Aiming at the problems of poor safety, reliability and assembly consistency of manual assembly of large segmented optical components, a dual manipulator automatic assembly method is proposed. First of all, a modular automatic assembly system is built, and the interactive cooperation mode of dual robotic arms is adopted to realize the function exchange of the two robotic arms and meet the requirements of a wider and larger visual identification and assembly range. Then, the 3D spatial grasping and assembly relationship is established by the “point cloud stitching” technology based on marker points, and the system calibration is completed. Finally, a “step-by-step” point-by-point approximation assembly strategy is proposed, which corrects the error through binocular vision guidance to improve the final assembly accuracy, which meets the requirements of high assembly accuracy and strong consistency of large-scale segmented optical components.
{"title":"Research on automatic assembly method of dual manipulator for large-scale segmented optical components","authors":"Pei Li, Jie Wu, Chong Lv, Yue Xiao, Chunrui Zhang","doi":"10.1117/12.3005430","DOIUrl":"https://doi.org/10.1117/12.3005430","url":null,"abstract":"Aiming at the problems of poor safety, reliability and assembly consistency of manual assembly of large segmented optical components, a dual manipulator automatic assembly method is proposed. First of all, a modular automatic assembly system is built, and the interactive cooperation mode of dual robotic arms is adopted to realize the function exchange of the two robotic arms and meet the requirements of a wider and larger visual identification and assembly range. Then, the 3D spatial grasping and assembly relationship is established by the “point cloud stitching” technology based on marker points, and the system calibration is completed. Finally, a “step-by-step” point-by-point approximation assembly strategy is proposed, which corrects the error through binocular vision guidance to improve the final assembly accuracy, which meets the requirements of high assembly accuracy and strong consistency of large-scale segmented optical components.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":" 44","pages":"1296409 - 1296409-7"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138994834","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The Whispering Gallery Modes Resonators(WGMR) are specific electromagnetic modes confined in circular resonators, where light beams are guided along the circumferences of the resonators with very small losses by total internal reflections. WGMR is the core component of optical filters, ultra-narrow linewidth laser, microwave photoelectric oscillator, optical frequency comb, rubidium atomic clock etc and high-precision sensors. Q factor is defined as the ratio of the total energy of photons in WGMR to the loss lost in one propagation cycle. The energy loss of WGMR is discussed. The cutting dynamics model diagram was established based the cutting force model for turning. The key technology affecting WGMR’s Q factor was the fabrication process. The manufacture of ultra-high Q factor WGMR are realized through rough machining, ultra-precision turning and precision polishing. The processing of ultra-precision turning and precision polishing is reported in the paper. The important fabrication processing of WGMR is ultra-precision turning. The test results show that the Q value of WGMR is 1.5×10 9@1550nm by Q value measurement system. The surface roughness and shape error of WGMR are 0.6nm (Ra value) and 5.3nm (PV value) respectively, measured by white light interferometer.
{"title":"Fabrication of millimeter-scale crystal whispering gallery mode resonators","authors":"Junhan Liu, Tianliang Qu, Changxin Xiong","doi":"10.1117/12.3006429","DOIUrl":"https://doi.org/10.1117/12.3006429","url":null,"abstract":"The Whispering Gallery Modes Resonators(WGMR) are specific electromagnetic modes confined in circular resonators, where light beams are guided along the circumferences of the resonators with very small losses by total internal reflections. WGMR is the core component of optical filters, ultra-narrow linewidth laser, microwave photoelectric oscillator, optical frequency comb, rubidium atomic clock etc and high-precision sensors. Q factor is defined as the ratio of the total energy of photons in WGMR to the loss lost in one propagation cycle. The energy loss of WGMR is discussed. The cutting dynamics model diagram was established based the cutting force model for turning. The key technology affecting WGMR’s Q factor was the fabrication process. The manufacture of ultra-high Q factor WGMR are realized through rough machining, ultra-precision turning and precision polishing. The processing of ultra-precision turning and precision polishing is reported in the paper. The important fabrication processing of WGMR is ultra-precision turning. The test results show that the Q value of WGMR is 1.5×10 9@1550nm by Q value measurement system. The surface roughness and shape error of WGMR are 0.6nm (Ra value) and 5.3nm (PV value) respectively, measured by white light interferometer.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":" 6","pages":"1296613 - 1296613-6"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138994919","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The Flexray illumination technology is a crucial resolution enhancement technique for immersion photolithography machines operating at nodes of 28nm and below. The Flexray pupil shaping Module is the key component of this pupil shaping technique. This module enables the generation of arbitrary illumination modes by adjusting the angular spectrum of the beam through a micro mirror array (MMA). To meet the requirements of optical characteristic detection, a multiparameter detection method has been proposed. The optical performance parameters, including polar non-balance, opening angle, azimuth angle, and ellipticity, are simultaneously obtained by imaging the intensity distribution on the pupil plane. Experimental measurements and analysis of illumination shapes using the Flexray Pupil Shaping Module have been conducted. The experimental results demonstrate that this measurement method can be applied to test the performance of the Flexray Pupil Shaping Module in lithography system.
