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Enhanced second harmonic generation from single spherical mesoporous Si/SiO2 nanoparticles on gold 单球形介孔Si/SiO2纳米颗粒在金表面增强二次谐波产生
IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-06 DOI: 10.1016/j.mssp.2025.110328
A.S. Funtikova , V.A. Sharov , L.N. Dvoretckaia , K.N. Novikova , D.A. Eurov , E. Yu Stovpiaga , D.A. Kurdyukov , A.V. Aybush , A.V. Koroleva , E.V. Zhizhin , V.V. Fedorov , D.V. Miniv , A.M. Mozharov , I.S. Mukhin
Si-based nanomaterials are a promising platform for nonlinear optics due to the central crystal symmetry breaking at the nanoscale. In this work, we studied the second harmonic generation (SHG) in spherical mesoporous nanocrystalline Si/SiO2 nanoparticles deposited on a gold substrate, combining experimental measurements and numerical simulations. The performed theoretical analysis showed that SHG signal related to Si crystallites is dominant in nonlinear response from Si/SiO2 nanoparticles. Our investigation revealed that Mie resonances in the mesoporous nanoparticles and their interaction with the gold substrate influence SHG efficiency. Moreover we observed additional enhancing of SHG efficiency at specific wavelengths, caused by constructive interference between resonances of the different orders. Experimentally measured SHG spectra for mesoporous nanoparticles matched well with results of our calculations. These findings demonstrate the potential of mesoporous nanocrystalline Si/SiO2 nanoparticles as efficient tunable frequency converters for nonlinear optical applications.
硅基纳米材料由于其中心晶体在纳米尺度上的对称性破坏而成为非线性光学研究的一个很有前途的平台。本文采用实验测量和数值模拟相结合的方法,研究了沉积在金衬底上的球形介孔纳米晶Si/SiO2纳米颗粒的二次谐波产生(SHG)。理论分析表明,在Si/SiO2纳米颗粒的非线性响应中,与Si晶相关的SHG信号占主导地位。我们的研究表明,介孔纳米颗粒中的Mie共振及其与金衬底的相互作用影响了SHG效率。此外,我们还观察到在特定波长下,由于不同阶共振之间的建设性干涉,SHG效率得到了额外的提高。实验测量的介孔纳米颗粒的SHG光谱与我们的计算结果吻合得很好。这些发现证明了介孔纳米晶Si/SiO2纳米颗粒作为非线性光学应用的有效可调谐频率转换器的潜力。
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引用次数: 0
Three-dimensional ordered mesoporous MoO3 nanomaterials for hydrogen sulfide detection 三维有序介孔MoO3纳米材料用于硫化氢检测
IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-06 DOI: 10.1016/j.mssp.2025.110326
Kai Li , Haohua Li , Guozhi Yan , Canping Fan , Shahid Hussain , Mohammed Mujahid Alam , Mohamed Hussien , Nikita Morozov , Rajesh Kumar Manavalan , Guanjun Qiao , Guiwu Liu
The highly sensitive and selective detection of hydrogen sulfide (H2S) remains critical in gas sensing. Addressing this need, we report the fabrication of a high-performance semiconductor gas sensor based on ordered mesoporous MoO3 for trace H2S detection. The sensor was synthesized via a nanocasting approach using mesoporous KIT-6 as a hard template, whereby the ordered mesoporous architecture imparts unique physicochemical properties to MoO3, establishing a robust foundation for efficient gas-sensing performance. The H2S-sensing performance of the mesoporous MoO3 sensor was systematically evaluated, and its sensing mechanism was deeply analyzed. Experimental results demonstrate that the sensor exhibits excellent sensing responses, capable of detecting as low as 10 ppm of H2S with high selectivity toward H2S, effectively excluding interference from other gases. The synergistic effect of the high specific surface area and ordered mesoporous structure significantly enhances the adsorption capacity and reaction activity of the sensor toward H2S, thereby greatly improving its sensing performance. Collectively, the ordered mesoporous MoO3 sensor reported herein showcases exceptional performance for trace H2S detection, positioning it as a promising and reliable material for practical applications in environmental monitoring, industrial safety, and beyond. This work paves the way for the development of next-generation metal oxide-based gas sensors with enhanced sensitivity and selectivity.
