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Nanofabrication of sharp conductive diamond tip probe chips and their application in reverse tip sample scanning probe microscopy 锋利导电金刚石尖端探针芯片的纳米制造及其在反向尖端样品扫描探针显微中的应用
IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-06-28 DOI: 10.1016/j.mne.2025.100307
L. Wouters , J. Cho , S. Gim , J. Yang , A. Kanniainen , K. Lee , P. Lagrain , N. Peric , T. Hantschel
Recently, a new scanning probe microscopy (SPM) concept called reverse tip sample scanning probe microscopy (RTS SPM) was introduced. Here, a sample is mounted at the end of a cantilever beam and scans over a tip that is integrated into an array of hundreds of SPM tips, overcoming one of the major limitations of the SPM technique, namely, the time-consuming and experiment-interrupting manual tip exchange step. However, to fully exploit this novel approach, a chip with an array of densely packed, nanometer-sharp, and durable SPM tips is essential. Therefore, we have developed a fabrication process to integrate such an array of sharp, high aspect ratio, doped diamond tips – referred to as hedgehog full diamond tip (HFDT) – into so-called probe chips, facilitating high-resolution SPM measurements and enabling rapid and seamless sample movement from one tip to another within the RTS SPM framework. An array of pyramidally shaped, doped diamond tips is fabricated through consecutive molding and diamond deposition steps. A supporting membrane is formed by metal deposition and electroplating, followed by selective underetching of the silicon substrate to release the tip array membrane and enable probe chip assembly. Finally, a self-patterned dry etching step is employed to generate multiple nanoscopic sharp tips on top of the base diamond pyramids. In this work, we present our developed and optimized probe chip technology and demonstrate its high electrical conductivity, robustness under high tip load force, and excellent spatial resolution, rendering it highly suitable for diverse electrical SPM measurement modes.
近年来,人们提出了一种新的扫描探针显微镜(SPM)概念,即反向尖端样品扫描探针显微镜(RTS SPM)。在这里,样品被安装在悬臂梁的末端,并扫描一个尖端,该尖端集成到数百个SPM尖端阵列中,克服了SPM技术的主要限制之一,即耗时和实验中断的手动尖端交换步骤。然而,为了充分利用这种新方法,一个具有密集排列、纳米级锐度和耐用SPM尖端阵列的芯片是必不可少的。因此,我们开发了一种制造工艺,将这种尖锐的,高纵横比的掺杂金刚石尖端阵列(称为刺猬全金刚石尖端(HFDT))集成到所谓的探针芯片中,促进高分辨率SPM测量,并在RTS SPM框架内实现从一个尖端到另一个尖端的快速无缝样品移动。通过连续成型和金刚石沉积步骤,制备了一组金字塔形的掺杂金刚石尖端。通过金属沉积和电镀形成支撑膜,随后对硅衬底进行选择性下蚀刻以释放尖端阵列膜并使探针芯片能够组装。最后,采用自图画化的干刻蚀步骤,在金刚石金字塔基面上生成多个纳米级尖头。在这项工作中,我们展示了我们开发和优化的探针芯片技术,并展示了其高导电性,高尖端负载力下的稳健性和出色的空间分辨率,使其非常适合各种电SPM测量模式。
{"title":"Nanofabrication of sharp conductive diamond tip probe chips and their application in reverse tip sample scanning probe microscopy","authors":"L. Wouters ,&nbsp;J. Cho ,&nbsp;S. Gim ,&nbsp;J. Yang ,&nbsp;A. Kanniainen ,&nbsp;K. Lee ,&nbsp;P. Lagrain ,&nbsp;N. Peric ,&nbsp;T. Hantschel","doi":"10.1016/j.mne.2025.100307","DOIUrl":"10.1016/j.mne.2025.100307","url":null,"abstract":"<div><div>Recently, a new scanning probe microscopy (SPM) concept called reverse tip sample scanning probe microscopy (RTS SPM) was introduced. Here, a sample is mounted at the end of a cantilever beam and scans over a tip that is integrated into an array of hundreds of SPM tips, overcoming one of the major limitations of the SPM technique, namely, the time-consuming and experiment-interrupting manual tip exchange step. However, to fully exploit this novel approach, a chip with an array of densely packed, nanometer-sharp, and durable SPM tips is essential. Therefore, we have developed a fabrication process to integrate such an array of sharp, high aspect ratio, doped diamond tips – referred to as hedgehog full diamond tip (HFDT) – into so-called probe chips, facilitating high-resolution SPM measurements and enabling rapid and seamless sample movement from one tip to another within the RTS SPM framework. An array of pyramidally shaped, doped diamond tips is fabricated through consecutive molding and diamond deposition steps. A supporting membrane is formed by metal deposition and electroplating, followed by selective underetching of the silicon substrate to release the tip array membrane and enable probe chip assembly. Finally, a self-patterned dry etching step is employed to generate multiple nanoscopic sharp tips on top of the base diamond pyramids. In this work, we present our developed and optimized probe chip technology and demonstrate its high electrical conductivity, robustness under high tip load force, and excellent spatial resolution, rendering it highly suitable for diverse electrical SPM measurement modes.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100307"},"PeriodicalIF":2.8,"publicationDate":"2025-06-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144534496","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Silicon selective etching by gold implantation: Feasibility and nanofabrication capabilities 金植入硅选择性蚀刻:可行性和纳米制造能力
IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-06-28 DOI: 10.1016/j.mne.2025.100308
E. Scattolo , A. Cian , J. Llobet , X. Borrise Nogue , S. Mondal , M. Barozzi , A. Bagolini , M. Crivellari , F. Pérez-Murano , D. Giubertoni
Silicon nanofabrication plays a crucial role in the development of advanced electronic, photonic, and quantum devices. Focused ion beam (FIB) milling is widely used for direct patterning at the nanoscale, but it requires high ion fluences, leading to long processing times, material redeposition, and increased contamination. In this work, we demonstrate an alternative FIB-based approach that relies on gold ion implantation at significantly lower fluences, enabling selective silicon etching while minimizing these drawbacks.
