Pub Date : 2026-01-01Epub Date: 2025-12-10DOI: 10.1016/j.apsadv.2025.100915
Sergiu Arapan , Jan Priessnitz , Alexander Kovacs , Dominik Legut , Harald Oezelt , David Böhm , Markus Gusenbauer , Thomas Schrefl
Interfaces play a substantial role for the functional properties of structured magnetic materials and magnetic multilayers. Modeling the functional behavior of magnetic materials requires the treatment of the relevant phenomena at the device level. Properties predicted from the electronic structure and spin dynamics at the atomistic level have to be properly transferred into a continuum level treatment. In this work we show how Co/Ru/Co three layers can be simulated with the continuum theory of micromagnetism, with interface coupling energies and bulk intrinsic properties properly derived from the results of ab initio and spin dynamics simulations at different temperatures.
{"title":"Effect of interface on magnetic exchange coupling in Co/Ru/Co trilayer: From ab initio simulations to micromagnetics","authors":"Sergiu Arapan , Jan Priessnitz , Alexander Kovacs , Dominik Legut , Harald Oezelt , David Böhm , Markus Gusenbauer , Thomas Schrefl","doi":"10.1016/j.apsadv.2025.100915","DOIUrl":"10.1016/j.apsadv.2025.100915","url":null,"abstract":"<div><div>Interfaces play a substantial role for the functional properties of structured magnetic materials and magnetic multilayers. Modeling the functional behavior of magnetic materials requires the treatment of the relevant phenomena at the device level. Properties predicted from the electronic structure and spin dynamics at the atomistic level have to be properly transferred into a continuum level treatment. In this work we show how Co/Ru/Co three layers can be simulated with the continuum theory of micromagnetism, with interface coupling energies and bulk intrinsic properties properly derived from the results of <em>ab initio</em> and spin dynamics simulations at different temperatures.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":"31 ","pages":"Article 100915"},"PeriodicalIF":8.7,"publicationDate":"2026-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145737646","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2026-01-01Epub Date: 2025-12-09DOI: 10.1016/j.apsadv.2025.100916
Guoxiu Zhang , Maciej Oskar Liedke , Maik Butterling , Eric Hirschmann , Andreas Wagner , René Hübner , Shengqiang Zhou , Manfred Helm , Elizabeth von Hauff , Slawomir Prucnal
Zinc oxide (ZnO) is a wide-bandgap semiconductor with excellent optical and electrical properties, making it a promising material for a wide range of applications in optoelectronics and sensors. The properties of ZnO can be easily modified through doping and defect engineering, which determines its long-term stability and ultimate application. One of the most well-known dopants for ZnO is aluminum (Al), which is used to produce the transparent conductive oxide AZO. In this study, using positron annihilation spectroscopy (PAS) and photoluminescence (PL), we demonstrate defect engineering in AZO through millisecond flash-lamp annealing. We show that the nature of the defects strongly depends on the Al-concentration. The highest electrical conductivity of AZO is obtained at an Al:Zn layer ratio of 1:20, i.e., 2.64 at. % Al. Samples with higher Al content are more resistant to annealing and contain more defects. PAS results reveal the presence of zinc vacancies (VZn) and zinc–oxygen vacancy complexes (VZn+O) in the delta-AZO thin films, and although the PAS and PL results are generally consistent, slight differences suggest the possible existence of non-optically active defects that are not revealed by the PL measurements. Additionally, an appropriate amount of aluminum doping contributes to improving the crystallinity of ZnO.
{"title":"Defect analysis of Al-delta-doped ZnO thin films by positron annihilation spectroscopy","authors":"Guoxiu Zhang , Maciej Oskar Liedke , Maik Butterling , Eric Hirschmann , Andreas Wagner , René Hübner , Shengqiang Zhou , Manfred Helm , Elizabeth von Hauff , Slawomir Prucnal","doi":"10.1016/j.apsadv.2025.100916","DOIUrl":"10.1016/j.apsadv.2025.100916","url":null,"abstract":"<div><div>Zinc oxide (ZnO) is a wide-bandgap semiconductor with excellent optical and electrical properties, making it a promising material for a wide range of applications in optoelectronics and sensors. The properties of ZnO can be easily modified through doping and defect engineering, which determines its long-term stability and ultimate application. One of the most well-known dopants for ZnO is aluminum (Al), which is used to produce the transparent conductive oxide AZO. In this study, using positron annihilation spectroscopy (PAS) and photoluminescence (PL), we demonstrate defect engineering in AZO through millisecond flash-lamp annealing. We show that the nature of the defects strongly depends on the Al-concentration. The highest electrical conductivity of AZO is obtained at an Al:Zn layer ratio of 1:20, i.e., 2.64 at. % Al. Samples with higher Al content are more resistant to annealing and contain more defects. PAS results reveal the presence of zinc vacancies (V<sub>Zn</sub>) and zinc–oxygen vacancy complexes (V<sub>Zn+</sub><sub>O</sub>) in the delta-AZO thin films, and although the PAS and PL results are generally consistent, slight differences suggest the possible existence of non-optically active defects that are not revealed by the PL measurements. Additionally, an appropriate amount of aluminum doping contributes to improving the crystallinity of ZnO.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":"31 ","pages":"Article 100916"},"PeriodicalIF":8.7,"publicationDate":"2026-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145737645","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