高灵敏度和选择性的硫化氢(H2S)检测仍然是气体传感的关键。为了满足这一需求,我们报道了一种基于有序介孔MoO3的高性能半导体气体传感器的制造,用于痕量H2S检测。该传感器以介孔KIT-6为硬模板,采用纳米铸造方法合成,有序的介孔结构赋予MoO3独特的物理化学性质,为实现高效的气敏性能奠定了坚实的基础。系统评价了介孔MoO3传感器的h2s传感性能,并深入分析了其传感机理。实验结果表明,该传感器具有优异的传感响应,能够检测低至10 ppm的H2S,对H2S具有高选择性,有效地排除了其他气体的干扰。高比表面积和有序介孔结构的协同作用显著增强了传感器对H2S的吸附能力和反应活性,从而大大提高了传感器的传感性能。总之,本文报道的有序介孔MoO3传感器在痕量H2S检测方面表现出卓越的性能,将其定位为环境监测、工业安全等实际应用中有前途和可靠的材料。这项工作为开发具有更高灵敏度和选择性的下一代金属氧化物气体传感器铺平了道路。
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引用次数: 0
Visible-near-infrared reflectance spectra of Cr2O3-based biomimetic leaves: A combined spectroscopic ellipsometry and first-principles study 基于cr2o3的仿生叶片的可见-近红外反射光谱:一个结合光谱椭偏和第一性原理的研究
IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-05 DOI: 10.1016/j.mssp.2025.110325
Meng Zhao , Tianbao Zhao , Tao Cheng , Zihan Su , Jiayi Zheng , Zhiming Liu , Linhua Liu , Jia-Yue Yang
The quest for biomimetic materials that emulate the solar spectral response of green plants has garnered substantial attention. Herein, we combined density-functional theory with on-site Coulomb corrections and spectroscopic ellipsometry to obtain the complex dielectric functions of chromium oxide (Cr2O3) pigment and polyurethane (PU) binder, respectively. Based on the Lorenz-Mie scattering theory and two-flux method considering anisotropic scattering, we systematically studied the regulatory mechanism of particle structural parameters on the reflectance spectrum of the biomimetic coating. The results show that optimizing the structural parameters of Cr2O3 particles reproduces the canonical vegetation features in the visible-near-infrared region. Coating reflectance decreases monotonically with both increasing particle volume fraction and larger mean radius. Additionally, the slope of red edge can be independently tuned by the particle size distribution, i.e. a larger proportion of small particles steepens the red-edge slope. This study provides a theoretical basis and data support for further optimizing the similarity between biomimetic coatings and natural vegetation in terms of their hyperspectral images in the visible-near infrared spectral range.
