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Influence of the RF voltage amplitude on the space- and time-resolved properties of RF-LF dielectric barrier discharges in α-γ mode 射频电压幅值对α-γ模式射频-低频介质势垒放电的空间和时间分辨特性的影响
Pub Date : 2024-04-23 DOI: 10.1088/1361-6595/ad4236
Raphaël Robert, Nader Sadeghi, Gerjan J M Hagelaar, L. Stafford, Françoise Massines
This work reports the results of an experimental and modelling study on dual-frequency Ar-NH3 dielectric barrier discharges (DBD) exhibiting the α – γ transition. A combination of space- and time-resolved optical absorption and emission spectroscopy is used to record spatio-temporal mappings of the Ar metastable number density, Ar 750.4 nm line emission intensity, and electron-Ar Bremsstrahlung continuum emission intensity. With the increase of the RF voltage amplitude in a 50 kHz-5 MHz DBD, maximum populations of Ar excited species (1s and 2p states, linked to the population of high-energy electrons) observed in the γ mode decrease and appear earlier in the low-frequency cycle. On the other hand, the density of the bulk electrons, monitored from the continuum emission intensity, increases, with a more prominent rise in the RF-α mode than in the γ regime. Such behaviors are consistent with the predictions of 1D fluid model and results from a decrease of the gas voltage required for self-maintenance of the cathode sheath in the γ breakdown.
本研究报告了对表现出 α - γ 转变的氩-NH3 双频介质势垒放电(DBD)进行实验和建模研究的结果。空间和时间分辨光学吸收和发射光谱相结合,记录了氩气瞬变数密度、氩气 750.4 nm 线发射强度和电子-氩气轫致辐射连续发射强度的时空映射。随着 50 kHz-5 MHz DBD 中射频电压振幅的增加,在 γ 模式中观察到的氩激发态(1s 和 2p态,与高能电子群相关)的最大数量减少,并在低频周期中提前出现。另一方面,从连续发射强度监测到的大体积电子密度增加了,在射频-α 模式中比在γ 模式中上升得更明显。这种行为与一维流体模型的预测一致,是由于γ击穿时阴极鞘自我维持所需的气体电压降低所致。
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引用次数: 1
Ar(1s5) density in a co-axial argon plasma jet with N2-O2 shielding 带有 N2-O2 屏蔽的同轴氩等离子体射流中的 Ar(1s5) 密度
Pub Date : 2024-04-18 DOI: 10.1088/1361-6595/ad4054
Duarte Gonçalves, G. Bauville, P. Jeanney, M. Lino da Silva, Luis Alves, Stéphane Pasquiers, J. Santos Sousa
Atmospheric-pressure microplasma jets (μAPPJs) are versatile sources of reactive species with diverse applications. However, understanding the plasma chemistry in these jets is challenging due to plasma-flow interactions in heterogeneous gas mixtures. Spatial metastable density profiles help to understand these physical and chemical mechanisms. This work focuses on controlling the shielding gas around a μAPPJ. We use a dielectric barrier discharge co-axial reactor where a co-flow shields the pure argon jet with different N2-O2 gas mixtures. A voltage pulse (4 kV, 1 μs, 20 kHz) generates a first discharge at the pulse’s rising edge and a second discharge at the falling edge. Tunable diode laser absorption spectroscopy measures the local Ar(1s5) density. A pure N2 (100%N2-0%O2) co-flow leads to less reproducible and lower peak Ar(1s5) density (5.8 × 1013 cm−3). Increasing the O2 admixture in the co-flow yields narrower Ar(1s5) absorbance profiles and increases the Ar(1s5) density (6.9 × 1013 - 9.1 × 1013 cm−3). The position of the peak density is closer to the reactor for higher O2 fractions. Absence of N2 results in comparable Ar(1s5) densities between the first and second discharges (maxima of 9.1 × 1013 and 9.3 × 1013 cm−3, respectively). Local Ar(1s5) density profiles from pure N2 to pure O2 shielding provide insights into physical and chemical processes. The spatially-resolved data may contribute to optimising argon μAPPJ reactors across the various applications and to validate numerical models.
