Muriel Bouttemy ,&nbsp;Kassiogé Dembélé ,&nbsp;Nicolas Vaissière ,&nbsp;Cyril Jadaud ,&nbsp;Pavel Bulkin ,&nbsp;Jean-Charles Vanel ,&nbsp;Erik V. Johnson ,&nbsp;Karim Ouaras ,&nbsp;Pere Roca i Cabarrocas","doi":"10.1016/j.mssp.2024.109069","DOIUrl":"10.1016/j.mssp.2024.109069","url":null,"abstract":"<div><div>We have achieved the growth of high-quality, homoepitaxial 100 GaAs thin films at 0.5 mbar and 500 °C using a Remote Plasma Chemical Vapor Deposition (RP-CVD) reactor. With this process, we demonstrate a film growth rate up to 3 μm/h, comparable to the conventional MOCVD technique. The resulting films exhibit structural characteristics close to those of commercial GaAs wafers, with excellent crystalline quality as confirmed by SAED patterns and XRD rocking-curve measurements for the 004 peak with a FWHM of 0.004°. AFM measurements reveal a surface roughness of 0.2 nm, similar to that of a polished wafer. Analysis of the chemical composition – as determined through XPS surface and depth-profiled measurements – indicates that the film is homogeneous, with a constant III/V ratio of 1 throughout the whole layer, and has no detectable carbon or oxygen contamination. Additionally, the films demonstrate a sharp photoluminescence peak (FWHM of 55 meV), a p-type doping concentration of 1.10<sup>18</sup> cm<sup>−3</sup>, and a hole mobility of 172 cm<sup>2</sup> V⁻<sup>1</sup>.s⁻<sup>1</sup>. This work thus demonstrates a cost-effective growth method for III-V devices, enabled by the reduced gas consumption (only a few sccm, compared to tens of L/min in MOCVD) in RP-CVD operation at low pressure.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"186 ","pages":"Article 109069"},"PeriodicalIF":4.2,"publicationDate":"2024-11-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142572414","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Novel Janus α-Au4XY (X/Y = S, Se, Te) monolayers with ultra-high carrier mobility: A first-principles study 具有超高载流子迁移率的新型 Janus α-Au4XY(X/Y = S、Se、Te)单层:第一原理研究
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-01 DOI: 10.1016/j.mssp.2024.109045
Nguyen V. Vinh , Le C. Nhan , Dang X. Du , Khang D. Pham
In this paper, we theoretically propose a series of Janus α-Au4XY (X/Y = S, Se, Te; X Y) monolayers and investigate their structural stability, electronic features, and transport properties based on first-principle calculations. It is indicated that Janus α-Au4XY monolayers have a structurally stable and can be synthesized experimentally. Janus α-Au4XY monolayers exhibit a low Young’s modulus and their mechanical features are slightly anisotropic. At the ground state, Janus α-Au4XY monolayers possess semiconducting characteristics with very steep band dispersions near the conduction band minimum, which is expected to ultra-high electron mobility. The electronic features of Janus α-Au4XY are highly sensitive to the biaxial strains ɛxy, particularly the applied compressive biaxial strains. Interestingly, the transitions from the semiconductor to the metal phases are observed in all three configurations of α-Au4XY at ɛxy=6%. Janus α-Au4XY monolayers exhibit superior transport characteristics with the electron mobility reaching up to 3.20×105 cm2V−1s−1 (α-Au4SSe monolayer). Our findings not only explore the outstanding electronic and transport features of Janus α-Au4XY nanostructures but also indicate their potential applications in nanoelectronics and nanoelectromechanical devices.
