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Examination of Capacities of Si50, C50, B25P25, Fe-Si50, Fe-C50 and Fe-B25P25 Nanocages for Procarbazine Delivery as Anticancer Drug Si50、C50、B25P25、Fe-Si50、Fe-C50和Fe-B25P25纳米笼用于抗癌药物丙卡嗪的容量研究
IF 2.8 3区 材料科学 Q3 CHEMISTRY, PHYSICAL Pub Date : 2024-11-04 DOI: 10.1007/s12633-024-03190-7
Farag M. A. Altalbawy, Irwanjot Kaur, Abhishek Kumar, Mamata Chahar, Suman Saini, Uday Abdul-Reda Hussein, Faraj Mohammed, Mustafa Adnan Abdulrahman, Ashwaq T. Kareem, Marwea Al-Hedrewy

The abilities of Si50, C50, B25P25, Fe-Si50, Fe-C50, Fe-B25P25 to deliver the Procarbazine are investigated. The thermodynamic parameters of interactions of Procarbazine with Si50, C50, B25P25, Fe-Si50, Fe-C50, Fe-B25P25 nanocages are examined. The ΔGadsorption of Procarbazine on silicon and carbon nanocages are calculated by computational models to propose the nanocages with high capacity to adsorb the Procarbazine. Results have shown that the Si50, C50, B25P25, Fe-Si50, Fe-C50, Fe-B25P25 nanocages are stable nanostructures from thermodynamic viewpoint. The ΔGadsorption values of Si50-Procarbazine, C50-Procarbazine, B25P25-Procarbazine, Fe-Si50-Procarbazine, Fe-C50-Procarbazine and Fe-B25P25-Procarbazine are -3.04, -3.15, -3.29, -3.77, -3.90 and -4.00 eV. The Fe-B25P25 has suitable capacity to deliver the Procarbazine. The metals can improve the recovery times of Procarbazine on silicon and carbon nanocages. The ΔGadsorption value of Fe-B25P25-Procarbazine is higher than Fe-C50 for delivering the Procarbazine. The Fe-B25P25 is suggested as acceptable material to deliver the Procarbazine.

考察了Si50、C50、B25P25、Fe-Si50、Fe-C50、Fe-B25P25对丙卡嗪的输送能力。考察了丙卡嗪与Si50、C50、B25P25、Fe-Si50、Fe-C50、Fe-B25P25纳米笼相互作用的热力学参数。通过计算模型计算了异丙嗪在硅纳米笼和碳纳米笼上的吸附量ΔGadsorption,提出了吸附异丙嗪的高容量纳米笼。结果表明,从热力学角度来看,Si50、C50、B25P25、Fe-Si50、Fe-C50、Fe-B25P25纳米笼是稳定的纳米结构。Si50-Procarbazine、C50-Procarbazine、B25P25-Procarbazine、Fe-Si50-Procarbazine、Fe-C50-Procarbazine和Fe-B25P25-Procarbazine的ΔGadsorption值分别为-3.04、-3.15、-3.29、-3.77、-3.90和-4.00 eV。Fe-B25P25具有合适的输送能力。金属可以提高异丙嗪在硅纳米笼和碳纳米笼上的回收率。Fe-B25P25-Procarbazine的ΔGadsorption值高于Fe-C50,用于输送Procarbazine。建议将Fe-B25P25作为输送Procarbazine的可接受材料。
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引用次数: 0
Morphological Study of Ba1.98Dy0.02SiO4 Nanoceramic Synthesized Via Distinguished Chemical Routes 不同化学路线合成Ba1.98Dy0.02SiO4纳米陶瓷的形态研究
IF 2.8 3区 材料科学 Q3 CHEMISTRY, PHYSICAL Pub Date : 2024-10-31 DOI: 10.1007/s12633-024-03181-8
Nancy Jangra, Bharti Mohan, Gita Rani, Rachna Ahlawat

