Pub Date : 2013-04-07DOI: 10.1109/NEMS.2013.6559715
L. Nannan, C. Jing
Embedded microchannels are required in many microfluidic devices. However, the channels may reduce the strength of the bulk substrate. In this study, Nanostructured TiO2(NST) material is proposed to provide the fluid passage for the drug into the required location while still maintains very good strength. A simple method was proposed to obtain the pressure drop over NST filled channel and the fluid resistance was experimentally determined. The Darcy' equation of NST films was setup, and the permeability was measured 1.475×10-11 m2. With a relatively high fluid resistance, further optimization should be carried out for NST microfluidic devices.
{"title":"Characterization of fluid resistance in nanostructured TiO2 (NST) film","authors":"L. Nannan, C. Jing","doi":"10.1109/NEMS.2013.6559715","DOIUrl":"https://doi.org/10.1109/NEMS.2013.6559715","url":null,"abstract":"Embedded microchannels are required in many microfluidic devices. However, the channels may reduce the strength of the bulk substrate. In this study, Nanostructured TiO2(NST) material is proposed to provide the fluid passage for the drug into the required location while still maintains very good strength. A simple method was proposed to obtain the pressure drop over NST filled channel and the fluid resistance was experimentally determined. The Darcy' equation of NST films was setup, and the permeability was measured 1.475×10-11 m2. With a relatively high fluid resistance, further optimization should be carried out for NST microfluidic devices.","PeriodicalId":308928,"journal":{"name":"The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2013-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122029385","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-04-07DOI: 10.1109/NEMS.2013.6559712
Jerry Yu, Y. Liu, F. Cai, M. Shafiei, Gang Chen, N. Motta, W. Wlodarski, K. Kalantar-zadeh, P. Lai
In this work, we investigate how hydrogen sensing performance of thermally evaporated MoO3 nano-platelets can be further improved by RF sputtering a thin layer of tantalum oxide (Ta2O5) or lanthanum oxide (La2O3). We show that dissociated hydrogen atoms cause the thin film layer to be polarised, inducing a measurable potential difference greater than that as reported previously. We attribute these observations to the presence of numerous traps in the thin layer; their states allow a stronger trapping of charge at the Pt-thin film oxide interface as compared to the MoO3 sensors without the coating. Under exposure to H2 (10 000 ppm), the maximum change in dielectric constant is 45.6 (at 260 °C) for the Ta2O5/MoO3 nanoplatelets and 31.6 (at 220 °C) for the La2O3/MoO3 nano-platelets. Subsequently, the maximum sensitivity for the Ta2O5/MoO3 and La2O3/MoO3 based sensors is 16.8 and 7.5, respectively.
{"title":"A comparison study on hydrogen sensing performance of Pt/MoO3 nanoplatelets coated with a thin layer of Ta2O5 or La2O3","authors":"Jerry Yu, Y. Liu, F. Cai, M. Shafiei, Gang Chen, N. Motta, W. Wlodarski, K. Kalantar-zadeh, P. Lai","doi":"10.1109/NEMS.2013.6559712","DOIUrl":"https://doi.org/10.1109/NEMS.2013.6559712","url":null,"abstract":"In this work, we investigate how hydrogen sensing performance of thermally evaporated MoO<sub>3</sub> nano-platelets can be further improved by RF sputtering a thin layer of tantalum oxide (Ta<sub>2</sub>O<sub>5</sub>) or lanthanum oxide (La<sub>2</sub>O<sub>3</sub>). We show that dissociated hydrogen atoms cause the thin film layer to be polarised, inducing a measurable potential difference greater than that as reported previously. We attribute these observations to the presence of numerous traps in the thin layer; their states allow a stronger trapping of charge at the Pt-thin film oxide interface as compared to the MoO<sub>3</sub> sensors without the coating. Under exposure to H<sub>2</sub> (10 000 ppm), the maximum change in dielectric constant is 45.6 (at 260 °C) for the Ta<sub>2</sub>O<sub>5</sub>/MoO<sub>3</sub> nanoplatelets and 31.6 (at 220 °C) for the La<sub>2</sub>O<sub>3</sub>/MoO<sub>3</sub> nano-platelets. Subsequently, the maximum sensitivity for the Ta<sub>2</sub>O<sub>5</sub>/MoO<sub>3</sub> and La<sub>2</sub>O<sub>3</sub>/MoO<sub>3</sub> based sensors is 16.8 and 7.5, respectively.","PeriodicalId":308928,"journal":{"name":"The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2013-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122120213","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-04-07DOI: 10.1109/NEMS.2013.6559917
J. Bausells, G. Tosolini, Y. Birhane, F. Pérez-Murano
We have developed self-sensing piezoresistive microcantilevers optimized for the measurement of (biomolecular) forces. Typical dimensions are 250 μm in length, 8-20 μm in width and 450 nm in thickness, with spring constants of about 1 mN/m. The devices have been electromechanically tested on wafer and show good force resolutions in air between 35 and 130 pN depending on the cantilever dimensions. We have also tested the electromechanical behavior of the cantilevers in liquid environment and we show that both the force sensitivity and the noise characteristics of the devices are not noticeably degraded as compared with their response in air. This opens the way to the use of the cantilevers in single molecule force spectroscopy of biomolecules.
