Xiao Deng, Jie Chen, Jie Liu, Yan Ma, Xinbin Cheng, Tongbao Li
Atom lithography is a novel technique for nanofabrication which can be used to grow periodic arrays of highly uniform nanometer-scale structures. The pitch standard of Cr nano-grating is 212.8±0.1 nm, which coincides with λ/2 of the standing wave, in correspondence with the 52Cr atomic resonance transition: 7S3 → 7P40, λ= 425.55 nm. With the utilization of the material removal ability by AFM scratching, the Cr nanostructures have been transferred to an InP substrate for replication and subdivision. The uncertainty analysed based on gravity centre (GC) method is better than 0.5% for both replicated and subdivided nano-gratings. AFM lithography method expands the application of atom lithography in metrology to a smaller scale with high precision.
{"title":"Replication and subdivision of chromium nano-grating in atom lithography","authors":"Xiao Deng, Jie Chen, Jie Liu, Yan Ma, Xinbin Cheng, Tongbao Li","doi":"10.1117/12.2191128","DOIUrl":"https://doi.org/10.1117/12.2191128","url":null,"abstract":"Atom lithography is a novel technique for nanofabrication which can be used to grow periodic arrays of highly uniform nanometer-scale structures. The pitch standard of Cr nano-grating is 212.8±0.1 nm, which coincides with λ/2 of the standing wave, in correspondence with the 52Cr atomic resonance transition: 7S3 → 7P40, λ= 425.55 nm. With the utilization of the material removal ability by AFM scratching, the Cr nanostructures have been transferred to an InP substrate for replication and subdivision. The uncertainty analysed based on gravity centre (GC) method is better than 0.5% for both replicated and subdivided nano-gratings. AFM lithography method expands the application of atom lithography in metrology to a smaller scale with high precision.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"61 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124240003","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
In the optics industry thin film systems are used to construct various interference devices such as antireflective coatings, high-reflectance mirrors, beam splitters and filters. The optical characterization of complex optical systems can not be performed by measurements only in the short spectral range in which the interference devices will be employed because the measured data do not contain sufficient information about all relevant parameters of these systems. The characterization of film materials requires the extension of the spectral range of the measurements to the IR region containing phonon absorption and to the UV region containing the electronic excitations. However, this leads to necessity of a dispersion model suitable for the description of the dielectric response in the wide spectral range. Such model must respect the physical conditions following from theory of dispersion, particularly Kramers-Kronig relations and integrability imposed by sum rules. This work presents the construction of a universal dispersion model composed from individual contributions representing both electronic and phonon excitations. The efficiency of presented model is given by the fact that all the contributions are described by analytical expressions. It is shown that the model is suitable for precise modeling of spectral dependencies of optical constants of a broad class of materials used in the optical industry for thin film systems such as MgF2, SiO2, Al2O3, HfO2, Ta2O5 and TiO2 in the spectral range from far IR to vacuum UV.
{"title":"Dispersion model for optical thin films applicable in wide spectral range","authors":"D. Franta, D. Nečas, I. Ohlídal, A. Giglia","doi":"10.1117/12.2190104","DOIUrl":"https://doi.org/10.1117/12.2190104","url":null,"abstract":"In the optics industry thin film systems are used to construct various interference devices such as antireflective coatings, high-reflectance mirrors, beam splitters and filters. The optical characterization of complex optical systems can not be performed by measurements only in the short spectral range in which the interference devices will be employed because the measured data do not contain sufficient information about all relevant parameters of these systems. The characterization of film materials requires the extension of the spectral range of the measurements to the IR region containing phonon absorption and to the UV region containing the electronic excitations. However, this leads to necessity of a dispersion model suitable for the description of the dielectric response in the wide spectral range. Such model must respect the physical conditions following from theory of dispersion, particularly Kramers-Kronig relations and integrability imposed by sum rules. This work presents the construction of a universal dispersion model composed from individual contributions representing both electronic and phonon excitations. The efficiency of presented model is given by the fact that all the contributions are described by analytical expressions. It is shown that the model is suitable for precise modeling of spectral dependencies of optical constants of a broad class of materials used in the optical industry for thin film systems such as MgF2, SiO2, Al2O3, HfO2, Ta2O5 and TiO2 in the spectral range from far IR to vacuum UV.