Polyamide (PA)-based nanofiltration (NF) membranes often suffer from low water permeability and limited salt/dye separation efficiency due to dense selective layers. This work precisely regulated pore size by grafting azobenzene (Azo) and incorporating β-CD, which captures dyes via molecular recognition, enhancing dye/salt separation. The numerous hydrophilic hydroxyl groups present on the exterior of β-CD cavities improve membrane surface hydrophilicity, thereby optimizing the functionality of membrane surface. The contaminants adhering to membrane surface can be simply eliminated utilizing UV irradiation to disrupt the interactions between β-CD and Azo. More importantly, the membrane could then be reconstructed by re-immersing it in a fresh β-CD solution. The optimized membrane demonstrated a notable flux reaching 32.4 L/m2·h·bar, along with an impressive CR/Na2SO4 selectivity ratio of 220.
{"title":"Construction of antifouling and renewable nanofiltration membranes through surface self-assembly for dye/salt separation","authors":"Hanbin Wang, Wenshuang Zhang, Shiji Jia, Chongbin Wang, Yuanyuan Feng","doi":"10.1016/j.apsusc.2025.165611","DOIUrl":"https://doi.org/10.1016/j.apsusc.2025.165611","url":null,"abstract":"Polyamide (PA)-based nanofiltration (NF) membranes often suffer from low water permeability and limited salt/dye separation efficiency due to dense selective layers. This work precisely regulated pore size by grafting azobenzene (Azo) and incorporating β-CD, which captures dyes via molecular recognition, enhancing dye/salt separation. The numerous hydrophilic hydroxyl groups present on the exterior of β-CD cavities improve membrane surface hydrophilicity, thereby optimizing the functionality of membrane surface. The contaminants adhering to membrane surface can be simply eliminated utilizing UV irradiation to disrupt the interactions between β-CD and Azo. More importantly, the membrane could then be reconstructed by re-immersing it in a fresh β-CD solution. The optimized membrane demonstrated a notable flux reaching 32.4 L/m<sup>2</sup>·h·bar, along with an impressive CR/Na<sub>2</sub>SO<sub>4</sub> selectivity ratio of 220.","PeriodicalId":247,"journal":{"name":"Applied Surface Science","volume":"10 1","pages":""},"PeriodicalIF":6.7,"publicationDate":"2025-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145777636","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-12-18DOI: 10.1016/j.apsusc.2025.165620
Óscar Eduardo Fernández-Jonguitud, Roberto Leyva-Ramos, Brenda Azharel Jiménez-López, Ignacio René Galindo-Esquivel, Antonio Aragón-Piña, Esmeralda Mendoza-Mendoza
{"title":"Highly efficient blue-LED-driven Cr(VI) reduction over bare and graphene-decorated Bi2WO6, BiVO4, and Bi2WO6/BiVO4 photocatalysts obtained by straightforward green methods","authors":"Óscar Eduardo Fernández-Jonguitud, Roberto Leyva-Ramos, Brenda Azharel Jiménez-López, Ignacio René Galindo-Esquivel, Antonio Aragón-Piña, Esmeralda Mendoza-Mendoza","doi":"10.1016/j.apsusc.2025.165620","DOIUrl":"https://doi.org/10.1016/j.apsusc.2025.165620","url":null,"abstract":"","PeriodicalId":247,"journal":{"name":"Applied Surface Science","volume":"29 1","pages":""},"PeriodicalIF":6.7,"publicationDate":"2025-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145784652","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Molecular-level insights into the adsorption of nitrogen heterocycles on reduced graphene oxide: engineered via functional group spacing and heteroatom positioning","authors":"Sagnik Kundu, Suraj Pise, Nilanjan Dey, Sayan Kanungo","doi":"10.1016/j.apsusc.2025.165609","DOIUrl":"https://doi.org/10.1016/j.apsusc.2025.165609","url":null,"abstract":"","PeriodicalId":247,"journal":{"name":"Applied Surface Science","volume":"56 1","pages":""},"PeriodicalIF":6.7,"publicationDate":"2025-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145786021","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-12-18DOI: 10.1016/j.apsusc.2025.165624
