Pub Date : 2024-09-05DOI: 10.1016/j.mee.2024.112265
Yang Wang , Ziyu Liu , Yabin Sun , Lin Chen , Qingqing Sun
Backside Power Delivery Network (BSPDN) is a crucial technology for integrated circuits at sub-3 nm technology nodes. The primary challenge resides in utilizing nano through silicon via (nano-TSV) to establish connections between the backside power network and buried power rails, thereby facilitating transistor powering. The key technology is to ensure a smooth sidewall morphology and prevent damage to buried power rails (BPR) due to over-etching. In this study, non-Bosch and Bosch techniques are compared using simulation. The results demonstrate that while the non-Bosch technique yields smooth sidewalls, it inevitably leads to over-etching, whereas Bosch effectively avoids over-etching. The etching of scallop-free nano-TSV is achieved by optimizing the Bosch process, which involves the use of inductively coupled plasma (ICP). Finally, metal filling of nano-TSV is successfully achieved. Thus, the nano-TSV etching method is established as viable for BSPDN.
{"title":"Etch of nano-TSV with smooth sidewall and excellent selection ratio for backside power delivery network","authors":"Yang Wang , Ziyu Liu , Yabin Sun , Lin Chen , Qingqing Sun","doi":"10.1016/j.mee.2024.112265","DOIUrl":"10.1016/j.mee.2024.112265","url":null,"abstract":"<div><p>Backside Power Delivery Network (BSPDN) is a crucial technology for integrated circuits at sub-3 nm technology nodes. The primary challenge resides in utilizing nano through silicon via (nano-TSV) to establish connections between the backside power network and buried power rails, thereby facilitating transistor powering. The key technology is to ensure a smooth sidewall morphology and prevent damage to buried power rails (BPR) due to over-etching. In this study, non-Bosch and Bosch techniques are compared using simulation. The results demonstrate that while the non-Bosch technique yields smooth sidewalls, it inevitably leads to over-etching, whereas Bosch effectively avoids over-etching. The etching of scallop-free nano-TSV is achieved by optimizing the Bosch process, which involves the use of inductively coupled plasma (ICP). Finally, metal filling of nano-TSV is successfully achieved. Thus, the nano-TSV etching method is established as viable for BSPDN.</p></div>","PeriodicalId":18557,"journal":{"name":"Microelectronic Engineering","volume":"295 ","pages":"Article 112265"},"PeriodicalIF":2.6,"publicationDate":"2024-09-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142266227","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-23DOI: 10.1016/j.mee.2024.112262
Kazi Meharajul Kabir, Shuza Binzaid
In response to the urgent imperative of combating global warming and advancing sustainable energy solutions, an innovative approach has emerged, capitalizing on bicycles and road bike lane infrastructure. This solution integrates a Smart Lithium Battery Charging System with a Sustainable Energy Harvesting Pad (SEHP) designed for cyclists. The SEHP harnesses piezoelectric energy from mechanical vibrations and kinetic energy from lightweight vehicles. It produces clean, renewable electricity as an alternative to traditional power sources. Comprehensive assessments of the SEHP's energy generation performance at various proficiency levels have revealed impressive capabilities. An electronic emulator system is developed to support academic and research communities, simulating scenarios on bike lanes to efficiently charge 36.36 Wh lithium batteries at various cycling proficiency levels. The study involved specific circuit design, seamless integration with the custom Smart Lithium Battery Charging System, and optimization using Microcontroller hardware and software solutions. Practical prototypes verified the emulator's functionality and real-world applicability, making it an authentic replica of the SEHP's outcomes. This innovative technology enhances our understanding of SEHP and enables comparative analysis against other energy sources, contributing to a more sustainable future.
