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Etch of nano-TSV with smooth sidewall and excellent selection ratio for backside power delivery network 蚀刻出具有光滑侧壁和优异选择率的纳米 TSV,用于背面输电网络
IF 2.6 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-09-05 DOI: 10.1016/j.mee.2024.112265
Yang Wang , Ziyu Liu , Yabin Sun , Lin Chen , Qingqing Sun

Backside Power Delivery Network (BSPDN) is a crucial technology for integrated circuits at sub-3 nm technology nodes. The primary challenge resides in utilizing nano through silicon via (nano-TSV) to establish connections between the backside power network and buried power rails, thereby facilitating transistor powering. The key technology is to ensure a smooth sidewall morphology and prevent damage to buried power rails (BPR) due to over-etching. In this study, non-Bosch and Bosch techniques are compared using simulation. The results demonstrate that while the non-Bosch technique yields smooth sidewalls, it inevitably leads to over-etching, whereas Bosch effectively avoids over-etching. The etching of scallop-free nano-TSV is achieved by optimizing the Bosch process, which involves the use of inductively coupled plasma (ICP). Finally, metal filling of nano-TSV is successfully achieved. Thus, the nano-TSV etching method is established as viable for BSPDN.

背面电源传输网络(BSPDN)是 3 纳米以下技术节点集成电路的一项关键技术。主要挑战在于利用纳米硅通孔(nano-TSV)在背面电源网络和埋入式电源轨之间建立连接,从而促进晶体管供电。关键技术是确保侧壁形态平滑,防止因过度蚀刻而损坏埋入式电源轨(BPR)。在这项研究中,通过模拟对非博世技术和博世技术进行了比较。结果表明,虽然非博世技术能产生光滑的侧壁,但不可避免地会导致过蚀刻,而博世技术则能有效避免过蚀刻。通过优化博世工艺(包括使用电感耦合等离子体 (ICP)),实现了无扇贝纳米 TSV 的蚀刻。最后,成功实现了纳米 TSV 的金属填充。因此,纳米 TSV 蚀刻方法在 BSPDN 中是可行的。
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引用次数: 0
Development of an emulator of the sustainable energy harvesting pad system on a bike lane for charging lithium batteries 在自行车道上开发用于锂电池充电的可持续能量收集垫系统模拟器
IF 2.6 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-23 DOI: 10.1016/j.mee.2024.112262
Kazi Meharajul Kabir, Shuza Binzaid

In response to the urgent imperative of combating global warming and advancing sustainable energy solutions, an innovative approach has emerged, capitalizing on bicycles and road bike lane infrastructure. This solution integrates a Smart Lithium Battery Charging System with a Sustainable Energy Harvesting Pad (SEHP) designed for cyclists. The SEHP harnesses piezoelectric energy from mechanical vibrations and kinetic energy from lightweight vehicles. It produces clean, renewable electricity as an alternative to traditional power sources. Comprehensive assessments of the SEHP's energy generation performance at various proficiency levels have revealed impressive capabilities. An electronic emulator system is developed to support academic and research communities, simulating scenarios on bike lanes to efficiently charge 36.36 Wh lithium batteries at various cycling proficiency levels. The study involved specific circuit design, seamless integration with the custom Smart Lithium Battery Charging System, and optimization using Microcontroller hardware and software solutions. Practical prototypes verified the emulator's functionality and real-world applicability, making it an authentic replica of the SEHP's outcomes. This innovative technology enhances our understanding of SEHP and enables comparative analysis against other energy sources, contributing to a more sustainable future.