Gold ions (Au+) were implanted into silicon substrates with a kinetic energy of 35 keV, followed by wet etching in tetramethylammonium hydroxide (TMAH). We identified the process window of Au fluences between 1 × 1015 and 1 × 1017 ions/cm2, with secondary ion mass spectrometry (SIMS) confirming an Au concentration threshold of 3.5 × 1020 atoms/cm3 necessary to sustain etching resistance, value predicted also by Monte Carlo simulations (TRIDYN). This approach enables the fabrication of suspended silicon nanowires with a minimum width of 36 nm, a thickness of 20 nm, and lengths up to 8 μm, achieving aspect ratios exceeding 400, as well as more complex suspended structures likes nets which can be targeted for applications in nanoelectromechanical systems (NEMS) reaching nanowire width over pitch down to 2 %.
The proposed method presents a promising alternative to conventional silicon patterning, significantly reducing processing complexity while enhancing nanostructure resolution. The results provide new insights into ion-implantation-assisted etching mechanisms and expand the possibilities for silicon nanostructure fabrication.
硅纳米制造在先进电子、光子和量子器件的发展中起着至关重要的作用。聚焦离子束(FIB)铣削广泛用于纳米尺度的直接图案化,但它需要高离子影响,导致加工时间长,材料再沉积和污染增加。在这项工作中,我们展示了一种基于fib的替代方法,该方法依赖于金离子注入,影响显著降低,实现了选择性硅蚀刻,同时最大限度地减少了这些缺点。将金离子(Au+)以35kev的动能注入到硅衬底中,然后在四甲基氢氧化铵(TMAH)中进行湿法刻蚀。我们确定了Au影响的过程窗口在1 × 1015和1 × 1017离子/cm2之间,通过二次离子质谱(SIMS)确认了维持蚀刻电阻所需的3.5 × 1020原子/cm3的Au浓度阈值,该值也通过蒙特卡罗模拟(TRIDYN)预测。这种方法可以制造最小宽度为36纳米,厚度为20纳米,长度可达8 μm的悬浮硅纳米线,实现超过400的长宽比,以及更复杂的悬浮结构,如网,可用于纳米机电系统(NEMS)的应用,其纳米线宽度在俯距上可降至2%。该方法是传统硅图像化的一种有前途的替代方法,显著降低了加工复杂性,同时提高了纳米结构分辨率。该结果为离子注入辅助蚀刻机制提供了新的见解,并扩大了硅纳米结构制造的可能性。
{"title":"Silicon selective etching by gold implantation: Feasibility and nanofabrication capabilities","authors":"E. Scattolo ,&nbsp;A. Cian ,&nbsp;J. Llobet ,&nbsp;X. Borrise Nogue ,&nbsp;S. Mondal ,&nbsp;M. Barozzi ,&nbsp;A. Bagolini ,&nbsp;M. Crivellari ,&nbsp;F. Pérez-Murano ,&nbsp;D. Giubertoni","doi":"10.1016/j.mne.2025.100308","DOIUrl":"10.1016/j.mne.2025.100308","url":null,"abstract":"<div><div>Silicon nanofabrication plays a crucial role in the development of advanced electronic, photonic, and quantum devices. Focused ion beam (FIB) milling is widely used for direct patterning at the nanoscale, but it requires high ion fluences, leading to long processing times, material redeposition, and increased contamination. In this work, we demonstrate an alternative FIB-based approach that relies on gold ion implantation at significantly lower fluences, enabling selective silicon etching while minimizing these drawbacks.</div><div>Gold ions (Au<sup>+</sup>) were implanted into silicon substrates with a kinetic energy of 35 keV, followed by wet etching in tetramethylammonium hydroxide (TMAH). We identified the process window of Au fluences between 1 × 10<sup>15</sup> and 1 × 10<sup>17</sup> ions/cm<sup>2</sup>, with secondary ion mass spectrometry (SIMS) confirming an Au concentration threshold of 3.5 × 10<sup>20</sup> atoms/cm<sup>3</sup> necessary to sustain etching resistance, value predicted also by Monte Carlo simulations (TRIDYN). This approach enables the fabrication of suspended silicon nanowires with a minimum width of 36 nm, a thickness of 20 nm, and lengths up to 8 μm, achieving aspect ratios exceeding 400, as well as more complex suspended structures likes nets which can be targeted for applications in nanoelectromechanical systems (NEMS) reaching nanowire width over pitch down to 2 %.</div><div>The proposed method presents a promising alternative to conventional silicon patterning, significantly reducing processing complexity while enhancing nanostructure resolution. The results provide new insights into ion-implantation-assisted etching mechanisms and expand the possibilities for silicon nanostructure fabrication.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100308"},"PeriodicalIF":2.8,"publicationDate":"2025-06-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144549877","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Enhancing electrical discharge machining performance through nano H₂/O₂ bubble integration: A sustainable and optimized approach 通过纳米H₂/O₂泡集成提高电火花加工性能:可持续和优化的方法
IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-06-23 DOI: 10.1016/j.mne.2025.100306
Chia-Lung Kuo , Chin-Ta Chen , Chao-Ching Ho
This study explores the integration of nano H₂/O₂ bubble liquid into Electrical Discharge Machining (EDM) and its impact on machining efficiency, precision, and sustainability. Experimental results demonstrate that the use of nano H2/O2 bubbles significantly enhances discharge dispersion, improves fluid flow for chip removal, and increases overall machining energy. For SUS316, machining time was reduced by up to 25 %, and for Ti6Al4V, by up to 31 %, when using a ϕ0.3 mm electrode. Additionally, electrode consumption decreased by up to 36 %, leading to improved cost-efficiency and reduced wear. The findings highlight the potential of nano H2/O2 bubble liquid in boosting EDM performance, offering a practical and environmentally sustainable solution for industrial applications by optimizing machining time, electrode consumption, and overall energy efficiency.