本文从理论上提出了一系列 Janus α-Au4XY(X/Y = S、Se、Te;X≠Y)单层,并基于第一性原理计算研究了它们的结构稳定性、电子特征和输运性质。结果表明,Janus α-Au4XY 单层具有稳定的结构,可以通过实验合成。Janus α-Au4XY 单层具有较低的杨氏模量,其力学特征具有轻微的各向异性。在基态,Janus α-Au4XY 单层具有半导体特性,在导带最小值附近具有非常陡峭的带散布,这有望带来超高的电子迁移率。Janus α-Au4XY 的电子特性对双轴应变ɛxy 高度敏感,尤其是施加的压缩双轴应变。有趣的是,在ɛxy=-6% 时,α-Au4XY 的三种构型都能观察到从半导体相到金属相的转变。Janus α-Au4XY 单层表现出卓越的传输特性,电子迁移率高达 3.20×105 cm2V-1s-1(α-Au4SSe 单层)。我们的研究结果不仅探索了 Janus α-Au4XY 纳米结构出色的电子和传输特性,还表明了它们在纳米电子学和纳米机电设备中的潜在应用。
{"title":"Novel Janus α-Au4XY (X/Y = S, Se, Te) monolayers with ultra-high carrier mobility: A first-principles study","authors":"Nguyen V. Vinh ,&nbsp;Le C. Nhan ,&nbsp;Dang X. Du ,&nbsp;Khang D. Pham","doi":"10.1016/j.mssp.2024.109045","DOIUrl":"10.1016/j.mssp.2024.109045","url":null,"abstract":"<div><div>In this paper, we theoretically propose a series of Janus <span><math><mi>α</mi></math></span>-Au<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span>XY (X/Y = S, Se, Te; X <span><math><mo>≠</mo></math></span> Y) monolayers and investigate their structural stability, electronic features, and transport properties based on first-principle calculations. It is indicated that Janus <span><math><mi>α</mi></math></span>-Au<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span>XY monolayers have a structurally stable and can be synthesized experimentally. Janus <span><math><mi>α</mi></math></span>-Au<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span>XY monolayers exhibit a low Young’s modulus and their mechanical features are slightly anisotropic. At the ground state, Janus <span><math><mi>α</mi></math></span>-Au<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span>XY monolayers possess semiconducting characteristics with very steep band dispersions near the conduction band minimum, which is expected to ultra-high electron mobility. The electronic features of Janus <span><math><mi>α</mi></math></span>-Au<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span>XY are highly sensitive to the biaxial strains <span><math><msub><mrow><mi>ɛ</mi></mrow><mrow><mi>x</mi><mi>y</mi></mrow></msub></math></span>, particularly the applied compressive biaxial strains. Interestingly, the transitions from the semiconductor to the metal phases are observed in all three configurations of <span><math><mi>α</mi></math></span>-Au<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span>XY at <span><math><mrow><msub><mrow><mi>ɛ</mi></mrow><mrow><mi>x</mi><mi>y</mi></mrow></msub><mo>=</mo><mo>−</mo><mn>6</mn><mtext>%</mtext></mrow></math></span>. Janus <span><math><mi>α</mi></math></span>-Au<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span>XY monolayers exhibit superior transport characteristics with the electron mobility reaching up to <span><math><mrow><mn>3</mn><mo>.</mo><mn>20</mn><mo>×</mo><mn>1</mn><msup><mrow><mn>0</mn></mrow><mrow><mn>5</mn></mrow></msup></mrow></math></span> cm<span><math><msup><mrow></mrow><mrow><mn>2</mn></mrow></msup></math></span>V<sup>−1</sup>s<sup>−1</sup> (<span><math><mi>α</mi></math></span>-Au<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span>SSe monolayer). Our findings not only explore the outstanding electronic and transport features of Janus <span><math><mi>α</mi></math></span>-Au<span><math><msub><mrow></mrow><mrow><mn>4</mn></mrow></msub></math></span>XY nanostructures but also indicate their potential applications in nanoelectronics and nanoelectromechanical devices.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"186 ","pages":"Article 109045"},"PeriodicalIF":4.2,"publicationDate":"2024-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142572410","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Challenges and solutions in Mist-CVD of Ga2O3 heteroepitaxial films Ga2O3 异质外延薄膜的雾化-气相沉积过程中的挑战和解决方案
