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IF 3.1 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-01-01
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引用次数: 0
IF 3.1 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-01-01
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引用次数: 0
IF 3.1 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-01-01
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引用次数: 0
IF 3.1 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-01-01
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引用次数: 0
IF 3.1 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-01-01
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引用次数: 0
IF 3.1 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-01-01
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引用次数: 0
IF 3.1 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-01-01
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引用次数: 0
IF 3.1 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-01-01
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引用次数: 0
IF 3.1 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-01-01
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引用次数: 0
A new subthreshold half-select free SRAM with dynamic feedback cut-off for low-power and high speed applications 具有动态反馈截止的新型亚阈值半选择自由SRAM,适用于低功耗和高速应用
IF 3.1 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-01-01 DOI: 10.1016/j.mee.2025.112438
Mohammadhasan jali , S. Mohammadali Zanjani , Mehdi Dolatshahi , Behrang Barekatain
This paper presents a novel 10 T static random-access memory (SRAM) cell designed for low-power, high-speed, and half-selected disturbance-free applications, featuring a differential write operation and a separated single-ended read operation. To reduce power consumption and enhance write stability, one of the back-to-back inverters is dynamically based on bit line value, removed from the circuit during the write phase, without the need for auxiliary circuitry. This functionality is implemented using stacked transistors in a single inverter, which also reduces leakage power. Moreover, subthreshold operation, along with dynamic threshold techniques, is employed to achieve additional power reduction. The proposed cell is evaluated through HSPICE simulations using 32 nm carbon nanotube field-effect transistor (CNFET) technology. Monte Carlo analysis shows that the write margin (WM), read static noise margin (RSNM), and hold static noise margin (HSNM) are 139.9 mV, 65.4 mV, and 63.9 mV, respectively. The write and read access times are 228.2 ps and 209.8 ps, respectively. The maximum write power consumption is 3.8 nW, while the read and leakage power are 10.4 nW and 252.2 pW, respectively. The minimum operating voltage is 150 mV, with an RSNM of 26 mV. The proposed 10 T SRAM cell occupies an area of about 0.161 μm2.
本文提出了一种新颖的10t静态随机存取存储器(SRAM)单元,设计用于低功耗,高速和半选择无干扰应用,具有差分写入操作和分离的单端读取操作。为了降低功耗和提高写入稳定性,其中一个背靠背逆变器是动态地基于位线值的,在写入阶段从电路中移除,而不需要辅助电路。该功能是在单个逆变器中使用堆叠晶体管实现的,这也减少了泄漏功率。此外,采用亚阈值操作以及动态阈值技术来实现额外的功耗降低。采用32纳米碳纳米管场效应晶体管(CNFET)技术,通过HSPICE模拟对所提出的电池进行了评估。蒙特卡罗分析表明,写入余量(WM)、读取静态噪声余量(RSNM)和保持静态噪声余量(HSNM)分别为139.9 mV、65.4 mV和63.9 mV。写和读访问时间分别为228.2 ps和209.8 ps。最大写功耗3.8 nW,最大读功耗10.4 nW,最大漏功耗252.2 pW。最小工作电压为150mv, RSNM为26mv。所提出的10 T SRAM单元占地约0.161 μm2。
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引用次数: 0
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Microelectronic Engineering
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