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Proceedings of the 5th European Workshop on Low Temperature Electronics最新文献

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A 4.2 K readout channel in a standard 0.7 /spl mu/m CMOS process for a photoconductor array camera 用于光导体阵列相机的标准0.7 /spl mu/m CMOS工艺中的4.2 K读出通道
Pub Date : 2002-11-07 DOI: 10.1109/WOLTE.2002.1022481
Y. Creten, O. Charlier, P. Merken, J. Putzeys, C. van Hoof
Abstrsct:The cryogenic design of a cold CMOS readout channel to be used in the Photoconductor Array Camera and Spectrometer (PACS) aboard the Herschel Space Observatory (HSO, formerly called FIRST) [I], is presented. Robust architectures and optimized sizing reduce the effect of cryogenic anomalities on the circuit. Simulation results and tests, both at room temperature and 4 K show a non-linearity < 2%, a hysteresis of <5mV and noise < 100nV/H~”~ @ 30Hz.
摘要:介绍了用于赫歇尔空间天文台(HSO,以前称为FIRST)光导体阵列相机和光谱仪(PACS)的冷CMOS读出通道的低温设计[1]。稳健的结构和优化的尺寸减少了低温异常对电路的影响。在室温和4 K下的仿真和测试结果表明,非线性< 2%,迟滞<5mV,噪声< 100nV/H~”~ @ 30Hz。
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引用次数: 5
The impact of an external body-bias on the hot-carrier degradation of partially depleted SOI N-MOSFETs at cryogenic temperatures 外体偏置对低温下部分耗尽SOI n - mosfet热载流子降解的影响
Pub Date : 2002-11-07 DOI: 10.1109/WOLTE.2002.1022441
F. Dieudonné, J. Jomaah, C. Raynaud, F. Balestra
Hot-carrier effects were studied in body-tied Partially Depleted SOI MOSFETs in a wide range of temperature, from 300 K down to 20 K. Devices under experimental tests were 0.25 μm long N-MOSFETs with a 10μm width. In this paper, the role of externally applied body-bias on the hot-carrier induced degradation is further investigated for five different temperatures. Our devices underwent accelerated electrical stress applying different negative body-biases as well as drain and front gate biases chosen to obtain reasonable stress duration. The variations of the main electrical parameters such as the maximal transconductance, the driving current or the threshold voltage are reported.
研究了体系部分耗尽SOI mosfet在300k到20k范围内的热载子效应。实验测试器件为长0.25 μm、宽10μm的n - mosfet。本文在五种不同温度下,进一步研究了外源体偏压对热载子诱导降解的作用。我们的器件通过施加不同的负体偏置以及漏极和正门偏置来加速电应力,以获得合理的应力持续时间。报告了最大跨导、驱动电流或阈值电压等主要电气参数的变化。
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引用次数: 2
Mesoscopic transport characteristics of nano-scale SOI MOSFETs: coulomb blockade and localization 纳米SOI mosfet的介观输运特性:库仑阻滞和局域化
Pub Date : 2002-11-07 DOI: 10.1109/WOLTE.2002.1022457
Y. Omura, M. Yamamoto
This paper describes the transport characteristics, measured at 1.1 K, of 50-nm-channel SOI MOSFETs with a 6-nm-thick silicon layer. To verify electron localization, Fermi wavelength, periodic length of primary interface morphology, and ideal cyclotron radius are estimated theoretically. It is shown that non-periodic roughness may contribute to Anderson localization while the local periodic structure of the interface morphology is associated with Coulomb blockade.
本文描述了具有6纳米厚硅层的50nm沟道SOI mosfet在1.1 K下的输运特性。为了验证电子局域化,从理论上估计了费米波长、初级界面形态的周期长度和理想回旋半径。结果表明,非周期粗糙度可能有助于安德森局域化,而界面形态的局部周期结构与库仑封锁有关。
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引用次数: 0
Investigations on the low-power and low-frequency noise performance of pHEMT at 4.2 K pHEMT在4.2 K时的低功耗和低频噪声性能研究
Pub Date : 2002-11-07 DOI: 10.1109/WOLTE.2002.1022463
T. Lucas, Y. Jin
Pseudomorphic GaAs HEMTs with a gate length of 1μm have been realized and characterized at 4.2K. For the device with a gate width of 4mm, a gate leakage current less than 1pA and a total input capacitance lower than 10pF have been obtained for any practical bias conditions. The channel resistance can be modified more than 10 9 times with a gate bias variation less than a half volt. An intrinsic voltage gain higher than 10 can be reached with a power dissipation equal to or less than 0.15mW. Under this power supply condition, equivalent input noise voltages of 8.4, 3.2 and down to 1.3nV/√Hz can be obtained at frequencies of 1, 10 and 100kHz respectively. This noise voltage has been studied as a function of the drain current. Finally, the experimental results of this work have shown that the device's noise voltage can be linked to its DC parameters.