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-31 DOI: 10.1016/j.mssp.2024.109063
A.V. Vasin , R. Yatskiv , O. Černohorský , N. Bašinová , J. Grym , A. Korchovyi , A.N. Nazarov , J. Maixner
Mist chemical vapor deposition (mist-CVD) has recently attracted interest as a facile, cost-effective, environmentally friendly method for the deposition of Ga2O3 films. This paper addresses selected challenges and issues that hinder the fabrication of high-quality Ga2O3 epitaxial films. Based on numerical simulations of the gas flow we show that the use of a fan, introducing atmospheric air into the horizontal growth reactor, avoids the formation of vortices and mist velocity fluctuations, which develop when a conventional carrier gas delivery system is employed. We also demonstrate that the presence of organic ligands in Ga acetylacetonate results in undesirable contamination of Ga2O3 films by pyrolytic carbon, which strongly affects the optical and morphological properties and can lead to incorrect estimation of the optical band gap. Carbon contamination is shown to be reduced by increasing the growth temperature, by growing under oxygen-rich conditions, or by using carbon-free precursors such as GaCl3. We further experimentally prove that when the thickness of Ga2O3 increases, a multiphase epitaxial film forms, presumably due to enhanced thermal stress. Finally, we experimentally show that nonstoichiometric GaOxClyHz microparticles form on top of a Ga2O3 film in the reactor zone, where the aerosol is completely evaporated and a vapor ambient is formed.
雾状化学气相沉积(mist-CVD)作为一种简便、经济、环保的 Ga2O3 薄膜沉积方法,最近引起了人们的兴趣。本文探讨了阻碍制造高质量 Ga2O3 外延薄膜的一些挑战和问题。根据气流的数值模拟,我们发现使用风扇将大气中的空气引入水平生长反应器,可避免形成涡流和雾状速度波动,而在使用传统载气输送系统时会出现这种情况。我们还证明,乙酰丙酮酸镓中有机配位体的存在会导致热解碳对 Ga2O3 薄膜造成不良污染,从而严重影响光学和形态特性,并可能导致对光带隙的错误估计。事实证明,通过提高生长温度、在富氧条件下生长或使用无碳前驱体(如 GaCl3),可以减少碳污染。我们进一步通过实验证明,当 Ga2O3 的厚度增加时,会形成多相外延薄膜,这可能是由于热应力增强所致。最后,我们通过实验证明,在反应器区的 Ga2O3 薄膜顶部会形成非全度的 GaOxClyHz 微颗粒,气溶胶会完全蒸发并形成蒸汽环境。
{"title":"Challenges and solutions in Mist-CVD of Ga2O3 heteroepitaxial films","authors":"A.V. Vasin ,&nbsp;R. Yatskiv ,&nbsp;O. Černohorský ,&nbsp;N. Bašinová ,&nbsp;J. Grym ,&nbsp;A. Korchovyi ,&nbsp;A.N. Nazarov ,&nbsp;J. Maixner","doi":"10.1016/j.mssp.2024.109063","DOIUrl":"10.1016/j.mssp.2024.109063","url":null,"abstract":"<div><div>Mist chemical vapor deposition (mist-CVD) has recently attracted interest as a facile, cost-effective, environmentally friendly method for the deposition of Ga<sub>2</sub>O<sub>3</sub> films. This paper addresses selected challenges and issues that hinder the fabrication of high-quality Ga<sub>2</sub>O<sub>3</sub> epitaxial films. Based on numerical simulations of the gas flow we show that the use of a fan, introducing atmospheric air into the horizontal growth reactor, avoids the formation of vortices and mist velocity fluctuations, which develop when a conventional carrier gas delivery system is employed. We also demonstrate that the presence of organic ligands in Ga acetylacetonate results in undesirable contamination of Ga<sub>2</sub>O<sub>3</sub> films by pyrolytic carbon, which strongly affects the optical and morphological properties and can lead to incorrect estimation of the optical band gap. Carbon