{"title":"Development of an emulator of the sustainable energy harvesting pad system on a bike lane for charging lithium batteries","authors":"Kazi Meharajul Kabir, Shuza Binzaid","doi":"10.1016/j.mee.2024.112262","DOIUrl":"10.1016/j.mee.2024.112262","url":null,"abstract":"<div><p>In response to the urgent imperative of combating global warming and advancing sustainable energy solutions, an innovative approach has emerged, capitalizing on bicycles and road bike lane infrastructure. This solution integrates a Smart Lithium Battery Charging System with a Sustainable Energy Harvesting Pad (SEHP) designed for cyclists. The SEHP harnesses piezoelectric energy from mechanical vibrations and kinetic energy from lightweight vehicles. It produces clean, renewable electricity as an alternative to traditional power sources. Comprehensive assessments of the SEHP's energy generation performance at various proficiency levels have revealed impressive capabilities. An electronic emulator system is developed to support academic and research communities, simulating scenarios on bike lanes to efficiently charge 36.36 Wh lithium batteries at various cycling proficiency levels. The study involved specific circuit design, seamless integration with the custom Smart Lithium Battery Charging System, and optimization using Microcontroller hardware and software solutions. Practical prototypes verified the emulator's functionality and real-world applicability, making it an authentic replica of the SEHP's outcomes. This innovative technology enhances our understanding of SEHP and enables comparative analysis against other energy sources, contributing to a more sustainable future.</p></div>","PeriodicalId":18557,"journal":{"name":"Microelectronic Engineering","volume":"294 ","pages":"Article 112262"},"PeriodicalIF":2.6,"publicationDate":"2024-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142076794","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-22DOI: 10.1016/j.mee.2024.112261
Amir Mohsen Ahmadi Najafabadi , Faruk Ballipinar , Melih Can Tasdelen , Abdulkadir Uzun , Murat Kaya Yapici , Anja Skrivervik , Ibrahim Tekin
This paper presents a low-profile wide scan angle multibeam conformal antenna array system with a novel feeding network for GHz mm-wave 5G applications. The proposed antenna system utilizes two conventional branch-line couplers as its beamforming network. A novel feeding technique is applied to generate beams with these couplers that are usually capable of generating beams. The proposed solution provides a wide scanning range with a minimum realized gain of dBi from to owing to this feeding approach and the peculiar placement of the array elements on a mm thick R-F775 bendable substrate. The generated beams at their steer direction have the minimum and maximum gain values of dBi and dBi, respectively. A low-cost PCB manufacturing technique based on soft lithography and wet etching is used. The system dimensions excluding extra connector sections are . The proposed flexible design is suitable for lightweight 5G communication systems and handsets with its compact low-complexity beamforming network, and wide continuous covering angle.
{"title":"Wide scan angle multibeam conformal antenna array with novel feeding for mm-wave 5G applications","authors":"Amir Mohsen Ahmadi Najafabadi , Faruk Ballipinar , Melih Can Tasdelen , Abdulkadir Uzun , Murat Kaya Yapici , Anja Skrivervik , Ibrahim Tekin","doi":"10.1016/j.mee.2024.112261","DOIUrl":"10.1016/j.mee.2024.112261","url":null,"abstract":"<div><p>This paper presents a low-profile wide scan angle multibeam conformal antenna array system with a novel feeding network for <span><math><mn>28</mn></math></span> GHz mm-wave 5G applications. The proposed antenna system utilizes two conventional branch-line couplers as its beamforming network. A novel feeding technique is applied to generate <span><math><mn>7</mn></math></span> beams with these couplers that are usually capable of generating <span><math><mn>2</mn></math></span> beams. The proposed solution provides a wide scanning range with a minimum realized gain of <span><math><mn>5</mn></math></span> dBi from <span><math><mo>−</mo><msup><mn>90</mn><mo>°</mo></msup></math></span> to <span><math><msup><mn>90</mn><mo>°</mo></msup></math></span> owing to this feeding approach and the peculiar placement of the array elements on a <span><math><mn>0.15</mn></math></span> mm thick R-F775 bendable substrate. The generated beams at their steer direction have the minimum and maximum gain values of <span><math><mn>6.5</mn></math></span> dBi and <span><math><mn>9.7</mn></math></span> dBi, respectively. A low-cost PCB manufacturing technique based on soft lithography and wet etching is used. The system dimensions excluding extra connector sections are <span><math><mn>67</mn><mo>×</mo><mn>15</mn><mo>×</mo><mn>3</mn><mspace></mspace><msup><mi>mm</mi><mn>3</mn></msup></math></span>. The proposed flexible design is suitable for lightweight 5G communication systems and handsets with its compact low-complexity beamforming network, and wide <span><math><msup><mn>180</mn><mo>°</mo></msup></math></span> continuous covering angle.</p></div>","PeriodicalId":18557,"journal":{"name":"Microelectronic Engineering","volume":"294 ","pages":"Article 112261"},"PeriodicalIF":2.6,"publicationDate":"2024-08-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142083477","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-20DOI: 10.1016/j.mee.2024.112257
Xiaoyu Zou, Matthew Fisher, Hugh Gotts
Control of surface molecular contamination (SMC) for components used in chemical vapor deposition (CVD), atomic layer deposition (ALD) and EUV photolithography is important to maintaining high yield and optimal tool operation at the latest process nodes in leading edge semiconductor manufacturing. High temperature thermal desorption spectroscopy (TDS) is a versatile tool for analyzing the cleanliness of surfaces, simulating thermal vacuum processes and studying the kinetics of desorption processes. A basic analysis of TD spectra allows for full characterization of volatile outgassing from surfaces, while detailed analysis can provide chemical information about the substrate surface.
