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Metallization of polyetherimide with 3D structures by supercritical carbon dioxide-assisted electroless NiP plating 通过超临界二氧化碳辅助无电解NiP电镀实现具有三维结构的聚醚酰亚胺的金属化
IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-02 DOI: 10.1016/j.mne.2024.100271
Ami Iwasaki , Tomoyuki Kurioka , Po-Wei Cheng , Chun-Yi Chen , Tso-Fu Mark Chang , Kei Takase , Hiroshi Ishihata , Masato Sone

Polyetherimide (PEI) with 3-dimensional (3D) structures is a promising material for applications in electronic devices because of its numerous attractive properties. In the applications of PEI, the low electrical conductivity is often a shortcoming. The electrical conductivity can be improved by a metallization process. Electroless plating is a common metallization process for polymeric materials; however, conventional electroless plating process scarcely provides the metallized PEI. In this work, we overcome this limitation by a supercritical carbon dioxide (scCO2)-assisted electroless NiP plating process. This scCO2-assisted electroless NiP plating allows metallization of PEI with 3D structures and realizes a low electrical resistance suitable for practical use in the electronic devices.

具有三维(3D)结构的聚醚酰亚胺(PEI)因其众多吸引人的特性,在电子设备中是一种很有应用前景的材料。在 PEI 的应用中,低导电性往往是一个缺点。可以通过金属化工艺来提高导电性。无电解电镀是高分子材料常用的金属化工艺,但传统的无电解电镀工艺几乎无法提供金属化的 PEI。在这项工作中,我们采用超临界二氧化碳(scCO2)辅助无电解镀镍工艺克服了这一限制。这种由 scCO2 辅助的无电解镀镍工艺可实现具有三维结构的 PEI 金属化,并具有适合电子设备实际使用的低电阻。
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引用次数: 0
Superhydrophobic and oleophobic Nylon, PES and PVDF membranes using plasma nanotexturing: Empowering membrane distillation and contributing to PFAS free hydrophobic membranes 利用等离子纳米挤压技术制造超疏水性和疏油性尼龙、聚醚砜和聚偏二氟乙烯膜:增强膜蒸馏能力,促进形成不含 PFAS 的疏水膜
IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-02 DOI: 10.1016/j.mne.2024.100269
Eleftherios Manouras , Dimosthenis Ioannou , Angelos Zeniou , Andreas Sapalidis , Evangelos Gogolides

As freshwater demand is constantly increasing, water purification via membrane distillation (MD) emerges as a promising water production technology, especially when combined with the use of superhydrophobic membranes. Here, following our previous work [1] we extend our universal, environmentally friendly, plasma nanotexturing and hydrophobization technology for rendering practically any type of membrane superhydrophobic and oleophobic. Thus, we render three commercial porous membranes superhydrophobic, namely, polyvinylidene (PVDF 0.45 μm) (initially hydrophobic), polyethersulfone (PES 1.20 μm) and nylon (NY 1.20 μm) (both initially hydrophilic). We demonstrate superhydrophobic, superoleophobic (down to 40mn/m surface tension) and oleophobic properties (down to 30mN/m surface tension) for PVDF, PES and Nylon membranes thus paving the way for their use with low surface tension waste streams. Moreover, the technology presented herein not only improves existing hydrophobic membranes but may lead to elimination of the use of Teflon-like fluorinated hydrophobic membranes altogether in the future, thereby contributing to the PFAS (Per and Poly Fluoro Alkyl Substances) and Teflon-like membrane use reduction. We subsequently evaluated the performance of the treated membranes in direct contact membrane distillation (DCMD) for desalination of sea-like water (35 g/L NaCl). All membranes showed enhanced water flux with an increase of >13% compared to the pristine hydrophobic PVDF membranes for at least 2 h of continuous operation, with salt rejection exciding 99.99%.