Ting Dai, Ping Chen, Gaoyu Wang, Ning Wang
{"title":"Wear resistance and magnetic mechanism of EP composite coating reinforced with coupling agent modified Fe3O4-ZrO2: simulation calculation and experiment research","authors":"Ting Dai, Ping Chen, Gaoyu Wang, Ning Wang","doi":"10.1016/j.apsusc.2025.165624","DOIUrl":"https://doi.org/10.1016/j.apsusc.2025.165624","url":null,"abstract":"","PeriodicalId":247,"journal":{"name":"Applied Surface Science","volume":"18 1","pages":""},"PeriodicalIF":6.7,"publicationDate":"2025-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145784648","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-12-18DOI: 10.1016/j.apsusc.2025.165603
Wen-Bo Wang, Kang Li, Ken Chen, Wenfang Li, Jun Du, Ryoshi Ohta, Makoto Kambara
{"title":"High-rate deposition of dense and uniform SiGe thick films via nanocluster-assembled mesoplasma spray chemical vapor deposition","authors":"Wen-Bo Wang, Kang Li, Ken Chen, Wenfang Li, Jun Du, Ryoshi Ohta, Makoto Kambara","doi":"10.1016/j.apsusc.2025.165603","DOIUrl":"https://doi.org/10.1016/j.apsusc.2025.165603","url":null,"abstract":"","PeriodicalId":247,"journal":{"name":"Applied Surface Science","volume":"34 1","pages":""},"PeriodicalIF":6.7,"publicationDate":"2025-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145784653","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-12-18DOI: 10.1016/j.apsusc.2025.165613
Svitlana Sovinska, Paweł Dąbczyński, Mateusz M. Marzec, Jakub Rysz, Krystian Sokołowski, Andrzej Bernasik, Beata Szreniawa, Michael Bredol, Benjamin González-Diaz, Katarzyna Matras-Postolek
{"title":"Ligand-controlled self-organization of 1D ZnSe nanocrystals in a model bulk heterojunction solar cell system","authors":"Svitlana Sovinska, Paweł Dąbczyński, Mateusz M. Marzec, Jakub Rysz, Krystian Sokołowski, Andrzej Bernasik, Beata Szreniawa, Michael Bredol, Benjamin González-Diaz, Katarzyna Matras-Postolek","doi":"10.1016/j.apsusc.2025.165613","DOIUrl":"https://doi.org/10.1016/j.apsusc.2025.165613","url":null,"abstract":"","PeriodicalId":247,"journal":{"name":"Applied Surface Science","volume":"17 1","pages":""},"PeriodicalIF":6.7,"publicationDate":"2025-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145786022","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-12-18DOI: 10.1016/j.apsusc.2025.165610
Jaegyu Jeong, Bogeun Jang, Yeonhee Lee, Yunjung Jang, Jongill Hong
Low-energy hydrogen-ion irradiation provides a non-destructive, precise route to tailor materials by modifying bulk and interfacial structures, enabling the conversion of paramagnetic oxides to ferromagnetic metals with minimal damage. We apply this approach to CoO/Pd multilayers, achieving reduction to Co/Pd while elucidating the mechanism. Deuterium is employed to isolate hydrogen-specific effects. The saturation magnetization increases with acceleration energy, indicating a progressive CoO → Co transformation driven by oxygen-vacancy-mediated out-diffusion. Depth-resolved chemical profiling, compared with simulations of defect production, reveals an energy-dependent crossover: at lower energies, dissociation of OH species supplies oxygen that diffuses out; at higher energies, direct oxygen removal dominates. X-ray reflectivity shows that smoother, more uniform interfaces promote oxygen out-diffusion and thereby accelerate reduction. Together, these results establish sub-keV hydrogen-ion irradiation as a controllable, non-destructive tool for nanoscale physicochemical phase control and for coupled tuning of bulk and interface states. Beyond the CoO/Pd system, the ability to program magnetic properties within a single heterostructure by energy modulation highlights opportunities for spintronic thin films and device-relevant surface engineering.