This study reports the successful development of bioactive coatings on in-situ alloyed Ti-40Nb substrates fabricated via selective laser melting (SLM) using plasma electrolytic oxidation (PEO). Two electrolytes were employed for PEO processing: phosphate–silicate (PS) and phosphate–silicate–hydroxyapatite (PSHA). A comparative evaluation was performed to investigate the influence of electrolyte composition on surface morphology, corrosion resistance, and biological performance. The incorporation of hydroxyapatite (HAp) in the PSHA electrolyte significantly modified the coating structure, resulting in reduced porosity, increased surface roughness, and enhanced wettability. X-ray diffraction analysis confirmed the formation of TiO₂ (anatase and rutile) and Nb₂O₅ phases, with a higher rutile fraction observed in the HAp-incorporated coatings due to intensified plasma discharges. Electrochemical testing in simulated body fluid (SBF) demonstrated improved corrosion resistance for the HAp-containing samples, as evidenced by lower corrosion current density and passivation current values. In vitro assays with MC3T3 pre-osteoblast cells further revealed superior cell viability and proliferation on the HAp-incorporated coatings, attributed to the synergistic effects of roughened topography and the sustained release of bioactive ions. Overall, the PEO-modified Ti40Nb samples exhibited enhanced corrosion protection and cytocompatibility, underscoring their strong potential as next-generation Ti-based orthopedic implant materials.
{"title":"Biofunctionalization of SLM Ti–40Nb alloy through hydroxyapatite-modified plasma electrolytic oxidation coating","authors":"Shangavi Subramanian , Kesavan Praveenkumar , Nagumothu Rameshbabu , Kuppusamy Lokeshraj , Ansheed Raheem , Jayamani Jayaraj , Konda Gokuldoss Prashanth","doi":"10.1016/j.apsadv.2025.100917","DOIUrl":"10.1016/j.apsadv.2025.100917","url":null,"abstract":"<div><div>This study reports the successful development of bioactive coatings on in-situ alloyed Ti-40Nb substrates fabricated via selective laser melting (SLM) using plasma electrolytic oxidation (PEO). Two electrolytes were employed for PEO processing: phosphate–silicate (PS) and phosphate–silicate–hydroxyapatite (PSHA). A comparative evaluation was performed to investigate the influence of electrolyte composition on surface morphology, corrosion resistance, and biological performance. The incorporation of hydroxyapatite (HAp) in the PSHA electrolyte significantly modified the coating structure, resulting in reduced porosity, increased surface roughness, and enhanced wettability. X-ray diffraction analysis confirmed the formation of TiO₂ (anatase and rutile) and Nb₂O₅ phases, with a higher rutile fraction observed in the HAp-incorporated coatings due to intensified plasma discharges. Electrochemical testing in simulated body fluid (SBF) demonstrated improved corrosion resistance for the HAp-containing samples, as evidenced by lower corrosion current density and passivation current values. In vitro assays with MC3T3 pre-osteoblast cells further revealed superior cell viability and proliferation on the HAp-incorporated coatings, attributed to the synergistic effects of roughened topography and the sustained release of bioactive ions. Overall, the PEO-modified Ti40Nb samples exhibited enhanced corrosion protection and cytocompatibility, underscoring their strong potential as next-generation Ti-based orthopedic implant materials.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":"31 ","pages":"Article 100917"},"PeriodicalIF":8.7,"publicationDate":"2026-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145737647","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2026-01-01Epub Date: 2025-12-04DOI: 10.1016/j.apsadv.2025.100909
Kejia Zhang , Zhenghe Wang , Kai Chen , Jundong Song , Takumi Sannomiya , Zhengjun Zhang , Takashi Harumoto , Ji Shi
Polar magneto-optical Kerr effect (P-MOKE) has found extensive applications in magnetic storage, magneto-optical sensors, and spintronic devices. In this study, we investigate the P-MOKE response of multilayer films composed of cobalt platinum (CoPt) alloys and aluminum nitride (AlN), fabricated via DC magnetron sputtering. We observe a magnetization-alignment-dependent behavior, with interference effects contributing to the overall Kerr rotation. Notably, a significant enhancement in P-MOKE is achieved in the substrate/AlN(20 nm)/CoPt(3 nm)/AlN(15 nm) structure, which is attributed to the interference effects induced by the AlN dielectric layer. Furthermore, a distinctive jump in the Kerr rotation hysteresis loop is observed in the substrate/AlN(20 nm)/CoPt(3 nm)/AlN(15 nm)/CoPt(3 nm) configuration, due to the antiparallel alignment of the magnetization between top and bottom CoPt layers. AlN-thickness-dependent behaviors in the P-MOKE signal have also been found in the CoPt/AlN/CoPt trilayer structure. The effective refractive index method and transfer matrix method are employed to quantitatively explain the anomalous Kerr rotation. This study highlights the exceptional sensitivity of P-MOKE to both magnetization configuration and multilayer structure, underscoring its potential for advanced magneto-optical applications.