{"title":"Piezoresistive probes for (biomolecular) force sensing","authors":"J. Bausells, G. Tosolini, Y. Birhane, F. Pérez-Murano","doi":"10.1109/NEMS.2013.6559917","DOIUrl":"https://doi.org/10.1109/NEMS.2013.6559917","url":null,"abstract":"We have developed self-sensing piezoresistive microcantilevers optimized for the measurement of (biomolecular) forces. Typical dimensions are 250 μm in length, 8-20 μm in width and 450 nm in thickness, with spring constants of about 1 mN/m. The devices have been electromechanically tested on wafer and show good force resolutions in air between 35 and 130 pN depending on the cantilever dimensions. We have also tested the electromechanical behavior of the cantilevers in liquid environment and we show that both the force sensitivity and the noise characteristics of the devices are not noticeably degraded as compared with their response in air. This opens the way to the use of the cantilevers in single molecule force spectroscopy of biomolecules.","PeriodicalId":308928,"journal":{"name":"The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2013-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128796629","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-04-07DOI: 10.1109/NEMS.2013.6559763
Huiming Xu, Hong Zhang, Zhiqiang Deng, H. San, Yuxi Yu
Silicon-based piezoresistive pressure sensors are generally fabricated as a piezo-sensitive diaphragm by using MEMS technology and SOI wafer. Lots of innovations and improvements have been made for silicon pressure sensor to increase its performance and reliability. It is found that the quality of Si-Si bonding will directly affect the performing of SOI substrate removing processes. The main problem is that the etching liquid infiltrate into bonding interface from the defect position of bonding wafer edge, resulting in the damage and corrosion of bonding wafer. To solve this problem, the paper presents an etching fixture design for effectively protecting the bonding wafer edge. Experimentally, a SOI-Si bonding wafer with poor quality in bonding edge was used to fabricate the piezoresistive pressure sensors by using the etching fixture. The experimental results show the use of etching fixture did not damage the bonding wafer and made a nice removal of SOI substrate. The fabricated pressure sensors wafers are also presented.