对模仿绿色植物的太阳光谱响应的仿生材料的追求已经引起了广泛的关注。本文将密度泛函理论与现场库仑修正和光谱椭偏相结合,分别得到了氧化铬(Cr2O3)颜料和聚氨酯(PU)粘结剂的复介电函数。基于Lorenz-Mie散射理论和考虑各向异性散射的双通量方法,系统研究了颗粒结构参数对仿生涂层反射光谱的调节机理。结果表明,优化Cr2O3颗粒的结构参数,在可见-近红外区域内再现了典型的植被特征。随着颗粒体积分数的增加和平均半径的增大,涂层反射率单调降低。此外,红边斜率可以由粒径分布独立调节,即小颗粒比例越大,红边斜率越陡。本研究为进一步优化仿生涂层在可见光-近红外光谱范围内的高光谱图像与天然植被的相似性提供了理论基础和数据支持。
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引用次数: 0
Fabrication of full preferentially oriented intermetallic compound interconnects using (111) nanotwinned Cu under bump metallization 凹凸金属化下(111)纳米孪晶Cu制备全优先取向金属间化合物互连
IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-04 DOI: 10.1016/j.mssp.2025.110324
S.N. Zhang , J. Ren , Y. Wu , M.L. Huang
Full textured η-Cu6Sn5 intermetallic compound (IMC) interconnects exhibiting a (11 2 0) preferred orientation were rapidly fabricated using the Current Direct Bonding (CDB) method with (111)-oriented nanotwinned Cu (nt-Cu) serving as the under bump metallization (UBM). Synchrotron radiography in situ revealed the nucleation and growth kinetics of η-Cu6Sn5 IMC grains. During the initial wetting stage, the (111) nt-Cu substrate functioned as a templating seed layer, promoting the heterogeneous nucleation of roof-type η-Cu6Sn5 grains with (11 2 0) orientation. Subsequent application of current stressing (1.0 × 104 A/cm2, 300 ± 5 °C), provided an additional energy influx that sustained the preferred orientation and accelerated the growth of (11 2 0)-textured η-Cu6Sn5 grains. The resulting full textured IMC interconnects with (11 2 0) orientation exhibited an average shear strength of 58.4 MPa. This study demonstrated a scalable approach for the rapid fabrication of high-melting-point, highly-textured η-Cu6Sn5 IMC interconnects utilizing cost-effective nt-Cu UBM, thereby supporting advances in 3D packaging technology.
采用电流直接键合(CDB)方法,以(111)取向纳米孪晶Cu (nt-Cu)作为碰撞下金属化(UBM),快速制备了具有(11 2 - 0)优先取向的全织构η-Cu6Sn5金属间化合物(IMC)互连。同步射线照相原位显示了η-Cu6Sn5 IMC晶粒的形核和生长动力学。在初始润湿阶段,(111)nt-Cu衬底起到模板种子层的作用,促进了(11 2 - 0)取向的顶型η-Cu6Sn5晶粒的非均匀形核。随后施加电流应力(1.0 × 104 A/cm2, 300±5°C),提供了额外的能量流入,维持了首选取向,并加速了(11 2)- 0形式的η-Cu6Sn5晶粒的生长。所得到的具有(11 2 - 0)方向的全纹理IMC互连的平均抗剪强度为58.4 MPa。该研究展示了一种可扩展的方法,可以利用具有成本效益的nt-Cu UBM快速制造高熔点,高度织构的η-Cu6Sn5 IMC互连,从而支持3D封装技术的进步。
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引用次数: 0
A study on the evolution of sawing force and bow angle in diamond wire sawing of sapphire 蓝宝石金刚石线锯过程中锯切力及弓角的演化研究
IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-04 DOI: 10.1016/j.mssp.2025.110312
Pengcheng Jiang, Mengran Ge, Quanjing Wang, Ru Zhang, Yao Liu, Zhidong Liu
Sapphire is widely utilized in the semiconductor market. Owing to its extremely high hardness, fixed-abrasive diamond wire saws have currently become the primary method for cutting sapphire and other brittle-hard materials. However, the dynamic evolution laws of sawing force and bow angle during the cutting process remain unclear, and there is a lack of systematic analysis on the bow angle in the machining of cylindrical sapphire workpieces. This issue directly affects slicing quality and processing efficiency, thus making it urgent to establish an accurate model to reveal their intrinsic correlation. In this study, by analyzing the diamond wire saw system for sapphire cutting, a sawing simulation model of the wire saw was developed, and a shape correction coefficient induced by the morphology of abrasive grains (β ~ 1.38) was calculated. The machining process was simulated using an iterative simulation method, and experiments were conducted to verify the rationality of the model. The results confirmed the effectiveness of the proposed model: the error between the simulated and experimental variations of sawing force is less than 9 %, the simulation error of the bow angle is less than 7 %, and the variation rate of the bow angle is approximately 5 % slower than that of the sawing force. Finally, under the validation of experiments, the variation laws of the bow angle and sawing force with wire running speed, feed speed, and pre-tension during the machining process were predicted.