{"title":"Physicochemical reduction of CoO to metallic Co by non-destructive, low-energy hydrogen-ion irradiation","authors":"Jaegyu Jeong, Bogeun Jang, Yeonhee Lee, Yunjung Jang, Jongill Hong","doi":"10.1016/j.apsusc.2025.165610","DOIUrl":"https://doi.org/10.1016/j.apsusc.2025.165610","url":null,"abstract":"Low-energy hydrogen-ion irradiation provides a non-destructive, precise route to tailor materials by modifying bulk and interfacial structures, enabling the conversion of paramagnetic oxides to ferromagnetic metals with minimal damage. We apply this approach to CoO/Pd multilayers, achieving reduction to Co/Pd while elucidating the mechanism. Deuterium is employed to isolate hydrogen-specific effects. The saturation magnetization increases with acceleration energy, indicating a progressive CoO → Co transformation driven by oxygen-vacancy-mediated out-diffusion. Depth-resolved chemical profiling, compared with simulations of defect production, reveals an energy-dependent crossover: at lower energies, dissociation of OH species supplies oxygen that diffuses out; at higher energies, direct oxygen removal dominates. X-ray reflectivity shows that smoother, more uniform interfaces promote oxygen out-diffusion and thereby accelerate reduction. Together, these results establish sub-keV hydrogen-ion irradiation as a controllable, non-destructive tool for nanoscale physicochemical phase control and for coupled tuning of bulk and interface states. Beyond the CoO/Pd system, the ability to program magnetic properties within a single heterostructure by energy modulation highlights opportunities for spintronic thin films and device-relevant surface engineering.","PeriodicalId":247,"journal":{"name":"Applied Surface Science","volume":"21 1","pages":""},"PeriodicalIF":6.7,"publicationDate":"2025-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145771416","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-12-18DOI: 10.1016/j.apsusc.2025.165606
Changgyu Kim, Okhyeon Kim, Tanzia Chowdhury, Mi-Soo Kim, Hye-Lee Kim, Seunggyun Hong, Byung-Kwan Kim, Jin Sik Kim, Wonyong Koh, Won-Jun Lee
{"title":"High-temperature high-growth-rate atomic layer deposition of SiO2 using hexamethyldisilylamino-dimethylamino-silane","authors":"Changgyu Kim, Okhyeon Kim, Tanzia Chowdhury, Mi-Soo Kim, Hye-Lee Kim, Seunggyun Hong, Byung-Kwan Kim, Jin Sik Kim, Wonyong Koh, Won-Jun Lee","doi":"10.1016/j.apsusc.2025.165606","DOIUrl":"https://doi.org/10.1016/j.apsusc.2025.165606","url":null,"abstract":"","PeriodicalId":247,"journal":{"name":"Applied Surface Science","volume":"20 1","pages":""},"PeriodicalIF":6.7,"publicationDate":"2025-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145784647","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-12-17DOI: 10.1016/j.apsusc.2025.165622
Mikhail V. Lebedev, Antonina A. Pivovarova, Ekaterina V. Kunitsyna, Aleksandr A. Klimov, Natalia D. Il’inskaya, Aleksandra V. Koroleva, Evgeny V. Zhizhin, Sergey V. Lebedev
Etching of InAs(1 0 0) surfaces with HBr:H2O2 and HBr:KMnO4 solutions is investigated by x-ray photoelectron spectroscopy and photoluminescence in order to relate surface chemistry and electronic structure. Etching with these solutions causes essential reduction of indium oxides and accumulation of elemental arsenic. Such a chemical modification is accompanied by increase in photoluminescence intensity testifying that the etching with HBr:H2O2 or HBr:KMnO4 solution eliminates non-radiative recombination at the InAs(1 0 0)/oxide interface. The photoluminescence intensity increases with the increase in the content of elemental arsenic and residual indium oxides at the surface. The increased photoluminescence intensity retains for at least a month of the exposure of etched InAs(1 0 0) surfaces to air, though the oxidation of surface indium and arsenic atoms on the etched surfaces is not avoided.
{"title":"Etcing of InAs(1 0 0) surface with HBr-based solutions","authors":"Mikhail V. Lebedev, Antonina A. Pivovarova, Ekaterina V. Kunitsyna, Aleksandr A. Klimov, Natalia D. Il’inskaya, Aleksandra V. Koroleva, Evgeny V. Zhizhin, Sergey V. Lebedev","doi":"10.1016/j.apsusc.2025.165622","DOIUrl":"https://doi.org/10.1016/j.apsusc.2025.165622","url":null,"abstract":"Etching of InAs(1 0 0) surfaces with HBr:H<sub>2</sub>O<sub>2</sub> and HBr:KMnO<sub>4</sub> solutions is investigated by x-ray photoelectron spectroscopy and photoluminescence in order to relate surface chemistry and electronic structure. Etching with these solutions causes essential reduction of indium oxides and accumulation of elemental arsenic. Such a chemical modification is accompanied by increase in photoluminescence intensity testifying that the etching with HBr:H<sub>2</sub>O<sub>2</sub> or HBr:KMnO<sub>4</sub> solution eliminates non-radiative recombination at the InAs(1 0 0)/oxide interface. The photoluminescence intensity increases with the increase in the content of elemental arsenic and residual indium oxides at the surface. The increased photoluminescence intensity retains for at least a month of the exposure of etched InAs(1 0 0) surfaces to air, though the oxidation of surface indium and arsenic atoms on the etched surfaces is not avoided.","PeriodicalId":247,"journal":{"name":"Applied Surface Science","volume":"21 1","pages":""},"PeriodicalIF":6.7,"publicationDate":"2025-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145777638","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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