There is a significant demand for high secondary electron emission (SEE) coefficients and long operational lifetimes in vacuum electronic devices. Therefore, the fabrication of thin films with excellent SEE performance has become increasingly critical. In this study, we demonstrate a simple yet effective approach to enhance the SEE coefficient and simultaneously reduce the decay rate of Al and Au co-doped MgO films by introducing a buffer layer and tuning its thickness. By investigating the crystallization behavior of films with varying buffer layer thicknesses, we reveal that the buffer layer significantly influences the surface morphology, chemical states, and band structure of the films, all of which play important roles in determining the final SEE performance. Notably, the Al and Au co-doped MgO film with a 40 nm-thick Al buffer layer exhibited the best SEE performance, improving the SEE coefficient from 5.03 to 5.32 while alleviating the decay rate from 13.6% to 9.8%. Compared to traditional approaches involving complex structural design, the strategy of incorporating a buffer layer offers a simple, reproducible, and scalable method for the fabrication of high-performance SEE films. The suitability of the optimized films for use in multipliers was demonstrated by the remarkable performance enhancement achieved upon their integration into the devices.
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