随着淡水需求的不断增加,通过膜蒸馏(MD)进行水净化已成为一种前景广阔的水生产技术,尤其是在结合使用超疏水膜的情况下。在这里,继我们之前的工作[1]之后,我们扩展了我们的通用、环保、等离子纳米挤压和疏水技术,使几乎所有类型的膜都具有超疏水性和疏油性。因此,我们对三种商用多孔膜进行了超疏水处理,即聚偏二氟乙烯(PVDF 0.45 μm)(最初为疏水性)、聚醚砜(PES 1.20 μm)和尼龙(NY 1.20 μm)(最初均为亲水性)。我们展示了 PVDF、PES 和尼龙膜的超疏水性、超疏油性(表面张力低至 40mn/m)和疏油性(表面张力低至 30mN/m),从而为它们在低表面张力废物流中的应用铺平了道路。此外,本文介绍的技术不仅能改进现有的疏水膜,还可能在未来完全淘汰特氟龙类氟化疏水膜的使用,从而为减少 PFAS(全氟烷基和聚氟烷基物质)和特氟龙类膜的使用做出贡献。随后,我们评估了经过处理的膜在直接接触膜蒸馏(DCMD)中用于海水(35 克/升 NaCl)脱盐的性能。与原始疏水性 PVDF 膜相比,所有膜在连续运行至少 2 小时后,水通量均有所提高,增幅达 13%,盐分去除率超过 99.99%。
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引用次数: 0
Moving toward autonomous manufacturing by accelerating hydrodynamic fabrication of microstructures using deep neural networks 利用深度神经网络加速微结构的流体力学制造,向自主制造迈进
IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-06-30 DOI: 10.1016/j.mne.2024.100268
Nicholus R. Clinkinbeard, Nicole N. Hashemi

Manufacturing of microstructures using a microfluidic device is a largely empirical effort due to the multi-physical nature of the fabrication process. As such, in moving toward autonomous manufacturing, models are desired that will predict microstructure attributes (e.g., size, porosity, and stiffness) based on known inputs, such as sheath and core fluid flow rates. Potentially more useful is the prospect of inputting desired microfiber features into a design model to extract appropriate manufacturing parameters. In this study, we demonstrate that deep neural networks (DNNs) trained with sparse datasets augmented by synthetic data can produce accurate predictive and design models to accelerate materials development. For our predictive model with known sheath and core flow rates and bath solution percentage, calculated solid microfiber dimensions are shown to be greater than 95% accurate, with porosity and Young's modulus exhibiting greater than 90% accuracy for a majority of conditions. Likewise, the design model is able to recover sheath and core flow rates with 95% accuracy when provided values for microfiber dimensions, porosity, and Young's modulus. As a result, DNN-based modeling of the microfiber fabrication process demonstrates high potential for reducing time to manufacture of microstructures with desired characteristics.

由于制造过程的多物理特性,利用微流体设备制造微结构在很大程度上是一项经验性工作。因此,在实现自主制造的过程中,我们需要能根据已知输入(如鞘液和芯液流速)预测微结构属性(如尺寸、孔隙率和刚度)的模型。将所需的超细纤维特征输入设计模型,以提取适当的制造参数,可能会更有用。在本研究中,我们证明了用合成数据增强的稀疏数据集训练的深度神经网络(DNN)可以生成精确的预测和设计模型,从而加速材料开发。在已知鞘和芯流速以及浴液百分比的情况下,我们的预测模型计算出的固体超细纤维尺寸准确率超过 95%,在大多数条件下,孔隙率和杨氏模量的准确率超过 90%。同样,在提供超细纤维尺寸、孔隙率和杨氏模量值的情况下,设计模型能够以 95% 的准确率恢复鞘和芯的流速。因此,基于 DNN 的超细纤维制造工艺建模在缩短具有所需特性的微结构的制造时间方面具有很大的潜力。
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引用次数: 0
Prospects of nano-lithographic tools for the fabrication of surface-enhanced Raman spectroscopy (SERS) substrates 纳米光刻工具在制造表面增强拉曼光谱(SERS)基底方面的应用前景
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-06-01 DOI: 10.1016/j.mne.2024.100267
K. Srivastava , H. Le-The , J.J.A. Lozeman , A. van den Berg , W. van der Stam , M. Odijk

The previous decades have seen a massive increase in the research towards reproducible and optimized surface-enhanced Raman spectroscopy (SERS) substrates. While traditional colloidal synthesis methods have commonly been used for SERS substrate fabrication, they lack reproducibility hindering their usage for many applications. The need for reproducible nanostructures showing high orders of enhancement factors has brought about a shift in the methods one can use to fabricate SERS nanostructures. Lithographic techniques have thus piqued the interest of researchers as a viable option for SERS substrate fabrication. Not only do they offer high enhancement factors and reproducible nanostructures, they also provide the ability to fabricate nanostructures with many different geometries, shapes, sizes and periodicities. Some of the most established lithographic techniques include electron beam lithography, nanosphere lithography, laser interference lithography and many more. This review discusses established lithographic techniques, such as mentioned above, along with other upcoming lithographic techniques to understand the principles and the methodology behind them. A deep understanding of how various parameters can influence the nanostructure fabrication and thereby influence the SERS enhancement is developed. A detailed description of how these nanostructures can be fabricated is also provided for better insight. In addition, strengths and limitations of each method are discussed in detail. Lastly, we also discuss the applicability of SERS substrates for commercial applications comparing the performance of chemical synthesis routes and lithography for SERS substrate fabrication. This review serves as a base to understand the concept and application of SERS from a microfabrication perspective.