In fundamental studies, TDS is often carried out from low temperatures to room temperature or for small samples. However, for microelectronics applications, high temperature studies of large (100 mm or greater) samples are of greater interest due to direct applications for cleanliness testing and thermal vacuum simulation. A limitation for TDS sensitivity is the outgassing of sample stage materials, particularly when analyzing gases that may be present in the chamber background such as water, CO and CO2. Typical sample stages are often tested only for total pressure or at room temperature.
In this study, we present a simple ultra-high vacuum (UHV) compatible sample heating stage for trace outgassing analysis of 100 mm samples at high temperatures. Simulation results are presented to support the feasibility of the concept. Experimental results verify the cleanliness of the stage via room temperature residual gas analysis (RGA) analysis and X-ray photoelectron spectroscopy (XPS) of stage components. Finally, use of this stage in a TDS analysis of a 100 mm Si witness wafer and comparison to room temperature RGA demonstrates operational capability.
The sample heating stage is both shown to be clean at high temperature and capable of analyzing 100 mm wafers to higher sensitivity than room temperature RGA for all m/z at the 1 × 10−9 mbar level. Despite its high performance, the heating stage is also easily produced by any laser machining service, greatly improving the accessibility of UHV science for all researchers.
{"title":"Development of an ultra-clean sample heating stage for thermal desorption spectroscopy","authors":"Xiaoyu Zou, Matthew Fisher, Hugh Gotts","doi":"10.1016/j.mee.2024.112257","DOIUrl":"10.1016/j.mee.2024.112257","url":null,"abstract":"<div><p>Control of surface molecular contamination (SMC) for components used in chemical vapor deposition (CVD), atomic layer deposition (ALD) and EUV photolithography is important to maintaining high yield and optimal tool operation at the latest process nodes in leading edge semiconductor manufacturing. High temperature thermal desorption spectroscopy (TDS) is a versatile tool for analyzing the cleanliness of surfaces, simulating thermal vacuum processes and studying the kinetics of desorption processes. A basic analysis of TD spectra allows for full characterization of volatile outgassing from surfaces, while detailed analysis can provide chemical information about the substrate surface.</p><p>In fundamental studies, TDS is often carried out from low temperatures to room temperature or for small samples. However, for microelectronics applications, high temperature studies of large (100 mm or greater) samples are of greater interest due to direct applications for cleanliness testing and thermal vacuum simulation. A limitation for TDS sensitivity is the outgassing of sample stage materials, particularly when analyzing gases that may be present in the chamber background such as water, CO and CO<sub>2</sub>. Typical sample stages are often tested only for total pressure or at room temperature.</p><p>In this study, we present a simple ultra-high vacuum (UHV) compatible sample heating stage for trace outgassing analysis of 100 mm samples at high temperatures. Simulation results are presented to support the feasibility of the concept. Experimental results verify the cleanliness of the stage via room temperature residual gas analysis (RGA) analysis and X-ray photoelectron spectroscopy (XPS) of stage components. Finally, use of this stage in a TDS analysis of a 100 mm Si witness wafer and comparison to room temperature RGA demonstrates operational capability.</p><p>The sample heating stage is both shown to be clean at high temperature and capable of analyzing 100 mm wafers to higher sensitivity than room temperature RGA for all <em>m</em>/<em>z</em> at the 1 × 10<sup>−9</sup> mbar level. Despite its high performance, the heating stage is also easily produced by any laser machining service, greatly improving the accessibility of UHV science for all researchers.</p></div>","PeriodicalId":18557,"journal":{"name":"Microelectronic Engineering","volume":"294 ","pages":"Article 112257"},"PeriodicalIF":2.6,"publicationDate":"2024-08-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142044453","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-20DOI: 10.1016/j.mee.2024.112258
Abhilash S. Vasu , T.K. Sreeja , N.R. Lakshmi