实现了栅极长度为1μm的伪晶GaAs hemt,并在4.2K下进行了表征。对于栅极宽度为4mm的器件,在任何实际偏置条件下,栅极漏电流均小于1pA,总输入电容均小于10pF。当栅极偏置变化小于半伏特时,通道电阻可以被修改10倍以上。在功耗等于或小于0.15mW的情况下,可以获得高于10的本征电压增益。在此电源条件下,在1、10和100kHz频率下分别可获得8.4、3.2和低至1.3nV/√Hz的等效输入噪声电压。我们研究了噪声电压作为漏极电流的函数。最后,本工作的实验结果表明,器件的噪声电压可以与其直流参数相关联。
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引用次数: 4
RSFQ: The fastest digital technology RSFQ:最快的数字技术
Pub Date : 2002-11-07 DOI: 10.1051/JP420020057
K. Likharev
This paper deals with the recent progress in the development of Rapid Single-Flux-Quantum (RSFQ) digital technology based on macroscopic quantum effects in superconductors. Elementary cells of this logic family store and process digital bits in the form of single quanta of magnetic flux, while the data exchange between the cells is provided with picosecond pulses transferred along superconductor microstrip lines with a speed approaching the speed of light. RSFQ devices combine a unique set of
本文介绍了基于超导体宏观量子效应的快速单通量量子(RSFQ)数字技术的最新进展。该逻辑家族的基本单元以单量子磁通量的形式存储和处理数字比特,而单元之间的数据交换提供皮秒脉冲,沿着超导微带线以接近光速的速度传输。RSFQ设备结合了一组独特的
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引用次数: 3
A relationship between 1/f noise and DC parameters in the pHEMT at 4.2 K 4.2 K时pHEMT中1/f噪声与直流参数的关系
Pub Date : 2002-11-07 DOI: 10.1109/WOLTE.2002.1022461
T. Lucas, Y. Jin
According to the Hooge empirical 1/f formula, a linear relationship between the squared equivalent input 1/f noise voltage and the ratio of drain current over squared transconductance has been developed. Low-power and low-frequency noise pHEMTs with gate lengths of 4 and 1 μm have been fabricated and characterized at 4.2K. The obtained noise and DC data are in good agreement with this developed expression when drain biases are fixed in both of quasi-linear and saturation regimes. This relationship provides the possibilities to evaluate the device noise level by its DC parameters and to determine the Hooge coefficient by directly measurable parameters.
根据Hooge经验1/f公式,推导出等效输入1/f噪声电压的平方与漏极电流除以跨导平方的比值之间的线性关系。制备了栅极长度为4 μm和1 μm的低功耗、低噪声phemt,并在4.2K下进行了表征。当漏极偏置在准线性和饱和状态下固定时,得到的噪声和直流数据与这个表达式很好地吻合。这种关系提供了通过直流参数评估器件噪声水平和通过直接可测量参数确定胡格系数的可能性。
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引用次数: 2
Electronics for deep space cryogenic applications 深空低温应用电子器件
Pub Date : 2002-11-07 DOI: 10.1109/WOLTE.2002.1022482
R. Patterson, A. Hammoud, J. Dickman, S. Gerber, M. Elbuluk, E. Overton
Deep space probes and planetary exploration missions require electrical power management and control systems that are capable of efficient and reliable operation in very cold temperature environments. Typically, in deep space probes, heating elements are used to keep the spacecraft electronics near room temperature. The utilization of power electronics designed for and operated at low temperature will contribute to increasing efficiency and improving reliability of space power systems. At NASA Glenn Research Center, commercial-off-the-shelf devices as well as developed components are being investigated for potential use at low temperatures. These devices include semiconductor switching devices, magnetics, and capacitors. Integrated circuits such as digital-to-analog and analog-to-digital converters, DC/DC converters, operational amplifiers, and oscillators are also being evaluated. In this paper, results will be presented for selected analog-to-digital converters, oscillators, DC/DC converters, and pulse width modulation (PWM) controllers.