Ba1.98Dy0.02SiO4 nanoceramic samples were synthesized using the most versatile sol–gel and citrate sol–gel techniques. The properties of Ba1.98Dy0.02SiO4 nanoceramics were perceived by XRD pattern, IR spectra, UV–Vis-DR Spectra, FESEM, etc. XRD confirmed the phase purity and homogeneity of the samples. Rietveld refinement methodology was employed to authenticate the prepared samples' structural parameters and crystal structure. FTIR analysis provides the IR vibrations consistent with bonding among the atoms and molecules. Compared to IR, high-frequency Raman modes attributed to SiO4 units are shifted. FESEM micrographs revealed the formation of spherical shape nanoparticles and nanorods. EDAX spectra governed the elemental composition of prepared samples, further confirmed via XPS scan. Diffuse reflectance examined optical modifications and band structure of the nanoceramics. The band gap of the proposed samples was intended to use the best relationship between the Kubelka Munk function and reflectance data. The comparative results showed that the citric acid-assisted Ba1.98Dy0.02SiO4 sample has better structural and optical characteristics with nanorod morphology functional in device fabrication. At the same time, the sample prepared by traditional sol–gel has spherical nanopowders suitable for display devices. The 0-dim and 1-dim morphology of the samples were ascribed to the significant differences in the synthesis conditions.

采用最通用的溶胶-凝胶和柠檬酸盐溶胶-凝胶技术合成了Ba1.98Dy0.02SiO4纳米陶瓷样品。采用XRD、IR、UV-Vis-DR、FESEM等方法对Ba1.98Dy0.02SiO4纳米陶瓷的性能进行表征。XRD证实了样品的相纯度和均匀性。采用Rietveld精化方法对制备样品的结构参数和晶体结构进行鉴定。FTIR分析提供了与原子和分子之间成键一致的红外振动。与IR相比,SiO4单元的高频拉曼模式发生了移位。FESEM显微照片显示球形纳米颗粒和纳米棒的形成。EDAX光谱控制了制备样品的元素组成,并通过XPS扫描进一步证实。漫反射测试了纳米陶瓷的光学修饰和能带结构。所提样品的带隙旨在利用Kubelka Munk函数与反射率数据之间的最佳关系。对比结果表明,柠檬酸辅助制备的Ba1.98Dy0.02SiO4样品具有较好的结构和光学特性,具有纳米棒形态,可用于器件制造。同时,传统溶胶-凝胶法制备的样品具有适合于显示器件的球形纳米粉末。样品的0-dim和1-dim形态是由于合成条件的显著差异造成的。
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引用次数: 0
Electrochemical Behaviour of Silicon Ions in NaCl-KCl Mixture with Low KF Concentration 低KF浓度NaCl-KCl混合物中硅离子的电化学行为
IF 2.8 3区 材料科学 Q3 CHEMISTRY, PHYSICAL Pub Date : 2024-10-31 DOI: 10.1007/s12633-024-03189-0
Sai Krishna Padamata, Geir Martin Haarberg, Gudrun Saevarsdottir

In this work, we studied the electrochemical behaviour of silicon ions in NaCl-KCl-KF molten salts containing K2SiF6 at 1003 K. Electrochemical techniques such as cyclic voltammetry, chronopotentiometry and chronoamperometry were used to study the kinetics of Si deposition on molybdenum working electrode. The diffusion coefficient and nucleation mode of silicon ions were investigated. The nucleation mode of Si ions was determined to be instantaneous nucleation by chronoamperometry. The diffusion coefficient of Si ions is 0.32 × 10–5 cm2.s−1 and 1.21 × 10–5 cm2.s−1 from cyclic voltammetry and chronopotentiometry, respectively. Before Si film formation, MoSi2 layer is formed on the Mo electrode. Electrolysis was performed in potentiostatic and galvanostatic modes. SEM, EDS and XRD analysis was performed on cathode products. At low cathode current densities, only MoSi2 is formed, whereas MoSi2 layer formation followed by thick Si film deposition takes place at high current densities.

本文研究了硅离子在含K2SiF6的NaCl-KCl-KF熔盐中1003k时的电化学行为。采用循环伏安法、时电位法和时安培法等电化学技术研究了硅在钼工作电极上的沉积动力学。研究了硅离子的扩散系数和成核模式。用时间电流法测定了硅离子的成核方式为瞬时成核。硅离子的扩散系数为0.32 × 10-5 cm2。S−1和1.21 × 10-5 cm2。S−1分别来自循环伏安法和计时电位法。在Si膜形成之前,在Mo电极上形成MoSi2层。电解在恒电位和恒流模式下进行。对阴极产物进行了SEM、EDS和XRD分析。在低阴极电流密度下,只形成MoSi2,而在高电流密度下,MoSi2层的形成伴随着厚Si膜的沉积。
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引用次数: 0
Geometric-Quadratic and Quadratic-Geometric Indices-based Entropy Measures of Silicon Carbide Networks 基于几何二次和二次几何指数的碳化硅网络熵测度
IF 2.8 3区 材料科学 Q3 CHEMISTRY, PHYSICAL Pub Date : 2024-10-25 DOI: 10.1007/s12633-024-03173-8
Shibsankar Das, Virendra Kumar, Jayjit Barman