contamination is shown to be reduced by increasing the growth temperature, by growing under oxygen-rich conditions, or by using carbon-free precursors such as GaCl<sub>3</sub>. We further experimentally prove that when the thickness of Ga<sub>2</sub>O<sub>3</sub> increases, a multiphase epitaxial film forms, presumably due to enhanced thermal stress. Finally, we experimentally show that nonstoichiometric GaO<sub>x</sub>Cl<sub>y</sub>H<sub>z</sub> microparticles form on top of a Ga<sub>2</sub>O<sub>3</sub> film in the reactor zone, where the aerosol is completely evaporated and a vapor ambient is formed.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"186 ","pages":"Article 109063"},"PeriodicalIF":4.2,"publicationDate":"2024-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142561345","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Synergistic effect of 3D porous tri-metallic MOF based electrode materials for highly stable asymmetric supercapacitors 基于三维多孔三金属 MOF 的电极材料对高稳定性不对称超级电容器的协同效应
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-31 DOI: 10.1016/j.mssp.2024.109036
Hassan Shabbir , Hafiz Muhammad Fahad , Rehana Sharif , Annam Butt , Sehar Fatima , Fozia Shaheen , Rajan Jose , Rizwan Wahab , Veeradasan Perumal , Samina Akbar , Sulaiman Al-Sulaimi , Jin Yang
Metal-organic frameworks (MOFs) have captured huge consideration owing to their high porosity structure and large surface area for their utilization in supercapacitors. The synthesis parameters play a vital role in the morphological and structural features of MOFs. Herein, a trimetallic metal-organic framework with the morphology of flower-based hierarchical microspheres has been synthesized by solvothermal method with optimization of the reaction duration. The hierarchical structure with connected nanosheets can provide more electroactive sites that lead to exceptional electrochemical performance. NiCoMn-MOF prepared with a reaction time of 48 h (MOF-48) delivers the specific capacitance of 1905 F/g (1 A/g) with rate capability of 71.52 % (10 A/g). Furthermore, MOF-48||Act-C asymmetric supercapacitor displays a remarkable capacitance of 226 F/g (1 A/g) and keeps 97 % of initial capacitance after 15000 continuous cycles. This asymmetric device has a power density of 6945.4 W/kg (10 A/g) and an energy density of 61.52 Wh/kg (1 A/g). Therefore, this study offers an effective technique to improve the electrochemical effectiveness of MOF-based electrodes for high-performance supercapacitors.
金属有机框架(MOFs)因其高孔隙率结构和大表面积在超级电容器中的应用而备受关注。合成参数对 MOFs 的形态和结构特征起着至关重要的作用。本文通过溶热法合成了一种具有花型分层微球形态的三金属金属有机框架,并优化了反应时间。具有连接纳米片的分层结构可以提供更多的电活性位点,从而实现优异的电化学性能。反应时间为 48 小时的镍钴锰-MOF(MOF-48)的比电容为 1905 F/g(1 A/g),速率能力为 71.52 %(10 A/g)。此外,MOF-48||Act-C 不对称超级电容器显示出 226 F/g (1 A/g) 的显著电容,并在连续循环 15000 次后保持 97 % 的初始电容。这种非对称器件的功率密度为 6945.4 W/kg(10 A/g),能量密度为 61.52 Wh/kg(1 A/g)。因此,这项研究为提高基于 MOF 的电极在高性能超级电容器中的电化学效果提供了一种有效的技术。
{"title":"Synergistic effect of 3D porous tri-metallic MOF based electrode materials for highly stable asymmetric supercapacitors","authors":"Hassan Shabbir ,&nbsp;Hafiz Muhammad Fahad ,&nbsp;Rehana Sharif ,&nbsp;Annam Butt ,&nbsp;Sehar Fatima ,&nbsp;Fozia Shaheen ,&nbsp;Rajan Jose ,&nbsp;Rizwan Wahab ,&nbsp;Veeradasan Perumal ,&nbsp;Samina Akbar ,&nbsp;Sulaiman Al-Sulaimi ,&nbsp;Jin Yang","doi":"10.1016/j.mssp.2024.109036","DOIUrl":"10.1016/j.mssp.2024.109036","url":null,"abstract":"<div><div>Metal-organic frameworks (MOFs) have captured huge consideration owing to their high