The new radiator incorporated with nanocomposites improve radiation characteristics of nonagon shaped antenna. The design comprise two nanocomposite materials loaded in slots that separately enhance lower and upper band radiation. The CPW antenna consists of nonagon shaped ring with heptagon radiating element that consists of inverted U and rigid shaped slots. The longer slot has been deliberately chosen to accommodate mid-frequency of two resonance frequencies and shorter slot isolates surface current distributed along radiating patch, left and right side. The Poly (3, 4 ethyelene dioxythiophene): Polystyrene Sulfonate-Silver nanowire (PEDOT:PSS-AgNW) nanocomposite filled in shorter slot improves gain, bandwidth and return loss of upper band, magnetite - Polyaniline (Fe3O4-PANI) filled in longer slot enhance lower band. The measured result proved to improve bandwidth, gain, radiation efficiency and polarization of lower, upper band. The flexible attributes of radiator studied extensively by wearable application by placing them on wrist and jeans. The fabricated antenna produce a bandwidth of 2.12–3.29 GHz in lower band, 4.51–6.00 GHz in upper band for 2.40/5.20/5.80 GHz WLAN, 2.50/5.50 GHz WiMAX, 2.40/4.90/5.20/5.50/5.80 GHz WiFi, 5G SUB-6 GHz and ISM bands.
采用纳米复合材料的新型辐射器改善了非菱形天线的辐射特性。该设计在槽中加入了两种纳米复合材料,可分别增强低频段和高频段的辐射。CPW 天线由带七角形辐射元件的非四边形环组成,七角形辐射元件由倒 U 形槽和刚性槽组成。特意选择较长的槽来适应两个共振频率的中频,而较短的槽则用于隔离沿辐射贴片左右两侧分布的表面电流。聚(3,4-乙烯二氧噻吩):聚苯乙烯磺酸盐-银纳米线(PEDOT:PSS-AgNW)纳米复合材料填充在较短的槽中,提高了高频段的增益、带宽和回波损耗;磁铁矿-聚苯胺(Fe3O4-PANI)填充在较长的槽中,提高了低频段的增益、带宽和回波损耗。测量结果证明,低频段和高频段的带宽、增益、辐射效率和极化都得到了改善。通过在手腕和牛仔裤上的可穿戴应用,对辐射器的柔性特性进行了广泛研究。制造的天线在低频段的带宽为 2.12-3.29 GHz,在高频段的带宽为 4.51-6.00 GHz,适用于 2.40/5.20/5.80 GHz WLAN、2.50/5.50 GHz WiMAX、2.40/4.90/5.20/5.50/5.80 GHz WiFi、5G SUB-6 GHz 和 ISM 频段。
{"title":"Nanocomposite filled slots that enhance radiation of flexible nonagon antenna","authors":"Abhilash S. Vasu , T.K. Sreeja , N.R. Lakshmi","doi":"10.1016/j.mee.2024.112258","DOIUrl":"10.1016/j.mee.2024.112258","url":null,"abstract":"<div><p>The new radiator incorporated with nanocomposites improve radiation characteristics of nonagon shaped antenna. The design comprise two nanocomposite materials loaded in slots that separately enhance lower and upper band radiation. The CPW antenna consists of nonagon shaped ring with heptagon radiating element that consists of inverted U and rigid shaped slots. The longer slot has been deliberately chosen to accommodate mid-frequency of two resonance frequencies and shorter slot isolates surface current distributed along radiating patch, left and right side. The Poly (3, 4 ethyelene dioxythiophene): Polystyrene Sulfonate-Silver nanowire (PEDOT:PSS-AgNW) nanocomposite filled in shorter slot improves gain, bandwidth and return loss of upper band, magnetite - Polyaniline (Fe<sub>3</sub>O<sub>4</sub>-PANI) filled in longer slot enhance lower band. The measured result proved to improve bandwidth, gain, radiation efficiency and polarization of lower, upper band. The flexible attributes of radiator studied extensively by wearable application by placing them on wrist and jeans. The fabricated antenna produce a bandwidth of 2.12–3.29 GHz in lower band, 4.51–6.00 GHz in upper band for 2.40/5.20/5.80 GHz WLAN, 2.50/5.50 GHz WiMAX, 2.40/4.90/5.20/5.50/5.80 GHz WiFi, 5G SUB-6 GHz and ISM bands.</p></div>","PeriodicalId":18557,"journal":{"name":"Microelectronic Engineering","volume":"294 ","pages":"Article 112258"},"PeriodicalIF":2.6,"publicationDate":"2024-08-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142097213","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-18DOI: 10.1016/j.mee.2024.112260
Geum Bin Baek, Kyung Ho Oh, Chee Won Chung
Co thin films masked with SiO2/Si3N4 layers were etched using a high-density plasma of a CH3COCH3/Ar gas mixture. As the concentration of CH3COCH3 increased, the etch rate of the Co thin films and etch selectivity decreased. Optimal etch profiles of the Co films without redeposition were achieved owing to the formation of Co compounds and a passivation layer, which facilitated a high degree of anisotropy. Moreover, the etch characteristics of the Co films were examined using the ICP RF power, dc-bias voltage to the substrate, and process pressure. The active species in plasmas and Co compounds formed during etching were investigated using optical emission spectroscopy and X-ray photoelectron spectroscopy. Finally, the Co thin films patterned with 300 nm lines were etched using a CH3COCH3/Ar gas mixture under optimized etch conditions. The findings suggest that a CH3COCH3/Ar gas mixture can serve as an effective etch gas for fabricating dry-etched Co thin films.
