首页 > 最新文献

Microscopy (Oxford, England)最新文献

英文 中文
A novel embedding composition for the evaluation of the internal structure of carbon materials using electron microscopy. 一种用电子显微镜评价碳材料内部结构的新型包埋组合物。
Pub Date : 2023-11-24 DOI: 10.1093/jmicro/dfad020
Tsukaho Yahagi

The image contrast obtained in electron microscopy depends on the atomic number of the sample. Therefore, obtaining a clear contrast is challenging when samples composed of light elements (carbon materials and polymers) are embedded in the resin. Herein, a newly developed embedding composition exhibiting low viscosity and high electron density is reported, which can be solidified using physical or chemical methods. When used for carbon materials, this embedding composition allows clear microscopic observation with higher contrast compared to conventional resin embedding. Furthermore, details of the observation of samples such as graphite and carbon black using this embedding composition are reported.

在电子显微镜下获得的图像对比度取决于样品的原子序数。因此,当由轻元素(碳材料和聚合物)组成的样品嵌入树脂中时,获得清晰的对比是具有挑战性的。本文报道了一种新开发的低粘度、高电子密度的包埋组合物,该包埋组合物可采用物理或化学方法固化。当用于碳材料时,与传统树脂包埋相比,这种包埋成分允许清晰的微观观察,对比度更高。此外,还报道了使用该包埋组合物对石墨和炭黑等样品的观察细节。
{"title":"A novel embedding composition for the evaluation of the internal structure of carbon materials using electron microscopy.","authors":"Tsukaho Yahagi","doi":"10.1093/jmicro/dfad020","DOIUrl":"10.1093/jmicro/dfad020","url":null,"abstract":"<p><p>The image contrast obtained in electron microscopy depends on the atomic number of the sample. Therefore, obtaining a clear contrast is challenging when samples composed of light elements (carbon materials and polymers) are embedded in the resin. Herein, a newly developed embedding composition exhibiting low viscosity and high electron density is reported, which can be solidified using physical or chemical methods. When used for carbon materials, this embedding composition allows clear microscopic observation with higher contrast compared to conventional resin embedding. Furthermore, details of the observation of samples such as graphite and carbon black using this embedding composition are reported.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"511-514"},"PeriodicalIF":0.0,"publicationDate":"2023-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"9140890","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High-resolution and analytical electron microscopy in a liquid flow cell via gas purging. 高分辨率和分析电子显微镜在液体流动电池通过气体净化。
Pub Date : 2023-11-24 DOI: 10.1093/jmicro/dfad023
Yevheniy Pivak, Junbeom Park, Shibabrata Basak, Rüdiger-Albert Eichel, Anne Beker, Alejandro Rozene, Héctor Hugo Pérez Garza, Hongyu Sun

Liquid-phase transmission electron microscopy (LPTEM) technique has been used to perform a wide range of in situ and operando studies. While most studies are based on the sample contrast change in the liquid, acquiring high qualitative results in the native liquid environment still poses a challenge. Herein, we present a novel and facile method to perform high-resolution and analytical electron microscopy studies in a liquid flow cell. This technique is based on removing the liquid from the observation area by a flow of gas. It is expected that the proposed approach can find broad applications in LPTEM studies.

液相透射电子显微镜(LPTEM)技术已被用于进行广泛的原位和操作研究。虽然大多数研究都是基于样品在液体中的对比度变化,但在天然液体环境中获得高质量的结果仍然是一个挑战。在此,我们提出了一种新颖而简便的方法来执行高分辨率和分析电子显微镜研究的液体流动池。这种技术的基础是通过气流将液体从观察区域移走。该方法有望在LPTEM研究中得到广泛应用。
{"title":"High-resolution and analytical electron microscopy in a liquid flow cell via gas purging.","authors":"Yevheniy Pivak, Junbeom Park, Shibabrata Basak, Rüdiger-Albert Eichel, Anne Beker, Alejandro Rozene, Héctor Hugo Pérez Garza, Hongyu Sun","doi":"10.1093/jmicro/dfad023","DOIUrl":"10.1093/jmicro/dfad023","url":null,"abstract":"<p><p>Liquid-phase transmission electron microscopy (LPTEM) technique has been used to perform a wide range of in situ and operando studies. While most studies are based on the sample contrast change in the liquid, acquiring high qualitative results in the native liquid environment still poses a challenge. Herein, we present a novel and facile method to perform high-resolution and analytical electron microscopy studies in a liquid flow cell. This technique is based on removing the liquid from the observation area by a flow of gas. It is expected that the proposed approach can find broad applications in LPTEM studies.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"520-524"},"PeriodicalIF":0.0,"publicationDate":"2023-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"9641816","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Using a novel CLEM system to localize lipid droplets and membranes in desiccated embryonic axis cells of soybean seeds. 利用新型CLEM系统定位大豆种子干燥胚轴细胞的脂滴和膜。
Pub Date : 2023-11-24 DOI: 10.1093/jmicro/dfad017
Salma Khanam, Takayuki Funatsu, Koji Tanaka, Yasuko Kaneko