为了应对全球变暖和推进可持续能源解决方案的紧迫性,一种利用自行车和道路自行车道基础设施的创新方法应运而生。该解决方案将智能锂电池充电系统与专为骑车人设计的可持续能源收集垫(SEHP)集成在一起。SEHP 利用机械振动产生的压电能量和轻型车辆产生的动能。它能产生清洁、可再生的电力,作为传统电源的替代品。对 SEHP 在不同熟练程度下的发电性能进行的综合评估显示,其性能令人印象深刻。为支持学术界和研究界,我们开发了一个电子模拟系统,模拟自行车道上的各种情况,在不同的骑行熟练程度下为 36.36 Wh 锂电池高效充电。研究涉及具体的电路设计、与定制智能锂电池充电系统的无缝集成,以及使用微控制器硬件和软件解决方案进行优化。实际原型验证了仿真器的功能和实际应用性,使其成为 SEHP 成果的真实复制品。这项创新技术增强了我们对 SEHP 的了解,并可与其他能源进行比较分析,从而为实现更加可持续的未来做出贡献。
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引用次数: 0
Wide scan angle multibeam conformal antenna array with novel feeding for mm-wave 5G applications 采用新型馈电的宽扫描角多波束共形天线阵列,适用于毫米波 5G 应用
IF 2.6 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-22 DOI: 10.1016/j.mee.2024.112261
Amir Mohsen Ahmadi Najafabadi , Faruk Ballipinar , Melih Can Tasdelen , Abdulkadir Uzun , Murat Kaya Yapici , Anja Skrivervik , Ibrahim Tekin

This paper presents a low-profile wide scan angle multibeam conformal antenna array system with a novel feeding network for 28 GHz mm-wave 5G applications. The proposed antenna system utilizes two conventional branch-line couplers as its beamforming network. A novel feeding technique is applied to generate 7 beams with these couplers that are usually capable of generating 2 beams. The proposed solution provides a wide scanning range with a minimum realized gain of 5 dBi from 90° to 90° owing to this feeding approach and the peculiar placement of the array elements on a 0.15 mm thick R-F775 bendable substrate. The generated beams at their steer direction have the minimum and maximum gain values of 6.5 dBi and 9.7 dBi, respectively. A low-cost PCB manufacturing technique based on soft lithography and wet etching is used. The system dimensions excluding extra connector sections are 67×15×3mm3. The proposed flexible design is suitable for lightweight 5G communication systems and handsets with its compact low-complexity beamforming network, and wide 180° continuous covering angle.

本文针对 28 GHz 毫米波 5G 应用,介绍了一种带有新型馈电网络的低剖面宽扫描角多波束共形天线阵列系统。拟议的天线系统采用两个传统的分支线耦合器作为波束成形网络。这些耦合器通常只能产生 2 个波束,而利用新型馈电技术可产生 7 个波束。由于采用了这种馈电方法,并在 0.15 毫米厚的 R-F775 可弯曲基板上布置了独特的阵列元件,因此所提出的解决方案扫描范围很宽,从 -90° 到 90° 的最小实现增益为 5 dBi。在转向方向上产生的波束的最小和最大增益值分别为 6.5 dBi 和 9.7 dBi。该系统采用了基于软光刻和湿法蚀刻的低成本印刷电路板制造技术。系统尺寸(不包括额外的连接器部分)为 67×15×3mm3。所提出的灵活设计适用于轻量级 5G 通信系统和手机,具有紧凑、低复杂度波束成形网络和宽 180° 连续覆盖角。
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引用次数: 0
Development of an ultra-clean sample heating stage for thermal desorption spectroscopy 开发用于热解吸光谱仪的超洁净样品加热台
IF 2.6 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-20 DOI: 10.1016/j.mee.2024.112257
Xiaoyu Zou, Matthew Fisher, Hugh Gotts

Control of surface molecular contamination (SMC) for components used in chemical vapor deposition (CVD), atomic layer deposition (ALD) and EUV photolithography is important to maintaining high yield and optimal tool operation at the latest process nodes in leading edge semiconductor manufacturing. High temperature thermal desorption spectroscopy (TDS) is a versatile tool for analyzing the cleanliness of surfaces, simulating thermal vacuum processes and studying the kinetics of desorption processes. A basic analysis of TD spectra allows for full characterization of volatile outgassing from surfaces, while detailed analysis can provide chemical information about the substrate surface.

In fundamental studies, TDS is often carried out from low temperatures to room temperature or for small samples. However, for microelectronics applications, high temperature studies of large (100 mm or greater) samples are of greater interest due to direct applications for cleanliness testing and thermal vacuum simulation. A limitation for TDS sensitivity is the outgassing of sample stage materials, particularly when analyzing gases that may be present in the chamber background such as water, CO and CO2. Typical sample stages are often tested only for total pressure or at room temperature.

In this study, we present a simple ultra-high vacuum (UHV) compatible sample heating stage for trace outgassing analysis of 100 mm samples at high temperatures. Simulation results are presented to support the feasibility of the concept. Experimental results verify the cleanliness of the stage via room temperature residual gas analysis (RGA) analysis and X-ray photoelectron spectroscopy (XPS) of stage components. Finally, use of this stage in a TDS analysis of a 100 mm Si witness wafer and comparison to room temperature RGA demonstrates operational capability.