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"304 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122980918","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The throughput of extreme ultraviolet (EUV) lithography systems is presently strongly limited by the available radiant power at the wafer level. Besides increasing the power of EUV sources, also the quality of the optical elements plays a key role. With state of the art multilayer mirrors the main cause of diminished reflectance is surface and interface roughness as well as interface diffusion. Both properties lead to reduced specular reflectance while only the interface roughness causes diffuse scattering. EUV diffuse scatter thus allows to selectively assess the contribution of the interface roughness. The intensity distribution of diffusely scattered EUV radiation provides information on vertical and lateral correlations of the surface and interface roughness through the appearance of resonant diffuse scattering (RDS) sheets. The study of off-specular scattering thus serves as a natural tool for the investigation of the roughness of the interfaces. However, upon near-normal incidence impinging EUV radiation, dynamical scattering contributions from thickness oscillations (Kiessig fringes) lead to Bragg lines which intersect the RDS sheets. This causes strong resonant enhancement in the scatter cross section which we called “Kiessig-like peak" in analogy to the well known phenomenon of Bragg-like peaks appearing in hard X-ray grazing incidence measurement geometries. Thus for power spectral density studies of multilayer interface roughness, resonant dynamical scattering cannot be neglected. Theoretical simulations based on the distorted-wave Born approximation enable to separate dynamic features of the multilayer from roughness induced scattering. This allows to consistently determine an interface power spectral density (PSD). We have analyzed magnetron sputtered high-reflectance Mo/Si multilayer mirrors with different nominal molybdenum layer thicknesses from 1.7 nm to 3.05 nm crossing the Mo crystallization threshold. Our off-specular scattering measurements at multilayer samples were conducted at the PTB-EUV radiometry beamline at the Metrology Light Source (MLS) in Berlin. The samples were produced by magnetron sputtering and pre-characterized by Kα X-ray reflectivity at Fraunhofer IWS, Dresden.
{"title":"Characterization of Mo/Si mirror interface roughness for different Mo layer thickness using resonant diffuse EUV scattering","authors":"A. Haase, V. Soltwisch, F. Scholze, S. Braun","doi":"10.1117/12.2191265","DOIUrl":"https://doi.org/10.1117/12.2191265","url":null,"abstract":"The throughput of extreme ultraviolet (EUV) lithography systems is presently strongly limited by the available radiant power at the wafer level. Besides increasing the power of EUV sources, also the quality of the optical elements plays a key role. With state of the art multilayer mirrors the main cause of diminished reflectance is surface and interface roughness as well as interface diffusion. Both properties lead to reduced specular reflectance while only the interface roughness causes diffuse scattering. EUV diffuse scatter thus allows to selectively assess the contribution of the interface roughness. The intensity distribution of diffusely scattered EUV radiation provides information on vertical and lateral correlations of the surface and interface roughness through the appearance of resonant diffuse scattering (RDS) sheets. The study of off-specular scattering thus serves as a natural tool for the investigation of the roughness of the interfaces. However, upon near-normal incidence impinging EUV radiation, dynamical scattering contributions from thickness oscillations (Kiessig fringes) lead to Bragg lines which intersect the RDS sheets. This causes strong resonant enhancement in the scatter cross section which we called “Kiessig-like peak\" in analogy to the well known phenomenon of Bragg-like peaks appearing in hard X-ray grazing incidence measurement geometries. Thus for power spectral density studies of multilayer interface roughness, resonant dynamical scattering cannot be neglected. Theoretical simulations based on the distorted-wave Born approximation enable to separate dynamic features of the multilayer from roughness induced scattering. This allows to consistently determine an interface power spectral density (PSD). We have analyzed magnetron sputtered high-reflectance Mo/Si multilayer mirrors with different nominal molybdenum layer thicknesses from 1.7 nm to 3.05 nm crossing the Mo crystallization threshold. Our off-specular scattering measurements at multilayer samples were conducted at the PTB-EUV radiometry beamline at the Metrology Light Source (MLS) in Berlin. The samples were produced by magnetron sputtering and pre-characterized by Kα X-ray reflectivity at Fraunhofer IWS, Dresden.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115878173","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Hofmann, Yanfen Xiao, S. Sherman, P. Bollgrün, T. Schmidt, U. Gleißner, H. Zappe
We report on the fabrication of all-polymer inverted rib waveguides by hot-embossing and inkjet printing. Inkjet printing as an additive fabrication technique is well suited for a fast, selective and automated patterning of large areas. In general, the lines that can be printed with polymer inks can serve as waveguides themselves but the dimensions are too big to form single-mode waveguides. To overcome this limitation we apply hot-embossed grooves as assist structures to ensure the lateral confinement of the guided wave. We show the waveguide design, spin-coated single-mode waveguides as an intermediate result and finally inkjet printed all-polymer waveguides and their optical performance.