Lipid droplets and membranes in radicle cells from desiccated embryonic axes of soybean (Glycine max) seeds were examined by a recently developed correlative light and electron microscopy system, which has been designed to facilitate the observation of identical locations using an upright reflected light microscope and compact SEM successively with minimum time lapse. Lipids are major components of membranes and are also stored in numerous lipid droplets lining plasma membranes in many seed cells. Fluorescently stained lipid droplets and membranes in the desiccated radicle cells were mainly located along the surface of shrunk protoplasm and around presumptive protein bodies, which will turn into vacuoles and increase their volume for radicle protrusion. Co-localization of lipid droplets and membranes suggests the presence of a membrane protection mechanism during desiccation and rehydration processes that ensures prompt elongation of radicle cells during germination.

本文利用最新开发的光学和电子显微镜系统,对大豆胚轴干燥后胚根细胞中的脂滴和膜进行了研究。该系统的设计目的是使直立反射光显微镜和紧凑扫描电镜在最短的时间内连续观察相同的位置。在许多种子细胞中,脂质是膜的主要成分,也储存在质膜内的许多脂滴中。在干燥的胚根细胞中,荧光染色的脂滴和膜主要分布在萎缩的原生质表面和推定的蛋白体周围,这些脂滴和膜会变成液泡,增加了胚根突出的体积。脂滴和膜的共定位表明,在干燥和再水化过程中存在一种膜保护机制,确保胚根细胞在萌发过程中迅速伸长。
{"title":"Using a novel CLEM system to localize lipid droplets and membranes in desiccated embryonic axis cells of soybean seeds.","authors":"Salma Khanam, Takayuki Funatsu, Koji Tanaka, Yasuko Kaneko","doi":"10.1093/jmicro/dfad017","DOIUrl":"10.1093/jmicro/dfad017","url":null,"abstract":"<p><p>Lipid droplets and membranes in radicle cells from desiccated embryonic axes of soybean (Glycine max) seeds were examined by a recently developed correlative light and electron microscopy system, which has been designed to facilitate the observation of identical locations using an upright reflected light microscope and compact SEM successively with minimum time lapse. Lipids are major components of membranes and are also stored in numerous lipid droplets lining plasma membranes in many seed cells. Fluorescently stained lipid droplets and membranes in the desiccated radicle cells were mainly located along the surface of shrunk protoplasm and around presumptive protein bodies, which will turn into vacuoles and increase their volume for radicle protrusion. Co-localization of lipid droplets and membranes suggests the presence of a membrane protection mechanism during desiccation and rehydration processes that ensures prompt elongation of radicle cells during germination.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"506-510"},"PeriodicalIF":0.0,"publicationDate":"2023-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"9332069","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Low-dose measurement of electric potential distribution in organic light-emitting diode by phase-shifting electron holography with 3D tensor decomposition. 用三维张量分解相移电子全息法测量有机发光二极管的低剂量电位分布。
Pub Date : 2023-11-24 DOI: 10.1093/jmicro/dfad019
Yusei Sasaki, Kazuo Yamamoto, Satoshi Anada, Noriyuki Yoshimoto