蓝宝石在半导体市场上应用广泛。固定磨料金刚石线锯由于其极高的硬度,目前已成为切割蓝宝石等脆硬材料的主要方法。然而,切割过程中锯切力与弓角的动态演化规律尚不清楚,对蓝宝石圆柱件加工中的弓角缺乏系统的分析。这个问题直接影响到切片质量和加工效率,因此迫切需要建立一个准确的模型来揭示它们的内在相关性。通过对蓝宝石切割用金刚石线锯系统的分析,建立了线锯的锯切仿真模型,并计算了由磨粒形貌引起的形状校正系数(β ~ 1.38)。采用迭代仿真方法对加工过程进行了仿真,并进行了实验验证模型的合理性。结果证实了所建模型的有效性:锯切力的模拟值与实验值误差小于9%,锯切角的模拟值误差小于7%,锯切角的变化率比锯切力的变化率慢约5%。最后,在实验验证的基础上,预测了加工过程中弓形角和锯切力随走丝速度、进给速度和预张力的变化规律。
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引用次数: 0
High-energy proton-radiation tolerance in IGZO synaptic transistors IGZO突触晶体管的高能质子辐射耐受性
IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-03 DOI: 10.1016/j.mssp.2025.110320
Woojin Park , Ojun Kwon , Kyungmin Lee , Seyoung Oh , Tae Jin Yoo , Yongsu Lee , Chang Goo Kang , Byungjin Cho
Exposure to cosmic rays leads to partial degradation of the electronic devices. This study tested the resilience of bare indium-gallium-zinc-oxide synaptic transistors under 33 MeV high-energy proton irradiation. In the transistors tested, clear differences were observed before and after high-energy proton irradiation. The drive current was reduced by 10–30 %, showing degradation with high-energy radioactive irradiation in the drain-to-source current–gate-to-source voltage (IDS–VGS) transfer characteristics. Despite the structural damage, the transistor still exhibited reasonable switching behavior. To understand the effects of irradiation on the contact junction, the series resistance (RSD) was calculated; RSD increased from 361 to 546 kΩ. Potentiation and depression were measured for evaluating the performance of the neuromorphic device application. The plasticity synaptic current change (ΔPSC) was 37.7 and 22.8 nA before and after proton irradiation. When measuring the current values of the reservoir computing (RC) states, clear differences in states were observed post-proton irradiation.
暴露在宇宙射线下会导致电子设备的部分退化。本研究测试了裸露的铟镓锌氧化物突触晶体管在33mev高能质子辐照下的弹性。在测试的晶体管中,高能质子辐照前后观察到明显的差异。驱动电流降低了10 - 30%,显示出高能放射性照射下漏极到源极电流-栅极到源电压(IDS-VGS)转移特性的退化。尽管结构损坏,晶体管仍然表现出合理的开关行为。为了了解辐照对接触结的影响,计算了串联电阻(RSD);RSD从361增加到546 kΩ。测量增强和抑制,以评估神经形态装置应用的性能。质子辐照前后的可塑性突触电流变化(ΔPSC)分别为37.7和22.8 nA。在测量储层计算(RC)状态的电流值时,观察到质子辐照后状态的明显差异。
{"title":"High-energy proton-radiation tolerance in IGZO synaptic transistors","authors":"Woojin Park ,&nbsp;Ojun Kwon ,&nbsp;Kyungmin Lee ,&nbsp;Seyoung Oh ,&nbsp;Tae Jin Yoo ,&nbsp;Yongsu Lee ,&nbsp;Chang Goo Kang ,&nbsp;Byungjin Cho","doi":"10.1016/j.mssp.2025.110320","DOIUrl":"10.1016/j.mssp.2025.110320","url":null,"abstract":"<div><div>Exposure to cosmic rays leads to partial degradation of the electronic devices. This study tested the resilience of bare indium-gallium-zinc-oxide synaptic transistors under 33 MeV high-energy proton irradiation. In the transistors tested, clear differences were observed before and after high-energy proton