Micro and Nano Engineering最新文献_第6页

Optimizing reticle based high throughput i-line grayscale projection lithography for 3D structures with low surface roughness 针对低表面粗糙度的三维结构优化基于十字线的高通量i线灰度投影光刻技术

IF 3.1 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2025-09-01 Epub Date: 2025-09-03 DOI: 10.1016/j.mne.2025.100319

S. Schermer , J. Bieling , S. DeMoor , A. Zanzal , P. Reynolds , C. Helke , J. Bonitz , A. Voigt , D. Reuter

In this work a reticle based i-line projection grayscale stepper lithography is applied, the patterning results are analyzed and the lithographic process is optimized to obtain low surface roughness grayscale pattern. Here the low contrast resist ma-P 1211G, one type of the ma-P 1200G grayscale resist series, from micro resist technology and tailored grayscale reticles from benchmark technologies are used. The spin curve, contrast curve and layer homogeneity of the resist were measured. A low surface roughness of the generated grayscale structures is important, because the roughness will be transferred during subsequent etching steps as pattern transfer. The impact of the pixel size (within the reticle) on the resist roughness and structure fidelity after resist development was investigated. Therefore, to measure the roughness of exposed and developed structures by AFM, dedicated roughness pads were integrated into the reticle design. After evaluation of the resist roughness a DOE study for different annealing steps in order to smoothen the resist surface after development was conducted. The ideal annealing or smoothening temperature was determined to reduce the resist roughness and preserve/ retain the structure fidelity at the same time.

本文采用了一种基于线线投影的灰度步进光刻技术，对成像结果进行了分析，并对光刻工艺进行了优化，以获得低表面粗糙度的灰度图像。这里使用了低对比度抗蚀剂ma-P 1211G， ma-P 1200G灰度抗蚀剂系列的一种，来自微抗蚀剂技术和来自基准技术的定制灰度线。测量了抗蚀剂的自旋曲线、对比曲线和层均匀性。生成的灰度结构的低表面粗糙度很重要，因为粗糙度将在随后的蚀刻步骤中作为图案转移而转移。研究了光刻液显影后像素尺寸对光刻液粗糙度和结构保真度的影响。因此，为了利用原子力显微镜测量暴露和发育结构的粗糙度，我们将专用的粗糙度垫块集成到光镜设计中。在评价抗蚀剂粗糙度的基础上，对不同的退火步骤进行了DOE研究，以便在显影后使抗蚀剂表面光滑。确定了理想的退火或平滑温度，以降低抗蚀剂粗糙度，同时保持/保持组织保真度。

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引用次数: 0

AI-initialized level-set inversion for lithographic mask reconstruction 用于光刻掩模重建的ai初始化水平集反演

IF 3.1 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2025-09-01 Epub Date: 2025-08-06 DOI: 10.1016/j.mne.2025.100312

Feng-Lin Tsao , Tzu-Yu Lin , Chen Shuai , Tzu-Chun Lo , Yu-Heng Hung , Chun-Hung Lin

As feature sizes in semiconductor manufacturing continue to shrink, accurate mask inspection and wafer-level prediction have become increasingly challenging. This paper presents a lithography-driven mask reconstruction framework that infers physically meaningful mask patterns from aerial images captured by mask reviewers. The proposed approach is grounded in an image formation model based on stacked pupil shift matrices and ensures physical interpretability and alignment with real lithography processes. The framework integrates a level-set-based inverse modeling approach with adaptive time-step optimization methods, including Barzilai–Borwein method and Golden Section Search, to ensure convergence efficiency and stability. To address the sensitivity of level-set methods to initialization, a deep learning-based model trained on lithography-aware data is introduced to generate accurate initial level-set functions. Additionally, an upsampling technique is employed to overcome pixel resolution limitations and to refine mask edge smoothness without increasing runtime. Experimental results demonstrate that the reconstructed masks generate aerial images that closely match those from mask reviewers. Compared with the sidelobe search, our AI-initialized method substantially improves reconstruction accuracy and convergence, especially in cases involving subresolution assist features. Furthermore, wafer-level evaluations exhibit strong alignment between simulated and actual CD variations, and matching slopes are consistently above 0.8. The proposed framework effectively bridges the gap between aerial image analysis and wafer behavior prediction, and offers a robust, scalable solution for advanced mask review and verification workflows.