To improve the performance of organic light-emitting diodes (OLEDs), it is essential to understand and control the electric potential in the organic semiconductor layers. Electron holography (EH) is a powerful technique for visualizing the potential distribution with a transmission electron microscope. However, it has a serious issue that high-energy electrons may damage the organic layers, meaning that a low-dose EH is required. Here, we used a machine learning technique, three-dimensional (3D) tensor decomposition, to denoise electron interference patterns (holograms) of bilayer OLEDs composed of N,N'-di-[(1-naphthyl)-N,N'-diphenyl]-(1,1'-biphenyl)-4,4'-diamine (α-NPD) and tris-(8-hydroxyquinoline)aluminum (Alq3), acquired under a low-dose rate of 130 e- nm-2 s-1. The effect of denoising on the phase images reconstructed from the holograms was evaluated in terms of both the phase measurement error and the peak signal-to-noise ratio. We achieved a precision equivalent to that of a conventional measurement that had an exposure time 60 times longer. The electric field within the Alq3 layer decreased as the cumulative dose increased, which indicates that the Alq3 layer was degraded by the electron irradiation. On the basis of the degradation of the electric field, we concluded that the tolerance dose without damaging the OLED sample is about 1.7 × 105 e- nm-2, which is about 0.6 times that of the conventional EH. The combination of EH and 3D tensor decomposition denoising is capable of making a time series measurement of an OLED sample without any effect from the electron irradiation.

为了提高有机发光二极管(oled)的性能,必须了解和控制有机半导体层中的电势。电子全息(EH)技术是利用透射电子显微镜观察电势分布的一种强有力的技术。然而,它有一个严重的问题,高能电子可能会破坏有机层,这意味着需要低剂量的EH。在这里,我们使用了一种机器学习技术,三维(3D)张量分解,对在低剂量率130 e- nm-2 s-1下获得的由N,N'-二-[(1-萘基)-N,N'-二苯基]-(1,1'-联苯)-4,4'-二胺(α-NPD)和三-(8-羟基喹啉)铝(Alq3)组成的双层oled的电子干涉图(全息图)进行降噪。从相位测量误差和峰值信噪比两方面评价了去噪对全息图重构相位图像的影响。我们获得的精度相当于曝光时间延长60倍的传统测量。随着累积剂量的增加,Alq3层内电场逐渐减小,表明Alq3层被电子辐照降解。基于电场的退化,我们得出在不破坏OLED样品的情况下,耐受剂量约为1.7 × 105 e- nm-2,是常规EH的0.6倍。EH和3D张量分解去噪的结合能够在不受电子辐照影响的情况下对OLED样品进行时间序列测量。
{"title":"Low-dose measurement of electric potential distribution in organic light-emitting diode by phase-shifting electron holography with 3D tensor decomposition.","authors":"Yusei Sasaki, Kazuo Yamamoto, Satoshi Anada, Noriyuki Yoshimoto","doi":"10.1093/jmicro/dfad019","DOIUrl":"10.1093/jmicro/dfad019","url":null,"abstract":"<p><p>To improve the performance of organic light-emitting diodes (OLEDs), it is essential to understand and control the electric potential in the organic semiconductor layers. Electron holography (EH) is a powerful technique for visualizing the potential distribution with a transmission electron microscope. However, it has a serious issue that high-energy electrons may damage the organic layers, meaning that a low-dose EH is required. Here, we used a machine learning technique, three-dimensional (3D) tensor decomposition, to denoise electron interference patterns (holograms) of bilayer OLEDs composed of N,N'-di-[(1-naphthyl)-N,N'-diphenyl]-(1,1'-biphenyl)-4,4'-diamine (α-NPD) and tris-(8-hydroxyquinoline)aluminum (Alq3), acquired under a low-dose rate of 130 e- nm-2 s-1. The effect of denoising on the phase images reconstructed from the holograms was evaluated in terms of both the phase measurement error and the peak signal-to-noise ratio. We achieved a precision equivalent to that of a conventional measurement that had an exposure time 60 times longer. The electric field within the Alq3 layer decreased as the cumulative dose increased, which indicates that the Alq3 layer was degraded by the electron irradiation. On the basis of the degradation of the electric field, we concluded that the tolerance dose without damaging the OLED sample is about 1.7 × 105 e- nm-2, which is about 0.6 times that of the conventional EH. The combination of EH and 3D tensor decomposition denoising is capable of making a time series measurement of an OLED sample without any effect from the electron irradiation.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"485-493"},"PeriodicalIF":0.0,"publicationDate":"2023-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"10783859","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
In situ pulsed electrical biasing TEM observation of AA7075. AA7075原位脉冲电偏置透射电镜观察。
Pub Date : 2023-11-24 DOI: 10.1093/jmicro/dfad025
Tyler J Grimm, Laine Mears