{"title":"Performance measurement of FlexRay pupil shaping module in lithography system","authors":"Zenghui Yang, Fang Zhang, Jingpei Hu, Zhenxin Huang, Aijun Zeng, Huijie Huang","doi":"10.1117/12.3008032","DOIUrl":"https://doi.org/10.1117/12.3008032","url":null,"abstract":"The Flexray illumination technology is a crucial resolution enhancement technique for immersion photolithography machines operating at nodes of 28nm and below. The Flexray pupil shaping Module is the key component of this pupil shaping technique. This module enables the generation of arbitrary illumination modes by adjusting the angular spectrum of the beam through a micro mirror array (MMA). To meet the requirements of optical characteristic detection, a multiparameter detection method has been proposed. The optical performance parameters, including polar non-balance, opening angle, azimuth angle, and ellipticity, are simultaneously obtained by imaging the intensity distribution on the pupil plane. Experimental measurements and analysis of illumination shapes using the Flexray Pupil Shaping Module have been conducted. The experimental results demonstrate that this measurement method can be applied to test the performance of the Flexray Pupil Shaping Module in lithography system.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":" 24","pages":"129631M - 129631M-7"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138994986","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
In this paper, we develop and demonstrate a proof-of-principle OEO, which features ultra-low phase noise in a Ka frequency band. The prototype of the whole OEO is in a cylindrical form. The optical fibers are wound on the outside, while all the optoelectronic devices are in the center. The fiber transmission noise is suppressed via phase modulation for the power redistribution. The spur-level improvement and steady state operation is guaranteed by dual-loop structure with 8.7 km and 11.6 km fiber spools, respectively. The optical power loss is reduced by the dual-output electro-optical intensity modulator (DEOM) instead of another 50:50 optical coupler. The noise floor for the fiber link from laser intensity and phase noises is suppressed by the balanced photodetector (PD) with specialized working conditions. Performance is investigated in detail. The OEO operates at the frequency of 30 GHz with the spur suppression of 74.6 dBc. The phase noise of -130.7 dBc/Hz (-149.1 dBc/Hz) @1 kHz (10 kHz), respectively, are achieved. The spectral purity is much higher than the current commercial signal source and equipment. Further, the developed OEO is applied to the frequency conversion. The RF signal, to be converted with a frequency of 7 GHz, is coupled into the OEO. Each beat results with OEO are observed clearly. All these results show that OEO has broad prospects in high precision infrastructure and projects.
{"title":"Ultra-low-phase-noise Ka band microwave optoelectronic oscillator and its application in frequency conversion","authors":"Hao Zhang, Caibin Yu, Pengfei Qu, Lijun Sun","doi":"10.1117/12.3007575","DOIUrl":"https://doi.org/10.1117/12.3007575","url":null,"abstract":"In this paper, we develop and demonstrate a proof-of-principle OEO, which features ultra-low phase noise in a Ka frequency band. The prototype of the whole OEO is in a cylindrical form. The optical fibers are wound on the outside, while all the optoelectronic devices are in the center. The fiber transmission noise is suppressed via phase modulation for the power redistribution. The spur-level improvement and steady state operation is guaranteed by dual-loop structure with 8.7 km and 11.6 km fiber spools, respectively. The optical power loss is reduced by the dual-output electro-optical intensity modulator (DEOM) instead of another 50:50 optical coupler. The noise floor for the fiber link from laser intensity and phase noises is suppressed by the balanced photodetector (PD) with specialized working conditions. Performance is investigated in detail. The OEO operates at the frequency of 30 GHz with the spur suppression of 74.6 dBc. The phase noise of -130.7 dBc/Hz (-149.1 dBc/Hz) @1 kHz (10 kHz), respectively, are achieved. The spectral purity is much higher than the current commercial signal source and equipment. Further, the developed OEO is applied to the frequency conversion. The RF signal, to be converted with a frequency of 7 GHz, is coupled into the OEO. Each beat results with OEO are observed clearly. All these results show that OEO has broad prospects in high precision infrastructure and projects.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":"7 2","pages":"129661O - 129661O-4"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138995031","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Right-angle conical mirror is widely used for wavefront conversion, which can construct a null interferometric optical path to achieve interferometric measurement of the cylindrical full-surface topography. However, the effect of the misalignment error on measurements is very significant, due to the difficulty in adjusting the position and attitude of the right-angle conical mirror and the measured cylindrical surface to the ideal state. The pure tilt misalignment errors will lead to parallel interference fringes. Based on this important finding, we propose a fast separation method of translation and tilt misalignment errors. First, adjust the relative translation of the right-angle conical mirror and the cylinder to be measured until all interference fringes are parallel. Then, perform measurement and remove the regular primary tilt from the result to separate the misalignment error effectively, so that the cylindrical full-surface topography is obtained. Under various misalignment errors, the extreme difference of all the PV values of the cylindrical surfaces measured by our method is less than 0.07λ. Experiments indicate that the proposed method can obtain essentially consistent measurements under different misalignment errors. Furthermore, the method is simple to operate and requires no data processing, laying the foundation for the practical application of cylindrical full-surface interferometry measurement.