本研究探讨了纳米H₂/O₂泡液在电火花加工(EDM)中的集成及其对加工效率、精度和可持续性的影响。实验结果表明,纳米H2/O2气泡的使用显著提高了放电分散性,改善了切屑的流体流动,提高了整体加工能量。对于SUS316,当使用0.3 mm电极时,加工时间减少了25%,对于Ti6Al4V,加工时间减少了31%。此外,电极消耗减少了36%,从而提高了成本效率并减少了磨损。研究结果强调了纳米H2/O2气泡液体在提高电火花加工性能方面的潜力,通过优化加工时间、电极消耗和整体能源效率,为工业应用提供了实用且环保的可持续解决方案。
{"title":"Enhancing electrical discharge machining performance through nano H₂/O₂ bubble integration: A sustainable and optimized approach","authors":"Chia-Lung Kuo ,&nbsp;Chin-Ta Chen ,&nbsp;Chao-Ching Ho","doi":"10.1016/j.mne.2025.100306","DOIUrl":"10.1016/j.mne.2025.100306","url":null,"abstract":"<div><div>This study explores the integration of nano H₂/O₂ bubble liquid into Electrical Discharge Machining (EDM) and its impact on machining efficiency, precision, and sustainability. Experimental results demonstrate that the use of nano H<sub>2</sub>/O<sub>2</sub> bubbles significantly enhances discharge dispersion, improves fluid flow for chip removal, and increases overall machining energy. For SUS316, machining time was reduced by up to 25 %, and for Ti6Al4V, by up to 31 %, when using a ϕ0.3 mm electrode. Additionally, electrode consumption decreased by up to 36 %, leading to improved cost-efficiency and reduced wear. The findings highlight the potential of nano H<sub>2</sub>/O<sub>2</sub> bubble liquid in boosting EDM performance, offering a practical and environmentally sustainable solution for industrial applications by optimizing machining time, electrode consumption, and overall energy efficiency.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100306"},"PeriodicalIF":2.8,"publicationDate":"2025-06-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144489361","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Anisotropic reactive ion etching of 2.5 micrometer thick alpha phase tantalum films for surface micromachining 2.5微米厚α相钽薄膜表面微加工的各向异性反应离子刻蚀
IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-06-23 DOI: 10.1016/j.mne.2025.100305
Md Shariful Islam, Longchang Ni, Maarten P. de Boer
An etch parameter study is conducted with the objective of achieving high anisotropy for tantalum (Ta) thin films of more than 1 μm in thickness. The gases explored are Argon (Ar), carbon tetrafluoride (CF4) and oxygen. The effects of composition, flow, pressure, and power are investigated. Optical emission spectroscopy is used to interpret the etch results. While the addition of oxygen adversely affects anisotropy, it is improved with lower pressure. An Ar:CF4 ratio of 5:1 is found to enable good etch rate and sidewall passivation. As power increases, the etch rate increases but there is no observable enhancement in anisotropy. Using a common parallel-plate RIE configuration with common low toxicity gases, a vertical sidewall is achieved for 2.5 μm thick α-Ta films with an optimum Ar to CF4 ratio, power and pressure.