大气压微等离子体射流(μAPPJs)是一种用途广泛的反应物源。然而,由于异质气体混合物中等离子体与气流的相互作用,了解这些射流中的等离子体化学性质具有挑战性。空间瞬变密度曲线有助于了解这些物理和化学机制。这项工作的重点是控制 μAPPJ 周围的屏蔽气体。我们使用了一个介质阻挡放电同轴反应器,在该反应器中,不同的 N2-O2 混合气体共流屏蔽了纯氩射流。电压脉冲(4 kV、1 μs、20 kHz)在脉冲上升沿产生第一次放电,在脉冲下降沿产生第二次放电。可调谐二极管激光吸收光谱测量局部 Ar(1s5) 密度。纯 N2(100%N2-0%O2)共流导致 Ar(1s5)密度(5.8 × 1013 cm-3)的重复性和峰值较低。增加共气流中的氧气掺量会使 Ar(1s5)吸光度曲线变窄,并增加 Ar(1s5)密度(6.9 × 1013 - 9.1 × 1013 cm-3)。O2 分数越高,密度峰的位置越靠近反应器。如果没有 N2,则第一次和第二次放电的 Ar(1s5) 密度相当(最大值分别为 9.1 × 1013 和 9.3 × 1013 cm-3)。从纯 N2 到纯 O2 屏蔽的局部 Ar(1s5) 密度剖面提供了对物理和化学过程的深入了解。空间分辨数据可能有助于优化氩μAPPJ 反应器的各种应用并验证数值模型。
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引用次数: 0
Surface recombination in Pyrex in oxygen DC glow discharges: mesoscopic modelling and comparison with experiments 氧气直流辉光放电中派尔雷克斯的表面重组:介观建模及与实验的比较
Pub Date : 2024-04-18 DOI: 10.1088/1361-6595/ad4055
P. Viegas, Jorge Silveira, T. C. Dias, O. Guaitella, A. Morillo-Candas, V. Guerra
Surface recombination in an oxygen DC glow discharge in a Pyrex (borosilicate glass) tube is studied via mesoscopic modelling and comparison with measurements of recombination probability. A total of 106 experimental conditions are assessed, with discharge current varying between 10 and 40 mA, pressure values ranging between 0.75 and 10 Torr, and fixed outer wall temperatures (Tw) of −20, 5, 25 and 50 ºC. The model includes O+O and O+O2 surface recombination reactions and a Tw dependent desorption frequency. The model is validated for all the 106 studied conditions and intends to have predictive capabilities. The analysis of the simulation results highlights that for Tw = −20 ºC and Tw = 5 ºC the dominant recombination mechanisms involve physisorbed oxygen atoms (OF) in Langmuir-Hinshelwood (L-H) recombination OF + OF and in Eley-Rideal (E-R) recombination O2 + OF, while for Tw = 25 ºC and Tw = 50 ºC processes involving chemisorbed oxygen atoms (OS) in E-R O + OS and L-H OF + OS also play a relevant role. A discussion is taken on the relevant recombination mechanisms and on ozone wall production, with relevance for higher pressure regimes.