使用 CH3COCH3/Ar 混合气体的高密度等离子体对掩蔽有 SiO2/Si3N4 层的钴薄膜进行了蚀刻。随着 CH3COCH3 浓度的增加,Co 薄膜的蚀刻速率和蚀刻选择性降低。由于形成了 Co 化合物和钝化层,促进了高度各向异性,因此实现了无需再沉积的最佳 Co 薄膜蚀刻曲线。此外,还利用 ICP 射频功率、基底直流偏置电压和工艺压力检测了 Co 薄膜的蚀刻特性。利用光学发射光谱和 X 射线光电子能谱研究了等离子体中的活性物种和蚀刻过程中形成的 Co 化合物。最后,在优化的蚀刻条件下,使用 CH3COCH3/Ar 混合气体对刻有 300 nm 线的 Co 薄膜进行了蚀刻。研究结果表明,CH3COCH3/Ar 混合气体可作为制造干蚀刻 Co 薄膜的有效蚀刻气体。
{"title":"Etch characteristics of cobalt thin films using high density plasma of CH3COCH3/Ar gas mixture","authors":"Geum Bin Baek, Kyung Ho Oh, Chee Won Chung","doi":"10.1016/j.mee.2024.112260","DOIUrl":"10.1016/j.mee.2024.112260","url":null,"abstract":"<div><p>Co thin films masked with SiO<sub>2</sub>/Si<sub>3</sub>N<sub>4</sub> layers were etched using a high-density plasma of a CH<sub>3</sub>COCH<sub>3</sub>/Ar gas mixture. As the concentration of CH<sub>3</sub>COCH<sub>3</sub> increased, the etch rate of the Co thin films and etch selectivity decreased. Optimal etch profiles of the Co films without redeposition were achieved owing to the formation of Co compounds and a passivation layer, which facilitated a high degree of anisotropy. Moreover, the etch characteristics of the Co films were examined using the ICP RF power, dc-bias voltage to the substrate, and process pressure. The active species in plasmas and Co compounds formed during etching were investigated using optical emission spectroscopy and X-ray photoelectron spectroscopy. Finally, the Co thin films patterned with 300 nm lines were etched using a CH<sub>3</sub>COCH<sub>3</sub>/Ar gas mixture under optimized etch conditions. The findings suggest that a CH<sub>3</sub>COCH<sub>3</sub>/Ar gas mixture can serve as an effective etch gas for fabricating dry-etched Co thin films.</p></div>","PeriodicalId":18557,"journal":{"name":"Microelectronic Engineering","volume":"294 ","pages":"Article 112260"},"PeriodicalIF":2.6,"publicationDate":"2024-08-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142021331","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-17DOI: 10.1016/j.mee.2024.112259
Semih Korkmaz
In this study, all-optical OR, exclusive OR (XOR), NOR, XNOR, AND, NAND, and NOT logic gates using metal-insulator-metal (MIM) waveguides with a rectangular ring resonator are designed and analyzed. The structure has a silver plate with three input waveguides, one output waveguide, and a rectangular ring resonator. One of the input ports is used as a control port. The finite-difference time-domain (FDTD) method is utilized to obtain the optical spectrum of the proposed structures. To realize all-optical logic gate properties of the designed structures, optical signals with the same phase or different phases are passed through the waveguides. Transmission spectrum (T), contrast ratio (CR), and modulation depth (MD) parameters are obtained to determine the performances of all-optical logic gates. To determine the logic 1 (ON) and logic 0 (OFF) states of the output ports, the threshold transmission value is accepted as 0.23 for all-optical logic gates. For the proposed designs, the highest transmission, contrast ratio, and modulation depth values are 217%, 6.75 dB, and 100%, respectively. The structure also supports a data rate of 24 Tb/s. The designed optical logic gates have valuable features for developing high-performance optical devices.