Electrically assisted heat treatment is the process of applying an electric current to a sample during heat treatment. Literature has generally shown there to be a difference in the resulting effects of direct current (DC) current and highly transient current (i.e. electropulsing). However, these differences are poorly characterized. In situ transmission electron microscopy (TEM) observation of an AA7075 sample while DC and pulsed current were passed through it was performed herein to explore the effects of an electric current on precipitate development. Numerical simulation results indicate that the thermal response of the samples was very rapid, causing the sample to reach steady-state temperatures almost instantly. There does not appear to be any significant difference between the results of pulsed current application and DC current. Additionally, the failure mechanism of an electrical biasing TEM sample is explored.

电辅助热处理是在热处理过程中对样品施加电流的过程。文献普遍表明,直流电(DC)电流和高瞬态电流(即电脉冲)产生的效果是不同的。然而,这些差异并没有得到很好的描述。通过原位透射电子显微镜(TEM)观察了直流和脉冲电流对AA7075样品的影响,探讨了电流对沉淀发育的影响。数值模拟结果表明,样品的热响应非常迅速,几乎可以瞬间达到稳态温度。在脉冲电流和直流电流的应用结果之间似乎没有任何显著的差异。此外,还探讨了电偏置TEM试样的破坏机理。
{"title":"In situ pulsed electrical biasing TEM observation of AA7075.","authors":"Tyler J Grimm, Laine Mears","doi":"10.1093/jmicro/dfad025","DOIUrl":"10.1093/jmicro/dfad025","url":null,"abstract":"<p><p>Electrically assisted heat treatment is the process of applying an electric current to a sample during heat treatment. Literature has generally shown there to be a difference in the resulting effects of direct current (DC) current and highly transient current (i.e. electropulsing). However, these differences are poorly characterized. In situ transmission electron microscopy (TEM) observation of an AA7075 sample while DC and pulsed current were passed through it was performed herein to explore the effects of an electric current on precipitate development. Numerical simulation results indicate that the thermal response of the samples was very rapid, causing the sample to reach steady-state temperatures almost instantly. There does not appear to be any significant difference between the results of pulsed current application and DC current. Additionally, the failure mechanism of an electrical biasing TEM sample is explored.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"494-505"},"PeriodicalIF":0.0,"publicationDate":"2023-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"9400143","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analyzing the synchronism of stacking-fault formation in side-by-side SiC nanowire pairs using the Levenshtein distance: stochastic versus deterministic processes. 使用Levenstein距离分析并排SiC纳米线对中堆垛层错形成的同步性:随机过程与确定性过程。
Pub Date : 2023-10-09 DOI: 10.1093/jmicro/dfac073
Fuka Moriuchi, Hideo Kohno

Pairs of silicon carbide nanowires were grown side by side synchronously from the same metal catalyst nanoparticles. The stacking sequences of each pair were read by high-resolution transmission electron microscopy, and the similarity of each stacking sequence was measured using the Levenshtein distance. No synchronism was detected in the pairs of stacking sequences, and the results indicated that the formation of stacking faults in silicon carbide nanowires was not deterministic, but purely stochastic.

由相同的金属催化剂纳米颗粒同步并排生长成对的碳化硅纳米线。通过高分辨率透射电子显微镜读取每对的堆叠序列,并使用Levenstein距离测量每个堆叠序列的相似性。在堆叠序列对中没有检测到同步性,结果表明碳化硅纳米线中堆叠故障的形成不是确定性的,而是纯粹随机的。
{"title":"Analyzing the synchronism of stacking-fault formation in side-by-side SiC nanowire pairs using the Levenshtein distance: stochastic versus deterministic processes.","authors":"Fuka Moriuchi,&nbsp;Hideo Kohno","doi":"10.1093/jmicro/dfac073","DOIUrl":"10.1093/jmicro/dfac073","url":null,"abstract":"<p><p>Pairs of silicon carbide nanowires were grown side by side synchronously from the same metal catalyst nanoparticles. The stacking sequences of each pair were read by high-resolution transmission electron microscopy, and the similarity of each stacking sequence was measured using the Levenshtein distance. No synchronism was detected in the pairs of stacking sequences, and the results indicated that the formation of stacking faults in silicon carbide nanowires was not deterministic, but purely stochastic.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"395-398"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"10444312","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Measurement and correction of TEM image distortion using arbitrary samples. 使用任意样本测量和校正TEM图像失真。
Pub Date : 2023-10-09 DOI: 10.1093/jmicro/dfad015
Hirokazu Tamaki, Koh Saitoh