{"title":"Structure-dependent polar kerr rotation in CoPt/AlN layered films","authors":"Kejia Zhang , Zhenghe Wang , Kai Chen , Jundong Song , Takumi Sannomiya , Zhengjun Zhang , Takashi Harumoto , Ji Shi","doi":"10.1016/j.apsadv.2025.100909","DOIUrl":"10.1016/j.apsadv.2025.100909","url":null,"abstract":"<div><div>Polar magneto-optical Kerr effect (P-MOKE) has found extensive applications in magnetic storage, magneto-optical sensors, and spintronic devices. In this study, we investigate the P-MOKE response of multilayer films composed of cobalt platinum (CoPt) alloys and aluminum nitride (AlN), fabricated via DC magnetron sputtering. We observe a magnetization-alignment-dependent behavior, with interference effects contributing to the overall Kerr rotation. Notably, a significant enhancement in P-MOKE is achieved in the substrate/AlN(20 nm)/CoPt(3 nm)/AlN(15 nm) structure, which is attributed to the interference effects induced by the AlN dielectric layer. Furthermore, a distinctive jump in the Kerr rotation hysteresis loop is observed in the substrate/AlN(20 nm)/CoPt(3 nm)/AlN(15 nm)/CoPt(3 nm) configuration, due to the antiparallel alignment of the magnetization between top and bottom CoPt layers. AlN-thickness-dependent behaviors in the P-MOKE signal have also been found in the CoPt/AlN/CoPt trilayer structure. The effective refractive index method and transfer matrix method are employed to quantitatively explain the anomalous Kerr rotation. This study highlights the exceptional sensitivity of P-MOKE to both magnetization configuration and multilayer structure, underscoring its potential for advanced magneto-optical applications.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":"31 ","pages":"Article 100909"},"PeriodicalIF":8.7,"publicationDate":"2026-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145683527","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2026-01-01Epub Date: 2026-01-06DOI: 10.1016/j.apsadv.2025.100925
Rudolf Ricka , Agnieszka Wanag , Ewelina Kusiak-Nejman , Martin Reli , Miroslava Filip Edelmannová , Marcin Łapinski , Grzegorz Słowik , Antoni W. Morawski , Kamila Kočí
This study investigates the role of defect engineering in enhancing TiO2-based photocatalysts for CO2 photoreduction through a systematically controlled synthesis. In contrast to previous reports focused on Ti3+ doping of commercial TiO2, here we combine sol–gel synthesis with post-synthetic chemical reduction using sodium borohydride (NaBH4) to obtain TiO2 materials with tunable concentrations of surface defects, specifically oxygen vacancies and Ti3+ sites. By varying both the reduction temperature and NaBH4 dosage, we introduce a new level of control over defect formation. The materials were characterized by X-ray diffraction (XRD), Raman spectroscopy, transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), nitrogen physisorption, and photoelectrochemical measurements. Photocatalytic performance was assessed via CO2 photoreduction under UV–vis irradiation. The sample reduced at 350 °C with 1.5 g NaBH4 showed the highest activity and selectivity toward CH4 and CO, clearly surpassing the performance of commercial TiO2 (P25) and a sol–gel reference without chemical reduction (W-TiO₂_350 °C). The improved performance is attributed to a synergistic balance of Ti3+ sites, oxygen vacancies, and surface hydroxyls, which enhance charge separation and CO2 activation. This work introduces new synthesis–structure–activity relationships and demonstrates the potential of defect-tuned TiO2 materials for efficient and selective CO2 valorization.
