The current study goals to create of PS-SiC-Al2O3 multifunctional nanocomposites films as a promising nanomaterials to exploit in futuristic nanoelectronics and optical fields. By comparing with other nanocomposites films, the PS-SiC-Al2O3 films have high absorption for UV-radiation, flexible, low band gap, and inexpensive. The microstructure and optical characteristics of PS-SiC-Al2O3 films were investigated. The microstructure and morphological properties included FTIR and OM. The realized results indicated that the values absorbance for PS-SiC-Al2O3 films are high at NIR and UV spectrums. These results build the films of PS-SiC-Al2O3 are promising for NIR sensing, UV shielding and optoelectronics approaches. The increment ratio of PS absorbance is 30.9% for λ = 320 nm and SiC-Al2O3 content is 2.4 wt.%. The PS band gap is 3.8 eV and its reduced to 3.13 eV with increasing SiC-Al2O3 NPs content to 2.4 wt.%.. This performance leads to make the PS-SiC-Al2O3 films are welcomed in various optoelectronics and photonics fields. The optical factors: extinction coefficient; absorption coefficient; real and imaginary dielectric constants, refractive index; and optical conductivity of PS were enhanced with increasing SiC-Al2O3 NPs content; these results of lead to made the PS-SiC-Al2O3 films are suitable for optical fields. Finally, the achieved results confirmed that the PS-SiC-Al2O3 films could be as a key for promising nanoelectronics and optical fields.