随着半导体制造中的特征尺寸不断缩小，精确的掩模检测和晶圆级预测变得越来越具有挑战性。本文提出了一种光刻驱动的掩模重建框架，该框架可以从掩模审查员捕获的航空图像中推断出物理上有意义的掩模模式。该方法基于基于堆叠瞳孔移位矩阵的图像形成模型，并确保物理可解释性和与真实光刻过程的对齐。该框架将基于水平集的逆建模方法与Barzilai-Borwein方法和黄金分割搜索等自适应时间步优化方法相结合，保证了收敛效率和稳定性。为了解决水平集方法对初始化的敏感性，引入了一种基于光刻感知数据训练的深度学习模型来生成准确的初始水平集函数。此外，采用上采样技术来克服像素分辨率的限制，并在不增加运行时间的情况下改进掩模边缘的平滑度。实验结果表明，重构后的掩模所生成的航拍图像与掩模审查员的航拍图像非常接近。与旁瓣搜索相比，我们的人工智能初始化方法大大提高了重建精度和收敛性，特别是在涉及亚分辨率辅助特征的情况下。此外，晶圆级评估显示模拟和实际CD变化之间有很强的一致性，匹配斜率始终大于0.8。提出的框架有效地弥合了航空图像分析和晶圆行为预测之间的差距，并为高级掩模审查和验证工作流程提供了强大的可扩展解决方案。

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引用次数: 0

Transmitted electron exposure in electron beam lithography for double-side patterning of bi-layer metasurfaces on a SiNx membrane SiNx膜双层超表面双面图像化电子束光刻中的透射电子曝光

IF 3.1 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2025-09-01 Epub Date: 2025-08-06 DOI: 10.1016/j.mne.2025.100313

Jinyu Guo , Yifei Wang , Hao Quan , Shuoqiu Tian , Qiucheng Chen , Wentao Yuan , Qingxin Wu , Kangping Liu , Yifang Chen , Qiong He , Lei Zhou

Metasheets, composed of two identical metasurfaces closely aligned to each other within a mode-coupling distance on the two opposite sides of a SiN_x membrane, are of unique functionalities for effective modulation of electromagnetic waves by nanoscale metallic structures. Although the physical image is readily clear, nanofabrication of such a two-sided devices with identical patterns still remains a big challenge because of the e-beam spreading caused by forward scattering in both resists and membranes. In this work, an innovative transmitted electron beam lithography (TEBL) was developed for metasheets. Three different resist stacks were tried and compared to eliminate the pattern deviation between them. A simulation study of TEBL was systematically carried out to figure out a reliable process window for replicating identical Au-gratings on the two opposite sides. The principle behind the success of replicating two identical metasurfaces on opposite sides is analyzed. The developed TEBL in this work extends the application of electron beam lithography to double-sided patterning for novel optical devices such as metasheets.

元片是由两个相同的元表面在SiNx膜的两侧的模耦合距离内紧密排列在一起组成的，具有纳米级金属结构有效调制电磁波的独特功能。虽然物理图像很容易清晰，但由于电子束在电阻和膜中的前向散射引起的扩散，这种具有相同图案的双面器件的纳米制造仍然是一个很大的挑战。在这项工作中，开发了一种创新的透射电子束光刻技术（TEBL）。对三种不同的抗蚀层进行了试验和比较，以消除它们之间的图案偏差。系统地进行了TEBL的模拟研究，以找出在相对两侧复制相同au光栅的可靠工艺窗口。分析了两个完全相同的超表面在相对两侧复制成功的原理。本工作开发的TEBL将电子束光刻技术的应用扩展到元片等新型光学器件的双面图案。

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引用次数: 0

Ni-P metallization of nylon 6,6 yarns with varying twist numbers by supercritical CO2 catalyzation toward weavable devices 超临界CO2催化不同捻数尼龙6,6纱Ni-P金属化制备可织装置

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2025-09-01 Epub Date: 2025-06-16 DOI: 10.1016/j.mne.2025.100304