{"title":"Inkjet printed single-mode waveguides on hot-embossed foils","authors":"M. Hofmann, Yanfen Xiao, S. Sherman, P. Bollgrün, T. Schmidt, U. Gleißner, H. Zappe","doi":"10.1117/12.2191335","DOIUrl":"https://doi.org/10.1117/12.2191335","url":null,"abstract":"We report on the fabrication of all-polymer inverted rib waveguides by hot-embossing and inkjet printing. Inkjet printing as an additive fabrication technique is well suited for a fast, selective and automated patterning of large areas. In general, the lines that can be printed with polymer inks can serve as waveguides themselves but the dimensions are too big to form single-mode waveguides. To overcome this limitation we apply hot-embossed grooves as assist structures to ensure the lateral confinement of the guided wave. We show the waveguide design, spin-coated single-mode waveguides as an intermediate result and finally inkjet printed all-polymer waveguides and their optical performance.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116624585","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
We propose a swept source optical coherence tomography that uses an original external-cavity laser diode and demonstrate measurements of thickness distribution in two dimensions using this equipment. We first conducted high-speed, wide-range wavelength scanning with an external-cavity laser diode that was equipped with a special antireflection-coated laser diode working at 770 nm. Using an acousto-optic deflector enabled a tuning range and rate of 22 nm and 20 kHz, respectively, with no mechanical elements. Next, we applied this source to an optical coherence tomography and measured the two-dimensional distribution of thickness of a thin glass plate.
{"title":"Two-dimensional thickness measurement using acousto-optically tuned external cavity laser diode","authors":"Takamasa Suzuki, S. Abe, Samuel Choi","doi":"10.1117/12.2193027","DOIUrl":"https://doi.org/10.1117/12.2193027","url":null,"abstract":"We propose a swept source optical coherence tomography that uses an original external-cavity laser diode and demonstrate measurements of thickness distribution in two dimensions using this equipment. We first conducted high-speed, wide-range wavelength scanning with an external-cavity laser diode that was equipped with a special antireflection-coated laser diode working at 770 nm. Using an acousto-optic deflector enabled a tuning range and rate of 22 nm and 20 kHz, respectively, with no mechanical elements. Next, we applied this source to an optical coherence tomography and measured the two-dimensional distribution of thickness of a thin glass plate.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"9628 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130107663","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Spectral interferometric methods utilizing the interference of two beams in a Michelson interferometer to measure the displacement are analyzed theoretically and experimentally. First we consider an experimental setup comprising a white-light source, a dispersion balanced Michelson interferometer and a spectrometer. The position of one of the interferometer mirrors is controlled via a piezo positioning system and the displacement measurement is based on the wavelength interrogation, i.e., the position of a selected interference fringe in the resultant channeled spectrum is measured as a function of the mirror displacement. Second we consider a setup with another interferometer, included in the Michelson interferometer, to increase the sensitivity of the displacement measurement. In this setup, the resultant channeled spectrum is with envelope which shifts with the displacement of the interferometer mirror. We analyze the new measurement method theoretically and show that the displacement measurement is once again possible by using the wavelength interrogation and the sensitivity is substantially increased. We also realized the new measurement setup in which the position of the interferometer mirror is controlled via a closed-loop piezo positioning system and confirmed the theoretical results.