在过去的几十年里,对可重现和优化的表面增强拉曼光谱(SERS)基底的研究有了大幅增长。虽然传统的胶体合成方法通常用于 SERS 基底的制造,但它们缺乏可重复性,阻碍了它们在许多应用中的使用。对显示高阶增强因子的可重现纳米结构的需求,带来了 SERS 纳米结构制造方法的转变。因此,平版印刷技术作为一种可行的 SERS 基底制造方法,引起了研究人员的兴趣。平版印刷技术不仅能提供高增强因子和可重现的纳米结构,还能制造出具有多种不同几何形状、大小和周期性的纳米结构。一些最成熟的光刻技术包括电子束光刻、纳米层光刻、激光干涉光刻等。本综述将讨论上述成熟的光刻技术以及其他即将出现的光刻技术,以了解这些技术背后的原理和方法。深入了解各种参数如何影响纳米结构的制造,从而影响 SERS 的增强。此外,还详细介绍了如何制造这些纳米结构,以便更好地理解。此外,还详细讨论了每种方法的优势和局限性。最后,我们还讨论了 SERS 基底在商业应用中的适用性,比较了用于 SERS 基底制造的化学合成路线和光刻法的性能。本综述可作为从微细加工角度理解 SERS 概念和应用的基础。
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引用次数: 0
UV-curable coatings for energy harvesting applications: Current state-of-the-art and future perspectives 用于能量收集应用的紫外线固化涂层:当前最新技术与未来展望
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-06-01 DOI: 10.1016/j.mne.2024.100266
Donatella Duraccio , Pier Paolo Capra , Giulio Malucelli

Generally speaking, energy harvesting is an up-to-date technology that describes the possibility of capturing small amounts of energy (thermal, solar, or mechanical) from the surroundings and storing them as electrical energy for later uses when needed. Among the energy harvesting systems, the use of piezoelectric thin films and coatings is gaining increasing interest from both the academic and industrial communities, as these systems allow for the design and development of micro- and nano-scale devices, thanks to the possibility of being micromachined and to the added functionality offered by the electromechanical coupling. These peculiarities justify their use for different applications, ranging from high energy density harvesters to high sensitivity sensors, and even low power consumption and large displacement actuators. Further, the current focus of the research on piezoelectric energy harvesting coatings is shifting from fully inorganic to hybrid organic-inorganic (i.e., composite) systems, as the latter can offer higher flexibility (i.e., lower stiffness), making them more sensitive to small vibrations and therefore suitable for these specific harvesting conditions. In this regard, photoinduced polymerization (the so-called “UV-curing”) has become a suitable and reliable technique for the manufacturing of piezoelectric composite systems, as it is a solvent-free approach that allows for transforming a liquid mixture of monomers/oligomers into a solid 3D network in a few seconds, with a very limited energy consumption and a very high conversion. Besides, as the UV-curing process is very fast, the dispersed ceramic piezoelectric phase is not prone to settle down in the liquid resin, hence ensuring its homogeneous distribution within the polymer network after curing and better piezoelectric performance. The present review aims to provide the reader with an up-to-date overview of UV-curable coatings for piezoelectric energy harvesting purposes, highlighting their potential and piezoelectric features; further, some perspectives about possible future developments will be proposed.