通过介观建模以及与重组概率测量结果的比较,研究了派莱克斯(硼硅玻璃)管中氧气直流辉光放电的表面重组。共评估了 106 种实验条件,放电电流在 10 至 40 mA 之间变化,压力值在 0.75 至 10 托之间变化,外壁温度 (Tw) 固定为 -20、5、25 和 50 ºC。该模型包括 O+O 和 O+O2 表面重组反应以及与 Tw 有关的解吸频率。该模型针对所有 106 种研究条件进行了验证,并具有预测能力。对模拟结果的分析突出表明,在 Tw = -20 ºC 和 Tw = 5 ºC 条件下,主要的重组机制涉及物理吸附氧原子(OF)的朗缪尔-欣舍伍德(L-H)重组 OF + OF 和埃利-里达尔(E-R)重组 O2 + OF,而在 Tw = 25 ºC 和 Tw = 50 ºC 条件下,涉及化学吸附氧原子(OS)的 E-R O + OS 和 L-H OF + OS 过程也发挥了相关作用。本文讨论了相关的重组机制和臭氧壁的产生,以及与较高压力条件的相关性。
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引用次数: 0
Ionization layer with collision-free atoms at the edge of partially to fully ionized plasmas 部分电离到完全电离等离子体边缘的无碰撞原子电离层
Pub Date : 2024-04-16 DOI: 10.1088/1361-6595/ad3f49
M. Benilov
When a hot arc spot has just formed on the cathode surface, e.g., in the course of arc ignition on a cold cathode, a significant part of the current still flows in the glow-discharge mode to the cold surface outside the spot. The near-cathode voltage continues to be high at all points of the cathode surface. The mean free path for collisions between the atoms and the ions within the plasma ball near the spot is comparable to, or exceeds, the thickness of the ionization layer, which is a part of the near-cathode non-equilibrium layer where the ion current to the cathode is generated. The evaluation of the ion current to the cathode surface under such conditions is revisited. A fluid description of the ion motion in the ionization layer is combined with a kinetic description of the atom motion. The resulting problem admits a simple analytical solution. Formulas for the evaluation of the ion current to the cathode for a wide range of conditions are derived and the possibilities of using these formulas to improve the accuracy of existing methods for modeling high-pressure arc discharges in relation to glow-to-arc transitions are discussed.
当阴极表面刚刚形成热弧光点时,例如在冷阴极上点燃电弧的过程中,大部分电流仍以辉光放电模式流向光点外的冷表面。阴极表面各点的近阴极电压仍然很高。原子和离子在光斑附近等离子体球内碰撞的平均自由路径与电离层的厚度相当,甚至超过了电离层的厚度,而电离层是近阴极非平衡层的一部分,离子电流就是在此产生的。本文重新探讨了在这种条件下阴极表面离子电流的评估。电离层中离子运动的流体描述与原子运动的动力学描述相结合。由此产生的问题可以用简单的分析方法解决。得出了在各种条件下阴极离子电流的评估公式,并讨论了使用这些公式来提高现有高压电弧放电建模方法在辉光到电弧转换方面的准确性的可能性。
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引用次数: 0
Investigation of O atom kinetics in O2 plasma and its afterglow 研究 O2 等离子体中的 O 原子动力学及其余辉
Pub Date : 2024-04-16 DOI: 10.1088/1361-6595/ad3f4a
Matthias Castor Karel Albrechts, Ivan Tsonev, A. Bogaerts
We have developed a comprehensive kinetic model to study the O atom kinetics in an O2 plasma and its afterglow. By adopting a pseudo-1D plug-flow formalism within the kinetic model, our aim is to assess how far the O atoms travel in the plasma afterglow, evaluating its potential as a source of O atoms for post-plasma gas conversion applications. Since we could not find experimental data for pure O2 plasma at atmospheric pressure, we first validated our model at low pressure (1-10 Torr) where very good experimental data are available. Good agreement between our model and experiments was achieved for the reduced electric field, gas temperature and the densities of the dominant neutral species, i.e. O2(a), O2(b) and O. Subsequently, we confirmed that the chemistry set is consistent with thermodynamic equilibrium calculations at atmospheric pressure. Finally, we investigated the O atom densities in the O2 plasma and its afterglow, for which we considered a microwave O2 plasma torch, operating at a pressure between 0.1 and 1 atm, for a flow rate of 20 slm and an SEI of 1656 kJ/mol. Our results show that for both pressure conditions, a high dissociation degree of ca. 92 % is reached within the discharge. However, the O atoms travel much further in the plasma afterglow for p = 0.1 atm (9.7 cm) than for p = 1 atm (1.4 cm), attributed to the longer lifetime (3.8 ms at 0.1 atm vs 1.8 ms at 1 atm) resulting from slower three-body recombination kinetics, as well as a higher volumetric flow rate.