本研究设计并分析了使用带有矩形环形谐振器的金属-绝缘体-金属(MIM)波导的全光 OR、排他 OR (XOR)、NOR、XNOR、AND、NAND 和 NOT 逻辑门。该结构由一块银板、三个输入波导、一个输出波导和一个矩形环谐振器组成。其中一个输入端口用作控制端口。利用有限差分时域(FDTD)方法获得了拟议结构的光学频谱。为了实现所设计结构的全光逻辑门特性,相同相位或不同相位的光信号都要通过波导。通过获得透射谱(T)、对比度(CR)和调制深度(MD)参数来确定全光逻辑门的性能。为了确定输出端口的逻辑 1(ON)和逻辑 0(OFF)状态,全光逻辑门的传输阈值被定为 0.23。对于拟议的设计,最高传输率、对比度和调制深度值分别为 217%、6.75 dB 和 100%。该结构还支持 24 Tb/s 的数据传输速率。所设计的光逻辑门具有开发高性能光器件的重要特性。
{"title":"Realization of all-optical logic gates using MIM waveguides and a rectangular ring resonator","authors":"Semih Korkmaz","doi":"10.1016/j.mee.2024.112259","DOIUrl":"10.1016/j.mee.2024.112259","url":null,"abstract":"<div><p>In this study, all-optical OR, exclusive OR (XOR), NOR, XNOR, AND, NAND, and NOT logic gates using metal-insulator-metal (MIM) waveguides with a rectangular ring resonator are designed and analyzed. The structure has a silver plate with three input waveguides, one output waveguide, and a rectangular ring resonator. One of the input ports is used as a control port. The finite-difference time-domain (FDTD) method is utilized to obtain the optical spectrum of the proposed structures. To realize all-optical logic gate properties of the designed structures, optical signals with the same phase or different phases are passed through the waveguides. Transmission spectrum (T), contrast ratio (CR), and modulation depth (MD) parameters are obtained to determine the performances of all-optical logic gates. To determine the logic 1 (ON) and logic 0 (OFF) states of the output ports, the threshold transmission value is accepted as 0.23 for all-optical logic gates. For the proposed designs, the highest transmission, contrast ratio, and modulation depth values are 217%, 6.75 dB, and 100%, respectively. The structure also supports a data rate of 24 Tb/s. The designed optical logic gates have valuable features for developing high-performance optical devices.</p></div>","PeriodicalId":18557,"journal":{"name":"Microelectronic Engineering","volume":"294 ","pages":"Article 112259"},"PeriodicalIF":2.6,"publicationDate":"2024-08-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142021332","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-11DOI: 10.1016/j.mee.2024.112256
Badreddine Smiri , Rémy Bernardin , Mickael Martin , Hervé Roussel , Jean Luc Deschanvres , Emmanuel Nolot , Névine Rochat , Franck Bassani , Thierry Baron , Bernard Pelissier
GaSe, a two-dimensional layered metal monochalcogenide, has recently attracted growing interest due to its unique electronic properties and potential technological applications. In this study, we investigate the oxidation mechanisms and properties of GaSe exposed to air for different durations, with the intensive use of Raman spectroscopy, combined with atomic force microscopy (AFM), photoluminescence (PL), and X-ray photoelectron spectroscopy (XPS). Raman analysis reveals the oxidation of GaSe, resulting in the formation of a thin layer comprising Ga2Se3, Ga2O3, and amorphous selenium. Utilizing these signatures, oxidation is then tracked. Raman spectroscopy reveals that GaSe layer becomes oxidized almost immediately after exposure to air. However, the oxidation is a self-limiting process, taking roughly 15 min to construct an 8 Å thick layer of Ga₂O₃. XPS analysis shows a good agreement with Raman analysis. The polarized Raman study suggests that the Ga₂Se₃ and Ga₂O₃ layers tend to reach an oriented structural state over time. In ambient conditions, the intensity of all Raman modes and the luminescence decreases, linked to reduction in GaSe thickness. By using various Raman excitation wavelengths, we highlight the depth-dependent oxidation dynamics in this 2D layered GaSe material.