Kazuhiro Shibata , Tomoyuki Kurioka , Hikaru Kondo , Nao Yoshida , Wan-Ting Chiu , Chun-Yi Chen , Tso-Fu Mark Chang , Hiromichi Kurosu , Masato Sone

Weavable devices are innovative fabric-based electronics created by weaving yarns with various functions into a single cloth, enabling multifunctionality beyond traditional wearable devices. Electrically conductive yarns are essential for this integration, and in practical applications, yarns are prepared with varying twist numbers. This study investigates the metallization of nylon 6,6 yarns using a supercritical CO₂-assisted NiP electroless plating method and examines the influence of twist numbers on metallization characteristics. The results show that increasing the twist number significantly decreases the electrical resistance of Ni-P/nylon 6,6 composite yarns, underscoring the critical role of yarn structure in electrical conductivity. Energy-dispersive X-ray spectroscopy (EDS) analysis indicates that higher twist numbers (0 T/m to 865 T/m) improve the distribution of Pd catalysts on scCO₂-catalyzed nylon 6,6 yarns. Additionally, scanning electron microscope (SEM) observations and EDS analysis show that increasing the twist number leads to thicker and more uniform NiP coatings, thereby improving the electrical performance. Overall, this study demonstrates that optimizing twist number is key to improving the metallization quality and electrical properties of nylon 6,6 yarns for advanced weavable electronic applications.

可编织设备是一种创新的基于织物的电子产品，通过将具有各种功能的纱线编织到一块布上，实现了传统可穿戴设备之外的多功能。导电纱线对于这种集成是必不可少的，在实际应用中，纱线的捻度是不同的。采用超临界co2辅助化学镀法对尼龙6,6丝进行了金属化处理，并考察了捻数对金属化性能的影响。结果表明，增加捻数可显著降低Ni-P/尼龙6,6复合纱线的电阻，说明纱线结构对导电率的影响至关重要。能量色散x射线能谱（EDS）分析表明，较高的捻度（0 ~ 865 T/m）改善了钯催化剂在scco2催化尼龙6,6纱上的分布。此外，扫描电镜（SEM）观察和能谱分析表明，增加捻度可以使NiP涂层更厚、更均匀，从而提高电气性能。总之，本研究表明，优化捻数是提高尼龙6,6丝金属化质量和电性能的关键，尼龙6,6丝用于先进的可织电子应用。

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引用次数: 0

Stereolithography 3D printing method for multi-material hydrogel 2D photo-patterning in a microfluidic chip 微流控芯片中多材料水凝胶二维图像的立体光刻3D打印方法

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2025-06-01 Epub Date: 2025-06-02 DOI: 10.1016/j.mne.2025.100301

S. Assie-Souleille, L. Seguier, D. Gauchard, I. Drobecq, B. Franc, L. Malaquin, J. Foncy

We present a novel and straightforward method using a standard stereolithography (SLA) 3D printer for high-resolution (20 μm x-y resolution), multi-material 2D hydrogel photo-patterning directly within a microfluidic chip. The process involves sequential injections of photosensitive hydrogel into a transparent microfluidic chip coupled with sequential direct laser writing by the printer through point-by-point photopolymerization. Our approach integrates a custom miniaturized syringe pump system into the SLA printer, thereby enabling fluid management and sequential injection of different photosensitive hydrogels directly into the microfluidic environment between each laser writing sequence. This technique enables the fabrication of intricate, multi-material hydrogel patterns (e.g., PEGDA and HAMA) with high spatial resolution over areas spanning several square millimeters. Future developments will focus on expanding the range of biomaterials and incorporating cell-laden hydrogels to facilitate the creation of biologically relevant microenvironments on chip.

This study opens new possibilities for high-resolution, multi-material hydrogel patterning in microfluidics and offers a valuable platform for advancing research in microsystems engineering.