本研究通过系统控制合成，探讨了缺陷工程在增强二氧化钛基光还原CO2光催化剂中的作用。与以往的报道不同，我们将溶胶-凝胶合成与合成后的化学还原相结合，利用硼氢化钠（NaBH4）获得了表面缺陷浓度可调的TiO2材料，特别是氧空位和Ti3+位点。通过改变还原温度和NaBH4用量，我们引入了对缺陷形成的新水平的控制。采用x射线衍射（XRD）、拉曼光谱（Raman spectroscopy）、透射电子显微镜（TEM）、x射线光电子能谱（XPS）、氮的物理吸附和光电化学测量对材料进行了表征。在紫外-可见照射下通过CO2光还原评价光催化性能。用1.5 g NaBH4在350°C下还原的样品对CH4和CO的活性和选择性最高，明显优于商用TiO2 （P25）和未经化学还原的溶胶-凝胶对照物（w - tio_2 _350°C）。性能的提高是由于Ti3+位、氧空位和表面羟基的协同平衡，从而增强了电荷分离和CO2活化。这项工作介绍了新的合成-结构-活性关系，并证明了缺陷调谐TiO2材料在高效和选择性CO2增值方面的潜力。
{"title":"Effect of NaBH4 loading and reduction temperature on defect-driven CO2 photoreduction over TiO2","authors":"Rudolf Ricka , Agnieszka Wanag , Ewelina Kusiak-Nejman , Martin Reli , Miroslava Filip Edelmannová , Marcin Łapinski , Grzegorz Słowik , Antoni W. Morawski , Kamila Kočí","doi":"10.1016/j.apsadv.2025.100925","DOIUrl":"10.1016/j.apsadv.2025.100925","url":null,"abstract":"<div><div>This study investigates the role of defect engineering in enhancing TiO<sub>2</sub>-based photocatalysts for CO<sub>2</sub> photoreduction through a systematically controlled synthesis. In contrast to previous reports focused on Ti<sup>3+</sup> doping of commercial TiO<sub>2</sub>, here we combine sol–gel synthesis with post-synthetic chemical reduction using sodium borohydride (NaBH<sub>4</sub>) to obtain TiO<sub>2</sub> materials with tunable concentrations of surface defects, specifically oxygen vacancies and Ti<sup>3+</sup> sites. By varying both the reduction temperature and NaBH<sub>4</sub> dosage, we introduce a new level of control over defect formation. The materials were characterized by X-ray diffraction (XRD), Raman spectroscopy, transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), nitrogen physisorption, and photoelectrochemical measurements. Photocatalytic performance was assessed via CO<sub>2</sub> photoreduction under UV–vis irradiation. The sample reduced at 350 °C with 1.5 <em>g</em> NaBH<sub>4</sub> showed the highest activity and selectivity toward CH<sub>4</sub> and CO, clearly surpassing the performance of commercial TiO<sub>2</sub> (P25) and a sol–gel reference without chemical reduction (W-TiO₂_350 °C). The improved performance is attributed to a synergistic balance of Ti<sup>3+</sup> sites, oxygen vacancies, and surface hydroxyls, which enhance charge separation and CO<sub>2</sub> activation. This work introduces new synthesis–structure–activity relationships and demonstrates the potential of defect-tuned TiO<sub>2</sub> materials for efficient and selective CO<sub>2</sub> valorization.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":"31 ","pages":"Article 100925"},"PeriodicalIF":8.7,"publicationDate":"2026-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145925639","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2026-01-01Epub Date: 2026-01-06DOI: 10.1016/j.apsadv.2025.100922
Harpreet Sondhi , Tom Kramberg , Arian Nijmeijer , Fred Roozeboom , Serena Gabrielli , Mikhael Bechelany , Alexey Kovalgin , Mieke W.J. Luiten-Olieman
Solvent-resistant nanofiltration (SRNF) has emerged as a promising alternative to conventional distillation for removing impurities, recovering solutes, and regenerating solvents from diluted process streams. For most industries, such as the pharmaceutical and (petro)chemical industry, the key important factor here is energy-efficiency gain. This study investigates the physicochemical properties of metalcone hybrid layers, such as layer thickness, composition, and layer-solvent interactions. It also utilizes surface-silanization to increase the hydrophobicity of these layers, grown on both planar silicon and 3D-porous ceramic substrates. Using the molecular layer deposition (MLD) technique, vapor-phase titanium tetra-chloride and trimethyl-aluminum are employed as precursors, with ethylene glycol as a co-reactant for nanopore fabrication and methyltrimethoxysilane for surface-silanization. MLD layers were deposited at 125°C and 150°C, followed by annealing in air and nitrogen (N2) at 250°C and 350°C. The resulting SRNF membranes demonstrated high chemical stability in polar and non-polar solvents, as well as in water-solvent mixtures, maintaining permeation rates after 48 hours of continuous exposure. Furthermore, after surface-silanization and enhanced hydrophobicity, the n-hexane permeance was tripled for surface-silanized titanicone and doubled for alucone hybrid layers compared to the unsilanized hybrid layers. Conversely, demineralized water permeance decreased. The SRNF membranes, with pore diameters of <2 nm, show a >90% rejection for polyethylene glycol molecular sizes >390 Dalton. The final n-hexane permeance of surface-silanized, air- and N2-annealed metalcone hybrid layer membranes was >10 L·m⁻2·hr⁻1·bar⁻1. These results demonstrate the versatility of MLD as a technology ready for further developing membranes towards large-scale industrial applications.