我们建立了一个综合动力学模型来研究 O2 等离子体及其余辉中的 O 原子动力学。通过在动力学模型中采用伪一维塞流形式主义,我们的目的是评估 O 原子在等离子体余辉中的移动距离,从而评估其作为等离子体后气体转换应用的 O 原子源的潜力。由于我们无法找到大气压下纯 O2 等离子体的实验数据,因此我们首先在低压(1-10 托)下验证了我们的模型,因为在低压下可以获得非常好的实验数据。在降低电场、气体温度和主要中性物种(即 O2(a)、O2(b) 和 O 的密度方面,我们的模型与实验之间取得了良好的一致性。最后,我们研究了 O2 等离子体及其余辉中的 O 原子密度,为此我们考虑了微波 O2 等离子体炬,其工作压力介于 0.1 和 1 atm 之间,流速为 20 slm,SEI 为 1656 kJ/mol。我们的研究结果表明,在这两种压力条件下,放电过程中的解离度都高达约 92%。然而,在 p = 0.1 atm(9.7 厘米)时,O 原子在等离子体余辉中的移动距离比 p = 1 atm(1.4 厘米)时要远得多,这是因为三体重组动力学速度较慢以及容积流速较高,导致 O 原子的寿命较长(0.1 atm 时为 3.8 毫秒,1 atm 时为 1.8 毫秒)。
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引用次数: 0
Effects of low-frequency voltage on nonlinear standing wave excitation, plasma uniformity, and ion dynamics in dual-frequency asymmetric capacitive discharges 低频电压对双频不对称电容放电中非线性驻波激励、等离子体均匀性和离子动力学的影响
Pub Date : 2024-04-11 DOI: 10.1088/1361-6595/ad3d82
Fang-Jie Zhou, D. Wen, Jian-Kai Liu, Ziqing Su, Kai Zhao, Yu-Ru Zhang, You-Nian Wang
It is known that in very-high-frequency capacitively coupled plasmas (VHF CCPs), the higher harmonics generated by nonlinear sheath motion can enhance the standing wave effect (SWE), which can lead to center-peaked plasma density profiles. In this work, an improved nonlinear electromagnetic model incorporating a transmission line model, an electron momentum balance model, a bulk plasma model, a collisionless nonlinear numerical sheath model, and an ion Monte-Carlo collision (MCC) model is developed to study the effects of low-frequency (LF) voltage VL on the nonlinear standing wave excitation, plasma uniformity, and ion energy and angular distribution functions (IEDFs and IADFs) in dual-frequency (DF) asymmetric capacitive argon discharges at relatively low pressure of 3 Pa. The plasma diffusion in the radial direction and ion dynamics within the LF oscillating sheath are self-consistently considered. The LF voltage VL at 2 MHz varies from 0 to 700 V while the high-frequency (HF) voltage VH at 60 MHz is fixed at 100 V. Simulation results indicate that without the addition of an LF source (i.e. VL = 0 V), there are a considerable number of high-order harmonics with short wavelengths, leading to significant SWE and central peak in the radial plasma density profile. Nevertheless, the high-order harmonic excitations tend to be weakened and merely occur around the phase of the full LF sheath collapse due to a shorter characteristic damping time of the surface waves as VL increases. This, combined with increased surface wavelengths of both the driving frequency and the higher harmonics at a higher VL, leads to suppressed standing waves and improved plasma uniformity. Meanwhile, the simulations show that both the low and the high energy peaks of IEDF move towards higher energies, and the energy peak separation width ΔE becomes wider with the increase of VL. The IEDF at the radial center of the powered electrode exhibits a broader ΔE than that at the edge. For the IADF, an increased VL results in more ions incident on the electrode with a smaller deflection angle. Because of a thinner sheath and a higher sheath voltage at the electrode center, the peak value of IADF at the electrode center is greater than that at the edge.