{"title":"Highly sensitive displacement measurement utilizing the wavelength interrogation","authors":"J. Militký, M. Kadulová, D. Ciprian, P. Hlubina","doi":"10.1117/12.2191198","DOIUrl":"https://doi.org/10.1117/12.2191198","url":null,"abstract":"Spectral interferometric methods utilizing the interference of two beams in a Michelson interferometer to measure the displacement are analyzed theoretically and experimentally. First we consider an experimental setup comprising a white-light source, a dispersion balanced Michelson interferometer and a spectrometer. The position of one of the interferometer mirrors is controlled via a piezo positioning system and the displacement measurement is based on the wavelength interrogation, i.e., the position of a selected interference fringe in the resultant channeled spectrum is measured as a function of the mirror displacement. Second we consider a setup with another interferometer, included in the Michelson interferometer, to increase the sensitivity of the displacement measurement. In this setup, the resultant channeled spectrum is with envelope which shifts with the displacement of the interferometer mirror. We analyze the new measurement method theoretically and show that the displacement measurement is once again possible by using the wavelength interrogation and the sensitivity is substantially increased. We also realized the new measurement setup in which the position of the interferometer mirror is controlled via a closed-loop piezo positioning system and confirmed the theoretical results.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133957891","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Campos-García, O. Huerta-Carranza, R. Díaz-Uribe, V. Moreno-Oliva
The null-screen method has been used to test aspheric surfaces, among them the surface of a parabolic trough solar collector (PTSC). This geometrical method measures the slope of the test surface and by a numerical integration procedure the shape of the test surface can be obtained. In this work, through some numerical simulations sinusoidal deformations with different amplitudes and spatial periods are introduced on PTSC surfaces. Then, an analysis of the deformations of the reflected images of a null-screen by the PTSC surface due to defects on the surface is performed. This procedure allows to validate the kind and magnitude of the surface deformations that can be measured with the proposed method. Also, an analysis of the advantages and limitations of the null-screen testing method will be discussed.
{"title":"Analysis of defects on the slopes on a parabolic trough solar collector with null-screens","authors":"M. Campos-García, O. Huerta-Carranza, R. Díaz-Uribe, V. Moreno-Oliva","doi":"10.1117/12.2192136","DOIUrl":"https://doi.org/10.1117/12.2192136","url":null,"abstract":"The null-screen method has been used to test aspheric surfaces, among them the surface of a parabolic trough solar collector (PTSC). This geometrical method measures the slope of the test surface and by a numerical integration procedure the shape of the test surface can be obtained. In this work, through some numerical simulations sinusoidal deformations with different amplitudes and spatial periods are introduced on PTSC surfaces. Then, an analysis of the deformations of the reflected images of a null-screen by the PTSC surface due to defects on the surface is performed. This procedure allows to validate the kind and magnitude of the surface deformations that can be measured with the proposed method. Also, an analysis of the advantages and limitations of the null-screen testing method will be discussed.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"58 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121189552","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
In this paper, we propose the sinusoidal frequency modulation on a laser diode (LD) to achieve both frequency stabilization of the LD and displacement measurement with a homodyne interferometer. The central frequency of the LD is stabilized to a Doppler broadened absorption line of an iodine (I2) molecule near the wavelength of 633 nm. The frequency of the LD is modulated across the absorption line and synchronous detection is utilized to detect the absorption signal. A simple and low-cost homodyne displacement-measuring interferometer can be constructed that can attain high measurement resolution.
{"title":"Sinusoidal frequency modulation on laser diode for frequency stabilization and displacement measuring interferometry","authors":"M. Aketagawa, T. Vu, R. Yamazaki","doi":"10.1117/12.2191032","DOIUrl":"https://doi.org/10.1117/12.2191032","url":null,"abstract":"In this paper, we propose the sinusoidal frequency modulation on a laser diode (LD) to achieve both frequency stabilization of the LD and displacement measurement with a homodyne interferometer. The central frequency of the LD is stabilized to a Doppler broadened absorption line of an iodine (I2) molecule near the wavelength of 633 nm. The frequency of the LD is modulated across the absorption line and synchronous detection is utilized to detect the absorption signal. A simple and low-cost homodyne displacement-measuring interferometer can be constructed that can attain high measurement resolution.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"337 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121258071","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Highly chromatic corrected optical systems rely on optical glasses with precise optical positions represented by refractive index and Abbe number. A modern production of optical glasses requires an economical, fast and accurate way of monitoring its fabrication. We demonstrate that an automated Hilger-Chance type refractometer fulfills all these needs. Therefore the uncertainty of a set of optical glasses is analyzed on the basis of a high number and long time reproducibility measurements. It turns out that the standard deviations after several hundreds of measurements taken over almost an decade in refraction is better than 10-5 in refraction and 0.02% in dispersion.