The sample heating stage is both shown to be clean at high temperature and capable of analyzing 100 mm wafers to higher sensitivity than room temperature RGA for all m/z at the 1 × 10−9 mbar level. Despite its high performance, the heating stage is also easily produced by any laser machining service, greatly improving the accessibility of UHV science for all researchers.

控制用于化学气相沉积 (CVD)、原子层沉积 (ALD) 和 EUV 光刻技术的部件的表面分子污染 (SMC) 对于在尖端半导体制造的最新工艺节点上保持高产量和最佳工具操作非常重要。高温热解吸光谱(TDS)是分析表面清洁度、模拟热真空过程和研究解吸过程动力学的多功能工具。通过对 TD 光谱进行基本分析,可以全面了解表面挥发物的特性,而详细分析则可以提供基底表面的化学信息。然而,在微电子应用中,由于可直接用于清洁度测试和热真空模拟,对大型(100 毫米或更大)样品的高温研究更令人感兴趣。TDS 灵敏度的一个限制因素是样品台材料的放气,尤其是在分析可能存在于真空室背景中的气体(如水、一氧化碳和二氧化碳)时。在本研究中,我们介绍了一种简单的超高真空(UHV)兼容样品加热台,用于在高温下对 100 毫米样品进行痕量放气分析。模拟结果证明了这一概念的可行性。实验结果通过室温残余气体分析 (RGA) 分析和平台组件的 X 射线光电子能谱分析 (XPS) 验证了平台的清洁度。最后,将该平台用于 100 毫米硅见证晶片的 TDS 分析,并与室温 RGA 进行比较,证明了其操作能力。样品加热平台不仅在高温下清洁度高,而且在 1 × 10-9 毫巴水平的所有 m/z 分析灵敏度都高于室温 RGA。尽管性能很高,但任何激光加工服务机构都能轻松生产加热台,从而大大提高了超高真空科学对所有研究人员的普及程度。
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引用次数: 0
Nanocomposite filled slots that enhance radiation of flexible nonagon antenna 增强柔性非四边形天线辐射的纳米复合材料填充槽
IF 2.6 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-20 DOI: 10.1016/j.mee.2024.112258
Abhilash S. Vasu , T.K. Sreeja , N.R. Lakshmi

The new radiator incorporated with nanocomposites improve radiation characteristics of nonagon shaped antenna. The design comprise two nanocomposite materials loaded in slots that separately enhance lower and upper band radiation. The CPW antenna consists of nonagon shaped ring with heptagon radiating element that consists of inverted U and rigid shaped slots. The longer slot has been deliberately chosen to accommodate mid-frequency of two resonance frequencies and shorter slot isolates surface current distributed along radiating patch, left and right side. The Poly (3, 4 ethyelene dioxythiophene): Polystyrene Sulfonate-Silver nanowire (PEDOT:PSS-AgNW) nanocomposite filled in shorter slot improves gain, bandwidth and return loss of upper band, magnetite - Polyaniline (Fe3O4-PANI) filled in longer slot enhance lower band. The measured result proved to improve bandwidth, gain, radiation efficiency and polarization of lower, upper band. The flexible attributes of radiator studied extensively by wearable application by placing them on wrist and jeans. The fabricated antenna produce a bandwidth of 2.12–3.29 GHz in lower band, 4.51–6.00 GHz in upper band for 2.40/5.20/5.80 GHz WLAN, 2.50/5.50 GHz WiMAX, 2.40/4.90/5.20/5.50/5.80 GHz WiFi, 5G SUB-6 GHz and ISM bands.