众所周知,在超高频电容耦合等离子体(VHF CCPs)中,非线性鞘运动产生的高次谐波会增强驻波效应(SWE),从而导致等离子体密度分布呈中心峰状。在这项工作中,一个改进的非线性电磁模型融合了传输线模型、电子动量平衡模型、体等离子体模型、无碰撞非线性数值鞘模型以及离子蒙特卡洛碰撞模型、和离子蒙特卡洛碰撞(MCC)模型,研究了低频(LF)电压 VL 对 3 Pa 相对低压下双频(DF)非对称电容氩放电中的非线性驻波激励、等离子体均匀性、离子能量和角度分布函数(IEDFs 和 IADFs)的影响。我们自洽地考虑了低频振荡鞘内等离子体的径向扩散和离子动力学。仿真结果表明,在不添加低频源(即 VL = 0 V)的情况下,会产生大量波长较短的高阶谐波,从而导致显著的 SWE 和径向等离子体密度剖面的中心峰。尽管如此,由于随着 VL 的增加,表面波的特性阻尼时间缩短,高阶谐波激励往往会减弱,而仅仅出现在低频鞘完全坍缩的相位附近。这与较高 VL 时驱动频率和高次谐波表面波长的增加相结合,导致驻波被抑制,等离子体均匀性得到改善。同时,模拟结果表明,IEDF 的低能量峰和高能量峰都在向高能量移动,能量峰分离宽度 ΔE 随着 VL 的增大而变宽。通电电极径向中心的 IEDF 比边缘的 IEDF 显示出更宽的ΔE。对于 IADF,VL 增加会导致更多离子以较小的偏转角入射到电极上。由于电极中心的鞘较薄,鞘电压较高,因此电极中心的 IADF 峰值大于边缘。
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引用次数: 0
Effect of target material on electrical properties of a two-electrode dielectric barrier helium plasma jet 靶材料对双电极介质势垒氦等离子体射流电气特性的影响
Pub Date : 2024-04-11 DOI: 10.1088/1361-6595/ad3d83
N. Škoro, K. Kutasi, Marija Puač, Z. L. Petrović, N. Puač
In this paper we present electrical characterization of a dielectric barrier discharge (DBD) plasma jet operating with He (2 slm and 3 slm) as working gas and interacting with Cu, PET and distilled H2O targets. We used a plasma jet with two copper electrodes wrapped around a glass tube. One electrode was powered by a high-voltage sinusoidal signal of 30 kHz, whereas the other electrode and the target holder were grounded. We have performed detailed investigation of the voltage and current waveforms, phase differences, volt-current (V-I) characteristics, calculated impedances and power deposition. The aim was to determine the influence of different target materials and their conductivity on the plasma properties. We calculated the total harmonic distortion (THD) factor that showed that the current through grounded electrode depends on the conductivity of the target. We also calculated the power delivered to the plasma core and the plasma plume regions and observed that the change in the target conductance influenced the power in both plasma regions. The experimentally characterized electrical circuit was simulated by a model of equivalent electrical circuit corresponding to the plasma-off and plasma-on regime. Voltage controlled current source was added as model of a streamer formed in plasma-on regime.
本文介绍了以 He(2 slm 和 3 slm)为工作气体、与铜、PET 和蒸馏水靶相互作用的介质阻挡放电(DBD)等离子体射流的电学特性。我们使用的等离子体射流带有两个包裹在玻璃管周围的铜电极。一个电极由 30 kHz 的高压正弦信号供电,而另一个电极和靶架接地。我们对电压和电流波形、相位差、电压-电流(V-I)特性、计算阻抗和功率沉积进行了详细研究。目的是确定不同靶材料及其电导率对等离子特性的影响。我们计算了总谐波失真(THD)因子,结果表明,通过接地电极的电流取决于靶材的电导率。我们还计算了输送到等离子体核心和等离子体羽流区域的功率,并观察到目标电导率的变化会影响这两个等离子体区域的功率。实验表征的电路由等效电路模型模拟,该模型对应于等离子体关闭和等离子体开启状态。还添加了电压控制电流源,作为等离子体开启状态下形成的流束模型。
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引用次数: 0
Electron power absorption in CF4 capacitively coupled RF plasmas operated in the striation mode 以条纹模式运行的 CF4 电容耦合射频等离子体中的电子功率吸收
Pub Date : 2024-04-09 DOI: 10.1088/1361-6595/ad3c69
R. Masheyeva, M. Vass, Xiao-Kun Wang, Yong-Xin Liu, A. Derzsi, Peter Hartmann, J. Schulze, Zoltán Donkó
The electron power absorption mechanisms in electronegative capacitively coupled plasmas in CF4 are investigated using PIC/MCC simulations at a pressure of p=60 Pa, a driving frequency of f= 13.56 MHz for voltage amplitudes in the interval of Φ0=100...300 V, where pronounced self-organized density variations, i.e., striations, develop. The calculations are based on the Boltzmann Term Analysis, a computational diagnostic method capable of providing a complete spatio-temporal description of electron power absorption. The discharge undergoes an electron power absorption mode transition from the drift-ambipolar- to the striation-mode at Φ0=180 V. Although Ohmic power absorption is found to be the dominant electron power absorption mechanism in the parameter range considered, the electron power absorption mode transition can be inferred from the behaviour of the spatio-temporally averaged ambipolar power absorption as a function of the voltage amplitude. Furthermore, it is shown, that as a consequence of the presence of striations, the temporal modulation of the electron density leads to a temporal modulation of the ambipolar electric field, which is responsible for the striated structures of various physical quantities related to electrons, such as the electron temperature and the ionization source function.