In chemical graph theory, topological indices are numerical quantities associated with the structure of molecular compounds. These indices are utilized in the construction of quantitative structure-property relationships (QSPR) and quantitative structure-activity relationships (QSAR) analysis and quantify the different features of the molecular topology. M-polynomial gives a handy method for managing complex computations involving various indices and offers a consistent methodology to derive multiple degree-based topological indices. Graph entropy measures are employed to measure the structural information content, disorder and complexity of a graph. In this article, we examine the geometric-quadratic (GQ) and quadratic-geometric (QG) indices for silicon carbide networks, namely (text {Si}_{2}text {C}_{3} textit{-I}[p,q]), (text {Si}_{2}text {C}_{3} textit{-II}[p,q]) and (text {Si}_{2}text {C}_{3} textit{-III}[p,q]) with the help of their respective M-polynomials. Next, we propose the idea of the GQ-QG indices-based entropy measure and compute their expressions for the above-said networks. Furthermore, the graphical representation and numerical computation of the GQ-QG indices and associated entropy measures are performed to assess their behavior. These indices and entropy measures may be helpful in predicting the physico-chemical properties and understanding the structural behavior of the considered silicon carbide networks.

在化学图论中,拓扑指数是与分子化合物结构相关的数值。利用这些指标构建定量构效关系(QSPR)和定量构效关系(QSAR)分析并量化分子拓扑结构的不同特征。m -多项式提供了一种方便的方法来管理涉及各种指标的复杂计算,并提供了一种一致的方法来推导基于度的多个拓扑指标。图熵度量用于度量图的结构信息含量、无序度和复杂性。在本文中,我们在各自m多项式的帮助下研究了碳化硅网络的几何二次(GQ)和二次几何(QG)指标,即(text {Si}_{2}text {C}_{3} textit{-I}[p,q]), (text {Si}_{2}text {C}_{3} textit{-II}[p,q])和(text {Si}_{2}text {C}_{3} textit{-III}[p,q])。接下来,我们提出了基于GQ-QG指标的熵测度思想,并计算了上述网络的熵测度表达式。此外,还对GQ-QG指数和相关熵测度进行了图形表示和数值计算,以评估它们的行为。这些指标和熵测度有助于预测所考虑的碳化硅网络的物理化学性质和理解其结构行为。
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引用次数: 0
The Preparation of a Novel Silicone Optical Adhesive with Low Hardness and High Refractive Index 新型低硬度高折射率有机硅光学胶粘剂的制备
IF 2.8 3区 材料科学 Q3 CHEMISTRY, PHYSICAL Pub Date : 2024-10-25 DOI: 10.1007/s12633-024-03183-6
Zhaoqun Pan, Shuangshuang Li, Changxin Cai

Hydroxyl-terminated polydiphenyl-methylphenyl siloxane (PDPMPS-OH) was synthesized by a non-hydrolysis sol–gel condensation method, using diphenylsilanediol (DPDS) and methylphenyl dimethoxysilane (MPDMS) as the raw materials. Subsequently, the synthesized PDPMPS-OH was reacted with divinyltetramethyldisiloxane (MMvi) to produce a vinyl-terminated polydiphenyl-methylphenyl siloxane (PDPMPS-Vi) with a high refractive index of 1.580 and a long chain linear structure. The optical adhesive product (CSOA) cured by PDPMPS-Vi and a hydrogen-containing silicone resin, exhibits excellent optical performance, high reliability, and significantly enhanced tensile strength (up to 384 kPa), hardness (up to 48 O), and elongation at break (up to 237.9%), as well as a refractive index of up to 1.575. This adhesive demonstrates remarkable performance as an optical component adhesive.