采用纳米复合材料的新型辐射器改善了非菱形天线的辐射特性。该设计在槽中加入了两种纳米复合材料,可分别增强低频段和高频段的辐射。CPW 天线由带七角形辐射元件的非四边形环组成,七角形辐射元件由倒 U 形槽和刚性槽组成。特意选择较长的槽来适应两个共振频率的中频,而较短的槽则用于隔离沿辐射贴片左右两侧分布的表面电流。聚(3,4-乙烯二氧噻吩):聚苯乙烯磺酸盐-银纳米线(PEDOT:PSS-AgNW)纳米复合材料填充在较短的槽中,提高了高频段的增益、带宽和回波损耗;磁铁矿-聚苯胺(Fe3O4-PANI)填充在较长的槽中,提高了低频段的增益、带宽和回波损耗。测量结果证明,低频段和高频段的带宽、增益、辐射效率和极化都得到了改善。通过在手腕和牛仔裤上的可穿戴应用,对辐射器的柔性特性进行了广泛研究。制造的天线在低频段的带宽为 2.12-3.29 GHz,在高频段的带宽为 4.51-6.00 GHz,适用于 2.40/5.20/5.80 GHz WLAN、2.50/5.50 GHz WiMAX、2.40/4.90/5.20/5.50/5.80 GHz WiFi、5G SUB-6 GHz 和 ISM 频段。
{"title":"Nanocomposite filled slots that enhance radiation of flexible nonagon antenna","authors":"Abhilash S. Vasu ,&nbsp;T.K. Sreeja ,&nbsp;N.R. Lakshmi","doi":"10.1016/j.mee.2024.112258","DOIUrl":"10.1016/j.mee.2024.112258","url":null,"abstract":"<div><p>The new radiator incorporated with nanocomposites improve radiation characteristics of nonagon shaped antenna. The design comprise two nanocomposite materials loaded in slots that separately enhance lower and upper band radiation. The CPW antenna consists of nonagon shaped ring with heptagon radiating element that consists of inverted U and rigid shaped slots. The longer slot has been deliberately chosen to accommodate mid-frequency of two resonance frequencies and shorter slot isolates surface current distributed along radiating patch, left and right side. The Poly (3, 4 ethyelene dioxythiophene): Polystyrene Sulfonate-Silver nanowire (PEDOT:PSS-AgNW) nanocomposite filled in shorter slot improves gain, bandwidth and return loss of upper band, magnetite - Polyaniline (Fe<sub>3</sub>O<sub>4</sub>-PANI) filled in longer slot enhance lower band. The measured result proved to improve bandwidth, gain, radiation efficiency and polarization of lower, upper band. The flexible attributes of radiator studied extensively by wearable application by placing them on wrist and jeans. The fabricated antenna produce a bandwidth of 2.12–3.29 GHz in lower band, 4.51–6.00 GHz in upper band for 2.40/5.20/5.80 GHz WLAN, 2.50/5.50 GHz WiMAX, 2.40/4.90/5.20/5.50/5.80 GHz WiFi, 5G SUB-6 GHz and ISM bands.</p></div>","PeriodicalId":18557,"journal":{"name":"Microelectronic Engineering","volume":"294 ","pages":"Article 112258"},"PeriodicalIF":2.6,"publicationDate":"2024-08-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142097213","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Etch characteristics of cobalt thin films using high density plasma of CH3COCH3/Ar gas mixture 使用 CH3COCH3/Ar 混合气体的高密度等离子体蚀刻钴薄膜的特性
IF 2.6 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-18 DOI: 10.1016/j.mee.2024.112260
Geum Bin Baek, Kyung Ho Oh, Chee Won Chung

Co thin films masked with SiO2/Si3N4 layers were etched using a high-density plasma of a CH3COCH3/Ar gas mixture. As the concentration of CH3COCH3 increased, the etch rate of the Co thin films and etch selectivity decreased. Optimal etch profiles of the Co films without redeposition were achieved owing to the formation of Co compounds and a passivation layer, which facilitated a high degree of anisotropy. Moreover, the etch characteristics of the Co films were examined using the ICP RF power, dc-bias voltage to the substrate, and process pressure. The active species in plasmas and Co compounds formed during etching were investigated using optical emission spectroscopy and X-ray photoelectron spectroscopy. Finally, the Co thin films patterned with 300 nm lines were etched using a CH3COCH3/Ar gas mixture under optimized etch conditions. The findings suggest that a CH3COCH3/Ar gas mixture can serve as an effective etch gas for fabricating dry-etched Co thin films.