{"title":"Molecular layer deposited metalcone hybrid layers for solvent-resistant nanofiltration membranes: surface wetting and permeation","authors":"Harpreet Sondhi , Tom Kramberg , Arian Nijmeijer , Fred Roozeboom , Serena Gabrielli , Mikhael Bechelany , Alexey Kovalgin , Mieke W.J. Luiten-Olieman","doi":"10.1016/j.apsadv.2025.100922","DOIUrl":"10.1016/j.apsadv.2025.100922","url":null,"abstract":"<div><div>Solvent-resistant nanofiltration (SRNF) has emerged as a promising alternative to conventional distillation for removing impurities, recovering solutes, and regenerating solvents from diluted process streams. For most industries, such as the pharmaceutical and (petro)chemical industry, the key important factor here is energy-efficiency gain. This study investigates the physicochemical properties of metalcone hybrid layers, such as layer thickness, composition, and layer-solvent interactions. It also utilizes surface-silanization to increase the hydrophobicity of these layers, grown on both planar silicon and 3D-porous ceramic substrates. Using the molecular layer deposition (MLD) technique, vapor-phase titanium tetra-chloride and trimethyl-aluminum are employed as precursors, with ethylene glycol as a co-reactant for nanopore fabrication and methyltrimethoxysilane for surface-silanization. MLD layers were deposited at 125°C and 150°C, followed by annealing in air and nitrogen (N<sub>2</sub>) at 250°C and 350°C. The resulting SRNF membranes demonstrated high chemical stability in polar and non-polar solvents, as well as in water-solvent mixtures, maintaining permeation rates after 48 hours of continuous exposure. Furthermore, after surface-silanization and enhanced hydrophobicity, the n-hexane permeance was tripled for surface-silanized titanicone and doubled for alucone hybrid layers compared to the unsilanized hybrid layers. Conversely, demineralized water permeance decreased. The SRNF membranes, with pore diameters of <2 nm, show a >90% rejection for polyethylene glycol molecular sizes >390 Dalton. The final n-hexane permeance of surface-silanized, air- and N<sub>2</sub>-annealed metalcone hybrid layer membranes was >10 L·m⁻<sup>2</sup>·hr⁻<sup>1</sup>·bar⁻<sup>1</sup>. These results demonstrate the versatility of MLD as a technology ready for further developing membranes towards large-scale industrial applications.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":"31 ","pages":"Article 100922"},"PeriodicalIF":8.7,"publicationDate":"2026-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145925640","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2026-01-01Epub Date: 2025-12-03DOI: 10.1016/j.apsadv.2025.100907
Daniel Egbebunmi , Francisco Cantillo Villalba , Norizaku Igusa , Graham Kaufman , Suchit Sarin , George Gogos , Scott A. Darveau , Christopher L. Exstrom , Craig Zuhlke , Jeffrey E. Shield
Enhancing surface functionalities through femtosecond laser surface processing (FLSP) combined with xerogel embedment enables advanced control of surface properties. FLSP produces permanent hierarchical scaffold with high surface area and near-surface porosity, which is expected to improve the adherence of functional coatings. In this study, we examined the mechanisms of this two-step process on aluminum 2219, with a focus on confining functional xerogels to tune wettability. Specifically, trimethoxy(3,3,3-trifluoropropyl)silane (SiF3) xerogels were incorporated to achieve superhydrophobicity, while tetraethoxysilane (TEOS) xerogels were used to promote superhydrophilicity. Material characterization confirmed that FLSP generated self-organized mound-like structures with near-surface, porous oxide layers. Importantly, the xerogels were shown to infiltrate and adhere selectively within these porous oxide regions without penetrating the underlying bulk aluminum, demonstrating that the FLSP scaffold effectively confines the coating. The choice of embedment method and drying technique strongly influenced the resulting surface state. Wicking proved to be the most effective embedment approach, producing fewer surface cracks than submersion and preserving the roughness needed for wettability control. Among the hydrophobic samples, the solvent-exchanged, air-dried SiF3 coating achieved the highest contact angle (155.6°). This performance is attributed to solvent exchange reducing capillary stresses, preserving surface roughness and promoting fluorinated group segregation to the exterior surface while maintaining interior silanol bonding. In contrast, TEOS-embedded samples exhibited complete wetting as the surface hydroxyl (-OH) groups promoted rapid spreading of water across the porous network. Overall, this work establishes a controlled two-step fabrication strategy in which FLSP-created scaffolds accommodate and confine xerogel coatings for tuning surface properties.
{"title":"Utilizing femtosecond laser surface processing and xerogel embedment to control surface properties of aluminum 2219","authors":"Daniel Egbebunmi , Francisco Cantillo Villalba , Norizaku Igusa , Graham Kaufman , Suchit Sarin , George Gogos , Scott A. Darveau , Christopher L. Exstrom , Craig Zuhlke , Jeffrey E. Shield","doi":"10.1016/j.apsadv.2025.100907","DOIUrl":"10.1016/j.apsadv.2025.100907","url":null,"abstract":"<div><div>Enhancing surface functionalities through femtosecond laser surface processing (FLSP) combined with xerogel embedment enables advanced control of surface properties. FLSP produces permanent hierarchical scaffold with high surface area and near-surface porosity, which is expected to improve the adherence of functional coatings. In this study, we examined the mechanisms of this two-step process on aluminum 2219, with a focus on confining functional xerogels to tune wettability. Specifically, trimethoxy(3,3,3-trifluoropropyl)silane (SiF3) xerogels were incorporated to achieve superhydrophobicity, while tetraethoxysilane (TEOS) xerogels were used to promote superhydrophilicity. Material characterization confirmed that FLSP generated self-organized mound-like structures with near-surface, porous oxide layers. Importantly, the xerogels were shown to infiltrate and adhere selectively within these porous oxide regions without penetrating the underlying bulk aluminum, demonstrating that the FLSP scaffold effectively confines the coating. The choice of embedment method and drying technique strongly influenced the resulting surface state. Wicking proved to be the most effective embedment approach, producing fewer surface cracks than submersion and preserving the roughness needed for wettability control. Among the hydrophobic samples, the solvent-exchanged, air-dried SiF3 coating achieved the highest contact angle (155.6°). This performance is attributed to solvent exchange reducing capillary stresses, preserving surface roughness and promoting fluorinated group segregation to the exterior surface while maintaining interior silanol bonding. In contrast, TEOS-embedded samples exhibited complete wetting as the surface hydroxyl (-OH) groups promoted rapid spreading of water across the porous network. Overall, this work establishes a controlled two-step fabrication strategy in which FLSP-created scaffolds accommodate and confine xerogel coatings for tuning surface properties.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":"31 ","pages":"Article 100907"},"PeriodicalIF":8.7,"publicationDate":"2026-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145651782","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2026-01-01Epub Date: 2025-12-12DOI: 10.1016/j.apsadv.2025.100914