{"title":"Fast separation method of misalignment errors for cylindrical full-surface interferometry","authors":"Hui Zhang, Fang Ji, Qian Liu","doi":"10.1117/12.3008115","DOIUrl":"https://doi.org/10.1117/12.3008115","url":null,"abstract":"Right-angle conical mirror is widely used for wavefront conversion, which can construct a null interferometric optical path to achieve interferometric measurement of the cylindrical full-surface topography. However, the effect of the misalignment error on measurements is very significant, due to the difficulty in adjusting the position and attitude of the right-angle conical mirror and the measured cylindrical surface to the ideal state. The pure tilt misalignment errors will lead to parallel interference fringes. Based on this important finding, we propose a fast separation method of translation and tilt misalignment errors. First, adjust the relative translation of the right-angle conical mirror and the cylinder to be measured until all interference fringes are parallel. Then, perform measurement and remove the regular primary tilt from the result to separate the misalignment error effectively, so that the cylindrical full-surface topography is obtained. Under various misalignment errors, the extreme difference of all the PV values of the cylindrical surfaces measured by our method is less than 0.07λ. Experiments indicate that the proposed method can obtain essentially consistent measurements under different misalignment errors. Furthermore, the method is simple to operate and requires no data processing, laying the foundation for the practical application of cylindrical full-surface interferometry measurement.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":" 35","pages":"129640P - 129640P-7"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138963509","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Aiming at the problem of reconnaissance and positioning of ground targets by airborne photoelectric detection equipment, this paper firstly studies the problem and model of multi-cooperative positioning based on distance measurement, and analyzes the factors affecting the positioning accuracy. Then, three solving methods of multicooperative target location based on distance measurement are proposed: least square algorithm, traditional particle swarm optimization algorithm and improved particle swarm optimization algorithm based on least square. The positioning accuracy and efficiency of the above three algorithms are simulated and compared in MATLAB, and the above algorithms are verified by flight test data. The experimental results show that the improved particle swarm optimization algorithm based on least squares has high computational accuracy and efficiency for solving the location equation of cooperative distance measurement.
{"title":"Analysis and implementation of multi-cooperative target location algorithm based on distance measurement","authors":"Shixiong Luo, Chuangang Xu, Jiangpeng Song","doi":"10.1117/12.3006994","DOIUrl":"https://doi.org/10.1117/12.3006994","url":null,"abstract":"Aiming at the problem of reconnaissance and positioning of ground targets by airborne photoelectric detection equipment, this paper firstly studies the problem and model of multi-cooperative positioning based on distance measurement, and analyzes the factors affecting the positioning accuracy. Then, three solving methods of multicooperative target location based on distance measurement are proposed: least square algorithm, traditional particle swarm optimization algorithm and improved particle swarm optimization algorithm based on least square. The positioning accuracy and efficiency of the above three algorithms are simulated and compared in MATLAB, and the above algorithms are verified by flight test data. The experimental results show that the improved particle swarm optimization algorithm based on least squares has high computational accuracy and efficiency for solving the location equation of cooperative distance measurement.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":" 13","pages":"129630L - 129630L-11"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138963625","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Fei Yu, Shuai Hou, Dan Hou, Han Zhang, Nihui Xie, Liu Yang, ChunHui Liao
The field of view of optical imaging systems is limited, making it difficult to meet the needs of continuous tracking of multiple targets in different orientations in a wide spatial domain, even in the 4 π spatial domain. Therefore, based on the two-dimensional tracking rotating platform, an unscented Kalman motion estimation algorithm based on target motion characteristics and an optimization algorithm for multi-objective switching tracking based on motion target matching, tracking convergence, and platform rotation ability have been proposed. The ultimate goal is to achieve continuous tracking of multiple spatial targets over a wide area. The development of a light and small space two-dimensional rotating platform tracking system is completed. The target detection coverage achieved is better than ± 180° in both pitch and azimuth directions. Continuous observation and tracking of better than 8 targets has been achieved through target motion estimation and switching tracking methods.