使用 CH3COCH3/Ar 混合气体的高密度等离子体对掩蔽有 SiO2/Si3N4 层的钴薄膜进行了蚀刻。随着 CH3COCH3 浓度的增加,Co 薄膜的蚀刻速率和蚀刻选择性降低。由于形成了 Co 化合物和钝化层,促进了高度各向异性,因此实现了无需再沉积的最佳 Co 薄膜蚀刻曲线。此外,还利用 ICP 射频功率、基底直流偏置电压和工艺压力检测了 Co 薄膜的蚀刻特性。利用光学发射光谱和 X 射线光电子能谱研究了等离子体中的活性物种和蚀刻过程中形成的 Co 化合物。最后,在优化的蚀刻条件下,使用 CH3COCH3/Ar 混合气体对刻有 300 nm 线的 Co 薄膜进行了蚀刻。研究结果表明,CH3COCH3/Ar 混合气体可作为制造干蚀刻 Co 薄膜的有效蚀刻气体。
{"title":"Etch characteristics of cobalt thin films using high density plasma of CH3COCH3/Ar gas mixture","authors":"Geum Bin Baek,&nbsp;Kyung Ho Oh,&nbsp;Chee Won Chung","doi":"10.1016/j.mee.2024.112260","DOIUrl":"10.1016/j.mee.2024.112260","url":null,"abstract":"<div><p>Co thin films masked with SiO<sub>2</sub>/Si<sub>3</sub>N<sub>4</sub> layers were etched using a high-density plasma of a CH<sub>3</sub>COCH<sub>3</sub>/Ar gas mixture. As the concentration of CH<sub>3</sub>COCH<sub>3</sub> increased, the etch rate of the Co thin films and etch selectivity decreased. Optimal etch profiles of the Co films without redeposition were achieved owing to the formation of Co compounds and a passivation layer, which facilitated a high degree of anisotropy. Moreover, the etch characteristics of the Co films were examined using the ICP RF power, dc-bias voltage to the substrate, and process pressure. The active species in plasmas and Co compounds formed during etching were investigated using optical emission spectroscopy and X-ray photoelectron spectroscopy. Finally, the Co thin films patterned with 300 nm lines were etched using a CH<sub>3</sub>COCH<sub>3</sub>/Ar gas mixture under optimized etch conditions. The findings suggest that a CH<sub>3</sub>COCH<sub>3</sub>/Ar gas mixture can serve as an effective etch gas for fabricating dry-etched Co thin films.</p></div>","PeriodicalId":18557,"journal":{"name":"Microelectronic Engineering","volume":"294 ","pages":"Article 112260"},"PeriodicalIF":2.6,"publicationDate":"2024-08-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142021331","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Realization of all-optical logic gates using MIM waveguides and a rectangular ring resonator 利用 MIM 波导和矩形环谐振器实现全光学逻辑门
IF 2.6 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-17 DOI: 10.1016/j.mee.2024.112259
Semih Korkmaz

In this study, all-optical OR, exclusive OR (XOR), NOR, XNOR, AND, NAND, and NOT logic gates using metal-insulator-metal (MIM) waveguides with a rectangular ring resonator are designed and analyzed. The structure has a silver plate with three input waveguides, one output waveguide, and a rectangular ring resonator. One of the input ports is used as a control port. The finite-difference time-domain (FDTD) method is utilized to obtain the optical spectrum of the proposed structures. To realize all-optical logic gate properties of the designed structures, optical signals with the same phase or different phases are passed through the waveguides. Transmission spectrum (T), contrast ratio (CR), and modulation depth (MD) parameters are obtained to determine the performances of all-optical logic gates. To determine the logic 1 (ON) and logic 0 (OFF) states of the output ports, the threshold transmission value is accepted as 0.23 for all-optical logic gates. For the proposed designs, the highest transmission, contrast ratio, and modulation depth values are 217%, 6.75 dB, and 100%, respectively. The structure also supports a data rate of 24 Tb/s. The designed optical logic gates have valuable features for developing high-performance optical devices.