{"title":"Fabrication of silicon piezoresistive pressure sensor using a reliable wet etching process","authors":"Huiming Xu, Hong Zhang, Zhiqiang Deng, H. San, Yuxi Yu","doi":"10.1109/NEMS.2013.6559763","DOIUrl":"https://doi.org/10.1109/NEMS.2013.6559763","url":null,"abstract":"Silicon-based piezoresistive pressure sensors are generally fabricated as a piezo-sensitive diaphragm by using MEMS technology and SOI wafer. Lots of innovations and improvements have been made for silicon pressure sensor to increase its performance and reliability. It is found that the quality of Si-Si bonding will directly affect the performing of SOI substrate removing processes. The main problem is that the etching liquid infiltrate into bonding interface from the defect position of bonding wafer edge, resulting in the damage and corrosion of bonding wafer. To solve this problem, the paper presents an etching fixture design for effectively protecting the bonding wafer edge. Experimentally, a SOI-Si bonding wafer with poor quality in bonding edge was used to fabricate the piezoresistive pressure sensors by using the etching fixture. The experimental results show the use of etching fixture did not damage the bonding wafer and made a nice removal of SOI substrate. The fabricated pressure sensors wafers are also presented.","PeriodicalId":308928,"journal":{"name":"The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2013-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129449328","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-04-07DOI: 10.1109/NEMS.2013.6559684
Yu-Hsiang Tang, Yu-Hsin Lin, Jr-Jung Yang, M. Shiao
In this paper, we focus on the development of membrane-typed metal mould with microstructures for imprinting. This mould has several benefits including reusable, easy replaceable core, and low cost that strongly improves industrial values in microstructure mass production. The membrane-typed metal mould with a thickness of 60 μm can be attached to a level mould or a roller mould, and becomes a metal core for the polymer microstructure imprint for mass production of products over large surface area. Photolithography, electroforming, and grinding techniques have been integrated in order to develop the membrane-typed metal mould in this research. It has been proven that the metal mould of micro pillars could be successfully fabricated. This metal mould was fabricated by precision electroforming technology that Ni-Co alloy was deposited on a photoresist mould, and further peeled off to attach onto a level mould. The hardness, stiffness and toughness of the Ni-Co alloy material core structure were sufficient and strong enough for reusable duration. The durability of this membrane-typed metal mould has been greatly enhanced. Furthermore, by applying roller assisted attaching mechanism, the interface between the mould and Ni-Co alloy core became more inseparable and flat. According to the experimental measurement results, the uniformity has been controlled between ± 5 μm. The reproducing accuracy of the polymer microstructures can also be effectively enhanced.
{"title":"Fabrication of membrane-typed metal mould with microstructures and application for roller imprinting","authors":"Yu-Hsiang Tang, Yu-Hsin Lin, Jr-Jung Yang, M. Shiao","doi":"10.1109/NEMS.2013.6559684","DOIUrl":"https://doi.org/10.1109/NEMS.2013.6559684","url":null,"abstract":"In this paper, we focus on the development of membrane-typed metal mould with microstructures for imprinting. This mould has several benefits including reusable, easy replaceable core, and low cost that strongly improves industrial values in microstructure mass production. The membrane-typed metal mould with a thickness of 60 μm can be attached to a level mould or a roller mould, and becomes a metal core for the polymer microstructure imprint for mass production of products over large surface area. Photolithography, electroforming, and grinding techniques have been integrated in order to develop the membrane-typed metal mould in this research. It has been proven that the metal mould of micro pillars could be successfully fabricated. This metal mould was fabricated by precision electroforming technology that Ni-Co alloy was deposited on a photoresist mould, and further peeled off to attach onto a level mould. The hardness, stiffness and toughness of the Ni-Co alloy material core structure were sufficient and strong enough for reusable duration. The durability of this membrane-typed metal mould has been greatly enhanced. Furthermore, by applying roller assisted attaching mechanism, the interface between the mould and Ni-Co alloy core became more inseparable and flat. According to the experimental measurement results, the uniformity has been controlled between ± 5 μm. The reproducing accuracy of the polymer microstructures can also be effectively enhanced.","PeriodicalId":308928,"journal":{"name":"The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2013-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130348271","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-04-07DOI: 10.1109/NEMS.2013.6559826
P. Dai, Honglu Zhang, Tie Li, Yuelin Wang, J. Chao, C. Fan
DNA origami, in which a long single strand of DNA is folded into a shape using shorter `staple Strands', promises low-cost ways to create nanoscale shapes and can even display patterns of binding sites of 6-nm-resolution, in principle allowing complex arrangements of carbon nanotubes, silicon nanowires, or quantum dots [1]. However, adsorption of origami appears better results on mica substrate, which cannot compatible with the complementary metal oxide semiconductor (CMOS) process. Here we describe a method to improve the adsorption of origami on silicon substrate, by quantitative control of the adsorption conditions, which will hopefully make contributions for churning out nanoscale shapes with CMOS process in the future.