一般来说,能量收集是一种最新技术,它描述了从周围环境中捕获少量能量(热能、太阳能或机械能)并将其储存为电能以供日后需要时使用的可能性。在能量收集系统中,压电薄膜和涂层的使用越来越受到学术界和工业界的关注,因为这些系统可以设计和开发微型和纳米级设备,这要归功于微机械加工的可能性和机电耦合提供的附加功能。这些特性证明了它们可用于不同的应用领域,从高能量密度采集器到高灵敏度传感器,甚至是低功耗和大位移执行器。此外,目前压电能量收集涂层的研究重点正从完全无机转向有机-无机混合(即复合)系统,因为后者可以提供更高的灵活性(即更低的刚度),使其对微小振动更加敏感,因此适用于这些特定的收集条件。在这方面,光诱导聚合(即所谓的 "紫外线固化")已成为制造压电复合材料系统的一种合适而可靠的技术,因为它是一种无溶剂方法,可在几秒钟内将单体/配体的液态混合物转化为固态三维网络,且能耗非常有限,转化率非常高。此外,由于紫外固化过程非常快,分散的陶瓷压电相不易沉淀在液态树脂中,因此可确保其在固化后均匀分布在聚合物网络中,从而获得更好的压电性能。本综述旨在向读者介绍用于压电能量收集目的的紫外固化涂层的最新概况,重点介绍其潜力和压电特性;此外,还将对未来可能的发展提出一些展望。
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引用次数: 0
Characterization of negative tone photoresist mr-EBL 6000.5 for i-line stepper and electron beam lithography for the Intra-Level Mix & Match Approach 用于 i 线步进和电子束光刻的负调光刻胶 mr-EBL 6000.5 在级内混合与匹配方法中的特性分析
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-06-01 DOI: 10.1016/j.mne.2024.100264
S. Schermer , C. Helke , M. Reinhardt , S. Hartmann , F. Tank , J. Wecker , G. Heldt , A. Voigt , D. Reuter

In this paper the characterization of the mr-EBL 6000.5, which is an epoxy resin based chemically amplified negative tone resist from micro resist technology (Germany, Berlin) for an Intra-Level Mix & Match (ILM&M) approach is presented. The ILM&M approach combined at least two exposure technologies on the same resist layer showing the advantage to resolve patterns of different dimensions with less process steps and short processing time. Since the mr-EBL 6000.5 resist is capable of being sensitive to both electron- and UV-radiation, process parameters for i-line stepper lithography and electron beam lithography (EBL) needs to be investigated to be capable for the ILM&M approach. First, a spin curve and a post exposure bake (PEB) study were applied to find suitable process parameters for both exposure technologies. Furthermore, the minimum feature sizes for both patterning technologies are investigated by using a 500 nm thick resist layer. The impact of small feature sizes near the CD-limit of the used i-line stepper (350 nm) on the resist thickness after the development was investigated in dependence of the PEB. After all parameters were examined, they were combined to be used in the ILM&M.

本文介绍了 mr-EBL 6000.5 的特性,这是一种基于环氧树脂的化学放大负调光刻胶,由德国柏林微光刻胶技术公司生产,采用了层内混合匹配(ILM&M)方法。ILM&M 方法在同一光刻胶层上结合了至少两种曝光技术,具有工艺步骤少、加工时间短的优势,可以解决不同尺寸的图案问题。由于 mr-EBL 6000.5 光刻胶对电子和紫外线辐射都很敏感,因此需要研究 i-line步进光刻和电子束光刻(EBL)的工艺参数,使其能够用于 ILM&M 方法。首先,应用自旋曲线和曝光后烘烤(PEB)研究为两种曝光技术找到合适的工艺参数。此外,通过使用 500 nm 厚的抗蚀层,研究了两种图案技术的最小特征尺寸。在所使用的 i 线步进器的 CD 限值(350 nm)附近的小特征尺寸对显影后抗蚀层厚度的影响与 PEB 有关。在对所有参数进行检查后,将它们组合起来用于 ILM&M。
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引用次数: 0
Continued dimensional scaling through projection lithography 通过投影光刻技术继续扩大尺寸
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-06-01 DOI: 10.1016/j.mne.2024.100263
Kurt Ronse

This article discusses the important role that optical lithography has played in realizing Moore's Law. With the introduction of Artificial Intelligence, Machine Learning, and the Internet of Things, the demand for computing power and data storage capacity has never been as large as today. Optical lithography has been able to keep up with the resolution demand by increasing the Numerical Aperture of the projection Lens, decreasing the wavelength and innovative resist schemes. After the introduction of Immersion lithography and Double patterning, EUV was introduced by the industry. Although the transition from 193 nm lithography to EUV lithography was very difficult, EUV follows the same scaling laws as Optical Lithography. The conclusion is that the scaling laws of Optical Lithography continue to support Moore's Law, through the development of high NA EUV Lithography.