为了实现厚度大于1 μm的钽(Ta)薄膜的高各向异性,对其蚀刻参数进行了研究。探测到的气体是氩(Ar)、四氟化碳(CF4)和氧。研究了组分、流量、压力和功率的影响。光学发射光谱用于解释蚀刻结果。虽然氧的加入对各向异性有不利影响,但在较低的压力下,各向异性得到改善。发现Ar:CF4比为5:1可以实现良好的蚀刻速率和侧壁钝化。随着功率的增加,腐蚀速率增加,但各向异性没有明显的增强。采用常见的平行板RIE结构和常见的低毒性气体,在最佳的Ar / CF4比、功率和压力下,获得了2.5 μm厚α-Ta膜的垂直侧壁。
{"title":"Anisotropic reactive ion etching of 2.5 micrometer thick alpha phase tantalum films for surface micromachining","authors":"Md Shariful Islam,&nbsp;Longchang Ni,&nbsp;Maarten P. de Boer","doi":"10.1016/j.mne.2025.100305","DOIUrl":"10.1016/j.mne.2025.100305","url":null,"abstract":"<div><div>An etch parameter study is conducted with the objective of achieving high anisotropy for tantalum (Ta) thin films of more than 1 μm in thickness. The gases explored are Argon (Ar), carbon tetrafluoride (CF<sub>4</sub>) and oxygen. The effects of composition, flow, pressure, and power are investigated. Optical emission spectroscopy is used to interpret the etch results. While the addition of oxygen adversely affects anisotropy, it is improved with lower pressure. An Ar:CF<sub>4</sub> ratio of 5:1 is found to enable good etch rate and sidewall passivation. As power increases, the etch rate increases but there is no observable enhancement in anisotropy. Using a common parallel-plate RIE configuration with common low toxicity gases, a vertical sidewall is achieved for 2.5 μm thick <span><math><mo>α</mo></math></span>-Ta films with an optimum Ar to CF<sub>4</sub> ratio, power and pressure.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100305"},"PeriodicalIF":2.8,"publicationDate":"2025-06-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144549878","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Ni-P metallization of nylon 6,6 yarns with varying twist numbers by supercritical CO2 catalyzation toward weavable devices 超临界CO2催化不同捻数尼龙6,6纱Ni-P金属化制备可织装置
IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-06-16 DOI: 10.1016/j.mne.2025.100304
Kazuhiro Shibata , Tomoyuki Kurioka , Hikaru Kondo , Nao Yoshida , Wan-Ting Chiu , Chun-Yi Chen , Tso-Fu Mark Chang , Hiromichi Kurosu , Masato Sone
Weavable devices are innovative fabric-based electronics created by weaving yarns with various functions into a single cloth, enabling multifunctionality beyond traditional wearable devices. Electrically conductive yarns are essential for this integration, and in practical applications, yarns are prepared with varying twist numbers. This study investigates the metallization of nylon 6,6 yarns using a supercritical CO2-assisted NiP electroless plating method and examines the influence of twist numbers on metallization characteristics. The results show that increasing the twist number significantly decreases the electrical resistance of Ni-P/nylon 6,6 composite yarns, underscoring the critical role of yarn structure in electrical conductivity. Energy-dispersive X-ray spectroscopy (EDS) analysis indicates that higher twist numbers (0 T/m to 865 T/m) improve the distribution of Pd catalysts on scCO2-catalyzed nylon 6,6 yarns. Additionally, scanning electron microscope (SEM) observations and EDS analysis show that increasing the twist number leads to thicker and more uniform NiP coatings, thereby improving the electrical performance. Overall, this study demonstrates that optimizing twist number is key to improving the metallization quality and electrical properties of nylon 6,6 yarns for advanced weavable electronic applications.
可编织设备是一种创新的基于织物的电子产品,通过将具有各种功能的纱线编织到一块布上,实现了传统可穿戴设备之外的多功能。导电纱线对于这种集成是必不可少的,在实际应用中,纱线的捻度是不同的。采用超临界co2辅助化学镀法对尼龙6,6丝进行了金属化处理,并考察了捻数对金属化性能的影响。结果表明,增加捻数可显著降低Ni-P/尼龙6,6复合纱线的电阻,说明纱线结构对导电率的影响至关重要。能量色散x射线能谱(EDS)分析表明,较高的捻度(0 ~ 865 T/m)改善了钯催化剂在scco2催化尼龙6,6纱上的分布。此外,扫描电镜(SEM)观察和能谱分析表明,增加捻度可以使NiP涂层更厚、更均匀,从而提高电气性能。总之,本研究表明,优化捻数是提高尼龙6,6丝金属化质量和电性能的关键,尼龙6,6丝用于先进的可织电子应用。
{"title":"Ni-P metallization of nylon 6,6 yarns with varying twist numbers by supercritical CO2 catalyzation toward weavable devices","authors":"Kazuhiro Shibata ,&nbsp;Tomoyuki Kurioka ,&nbsp;Hikaru Kondo ,&nbsp;Nao Yoshida ,&nbsp;Wan-Ting Chiu ,&nbsp;Chun-Yi Chen ,&nbsp;Tso-Fu Mark Chang ,&nbsp;Hiromichi Kurosu ,&nbsp;Masato Sone","doi":"10.1016/j.mne.2025.100304","DOIUrl":"10.1016/j.mne.2025.100304","url":null,"abstract":"<div><div>Weavable devices are innovative fabric-based electronics created by weaving yarns with various functions into a single cloth, enabling multifunctionality beyond traditional wearable devices. Electrically conductive yarns are essential for this integration, and in practical applications, yarns are prepared with varying twist numbers. This study investigates the metallization of nylon 6,6 yarns using a supercritical CO<sub>2</sub>-assisted Ni<img>P electroless plating method and examines the influence of twist numbers on metallization characteristics. The results show that increasing the twist number significantly decreases the electrical resistance of Ni-P/nylon 6,6 composite yarns, underscoring the critical role of yarn structure in electrical conductivity. Energy-dispersive X-ray spectroscopy (EDS) analysis indicates that higher twist numbers (0 T/m to 865 T/m) improve the distribution of Pd catalysts on scCO<sub>2</sub>-catalyzed nylon 6,6 yarns. Additionally, scanning electron microscope (SEM) observations and EDS analysis show that increasing the twist number leads to thicker and more uniform Ni<img>P coatings, thereby improving the electrical performance. Overall, this study demonstrates that optimizing twist number is key to improving the metallization quality and electrical properties of nylon 6,6 yarns for advanced weavable electronic applications.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100304"},"PeriodicalIF":2.8,"publicationDate":"2025-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144322776","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Real time analysis of cancer ovarian cell growth and migration on soft surfaces 卵巢癌细胞在柔软表面生长和迁移的实时分析
IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-06-15 DOI: 10.1016/j.mne.2025.100303
Maria Laura Coluccio , Luigi Bruno , Cristina Laurini , Francesca Gualtieri , Valentina Rocca , Tahreem Arshad Butt , Annamaria Cerantonio , Anna Martina Battaglia , Giuseppe Viglietto , Carmela De Marco , Francesco Gentile
It is well established that the nano-geometry and mechanical properties of a material's interface can significantly influence - and potentially enhance - cell adhesion, growth, proliferation, and migration, collectively referred to as cell behavior. At the same time, these behavioral responses are inherently dependent on the cell's own biological characteristics, including its type, age, cell cycle phase, and whether it is normal or cancerous - as well as, in the latter case, the stage of cancer. In this context, we hypothesize that these material and cellular factors may act synergistically, such that carefully engineered materials can modulate and amplify cellular responses. Specifically, such materials may function as amplifiers, accentuating the behavioral differences between distinct cell lines and thereby improving our ability to distinguish between them. Here, we used this concept to segregate OVCAR-429 ovarian cancer cells silenced for the EXT1 gene (shEXT1) from a control (SCR): i.e. cells infected with an empty lentivirus. EXT1 encodes a glycosyltransferase implicated in the synthesis of heparan sulfate proteoglycans and may play a role in cancer cell invasion and metastasis. We produced polydimethylsiloxane (PDMS) substrates with low values of Young's modulus in the MPa range, and moderate values of roughness of about 20nm. Then, we monitored cell-behavior over time on PDMS substrates and on standard rigid microplates for comparison. Analysis of cell trajectories revealed that shEXT1 cells exhibited significantly reduced motility on PDMS surfaces compared control cells, with cell velocity and diffusivity reduced by more than twofold, whereas no significant differences were observed on standard surfaces. Our results thus indicate the potential of soft biomaterials to reveal biological differences in disease models.
众所周知,材料界面的纳米几何形状和机械性能可以显著影响并潜在地增强细胞的粘附、生长、增殖和迁移,统称为细胞行为。与此同时,这些行为反应本质上取决于细胞自身的生物学特征,包括细胞的类型、年龄、细胞周期阶段,以及它是正常的还是癌变的——如果是癌变的,还取决于癌变的阶段。在这种情况下,我们假设这些材料和细胞因素可能协同作用,这样精心设计的材料可以调节和放大细胞反应。具体来说,这些材料可以作为放大器,强调不同细胞系之间的行为差异,从而提高我们区分它们的能力。在这里,我们使用这一概念从对照(SCR)中分离出对EXT1基因(shEXT1)沉默的OVCAR-429卵巢癌细胞,即被空慢病毒感染的细胞。EXT1编码一种糖基转移酶,参与硫酸肝素蛋白聚糖的合成,并可能在癌细胞的侵袭和转移中发挥作用。我们生产了聚二甲基硅氧烷(PDMS)衬底,其杨氏模量在MPa范围内,粗糙度适中,约为20nm。然后,我们在PDMS底物和标准刚性微孔板上监测细胞随时间的行为进行比较。细胞轨迹分析显示,与对照细胞相比,shEXT1细胞在PDMS表面上的运动性明显降低,细胞速度和扩散率降低了两倍以上,而在标准表面上没有观察到显著差异。因此,我们的结果表明,软生物材料在揭示疾病模型的生物学差异方面具有潜力。
{"title":"Real time analysis of cancer ovarian cell growth and migration on soft surfaces","authors":"Maria Laura Coluccio ,&nbsp;Luigi Bruno ,&nbsp;Cristina Laurini ,&nbsp;Francesca Gualtieri ,&nbsp;Valentina Rocca ,&nbsp;Tahreem Arshad Butt ,&nbsp;Annamaria Cerantonio ,&nbsp;Anna Martina Battaglia ,&nbsp;Giuseppe Viglietto ,&nbsp;Carmela De Marco ,&nbsp;Francesco Gentile","doi":"10.1016/j.mne.2025.100303","DOIUrl":"10.1016/j.mne.2025.100303","url":null,"abstract":"<div><div>It is well established that the nano-geometry and mechanical properties of a material's interface can significantly influence - and potentially enhance - cell adhesion, growth, proliferation, and migration, collectively referred to as cell behavior. At the same time, these behavioral responses are inherently dependent on the cell's own biological characteristics, including its type, age, cell cycle phase, and whether it is normal or cancerous - as well as, in the latter case, the stage of cancer. In this context, we hypothesize that these material and cellular factors may act synergistically, such that carefully engineered materials can modulate and amplify cellular responses. Specifically, such materials may function as amplifiers, accentuating the behavioral differences between distinct cell lines and thereby improving our ability to distinguish between them. Here, we used this concept to segregate OVCAR-429 ovarian cancer cells silenced for the EXT1 gene (shEXT1) from a control (SCR): i.e. cells infected with an empty lentivirus. EXT1 encodes a glycosyltransferase implicated in the synthesis of heparan sulfate proteoglycans and may play a role in cancer cell invasion and metastasis. We produced polydimethylsiloxane (PDMS) substrates with low values of Young's modulus in the MPa range, and moderate values of roughness of about <span><math><mn>20</mn><mspace></mspace><mi>nm</mi></math></span>. Then, we monitored cell-behavior over time on PDMS substrates and on standard rigid microplates for comparison. Analysis of cell trajectories revealed that shEXT1 cells exhibited significantly reduced motility on PDMS surfaces compared control cells, with cell velocity and diffusivity reduced by more than twofold, whereas no significant differences were observed on standard surfaces. Our results thus indicate the potential of soft biomaterials to reveal biological differences in disease models.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100303"},"PeriodicalIF":2.8,"publicationDate":"2025-06-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144312573","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Influence of DMSO/DMF ratio on the crystal growth and optical properties of Sn-based perovskite films DMSO/DMF比对sn基钙钛矿薄膜晶体生长和光学性能的影响
IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-06-09 DOI: 10.1016/j.mne.2025.100302
Hideto Tokizawa , Xinwei Zhao , Mariko Murayama
Perovskite solar cells (PSCs) are promising candidates for next-generation photovoltaic technology because of their high power conversion efficiency (PCE) and low production cost. However, the presence of lead in most PSCs raises concerns about their environmental impact. Tin (Sn)-based PSCs offer a less toxic alternative, but their performance still lags behind lead (Pb)-based counterparts. This study investigates the impact of solvent composition and annealing temperature on the crystal growth and optoelectronic properties of Sn-based perovskite (MA0.2FA0.8SnI3) thin films. By varying the ratio of dimethyl sulfoxide (DMSO) and N,N-dimethylformamide (DMF) in the precursor solution, we systematically controlled the crystallization process, guided by the LaMer model. X-ray diffraction (XRD) and microscopy analyses revealed that solvent ratio and annealing temperature significantly influence the crystallinity and morphology of the films. High DMSO ratios promoted larger crystal formation, while high DMF ratios induced smaller crystals. Optical characterization revealed a correlation between film morphology and band gap, with deviations from the theoretical value attributed to voids and incomplete surface coverage. Our findings demonstrate the critical role of solvent engineering in optimizing the quality of tin-based perovskite films for enhanced solar cell performance.
钙钛矿太阳能电池(PSCs)因其高功率转换效率(PCE)和低生产成本而成为下一代光伏技术的有前途的候选者。然而,大多数psc中铅的存在引起了人们对其环境影响的担忧。锡(Sn)基PSCs提供了毒性较小的替代品,但其性能仍然落后于铅(Pb)基PSCs。本研究考察了溶剂组成和退火温度对sn基钙钛矿(MA0.2FA0.8SnI3)薄膜晶体生长和光电性能的影响。通过改变前驱体溶液中二甲亚砜(DMSO)和N,N-二甲基甲酰胺(DMF)的比例,我们在LaMer模型的指导下系统地控制了结晶过程。x射线衍射(XRD)和显微分析表明,溶剂配比和退火温度对薄膜的结晶度和形貌有显著影响。高DMSO比促进较大的晶体形成,而高DMF比诱导较小的晶体形成。光学表征揭示了薄膜形态和带隙之间的相关性,与理论值的偏差归因于空洞和不完整的表面覆盖。我们的发现证明了溶剂工程在优化锡基钙钛矿薄膜质量以增强太阳能电池性能方面的关键作用。
{"title":"Influence of DMSO/DMF ratio on the crystal growth and optical properties of Sn-based perovskite films","authors":"Hideto Tokizawa ,&nbsp;Xinwei Zhao ,&nbsp;Mariko Murayama","doi":"10.1016/j.mne.2025.100302","DOIUrl":"10.1016/j.mne.2025.100302","url":null,"abstract":"<div><div>Perovskite solar cells (PSCs) are promising candidates for next-generation photovoltaic technology because of their high power conversion efficiency (PCE) and low production cost. However, the presence of lead in most PSCs raises concerns about their environmental impact. Tin (Sn)-based PSCs offer a less toxic alternative, but their performance still lags behind lead (Pb)-based counterparts. This study investigates the impact of solvent composition and annealing temperature on the crystal growth and optoelectronic properties of Sn-based perovskite (MA<sub>0.2</sub>FA<sub>0.8</sub>SnI<sub>3</sub>) thin films. By varying the ratio of dimethyl sulfoxide (DMSO) and <em>N</em>,<em>N</em>-dimethylformamide (DMF) in the precursor solution, we systematically controlled the crystallization process, guided by the LaMer model. X-ray diffraction (XRD) and microscopy analyses revealed that solvent ratio and annealing temperature significantly influence the crystallinity and morphology of the films. High DMSO ratios promoted larger crystal formation, while high DMF ratios induced smaller crystals. Optical characterization revealed a correlation between film morphology and band gap, with deviations from the theoretical value attributed to voids and incomplete surface coverage. Our findings demonstrate the critical role of solvent engineering in optimizing the quality of tin-based perovskite films for enhanced solar cell performance.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100302"},"PeriodicalIF":2.8,"publicationDate":"2025-06-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144272353","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Energy dissipation in silicon nitride microbeam resonators with a 3D-printed polymer layer 三维打印聚合物层氮化硅微束谐振器的能量耗散
IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-06-05 DOI: 10.1016/j.mne.2025.100300
Lucia Crocetto , Tomás Manzaneque , Murali Krishna Ghatkesar
We present an analysis of the main mechanisms of dissipation of resonant multilayer double-clamped microbeams in the frequency range 200 to 500 kHz. The devices consist of 2μm thick silicon nitride (E 160 GPa) beams covered with a polymer IP-Dip (E 4 GPa) layer fabricated by two-photon polymerization. A laser-Doppler vibrometer was used to measure the resonant vibrations and energy dissipation of the devices in high vacuum (< 0.05 Pa) at room temperature. The experimental findings were compared with theoretical and finite element method (FEM) results. The quality factor, dominated by the intrinsic dissipation in the IP-Dip layer, has proven to have a strong dependence on polymer thickness. On this basis, a viscous model for intrinsic dissipation in a polymer layer was formulated.