{"title":"Improvement of DNA Origami's adsorption on silicon substrate","authors":"P. Dai, Honglu Zhang, Tie Li, Yuelin Wang, J. Chao, C. Fan","doi":"10.1109/NEMS.2013.6559826","DOIUrl":"https://doi.org/10.1109/NEMS.2013.6559826","url":null,"abstract":"DNA origami, in which a long single strand of DNA is folded into a shape using shorter `staple Strands', promises low-cost ways to create nanoscale shapes and can even display patterns of binding sites of 6-nm-resolution, in principle allowing complex arrangements of carbon nanotubes, silicon nanowires, or quantum dots [1]. However, adsorption of origami appears better results on mica substrate, which cannot compatible with the complementary metal oxide semiconductor (CMOS) process. Here we describe a method to improve the adsorption of origami on silicon substrate, by quantitative control of the adsorption conditions, which will hopefully make contributions for churning out nanoscale shapes with CMOS process in the future.","PeriodicalId":308928,"journal":{"name":"The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2013-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123674864","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-04-07DOI: 10.1109/NEMS.2013.6559857
F. Tsumori, Kenji Hatama, Hyungoo Kang, Toshiko Osada, H. Miura
This paper reports a magnetic actuator using interaction between micro magnetic elements. It was already reported that the present actuator can work even if the structure was miniaturized to nano-scale. In the present work, simple fabrication process with photolithography and PDMS casting was employed to obtain beam type structures with micro array of magnetic elements on their surface. Two samples with simple grid patterns were prepared for testing. These samples had the same grid pattern but different orientation, which caused directly opposite bending deformation under the same applied magnetic field. We used magneto finite element method (FEM) to explain the behavior of the present actuators.
{"title":"Magneto-FEM analysis for micro actuator using array of magnetic elements","authors":"F. Tsumori, Kenji Hatama, Hyungoo Kang, Toshiko Osada, H. Miura","doi":"10.1109/NEMS.2013.6559857","DOIUrl":"https://doi.org/10.1109/NEMS.2013.6559857","url":null,"abstract":"This paper reports a magnetic actuator using interaction between micro magnetic elements. It was already reported that the present actuator can work even if the structure was miniaturized to nano-scale. In the present work, simple fabrication process with photolithography and PDMS casting was employed to obtain beam type structures with micro array of magnetic elements on their surface. Two samples with simple grid patterns were prepared for testing. These samples had the same grid pattern but different orientation, which caused directly opposite bending deformation under the same applied magnetic field. We used magneto finite element method (FEM) to explain the behavior of the present actuators.","PeriodicalId":308928,"journal":{"name":"The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2013-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121331968","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-04-07DOI: 10.1109/NEMS.2013.6559825
C. Liang, Wenrong Wang, Tie Li, Yuelin Wang
In this paper, the anisotropic hydrogen etching effect on chemical vapor deposited sing-crystal graphene domains was reported. After synthesized by chemical vapor deposition on copper foils, the graphene domains were exposed to a mixed gas flow of argon and hydrogen for etching. By varying the etching temperature from 800°C to 1050°C, hexagonal openings inside the graphene domains were found on hydrogen etched samples. The dependence of substrate was then studied and the result indicated that copper was necessary in the etching process as catalyst. At last, etching experiments were performed on high quality single-crystal graphene domains, and the result showed that the hexagonal single-crystal graphene domains were etched to circular.