以二苯基硅二醇(DPDS)和甲基苯基二甲氧基硅烷(MPDMS)为原料,采用非水解溶胶-凝胶缩合法合成了端羟基聚二苯基甲基苯基硅氧烷(PDPMPS-OH)。随后,将合成的PDPMPS-OH与二乙烯基四甲基二硅氧烷(MMvi)反应,制得折射率为1.580、长链线性结构的端乙烯基聚二苯基甲基苯基硅氧烷(PDPMPS-Vi)。PDPMPS-Vi与含氢硅树脂固化后的光学胶粘剂产品(CSOA)具有优异的光学性能和高可靠性,显著提高了抗拉强度(可达384 kPa)、硬度(可达48 O)和断裂伸长率(可达237.9%),折射率可达1.575。该胶粘剂表现出优异的光学元件胶粘剂性能。
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引用次数: 0
Influence of Inner Crucible Radius Variation on the Thermal Field and Oxygen Transport in the Melt During the Growth of Silicon by Continuous Czochralski Method 内坩埚半径变化对硅连续生长过程中熔体热场和氧输运的影响
IF 2.8 3区 材料科学 Q3 CHEMISTRY, PHYSICAL Pub Date : 2024-10-24 DOI: 10.1007/s12633-024-03184-5
Jiacheng Li, Xuekang Lv, Rongrong Hu, Salamat Ali, Gengjin Li, Jing Qi, Deyan He

The continuous Czochralski (CCz) method is a low-cost and high-efficiency method for the production of monocrystalline silicon. The inner crucible is an extremely important component in the CCz method. In this work, the crystal silicon rod production process with a diameter of 215.00 mm is simulated to study how the inner crucible radius influences the thermal field of the melt and the melt-crystal (m-c) interface shape with the outer crucible size remaining constant. Additionally, the effects of varying the inner crucible radius on the Von Mises stress within the crystal and the distribution of oxygen impurities in the melt are also examined. The results show that when the radius of the outer crucible is fixed, the required heater power increases slightly with the increase of the inner crucible radius. However, the convexity and deflection of the m-c interface, the Von Mises stress inside the crystal, and the oxygen impurities content at the crystal growth interface decrease with the increase of the inner crucible radius. Therefore, the larger inner crucible size is favorable for silicon crystal production using CCz. The results of this work can improve the production efficiency and quality of the silicon crystal.

连续法是生产单晶硅的一种低成本、高效率的方法。内坩埚是CCz法中极为重要的组成部分。本文模拟了直径为215.00 mm的晶体硅棒的生产过程,研究了在外坩埚尺寸保持不变的情况下,内坩埚半径对熔体热场和熔体-晶体(m-c)界面形状的影响。此外,还研究了坩埚内半径的变化对晶体内Von Mises应力和熔体中氧杂质分布的影响。结果表明:当外坩埚半径一定时,随着内坩埚半径的增大,加热所需功率略有增加;而随着内坩埚半径的增大,m-c界面的凹凸度和挠度、晶体内部的Von Mises应力以及晶体生长界面的氧杂质含量均呈下降趋势。因此,较大的内坩埚尺寸有利于用CCz生产硅晶体。研究结果可以提高硅晶体的生产效率和质量。
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引用次数: 0
An Analysis of the Static-Pre-Stress Effect on the Thermal Quality Factor of a Silicon Viscothermoelastic Nano Resonator Under the Hyperbolic Two-Temperature Dual-Phase-Lag Heat Transfer 双曲双温双相滞后传热条件下静态预应力对硅粘热弹性纳米谐振器热品质因子的影响分析
IF 2.8 3区 材料科学 Q3 CHEMISTRY, PHYSICAL Pub Date : 2024-10-22 DOI: 10.1007/s12633-024-03174-7
B. M. Alotaibi, Haifa A. Al-Yousef, Alaa A. El-Bary, Hamdy M. Youssef, Norah A. M. Alsaif, Mohammed F. Alotiby, Thaqal M. Alhuzaymi

For nanobeam resonators, it is of the utmost importance to have a solid understanding of how to tune the energy damping and thermal quality factor. The periods of thermal and mechanical relaxation are quite important when it comes to adjusting energy damping. Within the scope of this study, the novelty of this work is constructing an analytical thermal model to investigate the effects of the static pre-stress, as well as the thermal and mechanical relaxation periods, on a viscothermoelastic silicon nano resonator in the context of a hyperbolic two-temperature dual-phase-lag heat conduction model. Several factors, including the length scale, mechanical relaxation time, thermal relaxation times, static-pre-stress, and isothermal frequency, have been investigated concerning the thermal quality factor. It is possible to alter the length-scale parameters, as well as the static-pre-stress, thermal, and mechanical relaxation times, to achieve a significant increase in the thermal quality factor. The isothermal frequency is another factor that has a major impact on the thermal quality factor of the viscothermoelastic silicon nano resonator.