We have developed a method to quantitatively measure image distortion, one of the five Seidel aberrations, in transmission electron microscopes without using a standard sample with a known structure. Displacements of small local segments in an image due to image distortion of the intermediate and projection lens system are first measured by comparing images taken before and after a given shift at the first image plane of the objective lens. Then, the sum of the second partial derivatives, or the Laplacian, of the displacement field is measured, and the radial and azimuthal distortion parameters are determined from the measured results. We confirmed using numerically distorted images that the proposed method can measure the image distortion within a relative error ratio of 0.04 for a wide range of distortion amount from 0.1% to 5.0%. The distortion measurement and correction were confirmed to work correctly by using the experimental images, and the iterative measurement and correction procedure could reduce the distortion to a level where the average image displacement was < 0.05 pixels.

我们开发了一种方法,在不使用已知结构的标准样品的情况下,定量测量透射电子显微镜中的图像失真,这是五种塞德尔像差之一。首先通过比较在物镜的第一像平面处的给定偏移之前和之后拍摄的图像来测量由于中间和投影透镜系统的图像失真而导致的图像中的小局部片段的位移。然后,测量位移场的二阶偏导数或拉普拉斯算子的和,并根据测量结果确定径向和方位角失真参数。我们使用数字失真图像证实,对于0.1%至5.0%的宽失真量范围,所提出的方法可以在0.04的相对误差率内测量图像失真。通过使用实验图像证实了失真测量和校正的正确性,并且迭代测量和校正过程可以将失真降低到平均图像位移<0.05像素的水平。
{"title":"Measurement and correction of TEM image distortion using arbitrary samples.","authors":"Hirokazu Tamaki,&nbsp;Koh Saitoh","doi":"10.1093/jmicro/dfad015","DOIUrl":"10.1093/jmicro/dfad015","url":null,"abstract":"<p><p>We have developed a method to quantitatively measure image distortion, one of the five Seidel aberrations, in transmission electron microscopes without using a standard sample with a known structure. Displacements of small local segments in an image due to image distortion of the intermediate and projection lens system are first measured by comparing images taken before and after a given shift at the first image plane of the objective lens. Then, the sum of the second partial derivatives, or the Laplacian, of the displacement field is measured, and the radial and azimuthal distortion parameters are determined from the measured results. We confirmed using numerically distorted images that the proposed method can measure the image distortion within a relative error ratio of 0.04 for a wide range of distortion amount from 0.1% to 5.0%. The distortion measurement and correction were confirmed to work correctly by using the experimental images, and the iterative measurement and correction procedure could reduce the distortion to a level where the average image displacement was < 0.05 pixels.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"425-432"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"10710879","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Development of temporal series 4D-STEM and application to relaxation time measurement. 时间序列4D-STEM的发展及其在弛豫时间测量中的应用。
Pub Date : 2023-10-09 DOI: 10.1093/jmicro/dfad006
Katsuaki Nakazawa, Kazutaka Mitsuishi

Diffraction patterns contain useful information about the materials. Recent developments in four-dimensional scanning transmission electron microscopy and the acquisition of the spatial distribution of diffraction patterns have produced significant results. The acquisition of a temporal series of diffractions is achieved for a stationary beam. However, the acquisition of spatiotemporal distribution of diffraction patterns has only been established under limited conditions. In this study, we developed a simple method that enables the recording of the spatiotemporal distribution of diffraction patterns and applied it to the relaxation time measurement that is robust to sample drift.