我们提出了一种新颖而直接的方法，使用标准立体光刻（SLA） 3D打印机进行高分辨率（20 μm x-y分辨率），直接在微流控芯片内进行多材料2D水凝胶照片图像化。该过程包括将光敏水凝胶依次注射到透明微流控芯片中，并通过逐点光聚合由打印机进行顺序直接激光书写。我们的方法将定制的微型注射泵系统集成到SLA打印机中，从而实现流体管理和在每个激光书写序列之间将不同的光敏水凝胶直接注射到微流体环境中。该技术能够制造复杂的多材料水凝胶图案（例如，PEGDA和HAMA），在跨越几平方毫米的区域内具有高空间分辨率。未来的发展将集中在扩大生物材料的范围和结合细胞负载的水凝胶，以促进在芯片上创建生物相关的微环境。该研究为微流体中高分辨率、多材料水凝胶图谱的研究开辟了新的可能性，并为推进微系统工程研究提供了一个有价值的平台。

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引用次数: 0

Ultrasonic power and data transfer for active medical implants using adaptive beamforming 使用自适应波束形成的有源医疗植入物的超声功率和数据传输

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2025-06-01 Epub Date: 2025-04-29 DOI: 10.1016/j.mne.2025.100296

Tianhui Li , James A. Flint , Hailing Fu , Sotiris Korossis , Stephanos Theodossiades

Wireless power transfer provides a sustainable power source for active medical implants. Recent developments in biosensors, MEMS technologies and the advent of ubiquitous computing has opened up the potential for a millimeter-sized active medical implant for continuous health monitoring. Frequent wireless communication and data processing requires more energy than traditional active medical implants. Therefore, a continuous power source is needed. This study investigated the development of an ultrasonic power transfer (USPT) system for active medical implants. The system, comprised of a wearable and an implantable device, can transfer both power and data between the implant and the wearable. By implementing beamforming, it can adapt to misalignment between the transmitter and the receiver. In the experiments, the receiver outputs 0.16 mW after rectification, when transmitting through 0.5 cm of water. By measuring the time-of-flight (ToF) of a pulse transmitted from the receiver, implant position feedback is achieved. Data transfer is demonstrated at a rate of 1 kbit/s, across a 4 cm path in water, which is adequate for many biomedical applications.

无线电力传输为有源医疗植入物提供了一种可持续的电源。生物传感器、微机电系统技术和无处不在的计算技术的最新发展，为毫米大小的主动医疗植入物的持续健康监测开辟了潜力。频繁的无线通信和数据处理比传统的有源医疗植入物需要更多的能量。因此，需要一个连续的电源。本研究探讨了一种用于有源医疗植入物的超声功率传输（USPT）系统的开发。该系统由可穿戴设备和可植入设备组成，可以在植入设备和可穿戴设备之间传输功率和数据。通过实现波束形成，它可以适应发射器和接收器之间的不对准。在实验中，当通过0.5 cm的水传输时，接收器经过整流后输出0.16 mW。通过测量从接收机发射的脉冲的飞行时间（ToF），实现了植入物的位置反馈。数据传输速度为1kbit /s，在水中横跨4厘米的路径，足以满足许多生物医学应用。

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引用次数: 0

Assessing ultrasonic and optical flow velocimetry in a millifluidic device using oil-in-water emulsions as blood mimicking fluid 利用水包油乳剂作为模拟血液的液体，在微流体装置中评估超声和光流速测量

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2025-06-01 Epub Date: 2025-05-08 DOI: 10.1016/j.mne.2025.100298

Estelle Lu , Williams Flores Cisternas , Héloïse Uhl , Alexandre Chargueraud , Quentin Grimal , Guillaume Renaud , Jean-Gabriel Minonzio , Jacques Fattaccioli

Blood-mimicking fluids (BMFs) play a critical role in ultrasonic imaging and Doppler flow studies by replicating the physical and acoustic properties of blood. This study introduces a novel soybean oil-in-water emulsion as a BMF with particle size akin to red blood cells. Using a millifluidic device, we cross-validated flow profiles through both Doppler velocimetry and optical particle tracking, demonstrating compatibility with theoretical Poiseuille flow models. The millifluidic chip, fabricated via stereolithography, provided an optimized platform for dual optical and ultrasonic assessments. Results showed strong agreement between the two methods across a range of flow rates, affirming the suitability of the emulsion for velocimetry applications. Furthermore, the acoustic properties of soybean oil droplets support their potential as an echogenic and stable alternative to conventional BMFs.