对于纳米光束谐振器来说,了解如何调节能量阻尼和热质量因子是至关重要的。在调节能量阻尼时,热松弛期和机械松弛期是非常重要的。在本研究的范围内,本工作的新颖之处在于构建了一个分析热模型,以研究在双曲双温双相滞后热传导模型的背景下,静态预应力以及热松弛期和机械松弛期对粘热弹性硅纳米谐振器的影响。研究了长度尺度、机械松弛时间、热松弛时间、静态预应力和等温频率等因素对热质量的影响。可以改变长度尺度参数,以及静态预应力、热和机械松弛时间,以实现热质量因子的显着增加。等温频率是影响粘热弹性硅纳米谐振器热质量因子的另一个重要因素。
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引用次数: 0
Quantum Chemical Simulation for the Adsorption Behavior of Silicon in Water and Surface Property Study 硅在水中吸附行为的量子化学模拟及表面性质研究
IF 2.8 3区 材料科学 Q3 CHEMISTRY, PHYSICAL Pub Date : 2024-10-22 DOI: 10.1007/s12633-024-03180-9
Lin Zhu, Shicong Yang, Dandan Wu, Keqiang Xie, Kuixian Wei, Wenhui Ma

With the rapid development of the photovoltaic industry, the demand for crystalline silicon has significantly increased. Water-based waste slurry generated from silicon wafer cutting with diamond wire is a byproduct, presenting considerable potential for reutilization. However, the presence of moisture can lead to silicon oxidation and SiO2 layer formation on the surface, hindering the recovery of high-purity silicon. In this study, the first-principles was employed for investigating the adsorption property of H2O on Si (111) and Si (100) surfaces, based on density functional theory. The results indicate that H2O can spontaneously adsorb on both the (111) and (100) surfaces of Silicon, and the affinity of H2O for the Si (111) surface being stronger than the Si (100) surface. Furthermore, Mulliken charge calculations and differential electron density analysis confirm that charge transfer of H, O and Si atoms occurs during the adsorption process between Si and H2O. The Si–O bonds formed on the Si (111) surface exhibit greater covalency compared to the Si (100) surface, suggesting that the Si (111) face is more susceptible to oxidation than the Si (100) face. This study provided theoretical insight into the adsorption of silicon in water at the atomic level, which is significant for deepening the understanding of silicon's oxidation mechanisms.

随着光伏产业的快速发展,对晶体硅的需求显著增加。金刚石丝切割硅片产生的水基废浆是一种副产品,具有相当大的再利用潜力。然而,水分的存在会导致硅氧化并在表面形成SiO2层,阻碍高纯硅的回收。本研究基于密度泛函理论,利用第一性原理研究了水在Si(111)和Si(100)表面的吸附特性。结果表明,H2O在硅的(111)和(100)表面均能自发吸附,且对Si(111)表面的亲和性强于Si(100)表面。此外,Mulliken电荷计算和差分电子密度分析证实,在Si和H2O之间的吸附过程中,H、O和Si原子发生了电荷转移。与Si(100)表面相比,Si(111)表面形成的Si - o键表现出更大的共价,表明Si(111)表面比Si(100)表面更容易氧化。本研究在原子水平上对硅在水中的吸附提供了理论认识,对深化对硅氧化机理的认识具有重要意义。
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引用次数: 0
A Study of the Influence of Process Parameters of AP PECVD on the Mechanical Properties of Silica-like Films Deposited on Polycarbonate AP PECVD工艺参数对聚碳酸酯类二氧化硅薄膜力学性能影响的研究
IF 2.8 3区 材料科学 Q3 CHEMISTRY, PHYSICAL Pub Date : 2024-10-21 DOI: 10.1007/s12633-024-03178-3
Anastasia S. Bil, Sergei E. Alexandrov

The ability to resist plastic deformation of the surface is extremely important for polycarbonates (PC), which are widely used in various industrial applications. This work is dedicated to the study of the possibility of using atmospheric pressure (AP) plasma enhanced chemical vapour deposition (PECVD) in dielectric barrier discharge (DBD) for the deposition of silica-like films as a method of strengthening of the PC surfaces. This is the first systematic study of the effect of the main process parameters on microhardness, scratch resistance and abrasion resistance of protective silica-like layers deposited on PC by this method using hexamethyldisiloxane (HMDSO) as a silicon-containing reagent. Also the numerical evaluation of the above mentioned properties of the coatings has been carried out. It has been found that the surface microhardness is most dependent on the amount of oxygen added to the gas mixture, the abrasion resistance is most affected by the electrical power absorbed in the discharge, and the scratch resistance is highly influenced by all process parameters. It has been shown experimentally that the microhardness of such silica-like films can reach 10 GPa (close to the typical value for quartz) and the near-surface microhardness of PC can be increased almost two times, scratch resistance increases by 8 points, and rolling abrasion resistance increases from 56 to 95% when the coating with the thickness of several dozen nm was deposited.