porosity structure and large surface area for their utilization in supercapacitors. The synthesis parameters play a vital role in the morphological and structural features of MOFs. Herein, a trimetallic metal-organic framework with the morphology of flower-based hierarchical microspheres has been synthesized by solvothermal method with optimization of the reaction duration. The hierarchical structure with connected nanosheets can provide more electroactive sites that lead to exceptional electrochemical performance. NiCoMn-MOF prepared with a reaction time of 48 h (MOF-48) delivers the specific capacitance of 1905 F/g (1 A/g) with rate capability of 71.52 % (10 A/g). Furthermore, MOF-48||Act-C asymmetric supercapacitor displays a remarkable capacitance of 226 F/g (1 A/g) and keeps 97 % of initial capacitance after 15000 continuous cycles. This asymmetric device has a power density of 6945.4 W/kg (10 A/g) and an energy density of 61.52 Wh/kg (1 A/g). Therefore, this study offers an effective technique to improve the electrochemical effectiveness of MOF-based electrodes for high-performance supercapacitors.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"186 ","pages":"Article 109036"},"PeriodicalIF":4.2,"publicationDate":"2024-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142561344","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Processing of gallium oxide crystals using liquid-immersion wire-cut electrical discharge machining 利用液态浸入式线切割放电加工技术加工氧化镓晶体
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-31 DOI: 10.1016/j.mssp.2024.109049
Zhang Yimiao , Qiu Mingbo , Li Hui , Wang Yingmin , Li Jingtao , Liu Zhaowei , Di Yifan , Cheng Hongjuan
To address the issues of cracking and cleavage commonly encountered during conventional mechanical processing of gallium oxide (Ga2O3) crystals using several methods, such as outer circle cutting and diamond wire sawing, this study proposed a liquid-immersion wire-cut electrical discharge machining (WEDM) technique. This study also revealed that the segregation phenomena during the growth of Ga2O3 crystals resulted in non-uniform resistivity within the crystal, leading to the failure of traditional spray-type electro-discharge wire-cutting techniques. To overcome this limitation, the feasibility of the liquid-immersion WEDM technique was proposed, and an experimental platform was established. Resistivity measurements of the cut surfaces of Ga2O3 in kerosene immersion revealed a reduction of approximately 99.2 % in the resistivity difference. This result shows that the formation of carbon films during processing can effectively compensate for the intrinsic non-uniform resistivity. An equivalent circuit model for liquid-immersion WEDM of Ga2O3 crystals in kerosene was developed. Thermodynamic and kinetic analyses were conducted on hydrocarbon decomposition reactions in kerosene at discharge temperatures. The results confirmed that decomposition reactions could occur during the discharge process. A truncation experiment for Ga2O3 ingots was conducted, and a method using single-crystal silicon for electrical assistance in the processing of 1-inch wafers was proposed. The experimental results showed that liquid-immersion WEDM of Ga2O3 crystals in kerosene effectively suppressed cracking and cleavage, achieving a processing accuracy within 50 μm and successfully producing a 1-inch circular Ga2O3 wafer, with the machining accuracy improved by approximately 66.6 % compared to diamond wire cutting.
