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Advances in x-ray analysis最新文献

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Analysis of Residual Stress States in Coarse Grained and Single Crystal Nickel-Base Superalloys 粗晶和单晶镍基高温合金残余应力状态分析
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022618
W. Reimers
{"title":"Analysis of Residual Stress States in Coarse Grained and Single Crystal Nickel-Base Superalloys","authors":"W. Reimers","doi":"10.1154/S0376030800022618","DOIUrl":"https://doi.org/10.1154/S0376030800022618","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"56 1","pages":"211-223"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72686344","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Refined Determination of the Structure of Kerogen Etc. by Xrd and its Significance 用Xrd精细化测定干酪根等的结构及其意义
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022977
Wei Mingxin, Liu Delian, Cheng Deyu, Wang Guan-xin
{"title":"Refined Determination of the Structure of Kerogen Etc. by Xrd and its Significance","authors":"Wei Mingxin, Liu Delian, Cheng Deyu, Wang Guan-xin","doi":"10.1154/S0376030800022977","DOIUrl":"https://doi.org/10.1154/S0376030800022977","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"36 1","pages":"553-560"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85559603","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Determination of Thickness and Composition of Thin AlxGa1-xAs Films on GaAs substrates by Total Electron Yield (Tey) Measurements 用总电子产额(Tey)测定GaAs衬底上AlxGa1-xAs薄膜的厚度和组成
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800023120
H. Ebel, R. Svagera, M. Ebel, N. Zagler
{"title":"Determination of Thickness and Composition of Thin AlxGa1-xAs Films on GaAs substrates by Total Electron Yield (Tey) Measurements","authors":"H. Ebel, R. Svagera, M. Ebel, N. Zagler","doi":"10.1154/S0376030800023120","DOIUrl":"https://doi.org/10.1154/S0376030800023120","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"2 1","pages":"683-694"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84589984","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Sample Curvature Effects on d-versus-sin2ѱ plots for Residual Stress Analysis 样品曲率对残余应力分析d- vs - sin2<e:1>图的影响
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022692
A. Ward, H. Allison, Brian Zimmerman, R. Hendricks
{"title":"Sample Curvature Effects on d-versus-sin2ѱ plots for Residual Stress Analysis","authors":"A. Ward, H. Allison, Brian Zimmerman, R. Hendricks","doi":"10.1154/S0376030800022692","DOIUrl":"https://doi.org/10.1154/S0376030800022692","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"64 1","pages":"291-296"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88916604","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Assessing the Validity of Diffraction Stress Data with the Goodness-Of-Fit Statistic 用拟合优度统计评价衍射应力数据的有效性
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022680
Thomas A. Lohkamp, R. A. Winhoitz
{"title":"Assessing the Validity of Diffraction Stress Data with the Goodness-Of-Fit Statistic","authors":"Thomas A. Lohkamp, R. A. Winhoitz","doi":"10.1154/S0376030800022680","DOIUrl":"https://doi.org/10.1154/S0376030800022680","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"9 1","pages":"281-289"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74746284","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Comparison of Various Descriptions of X-Ray Tube Spectra x射线管光谱各种描述的比较
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022539
B. Schossmann, H. Wiederschwinger, H. Ebel, J. Wernisch
{"title":"Comparison of Various Descriptions of X-Ray Tube Spectra","authors":"B. Schossmann, H. Wiederschwinger, H. Ebel, J. Wernisch","doi":"10.1154/S0376030800022539","DOIUrl":"https://doi.org/10.1154/S0376030800022539","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"127 1","pages":"127-135"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79542606","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
Depth profiling by Xrf with Variable Beam Geometry Applied to Thin Films in the Nanometer Region 可变光束几何形状的Xrf深度剖面在纳米区域薄膜中的应用
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800023119
H. Ebel, R. Svagera, Robert Hobl, W. Kugler, Hung D Nguyen
{"title":"Depth profiling by Xrf with Variable Beam Geometry Applied to Thin Films in the Nanometer Region","authors":"H. Ebel, R. Svagera, Robert Hobl, W. Kugler, Hung D Nguyen","doi":"10.1154/S0376030800023119","DOIUrl":"https://doi.org/10.1154/S0376030800023119","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"7 1","pages":"675-682"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74720022","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
New Tools for Grazing Incidence Diffraction Measurements: Comparison of Different Primary and Secondary Beam Conditioners 掠入射衍射测量的新工具:不同主次光束调理器的比较
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022485
R. Stabenow, A. Haase
{"title":"New Tools for Grazing Incidence Diffraction Measurements: Comparison of Different Primary and Secondary Beam Conditioners","authors":"R. Stabenow, A. Haase","doi":"10.1154/S0376030800022485","DOIUrl":"https://doi.org/10.1154/S0376030800022485","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"18 1","pages":"87-94"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75028519","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
X-Ray Fluorescence Cross-Section Measurements in the Energy Range 4-18 keV 能量范围4- 18kev的x射线荧光截面测量
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800023326
K. Stoev, J. F. Dlouhy
{"title":"X-Ray Fluorescence Cross-Section Measurements in the Energy Range 4-18 keV","authors":"K. Stoev, J. F. Dlouhy","doi":"10.1154/S0376030800023326","DOIUrl":"https://doi.org/10.1154/S0376030800023326","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"1 1","pages":"845-855"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79146090","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analysis of Thin Films and Multi-Layer Thin Films containing Light Elements by XRF 含轻元素薄膜和多层薄膜的XRF分析
Pub Date : 1995-01-01 DOI: 10.1154/S0376030800023144
M. Kaufmann, M. Mantler, F. Weber
{"title":"Analysis of Thin Films and Multi-Layer Thin Films containing Light Elements by XRF","authors":"M. Kaufmann, M. Mantler, F. Weber","doi":"10.1154/S0376030800023144","DOIUrl":"https://doi.org/10.1154/S0376030800023144","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"16 1","pages":"701-706"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85979426","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
期刊
Advances in x-ray analysis
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