本文讨论了光学光刻技术在实现摩尔定律方面发挥的重要作用。随着人工智能、机器学习和物联网的引入,对计算能力和数据存储容量的需求从未像今天这样大。光学光刻技术通过增加投影透镜的数值孔径、减少波长和创新光刻胶方案,满足了对分辨率的需求。在引入沉浸式光刻技术和双图案技术之后,业界又引入了超紫外光刻技术。虽然从 193 纳米光刻过渡到极紫外光刻非常困难,但极紫外光刻遵循与光学光刻相同的缩放规律。结论是,通过高 NA EUV 光刻技术的发展,光学光刻技术的缩放规律将继续支持摩尔定律。
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引用次数: 0
Fabrication of switchable biocompatible, nano-fluidic devices using a thermoresponsive polymer on nano-patterned surfaces 在纳米图案表面使用热致伸缩聚合物制造可切换的生物兼容纳米流体设备
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-05-27 DOI: 10.1016/j.mne.2024.100265
Ch. Bickmann , Ch. Meinecke , T. Korten , H. Sekulla , Ch. Helke , Th. Blaudeck , D. Reuter , St. E. Schulz

In this study, a method for depositing and patterning the thermosensitive polymer poly(N-isopropylacrylamide) on SiO2 surfaces is presented for potential use in nano-sized microfluidic channels. Two approaches based on nanolithographic processes are shown for this purpose. In both cases, a self-assembling monolayer consisting of (3-aminopropyl)-dimethylethoxysilane was bound to the hydroxyl group of the substrate surface and subsequently functionalized with the polymerization initiator α-bromoisobutyryl bromide. In the first approach the silane monolayer itself was patterned using a photoresist and a lift-off process, followed by the selective deposition of the initiator, which starts a substrate-induced atom transfer radical polymerization for the growth of polymer on the silane monolayer. In the second approach, the lift-off takes place after the polymerization on the substrate surface. The result of this study shows the successful application of the process steps for the nano-dimensioned grafting of poly(N-isopropylacrylamide) onto SiO2 substrates. The reaction time of the silane monolayer with the polymerization initiator and the composition of the reaction solution used were found to have the greatest influence of the processes. AFM and XPS analysis of the functionalized surfaces revealed patterned growth of both the self-assembling monolayer and the polymer structures.

本研究介绍了一种在二氧化硅表面沉积和图案化热敏聚合物聚(N-异丙基丙烯酰胺)的方法,该方法有望用于纳米尺寸的微流体通道。为此介绍了两种基于纳米光刻工艺的方法。在这两种情况下,由 (3-aminopropyl)-dimethylethoxysilane 组成的自组装单层都与基底表面的羟基结合,随后用聚合引发剂 α-溴异丁酰溴进行官能化。在第一种方法中,硅烷单层本身使用光致抗蚀剂和掀离工艺进行图案化,然后选择性地沉积引发剂,从而启动基底诱导的原子转移自由基聚合反应,使聚合物在硅烷单层上生长。第二种方法则是在基底表面聚合后进行脱模。这项研究结果表明,在二氧化硅基底上纳米接枝聚(N-异丙基丙烯酰胺)的工艺步骤得到了成功应用。研究发现,硅烷单层与聚合引发剂的反应时间以及所用反应溶液的成分对工艺的影响最大。对功能化表面的原子力显微镜(AFM)和 XPS 分析表明,自组装单层和聚合物结构均呈模式化生长。
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引用次数: 0
Recent progress on gold nanoparticle biosensors monitored water quality: Insights on diversified contaminants and functionalization paradigms 监测水质的金纳米粒子生物传感器的最新进展:关于多样化污染物和功能化范例的见解
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-05-18 DOI: 10.1016/j.mne.2024.100261
Parth Malik , Ruma Rani , Rachna Gupta , Rakesh Kumar Ameta , Tapan Kumar Mukherjee

Over the past few years, water quality monitoring has swiftly emerged as a thrust area for most of the developing nations. Despite its renewable essence, incessant industrialization and urbanization have depleted the natural water resources, culminating in adverse impact on potable water quality. As a consequence, reliable technologies with utmost sensitivity and accurate predictions vis-à-vis authentic qualitative standards are urgently needed. Herein, interest in using gold nanoparticles (Au NPs) biosensors to gauge the qualitative profile of water resources has been quite significant. Major fascinations for Au NPs biosensing driven water quality monitoring are steadfast preparation methodologies, well-understood mechanisms for size-shape modulation and inert sensitivity manifested remarkable functionalization abilities. The size-shape modulated functionalization advances for Au NPs are the dynamic outcomes of their quantum effects, anchored via single or multidimensional quantum confinements (QCs). Morphologies as vibrant as rod, spherical, cylindrical, shells and combinatorial regime have been the backbone aspects of Au NPs based biosensors. With such insights, the present article focuses on last decade noted advances aimed at Au NPs biosensors assessed water quality. The studies discussed herewith were retrieved from Pubmed using the keywords, “Gold Nanoparticle Biosensors for Water Quality Monitoring”. The knowledge shared herein could consolidate the fabrication of future Au nanomaterials based sensing technologies vis-à-vis functionalization mechanisms, cost considerations, precision aspects, integrated possibilities and long-term cautions.