为了解决传统机械加工氧化镓(Ga2O3)晶体过程中常见的开裂和劈裂问题,本研究提出了一种液态浸入式线切割放电加工(WEDM)技术。该研究还发现,Ga2O3 晶体生长过程中的偏析现象会导致晶体内部电阻率不均匀,从而导致传统的喷射式放电线切割技术失效。为了克服这一局限性,研究人员提出了液体浸入式线切割技术的可行性,并建立了实验平台。在煤油浸泡下对 Ga2O3 切割表面进行的电阻率测量显示,电阻率差值减少了约 99.2%。这一结果表明,在加工过程中形成的碳膜可以有效补偿固有的非均匀电阻率。为煤油中 Ga2O3 晶体的液浸 WEDM 建立了等效电路模型。对煤油中碳氢化合物在放电温度下的分解反应进行了热力学和动力学分析。结果证实,在放电过程中可能会发生分解反应。对 Ga2O3 硅锭进行了截断实验,并提出了在加工 1 英寸硅片时使用单晶硅进行电辅助的方法。实验结果表明,在煤油中对 Ga2O3 晶体进行液浸线切割能有效抑制开裂和劈裂,加工精度在 50 μm 以内,并成功生产出 1 英寸圆形 Ga2O3 硅片,加工精度比金刚石线切割提高了约 66.6%。
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引用次数: 0
Green fabrication of aniline over mesoporous NiS/YVO4 S-type heterostructure photocatalyst under visible light exposure 介孔 NiS/YVO4 S 型异质结构光催化剂在可见光照射下绿色制备苯胺
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-30 DOI: 10.1016/j.mssp.2024.109064
Soad Z. Alsheheri , Tamer M. Khedr
The photocatalytic hydrogenation of hazardous nitrobenzene (NTB) can efficiently and safely yield aniline (AN), which holds considerable economic significance. The systematic development of superb visible light-proceeded photocatalytic substances that effectively harness the sun spectrum is crucial. In this contribution, mesoporous YVO4 nanostructured crystals were first assembled employing block copolymer-aided sol-gel protocol and then coupled with NiS nanoparticles (NPs) (4.0–16.0 wt%) through ultrasonic self-growth and calcination to design mesoporous step-type (S-type) NiS/YVO4 (N/Y) heterostructure photocatalysts. A detailed characterization substantiated powerful interface interaction and effective S-type charge transmission in the designed heterostructured materials. Moreover, optical and photoelectrochemical experiments unveiled superb light harvesting and improved charge separation efficiencies. Thanking the building of the S-type heterostructure, the N/Y heterostructure materials recorded notable photocatalytic proficiency than pristine YVO4. Specifically, under exposure to visible light for 50 min, the optimal material (12.0 % N/Y) at the best dosage (2.4 g/L) achieved 100 % selective phototransformation of NTB into AN with a rate constant (K) of 0.0696 min−1, superior to pristine YVO4 (0.0015 min−1) by a factor of 46.4. The 12.0 % N/Y heterostructure also indicated superb cyclic stability, mostly retaining its remarkable efficacy over five consecutive runs. The positive influence of the catalyst content on the NTB photoreduction on 12.0 % N/Y was examined and affirmed by the catalyst dosage alteration. Additionally, based on Mott-Schottky (M − S) measurements, the pathway of charge migration for 12.0 % N/Y heterostructure was suggested. The current contribution offers estimable insights into developing highly effective and stable photocatalytic substances.
对危险的硝基苯(NTB)进行光催化加氢可以高效、安全地生成苯胺(AN),而苯胺具有相当大的经济意义。系统开发能有效利用太阳光谱的超强可见光光催化物质至关重要。本文首先采用嵌段共聚物辅助溶胶-凝胶协议组装了介孔 YVO4 纳米结构晶体,然后通过超声波自生长和煅烧与 NiS 纳米颗粒(4.0-16.0 wt%)结合,设计出介孔阶梯型(S 型)NiS/YVO4(N/Y)异质结构光催化剂。详细的表征证实了所设计的异质结构材料具有强大的界面相互作用和有效的 S 型电荷传输。此外,光学和光电化学实验还揭示了卓越的光收集能力和更高的电荷分离效率。得益于 S 型异质结构的构建,N/Y 异质结构材料的光催化性能明显优于原始 YVO4。具体来说,在可见光照射 50 分钟的条件下,最佳材料(12.0 % N/Y)的最佳用量(2.4 g/L)实现了将 NTB 100 % 选择性光转化为 AN,速率常数(K)为 0.0696 min-1,比原始 YVO4(0.0015 min-1)高出 46.4 倍。12.0 % N/Y 异质结构还显示出极佳的循环稳定性,在连续五次运行中大部分时间都保持了显著的功效。催化剂含量对 12.0 % N/Y 的 NTB 光还原有积极影响,催化剂用量的改变证实了这一点。此外,根据莫特-肖特基(M - S)测量结果,提出了 12.0% N/Y 异质结构的电荷迁移途径。目前的研究成果为开发高效、稳定的光催化物质提供了可贵的启示。