Sang Hyeok Kim , Donghyun Kim , Inkyu Yoon , Somi Lee , Yunhye Jang , Lae Hyeong Jeong , Seunggyu Lee , Jiyong Woo , Jae Woo Lee
This study investigates the effect of Zr concentration in HZO thin films for application as charge trap layers (CTL) in charge trap flash (CTF) memory devices. Non-ferroelectric HZO thin films with various Zr concentrations are deposited using atomic layer deposition, and their material and electrical properties are analyzed. Increasing Zr concentration narrows the bandgap and increases oxygen vacancies. The low-frequency noise and dielectric breakdown measurements reveal that higher Zr concentrations result in increased trap density but a reduced breakdown electric field. This indicates a trade-off between improved charge storage capability and the reliability of HZO in CTL applications.
Subsequently, CTF devices incorporating HZO-based CTLs are fabricated to evaluate memory performance. The device with 10% Zr achieves the widest memory window (1.96 V), excellent endurance over 106 program/erase cycles (5.35 % memory window reduction rate), and retention after 106 s (15.9 % memory window reduction rate). In contrast, the device with 20% Zr exhibits degraded erase efficiency due to excessive trap density, resulting in a reduced memory window. These results demonstrate that a Zr concentration of 10% in HZO-based CTL is the optimized composition for flash memory performance, delivering superior memory window, endurance, and retention characteristics essential for reliable CTF memory.
{"title":"Optimization of Zr concentration in HZO-based charge trap layers for enhanced flash memory performance","authors":"Sang Hyeok Kim , Donghyun Kim , Inkyu Yoon , Somi Lee , Yunhye Jang , Lae Hyeong Jeong , Seunggyu Lee , Jiyong Woo , Jae Woo Lee","doi":"10.1016/j.apsadv.2025.100914","DOIUrl":"10.1016/j.apsadv.2025.100914","url":null,"abstract":"<div><div>This study investigates the effect of Zr concentration in HZO thin films for application as charge trap layers (CTL) in charge trap flash (CTF) memory devices. Non-ferroelectric HZO thin films with various Zr concentrations are deposited using atomic layer deposition, and their material and electrical properties are analyzed. Increasing Zr concentration narrows the bandgap and increases oxygen vacancies. The low-frequency noise and dielectric breakdown measurements reveal that higher Zr concentrations result in increased trap density but a reduced breakdown electric field. This indicates a trade-off between improved charge storage capability and the reliability of HZO in CTL applications.</div><div>Subsequently, CTF devices incorporating HZO-based CTLs are fabricated to evaluate memory performance. The device with 10% Zr achieves the widest memory window (1.96 V), excellent endurance over 10<sup>6</sup> program/erase cycles (5.35 % memory window reduction rate), and retention after 10<sup>6</sup> s (15.9 % memory window reduction rate). In contrast, the device with 20% Zr exhibits degraded erase efficiency due to excessive trap density, resulting in a reduced memory window. These results demonstrate that a Zr concentration of 10% in HZO-based CTL is the optimized composition for flash memory performance, delivering superior memory window, endurance, and retention characteristics essential for reliable CTF memory.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":"31 ","pages":"Article 100914"},"PeriodicalIF":8.7,"publicationDate":"2026-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145737644","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2026-01-01Epub Date: 2025-12-12DOI: 10.1016/j.apsadv.2025.100919
Chia-Hui Yen , Shih-Ching Huang , Tzh-Hsuan Wang , Wei-Che Tsai , Yan-Gu Lin , Chia Yu Lin
Electrocatalytic adiponitrile reduction (e-ADNRR) using water as the proton source for the synthesis of 6-aminocapronitrile and hexamethylenediamine, the respective monomeric precursors for Nylon 6 and Nylon 6,6, serves as a green and sustainable alternative to traditional thermocatalytic hydrogenation counterparts. The efficient e-ADNRR relies on the development of robust electrocatalysts that readily expedite the kinetics of e-ADNRR while suppressing the competing hydrogen evolution reaction. Herein, we report on a nickel submicron-particulate film-modified electrode (Ti|microNi), containing defective NiOx and metallic nickel, that exhibits high performance towards e-ADNRR under environmentally benign conditions. The effects of electrode preparation conditions (e.g., electrodeposition current) and electrosynthetic conditions (e.g., electrolyte pH, ADN concentration, and concentration of quaternary alkyl ammonium salt) were systematically investigated through a series of controlled-current electrolysis. Ni2+ centers in the defective NiOx are low-coordinated and have a pyramidal (NiO5) symmetry with an oxygen vacancy in the octahedral position. Analysis of the mechanism underlying e-ADNRR at the developed Ti|microNi electrode reveals that e-ADNRR involves the direct electron transfer from the Ti|microNi electrode to ADN molecules, generating reduced intermediates that are subsequently protonated by nearby water molecules. Under optimal conditions, the developed Ti|microNi electrode was demonstrated, for the first time, to exhibit a remarkably high overall product current efficiency (∼98.5 %) at industrially relevant current (-100 mA cm−2) at near-neutral pH without using any organic cosolvent, which eliminates the risk of adiponitrile decomposition and avoids the additional energy consumption associated with the use of organic cosolvents. Overall, this study presents a novel strategy for designing high-performance electrocatalysts for efficient e-ADNRR and related organic electrosynthetic processes.