利用PIC/MCC模拟研究了CF4负电容耦合等离子体中的电子功率吸收机制,压力为p=60 Pa,驱动频率为f=13.56 MHz,电压幅值范围为Φ0=100...300 V,其中出现了明显的自组织密度变化,即条纹。计算基于波尔兹曼项分析法,这是一种计算诊断方法,能够提供完整的电子功率吸收时空描述。尽管在所考虑的参数范围内,欧姆功率吸收被认为是最主要的电子功率吸收机制,但电子功率吸收模式的转变可以从作为电压振幅函数的时空平均伏极性功率吸收的行为中推断出来。此外,研究还表明,由于条纹的存在,电子密度的时域调制导致了伏极电场的时域调制,这是与电子有关的各种物理量(如电子温度和电离源函数)出现条纹结构的原因。
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引用次数: 0
Spatially resolved TALIF investigation of atomic oxygen in the effluent of a CO2 microwave discharge 二氧化碳微波放电流出物中原子氧的空间分辨 TALIF 研究
Pub Date : 2024-04-09 DOI: 10.1088/1361-6595/ad3c36
Arne Meindl, Ante Hecimovic, U. Fantz
A diagnostic setup for one-dimensionally spatially resolved TALIF detection of ground state oxygen atoms (2p4 3P2,1,0) is developed. The goal of this study is to investigate the evolution of temperatures and absolute number densities of oxygen atoms along the effluent of a low-pressure CO2 microwave discharge in order to gain insights into some of the mechanisms governing the post-discharge regime. The plasma source is operated at conditions of 600 W−1200 W of absorbed power with flow rates of 74 sccm and 370 sccm pure CO2 at pressures between 1.2 mbar and 5 mbar with specific energy inputs up to 111.9 eV/molecule. These operating conditions exhibit high CO2 conversions (up to 90 %) at low energy efficiencies (2−7.4 %), due to direct electron impact dissociation driving the conversion process resulting in splitting of CO2 into CO and metastable oxygen atoms. The TALIF measurements yield spatially resolved translational temperatures between 1000 K−1600 K for most operating conditions and axial positions along the effluent. Reference measurements with xenon 6p′ [3/2]2 are used for absolute number density calibration. The resulting axially resolved number density profiles of ground state atomic oxygen increase along the effluent, even at considerable distances of several centimeters from the active discharge, before they reach a maximum between 5×1020 m−3 and 2.2×1021 m−3 depending on the condition, and decrease after that. This behavior indicates the potential significance of quenching of metastable oxygen atoms within the post-discharge regime of the investigated CO2 discharges. The measured spatially resolved number density evolutions are qualitatively consistent with quenching via wall collisions being the dominant deactivation mechanism, underlining the importance of particle-wall interactions.