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引用次数: 0
Photoassisted decoration of Ag nanoparticles onto TiO2 nanorod arrays for continuously reusable ultrasensitive SERS sensors 在二氧化钛纳米棒阵列上光辅助装饰银纳米粒子,以制造可连续重复使用的超灵敏 SERS 传感器
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-30 DOI: 10.1016/j.mssp.2024.109057
Ton Nu Quynh Trang , Nguyen Tran Gia Bao , Vu Thi Hanh Thu
Herein, a hybrid nanoarray-based surface-enhanced Raman scattering (SERS) sensor was developed to obtain dual functionalities of SERS signal amplification and photocatalytic reusability for detecting trace organic pollutants and antibiotic residues in environmental water. The plasmonic metal was created by controlling the formation of Ag nanoparticles (NPs), which were uniformly anchored within rutile TiO2 nanoarrays (r-TNRs) to form the Ag@r-TNRs platform. The SERS performance of the Ag@r-TNRs platform was obtained by optimizing photo-induced reduction strategy. Crystal violet (CV) and chloramphenicol (CAP) were chosen to assess the SERS behavior of the Ag@r-TNRs platform. The high sensitivity for detecting trace amounts of target molecules of Ag@r-TNRs hybrid nanostructure experienced both local electromagnetic mechanism (EM) and efficient charge transfer (CT). The prepared substrates exhibited ultralow detection (10−12 M for CV and 10−11 M for CAP) and high enhancement factors (EF) in the order of 4.9 × 109 and 5.6 × 108 for CV and CAP, respectively. Furthermore, duplex detection of dyes (CV and CAP) was successfully accomplished using Ag@r-TNRs to estimate SERS applications. Thanks to the excellent photocatalytic properties of TiO2, the layered structures possessed steady and effective ultraviolet (UV) cleaning performance. After UV irradiation for 40 min, 99 % of the CV were completely decomposed at a UV illumination. This SERS substrate can be reused for many times with a determined recovery rate of 93 %. Accordingly, the bifunctional Ag@r-TNRs substrate shows great potential for SERS analysis and photocatalytic performance in water environmental remediation.
本文开发了一种基于混合纳米阵列的表面增强拉曼散射(SERS)传感器,以获得 SERS 信号放大和光催化重复使用的双重功能,用于检测环境水体中的痕量有机污染物和抗生素残留。质子金属是通过控制银纳米粒子(NPs)的形成而产生的,它们被均匀地锚定在金红石型二氧化钛纳米阵列(r-TNRs)中,形成 Ag@r-TNRs 平台。通过优化光诱导还原策略,获得了 Ag@r-TNRs 平台的 SERS 性能。选择结晶紫(CV)和氯霉素(CAP)来评估 Ag@r-TNRs 平台的 SERS 性能。Ag@r-TNRs 混合纳米结构对痕量目标分子的高灵敏度检测同时经历了局部电磁机制(EM)和高效电荷转移(CT)。所制备的基底具有超低的检测量(CV 为 10-12 M,CAP 为 10-11 M)和较高的增强因子(EF),CV 和 CAP 的增强因子分别为 4.9 × 109 和 5.6 × 108。此外,利用 Ag@r-TNRs 成功实现了染料(CV 和 CAP)的双重检测,从而估计了 SERS 的应用。得益于 TiO2 卓越的光催化特性,层状结构具有稳定有效的紫外线(UV)清洁性能。紫外线照射 40 分钟后,99% 的 CV 在紫外线照射下完全分解。这种 SERS 基底可以多次重复使用,经测定回收率为 93%。因此,双功能 Ag@r-TNRs 基质在水环境修复的 SERS 分析和光催化性能方面显示出巨大的潜力。
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引用次数: 0
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Materials Science in Semiconductor Processing
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