血液模拟液（BMFs）通过复制血液的物理和声学特性，在超声成像和多普勒血流研究中发挥着关键作用。本研究介绍了一种新型的大豆油水包乳剂，其颗粒大小类似于红细胞。使用微流体装置，我们通过多普勒测速和光学粒子跟踪交叉验证了流动剖面，证明了与理论泊泽维尔流动模型的兼容性。通过立体光刻制造的微流控芯片为双光学和超声评估提供了优化的平台。结果表明，两种方法在一定的流速范围内具有很强的一致性，证实了乳液在测速应用中的适用性。此外，大豆油液滴的声学特性支持它们作为传统生物燃料的回声和稳定替代品的潜力。

引用次数: 0

Near-collector electroprinting of cellulose acetate structures with large specific surface per volume 具有大体积比表面积的醋酸纤维素结构的近捕集器电印刷

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2025-06-01 Epub Date: 2025-05-06 DOI: 10.1016/j.mne.2025.100299

Farnaz Rezaei , Daniel O. Carlsson , Jimmy Hedin Dahlstrom , Jonas Lindh , Stefan Johansson

This study focuses on the fabrication and analysis of 3D-printed high-detail resolution cellulose acetate (CA) structures, particularly examining their specific surface area per volume

(S_{v})

. While electrospinning is a widely used technique for creating nanofiber membranes with high

S_{v}

, which is advantageous for applications like chromatography, the performance could be further improved by precisely controlling fiber placement. To further develop membranes, this research explores the use of electroprinting with small distances between nozzle and collector, here named near-collector electroprinting, to create 3D structures. By optimizing printing parameters, in particular the reduction of the nozzle-to-collector distance, 3D structures with precise fiber placement within a few micrometers were fabricated. The specific surface area per volume was calculated for both 3D-printed and electrospun filters. Results showed that 3D-printed structures with a 5 μm pitch achieved a

S_{v}

similar to electrospun filters.

Incorporating polyethyleneimine (PEI) in the CA ink enabled the 3D-printed structures to gain ion binding capacity which was further investigated. This ion-exchange ability which integrated into the printing step, eliminating the need for a separate post-modification process in bio-separation applications. By switching the substrate voltage from positive to negative, relative to the grounded nozzle, the printed fiber diameter decreased substantially for the CA ink with PEI. The

S_{v}

for near-collector electroprinted fibers of this material could therefore potentially be higher than that of electrospun membranes, provided that an order of magnitude higher printing speed, than presently possible can be used. These findings suggest that near-collector electroprinted CA structures offer potential improvements in membrane design and performance, making them a promising alternative to traditional electrospun membranes for bio-separation applications.

本研究侧重于3d打印高细节分辨率醋酸纤维素（CA）结构的制造和分析，特别是检查其每体积比表面积Sv。虽然静电纺丝是一种广泛使用的技术，用于制造高Sv的纳米纤维膜，这有利于色谱等应用，但通过精确控制纤维的放置可以进一步提高性能。为了进一步开发膜，本研究探索了喷嘴和集热器之间距离较小的电打印技术的使用，这里称为近集热器电打印，以创建3D结构。通过优化打印参数，特别是减少喷嘴到收集器的距离，可以制造出在几微米内精确放置纤维的3D结构。计算了3d打印和静电纺过滤器的每体积比表面积。结果表明，间距为5 μm的3d打印结构获得了与静电纺过滤器相似的Sv。在CA墨水中加入聚乙烯亚胺（PEI）使3d打印结构获得离子结合能力，这一点得到了进一步的研究。这种离子交换能力集成到打印步骤中，消除了生物分离应用中单独的后修饰过程的需要。相对于接地喷嘴，通过将衬底电压从正开关到负开关，具有PEI的CA油墨的印刷纤维直径大大减小。因此，这种材料的近集电极电印刷纤维的Sv可能比电纺膜的Sv高，前提是可以使用比目前可能的印刷速度高一个数量级。这些发现表明，近集热器电印刷CA结构在膜设计和性能方面有潜在的改进，使其成为传统电纺膜在生物分离应用中的有希望的替代品。

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引用次数: 0

Regional proximity effect correction for replicating 28 nm lines/spaces in HSQ as dielectric diffraction gratings with high aspect ratio 高纵横比介质衍射光栅复制HSQ中28nm线/空间的区域邻近效应校正