irradiation. The drive current was reduced by 10–30 %, showing degradation with high-energy radioactive irradiation in the drain-to-source current–gate-to-source voltage (I<sub>DS</sub>–V<sub>GS</sub>) transfer characteristics. Despite the structural damage, the transistor still exhibited reasonable switching behavior. To understand the effects of irradiation on the contact junction, the series resistance (R<sub>SD</sub>) was calculated; R<sub>SD</sub> increased from 361 to 546 kΩ. Potentiation and depression were measured for evaluating the performance of the neuromorphic device application. The plasticity synaptic current change (ΔPSC) was 37.7 and 22.8 nA before and after proton irradiation. When measuring the current values of the reservoir computing (RC) states, clear differences in states were observed post-proton irradiation.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"204 ","pages":"Article 110320"},"PeriodicalIF":4.6,"publicationDate":"2025-12-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145681831","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Synaptic plasticity and visual memory in WO3-Based optoelectronic devices controlled by electrode configuration 电极结构控制wo3基光电器件的突触可塑性和视觉记忆
IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-02 DOI: 10.1016/j.mssp.2025.110316
Dabin Jeon , Seung Hun Lee , Chang-Shin Park , Han-Ki Kim , Sung-Nam Lee
We report optoelectronic synaptic behaviors of WO3-based devices with symmetric (Ag/WO3/Ag) and asymmetric (Ag/WO3/Pt) electrode configurations to emulate biological learning and memory functions. Structural and spectroscopic analyses confirm the presence of oxygen vacancies and deep-level defects, which contribute to persistent photoconductivity and defect-mediated emissions. Both devices exhibit light-induced excitatory postsynaptic current (EPSC) modulation depending on ultraviolet pulse duration, intensity, number, and frequency, mimicking synaptic potentiation. The Ag/WO3/Ag device shows consistently higher EPSC, faster learning, and longer retention than its asymmetric counterpart due to improved carrier injection and reduced interfacial barriers. Learning–forgetting experiments reveal that repeated optical stimulation enables faster learning and enhanced memory retention in both structures. Visual memory mapping using 3 × 3 pixel arrays further demonstrate spatial encoding and gradual forgetting of a “T”-shaped pattern, with the symmetric device retaining higher contrast over time. These findings highlight the critical role of electrode structure in tuning optoelectronic synaptic performance and suggest that defect-engineered WO3 thin films with optimized interfaces are promising candidates for neuromorphic vision and light-driven memory applications.