对于广泛应用于各种工业应用的聚碳酸酯(PC)来说,抗表面塑性变形的能力是极其重要的。这项工作致力于研究在介质阻挡放电(DBD)中使用常压(AP)等离子体增强化学气相沉积(PECVD)沉积二氧化硅类薄膜作为增强PC表面的方法的可能性。本文首次以六甲基二硅氧烷(HMDSO)为含硅试剂,系统研究了主要工艺参数对该方法沉积在PC上的类硅保护层显微硬度、耐划伤性和耐磨性的影响。并对涂层的上述性能进行了数值评价。研究发现,表面显微硬度最依赖于混合气体中加入氧气的量,耐磨性受放电中吸收的电功率影响最大,抗划伤性受所有工艺参数的影响很大。实验表明,当制备厚度为几十nm的类二氧化硅薄膜时,其显微硬度可达10 GPa(接近石英的典型值),PC近表面显微硬度可提高近2倍,抗划伤性提高8点,滚动耐磨性从56提高到95%。
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引用次数: 0
Improving the Yield and Physiological Traits of Different Safflower Cultivars (Carthamus tinctorius L.) Using Silicon and Nickel Foliar Application in a Saline Soil Condition 提高不同红花品种产量和生理性状的研究盐碱地条件下硅镍叶面施用
IF 2.8 3区 材料科学 Q3 CHEMISTRY, PHYSICAL Pub Date : 2024-10-17 DOI: 10.1007/s12633-024-03161-y
Mahboobe Bahrami, Mohamad Rahim Owji, Farhad Mohajeri, Mahmood Dejam

Improving the yield of different safflower cultivars using silicon and nickel foliar application in a saline soil condition was the hypothesis proposed in this research. For this purpose, a factorial experiment was conducted in the form of a randomized complete block design in Haji Abad, Iran, in 2019 and 2020. The first factor included four cultivars of safflower including Sofeh, Isfahan, Padideh and Golmehr, and the second factor was seven foliar spraying treatments, consisted of control, nickel with concentrations of 100, 200, and 300 mg L−1 and silicon with concentrations of 100, 150, and 200 mg L−1. Results showed that silicon foliar application of 150 and 200 mg L−1 increased potassium content by 10 and 16%, respectively, in compared to the control. Nickel foliar spraying of 300 mg L−1 caused an increase in leaf ion leakage and a decrease in photosynthetic pigments. On the other hand, silicon foliar application of 200 mg L−1 increased the total leaf chlorophyll content by 12 and 18% in Sofeh and Isfahan cultivars, respectively. Compared to the control, silicon with the concentration of 200 mg L−1 caused a 10 and 13% decrease in soluble carbohydrate and proline, respectively. In Isfahan and Padideh cultivars, silicon foliar spraying of 150 and 200 mg L−1 increased the seed yield by 21 and 15% compared to the control. The results of this research showed a positive effect of silicon foliar spraying especially with concentrations of 150 and 200 mg L−1 on improving seed yield and oil percentage in different safflower cultivars under salt stress.

本研究提出了在盐碱地条件下利用硅镍叶面施用提高不同红花品种产量的假设。为此,我们于2019年和2020年在伊朗哈吉阿巴德以随机完全区组设计的形式进行了一项析因试验。第一个因子包括Sofeh、Isfahan、Padideh和Golmehr 4个红花品种,第二个因子包括对照、浓度为100、200和300 mg L - 1的镍和浓度为100、150和200 mg L - 1的硅7个叶面喷施处理。结果表明,叶面施用150和200 mg L−1硅,钾含量分别比对照提高了10%和16%。叶片喷施300 mg L−1镍导致叶片离子泄漏增加,光合色素减少。另一方面,叶面施用200 mg L−1硅可使Sofeh和Isfahan品种叶片总叶绿素含量分别提高12%和18%。与对照相比,浓度为200 mg L−1的硅使可溶性碳水化合物和脯氨酸分别减少了10%和13%。在Isfahan和Padideh品种中,硅叶面喷施150和200 mg L - 1比对照增产21%和15%。结果表明,盐胁迫下,硅叶面喷施对不同红花品种的种子产量和出油率均有显著的促进作用,特别是150和200 mg L−1喷施效果更好。
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引用次数: 0
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