本研究设计并分析了使用带有矩形环形谐振器的金属-绝缘体-金属(MIM)波导的全光 OR、排他 OR (XOR)、NOR、XNOR、AND、NAND 和 NOT 逻辑门。该结构由一块银板、三个输入波导、一个输出波导和一个矩形环谐振器组成。其中一个输入端口用作控制端口。利用有限差分时域(FDTD)方法获得了拟议结构的光学频谱。为了实现所设计结构的全光逻辑门特性,相同相位或不同相位的光信号都要通过波导。通过获得透射谱(T)、对比度(CR)和调制深度(MD)参数来确定全光逻辑门的性能。为了确定输出端口的逻辑 1(ON)和逻辑 0(OFF)状态,全光逻辑门的传输阈值被定为 0.23。对于拟议的设计,最高传输率、对比度和调制深度值分别为 217%、6.75 dB 和 100%。该结构还支持 24 Tb/s 的数据传输速率。所设计的光逻辑门具有开发高性能光器件的重要特性。
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引用次数: 0
Spectroscopic investigation of oxidation in GaSe 2D layered materials GaSe 二维层状材料中的氧化光谱研究
IF 2.6 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-11 DOI: 10.1016/j.mee.2024.112256
Badreddine Smiri , Rémy Bernardin , Mickael Martin , Hervé Roussel , Jean Luc Deschanvres , Emmanuel Nolot , Névine Rochat , Franck Bassani , Thierry Baron , Bernard Pelissier

GaSe, a two-dimensional layered metal monochalcogenide, has recently attracted growing interest due to its unique electronic properties and potential technological applications. In this study, we investigate the oxidation mechanisms and properties of GaSe exposed to air for different durations, with the intensive use of Raman spectroscopy, combined with atomic force microscopy (AFM), photoluminescence (PL), and X-ray photoelectron spectroscopy (XPS). Raman analysis reveals the oxidation of GaSe, resulting in the formation of a thin layer comprising Ga2Se3, Ga2O3, and amorphous selenium. Utilizing these signatures, oxidation is then tracked. Raman spectroscopy reveals that GaSe layer becomes oxidized almost immediately after exposure to air. However, the oxidation is a self-limiting process, taking roughly 15 min to construct an 8 Å thick layer of Ga₂O₃. XPS analysis shows a good agreement with Raman analysis. The polarized Raman study suggests that the Ga₂Se₃ and Ga₂O₃ layers tend to reach an oriented structural state over time. In ambient conditions, the intensity of all Raman modes and the luminescence decreases, linked to reduction in GaSe thickness. By using various Raman excitation wavelengths, we highlight the depth-dependent oxidation dynamics in this 2D layered GaSe material.

硒化镓(GaSe)是一种二维层状金属单质,由于其独特的电子特性和潜在的技术应用,最近引起了越来越多的关注。在本研究中,我们通过大量使用拉曼光谱,结合原子力显微镜(AFM)、光致发光(PL)和 X 射线光电子能谱(XPS),研究了 GaSe 暴露于空气中不同时间的氧化机制和性质。拉曼分析揭示了 GaSe 的氧化过程,形成了由 Ga2Se3、Ga2O3 和无定形硒组成的薄层。利用这些特征,可以跟踪氧化过程。拉曼光谱显示,GaSe 层暴露在空气中后几乎立即发生氧化。然而,氧化是一个自我限制的过程,大约需要 15 分钟才能形成 8 Å 厚的镓₂O₃层。XPS 分析与拉曼分析显示出良好的一致性。偏振拉曼研究表明,随着时间的推移,Ga₂Se₃ 和 Ga₂O₃层趋向于达到一种定向结构状态。在环境条件下,所有拉曼模式和发光强度都会下降,这与 GaSe 厚度的减少有关。通过使用不同的拉曼激发波长,我们强调了这种二维层状 GaSe 材料中与深度相关的氧化动力学。
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引用次数: 0
Extreme silicon thinning for back side power delivery network: Si thinning stopping on scaled SiGe etch stop layer 用于背面输电网络的极端硅减薄:在按比例硅锗蚀刻停止层上停止硅减薄
IF 2.6 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-24 DOI: 10.1016/j.mee.2024.112246
Farid Sebaai , Roger Loo , Anne Jourdain , Eric Beyne , Hikaru Kawarazaki , Teppei Nakano , Efrain Altamirano Sanchez

This paper discusses the challenges relative to the silicon thinning which allows the back side power delivery integration (BSPDN). The back side silicon thinning stopping on a thin Si0.75Ge0.25 etch stop layer (ESL) has been investigated as it represents an alternative to the use of SOI wafers. Etch stop layers using 10 nm Si0.75Ge0.25 or 10 nm Si0.75Ge0.25 boron doped (Si0.75Ge0.25:B) have been studied for which different thinning process sequences were considered. All the considered thinning sequences are terminated with a diluted ammonia (NH4OH) process which provides the selectivity towards the ESL. Considering a 10 nm Si0.75Ge0.25:B as an ESL considerably increases the selectivity of the last diluted NH4OH silicon etching step. It nevertheless induces a risk of device poisoning caused by the diffusion of boron. Considering a 10 nm Si0.75Ge0.25 as an ESL has been then demonstrated using different thinning process sequences. Those alternative thinning sequences were optimized with respect to the silicon removal within wafer uniformity.