电催化己二腈还原（e-ADNRR）以水为质子源合成尼龙6和尼龙6,6的单体前体- 6-氨基己二腈和六亚甲二胺，是传统热催化加氢反应的绿色可持续替代品。高效的e-ADNRR依赖于强大的电催化剂的发展，这些电催化剂容易加速e-ADNRR的动力学，同时抑制竞争性的析氢反应。在此，我们报道了一种含有缺陷NiOx和金属镍的镍亚微米颗粒膜修饰电极（Ti|microNi），该电极在环境友好的条件下对e-ADNRR表现出高性能。通过一系列控流电解，系统考察了电极制备条件（如电沉积电流）和电合成条件（如电解液pH、ADN浓度和季烷基铵盐浓度）的影响。缺陷NiOx中的Ni2+中心是低配位的，具有锥体对称（NiO5），在八面体位置有一个氧空位。对制备的Ti|微电极上的e-ADNRR机制的分析表明，e-ADNRR涉及从Ti|微电极到ADN分子的直接电子转移，产生还原中间体，这些中间体随后被附近的水分子质子化。在最佳条件下，所开发的Ti|microNi电极首次在接近中性的pH值下，在工业相关电流（-100 mA cm - 2）下表现出非常高的整体产品电流效率（~ 98.5%），而不使用任何有机共溶剂，这消除了己二腈分解的风险，避免了与使用有机共溶剂相关的额外能量消耗。总的来说，本研究为高效的e-ADNRR和相关的有机电合成工艺设计高性能电催化剂提供了一种新的策略。
{"title":"Efficient electrosynthesis of Nylon monomeric precursors from the electrocatalytic adiponitrile reduction over the defect-rich NiOx/Ni modified electrode","authors":"Chia-Hui Yen , Shih-Ching Huang , Tzh-Hsuan Wang , Wei-Che Tsai , Yan-Gu Lin , Chia Yu Lin","doi":"10.1016/j.apsadv.2025.100919","DOIUrl":"10.1016/j.apsadv.2025.100919","url":null,"abstract":"<div><div>Electrocatalytic adiponitrile reduction (<em>e</em>-ADNRR) using water as the proton source for the synthesis of 6-aminocapronitrile and hexamethylenediamine, the respective monomeric precursors for Nylon 6 and Nylon 6,6, serves as a green and sustainable alternative to traditional thermocatalytic hydrogenation counterparts. The efficient <em>e</em>-ADNRR relies on the development of robust electrocatalysts that readily expedite the kinetics of <em>e</em>-ADNRR while suppressing the competing hydrogen evolution reaction. Herein, we report on a nickel submicron-particulate film-modified electrode (Ti|<em>micro</em>Ni), containing defective NiO<sub>x</sub> and metallic nickel, that exhibits high performance towards <em>e</em>-ADNRR under environmentally benign conditions. The effects of electrode preparation conditions (e.g., electrodeposition current) and electrosynthetic conditions (e.g., electrolyte pH, ADN concentration, and concentration of quaternary alkyl ammonium salt) were systematically investigated through a series of controlled-current electrolysis. Ni<sup>2+</sup> centers in the defective NiO<sub>x</sub> are low-coordinated and have a pyramidal (NiO<sub>5</sub>) symmetry with an oxygen vacancy in the octahedral position. Analysis of the mechanism underlying <em>e</em>-ADNRR at the developed Ti|<em>micro</em>Ni electrode reveals that <em>e</em>-ADNRR involves the direct electron transfer from the Ti|<em>micro</em>Ni electrode to ADN molecules, generating reduced intermediates that are subsequently protonated by nearby water molecules. Under optimal conditions, the developed Ti|<em>micro</em>Ni electrode was demonstrated, for the first time, to exhibit a remarkably high overall product current efficiency (∼98.5 %) at industrially relevant current (-100 mA cm<sup>−2</sup>) at near-neutral pH without using any organic cosolvent, which eliminates the risk of adiponitrile decomposition and avoids the additional energy consumption associated with the use of organic cosolvents. Overall, this study presents a novel strategy for designing high-performance electrocatalysts for efficient <em>e</em>-ADNRR and related organic electrosynthetic processes.