{"title":"Spectroscopic investigation of oxidation in GaSe 2D layered materials","authors":"Badreddine Smiri , Rémy Bernardin , Mickael Martin , Hervé Roussel , Jean Luc Deschanvres , Emmanuel Nolot , Névine Rochat , Franck Bassani , Thierry Baron , Bernard Pelissier","doi":"10.1016/j.mee.2024.112256","DOIUrl":"10.1016/j.mee.2024.112256","url":null,"abstract":"<div><p>GaSe, a two-dimensional layered metal monochalcogenide, has recently attracted growing interest due to its unique electronic properties and potential technological applications. In this study, we investigate the oxidation mechanisms and properties of GaSe exposed to air for different durations, with the intensive use of Raman spectroscopy, combined with atomic force microscopy (AFM), photoluminescence (PL), and X-ray photoelectron spectroscopy (XPS). Raman analysis reveals the oxidation of GaSe, resulting in the formation of a thin layer comprising Ga<sub>2</sub>Se<sub>3</sub>, Ga<sub>2</sub>O<sub>3</sub>, and amorphous selenium. Utilizing these signatures, oxidation is then tracked. Raman spectroscopy reveals that GaSe layer becomes oxidized almost immediately after exposure to air. However, the oxidation is a self-limiting process, taking roughly 15 min to construct an 8 Å thick layer of Ga₂O₃. XPS analysis shows a good agreement with Raman analysis. The polarized Raman study suggests that the Ga₂Se₃ and Ga₂O₃ layers tend to reach an oriented structural state over time. In ambient conditions, the intensity of all Raman modes and the luminescence decreases, linked to reduction in GaSe thickness. By using various Raman excitation wavelengths, we highlight the depth-dependent oxidation dynamics in this 2D layered GaSe material.</p></div>","PeriodicalId":18557,"journal":{"name":"Microelectronic Engineering","volume":"294 ","pages":"Article 112256"},"PeriodicalIF":2.6,"publicationDate":"2024-08-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141998500","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-07-24DOI: 10.1016/j.mee.2024.112246
Farid Sebaai , Roger Loo , Anne Jourdain , Eric Beyne , Hikaru Kawarazaki , Teppei Nakano , Efrain Altamirano Sanchez
This paper discusses the challenges relative to the silicon thinning which allows the back side power delivery integration (BSPDN). The back side silicon thinning stopping on a thin Si0.75Ge0.25 etch stop layer (ESL) has been investigated as it represents an alternative to the use of SOI wafers. Etch stop layers using 10 nm Si0.75Ge0.25 or 10 nm Si0.75Ge0.25 boron doped (Si0.75Ge0.25:B) have been studied for which different thinning process sequences were considered. All the considered thinning sequences are terminated with a diluted ammonia (NH4OH) process which provides the selectivity towards the ESL. Considering a 10 nm Si0.75Ge0.25:B as an ESL considerably increases the selectivity of the last diluted NH4OH silicon etching step. It nevertheless induces a risk of device poisoning caused by the diffusion of boron. Considering a 10 nm Si0.75Ge0.25 as an ESL has been then demonstrated using different thinning process sequences. Those alternative thinning sequences were optimized with respect to the silicon removal within wafer uniformity.