本文分析了共振多层双箝位微光束在200 ~ 500khz范围内的主要耗散机制。该器件由2μm厚的氮化硅(E≈160 GPa)光束和双光子聚合法制备的聚合物IP-Dip (E≈4 GPa)层组成。用激光多普勒测振仪测量了器件在高真空条件下的共振振动和能量耗散。0.05 Pa)。实验结果与理论计算结果和有限元计算结果进行了比较。以IP-Dip层的本征耗散为主导的质量因子已被证明与聚合物厚度有很强的依赖性。在此基础上,建立了聚合物层内本征耗散的粘性模型。
{"title":"Energy dissipation in silicon nitride microbeam resonators with a 3D-printed polymer layer","authors":"Lucia Crocetto ,&nbsp;Tomás Manzaneque ,&nbsp;Murali Krishna Ghatkesar","doi":"10.1016/j.mne.2025.100300","DOIUrl":"10.1016/j.mne.2025.100300","url":null,"abstract":"<div><div>We present an analysis of the main mechanisms of dissipation of resonant multilayer double-clamped microbeams in the frequency range 200 to 500 kHz. The devices consist of <span><math><mn>2</mn><mspace></mspace><mi>μm</mi></math></span> thick silicon nitride (E <span><math><mo>≈</mo></math></span> 160 GPa) beams covered with a polymer IP-Dip (E <span><math><mo>≈</mo></math></span> 4 GPa) layer fabricated by two-photon polymerization. A laser-Doppler vibrometer was used to measure the resonant vibrations and energy dissipation of the devices in high vacuum (&lt; 0.05 Pa) at room temperature. The experimental findings were compared with theoretical and finite element method (FEM) results. The quality factor, dominated by the intrinsic dissipation in the IP-Dip layer, has proven to have a strong dependence on polymer thickness. On this basis, a viscous model for intrinsic dissipation in a polymer layer was formulated.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100300"},"PeriodicalIF":2.8,"publicationDate":"2025-06-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144262766","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Stereolithography 3D printing method for multi-material hydrogel 2D photo-patterning in a microfluidic chip 微流控芯片中多材料水凝胶二维图像的立体光刻3D打印方法
IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-06-01 DOI: 10.1016/j.mne.2025.100301
S. Assie-Souleille, L. Seguier, D. Gauchard, I. Drobecq, B. Franc, L. Malaquin, J. Foncy
We present a novel and straightforward method using a standard stereolithography (SLA) 3D printer for high-resolution (20 μm x-y resolution), multi-material 2D hydrogel photo-patterning directly within a microfluidic chip. The process involves sequential injections of photosensitive hydrogel into a transparent microfluidic chip coupled with sequential direct laser writing by the printer through point-by-point photopolymerization. Our approach integrates a custom miniaturized syringe pump system into the SLA printer, thereby enabling fluid management and sequential injection of different photosensitive hydrogels directly into the microfluidic environment between each laser writing sequence. This technique enables the fabrication of intricate, multi-material hydrogel patterns (e.g., PEGDA and HAMA) with high spatial resolution over areas spanning several square millimeters. Future developments will focus on expanding the range of biomaterials and incorporating cell-laden hydrogels to facilitate the creation of biologically relevant microenvironments on chip.
This study opens new possibilities for high-resolution, multi-material hydrogel patterning in microfluidics and offers a valuable platform for advancing research in microsystems engineering.
