首页 > 最新文献

2005 IEEE International Wkshp on Radio-Frequency Integration Technology: Integrated Circuits for Wideband Comm & Wireless Sensor Networks最新文献

英文 中文
RF system architectures and circuit techniques for wideband transceivers 宽带收发器的射频系统架构和电路技术
Hui Zheng, S. Lou, L. Leung, H. Luong
This paper addresses design consideration and potential solutions for single-chip CMOS wideband RF transceivers. System architectures are discussed together with their challenges as compared to conventional narrow-band systems. At the circuit level, various wideband design techniques for wideband matching, wideband loading, and wideband frequency tuning range is explored. Finally, detailed design and measurement results of an UWB LNA, an UWB synthesizer, and a wideband VCO is presented.
本文讨论了单片CMOS宽带射频收发器的设计考虑和潜在的解决方案。讨论了系统架构及其与传统窄带系统相比所面临的挑战。在电路层面,探讨了宽带匹配、宽带加载和宽带频率调谐范围的各种宽带设计技术。最后给出了UWB LNA、UWB合成器和宽带压控振荡器的详细设计和测试结果。
{"title":"RF system architectures and circuit techniques for wideband transceivers","authors":"Hui Zheng, S. Lou, L. Leung, H. Luong","doi":"10.1109/RFIT.2005.1598867","DOIUrl":"https://doi.org/10.1109/RFIT.2005.1598867","url":null,"abstract":"This paper addresses design consideration and potential solutions for single-chip CMOS wideband RF transceivers. System architectures are discussed together with their challenges as compared to conventional narrow-band systems. At the circuit level, various wideband design techniques for wideband matching, wideband loading, and wideband frequency tuning range is explored. Finally, detailed design and measurement results of an UWB LNA, an UWB synthesizer, and a wideband VCO is presented.","PeriodicalId":337918,"journal":{"name":"2005 IEEE International Wkshp on Radio-Frequency Integration Technology: Integrated Circuits for Wideband Comm & Wireless Sensor Networks","volume":"42 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127678537","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Air-interfacing microwave passive RFID tag in bulk CMOS 空接口微波无源RFID标签的批量CMOS
Y. Choi, W. Yeoh
Overcoming the price hurdle that hampers mass-scale RFID adoption, this paper examines the architectural trade-offs as well as design issues involved in the development of a passive RFID tag IC targeted for low cost high volume deployment. Peculiar air-interfacing problems related to power rectification, data demodulation and backscattering modulation are addressed through the discussion of a design example whereby a 2.45-GHz RFID tag IC has been implemented in standard CMOS process.
克服了阻碍大规模采用RFID的价格障碍,本文研究了针对低成本大批量部署的无源RFID标签IC开发所涉及的架构权衡和设计问题。通过讨论一个在标准CMOS工艺中实现2.45 ghz RFID标签IC的设计实例,解决了与功率整流、数据解调和后向散射调制相关的特殊空中接口问题。
{"title":"Air-interfacing microwave passive RFID tag in bulk CMOS","authors":"Y. Choi, W. Yeoh","doi":"10.1109/RFIT.2005.1598875","DOIUrl":"https://doi.org/10.1109/RFIT.2005.1598875","url":null,"abstract":"Overcoming the price hurdle that hampers mass-scale RFID adoption, this paper examines the architectural trade-offs as well as design issues involved in the development of a passive RFID tag IC targeted for low cost high volume deployment. Peculiar air-interfacing problems related to power rectification, data demodulation and backscattering modulation are addressed through the discussion of a design example whereby a 2.45-GHz RFID tag IC has been implemented in standard CMOS process.","PeriodicalId":337918,"journal":{"name":"2005 IEEE International Wkshp on Radio-Frequency Integration Technology: Integrated Circuits for Wideband Comm & Wireless Sensor Networks","volume":"64 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123662583","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Microwave noise characteristics of AlGaN/GaN HEMTs on high-resistivity silicon substrate 高阻硅衬底上AlGaN/GaN hemt的微波噪声特性
Z.H. Liu, S. Arulkumaran, G. Ng, W. Cheong, R. Zeng, J. Bu, H. Wang, K. Radhakrishnan, C.H. Tan
AlGaN/GaN high-electron-mobility-transistors (HEMTs) with 0.8-/spl mu/m- and 0.3 /spl mu/m-gate-length were successfully fabricated on high-resistivity (HR) silicon substrate. The cutoff frequency f/sub T/ values of 7 GHz, 22 GHz and maximum oscillation frequency f/sub max/ values of 23 GHz, 40 GHz were achieved for 0.8-/spl mu/m- and 0.3-/spl mu/m-gate-length device, respectively. A minimum noise figure (NF/sub min/) of 2.0 dB and an associate gain (G/sub ass/) of 10.3 dB were achieved at 10 GHz in 0.3-/spl mu/m-gate-length device. This shows the promising potential of AlGaN/GaN HEMTs on high-resistivity Si for cost effective low noise amplifiers.