{"title":"A new method of multi-target tracking in wide-area for dealing with the threat of small celestial bodies in space","authors":"Fei Yu, Shuai Hou, Dan Hou, Han Zhang, Nihui Xie, Liu Yang, ChunHui Liao","doi":"10.1117/12.3007852","DOIUrl":"https://doi.org/10.1117/12.3007852","url":null,"abstract":"The field of view of optical imaging systems is limited, making it difficult to meet the needs of continuous tracking of multiple targets in different orientations in a wide spatial domain, even in the 4 π spatial domain. Therefore, based on the two-dimensional tracking rotating platform, an unscented Kalman motion estimation algorithm based on target motion characteristics and an optimization algorithm for multi-objective switching tracking based on motion target matching, tracking convergence, and platform rotation ability have been proposed. The ultimate goal is to achieve continuous tracking of multiple spatial targets over a wide area. The development of a light and small space two-dimensional rotating platform tracking system is completed. The target detection coverage achieved is better than ± 180° in both pitch and azimuth directions. Continuous observation and tracking of better than 8 targets has been achieved through target motion estimation and switching tracking methods.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":" 46","pages":"129650C - 129650C-11"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138964389","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Zhuoyun Li, Yang Chen, Qing Wang, Mingbin Yu, Shuxiao Wang, Yan Cai
Applying various functional materials to silicon to enhance the functionality of silicon photonics is a potential solution for silicon photonics platform under the requirement of CMOS compatibility. In this paper, two LN heterogeneous integration platforms have been proposed. One is the integration of LN film with a 220 nm top silicon SOI platform, in which the simulated results demonstrate that the designed modulator has a low half wave-voltage length product of 2.27 V·cm. And the other is the integration of LN film with a 400 nm top silicon nitride on insulator platform, in which the the proposed device achieves a VpiL of 2.58 V·cm and a 3-dB bandwidth of ~130 GHz with 7-mm long modulation region is verified by simulation.
{"title":"Design of MZI electro-optic modulator on lithium niobate heterogeneous integration platforms","authors":"Zhuoyun Li, Yang Chen, Qing Wang, Mingbin Yu, Shuxiao Wang, Yan Cai","doi":"10.1117/12.3007772","DOIUrl":"https://doi.org/10.1117/12.3007772","url":null,"abstract":"Applying various functional materials to silicon to enhance the functionality of silicon photonics is a potential solution for silicon photonics platform under the requirement of CMOS compatibility. In this paper, two LN heterogeneous integration platforms have been proposed. One is the integration of LN film with a 220 nm top silicon SOI platform, in which the simulated results demonstrate that the designed modulator has a low half wave-voltage length product of 2.27 V·cm. And the other is the integration of LN film with a 400 nm top silicon nitride on insulator platform, in which the the proposed device achieves a VpiL of 2.58 V·cm and a 3-dB bandwidth of ~130 GHz with 7-mm long modulation region is verified by simulation.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":"96 1","pages":"129661U - 129661U-7"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138965017","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
In order to overcome the shortcomings of the aiming system in inertial confinement fusion device, such as small field of view, long preparation time and large manual interpretation error, a vision aiming system based on diffraction effect is designed. After the diffraction of the reflected light of the target, the starlight detection device is used to detect the center of the target automatically, which reduces the manual interpretation error. The system uses forward illumination to improve imaging integrity, uses quarter-wave plate and polarization splitter to improve system energy utilization, uses diffraction effect and starlight detector to improve aiming accuracy up to 9.52 μm, which reduces preparation time. The quality of illumination system and diffraction system is evaluated by using spot diagram in Zemax, and the simulation of the system is carried out. The results meet the engineering requirements.