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2025-03-01 Epub Date: 2025-03-29 DOI: 10.1016/j.mne.2025.100295

Qingxin Wu , Wentao Yuan , Qiucheng Chen , Hao Quan , Yifang Chen

With the rapid advances of extreme ultraviolet (EUV) lithography toward ultra-high resolution, characterization technique of EUV resists by interference lithography (IL) for 14-nm node process needs urgent upgrading because of the considerable loss of light transmission by metallic grating masks. Diffraction phase gratings in dielectric silicon dioxide as masks are a promising solution, provided that 28 nm lines/spaces with high aspect ratio as well as large grating areas are obtained. This paper reports our recent success in replicating 28 nm half-pitch gratings with the aspect ratio of 13:1 and the area up to 200 × 200 μm² by state-of-the-art electron beam lithography with regional proximity effect correction (PEC) in hydrogen silsesquioxane (HSQ) coated on a 100 nm silicon nitride membrane. To ensure well resolved lines/spaces in 350 nm thick HSQ, Monte Carlo algorithm is applied in the simulations of 3D absorbing electron energy density distributions, followed by calculations of equal energy contours of deposited energy based on the kinetic development model, which enables us to work out reliable dose windows. The process developed in this work should be feasibly extended to large area gratings in a future industrialization.

随着极紫外（EUV）光刻技术向超高分辨率的快速发展，金属光栅掩模对极紫外电阻的透射损失较大，14nm节点工艺的干涉光刻（IL）表征技术急需升级。以介质二氧化硅为掩模的衍射相位光栅是一种很有前途的解决方案，只要能获得高纵横比和大光栅面积的28 nm线/空间。本文报道了利用最先进的电子束光刻技术，利用区域接近效应校正（PEC）在100 nm氮化硅膜上涂覆的硅氧烷氢（HSQ）上成功地复制出28 nm宽高比为13:1、面积达200 × 200 μm2的半间距光栅。为了保证350 nm厚HSQ中线条/空间的良好分辨，采用蒙特卡罗算法模拟了三维吸收电子能量密度分布，并根据动力学发展模型计算了沉积能量的等能量轮廓，从而得到了可靠的剂量窗。在未来的工业化生产中，本研究开发的工艺可以推广到大面积光栅中。

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引用次数: 0

Rapid prototyping of 3D microstructures: A simplified grayscale lithography encoding method using blender 三维微结构的快速成型：一种使用搅拌器的简化灰度光刻编码方法

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2025-03-01 Epub Date: 2024-12-27 DOI: 10.1016/j.mne.2024.100294

Fabrício Frizera Borghi , Mohammed Bendimerad , Marie-Ly Chapon , Tatiana Petithory , Laurent Vonna , Laurent Pieuchot

The democratization of fabrication equipment has spurred recent interest in maskless grayscale lithography for both 2D and 3D microfabrication. However, the design of suitable template images remains a challenge. This work presents a simplified method for encoding 3D objects into grayscale image files optimized for grayscale lithography. Leveraging the widely used and open-source 3D modeling software Blender, we developed a robust approach to convert geometric heights into grayscale levels and generate image files through top-view rendering. Our method accurately reproduced the overall shape of simple structures like stairs and ramps compared to the original designs. We extended this approach to complex 3D sinusoidal surfaces, achieving similar results. Given the increasing accessibility and user-friendliness of digital rendering tools, this study offers a promising strategy for rapid prototyping of initial designs with minimal effort.

制造设备的民主化激发了最近对二维和三维微加工的无掩模灰度光刻的兴趣。然而，设计合适的模板图像仍然是一个挑战。这项工作提出了一种简化的方法，将3D对象编码为灰度图像文件，优化了灰度光刻。利用广泛使用的开源3D建模软件Blender，我们开发了一种强大的方法来将几何高度转换为灰度级别，并通过俯视图渲染生成图像文件。与原始设计相比，我们的方法准确地再现了楼梯和坡道等简单结构的整体形状。我们将这种方法扩展到复杂的3D正弦曲面，获得了类似的结果。考虑到数字渲染工具的可访问性和用户友好性的增加，本研究为以最小的努力快速构建初始设计原型提供了一个有前途的策略。

引用次数: 0