{"title":"Hydrogen etching effect on single-crystal graphene domains","authors":"C. Liang, Wenrong Wang, Tie Li, Yuelin Wang","doi":"10.1109/NEMS.2013.6559825","DOIUrl":"https://doi.org/10.1109/NEMS.2013.6559825","url":null,"abstract":"In this paper, the anisotropic hydrogen etching effect on chemical vapor deposited sing-crystal graphene domains was reported. After synthesized by chemical vapor deposition on copper foils, the graphene domains were exposed to a mixed gas flow of argon and hydrogen for etching. By varying the etching temperature from 800°C to 1050°C, hexagonal openings inside the graphene domains were found on hydrogen etched samples. The dependence of substrate was then studied and the result indicated that copper was necessary in the etching process as catalyst. At last, etching experiments were performed on high quality single-crystal graphene domains, and the result showed that the hexagonal single-crystal graphene domains were etched to circular.","PeriodicalId":308928,"journal":{"name":"The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2013-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116286441","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-04-07DOI: 10.1109/NEMS.2013.6559767
Mengdi Han, Y. C. Chan, Wen Liu, Shouhe Zhang, Haixia Zhang
This paper reports the design, test and application of a novel low frequency piezoelectric energy harvester. To achieve high output voltage at low frequency, both d31 and d33 modes of polyvinylidene fluoride (PVDF) are utilized in this device. Output voltage of the device are tested under different frequencies and accelerations. Rectifying bridge is used to reverse signals with negative signs and capacitors can be charged to light up a light emitting diode (LED).
{"title":"Low frequency PVDF piezoelectric energy harvester with combined d31 and d33 operating modes","authors":"Mengdi Han, Y. C. Chan, Wen Liu, Shouhe Zhang, Haixia Zhang","doi":"10.1109/NEMS.2013.6559767","DOIUrl":"https://doi.org/10.1109/NEMS.2013.6559767","url":null,"abstract":"This paper reports the design, test and application of a novel low frequency piezoelectric energy harvester. To achieve high output voltage at low frequency, both d31 and d33 modes of polyvinylidene fluoride (PVDF) are utilized in this device. Output voltage of the device are tested under different frequencies and accelerations. Rectifying bridge is used to reverse signals with negative signs and capacitors can be charged to light up a light emitting diode (LED).","PeriodicalId":308928,"journal":{"name":"The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2013-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116479963","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-04-07DOI: 10.1109/NEMS.2013.6559859
Lurui Zhao, Can Li, D. She, Zhiqiang Wang, Jun Xu, Wengang Wu
This paper presents a fabrication method for anisotropic nanomaterial by operating nanowires by focused-ion-beam (FIB) irradiation. After the preparation of one-dimensional nanowire, FIB irradiation is applied on the nanowire to operate its orientation and morphology by choosing irradiation position and area. On one hand, localized FIB irradiation is employed to precisely operate the morphology of the planar ultra-fine nanowire prepared by FIB induced fluidization and self-perfect process driven by the material diffusion process. On the other hand, large area FIB scanning is applied to achieve the orientation adjustment of high-density nanowire bunch and nano-forest obtained by oxygen plasma etching. When nanowire is irradiated, unbalanced stress is introduced at different side, and thus nanowire bends to balance the stress. Based on this approach, both single and large area of nanowire structure can be controlled, and anisotropic nanomaterial is realized.
{"title":"Fabrication of anisotropic nanomaterial by precise and large-area nanowire operation with focused-ion-beam","authors":"Lurui Zhao, Can Li, D. She, Zhiqiang Wang, Jun Xu, Wengang Wu","doi":"10.1109/NEMS.2013.6559859","DOIUrl":"https://doi.org/10.1109/NEMS.2013.6559859","url":null,"abstract":"This paper presents a fabrication method for anisotropic nanomaterial by operating nanowires by focused-ion-beam (FIB) irradiation. After the preparation of one-dimensional nanowire, FIB irradiation is applied on the nanowire to operate its orientation and morphology by choosing irradiation position and area. On one hand, localized FIB irradiation is employed to precisely operate the morphology of the planar ultra-fine nanowire prepared by FIB induced fluidization and self-perfect process driven by the material diffusion process. On the other hand, large area FIB scanning is applied to achieve the orientation adjustment of high-density nanowire bunch and nano-forest obtained by oxygen plasma etching. When nanowire is irradiated, unbalanced stress is introduced at different side, and thus nanowire bends to balance the stress. Based on this approach, both single and large area of nanowire structure can be controlled, and anisotropic nanomaterial is realized.","PeriodicalId":308928,"journal":{"name":"The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2013-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124297100","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
京公网安备 11010802042870号
京ICP备2023020795号-1
扫码关注我们
求助内容：
应助结果提醒方式：