我们报道了对称(Ag/WO3/Ag)和不对称(Ag/WO3/Pt)电极配置的WO3基器件的光电突触行为,以模拟生物学习和记忆功能。结构和光谱分析证实了氧空位和深层缺陷的存在,这有助于持续的光电导率和缺陷介导的发射。这两种装置都表现出光诱导的兴奋性突触后电流(EPSC)调制,这取决于紫外线脉冲的持续时间、强度、数量和频率,模拟突触增强。由于改进了载流子注入和减少了界面障碍,Ag/WO3/Ag器件比非对称器件具有更高的EPSC、更快的学习速度和更长的保留时间。学习-遗忘实验表明,重复的视觉刺激可以加快学习速度,并增强这两个结构的记忆保持能力。使用3 × 3像素阵列的视觉记忆映射进一步证明了空间编码和“T”形模式的逐渐遗忘,对称器件随着时间的推移保持更高的对比度。这些发现强调了电极结构在调整光电突触性能中的关键作用,并表明具有优化界面的缺陷工程WO3薄膜是神经形态视觉和光驱动记忆应用的有希望的候选者。
{"title":"Synaptic plasticity and visual memory in WO3-Based optoelectronic devices controlled by electrode configuration","authors":"Dabin Jeon ,&nbsp;Seung Hun Lee ,&nbsp;Chang-Shin Park ,&nbsp;Han-Ki Kim ,&nbsp;Sung-Nam Lee","doi":"10.1016/j.mssp.2025.110316","DOIUrl":"10.1016/j.mssp.2025.110316","url":null,"abstract":"<div><div>We report optoelectronic synaptic behaviors of WO<sub>3</sub>-based devices with symmetric (Ag/WO<sub>3</sub>/Ag) and asymmetric (Ag/WO<sub>3</sub>/Pt) electrode configurations to emulate biological learning and memory functions. Structural and spectroscopic analyses confirm the presence of oxygen vacancies and deep-level defects, which contribute to persistent photoconductivity and defect-mediated emissions. Both devices exhibit light-induced excitatory postsynaptic current (EPSC) modulation depending on ultraviolet pulse duration, intensity, number, and frequency, mimicking synaptic potentiation. The Ag/WO<sub>3</sub>/Ag device shows consistently higher EPSC, faster learning, and longer retention than its asymmetric counterpart due to improved carrier injection and reduced interfacial barriers. Learning–forgetting experiments reveal that repeated optical stimulation enables faster learning and enhanced memory retention in both structures. Visual memory mapping using 3 × 3 pixel arrays further demonstrate spatial encoding and gradual forgetting of a “T”-shaped pattern, with the symmetric device retaining higher contrast over time. These findings highlight the critical role of electrode structure in tuning optoelectronic synaptic performance and suggest that defect-engineered WO<sub>3</sub> thin films with optimized interfaces are promising candidates for neuromorphic vision and light-driven memory applications.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"204 ","pages":"Article 110316"},"PeriodicalIF":4.6,"publicationDate":"2025-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145681828","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Study on material removal by ultrasonic vibration-assisted polishing of silicon carbide wafer (4H-SiC) 超声振动辅助抛光碳化硅晶圆(4H-SiC)材料去除研究
IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-01 DOI: 10.1016/j.mssp.2025.110318
De Liu , Jiaming Li , Chao Xian , Zhiyang Gu
Silicon carbide (4H-SiC), a typical difficult-to-machine material, poses significant challenges in precision surface machining due to its high hardness and brittleness. Ultrasonic vibration-assisted polishing has emerged as an effective method for achieving global flattening of 4H-SiC wafer. This study employs molecular dynamics simulations to investigate the interaction mechanisms between two abrasive grains under three vibration modes: transverse, longitudinal, and reverse. Simulation results show that vibration reduces polishing forces, while coupled abrasive grains further decrease forces and improve surface residual stress distribution. Longitudinal vibration increases dislocation density, whereas reverse vibration reduces it. Polishing experiments confirmed that applied vibration enhances surface quality. These findings provide important theoretical support for efficient precision polishing of 4H-SiC wafer.