深空探测和行星探测任务需要能够在极冷温度环境下高效可靠运行的电力管理和控制系统。通常,在深空探测器中,加热元件用于使航天器电子设备保持在室温附近。利用为低温设计和运行的电力电子设备将有助于提高空间电力系统的效率和可靠性。在美国宇航局格伦研究中心,商业现货设备以及开发的组件正在研究在低温下的潜在用途。这些器件包括半导体开关器件、磁性器件和电容器。集成电路,如数模和模数转换器、DC/DC转换器、运算放大器和振荡器也正在评估中。在本文中,将介绍所选模数转换器、振荡器、DC/DC转换器和脉宽调制(PWM)控制器的结果。
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引用次数: 24
Temperature scaling of nanoscale silicon MOSFETs 纳米硅mosfet的温度缩放
Pub Date : 2002-11-07 DOI: 10.1109/WOLTE.2002.1022443
V. Sverdlov, Y. Naveh, K. Likharev
We have combined a 1D model of double-gate MOSFETs with ultrathin intrinsic channel, with a simple model of power consumption in digital integrated circuits, to calculate the temperature dependence of the minimum total (static + dynamic) power P and the optimal power supply voltage V DD . The results are strongly dependent on the circuit speed assumptions. If the current trend of speed scaling with the critical size reduction is sustained, both P and V DD saturate as soon as T is decreased below 100 K. On the other hand, if the high speed condition is removed, transistors may operate in the subthreshold region and minimum value of P scales as T 2 while the optimum value of V DD drops as T. This reduction is, however, limited by thermal fluctuations, leading to a different scaling, V DD T 1/2 and P T 1 , for low temperatures and/or large circuit densities. Because of this limitation, deep cooling of CMOS circuits may make sense only in very special cases.
我们将具有超薄固有通道的双栅mosfet的一维模型与数字集成电路的简单功耗模型相结合,计算了最小总(静态+动态)功率P和最佳电源电压V DD的温度依赖性。结果强烈依赖于电路速度的假设。如果当前速度随临界尺寸减小的趋势持续下去,当T降至100k以下时,P和vdd都达到饱和。另一方面,如果去除高速条件,晶体管可能工作在亚阈值区域,P尺度的最小值为t2,而V DD的最佳值为T。然而,这种降低受到热波动的限制,导致不同的尺度,V DD t1 /2和P t1 1,对于低温和/或大电路密度。由于这种限制,CMOS电路的深度冷却可能只在非常特殊的情况下才有意义。
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引用次数: 2
Investigation of radiation hardness of SIS junctions for space borne radio astronomy 星载射电天文SIS节点辐射硬度研究
Pub Date : 2002-05-01 DOI: 10.1109/WOLTE.2002.1022475
I. Péron, G. Faury, Y. Delorme, F. Dauplay, B. Lecomte, M. SaIez, K. Schuster
Submillimeter astronomy with SIS (Superconductor-Insulator-Superconductor) mixers in space offer access to new wavelength windows and unsurpassed sensitivity. However little is known about the behavior of these devices in space. The Heterodyne Instrument (HIFI) aboard ESA's cornerstone Herschel Space Observatory (formely FIRST) satellite, scheduled for launch in 2007, will be among the first instrument using SIS technology in space. Within this context it is important to study possible radiation damage effects in SIS tunnel junctions. The particular devices used for HERSCHEL-HIFI-Band 1 (480-640 GHz) were fabricated with a new process based on negative resist E-beam lithography and very high current densities (15 kA/cm 2 ). In this paper, we report on radiation hardness tests with 10 MeV protons on the described high current density Nb/Al-AlOx/Nb junctions.
在太空中使用SIS(超导体-绝缘体-超导体)混频器的亚毫米天文学提供了新的波长窗口和无与伦比的灵敏度。然而,人们对这些设备在太空中的行为知之甚少。欧空局的赫歇尔空间天文台(前身为FIRST)卫星上的外差仪器(HIFI)计划于2007年发射,它将是第一批在太空中使用SIS技术的仪器之一。在这种情况下,研究SIS隧道结可能的辐射损伤效应是很重要的。用于HERSCHEL-HIFI-Band 1 (480-640 GHz)的特殊器件采用基于负阻电子束光刻和非常高电流密度(15 kA/ cm2)的新工艺制造。本文报道了用10 MeV质子对高电流密度Nb/Al-AlOx/Nb结进行的辐射硬度测试。
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引用次数: 3
Demonstration of an 4.2 K analog switch matrix in a standard 0.7 /spl mu/ CMOS process 在标准的0.7 /spl mu/ CMOS工艺中演示4.2 K模拟开关矩阵
Pub Date : 2002-05-01 DOI: 10.1109/WOLTE.2002.1022483
Y. Creten, J. De Hert, O. Charlier, P. Merken, J. Putzeys, C. Van Hoof
In this extended abstract a 4x4 Field Programmable Analogue Array or switch matrix is presented. Design and preliminary data will be discussed.
在这个扩展摘要中,提出了一个4x4现场可编程模拟阵列或开关矩阵。将讨论设计和初步数据。
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引用次数: 0
期刊
Proceedings of the 5th European Workshop on Low Temperature Electronics
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