在高阻硅衬底上成功制备了栅极长度分别为0.8-/spl mu/m和0.3 /spl mu/m的AlGaN/GaN高电子迁移率晶体管。对于0.8-/spl mu/m和0.3-/spl mu/m门长器件,截止频率f/sub / T/分别为7 GHz和22 GHz,最大振荡频率f/sub / max/分别为23 GHz和40 GHz。在0.3-/spl mu/m栅极长度器件中,在10 GHz频率下,最小噪声系数(NF/sub min/)为2.0 dB,相关增益(G/sub ass/)为10.3 dB。这显示了AlGaN/GaN hemt在高电阻率Si上用于低成本低噪声放大器的巨大潜力。
{"title":"Microwave noise characteristics of AlGaN/GaN HEMTs on high-resistivity silicon substrate","authors":"Z.H. Liu, S. Arulkumaran, G. Ng, W. Cheong, R. Zeng, J. Bu, H. Wang, K. Radhakrishnan, C.H. Tan","doi":"10.1109/RFIT.2005.1598891","DOIUrl":"https://doi.org/10.1109/RFIT.2005.1598891","url":null,"abstract":"AlGaN/GaN high-electron-mobility-transistors (HEMTs) with 0.8-/spl mu/m- and 0.3 /spl mu/m-gate-length were successfully fabricated on high-resistivity (HR) silicon substrate. The cutoff frequency f/sub T/ values of 7 GHz, 22 GHz and maximum oscillation frequency f/sub max/ values of 23 GHz, 40 GHz were achieved for 0.8-/spl mu/m- and 0.3-/spl mu/m-gate-length device, respectively. A minimum noise figure (NF/sub min/) of 2.0 dB and an associate gain (G/sub ass/) of 10.3 dB were achieved at 10 GHz in 0.3-/spl mu/m-gate-length device. This shows the promising potential of AlGaN/GaN HEMTs on high-resistivity Si for cost effective low noise amplifiers.","PeriodicalId":337918,"journal":{"name":"2005 IEEE International Wkshp on Radio-Frequency Integration Technology: Integrated Circuits for Wideband Comm & Wireless Sensor Networks","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123732628","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Relation between RF noise and gate oxide breakdown location in deep submicron NMOSFETs 深亚微米nmosfet中射频噪声与栅极氧化物击穿位置的关系
R. Zeng, Hong Wang
The relation between the location of gate oxide breakdown in deep submicron MOSFETs and noise characteristics has been studied. RF noise in the frequency range of 2 to 18 GHz of the devices with oxide breakdown at different locations are characterized and compared. The results show that degradation of noise parameter subject to gate oxide breakdown is not only related to breakdown hardness but also the location of the oxide breakdown path. For similar breakdown hardness, formation of the breakdown path closer to source side may result in a larger degradation of device RF noise performance. The physical origin behind oxide breakdown induced RF noise in MOSFETs is investigated. The study provides useful information for the use of MOSFETs for low noise circuits.
研究了深亚微米mosfet中栅极氧化物击穿位置与噪声特性的关系。对不同位置氧化击穿器件在2 ~ 18 GHz频率范围内的射频噪声进行了表征和比较。结果表明:栅极氧化物击穿后噪声参数的退化不仅与击穿硬度有关,还与氧化物击穿路径的位置有关。对于相似的击穿硬度,形成更靠近源侧的击穿路径可能导致更大的器件射频噪声性能下降。研究了mosfet中氧化击穿引起的射频噪声的物理来源。该研究为在低噪声电路中使用mosfet提供了有用的信息。
{"title":"Relation between RF noise and gate oxide breakdown location in deep submicron NMOSFETs","authors":"R. Zeng, Hong Wang","doi":"10.1109/RFIT.2005.1598890","DOIUrl":"https://doi.org/10.1109/RFIT.2005.1598890","url":null,"abstract":"The relation between the location of gate oxide breakdown in deep submicron MOSFETs and noise characteristics has been studied. RF noise in the frequency range of 2 to 18 GHz of the devices with oxide breakdown at different locations are characterized and compared. The results show that degradation of noise parameter subject to gate oxide breakdown is not only related to breakdown hardness but also the location of the oxide breakdown path. For similar breakdown hardness, formation of the breakdown path closer to source side may result in a larger degradation of device RF noise performance. The physical origin behind oxide breakdown induced RF noise in MOSFETs is investigated. The study provides useful information for the use of MOSFETs for low noise circuits.","PeriodicalId":337918,"journal":{"name":"2005 IEEE International Wkshp on Radio-Frequency Integration Technology: Integrated Circuits for Wideband Comm & Wireless Sensor Networks","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129224482","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
期刊
2005 IEEE International Wkshp on Radio-Frequency Integration Technology: Integrated Circuits for Wideband Comm & Wireless Sensor Networks
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1