本研究开发了一种用于一维空间分辨 TALIF 检测基态氧原子(2p4 3P2,1,0)的诊断装置。本研究的目的是研究氧原子的温度和绝对数量密度沿低压二氧化碳微波放电流出物的演变,以深入了解放电后机制的一些情况。等离子体源在 600 W-1200 W 的吸收功率条件下运行,纯 CO2 流量为 74 sccm 和 370 sccm,压力介于 1.2 mbar 和 5 mbar 之间,比能量输入高达 111.9 eV/分子。在这些操作条件下,二氧化碳的转化率很高(高达 90%),而能效却很低(2-7.4%),这是由于电子直接撞击解离推动了转化过程,导致二氧化碳分裂为一氧化碳和逸散氧原子。TALIF 测量得出的空间分辨率平移温度在 1000 K-1600 K 之间,适用于大多数运行条件和流出物的轴向位置。使用氙 6p′ [3/2]2 进行的参考测量用于绝对数量密度校准。所得到的基态原子氧的轴向分辨数密度曲线沿着流出物增加,甚至在距离活动排放口几厘米的相当大的距离上也是如此,然后根据条件的不同,在 5×1020 m-3 和 2.2×1021 m-3 之间达到最大值,之后便开始下降。这种行为表明,在所研究的二氧化碳放电过程中,在放电后状态下淬灭逸散氧原子可能具有重要意义。测量到的空间分辨数量密度演变与通过壁碰撞淬灭是主要失活机制的定性一致,强调了粒子与壁相互作用的重要性。
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引用次数: 0
Interaction of atmospheric pressure helium plasma jet with non-planar substrates: path selectivity of surface ionization wave 常压氦等离子体射流与非平面基底的相互作用:表面电离波的路径选择性
Pub Date : 2024-04-09 DOI: 10.1088/1361-6595/ad3c6a
Guoqiang Liu, Jiateng Zhou, Yang Xia, Y. X. Wang, Dongping Liu
Most surfaces treated by atmospheric pressure plasma jets (APPJs) in practical applications are notably three-dimensional. However, non-planar surfaces exhibit a diverse array of geometries, such as variations in curvature, roughness, and texture, complicating the prediction of surface ionization waves (SIW) propagation behavior across varied surface shapes, in the absence of sufficient experimental data. In this study, we made measurements of APPJ interactions with the non-planar substrates using the spatio-temporal resolved image method. Non-planar substrates encompassed wavy surfaces, arrayed hemispheres, and randomly textured raised surfaces. We tracked the morphology and velocity of SIW propagation over these surfaces. The results indicate that the SIW propagation on non-planar surfaces is significantly influenced by surface geometry and displays path selectivity, i.e., the SIW tends to propagate along valleys. The average propagation velocity of the SIW increases with the increasing radius of the wavy surface, as well as with the increased height of the arrayed hemispheres. This is attributable to the surface geometry constraining the dispersion of the SIW, causing it to concentrate and propagate in a singular direction. Moreover, the surface geometry markedly affects the distribution of the plasma treatment area, with the plasma inclined to enter valleys (where the light emission is significantly stronger than that of peaks) and to closely adhere to hemispherical surfaces. These patterns suggest a potential positive impact on treating skin surfaces such as pores, reducing bacteria in wrinkles, and addressing pimples.
在实际应用中,大气压等离子射流(APPJ)处理的大多数表面都是三维的。然而,非平面表面呈现出多种多样的几何形状,例如曲率、粗糙度和纹理的变化,这使得在缺乏足够实验数据的情况下,预测表面电离波(SIW)在不同形状表面的传播行为变得更加复杂。在这项研究中,我们使用时空分辨图像法测量了 APPJ 与非平面基底的相互作用。非平面基底包括波浪形表面、阵列半球和随机纹理的凸起表面。我们跟踪了 SIW 在这些表面上的形态和传播速度。结果表明,SIW 在非平面表面上的传播受表面几何形状的影响很大,并显示出路径选择性,即 SIW 倾向于沿着山谷传播。随着波浪形表面半径的增加,以及阵列半球高度的增加,SIW 的平均传播速度也在增加。这是因为表面的几何形状限制了 SIW 的扩散,使其向单一方向集中和传播。此外,表面几何形状明显影响等离子体处理区域的分布,等离子体倾向于进入谷地(在谷地,光发射明显强于峰值),并紧贴半球表面。这些模式表明,等离子体在治疗毛孔等皮肤表面、减少皱纹中的细菌和解决粉刺方面具有潜在的积极影响。
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Plasma Sources Science and Technology
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