衍射图案包含有关材料的有用信息。四维扫描透射电子显微镜的最新发展和衍射图案空间分布的获取已经产生了显著的结果。对于静止光束,可以获得一系列衍射的时间序列。然而,衍射图案的时空分布的获取只是在有限的条件下建立的。在这项研究中,我们开发了一种简单的方法,可以记录衍射图案的时空分布,并将其应用于对样品漂移具有鲁棒性的弛豫时间测量。
{"title":"Development of temporal series 4D-STEM and application to relaxation time measurement.","authors":"Katsuaki Nakazawa,&nbsp;Kazutaka Mitsuishi","doi":"10.1093/jmicro/dfad006","DOIUrl":"10.1093/jmicro/dfad006","url":null,"abstract":"<p><p>Diffraction patterns contain useful information about the materials. Recent developments in four-dimensional scanning transmission electron microscopy and the acquisition of the spatial distribution of diffraction patterns have produced significant results. The acquisition of a temporal series of diffractions is achieved for a stationary beam. However, the acquisition of spatiotemporal distribution of diffraction patterns has only been established under limited conditions. In this study, we developed a simple method that enables the recording of the spatiotemporal distribution of diffraction patterns and applied it to the relaxation time measurement that is robust to sample drift.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"446-449"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"9074254","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Correction to: High-resolution and analytical electron microscopy in a liquid flow cell via gas purging. 更正:通过气体吹扫在液体流动池中进行高分辨率和分析电子显微镜检查。
Pub Date : 2023-10-09 DOI: 10.1093/jmicro/dfad033
{"title":"Correction to: High-resolution and analytical electron microscopy in a liquid flow cell via gas purging.","authors":"","doi":"10.1093/jmicro/dfad033","DOIUrl":"10.1093/jmicro/dfad033","url":null,"abstract":"","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"460"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"9648257","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Super-resolution method for SEM images based on pixelwise weighted loss function. 基于像素加权损失函数的扫描电镜图像超分辨率方法。
Pub Date : 2023-10-09 DOI: 10.1093/jmicro/dfad009
Akira Ito, Atsushi Miyamoto, Naoaki Kondo, Minoru Harada

Scanning electron microscopy (SEM) has realized high-throughput defect monitoring of semiconductor devices. As miniaturization and complexification of semiconductor circuit patterns increase in recent years, so has the number of defects. There is thus a great need to further increase the throughput of SEM defect monitoring. Toward this end, we propose a deep learning-based super-resolution method that reproduces high-resolution (HR) images from corresponding low-resolution images. Image quality factors such as pattern contrast and sharpness are important in SEM HR images in order to evaluate the quality of printed circuit patterns. Our proposed method meets various image quality requirements by changing the loss calculation method pixelwise based on the pattern in the image. It realizes super-resolved images that compare favorably with actual HR images and can improve SEM throughput by 100% or more.

扫描电子显微镜(SEM)已经实现了半导体器件的高通量缺陷监测。近年来,随着半导体电路图案的小型化和复杂化的增加,缺陷的数量也在增加。因此,非常需要进一步增加SEM缺陷监测的吞吐量。为此,我们提出了一种基于深度学习的超分辨率方法,该方法从相应的低分辨率图像中再现高分辨率(HR)图像。为了评估印刷电路图案的质量,图案对比度和清晰度等图像质量因素在SEM HR图像中是重要的。我们提出的方法通过改变基于图像中图案的逐像素损失计算方法来满足各种图像质量要求。它实现了与实际HR图像相比非常好的超分辨率图像,并且可以将SEM吞吐量提高100%或更多。
{"title":"Super-resolution method for SEM images based on pixelwise weighted loss function.","authors":"Akira Ito,&nbsp;Atsushi Miyamoto,&nbsp;Naoaki Kondo,&nbsp;Minoru Harada","doi":"10.1093/jmicro/dfad009","DOIUrl":"10.1093/jmicro/dfad009","url":null,"abstract":"<p><p>Scanning electron microscopy (SEM) has realized high-throughput defect monitoring of semiconductor devices. As miniaturization and complexification of semiconductor circuit patterns increase in recent years, so has the number of defects. There is thus a great need to further increase the throughput of SEM defect monitoring. Toward this end, we propose a deep learning-based super-resolution method that reproduces high-resolution (HR) images from corresponding low-resolution images. Image quality factors such as pattern contrast and sharpness are important in SEM HR images in order to evaluate the quality of printed circuit patterns. Our proposed method meets various image quality requirements by changing the loss calculation method pixelwise based on the pattern in the image. It realizes super-resolved images that compare favorably with actual HR images and can improve SEM throughput by 100% or more.</p>","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"408-417"},"PeriodicalIF":0.0,"publicationDate":"2023-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"10700639","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Microscopy (Oxford, England)
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1