在过去几年里,水质监测已迅速成为大多数发展中国家的重点领域。尽管水是可再生的,但持续的工业化和城市化耗尽了天然水资源,最终对饮用水水质造成了不利影响。因此,迫切需要具有最高灵敏度和准确预测真实水质标准的可靠技术。因此,人们对使用金纳米粒子(Au NPs)生物传感器来测量水资源的质量状况产生了浓厚的兴趣。金纳米粒子生物传感驱动水质监测的主要魅力在于其稳定的制备方法、广为人知的粒度形状调制机制和惰性灵敏度,以及显著的功能化能力。金氧化物尺寸形状调制功能化的进展是其量子效应的动态结果,通过单维或多维量子束缚(QC)实现。棒状、球状、圆柱状、壳状和组合体系等形态各异的金氧化物已成为基于金氧化物的生物传感器的支柱。有鉴于此,本文重点介绍了过去十年来在金氧化物生物传感器评估水质方面取得的显著进展。本文所讨论的研究均来自 Pubmed,关键词为 "用于水质监测的金纳米粒子生物传感器"。本文分享的知识可以从功能化机制、成本考虑、精度方面、综合可能性和长期注意事项等方面巩固未来基于金纳米材料的传感技术的制造。
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引用次数: 0
Plasmonic metamaterial absorber for MWIR and LWIR bispectral microbolometers 用于中波红外和低波红外双谱微测辐射计的等离子超材料吸收器
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-05-16 DOI: 10.1016/j.mne.2024.100262
Alexander Litke , Elahe Zakizade , Marvin Michel , Sascha Weyers , Anna Lena Schall-Giesecke

Plasmonic metamaterial absorbers (PMAs) designed for multispectral imaging in the infrared (IR) with uncooled microbolometers are investigated. The study presents Fourier transform infrared spectroscopy (FTIR) measurements of PMAs consisting of metal-insulator-metal-stacks (MIM) with square-shaped micropatches as top metal layers. The measurements reveal high absorptances of 82% to 99% for distinct wavelengths within a range from 2 μm to 9.2 μm. The spectra are evaluated with respect to the lateral dimensions of the patches and to the refractive indices of the used dielectrics SiO2, Al2O3 and Ta2O5. Numerical simulations and analytical calculations of the TM010-mode using the transmission line model (TLM) for microstrip antennas show good qualitative agreement with the measurement results. Additionally, bispectral PMAs were fabricated consisting of fields of PMAs with two different patch sizes arranged in a chessboard pattern. The individual fields of this pattern correspond to microbolometers with 12 μm pitch in shape and size. Two distinct absorption maxima can be seen in the spectra measured by FTIR. The choice of materials, deposition methods and patterning processes is suitable for the integration into the existing Fraunhofer IMS's nanotube microbolometer technology to realize multispectral infrared imaging. The fabrication process is CMOS-compatible and carried out on 8-in. wafers.

本研究调查了为使用非制冷微测辐射热计进行红外多光谱成像而设计的等离子体超材料吸收器(PMA)。研究介绍了傅立叶变换红外光谱(FTIR)对由金属-绝缘体-金属叠层(MIM)组成的 PMA 的测量结果,该叠层的顶层金属为方形微块。测量结果表明,在 2 μm 至 9.2 μm 范围内,不同波长的吸收率高达 82% 至 99%。我们根据贴片的横向尺寸以及所用电介质 SiO2、Al2O3 和 Ta2O5 的折射率对光谱进行了评估。使用微带天线的传输线模型(TLM)对 TM010 模式进行的数值模拟和分析计算表明,其与测量结果在质量上非常吻合。此外,我们还制作了双谱 PMA,由两种不同贴片尺寸的 PMA 场组成,以棋盘模式排列。该图案的各个场在形状和尺寸上与间距为 12 μm 的微测辐射计相对应。在傅立叶变换红外光谱中可以看到两个不同的吸收最大值。材料、沉积方法和图案化工艺的选择适合集成到弗劳恩霍夫 IMS 现有的纳米管微测辐射热计技术中,以实现多光谱红外成像。制造工艺与 CMOS 兼容,在 8 英寸晶圆上进行。
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Micro and Nano Engineering
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