碳化硅(4H-SiC)是一种典型的难加工材料,由于其高硬度和脆性,在精密表面加工中面临着巨大的挑战。超声振动辅助抛光已成为实现4H-SiC晶圆整体平坦化的有效方法。本文采用分子动力学模拟方法研究了两粒磨料在横向、纵向和反向三种振动模式下的相互作用机理。仿真结果表明,振动降低了抛光力,而耦合的磨粒进一步降低了抛光力,改善了表面残余应力分布。纵向振动使位错密度增大,反向振动使位错密度减小。抛光实验证实,施加振动可以提高表面质量。这些研究结果为4H-SiC晶圆的高效精密抛光提供了重要的理论支持。
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引用次数: 0
Mechanism analysis of performance enhancement in GaN terahertz Schottky barrier diodes by post-anode annealing 阳极后退火提高GaN太赫兹肖特基势垒二极管性能的机理分析
IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-01 DOI: 10.1016/j.mssp.2025.110319
Yan Ren , Yiqiang Ni , Xubo Song , Guodong Gu , Yuanjie Lv , Yongtao Yu , Yinle Li , Chao Pang , Zhihong Feng , Shengze Zhou , Honghui Liu
In this work, we demonstrate a significant improvement in the performance of GaN terahertz (THz) Schottky barrier diodes (SBDs) via the post-anode annealing (PAA) process. The breakdown voltage of GaN THz SBDs was increased from 15.14 V to 23.70 V, which effectively enhances the power density of the device. The annealing mechanism of the Ni/Au interface reveals that the PAA process significantly mitigates Schottky barrier inhomogeneity and reduces interface state density (NSS). High-resolution transmission electron microscopy (HRTEM) and atomic force microscopy (AFM) images reveal evidence of alloying occurring at the Ni/GaN interface. Meanwhile, the alignment of triangular metal clusters along the step-flow direction indicates that the PAA process effectively suppresses metal-induced gap states resulting from step-flow morphology at the Ni/GaN interface, thereby promoting the formation of a high-quality Ni/Au contact. This mechanism significantly contributes to the enhanced performance of GaN THz SBDs. Hence, this approach provides an efficient solution for high-power THz source applications.
在这项工作中,我们证明了通过阳极后退火(PAA)工艺显著改善了GaN太赫兹(THz)肖特基势垒二极管(sdd)的性能。将GaN太赫兹sdd的击穿电压从15.14 V提高到23.70 V,有效地提高了器件的功率密度。Ni/Au界面的退火机制表明,PAA工艺显著减轻了Schottky势垒不均匀性,降低了界面态密度(NSS)。高分辨率透射电子显微镜(HRTEM)和原子力显微镜(AFM)图像显示了Ni/GaN界面发生合金化的证据。同时,沿阶梯流动方向的三角形金属团簇排列表明,PAA工艺有效抑制了Ni/GaN界面上由阶梯流动形貌引起的金属诱导的间隙状态,从而促进了高质量Ni/Au接触的形成。这一机制显著提高了GaN太赫兹sdd的性能。因此,这种方法为高功率太赫兹源应用提供了一种有效的解决方案。
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引用次数: 0
Bismuth-based organic-inorganic hybrid perovskite [C10H16N]2BiCl5 as a novel visible-light active photocatalyst for the degradation of rhodamine B dye and ciprofloxacin antibiotic 铋基有机-无机杂化钙钛矿[C10H16N]2BiCl5作为降解罗丹明B染料和环丙沙星抗生素的新型可见光活性光催化剂
IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-12-01 DOI: 10.1016/j.mssp.2025.110317
Dinesh Kulhary , Sutripto Majumder , Erum Gul Naz , Yogendra Singh , Sunita Shalabh Pachori , Sainath Narayan Bhavsar , Manish R. Bhise
Organic-Inorganic Hybrid halide perovskites have garnered a lot of attention as a potential candidate for environmental remediation and optoelectronic applications. A novel lead-free bismuth hybrid perovskite was synthesized and further used for the photodegradation of detrimental pollutants. The as-synthesized compound [C10H16N]2BiCl5 was characterized using a number of techniques such as powder X-ray diffraction (PXRD), FTIR, Raman, and SEM. Rhodamine B and ciprofloxacin were chosen as typical pollutants for the degradation under UV and visible lights. The compound was found to be thermally stable up to 400 K. Additionally, the Coats-Redfernmethod was applied for the calculation of activation energy (Ea), which was found to be 2.4 kJ/mol. The surface area to volume ratio of the catalyst was found to be 19.40 m2/g. The catalyst completely removed the RhB dye and ciprofloxacin antibiotic in 30 min. The catalyst's excellent photocatalytic activity can be attributed to the combined effects of enhanced dye adsorption. The direct band gap of the material was found to be 2.69 eV, whereas the indirect band gap of the material was calculated to be 2.86 eV. Therefore, this study offers fresh perspectives into the design, fabrication, and engineering of the hybrid [C10H16N]2BiCl5 perovskite and its application for the elimination of harmful and detrimental pollutants.