{"title":"Visual aiming and positioning system based on diffraction effect","authors":"Fusheng Li, Zheng-mao Xie","doi":"10.1117/12.2692331","DOIUrl":"https://doi.org/10.1117/12.2692331","url":null,"abstract":"In order to overcome the shortcomings of the aiming system in inertial confinement fusion device, such as small field of view, long preparation time and large manual interpretation error, a vision aiming system based on diffraction effect is designed. After the diffraction of the reflected light of the target, the starlight detection device is used to detect the center of the target automatically, which reduces the manual interpretation error. The system uses forward illumination to improve imaging integrity, uses quarter-wave plate and polarization splitter to improve system energy utilization, uses diffraction effect and starlight detector to improve aiming accuracy up to 9.52 μm, which reduces preparation time. The quality of illumination system and diffraction system is evaluated by using spot diagram in Zemax, and the simulation of the system is carried out. The results meet the engineering requirements.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":"108 2","pages":"1296402 - 1296402-13"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138965086","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Jinyao Duan, Jinkun Zheng, Yang Yang, Yuchao Song, Anpeng Lai, Bo Wang, Weiwei Cao, Yonglin Bai
In this paper, we mainly study the problem of electron cloud diffusion in high-speed ultraviolet photonic imaging detectors. In this paper, the size of the electron cloud transmitted by the microchannel plate and the anode in the high-speed ultraviolet photon imaging detector is studied by simulation, including the bias angle, pore diameter, voltage (U) and distance between MCP and anode (l) on the electron cloud received by the anode. the diffusion radius of the electron cloud increases with the increase of the bias angle, and the voltage (U) and the distance (l) between the MCP and the anode on the electron cloud received by the anode. The research shows that the diffusion radius of the electron cloud increases with the increase of the bias angle, the diffusion radius of the electron cloud. When U is larger, the energy of electron cloud is also higher. When the voltage increases to 1900V, the electron movement speed increases linearly with the increase of U. Moreover, the diffusion distance of the electron cloud radius increases with the increase of the transmission distance l. When the distance is 2 mm, a maximum electron diffusion radius is obtained. When the bias angle is 10°, the pore diameter is 10um, the voltage is 2000V, and the distance l is 0.5mm, the diffusion ratio of the electron cloud is 5.5.
本文主要研究高速紫外光子成像探测器中的电子云扩散问题。本文通过仿真研究了高速紫外光子成像探测器中微通道板和阳极传输的电子云的大小，包括偏置角、孔径、电压（U）和 MCP 与阳极之间的距离（l）对阳极接收到的电子云的影响，电子云的扩散半径随偏置角的增大而增大，电压（U）和 MCP 与阳极之间的距离（l）对阳极接收到的电子云的影响。研究表明，电子云的扩散半径随偏压角的增大而增大，电子云的扩散半径随偏压角的增大而增大。当 U 越大时，电子云的能量也越高。此外，电子云半径的扩散距离随传输距离 l 的增加而增加。当传输距离为 2 mm 时，电子扩散半径最大。当偏置角为 10°、孔径为 10um、电压为 2000V、传输距离 l 为 0.5mm 时，电子云的扩散比为 5.5。
{"title":"Diffusion of electron clouds in high-speed ultraviolet photonic imaging detectors","authors":"Jinyao Duan, Jinkun Zheng, Yang Yang, Yuchao Song, Anpeng Lai, Bo Wang, Weiwei Cao, Yonglin Bai","doi":"10.1117/12.3007806","DOIUrl":"https://doi.org/10.1117/12.3007806","url":null,"abstract":"In this paper, we mainly study the problem of electron cloud diffusion in high-speed ultraviolet photonic imaging detectors. In this paper, the size of the electron cloud transmitted by the microchannel plate and the anode in the high-speed ultraviolet photon imaging detector is studied by simulation, including the bias angle, pore diameter, voltage (U) and distance between MCP and anode (l) on the electron cloud received by the anode. the diffusion radius of the electron cloud increases with the increase of the bias angle, and the voltage (U) and the distance (l) between the MCP and the anode on the electron cloud received by the anode. The research shows that the diffusion radius of the electron cloud increases with the increase of the bias angle, the diffusion radius of the electron cloud. When U is larger, the energy of electron cloud is also higher. When the voltage increases to 1900V, the electron movement speed increases linearly with the increase of U. Moreover, the diffusion distance of the electron cloud radius increases with the increase of the transmission distance l. When the distance is 2 mm, a maximum electron diffusion radius is obtained. When the bias angle is 10°, the pore diameter is 10um, the voltage is 2000V, and the distance l is 0.5mm, the diffusion ratio of the electron cloud is 5.5.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":"131 5","pages":"129590Z - 129590Z-7"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138965097","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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