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":"31 ","pages":"Article 100919"},"PeriodicalIF":8.7,"publicationDate":"2026-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145737643","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A dual interfacial heterojunction of 2D-2D Ti1.33N@BiVO4/GdIn2Se3 photocatalyst with enhanced photocatalytic properties was prepared. Microscopic images showed a 2D GdIn2Se3 sheet sandwiching a decahedron and a tetragonal bipyramidal (010) exposed facet of BiVO4, covered by 2D Ti1.33 N MXene nanosheets. The XRD data and HR-TEM analysis confirmed the successful fabrication of a multijunctional heterostructure. The optical studies showed a visible-light (460 to 550 nm) active Ti1.33N@BiVO4/GdIn2Se3 photocatalyst with suppressed charge carrier recombination. The Ti1.33N@BiVO4/GdIn2Se3 composite realised a Schottky junction and S-scheme dual charge transfer mechanism. A Schottky junction was realised at the BiVO4@Ti1.33Ninterface, and at the GdIn2Se3/BiVO4 interface, an S-scheme pathway is observed. In agreement with the multijunction formation, the photoelectrochemical studies (EIS, OCVD, and PCR) showed an improvement in the charge carrier properties of the ternary composite. A low charge transfer resistance of 323Ω and a high charge carrier density of 1.08×1021 cm−3 were achieved in the Ti1.33N@BiVO4/GdIn2Se3 composite.
制备了具有增强光催化性能的2D-2D Ti1.33N@BiVO4/GdIn2Se3光催化剂的双界面异质结。显微图像显示，二维GdIn2Se3薄片夹在一个十面体和一个四边形双锥体（010）暴露的BiVO4表面上，被二维Ti1.33 N MXene纳米薄片覆盖。XRD数据和HR-TEM分析证实了多结异质结构的成功制备。光学研究表明，具有抑制载流子复合的可见光（460 ~ 550 nm）活性Ti1.33N@BiVO4/GdIn2Se3光催化剂。Ti1.33N@BiVO4/GdIn2Se3复合材料实现了Schottky结和S-scheme双电荷转移机制。在BiVO4@Ti1.33Ninterface处实现了肖特基结，在GdIn2Se3/BiVO4界面处观察到S-scheme通路。与多结形成一致，光电化学研究（EIS， OCVD和PCR）表明三元复合材料的载流子性质有所改善。在Ti1.33N@BiVO4/GdIn2Se3复合材料中获得了低电荷转移电阻323Ω和高电荷载流子密度1.08×1021 cm−3。
{"title":"Fabrication of a multijunction nitride-based Ti1.33N@BiVO4/GdIn2Se3 MXene heterostructure with enhanced optoelectronic and photoelectrochemical properties","authors":"Majahekupheleni Malati , Bonginkosi Thango , Thulane Paepae , Nkosinathi Gule , Langelihle Dlamini","doi":"10.1016/j.apsadv.2025.100921","DOIUrl":"10.1016/j.apsadv.2025.100921","url":null,"abstract":"<div><div>A dual interfacial heterojunction of 2D-2D Ti<sub>1.33</sub>N@BiVO<sub>4</sub>/GdIn<sub>2</sub>Se<sub>3</sub> photocatalyst with enhanced photocatalytic properties was prepared. Microscopic images showed a 2D GdIn<sub>2</sub>Se<sub>3</sub> sheet sandwiching a decahedron and a tetragonal bipyramidal (010) exposed facet of BiVO<sub>4</sub>, covered by 2D Ti<sub>1.33</sub> N MXene nanosheets. The XRD data and HR-TEM analysis confirmed the successful fabrication of a multijunctional heterostructure. The optical studies showed a visible-light (460 to 550 nm) active Ti<sub>1.33</sub>N@BiVO<sub>4</sub>/GdIn<sub>2</sub>Se<sub>3</sub> photocatalyst with suppressed charge carrier recombination. The Ti<sub>1.33</sub>N@BiVO<sub>4</sub>/GdIn<sub>2</sub>Se<sub>3</sub> composite realised a Schottky junction and S-scheme dual charge transfer mechanism. A Schottky junction was realised at the BiVO<sub>4</sub>@Ti<sub>1.33</sub>Ninterface, and at the GdIn<sub>2</sub>Se<sub>3</sub>/BiVO<sub>4</sub> interface, an S-scheme pathway is observed. In agreement with the multijunction formation, the photoelectrochemical studies (EIS, OCVD, and PCR) showed an improvement in the charge carrier properties of the ternary composite. A low charge transfer resistance of 323Ω and a high charge carrier density of 1.08×10<sup>21</sup> cm<sup>−3</sup> were achieved in the Ti<sub>1.33</sub>N@BiVO<sub>4</sub>/GdIn<sub>2</sub>Se<sub>3</sub> composite.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":"31 ","pages":"Article 100921"},"PeriodicalIF":8.7,"publicationDate":"2026-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145925643","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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