{"title":"Extreme silicon thinning for back side power delivery network: Si thinning stopping on scaled SiGe etch stop layer","authors":"Farid Sebaai , Roger Loo , Anne Jourdain , Eric Beyne , Hikaru Kawarazaki , Teppei Nakano , Efrain Altamirano Sanchez","doi":"10.1016/j.mee.2024.112246","DOIUrl":"10.1016/j.mee.2024.112246","url":null,"abstract":"<div><p>This paper discusses the challenges relative to the silicon thinning which allows the back side power delivery integration (BSPDN). The back side silicon thinning stopping on a thin Si<sub>0.75</sub>Ge<sub>0.25</sub> etch stop layer (ESL) has been investigated as it represents an alternative to the use of SOI wafers. Etch stop layers using 10 nm Si<sub>0.75</sub>Ge<sub>0.25</sub> or 10 nm Si<sub>0.75</sub>Ge<sub>0.25</sub> boron doped (Si<sub>0.75</sub>Ge<sub>0.25</sub>:B) have been studied for which different thinning process sequences were considered. All the considered thinning sequences are terminated with a diluted ammonia (NH<sub>4</sub>OH) process which provides the selectivity towards the ESL. Considering a 10 nm Si<sub>0.75</sub>Ge<sub>0.25</sub>:B as an ESL considerably increases the selectivity of the last diluted NH<sub>4</sub>OH silicon etching step. It nevertheless induces a risk of device poisoning caused by the diffusion of boron. Considering a 10 nm Si<sub>0.75</sub>Ge<sub>0.25</sub> as an ESL has been then demonstrated using different thinning process sequences. Those alternative thinning sequences were optimized with respect to the silicon removal within wafer uniformity.</p></div>","PeriodicalId":18557,"journal":{"name":"Microelectronic Engineering","volume":"294 ","pages":"Article 112246"},"PeriodicalIF":2.6,"publicationDate":"2024-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141785021","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-07-22DOI: 10.1016/j.mee.2024.112231
Qiaoqiao Kang , Wei Tian , Yuzhe Lin , Jifang Tao
The development of Micro Electro Mechanical Systems (MEMS) flow sensor towards high level market applications generates various challenges, in particular also on the reliable functionality. With the advancement of reliability engineering technology, aging phenomenon of MEMS devices has been widely concerned. As a result, an aging evaluation method is essential. The accelerated aging testing (AAT) is the most widely used in traditional aging methods. However, its performance is limited by highly economic and time cost. In this paper, a novel aging effect model is proposed, in which a comprehensive approach that integrates AAT, lifetime distribution modeling, and either Finite Element Modeling Simulation (FEMS) or fatigue simulation (FS) as fundamental is explored. However, the difference from the conventional approach was that the AAT results is imported in FS, to confirm fatigue analysis, while FS predictions are instrumental in analyzing degradation or fatigue phenomena and estimation lifetime. In this way, aging performance is illustrated detailed with the lower aging cost and high efficiency. Meanwhile, the results of proposed FS are verified by a thermal cycle (TC) AAT. Specifically, the resistor degradation mechanism, the characteristic parameter degradation is calculated. Moreover, the lifetime evaluation was acquired by the Arrhenius model. Finally, the proposed aging performance evaluation method can be applied to both discrete devices and modules. Compared with the traditional aging method the high aging cost can be eliminated, and the proposed aging evaluation strategy can be used in various temperature conditions.
{"title":"A novel evaluation method of the aging performance of MEMS flow sensor","authors":"Qiaoqiao Kang , Wei Tian , Yuzhe Lin , Jifang Tao","doi":"10.1016/j.mee.2024.112231","DOIUrl":"10.1016/j.mee.2024.112231","url":null,"abstract":"<div><p>The development of Micro Electro Mechanical Systems (MEMS) flow sensor towards high level market applications generates various challenges, in particular also on the reliable functionality. With the advancement of reliability engineering technology, aging phenomenon of MEMS devices has been widely concerned. As a result, an aging evaluation method is essential. The accelerated aging testing (AAT) is the most widely used in traditional aging methods. However, its performance is limited by highly economic and time cost. In this paper, a novel aging effect model is proposed, in which a comprehensive approach that integrates AAT, lifetime distribution modeling, and either Finite Element Modeling Simulation (FEMS) or fatigue simulation (FS) as fundamental is explored. However, the difference from the conventional approach was that the AAT results is imported in FS, to confirm fatigue analysis, while FS predictions are instrumental in analyzing degradation or fatigue phenomena and estimation lifetime. In this way, aging performance is illustrated detailed with the lower aging cost and high efficiency. Meanwhile, the results of proposed FS are verified by a thermal cycle (TC) AAT. Specifically, the resistor degradation mechanism, the characteristic parameter degradation is calculated. Moreover, the lifetime evaluation was acquired by the Arrhenius model. Finally, the proposed aging performance evaluation method can be applied to both discrete devices and modules. Compared with the traditional aging method the high aging cost can be eliminated, and the proposed aging evaluation strategy can be used in various temperature conditions.</p></div>","PeriodicalId":18557,"journal":{"name":"Microelectronic Engineering","volume":"293 ","pages":"Article 112231"},"PeriodicalIF":2.6,"publicationDate":"2024-07-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141736744","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}