本文讨论了实现背面功率传输集成(BSPDN)的硅减薄所面临的挑战。本文研究了在薄硅锗蚀刻停止层(ESL)上停止背面硅减薄的问题,因为这代表了使用 SOI 晶圆的一种替代方法。对使用 10 nm SiGe 或 10 nm 掺硼 SiGe(SiGe:B)的蚀刻阻挡层进行了研究,并考虑了不同的减薄工艺顺序。所有考虑过的减薄顺序都是以稀释氨水 (NHOH) 工艺终止,该工艺提供了对 ESL 的选择性。将 10 nm SiGe:B 作为 ESL 可大大提高最后一个稀释 NHOH 硅蚀刻步骤的选择性。然而,硼的扩散会导致器件中毒的风险。将 10 nm SiGe 作为 ESL 后,使用不同的稀化工艺顺序进行了验证。在硅片均匀性的前提下,对这些不同的薄化顺序进行了硅去除优化。
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引用次数: 0
A novel evaluation method of the aging performance of MEMS flow sensor MEMS 流量传感器老化性能的新型评估方法
IF 2.6 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-22 DOI: 10.1016/j.mee.2024.112231
Qiaoqiao Kang , Wei Tian , Yuzhe Lin , Jifang Tao

The development of Micro Electro Mechanical Systems (MEMS) flow sensor towards high level market applications generates various challenges, in particular also on the reliable functionality. With the advancement of reliability engineering technology, aging phenomenon of MEMS devices has been widely concerned. As a result, an aging evaluation method is essential. The accelerated aging testing (AAT) is the most widely used in traditional aging methods. However, its performance is limited by highly economic and time cost. In this paper, a novel aging effect model is proposed, in which a comprehensive approach that integrates AAT, lifetime distribution modeling, and either Finite Element Modeling Simulation (FEMS) or fatigue simulation (FS) as fundamental is explored. However, the difference from the conventional approach was that the AAT results is imported in FS, to confirm fatigue analysis, while FS predictions are instrumental in analyzing degradation or fatigue phenomena and estimation lifetime. In this way, aging performance is illustrated detailed with the lower aging cost and high efficiency. Meanwhile, the results of proposed FS are verified by a thermal cycle (TC) AAT. Specifically, the resistor degradation mechanism, the characteristic parameter degradation is calculated. Moreover, the lifetime evaluation was acquired by the Arrhenius model. Finally, the proposed aging performance evaluation method can be applied to both discrete devices and modules. Compared with the traditional aging method the high aging cost can be eliminated, and the proposed aging evaluation strategy can be used in various temperature conditions.

微电子机械系统(MEMS)流量传感器在向高端市场应用发展的过程中面临着各种挑战,尤其是在可靠性功能方面。随着可靠性工程技术的发展,MEMS 设备的老化现象受到广泛关注。因此,老化评估方法至关重要。加速老化试验(AAT)是传统老化方法中应用最广泛的一种。然而,其性能受限于高度的经济性和时间成本。本文提出了一种新型老化效应模型,探索了一种以 AAT、寿命分布建模和有限元建模仿真(FEMS)或疲劳仿真(FS)为基础的综合方法。然而,与传统方法不同的是,AAT 结果被导入到 FS 中以确认疲劳分析,而 FS 预测则有助于分析退化或疲劳现象以及估计寿命。通过这种方法,老化性能得到了详细说明,老化成本更低,效率更高。同时,热循环 (TC) AAT 验证了拟议 FS 的结果。具体而言,计算了电阻器退化机制、特征参数退化。此外,还利用阿伦尼乌斯模型进行了寿命评估。最后,所提出的老化性能评估方法既适用于分立器件,也适用于模块。与传统的老化方法相比,可以消除高昂的老化成本,而且所提出的老化评估策略可以在各种温度条件下使用。
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引用次数: 0
期刊
Microelectronic Engineering
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