我们提出了一种新颖而直接的方法,使用标准立体光刻(SLA) 3D打印机进行高分辨率(20 μm x-y分辨率),直接在微流控芯片内进行多材料2D水凝胶照片图像化。该过程包括将光敏水凝胶依次注射到透明微流控芯片中,并通过逐点光聚合由打印机进行顺序直接激光书写。我们的方法将定制的微型注射泵系统集成到SLA打印机中,从而实现流体管理和在每个激光书写序列之间将不同的光敏水凝胶直接注射到微流体环境中。该技术能够制造复杂的多材料水凝胶图案(例如,PEGDA和HAMA),在跨越几平方毫米的区域内具有高空间分辨率。未来的发展将集中在扩大生物材料的范围和结合细胞负载的水凝胶,以促进在芯片上创建生物相关的微环境。该研究为微流体中高分辨率、多材料水凝胶图谱的研究开辟了新的可能性,并为推进微系统工程研究提供了一个有价值的平台。
{"title":"Stereolithography 3D printing method for multi-material hydrogel 2D photo-patterning in a microfluidic chip","authors":"S. Assie-Souleille,&nbsp;L. Seguier,&nbsp;D. Gauchard,&nbsp;I. Drobecq,&nbsp;B. Franc,&nbsp;L. Malaquin,&nbsp;J. Foncy","doi":"10.1016/j.mne.2025.100301","DOIUrl":"10.1016/j.mne.2025.100301","url":null,"abstract":"<div><div>We present a novel and straightforward method using a standard stereolithography (SLA) 3D printer for high-resolution (20 μm x-y resolution), multi-material 2D hydrogel photo-patterning directly within a microfluidic chip. The process involves sequential injections of photosensitive hydrogel into a transparent microfluidic chip coupled with sequential direct laser writing by the printer through point-by-point photopolymerization. Our approach integrates a custom miniaturized syringe pump system into the SLA printer, thereby enabling fluid management and sequential injection of different photosensitive hydrogels directly into the microfluidic environment between each laser writing sequence. This technique enables the fabrication of intricate, multi-material hydrogel patterns (e.g., PEGDA and HAMA) with high spatial resolution over areas spanning several square millimeters. Future developments will focus on expanding the range of biomaterials and incorporating cell-laden hydrogels to facilitate the creation of biologically relevant microenvironments on chip.</div><div>This study opens new possibilities for high-resolution, multi-material hydrogel patterning in microfluidics and offers a valuable platform for advancing research in microsystems engineering.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"27 ","pages":"Article 100301"},"PeriodicalIF":2.8,"publicationDate":"2025-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144204270","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Assessing ultrasonic and optical flow velocimetry in a millifluidic device using oil-in-water emulsions as blood mimicking fluid 利用水包油乳剂作为模拟血液的液体,在微流体装置中评估超声和光流速测量
IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-05-08 DOI: 10.1016/j.mne.2025.100298
Estelle Lu , Williams Flores Cisternas , Héloïse Uhl , Alexandre Chargueraud , Quentin Grimal , Guillaume Renaud , Jean-Gabriel Minonzio , Jacques Fattaccioli
Blood-mimicking fluids (BMFs) play a critical role in ultrasonic imaging and Doppler flow studies by replicating the physical and acoustic properties of blood. This study introduces a novel soybean oil-in-water emulsion as a BMF with particle size akin to red blood cells. Using a millifluidic device, we cross-validated flow profiles through both Doppler velocimetry and optical particle tracking, demonstrating compatibility with theoretical Poiseuille flow models. The millifluidic chip, fabricated via stereolithography, provided an optimized platform for dual optical and ultrasonic assessments. Results showed strong agreement between the two methods across a range of flow rates, affirming the suitability of the emulsion for velocimetry applications. Furthermore, the acoustic properties of soybean oil droplets support their potential as an echogenic and stable alternative to conventional BMFs.
血液模拟液(BMFs)通过复制血液的物理和声学特性,在超声成像和多普勒血流研究中发挥着关键作用。本研究介绍了一种新型的大豆油水包乳剂,其颗粒大小类似于红细胞。使用微流体装置,我们通过多普勒测速和光学粒子跟踪交叉验证了流动剖面,证明了与理论泊泽维尔流动模型的兼容性。通过立体光刻制造的微流控芯片为双光学和超声评估提供了优化的平台。结果表明,两种方法在一定的流速范围内具有很强的一致性,证实了乳液在测速应用中的适用性。此外,大豆油液滴的声学特性支持它们作为传统生物燃料的回声和稳定替代品的潜力。
{"title":"Assessing ultrasonic and optical flow velocimetry in a millifluidic device using oil-in-water emulsions as blood mimicking fluid","authors":"Estelle Lu ,&nbsp;Williams Flores Cisternas ,&nbsp;Héloïse Uhl ,&nbsp;Alexandre Chargueraud ,&nbsp;Quentin Grimal ,&nbsp;Guillaume Renaud ,&nbsp;Jean-Gabriel Minonzio ,&nbsp;Jacques Fattaccioli","doi":"10.1016/j.mne.2025.100298","DOIUrl":"10.1016/j.mne.2025.100298","url":null,"abstract":"<div><div>Blood-mimicking fluids (BMFs) play a critical role in ultrasonic imaging and Doppler flow studies by replicating the physical and acoustic properties of blood. This study introduces a novel soybean oil-in-water emulsion as a BMF with particle size akin to red blood cells. Using a millifluidic device, we cross-validated flow profiles through both Doppler velocimetry and optical particle tracking, demonstrating compatibility with theoretical Poiseuille flow models. The millifluidic chip, fabricated via stereolithography, provided an optimized platform for dual optical and ultrasonic assessments. Results showed strong agreement between the two methods across a range of flow rates, affirming the suitability of the emulsion for velocimetry applications. Furthermore, the acoustic properties of soybean oil droplets support their potential as an echogenic and stable alternative to conventional BMFs.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"27 ","pages":"Article 100298"},"PeriodicalIF":2.8,"publicationDate":"2025-05-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143942364","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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Micro and Nano Engineering
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