{"title":"V-block refractometer for monitoring the production of optical glasses","authors":"U. Petzold, R. Jedamzik, P. Hartmann, S. Reichel","doi":"10.1117/12.2191218","DOIUrl":"https://doi.org/10.1117/12.2191218","url":null,"abstract":"Highly chromatic corrected optical systems rely on optical glasses with precise optical positions represented by refractive index and Abbe number. A modern production of optical glasses requires an economical, fast and accurate way of monitoring its fabrication. We demonstrate that an automated Hilger-Chance type refractometer fulfills all these needs. Therefore the uncertainty of a set of optical glasses is analyzed on the basis of a high number and long time reproducibility measurements. It turns out that the standard deviations after several hundreds of measurements taken over almost an decade in refraction is better than 10-5 in refraction and 0.02% in dispersion.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124047802","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
T. Döhring, M. Stollenwerk, Qingqing Gong, L. Proserpio, A. Winter, P. Friedrich
Previously used mirror technologies are not able to fulfil the requirements of future X-ray telescopes due to challenging requests from the scientific community. Consequently new technical approaches for X-ray mirror production are under development. In Europe the technical baseline for the planned X-ray observatory ATHENA is the radical new approach of silicon pore optics. NASA´s recently launched NuSTAR mission uses segmented mirrors shells made from thin bended glasses, successfully demonstrating the feasibility of the glass forming technology for X-ray mirrors. For risk mitigation also in Europe the hot slumping of thin glasses is being developed as an alternative technology for lightweight X-ray telescopes. The high precision mirror manufacturing requires challenging technical developments; several design trades and trend-setting decisions need to be made and are discussed within this paper. Some new technical and economic aspects of the intended glass mirror serial production are also studied within the recently started interdisciplinary project INTRAAST, an acronym for "industry transfer of astronomical mirror technologies". The goal of the project, embedded in a cooperation of the Max-Planck-Institute for extraterrestrial Physics and the University of Applied Sciences Aschaffenburg, is to master the challenge of producing thin mirror shells for future X-ray telescopes. As a first project task the development of low stress coatings for thin glass mirror substrates have been started, the corresponding technical approach and first results are presented.
{"title":"The challenge of developing thin mirror shells for future x-ray telescopes","authors":"T. Döhring, M. Stollenwerk, Qingqing Gong, L. Proserpio, A. Winter, P. Friedrich","doi":"10.1117/12.2191112","DOIUrl":"https://doi.org/10.1117/12.2191112","url":null,"abstract":"Previously used mirror technologies are not able to fulfil the requirements of future X-ray telescopes due to challenging requests from the scientific community. Consequently new technical approaches for X-ray mirror production are under development. In Europe the technical baseline for the planned X-ray observatory ATHENA is the radical new approach of silicon pore optics. NASA´s recently launched NuSTAR mission uses segmented mirrors shells made from thin bended glasses, successfully demonstrating the feasibility of the glass forming technology for X-ray mirrors. For risk mitigation also in Europe the hot slumping of thin glasses is being developed as an alternative technology for lightweight X-ray telescopes. The high precision mirror manufacturing requires challenging technical developments; several design trades and trend-setting decisions need to be made and are discussed within this paper. Some new technical and economic aspects of the intended glass mirror serial production are also studied within the recently started interdisciplinary project INTRAAST, an acronym for \"industry transfer of astronomical mirror technologies\". The goal of the project, embedded in a cooperation of the Max-Planck-Institute for extraterrestrial Physics and the University of Applied Sciences Aschaffenburg, is to master the challenge of producing thin mirror shells for future X-ray telescopes. As a first project task the development of low stress coatings for thin glass mirror substrates have been started, the corresponding technical approach and first results are presented.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116021586","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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