有机-无机杂化卤化物钙钛矿作为一种潜在的环境修复和光电子应用候选者受到了广泛的关注。合成了一种新型无铅铋杂化钙钛矿,并将其用于有害污染物的光降解。采用粉末x射线衍射(PXRD)、红外光谱(FTIR)、拉曼光谱(Raman)和扫描电镜(SEM)等技术对合成的化合物[C10H16N]2BiCl5进行了表征。选择罗丹明B和环丙沙星作为紫外和可见光下降解的典型污染物。该化合物在400k温度下都是热稳定的。此外,采用coats - redfern法计算了其活化能(Ea),得到活化能为2.4 kJ/mol。催化剂的表面积体积比为19.40 m2/g。催化剂在30 min内完全去除RhB染料和环丙沙星抗生素。催化剂优异的光催化活性可归因于增强染料吸附的综合作用。该材料的直接带隙为2.69 eV,间接带隙为2.86 eV。因此,本研究为杂化[C10H16N]2BiCl5钙钛矿的设计、制造和工程化及其在消除有害和有害污染物方面的应用提供了新的视角。
{"title":"Bismuth-based organic-inorganic hybrid perovskite [C10H16N]2BiCl5 as a novel visible-light active photocatalyst for the degradation of rhodamine B dye and ciprofloxacin antibiotic","authors":"Dinesh Kulhary ,&nbsp;Sutripto Majumder ,&nbsp;Erum Gul Naz ,&nbsp;Yogendra Singh ,&nbsp;Sunita Shalabh Pachori ,&nbsp;Sainath Narayan Bhavsar ,&nbsp;Manish R. Bhise","doi":"10.1016/j.mssp.2025.110317","DOIUrl":"10.1016/j.mssp.2025.110317","url":null,"abstract":"<div><div>Organic-Inorganic Hybrid halide perovskites have garnered a lot of attention as a potential candidate for environmental remediation and optoelectronic applications. A novel lead-free bismuth hybrid perovskite was synthesized and further used for the photodegradation of detrimental pollutants. The as-synthesized compound [C<sub>10</sub>H<sub>16</sub>N]<sub>2</sub>BiCl<sub>5</sub> was characterized using a number of techniques such as powder X-ray diffraction (PXRD), FTIR, Raman, and SEM. Rhodamine B and ciprofloxacin were chosen as typical pollutants for the degradation under UV and visible lights. The compound was found to be thermally stable up to 400 K. Additionally, the Coats-Redfernmethod was applied for the calculation of activation energy (E<sub>a</sub>), which was found to be 2.4 kJ/mol. The surface area to volume ratio of the catalyst was found to be 19.40 m<sup>2</sup>/g. The catalyst completely removed the RhB dye and ciprofloxacin antibiotic in 30 min. The catalyst's excellent photocatalytic activity can be attributed to the combined effects of enhanced dye adsorption. The direct band gap of the material was found to be 2.69 eV, whereas the indirect band gap of the material was calculated to be 2.86 eV. Therefore, this study offers fresh perspectives into the design, fabrication, and engineering of the hybrid [C<sub>10</sub>H<sub>16</sub>N]<sub>2</sub>BiCl<sub>5</sub> perovskite and its application for the elimination of harmful and detrimental pollutants.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"204 ","pages":"Article 110317"},"PeriodicalIF":4.6,"publicationDate":"2025-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145681874","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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Materials Science in Semiconductor Processing
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